Water quality treatment equipment for semiconductor water consumption point

Abstract

The invention discloses water quality treatment equipment for a semiconductor water point, which comprises a water inlet valve, a booster pump, an ultraviolet sterilizer, a precision filter, a polishing mixed bed device, a terminal filter, an outlet water resistance meter and a water supply valve which are connected in sequence, the pipeline between the outlet water resistance meter and the water supply valve is also connected with a circulating pipeline flowing to the pipeline between the water inlet valve and the booster pump, and the circulating pipeline is provided with a circulating valve and a one-way valve. According to the invention, water quality treatment can be carried out at a semiconductor water consumption point, so that the pollution risk of water for semiconductor manufacturing is reduced, and the water quality of the water for semiconductor manufacturing is ensured.

Description

Technical Field

[0001] The invention belongs to the technical field of water treatment, and in particular relates to water quality treatment equipment for semiconductor water use points. Background Art

[0002] Pure water is widely used in cleaning equipment in the semiconductor industry, and its purity and stability directly affect the precise manufacturing of semiconductors and the quality of finished products. However, the distance between the pure water production end and the water consumption end is uncontrollable, and there is uncertainty between the water production time and the water use time. There are many factors that affect water quality in between.

[0003] Semiconductor manufacturing requires high levels of pure water. According to national standards for water used in electronics, its ion content is very low. Ultrapure water may be at risk of re-contamination after preparation. Specifically, during transportation, ultrapure water pre-treated at the front end is prone to the introduction of suspended impurities, bacteria and organic carbon will grow in pipes, water resistance will drop, and water pressure will drop. Summary of the invention

[0004] The technical problem to be solved by the present invention is to provide a water quality treatment device for semiconductor water use points to effectively reduce the pollution risk of semiconductor manufacturing water and overcome the shortcomings of the prior art.

[0005] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0006] A water quality treatment device for a semiconductor water point, characterized in that it includes an inlet valve, a booster pump, an ultraviolet sterilizer, a precision filter, a polishing mixed bed device, a terminal filter, an outlet water resistance meter and a water supply valve connected in sequence, and a circulation pipeline flowing to the pipeline between the water inlet valve and the booster pump is also connected to the pipeline between the outlet water resistance meter and the water supply valve, and a circulation valve and a one-way valve are arranged on the circulation pipeline.

[0007] With the above technical solution, the ultrapure water sent from the front-end pretreatment enters through the water inlet valve, is first pressurized by the booster pump, the ultraviolet sterilizer removes bacteria and organic carbon in the water, the precision filter filters out suspended particle impurities in the pipeline, the polishing mixed bed device increases the resistivity of the pure water to the set value, and the terminal filter filters out fine impurities in the water to meet the water use requirements. If the water used does not meet the resistance value requirements as monitored by the outlet water resistance meter, the produced water is re-delivered to the booster pump through the circulation pipeline for further circulation treatment, thereby ensuring the final water quality.

[0008] From the above introduction, it can be seen that the present invention can achieve water quality treatment at the semiconductor water use point to reduce the pollution risk of semiconductor manufacturing water and ensure the water quality of semiconductor manufacturing water. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] The present invention is described in detail below in conjunction with the accompanying drawings:

[0010] Figure 1 It is the equipment piping diagram of the present invention. DETAILED DESCRIPTION

[0011] like Figure 1 As shown, the water quality treatment equipment for the semiconductor water use point of the present invention is connected with a water inlet valve 11, an inlet pressure transmitter 12, an outlet water resistance meter 13, a booster pump 14, an ultraviolet sterilizer 15, a precision filter 16, a polishing mixed bed device 30, a terminal filter 17, an outlet water resistance meter 18, an outlet water pressure transmitter 19 and a water supply valve 21 in sequence through pipelines from the water inlet joint 10 to the water supply joint 20.

[0012] In addition, the pipeline between the outlet water pressure transmitter 19 and the water supply valve 21 is also connected to a circulation pipeline 40 flowing to the pipeline between the outlet water resistance value meter 13 and the booster pump 14. The circulation pipeline 40 is provided with a circulation valve 41 and a check valve 42 in sequence according to the flow direction.

[0013] The precision filter uses a PP filter element with a filtration accuracy of 0.2 μm, and the terminal filter uses a PES filter element with a filtration accuracy of 0.1 μm. The polishing mixed bed device 30 uses a two-stage polishing mixed bed, that is, a first polishing mixed bed 31 and a second polishing mixed bed 32 are connected in series. The processing capacity of the resin used in the first polishing mixed bed 31 and the second polishing mixed bed 32 both reaches 18.2 MΩ.

[0014] The water inlet valve 11, the inlet pressure transmitter 12, the outlet water resistance meter 13, the booster pump 14, the outlet water resistance meter 18, the outlet water pressure transmitter 19, the water supply valve 21, and the circulation valve 41 are all electrically connected to the controller of the water treatment equipment of the present invention.

[0015] The above is the water quality treatment equipment for semiconductor water points of the present invention, and its working method is as follows:

[0016] The water inlet connector 10 is connected to the outlet pipe of the water sent by the front-end pretreatment, and the water supply connector 20 is connected to the semiconductor water-using equipment.

[0017] Open the water inlet valve 11, the water inlet pressure transmitter 12 will monitor the water inlet pressure, and the inlet water resistance meter 13 will also detect the resistance of the water inlet. Usually, the water resistance and water pressure of the pure water sent by pretreatment will decrease, which cannot meet the water use requirements. The controller will start the booster pump 14 to increase the pressure to meet the pressure requirements, and use the ultraviolet sterilizer 15, precision filter 16, polishing mixed bed device 30, and terminal filter 17 to further treat the incoming water. Among them, the ultraviolet sterilizer 15 removes bacteria and organic carbon in the water, the precision filter 16 filters out suspended particle impurities in the pipeline, the two-stage polishing mixed bed increases the pure water resistance to 18.2MΩ, and the terminal filter 17 filters out fine impurities in the water.

[0018] After treatment, the outlet water resistance meter 18 and the outlet water pressure transmitter 19 detect the treated pure water again. If the water supply resistance and water supply pressure meet the water use requirements, the controller controls the water supply valve 21 to open to supply water to the semiconductor water-using equipment. If the water supply resistance and / or water supply pressure do not meet the water use requirements, the controller circulation valve 41 opens and the water supply valve 21 closes (the water inlet valve 11 is closed as needed), so that the water flows back to the booster pump 14 for further treatment, so that the final water supply meets the water use requirements. The one-way valve 42 prevents the water in the water inlet joint side pipe from flowing into the water supply joint side pipe.

[0019] From the above detailed description, it can be seen that the present invention can achieve water quality treatment at the semiconductor water use point to reduce the pollution risk of semiconductor manufacturing water and ensure the water quality of semiconductor manufacturing water.

Claims

1. A water quality treatment device for a semiconductor water point, characterized in that: It includes an inlet valve, a booster pump, an ultraviolet sterilizer, a precision filter, a polishing mixed bed device, a terminal filter, an outlet water resistance meter and a water supply valve connected in sequence. The pipeline between the outlet water resistance meter and the water supply valve is also connected to a circulation pipeline flowing to the pipeline between the water inlet valve and the booster pump. The circulation pipeline is provided with a circulation valve and a one-way valve.

2. The water treatment equipment for semiconductor hydropower according to claim 1, characterized in that: The polishing mixed bed device is formed by connecting a first polishing mixed bed and a second polishing mixed bed in series.

3. The water quality treatment equipment for semiconductor hydropower according to claim 1, characterized in that: The filtration accuracy of the precision filter is 1.2 μm, and the filtration accuracy of the terminal filter is 0.1 μm.

4. The water treatment equipment for semiconductor hydropower according to claim 1 or 3, characterized in that: The precision filter adopts a PP filter element, and the terminal filter adopts a PES filter element.

5. The water quality treatment equipment for semiconductor hydropower according to claim 1, characterized in that: The first polishing mixed bed and the second polishing mixed bed both use resin with a processing capacity of 18.2 MΩ resistance.

6. The water quality treatment equipment for semiconductor hydropower according to claim 1, characterized in that: An inlet water resistance meter is also provided between the water inlet valve and the booster pump.

7. The water quality treatment equipment for semiconductor hydropower according to claim 6, characterized in that: An inlet pressure transmitter is also provided between the water inlet valve and the inlet water resistance value meter.

8. The water quality treatment equipment for semiconductor hydropower according to claim 1, characterized in that: An outlet pressure transmitter is also provided between the water supply valve and the outlet water resistance value meter.

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