Moving exposure workbench, exposure system and exposure control method

Abstract

The invention discloses a motion exposure workbench, an exposure system and an exposure control method.The motion exposure workbench comprises a mounting base, a lifting assembly, a first motion assembly, a second motion assembly and an exposure assembly, and a controller is in communication connection with the exposure assembly, the lifting assembly, the first motion assembly and the second motion assembly; the controller is used for adjusting according to the exposure condition; the second movement assembly is further provided with a sensor, and the sensor is used for detecting the position of the base plate. According to the exposure device, the sensor is arranged to detect the position of the substrate so as to drive the first movement assembly and the second movement assembly to adjust the position of the exposure assembly according to the position of the substrate, so that the exposure assembly can better act the exposure effect on the substrate, and the exposure assembly can act the exposure effect on the substrate according to the design for exposure; and adjustment can be carried out according to the production process in the use process, so that the exposure assembly has higher precision in use.

Description

Technical Field

[0001] The present invention relates to the technical field of exposure devices, and in particular to a moving exposure workbench, an exposure system and an exposure control method. Background Art

[0002] In the prior art, the stepping positioning motion platform in the exposure system has a cantilevered fixed installation of the upper moving optical path system, and the optical path system is installed on the side of the optical path installation base plate. The exposure center position of the optical path system is far away from the center position of the stepping positioning motion platform. The dynamic characteristics of the positioning motion platform, namely Yaw, Pitch, Roll, repeatability, straightness, etc., all have an important impact on the position accuracy of the positioning motion platform. In addition, due to the existence of Abbe error, the farther the exposure center position of the optical path system is from the motion center position of the precision positioning platform, the greater the Abbe error value, and the greater the error of the exposure accuracy of the laser direct imaging device, which reduces the exposure yield of the entire device. The exposure device cantilever is on the exposure fixed plate, and the structural rigidity is weak, which is easy to cause vibration and affect the positioning repeatability accuracy. Summary of the invention

[0003] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one purpose of the present invention is to provide a moving exposure workbench, on which a detection member is provided, so that the detection member is suitable for detecting a substrate, so that the use position of the exposure component can be adjusted according to the position of the substrate, so that the exposure component can be arranged in a suitable position according to the design during use, so that the use and production of the exposure system can have higher precision, have a higher yield rate, and can also achieve automatic control.

[0004] Another object of the present invention is to provide an exposure system, wherein the exposure system is provided with a moving exposure workbench as shown above.

[0005] Another object of the present invention is to provide an exposure control method, wherein the exposure control method is provided with a moving exposure workbench as shown above.

[0006] According to an embodiment of the present invention, a motion exposure workbench comprises: a mounting seat, a lifting assembly, a first motion assembly, a second motion assembly and an exposure assembly, wherein a workbench is provided in the middle of the mounting seat, and the workbench is used to carry a substrate; the lifting assembly is provided on the base, and an output end of the lifting assembly is connected to the workbench, and the lifting assembly is used to adjust the vertical height of the workbench; the first motion assembly is provided on the base, and the first motion assembly and the lifting assembly are spaced apart, and the first motion assembly moves along a first direction; the second motion assembly is provided on the first motion assembly, and the second motion assembly moves along a second direction, and the first direction and the second direction are both in the horizontal direction, and the first direction and the second direction are perpendicular to each other; the controller is connected to the exposure assembly, the lifting assembly, the first motion assembly and the second motion assembly for communication, and the controller is used to make adjustments according to the exposure situation; wherein a sensor is also provided on the second motion assembly, and the sensor is used to detect the position of the substrate.

[0007] According to the motion exposure workbench of the embodiment of the present invention, a sensor is provided to detect the position of the substrate, and the first motion component and the second motion component are driven to adjust the position of the exposure component according to the position of the substrate, so that the exposure component can better exert the exposure effect on the substrate, so that the exposure component can exert the exposure effect on the substrate according to the design for exposure, and can be adjusted according to the production process during use, so that the use of the exposure component has higher precision, so that the exposure effect of the substrate is better, the yield rate of the substrate is improved, and the automatic control of the motion exposure workbench can be realized. In addition, a controller is also provided, so that the controller is suitable for connecting with the above-mentioned exposure positioning components, so that the controller can adjust the position of the exposure component according to the detection effect, so that the exposure system can better exert the exposure effect on the substrate to improve the yield rate. Similarly, the above-mentioned structure can also realize the automatic control of the motion exposure workbench.

[0008] In some embodiments, the exposure assembly further includes: an exposure base plate and an exposure member, the exposure base plate is arranged on the second moving assembly; there are multiple exposure members and the exposure members are arranged on the exposure base plate, the multiple exposure members are arranged at intervals on the same straight line, and the sensor is arranged on one side of the straight line direction of the multiple exposure members.

[0009] In some embodiments, the second motion component includes: a stepping base, a stepping part and a stepping mounting plate, the stepping base is arranged on the first motion component; the stepping part is arranged on the stepping base; the stepping mounting plate is arranged on the stepping part, a mounting groove is arranged in the middle of the stepping mounting plate, and the exposure base plate is embedded in the mounting groove.

[0010] In some embodiments, the stepping base is a marble base, and / or the stepping base is an integrally formed part.

[0011] In some embodiments, the stepping member includes: a stepping stator, a stepping mover and a stepping guide rail, the stepping stator is arranged on the stepping base; the stepping mover is arranged on the stepping mounting plate, and the stepping mover is arranged opposite to the stepping stator; the stepping guide rail is a plurality of stepping guide rails arranged in parallel, and the stepping mounting plate extends along the extension direction of the guide rail.

[0012] In some embodiments, the stepping member further includes: a grating ruler, the grating ruler is arranged opposite to the stepping mounting plate, and the grating ruler is arranged opposite to the stepping mounting plate, and the grating ruler is used to detect the position of the stepping mounting plate.

[0013] In some embodiments, there are two grating rulers, and the two grating rulers are arranged opposite to the two stepping guide rails.

[0014] In some embodiments, the stepping guide rails are three arranged in parallel.

[0015] In some embodiments, the first motion component includes: two positioning axes, the positioning axes are arranged in parallel and the positioning axes are spaced apart from the workbench.

[0016] The exposure system according to an embodiment of the present invention includes: the moving exposure workbench as described above.

[0017] According to the exposure system of the embodiment of the present invention, since the exposure system is provided with the assembly as shown above, a controller is provided to connect the first motion component and the second motion component, so that the controller is suitable for adjusting the position of the exposure component according to the control effect, so that the exposure component can apply the exposure effect to the substrate for exposure as designed, so that the exposure effect of the substrate is better, while realizing the automatic control of the exposure system, the production yield of the exposure system can also be improved.

[0018] According to an embodiment of the present invention, the exposure control method is used to control the moving exposure workbench as described above, and includes: S1: placing the substrate on the workbench; S2: the substrate moves along the positioning assembly until the sensor detects the substrate; S3: The detection member is used to align the position of the substrate; S4: the exposure component exposes the substrate; S5: The exposed substrate is transported to a subsequent process; S6: Repeat the above S1-S5 until the use is completed.

[0019] According to the exposure control method of the embodiment of the present invention, during the use of the moving exposure workbench, it is suitable to first arrange the substrate on the workbench to make the workbench suitable for carrying the substrate, and then move the substrate to allow the sensor to detect the substrate, so as to adjust the substrate according to the detection result, so that the exposure effect of the subsequent exposure component can act on the substrate for accurate and reliable exposure, so as to improve the production efficiency of the substrate after the subsequent exposure is completed, so that the substrate has sufficient performance to meet the use of subsequent processes, so as to realize the automated production and use of the exposure system.

[0020] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which: Figure 1 is a schematic structural diagram of a motion exposure workbench according to an embodiment of the present invention; Figure 2 is a schematic structural diagram of a motion exposure workbench according to an embodiment of the present invention; Figure 3 is a schematic structural diagram of a motion exposure workbench according to an embodiment of the present invention; Figure 4 is a schematic structural diagram of a motion exposure workbench according to an embodiment of the present invention; Figure 5 is a schematic structural diagram of a motion exposure workbench according to an embodiment of the present invention; Figure 6 is a schematic flow chart of an exposure control method according to an embodiment of the present invention; Reference numerals: Motion Exposure Workbench 10, Mounting seat 100, Workbench 200, Lifting assembly 300, The first moving assembly 400, the positioning shaft 410, The second motion assembly 500, the stepping base 510, the stepping member 520, the stepping stator 521, the stepping mover 522, the stepping guide rail 523, the grating ruler 524, the stepping mounting plate 530, Exposure assembly 600 , sensor 610 , exposure base plate 620 , exposure member 630 . DETAILED DESCRIPTION

[0022] Embodiments of the present invention are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. Embodiments of the present invention are described in detail below.

[0023] Reference below Figure 1-Figure 6 The moving exposure workbench 10 according to the embodiment of the present invention is described, including: a mounting base 100, a lifting assembly 300, a first moving assembly 400, a second moving assembly 500 and an exposure assembly 600.

[0024] Specifically, a workbench 200 is provided in the middle of the mounting base 100, and the workbench 200 is used to carry the substrate; the lifting component 300 is provided on the base, and the output end of the lifting component 300 is connected to the workbench 200, and the lifting component 300 is used to adjust the vertical height of the workbench 200; the first motion component 400 is provided on the base, and the first motion component 400 and the lifting component 300 are spaced apart, and the first motion component 400 is used to determine the position of the substrate; the second motion component 500 is provided on the first motion component 400, and the output end of the second motion component 500 is connected to the substrate, and the second motion component 500 is used to adjust the position; the exposure component 600 is provided on the upper side of the second motion component 500, and the exposure component 600 is arranged opposite to at least part of the workbench 200, and the exposure component 600 is used to expose the substrate; wherein, the exposure component 600 includes a sensor 610, and the sensor 610 is used to detect the position of the substrate.

[0025] That is to say, during the use of the exposure system, it is suitable to use the moving exposure workbench 10 to carry the substrate, so that the position of the substrate can be controlled and adjusted under the control of the moving exposure workbench 10, so that the substrate can be transported to a designated position for exposure, so that the exposure component 600 can apply the exposure effect to the substrate as designed, so that the exposure effect of the substrate in the exposure system is better, thereby improving the production efficiency of the exposure system, and the substrate exposed and produced by the exposure system has a higher yield rate.

[0026] Specifically, the motion exposure workbench 10 is suitable for including a mounting seat 100, a lifting assembly 300, a first motion assembly 400, a second motion assembly 500 and an exposure assembly 600. That is, the mounting seat 100 is suitable for providing a bearing function to carry other components, so that the motion exposure workbench 10 is suitable for being arranged in a suitable position according to control for subsequent use. In some specific embodiments, a lifting assembly 300 is provided on the mounting seat 100, and the free end of the lifting assembly 300 is suitable for constructing a workbench 200, so that the lifting assembly 300 is suitable for adjusting the vertical position of the workbench 200 according to demand, so that when the workbench 200 is loaded with a substrate, it is suitable for adjusting the position so that the exposure effect can better act on the substrate, so that the production efficiency and production effect of the substrate are improved. In addition, a first motion assembly 400 is also provided, and the first motion assembly 400 is suitable for driving the exposure assembly 600 to move in a first direction to adjust the working position of the exposure assembly 600, so that the exposure effect can better act on the substrate for production, so that the exposure effect of the substrate is improved. Similarly, after the position of the substrate is restricted, it is suitable for movement through the second motion component 500. Since the second motion component 500 is suitable for driving the exposure component 600 to move, and since the moving direction of the first motion component 400 and the moving direction of the second motion component 500 are perpendicular to each other, the exposure position of the exposure component 600 can be better adjusted, so that the use of the exposure component 600 is more reliable, so that the exposure component 600 can apply the exposure effect to the substrate according to the design, so that the production of the substrate has a higher yield rate.

[0027] In addition, a controller is provided, which is suitable for connecting with the above-mentioned exposure positioning and other components, so that the controller can adjust the position of the exposure component 600 according to the detection effect, so that the exposure system can better apply the exposure effect to the substrate to improve the yield rate. Similarly, the above-mentioned structure can also realize the automatic control and use of the moving exposure workbench 10.

[0028] Specifically, the exposure component 600 is suitable for including a sensor 610, and the sensor 610 is suitable for detecting with the substrate. When the sensor 610 detects a corresponding signal, the position of the substrate can be determined. When the sensor 610 detects no signal, it is suitable for controlling the first motion component 400 to adjust the position of the substrate until a signal is detected for subsequent transportation and exposure production.

[0029] According to the embodiment of the present invention, the motion exposure workbench 10 is provided with a sensor 610 to detect the position of the substrate, so as to drive the first motion component 400 and the second motion component 500 to adjust the position of the exposure component 600 according to the position of the substrate, so that the exposure component 600 can better exert the exposure effect on the substrate, so that the exposure component 600 can exert the exposure effect on the substrate according to the design for exposure, and can be adjusted according to the production process during use, so that the use of the exposure component 600 has higher precision, so that the exposure effect of the substrate is better, the yield rate of the substrate is improved, and the automatic control of the motion exposure workbench 10 can be realized. In addition, a controller is also provided, so that the controller is suitable for connecting with the above-mentioned exposure positioning components, so that the controller can adjust the position of the exposure component 600 according to the detection effect, so that the exposure system can better exert the exposure effect on the substrate to improve the yield rate. Similarly, the above structure can also realize the automatic control of the motion exposure workbench 10.

[0030] In some embodiments, the exposure assembly 600 includes: an exposure base plate 620 and an exposure member 630, the exposure base plate 620 is arranged on the second moving assembly 500; there are multiple exposure members 630 and the exposure members 630 are arranged on the exposure base plate 620, the multiple exposure members 630 are arranged at intervals on the same straight line, and the sensor 610 is arranged on one side of the straight line direction of the multiple exposure members 630.

[0031] It can be understood that the exposure assembly 600 is suitable for including an exposure base plate 620 and an exposure member 630, and the exposure base plate 620 is suitable for providing a bearing capacity, so that the exposure base plate 620 is suitable for carrying the above-mentioned sensor 610 and the exposure member 630, so that the exposure member 630 can be used as designed, so that the exposure effect can be directly applied to the specified position on the substrate to meet the exposure production requirements of the substrate, so that the production efficiency of the substrate is improved. In addition, the sensor 610 is suitable for being constructed on one side of the exposure member 630, so that the sensor 610 can better detect the position of the substrate during use, so that the sensor 610 can detect and judge the position of the substrate according to the design, so that the subsequent movement exposure workbench 10 can adjust the position of the exposure assembly 600 according to the design for use, so that the production performance of the exposure system is improved. In addition, a plurality of exposure members 630 are arranged at intervals so that the exposure assembly 600 is suitable for having a higher exposure efficiency during use, so that the production efficiency of the exposure system is improved.

[0032] In some embodiments, the second moving component 500 includes: a stepping base 510, a stepping member 520 and a stepping mounting plate 530, the stepping base 510 is arranged on the first moving component 400; the stepping member 520 is arranged on the stepping base 510; the stepping mounting plate 530 is arranged on the stepping member 520, and a mounting groove is provided in the middle of the stepping mounting plate 530, and the exposure base plate 620 is embedded in the mounting groove. It can be understood that the second motion component 500 is suitable for including: a stepping base 510, a stepping member 520 and a stepping mounting plate 530. The stepping base 510 is suitable for providing a bearing capacity to bear the remaining structures for use, and the stepping base 510 is suitable for bearing a stepping member 520. The stepping member 520 is suitable for stepping according to control to drive the substrate to adjust the position in a stepping manner, and the stepping mounting plate 530 is suitable for improving the bearing capacity. An exposure base plate 620 is arranged in the middle of the stepping mounting plate 530 so that the exposure component 600 can be arranged on the second motion component 500, so that the position of the second motion component 500 is suitable for adjusting the use position of the exposure component 600 according to demand, so that the sensor 610 can better detect the position of the substrate for exposure, and at the same time, the use performance of the exposure component 600 can act on the substrate according to the design to realize automatic processing.

[0033] In some embodiments, the stepping base 510 is a marble base, and / or the stepping base 510 is an integrally formed part. It is understandable that the stepping base 510 is a marble base so that the stepping base 510 has a higher structural strength to support other structures for use, so that the substrate can be used as designed, so that the motion exposure workbench 10 can expose the substrate as designed, so that the substrate is suitable for having higher performance after production to meet subsequent production. Similarly, it is suitable for the stepping base 510 to be constructed in an integrated manner to save the production steps of the stepping base 510, simplify the production process of the motion exposure workbench 10, and improve the connection strength of the stepping base 510 to increase the structural strength of the motion exposure workbench 10.

[0034] In some embodiments, the stepping member 520 includes: a stepping stator 521, a stepping mover 522 and a stepping guide rail 523, the stepping stator 521 is arranged on the stepping base 510; the stepping mover 522 is arranged on the stepping mounting plate 530, and the stepping mover 522 is arranged opposite to the stepping stator 521; there are multiple stepping guide rails 523 arranged in parallel, and the stepping mounting plate 530 extends along the extension direction of the guide rail. It can be understood that during the use of the stepping member 520, it is suitable to include a stepping guide rail 523, a stepping stator 521 and a stepping mover 522, and the stepping guide rail 523 is suitable for providing a guiding function. Similarly, a stepping stator 521 and a stepping mover 522 are also provided, so that the stepping mover 522 is suitable for being arranged relative to the stepping stator 521 to provide a driving effect to a specified position to meet the use. Specifically, the stepping member 520 is suitable for providing a driving effect through the stepping mover 522 to drive the stepping mounting plate 530 to move during use, so that the moving exposure workbench 10 can be used according to the designed position adjustment.

[0035] In some embodiments, the stepper 520 further includes: a grating ruler 524, which is arranged relative to the stepper mounting plate 530, and the grating ruler 524 is used to detect the position of the stepper mounting plate 530. It can be understood that by arranging the grating ruler 524 relative to the stepper driving member, the grating ruler 524 can detect the position of the stepper mounting plate 530, and can also adjust the exposure performance according to the use status, so that the output performance of the exposure assembly 600 can be more reliably applied to the substrate, thereby improving production efficiency.

[0036] In this example, there are two grating rulers 524, and the two grating rulers 524 are arranged opposite to the two stepping guide rails 523. In this way, by providing two grating rulers 524, the two grating rulers 524 can be respectively arranged on both sides of the stepping guide rail 523 to detect the stepping mounting plate 530, so that the stepping mounting plate 530 can be adjusted according to the design, so that the second motion component 500 can be adjusted according to the design during use, so that the exposure component 600 can be arranged in a suitable position for subsequent use, so that the exposure system can also be adjusted according to the setting situation during the automated production process to improve the yield rate of the produced products.

[0037] In some embodiments, there are three stepping rails 523 arranged in parallel. It is understood that, in the process of constructing the stepping rails 523, it is suitable to arrange the stepping rails 523 in parallel to allow the stepping mounting plate 530 to move with higher precision during the movement process, so that the exposure assembly 600 can be moved to a suitable position according to the design for subsequent exposure, which is more reliable, and the products produced by the exposure system have higher production efficiency and production precision.

[0038] In some embodiments, the first motion assembly 400 includes: two positioning shafts 410, which are arranged in parallel and spaced apart from the workbench 200. In this way, during the use of the first motion assembly 400, it is suitable to adjust the position of the exposure assembly 600 along the first direction through the positioning shafts 410, so that the position of the exposure assembly 600 in the first direction can be adjusted through the positioning shafts 410, thereby realizing the movement of the exposure system in the first direction.

[0039] According to an embodiment of the present invention, the exposure system includes: the above-mentioned moving exposure workbench 10. In this way, since the above-mentioned moving exposure workbench 10 is provided in the exposure system, a sensor 610 is provided to detect the position of the substrate, so as to drive the first moving component 400 and the second moving component 500 to adjust the position of the exposure component 600 according to the position of the substrate, so that the exposure component 600 can better exert the exposure effect on the substrate, so that the exposure component 600 can exert the exposure effect on the substrate according to the design for exposure, and can be adjusted according to the production process during use, so that the use of the exposure component 600 has higher precision, so that the exposure effect of the substrate is better, the yield rate of the substrate is improved, and the automatic control of the exposure system can be realized. In addition, a controller is also provided, so that the controller is suitable for connecting with the above-mentioned exposure positioning components, so that the controller can adjust the position of the exposure component 600 according to the detection effect, so that the exposure system can better exert the exposure effect on the substrate to improve the yield rate. Similarly, the above-mentioned structure can also realize the automatic control of the moving exposure workbench 10.

[0040] According to the exposure control method of the embodiment of the present invention, the control method is used to control the above-mentioned moving exposure workbench 10, including: S1: placing a substrate on a workbench 200; S2: The substrate moves along the positioning assembly until the sensor 610 detects the substrate; S3: The detection member is used to align the position of the substrate; S4: the exposure component 600 exposes the substrate; S5: The exposed substrate is transported to the subsequent process; S6: Repeat the above S1-S5 until the use is completed.

[0041] It can be understood that, during the use of the moving exposure workbench 10, it is suitable to first arrange the substrate on the workbench 200 to make the workbench 200 suitable for carrying the substrate, and then move the substrate to allow the sensor 610 to detect the substrate, so as to adjust the substrate according to the detection result, so that the exposure effect of the subsequent exposure component 600 can act on the substrate for accurate and reliable exposure, so as to improve the production efficiency of the substrate after the subsequent exposure is completed, so that the substrate has sufficient performance to meet the use of subsequent processes, so as to realize the automated production and use of the exposure system.

[0042] Other structures and operations of the exposure system according to the embodiment of the present invention are known to those skilled in the art and will not be described in detail here.

[0043] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example.

[0044] Although the embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.

Claims

1. A motion exposure workbench, characterized in that: include: A mounting seat, wherein a workbench is provided in the middle of the mounting seat, and the workbench is used to carry the substrate; A lifting component, the lifting component is arranged on the base, and an output end of the lifting component is connected to the workbench, and the lifting component is used to adjust the vertical height of the workbench; A first moving component, the first moving component is disposed on the base, and the first moving component is spaced apart from the lifting component, and the first moving component moves along a first direction; A second motion component, the second motion component is arranged on the first motion component, the second motion component moves along a second direction, the first direction and the second direction are both in a horizontal direction, and the first direction and the second direction are perpendicular to each other; An exposure assembly, the exposure assembly is disposed on the upper side of the second moving assembly, and the exposure assembly is disposed opposite to at least a portion of the workbench, and the exposure assembly is used to expose the substrate; A controller, the controller being in communication with the exposure assembly, the lifting assembly, the first motion assembly, and the second motion assembly, the controller being used to make adjustments according to exposure conditions; Wherein, the second motion component is also provided with a sensor, and the sensor is used to detect the position of the substrate.

2. The motion exposure workbench according to claim 1, characterized in that: The exposure assembly further comprises: an exposure base plate, wherein the exposure base plate is arranged on the second moving assembly; The exposure components are multiple and arranged on the exposure base plate. The multiple exposure components are arranged on the same straight line at intervals. The sensor is arranged on one side of the straight line direction of the multiple exposure components.

3. The motion exposure workbench according to claim 2, characterized in that: The second motion component comprises: A stepping base, wherein the stepping base is arranged on the first motion component; A stepping member, wherein the stepping member is arranged on the stepping base; A stepping mounting plate is arranged on the stepping member, a mounting groove is arranged in the middle of the stepping mounting plate, and the exposure base plate is embedded in the mounting groove.

4. The motion exposure workbench according to claim 3, characterized in that: The stepping base is a base made of marble, and / or the stepping base is an integrally formed part.

5. The motion exposure workbench according to claim 3, characterized in that: The stepping member comprises: A stepping stator, the stepping stator being arranged on the stepping base; A stepper mover, the stepper mover is arranged on the stepper mounting plate, and the stepper mover is arranged opposite to the stepper stator; The stepping guide rail is a plurality of stepping guide rails arranged in parallel, and the stepping mounting plate extends along the extension direction of the guide rail.

6. The motion exposure workbench according to claim 3, characterized in that: The stepping member further includes: a grating ruler, which is arranged on the stepping base and is arranged opposite to the stepping mounting plate, and is used to detect the position of the stepping mounting plate.

7. The motion exposure workbench according to claim 6, characterized in that: There are two grating rulers, and the two grating rulers are arranged opposite to the two stepping guide rails.

8. The motion exposure workbench according to claim 1, characterized in that: The first motion component comprises: two positioning shafts which are arranged in parallel and spaced apart from the workbench.

9. An exposure system, characterized in that: include: A motion exposure workbench as claimed in any one of claims 1 to 8.

10. An exposure control method, the control method is used to control the moving exposure workbench according to any one of claims 1 to 8, characterized in that: include: S1: placing the substrate on the workbench; S2: the substrate moves along the positioning assembly until the sensor detects the substrate; S3: The detection member is used to align the position of the substrate; S4: the exposure component exposes the substrate; S5: The exposed substrate is transported to a subsequent process; S6: Repeat the above S1-S5 until the use is completed.

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