Swing type drying tank suitable for wafers of multiple sizes

Abstract

The invention relates to a swing type drying tank suitable for wafers of multiple sizes, and belongs to the technical field of wafer production equipment. The swing type drying tank suitable for the wafers of multiple sizes is composed of a tank body, a swing mechanism and a wafer basket placing seat arranged on the swing mechanism. The first supporting block, the second supporting block and the third supporting block on the wafer basket placing seat and the two side plates are used for supporting the first wafer basket and the second wafer basket which are different in size through one supporting frame, so that the wafer cleaning production equipment can directly adapt to wafers different in size, and the adaptability of the equipment is improved; and meanwhile, the wafer basket is stably and reliably supported.

Description

Technical Field

[0001] The present application belongs to the technical field of wafer production equipment, and in particular, relates to a swing drying tank suitable for wafers of multiple sizes. Background Art

[0002] For semiconductor wafer cleaning, the wafer needs alkaline cleaning solution cleaning, pure water cleaning, hydrofluoric acid cleaning, ozone water cleaning, drying and other processes. Wafer drying is generally the last step of wafer cleaning, which can remove the residual cleaning solution on the surface of the wafer, prevent the wafer from oxidizing, and control the surface moisture and surface cleanliness. Whether it is drying or cleaning, a support frame is needed to support the wafer basket. Chinese patent publication CN115218627A discloses a wafer drying equipment swing mechanism, which is arranged in a drying tank, drives the wafer to swing and relies on dry gas to dry the wafer, but the existing wafer drying equipment swing mechanism can only correspond to support a fixed size wafer basket. At present, wafers have a variety of sizes such as 6 inches, 8 inches and even 12 inches. When the equipment needs to process wafers of different sizes, the existing technology needs to replace the support frame to adapt to wafers of different sizes. In other words, for the installed wafer drying equipment, it can only correspond to one size of wafer, which limits the versatility of the equipment. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide a swing drying tank suitable for wafers of multiple sizes in order to solve the deficiencies in the prior art.

[0004] The technical solution adopted by the present invention to solve its technical problem is: A swing drying tank suitable for wafers of multiple sizes, comprising: Tank body; The swing mechanism comprises: a horizontal sliding module arranged outside the tank body, a slider arranged on the horizontal sliding module, and an arched sliding arm installed on the slider, wherein the arched sliding arm extends into the tank body, and a wafer basket placement seat is installed on the portion of the arched sliding arm located inside the tank body; when the horizontal sliding module is working, it can drive the slider, the arched sliding arm and the wafer basket placement seat to swing; The wafer basket placement seat includes: Base; There are two side panels, located at both ends of the base; The first support block, the second support block and the third support block are all arranged on the base and located between the two side plates, and the third support block is located between the first support block and the second support block; The first support block is provided with a first step tread and a second step tread, the second support block is provided with a third step tread, the third support block is provided with a fourth step tread, the third step tread is provided at a lower height than the second step tread, the first step tread and the third step tread are at the same height, and the second step tread and the fourth step tread are at the same height; The first step tread and the third step tread are used to support the bottom of the first wafer basket, and the side surface of the second support block and one of the side plates limit the side surface of the first wafer basket; The second step tread and the fourth step tread are used to support the bottom of the second wafer basket and the two side plates limit the side surfaces of the second wafer basket.

[0005] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the orientation of the first step riser corresponding to the second step tread is opposite to the orientation of the second step riser corresponding to the third step tread.

[0006] Preferably, in the swing drying tank applicable to wafers of various sizes of the present invention, the first supporting block has a U-shaped groove, and the bottom of the U-shaped groove is the first step surface.

[0007] Preferably, in the swing drying tank suitable for wafers of multiple sizes of the present invention, the middle of the side plate is hollowed out, a mounting block is installed between the two side plates, the mounting block is fixed to the inner wall of the hollowed-out portion of the side plate, and top plates are provided on both sides of the mounting block.

[0008] Preferably, in the swing drying tank applicable to wafers of various sizes of the present invention, the top surfaces of the first step tread, the second step tread, the third step tread and the fourth step tread are inclined surfaces.

[0009] Preferably, in the swing drying tank applicable to wafers of various sizes of the present invention, the mounting block has a hollow portion in the middle.

[0010] Preferably, in the swing drying tank applicable to wafers of various sizes of the present invention, the third supporting block is located at the midpoint of the two side plates.

[0011] Preferably, the swing drying tank suitable for wafers of multiple sizes of the present invention has three mounting grooves formed on the base, in which the first support block, the second support block and the third support block are installed, and the first support block, the second support block and the third support block can be positioned through the mounting grooves.

[0012] Preferably, in the swing drying tank applicable to wafers of multiple sizes of the present invention, the first wafer basket is a 6-inch wafer basket for accommodating 6-inch wafers, and the second wafer basket is an 8-inch wafer basket for accommodating 8-inch wafers.

[0013] The beneficial effects of the present invention are: The swing drying tank applicable to wafers of multiple sizes of the present application is composed of a tank body, a swing mechanism and a wafer basket placement seat arranged on the swing mechanism, wherein the swing mechanism can drive the wafer basket placement seat and the wafer basket arranged on the wafer basket placement seat to swing, so that the combination of wafer swing and gas flow in the tank body can achieve efficient and uniform drying of the wafers. The three support blocks of the first support block, the second support block and the third support block on the wafer basket placement seat and two side plates are used to realize the support of the first wafer basket and the second wafer basket of two different sizes by a support frame, so that the swing drying tank can directly adapt to wafers of different sizes, improve the adaptability of the equipment, and at the same time, the support for the wafer basket is stable and reliable. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The technical solution of the present application is further described below in conjunction with the accompanying drawings and embodiments.

[0015] Figure 1 It is a schematic diagram of the structure of a swing drying tank applicable to wafers of multiple sizes according to an embodiment of the present application; Figure 2 is a cross-sectional view of a swing drying tank applicable to wafers of multiple sizes according to an embodiment of the present application; Figure 3 is a schematic structural diagram of the swing mechanism of an embodiment of the present application; Figure 4 is a schematic structural diagram of a multi-size wafer basket support frame supporting a first wafer basket according to an embodiment of the present application; Figure 5 It is a schematic structural diagram of a multi-size wafer basket support frame supporting a second wafer basket according to an embodiment of the present application; Figure 6 It is a schematic diagram of the structure of a multi-size wafer basket support frame applicable to an embodiment of the present application; Figure 7 is a side view of a multi-size wafer basket support frame supporting a first wafer basket according to an embodiment of the present application; Figure 8 is a side view of a multi-size wafer basket support frame supporting a second wafer basket according to an embodiment of the present application; The reference numerals in the figure are: 1 Wafer basket holder; 2 tank body; 3 Swing mechanism; 11 base; 12 side panels; 13 first support block; 14 second supporting block; 15 third support block; 16 top plate; 17 Mounting Block; 31 horizontal sliding module; 32 Sliders; 33 Arched sliding arm; 34 Rotating mounting base; 91 1st wafer basket; 92 second wafer basket; 111 mounting slot; 131 First step tread; 132 Second stair tread; 133 First step riser; 141 Third step tread; 142 Second step riser; 151 Fourth step tread; 321 pulley; 331 Slide slot. DETAILED DESCRIPTION

[0016] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application may be combined with each other.

[0017] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the scope of protection of the present application. In addition, the terms "first", "second", etc. are used only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the invention, unless otherwise specified, "multiple" means two or more.

[0018] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood by specific circumstances.

[0019] The technical solution of the present application will be described in detail below with reference to the accompanying drawings and in combination with embodiments.

[0020] Example This embodiment provides a swing drying tank suitable for wafers of various sizes, such as Figure 1 and 2 As shown, including: Tank 2; Swing mechanism 3, such as Figure 3 As shown, it includes: a horizontal sliding module 31 arranged outside the trough body 2, a slider 32 arranged on the horizontal sliding module 31, and an arched sliding arm 33 installed on the slider 32, the arched sliding arm 33 extends into the trough body 2, and a wafer basket placement seat 1 is installed on the part of the arched sliding arm 33 located in the trough body 2; the horizontal sliding module 31 is composed of a motor and a slide rail, and can drive the slider 32, the arched sliding arm 33 and the wafer basket placement seat 1 to swing when working; the specific structure of the arched sliding arm 33 is to be able to extend from the outside of the trough body 2 to the inside of the trough body 2, so the arched sliding arm 33 passes over the top of the trough body 2 and extends into the trough body 2 to form a first arm located outside the trough body 2 and a second arm located inside the trough body 2, and the bottom of the second arm is installed with a wafer basket placement seat 1. The bottom end of the first arm is rotatably connected to a rotatable mounting seat 34 (bearing seat). The rotatable mounting seat 34 is arranged outside the slot body 2 . A sliding groove 331 is provided in the middle of the first arm. The slider 32 is provided with a pulley 321 located in the sliding groove 331 .

[0021] like Figure 4-8 As shown, the wafer basket placement seat 1 includes: Base 11; There are two side panels 12, which are respectively located at two ends of the base 11; The first support block 13, the second support block 14 and the third support block 15 are all arranged on the base 11 and located between the two side plates 12, and the third support block 15 is located between the first support block 13 and the second support block 14; The first support block 13 is provided with a first step tread 131 and a second step tread 132, the second support block 14 is provided with a third step tread 141, the third support block 15 is provided with a fourth step tread 151, the third step tread 141 is provided at a lower height than the second step tread 132, the first step tread 131 and the third step tread 141 are at the same height, and the second step tread 132 and the fourth step tread 151 are at the same height; The first step tread 131 and the third step tread 141 are used to support the bottom of the first wafer basket, and the side surface of the second support block 14 and one of the side plates 12 limit the side surface of the first wafer basket; The second step tread 132 and the fourth step tread 151 are used to support the bottom of the second wafer basket, and the two side plates 12 limit the side surfaces of the second wafer basket.

[0022] The swing drying tank of the present application is suitable for wafers of multiple sizes, wherein the wafer placement seat 1 utilizes three support blocks, namely the first support block 13, the second support block 14 and the third support block 15, and two side plates 12 to realize a support frame supporting two first wafer baskets and second wafer baskets of different sizes, so that the swing drying tank can directly adapt to wafers of different sizes, improve the adaptability of the equipment, and at the same time, the support for the wafer basket is stable and reliable.

[0023] Furthermore, the orientation of the first step riser surface 133 corresponding to the second step tread 132 is opposite to the orientation of the second step riser surface 142 corresponding to the third step tread 141 (the first step riser surface 133 faces inward and the second step riser surface 142 faces outward), and the wafer basket is positioned laterally by the two riser surfaces.

[0024] Furthermore, the first supporting block 13 has a U-shaped groove, and the bottom of the U-shaped groove is the first step 131. The U-shaped groove is also used to clamp the bottom of the first wafer basket.

[0025] Furthermore, the middle of the side panel 12 is hollowed out, and a mounting block 17 is installed between the two side panels 12. The mounting block 17 is fixed to the inner wall of the hollowed-out portion of the side panel 12. Top plates 16 are provided on both sides of the mounting block 17. When the wafer basket is placed on the wafer basket placement seat 1, the top plate 16 can lift the wafers in the wafer basket to a certain height.

[0026] Furthermore, the top surfaces of the first step 131 and the second step 132 , the third step 141 and the fourth step 151 are inclined surfaces, forming pointed ends to reduce the contact area with the wafer basket.

[0027] Furthermore, the installation block 17 has a hollow portion in the middle to reduce material usage, reduce weight and make the airflow path smoother.

[0028] Furthermore, the third support block 15 is located at the midpoint of the two side panels 12 .

[0029] Furthermore, three mounting grooves 111 are formed on the base 11, and the first support block 13, the second support block 14 and the third support block 15 are mounted in the mounting grooves 111. The first support block 13, the second support block 14 and the third support block 15 can be positioned through the mounting grooves 111. The first support block 13, the second support block 14 and the third support block 15 are mounted on the base 11 by screws, and the first support block 13, the second support block 14 and the third support block 15 are provided with long holes to facilitate position adjustment.

[0030] The applicable multi-size wafer basket support frame of the present application can be used for accommodating a 6-inch wafer basket (first wafer basket 91 ) for accommodating 6-inch wafers or an 8-inch wafer basket (second wafer basket 92 ) for accommodating 8-inch wafers.

[0031] It should be pointed out that a cover body may also be provided on the tank body 2 .

[0032] Based on the above ideal embodiments of this application, the relevant staff can make various changes and modifications without departing from the technical concept of this application through the above description. The technical scope of this application is not limited to the content in the specification, and its technical scope must be determined according to the scope of the claims.

Claims

1. A swing drying tank suitable for wafers of various sizes, characterized in that: include: Tank body (2); The swing mechanism (3) comprises: a horizontal sliding module (31) arranged outside the trough body (2), a slider (32) arranged on the horizontal sliding module (31), and an arched sliding arm (33) mounted on the slider (32), wherein the arched sliding arm (33) extends into the trough body (2), and a wafer basket placement seat (1) is mounted on the portion of the arched sliding arm (33) located inside the trough body (2); when the horizontal sliding module (31) is in operation, it can drive the slider (32), the arched sliding arm (33) and the wafer basket placement seat (1) to swing; The wafer basket placement seat (1) comprises: Base (11); Two side panels (12) are respectively located at two ends of the base (11); The first support block (13), the second support block (14) and the third support block (15) are all arranged on the base (11) and located between the two side plates (12), and the third support block (15) is located between the first support block (13) and the second support block (14); The first support block (13) is provided with a first step tread (131) and a second step tread (132), the second support block (14) is provided with a third step tread (141), and the third support block (15) is provided with a fourth step tread (151), the third step tread (141) is provided at a lower height than the second step tread (132), the first step tread (131) and the third step tread (141) are of the same height, and the second step tread (132) and the fourth step tread (151) are of the same height; The first step tread (131) and the third step tread (141) are used to support the bottom of the first wafer basket, and the side surface of the second support block (14) and one of the side plates (12) limit the side surface of the first wafer basket; The second step tread (132) and the fourth step tread (151) are used to support the bottom of the second wafer basket, and the two side plates (12) limit the side surfaces of the second wafer basket.

2. The swing drying tank applicable to wafers of multiple sizes according to claim 1, characterized in that: The orientation of the first step riser (133) corresponding to the second step tread (132) is opposite to the orientation of the second step riser (142) corresponding to the third step tread (141).

3. The swing drying tank applicable to wafers of multiple sizes according to claim 1, characterized in that: The first support block (13) has a U-shaped groove, and the bottom of the U-shaped groove is the first step surface (131).

4. The swing drying tank applicable to wafers of multiple sizes according to claim 1, characterized in that: The middle of the side plate (12) is hollowed out, a mounting block (17) is installed between the two side plates (12), the mounting block (17) is fixed to the inner wall of the hollowed-out portion of the side plate (12), and top plates (16) are arranged on both sides of the mounting block (17).

5. The swing drying tank applicable to wafers of multiple sizes according to claim 1, characterized in that: The top surfaces of the first step tread (131), the second step tread (132), the third step tread (141) and the fourth step tread (151) are inclined surfaces.

6. The swing drying tank applicable to wafers of multiple sizes according to claim 4, characterized in that: The installation block (17) has a hollow portion in the middle.

7. The swing drying tank applicable to wafers of multiple sizes according to claim 4, characterized in that: The third support block (15) is located at the midpoint of the two side plates (12).

8. The swing drying tank applicable to wafers of various sizes according to claim 1, characterized in that: The base (11) is formed with three mounting grooves (111), and a first support block (13), a second support block (14) and a third support block (15) are mounted in the mounting grooves (111). The first support block (13), the second support block (14) and the third support block (15) can be positioned by the mounting grooves (111).

9. The swing drying tank applicable to wafers of various sizes according to claim 1, characterized in that: The first wafer basket is a 6-inch wafer basket for accommodating 6-inch wafers, and the second wafer basket is an 8-inch wafer basket for accommodating 8-inch wafers.

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