Gallium particle preparation device

Abstract

The invention provides a gallium particle preparation device. The gallium particle preparation device comprises a box body part; the separation part is arranged in the box body part so as to separate the interior of the box body part into a first cavity and a second cavity, the separation part is provided with a hole channel, the hole channel is communicated between the first cavity and the second cavity, and the position height of the first cavity is higher than that of the second cavity; the pressure regulating part is used for regulating the internal pressure of the box body part, so that the pressure in the first cavity is higher than or equal to the pressure in the second cavity; wherein the first cavity is used for containing liquid gallium, and the second cavity is used for containing cooling liquid. According to the gallium particle preparation device provided by the embodiment of the invention, the preparation difficulty of the gallium particles can be reduced, the preparation efficiency of the gallium particles is improved, and the production cost of the gallium particles is saved.

Description

Technical Field

[0001] The present disclosure relates to the technical field of metal granulation, and in particular to a gallium granule preparation device. Background Art

[0002] Gallium particles are particles made of metallic gallium and are often used for doping solar crystalline silicon to improve the attenuation problem of solar silicon cells during use. In the related art, the mold method is used to make gallium particles. However, the production efficiency of gallium particles prepared by the mold method is poor, which is difficult to adapt to the growing demand for gallium particle production and is not conducive to reducing production costs. Summary of the invention

[0003] The present disclosure aims to solve at least one of the technical problems existing in the prior art or related art.

[0004] In view of this, according to an embodiment of the present disclosure, a gallium particle preparation device is proposed, comprising:

[0005] Box body;

[0006] The partition part is arranged in the box body to separate the interior of the box body into a first chamber and a second chamber. The partition part is provided with a hole, which is connected between the first chamber and the second chamber. The height of the first chamber is higher than that of the second chamber.

[0007] A pressure regulating part, used for regulating the internal pressure of the box body so that the pressure in the first chamber is higher than or equal to the pressure in the second chamber;

[0008] The first chamber is used to contain liquid gallium, and the second chamber is used to contain cooling liquid.

[0009] In a feasible implementation manner, the gallium particle preparation device further includes:

[0010] The temperature regulating part is used for regulating the temperature in the first chamber and the second chamber so that the temperature in the first chamber is higher than the melting point of gallium and the temperature in the second chamber is lower than the melting point of gallium.

[0011] In a feasible embodiment, the temperature in the first chamber is greater than or equal to 30° C.; and / or

[0012] The temperature in the second chamber is less than or equal to 10°C.

[0013] In a feasible embodiment, the diameter of the pore is greater than or equal to 1 mm and less than or equal to 5 mm; and / or

[0014] The length of the hole is greater than or equal to 1 cm and less than or equal to 3 cm.

[0015] In a feasible implementation manner, the height of the second chamber is greater than or equal to 1 m and less than or equal to 2 m.

[0016] In a feasible implementation manner, the box body is formed with a liquid inlet and a liquid discharge port, both of which are connected to the second chamber, and the position height of the liquid discharge port is lower than the position height of the liquid inlet.

[0017] In a feasible implementation manner, a gap is formed between the drain port and the partition portion along the height direction of the second chamber.

[0018] In a feasible implementation manner, the gallium particle preparation device further includes:

[0019] The pumping part has a liquid inlet end connected to the liquid discharge port, and a liquid discharge end connected to the liquid inlet.

[0020] In a feasible implementation manner, the box body includes:

[0021] Box body;

[0022] A box cover is detachably arranged on the box body, and is formed with a feed inlet and a pressure regulating port, both of which are connected to the first chamber, and an output end of the pressure regulating part is connected to the pressure regulating port;

[0023] Wherein, when the box cover is arranged on the box body, the box cover and the box body are sealed and connected.

[0024] In a feasible implementation manner, the box body and the partition are both made of glass or polytetrafluoroethylene.

[0025] Compared with the prior art, the present disclosure at least includes the following beneficial effects: the gallium particle preparation device provided by the embodiment of the present disclosure includes a box body, a partition and a pressure regulating part, wherein the partition is arranged in the box body and divides the box body into a first chamber and a second chamber, the first chamber and the second chamber can be connected through the hole of the partition, the first chamber can be used to contain liquid gallium, the second chamber can be used to contain coolant, and the position height of the first chamber is higher than the position height of the second chamber, so that the liquid gallium in the first chamber can drip into the coolant in the second chamber through the hole on the partition under the action of gravity, and accordingly, the liquid gallium in the form of droplets can be The gallium particles are condensed into solid gallium particles under the cooling effect of the coolant, thereby simplifying the preparation process of the gallium particles and realizing the preparation of the gallium particles; the pressure regulating part is used to adjust the internal pressure of the box body so that the pressure in the first chamber is not lower than the pressure in the second chamber, so that the liquid gallium in the first chamber is more quickly dripped into the coolant under the action of gravity and the pressure difference between the first chamber and the second chamber, and it is convenient to change the flow rate of the liquid gallium in the channel by adjusting the pressure difference between the first chamber and the second chamber, thereby adjusting the dripping rate of the liquid gallium, realizing the preparation rate control of the gallium particles, which is conducive to further improving the preparation efficiency of the gallium particles and saving the production cost of the gallium particles. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Various other advantages and benefits will become apparent to those of ordinary skill in the art by reading the detailed description of the exemplary embodiments below. The accompanying drawings are only for the purpose of illustrating exemplary embodiments and are not to be considered as limiting the present disclosure. Also, the same reference symbols are used throughout the accompanying drawings to represent the same components. In the accompanying drawings:

[0027] Figure 1 A schematic structural diagram of a gallium particle preparation device according to an embodiment of the present disclosure.

[0028] in, Figure 1 The corresponding relationship between the reference numerals and the component names is as follows:

[0029] 100 box body; 110 box body; 120 box cover; 200 partition;

[0030] 101 first chamber; 102 second chamber; 103 liquid inlet; 104 liquid discharge port; 105 feed port; 106 pressure regulating port; 201 channel. DETAILED DESCRIPTION

[0031] The exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments set forth herein. On the contrary, these embodiments are provided to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0032] It should be noted that in the conventional technology, some gallium particle production activities adopt a mold method to prepare gallium particles. The aforementioned mold usually includes an upper mold and a lower mold. The lower side of the upper mold and the upper side of the lower mold are both provided with pits, and the pits of the upper mold and the lower mold correspond to each other. The pits of the upper mold and the pits of the lower mold are suitable for splicing into a roughly spherical mold cavity. In the process of preparing gallium particles, it is necessary to sequentially carry out the process steps of splicing the aforementioned mold cavity, injecting liquid gallium into the mold cavity, condensing the liquid gallium in the mold cavity, separating the upper and lower molds to take out the particles, etc., so that the process of the preparation method in the aforementioned conventional technology is relatively complicated, and the single gallium particle output is seriously limited by the number of mold cavities of the mold. In addition, when preparing and taking out gallium particles, it is necessary to frequently splice and separate the upper and lower molds, which makes it difficult to improve the continuity of gallium particle production, and leads to low production efficiency of gallium particles, thereby increasing the production cost of gallium particles. Moreover, the prepared gallium particles are often prone to surface defects, such as the formation of flanges at the joints corresponding to the upper and lower molds, which limits the molding quality of the gallium particles.

[0033] To solve at least one of the technical problems existing in the prior art or related technology, such as Figure 1As shown, according to an embodiment of the present disclosure, a gallium particle preparation device is proposed, including: a box body 100; a partition 200, which is arranged in the box body 100 to separate the interior of the box body 100 into a first chamber 101 and a second chamber 102, and the partition 200 is provided with a channel 201, and the channel 201 is connected between the first chamber 101 and the second chamber 102, and the position height of the first chamber 101 is higher than the position height of the second chamber 102; a pressure regulating part, which is used to adjust the internal pressure of the box body 100 so that the pressure in the first chamber 101 is higher than or equal to the pressure in the second chamber 102; wherein the first chamber 101 is used to contain liquid gallium, and the second chamber 102 is used to contain coolant.

[0034] The gallium particle preparation device provided by the embodiment of the present disclosure includes a box body 100, a partition 200 and a pressure regulating part, wherein the partition 200 is arranged in the box body 100 and divides the box body 100 into a first chamber 101 and a second chamber 102, and the first chamber 101 and the second chamber 102 can be connected through the channel 201 of the partition 200, the first chamber 101 can be used to contain liquid gallium, and the second chamber 102 can be used to contain coolant, and the position height of the first chamber 101 is higher than the position height of the second chamber 102, so that the liquid gallium in the first chamber 101 can drip into the coolant in the second chamber 102 through the channel 201 on the partition 200 under the action of gravity, and accordingly, the liquid in the form of droplets The liquid gallium can be condensed into solid gallium particles under the cooling effect of the coolant, thereby simplifying the preparation process of the gallium particles and realizing the preparation of the gallium particles; the pressure regulating part is used to adjust the internal pressure of the box body 100 so that the pressure in the first chamber 101 is not lower than the pressure in the second chamber 102, so that the liquid gallium in the first chamber 101 is more quickly dripped into the coolant under the action of gravity and the pressure difference between the first chamber 101 and the second chamber 102, and it is convenient to change the flow rate of the liquid gallium in the channel 201 by adjusting the pressure difference between the first chamber 101 and the second chamber 102, thereby adjusting the dripping rate of the liquid gallium and realizing the preparation rate control of the gallium particles, which is conducive to further improving the preparation efficiency of the gallium particles and saving the production cost of the gallium particles.

[0035] It can be understood that, compared with the aforementioned conventional technology, the gallium particle preparation device provided in the embodiment of the present disclosure can utilize the surface tension of liquid gallium to allow the liquid gallium to naturally form a state with a higher sphericity during the dripping process, and utilize the coolant to condense the liquid gallium when the liquid gallium drips into the coolant, which can reduce the use of molds in the granulation process, avoid frequent mold opening and closing operations, and do not need to independently perform the process steps of injecting liquid gallium into the mold cavity and condensing the liquid gallium in the mold cavity in sequence. It is also convenient to adjust the preparation rate of gallium particles by adjusting the pressure difference between the first chamber 101 and the second chamber 102, thereby improving the preparation efficiency of gallium particles; and the coolant contained in the second chamber 102 can reduce the impact of the liquid gallium during the dripping process while condensing the liquid gallium, and the coolant can apply a relatively uniform pressure to the surface of the gallium particles therein, which is conducive to ensuring the morphology of the prepared gallium particles, improving the surface smoothness of the gallium particles, and thereby improving the molding quality of the gallium particles.

[0036] It is understandable that the aforementioned coolant may be, but is not limited to, ultrapure water or ethylene glycol, which is helpful in ensuring the purity of the gallium particles.

[0037] It can be understood that, in actual applications, the height direction of the aforementioned box body 100 can be roughly the same as the direction of gravity, and the aforementioned first chamber 101 and the aforementioned second chamber 102 can be arranged along the direction of gravity. Accordingly, the position height of the aforementioned first chamber 101 and the position height of the aforementioned second chamber 102 refer to the position height in the direction of gravity, that is, along the direction of gravity, the second chamber 102 is located below the first chamber 101.

[0038] It is understandable that the box body 100 may be provided with a discharge port, which is connected to the second chamber 102 , and the gallium particles in the second chamber 102 may be discharged through the discharge port.

[0039] It can be understood that the aforementioned pressure regulating unit may include a pressure pump, and the pressure pump may be connected to the first chamber 101 and / or the second chamber 102 .

[0040] In some examples, the gallium particle preparation apparatus further includes: a temperature regulating unit for regulating the temperature in the first chamber 101 and the second chamber 102 so that the temperature in the first chamber 101 is higher than the melting point of gallium, and the temperature in the second chamber 102 is lower than the melting point of gallium.

[0041] In this technical solution, the gallium particle preparation device may further include the aforementioned temperature regulating unit; based on the aforementioned setting, the gallium particle preparation device can maintain a stable temperature in the first chamber 101 and the second chamber 102 during use, thereby preventing liquid gallium from condensing in the first chamber 101 and facilitating condensation of liquid gallium while dripping into the second chamber 102, which is beneficial to further improve the preparation efficiency of gallium particles.

[0042] In some examples, the temperature in the first chamber 101 is greater than or equal to 30° C.; and / or the temperature in the second chamber 102 is less than or equal to 10° C.

[0043] In this technical solution, the temperature in the first chamber 101 can be set to be greater than or equal to 30° C., so that the temperature in the first chamber 101 can be higher than the melting point of gallium, which is beneficial to prevent liquid gallium from condensing in the first chamber 101, and provide a guarantee for the liquid gallium to be able to drip continuously and stably into the second chamber 102, further improving the preparation efficiency of gallium particles.

[0044] In this technical solution, the temperature in the second chamber 102 can be set to be less than or equal to 10° C., so that the temperature in the second chamber 102 can be lower than the melting point of gallium, which is conducive to condensation of liquid gallium while dripping into the second chamber 102, further improving the preparation efficiency of gallium particles.

[0045] It can be understood that in this technical solution, the temperature in the first chamber 101 can be set to be greater than or equal to 30°C, while the temperature in the second chamber 102 can be set to be less than or equal to 10°C, thereby preventing liquid gallium from condensing in the first chamber 101 and facilitating the condensation of liquid gallium while dripping into the second chamber 102, which is beneficial to further improve the preparation efficiency of gallium particles.

[0046] Exemplarily, the temperature in the first chamber 101 is greater than or equal to 35° C. and less than or equal to 45° C., so that on the one hand, the temperature in the first chamber 101 can be higher than the melting point of gallium, which is beneficial to prevent liquid gallium from condensing in the first chamber 101 and provide a guarantee for the liquid gallium to be able to drip continuously and stably into the second chamber 102; on the other hand, it can also reduce the energy consumption of maintaining the internal temperature of the first chamber 101, further saving the production cost of gallium particles.

[0047] Exemplarily, the temperature in the second chamber 102 is greater than or equal to -30°C and less than or equal to 10°C. Thus, on the one hand, the temperature in the second chamber 102 can be lower than the melting point of gallium, which is beneficial for condensation of liquid gallium while dripping into the second chamber 102, thereby further improving the preparation efficiency of gallium particles; on the other hand, it can also reduce the energy consumption for maintaining the internal temperature of the second chamber 102, thereby further saving the production cost of gallium particles.

[0048] In some examples, the diameter of the channel 201 is greater than or equal to 1 mm and less than or equal to 5 mm; and / or the length of the channel 201 is greater than or equal to 1 cm and less than or equal to 3 cm.

[0049] In this technical solution, the diameter of the pore 201 can be set to be greater than or equal to 1 mm and less than or equal to 5 mm. Therefore, on the one hand, the diameter of the prepared gallium particles can be constrained and controlled by the diameter of the pore 201, so as to prepare gallium particles within a certain diameter range; on the other hand, the diameter of the pore 201 can be avoided to be too small, so as to reduce the flow resistance of the pore 201 to the liquid gallium, which is conducive to ensuring the permeability of the pore 201; on the other hand, the diameter of the pore 201 can be avoided to be too large, which is convenient for constraining the flow rate of liquid gallium in the pore 201, which is conducive to preventing the liquid gallium from flowing out in the form of a continuous liquid flow, and further conducive to ensuring the granulation quality.

[0050] In this technical solution, the length of the channel 201 can be set to be greater than or equal to 1 cm and less than or equal to 3 cm. Therefore, on the one hand, the length of the channel 201 can be avoided to be too long, which is beneficial to reduce the probability of liquid gallium condensing in the channel 201, prevent the channel 201 from being blocked, and provide reliable guarantee for the smooth progress of the gallium particle preparation process; on the other hand, the length of the channel 201 can be avoided to be too short, which is beneficial to ensure the limiting effect of the channel 201 on the liquid flow diameter of the liquid gallium therein, thereby providing reliable guarantee for the size accuracy of the prepared gallium particles.

[0051] It is understandable that in this technical solution, the diameter of the channel 201 can be set to be greater than or equal to 1 mm and less than or equal to 5 mm, and the length of the channel 201 can be set to be greater than or equal to 1 cm and less than or equal to 3 cm.

[0052] It is understandable that the diameter of the prepared gallium particles is positively correlated with the diameter of the pore 201 . The diameter of the pore 201 can be specifically selected in accordance with actual needs and is not further limited here.

[0053] In some examples, the height of the second chamber 102 is greater than or equal to 1 m and less than or equal to 2 m.

[0054] In this technical solution, the height of the second chamber 102 can be set to be greater than or equal to 1m and less than or equal to 2m. On the one hand, the height of the second chamber 102 can be avoided to be too small, so that the dripping distance of the liquid gallium in the second chamber 102 can be ensured to be longer, which is beneficial to more complete condensation of the liquid gallium in the second chamber, and helps to increase the volume of the second chamber 102, so that it is convenient for the second chamber 102 to accommodate more coolant and gallium particles, which is beneficial to further improve the preparation efficiency of gallium particles; on the other hand, it can also avoid the height of the second chamber 102 being too large, which is beneficial to ensure the structural compactness of the gallium particle preparation device.

[0055] like Figure 1As shown, in some examples, the box body 100 is formed with a liquid inlet 103 and a liquid outlet 104 , both of which are connected to the second chamber 102 , and the position height of the liquid outlet 104 is lower than the position height of the liquid inlet 103 .

[0056] In this technical solution, the box body 100 may be formed with the aforementioned liquid inlet 103 and the aforementioned liquid drain port 104; based on the aforementioned arrangement, the second chamber 102 may exchange coolant with the outside of the device through the liquid inlet 103 and the liquid drain port 104, thereby improving the convenience of inputting and discharging coolant into the second chamber 102, and facilitating the replenishment of coolant with lower temperature in the second chamber 102 and the discharge of coolant with higher temperature, thereby providing a guarantee for the condensation efficiency of liquid gallium.

[0057] It can be understood that in the height direction of the second chamber 102, the coolant with a higher temperature is easy to be distributed in the area with a higher height, and correspondingly, the coolant with a lower temperature is easy to be distributed in the area with a higher temperature. Therefore, by setting the height of the drain port 104 to be lower than the height of the liquid inlet 103, the cold zone liquid with a higher temperature can be discharged from the second chamber 102 more efficiently and quickly, which is beneficial to maintain the temperature of the coolant in the second chamber 102 at a lower level, thereby providing a guarantee for the condensation efficiency of the liquid gallium.

[0058] In some examples, a gap is formed between the drain port 104 and the partition 200 along the height direction of the second chamber 102 .

[0059] In this technical solution, by providing a gap between the drain port 104 and the partition 200 along the height direction of the second chamber 102, the maximum liquid level height of the coolant in the second chamber 102 can be limited, so that a certain distance is formed between the liquid surface of the coolant in the second chamber 102 and the partition 200. Therefore, during use, after the liquid gallium is dripped into the second chamber 102, it can first fall freely for a certain length, and then drip into the coolant, so that the liquid gallium can form a morphology with higher sphericity under the action of gravity and tension, which is beneficial to ensuring the molding quality of the gallium particles. At the same time, it can reduce the probability of the gallium particles in the coolant flowing out of the liquid inlet 103 following the coolant flow, thereby reducing material losses in the production process.

[0060] Exemplarily, along the height direction of the second chamber 102 , the spacing distance between the drain port 104 and the partition portion 200 is greater than or equal to 10 cm and less than or equal to 20 cm, which is beneficial to ensure the compactness of the structure of the box body 100 .

[0061] It can be understood that, when the gallium particle preparation device includes the aforementioned temperature regulating portion, the temperature in the second chamber 102 is lower than the melting point of gallium, so that if a gap is formed between the drain port 104 and the partition 200 along the height direction of the second chamber 102, the liquid gallium can form a certain degree of surface condensation during the free fall process, which is beneficial to the influence of the pressure or impact force of the cooling liquid on the surface morphology of the gallium particles, and further improves the molding quality of the gallium particles.

[0062] In some examples, the gallium particle preparation device further includes: a pumping unit, wherein a liquid inlet end of the pumping unit is connected to the liquid discharge port 104 , and a liquid discharge end of the pumping unit is connected to the liquid inlet 103 .

[0063] In this technical solution, the gallium particle preparation device may further include the aforementioned pumping unit; based on the aforementioned arrangement, it is possible to facilitate the circulation of the coolant into the second chamber 102, thereby reducing the use loss of the coolant and further reducing the preparation cost of the gallium particles.

[0064] like Figure 1 As shown, in some examples, the box body 100 includes: a box body 110; a box cover 120, which is detachably arranged on the box body 110, and the box cover 120 is formed with a feed port 105 and a pressure regulating port 106, both of which are connected to the first chamber 101, and the output end of the pressure regulating part is connected to the pressure regulating port 106; wherein, when the box cover 120 is arranged on the box body 110, the box cover 120 and the box body 110 are sealed and connected.

[0065] In this technical solution, the box body 100 may include the box body 110 and the box cover 120 mentioned above. Based on the above arrangement, on the one hand, it is convenient to clean the inside of the box body 100 by removing the box cover 120, which is beneficial to improving the cleanliness of the internal space of the box body 100 and the partition 200, and is beneficial to ensuring the purity of the gallium particles. On the other hand, it is also convenient to feed liquid gallium into the first chamber 101 through the feed port 105, thereby ensuring the continuity of the production process, and facilitating the pressure regulating part to pressurize the first chamber 101 to promote the efficiency of liquid gallium flowing into the channel 201. On the other hand, when the box cover 120 is arranged on the box body 110, the sealing of the space inside the box can be improved, thereby facilitating the pressure regulating part to adjust the pressure inside the box body 100.

[0066] It can be understood that the box body 110 has a box opening, and the aforementioned partition 200 is arranged in the box body 110 to separate the interior of the box body 110 into the aforementioned first chamber 101 and the second chamber 102; the aforementioned box opening is located at the top of the box body 110, the aforementioned first chamber 101 is located between the partition 200 and the box opening, and the aforementioned second chamber 102 is located between the partition 200 and the bottom of the box body 100; the aforementioned box cover 120 is used to open or cover the box opening.

[0067] In some examples, both the box portion and the partition portion are made of glass or polytetrafluoroethylene.

[0068] In this technical solution, the box body and the partition can be made of glass or polytetrafluoroethylene, thereby improving the surface quality of the box body and the partition, improving the convenience of cleaning the box body and the partition, and reducing the probability of dirt accumulation in the box body and the partition, which is beneficial to improving the cleanliness of the box body and the partition, and providing a guarantee for the preparation purity of gallium particles.

[0069] In the present disclosure, the terms "first", "second", and "third" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance; the term "plurality" refers to two or more, unless otherwise expressly defined. The terms "installed", "connected", "connected", "fixed", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral connection; "connected" can be a direct connection or an indirect connection through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the present disclosure can be understood according to the specific circumstances.

[0070] In the description of the present disclosure, it is necessary to understand that the directions or positional relationships indicated by the terms "up", "down", "left", "right", "front", "back", etc. are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, rather than indicating or implying that the device or unit referred to must have a specific direction, be constructed and operated in a specific orientation, and therefore, should not be understood as a limitation on the present disclosure.

[0071] In the description of this specification, the description of the terms "one embodiment", "some embodiments", "specific embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0072] The above are only preferred embodiments of the present disclosure and are not intended to limit the present disclosure. For those skilled in the art, the present disclosure may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present disclosure shall be included in the protection scope of the present disclosure.

Claims

1. A gallium particle preparation device, characterized in that: include: Box body; A partition is disposed in the box body to separate the interior of the box body into a first chamber and a second chamber, the partition is provided with a hole, the hole communicates between the first chamber and the second chamber, and the first chamber is located at a higher height than the second chamber; a pressure regulating unit, used for regulating the internal pressure of the box body so that the pressure in the first chamber is higher than or equal to the pressure in the second chamber; The first chamber is used to contain liquid gallium, and the second chamber is used to contain cooling liquid.

2. The gallium particle preparation device according to claim 1, characterized in that: Also includes: The temperature regulating unit is used to regulate the temperature in the first chamber and the second chamber so that the temperature in the first chamber is higher than the melting point of gallium and the temperature in the second chamber is lower than the melting point of gallium.

3. The gallium particle preparation device according to claim 1, characterized in that: The temperature in the first chamber is greater than or equal to 30° C.; and / or The temperature in the second chamber is less than or equal to 10°C.

4. The gallium particle preparation device according to claim 1, characterized in that: The diameter of the pore is greater than or equal to 1 mm and less than or equal to 5 mm; and / or The length of the channel is greater than or equal to 1 cm and less than or equal to 3 cm.

5. The gallium particle preparation device according to claim 1, characterized in that: The height of the second chamber is greater than or equal to 1 m and less than or equal to 2 m.

6. The gallium particle preparation device according to any one of claims 1 to 5, characterized in that: The box body is formed with a liquid inlet and a liquid discharge port, both of which are connected to the second chamber, and the position height of the liquid discharge port is lower than the position height of the liquid inlet.

7. The gallium particle preparation device according to claim 6, characterized in that: A gap is formed between the drain port and the partition portion along a height direction of the second chamber.

8. The gallium particle preparation device according to claim 6, characterized in that: Also includes: A pumping part, wherein the liquid inlet end of the pumping part is connected to the liquid discharge port, and the liquid discharge end of the pumping part is connected to the liquid inlet.

9. The gallium particle preparation device according to any one of claims 1 to 5, characterized in that: The box body comprises: box body; A box cover is detachably arranged on the box body, the box cover is formed with a feed inlet and a pressure regulating port, the feed inlet and the pressure regulating port are both connected to the first chamber, and the output end of the pressure regulating part is connected to the pressure regulating port; Wherein, when the box cover is arranged on the box body, the box cover and the box body are sealed and connected.

10. The gallium particle preparation device according to any one of claims 1 to 5, characterized in that: The box body and the partition are both made of glass or polytetrafluoroethylene.

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