Photovoltaic silicon wafer pretreatment cleaning machine

Abstract

The invention discloses a photovoltaic silicon wafer pretreatment cleaning machine, and relates to the technical field of photovoltaic silicon wafer cleaning, the photovoltaic silicon wafer pretreatment cleaning machine comprises a main body mechanism, the main body mechanism comprises a pretreatment zone, one side of the pretreatment zone is fixedly connected with a cleaning zone, one side of the cleaning zone is fixedly connected with a drying zone, and one side of the pretreatment zone is provided with a first conveyor belt; an inner cavity of the pretreatment area is rotationally connected with a second conveying belt and a third conveying belt, the outer side of the cleaning area is fixedly connected with a controller, the controller is used for controlling all power sources, and a treatment mechanism is arranged in the inner cavity of the pretreatment area. And the treatment mechanism comprises a soaking unit. According to the photovoltaic silicon wafer pretreatment cleaning machine, by arranging the treatment mechanism, excessive input of mechanical grabbing equipment is avoided, the production cost is reduced, the contact between the photovoltaic silicon wafer and the cleaning solution is accelerated, the pretreatment effect of the photovoltaic silicon wafer is optimized, and the pretreatment efficiency of the photovoltaic silicon wafer is improved.

Description

Technical Field

[0001] The invention relates to the technical field of photovoltaic silicon wafer cleaning, in particular to a photovoltaic silicon wafer pretreatment cleaning machine. Background Art

[0002] Photovoltaic silicon wafers are mainly made of solar-grade polysilicon. After crystal pulling, slicing, polishing, cleaning and other process steps, silicon rods are processed into thin sheets. Photovoltaic silicon wafers have the characteristics of high purity, good conductivity and mechanical strength.

[0003] During the production, transportation and storage of photovoltaic silicon wafers, they will inevitably come into contact with various sources of pollution, such as dust, grease, metal ions, etc. If these pollutants are not removed, they will seriously affect the performance of solar cells. At this time, a cleaning machine will be used to clean the photovoltaic silicon wafers. Before cleaning, the photovoltaic silicon wafers need to be pre-treated and soaked in a special solution to soften the stains on their surface. However, when pre-treating photovoltaic silicon wafers, baskets of photovoltaic silicon wafers are usually switched between multiple soaking pools and cleaning pools through mechanical gripping equipment, which greatly increases the input of mechanical equipment. In addition, due to the small distance between the stacked photovoltaic silicon wafers and the limitation of the material basket, each photovoltaic silicon wafer is not in full contact with the solution in time, resulting in poor pre-treatment effect and efficiency.

[0004] Combining the above problems, we will find that it is difficult to avoid the above problems at the same time when using the existing photovoltaic silicon wafer pretreatment cleaning machines on the market, and even if they can be solved, they need to be solved through external tools, which makes it impossible to achieve the desired effect. Therefore, we propose a photovoltaic silicon wafer pretreatment cleaning machine. Summary of the invention

[0005] The purpose of the present invention is to provide a photovoltaic silicon wafer pretreatment cleaning machine to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned object, the present invention provides the following technical solutions: a photovoltaic silicon wafer pretreatment cleaning machine, comprising a main body mechanism, the main body mechanism comprising a pretreatment area, one side of the pretreatment area is fixedly connected to a cleaning area, one side of the cleaning area is fixedly connected to a drying area, a first conveyor belt is placed on one side of the pretreatment area, a second conveyor belt and a third conveyor belt are rotatably connected to the inner cavity of the pretreatment area, a controller is fixedly connected to the outer side of the cleaning area, the controller is used to control all power supplies, and a processing mechanism is provided in the inner cavity of the pretreatment area; The processing mechanism comprises a soaking unit, which is arranged in the inner cavity of the pre-processing area and is used to soak the photovoltaic silicon wafer; The processing mechanism comprises a guiding unit, which is arranged in the inner cavity of the pre-processing area, and is used in conjunction with the soaking unit, and is used to guide the photovoltaic silicon wafers in the basket; The processing mechanism also includes a moving unit, which is arranged on the opposite side of the support frame. The moving unit is used in conjunction with the soaking unit and the guiding unit. The moving unit is used to achieve the transfer of the photovoltaic silicon wafer after the soaking is completed.

[0007] Preferably, the soaking unit includes a support frame, the opposite sides of the support frame are fixedly connected to the outer surface of the pretreatment zone, the inner top of the support frame is fixedly connected to a hydraulic rod, the telescopic end of the hydraulic rod is fixedly connected to a basket cover, a material basket is placed on the top of the first conveyor belt, the basket cover is used in conjunction with the material basket, the inner bottom of the pretreatment zone is fixedly connected to a first telescopic rod, the telescopic end of the first telescopic rod is fixedly connected to a limiting plate, the surface sliding sleeve of the first telescopic rod is provided with a first spring, one end of the first spring is fixedly connected to the inner bottom of the pretreatment zone, and the other end of the first spring is fixedly connected to the bottom of the limiting plate.

[0008] Preferably, the top of the basket cover is provided with a plurality of equidistantly arranged special-shaped holes, the special-shaped holes are used to increase the generation of bubbles, and the bottom of the basket is provided with a plurality of equidistantly arranged leakage holes.

[0009] Preferably, the guide unit includes a guide groove opened on the opposite side of the inner cavity of the pretreatment area, the guide groove includes a transverse groove and a vertical groove, the transverse groove and the vertical groove are connected in an L shape, the inner cavities of the two guide grooves are slidably connected with a first guide rod, the opposite ends of the two first guide rods are commonly fixedly connected with a positioning block, one side of the positioning block is provided with a first clamping hole and a second clamping hole, the bottom of the material basket is fixedly connected with a first clamping block, the surface of the first clamping block is in contact with the inner cavity of the first clamping hole, the top of the limiting piece is fixedly connected with a second clamping block, the surface of the second clamping block is in contact with the inner cavity of the second clamping hole, and both sides of the second clamping block are fixedly connected There is a second guide rod, the surface of which is slidably connected to the inner cavity of the vertical groove, electric push rods are fixedly connected to both sides of the pretreatment area, the telescopic end of the electric push rod is fixedly connected to a guide block, one side of the guide block penetrates into the inner cavity of the pretreatment area, the inner wall of the pretreatment area is provided with a hole, the surface of the guide block is slidably connected to the inner cavity of the hole, the bottom of the guide block is fixedly connected to a clamping rod, the surface of the first guide rod is provided with a clamping groove used in conjunction with the clamping rod, the surface of the clamping rod is in contact with the inner cavity of the clamping groove, the upper surface of the second guide rod is fixedly connected to a rubber block, the rubber block is used to reduce the impact force when the first guide rod falls into the vertical groove.

[0010] Preferably, an extension plate is fixedly connected to the inner side of the pretreatment area, a special-shaped plate is fixedly connected to one side of the extension plate, an inner wall of the positioning block is provided with an L-shaped groove, the inner cavity of the L-shaped groove is slidably connected with a stop block, one side of the material basket is fixedly connected with a stop rod, one end of the stop rod is in contact with one side of the stop block, and the cooperation between the stop rod and the stop block realizes the limitation of the maximum displacement of the material basket, one side of the stop block is fixedly connected with a connecting rod, the connecting rod is slidably connected to the inner cavity of the L-shaped groove, one end of the connecting rod is rotatably connected to a roller through a bearing, the roller is rollingly connected to the surface of the special-shaped plate, and the inner bottom of the L-shaped groove is fixedly connected with a tension spring, and one end of the tension spring is fixedly connected to the bottom of the connecting rod.

[0011] Preferably, the inner bottom wall of the first clamping hole is rotatably connected to a plurality of friction rollers via a one-way bearing, a silicone pad is fixedly connected to the surface of the friction roller, and the surface of the friction roller contacts the bottom of the first clamping block.

[0012] Preferably, support plates are fixedly connected on both sides of the pretreatment area, a guide ring is fixedly sleeved on the surface of the telescopic end of the electric push rod, a guide column is fixedly connected to the lower surface of the guide ring, a guide groove for use with the guide column is opened on the top of the support plate, and the surface of the guide column is slidably connected to the inner cavity of the guide groove.

[0013] Preferably, the moving unit includes a positioning plate fixedly connected to the inner side of the supporting frame, the number of the positioning plates is two, the two positioning plates are arranged opposite to each other, the top of the positioning plate is rotatably connected to a rotating cylinder through a bearing, the inner wall of the rotating cylinder is provided with a spiral groove, the inner cavity of the rotating cylinder is slidably connected with a connecting column, the surface of the connecting column is fixedly connected with a short rod used in conjunction with the spiral groove, the surface of the short rod is slidably connected with the inner cavity of the spiral groove, the top of the connecting column is fixedly connected with a touch plate, the telescopic end of the hydraulic rod is fixedly connected with a lifting plate, the top of the lifting plate contacts with the bottom of the touch plate, the surface of the rotating cylinder is fixedly connected with a spring telescopic rod, the telescopic end of the spring telescopic rod is fixedly connected with a pushing block, both sides of the material basket are fixedly connected with blocking blocks, the pushing block is used to apply thrust to the blocking block, one end of the pushing block is rotatably connected with a roller through a rotating shaft, and the surface of the roller is in rolling contact with the surface of the material basket.

[0014] Preferably, two relatively arranged slide grooves are provided on the inner side of the support frame, the surface of the touch plate is slidably connected to the inner cavity of the slide groove, a slide column is fixedly connected to the inner wall of the slide groove, and the inner wall of the touch plate is slidably connected to the surface of the slide column.

[0015] Preferably, a third spring is fixedly connected to the inner bottom of the slide groove, one end of the third spring is fixedly connected to the bottom of the touch plate, and the third spring is slidably sleeved on the surface of the slide rod.

[0016] Compared with the prior art, the present invention has the following beneficial effects: The present invention provides a soaking unit, which can limit the photovoltaic silicon wafers in the material basket through the cooperation between the material basket and the basket cover, and with the help of the cooperation between the hydraulic rod and the first telescopic rod, the photovoltaic silicon wafers in the basket can be moved vertically back and forth in the soaking solution, thereby accelerating the full contact between the soaking solvent and the single photovoltaic silicon wafer, thereby optimizing the pretreatment effect and improving the pretreatment efficiency.

[0017] The present invention can smoothly guide the photovoltaic silicon wafers to the bottom of the hydraulic rod by arranging the guiding unit, realize the automatic loading of the photovoltaic silicon wafers during pretreatment, and realize the guidance of the photovoltaic silicon wafers during immersion, thereby ensuring the continuity of the pretreatment process and improving the pretreatment efficiency of the photovoltaic silicon wafers.

[0018] The present invention, by providing a moving unit, can push the touch plate with the help of the retractable end of the hydraulic rod to realize the rotation of the spring telescopic rod, so that the push block pushes the blocking block, so that the pretreated photovoltaic silicon wafers are moved to the second conveyor belt along with the material basket, thereby realizing the automatic unloading of the pretreated photovoltaic silicon wafers; by providing a processing mechanism, the input of too many mechanical grasping devices is avoided, the production cost is reduced, and the contact between the photovoltaic silicon wafers and the cleaning solution is accelerated, the pretreatment effect of the photovoltaic silicon wafers is optimized, and the pretreatment efficiency of the photovoltaic silicon wafers is improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 A top view of the pretreatment zone of the present invention; Figure 3 It is a schematic diagram of the cooperation between the material basket and the basket cover of the present invention; Figure 4 It is a three-dimensional schematic diagram of the separation of the positioning block, the first clamping block and the second clamping block of the present invention; Figure 5 is a three-dimensional schematic diagram of the special-shaped plate of the present invention; Figure 6 It is a three-dimensional schematic diagram of the horizontal groove and the vertical groove of the present invention; Figure 7 It is a three-dimensional schematic diagram of the guide column and the guide groove of the present invention; Figure 8 It is a cross-sectional schematic diagram of the friction roller and the silicone pad of the present invention; Fig. 9 It is a partial three-dimensional schematic diagram of the mobile unit of the present invention; Fig.10 It is a three-dimensional schematic diagram of the cooperation between the spiral groove and the short rod of the present invention.

[0020] In the figure: 1. main body; 11. pretreatment area; 12. cleaning area; 13. drying area; 14. first conveyor belt; 15. second conveyor belt; 16. third conveyor belt; 17. controller; 2. treatment mechanism; 21. soaking unit; 2101. support frame; 2102. hydraulic rod; 2103. basket cover; 2104. material basket; 2105. first telescopic rod; 2106. limit plate; 2107. first spring; 2108. special-shaped hole; 2109. leakage hole; 22. guide unit; 2201. horizontal groove; 2202. vertical groove; 2203. first guide rod; 2204. positioning block; 2205. first clamping hole; 2206. second clamping hole; 2207. first clamping block; 2208. second clamping block; 2209. second guide rod; 2210. electric push rod; 2211. guide block; 22 12. Clamping rod; 2213. Clamping slot; 2214. Rubber block; 2215. Extension plate; 2216. Special-shaped plate; 2217. L-shaped slot; 2218. Stopper; 2219. Stopper rod; 2220. Connecting rod; 2221. Roller; 2222. Tension spring; 2223. Friction roller; 2224. Silicone pad; 2225. Support plate; 2226. Guide ring; 2227. Guide column; 22 28. Guide groove; 23. Moving unit; 2301. Positioning plate; 2302. Rotating cylinder; 2303. Spiral groove; 2304. Connecting column; 2305. Short rod; 2306. Touch plate; 2307. Lifting plate; 2308. Spring telescopic rod; 2309. Push block; 2310. Block; 2311. Roller; 2312. Slide groove; 2313. Sliding column; 2314. Third spring. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0022] Example 1: Please refer to Figure 1-Figure 10The present invention provides a technical solution: a photovoltaic silicon wafer pretreatment cleaning machine, comprising a main body mechanism 1, the main body mechanism 1 comprises a pretreatment area 11, a cleaning area 12 is fixedly connected to one side of the pretreatment area 11, the cleaning area 12 is used to sequentially apply a cleaning solvent and spray cleaning to the soaked photovoltaic silicon wafers, a drying area 13 is fixedly connected to one side of the cleaning area 12, the drying area 13 is used to dry the cleaned photovoltaic silicon wafers, a first conveyor belt 14 is placed on one side of the pretreatment area 11, the first conveyor belt 14 is used to convey the unprocessed photovoltaic silicon wafers in baskets, the inner cavity of the pretreatment area 11 is rotatably connected with a second conveyor belt 15 and a third conveyor belt 16, the second conveyor belt 15 is used to transport and place the pretreated photovoltaic silicon wafers in baskets, the third conveyor belt 16 is used to convey the pretreated photovoltaic silicon wafers to the cleaning area 12, the outer side of the cleaning area 12 is fixedly connected with a controller 17, the controller 17 is used to control all power supplies, and the inner cavity of the pretreatment area 11 is provided with a processing mechanism 2; The processing mechanism 2 includes a soaking unit 21, which is disposed in the inner cavity of the pre-processing area 11 and is used for soaking the photovoltaic silicon wafer.

[0023] As a further limitation of the processing mechanism 2 of the present invention, the soaking unit 21 includes a support frame 2101, the opposite side of the support frame 2101 is fixedly connected to the outer surface of the pretreatment zone 11, the inner top of the support frame 2101 is fixedly connected to a hydraulic rod 2102, the telescopic end of the hydraulic rod 2102 is fixedly connected to a basket cover 2103, a material basket 2104 is placed on the top of the first conveyor belt 14, the basket cover 2103 is used in conjunction with the material basket 2104, the inner bottom of the pretreatment zone 11 is fixedly connected to a first telescopic rod 2105, the telescopic end of the first telescopic rod 2105 is fixedly connected to a limiting plate 2106, and the first telescopic rod 2105 A first spring 2107 is provided on the surface sliding sleeve, one end of the first spring 2107 is fixedly connected to the inner bottom of the pretreatment area 11, and the other end of the first spring 2107 is fixedly connected to the bottom of the limiting plate 2106; by setting the immersion unit 21, the photovoltaic silicon wafers can be limited in the material basket 2104 through the cooperation between the material basket 2104 and the basket cover 2103, and the photovoltaic silicon wafers in the basket can be moved vertically back and forth in the immersion solution with the help of the cooperation between the hydraulic rod 2102 and the first telescopic rod 2105, which accelerates the full contact between the immersion solvent and the single photovoltaic silicon wafer, thereby optimizing the pretreatment effect and improving the pretreatment efficiency.

[0024] A plurality of equidistantly arranged special-shaped holes 2108 are provided on the top of the basket cover 2103, and the special-shaped holes 2108 are used to increase the generation of bubbles. A plurality of equidistantly arranged leakage holes 2109 are provided on the bottom of the material basket 2104. By setting the special-shaped holes 2108 and the leakage holes 2109, the shape of the special-shaped holes 2108 is in accordance with the shape of the venturi tube, and the vertical movement of the material basket 2104 and the basket cover 2103 is coordinated, so that the soaking solution passes through the special-shaped holes 2108 and the leakage holes 2109, thereby increasing the generation of bubbles. In the process of the vertical movement of the material basket 2104, bubbles are generated and burst at the same time, and the burst bubbles can be generated. The bursting of bubbles is a rapid energy release process, and the gas in the bubbles quickly diffuses into the surrounding water to form an instantaneous local high-pressure area. This high-pressure area will propagate pressure waves to the surrounding waters, and has a higher frequency and energy, thereby increasing the effect of impacting the stains adhered to the surface of the photovoltaic silicon wafer.

[0025] The specific implementation of this embodiment is as follows: when cleaning photovoltaic silicon wafers, the user places the basket 2104 full of photovoltaic silicon wafers on the first conveyor belt 14, and after the basket 2104 is transported to the designated position by the first conveyor belt 14, the basket 2104 containing photovoltaic silicon wafers is guided to the top of the first telescopic rod 2105, that is, directly below the basket cover 2103, by the guide unit 22. At this time, the hydraulic rod 2102 is activated by the controller 17 to extend the telescopic end of the hydraulic rod 2102 downward, thereby driving the basket 2104 to move upward. The cover 2103 moves down to contact with the top of the material basket 2104. The inner top of the basket cover 2103 is fixedly connected with a rubber pad to achieve soft contact with the photovoltaic silicon wafers and protect the photovoltaic silicon wafers. Through the cooperation of the basket cover 2103 and the material basket 2104, the downward pressure of the hydraulic rod 2102 is transmitted to the limit piece 2106, the first telescopic rod 2105 and the first spring 2107, so that the first telescopic rod 2105 and the first spring 2107 are compressed. The elastic coefficient of the first spring 2107 is greater than that of the material basket 2104 and the photovoltaic silicon wafer collection. The total weight of the material basket 2104 is less than the pressing force of the hydraulic rod 2102. With the compression of the first telescopic rod 2105 and the first spring 2107, the photovoltaic silicon wafer follows the basket 2104 and the basket cover 2103 to immerse in the soaking solution. After being pressed down to a certain height, the telescopic end of the hydraulic rod 2102 is retracted upward by a certain distance. This distance is to ensure that the basket cover 2103 does not separate from the soaking solution. The vertical movement is repeated for a set number of times. During the vertical movement, the soaking solution passes through the special-shaped holes 2108 and the leakage holes 2109, which increases the generation of bubbles. During the vertical movement of the basket 2104, bubbles are generated and burst at the same time. The bubble burst is a rapid energy release process. The gas in the bubble quickly diffuses into the surrounding water to form an instantaneous local high-pressure area. This high-pressure area will propagate pressure waves to the surrounding waters with higher frequency and energy, thereby increasing the effect of impacting and disintegrating the stains adhered to the surface of the photovoltaic silicon wafer, thereby accelerating the full contact between the soaking solvent and the single photovoltaic silicon wafer, optimizing the pretreatment effect and improving the pretreatment efficiency.

[0026] Example 2: Please refer to Figure 1-Figure 10 The present invention provides a technical solution: a photovoltaic silicon wafer pretreatment cleaning machine. The present invention makes corresponding improvements to the technical problems mentioned in the background technology. The processing mechanism 2 includes a guide unit 22, which is arranged in the inner cavity of the pretreatment area 11. The guide unit 22 is used in conjunction with the soaking unit 21. The guide unit 22 is used to guide the photovoltaic silicon wafers in the basket.

[0027] As a further limitation of the treatment mechanism 2 of the present invention, the guide unit 22 includes a guide groove opened on the opposite side of the inner cavity of the pretreatment area 11, the guide groove includes a horizontal groove 2201 and a vertical groove 2202, the horizontal groove 2201 and the vertical groove 2202 are connected in an L shape, the inner cavities of the two guide grooves are slidably connected with a first guide rod 2203, the opposite ends of the two first guide rods 2203 are commonly fixedly connected with a positioning block 2204, and one side of the positioning block 2204 is provided with a first clamping hole 2205 and a second clamping hole 2206 The bottom of the material basket 2104 is fixedly connected with a first clamping block 2207, the surface of the first clamping block 2207 contacts the inner cavity of the first clamping hole 2205, the top of the limiting piece 2106 is fixedly connected with a second clamping block 2208, the surface of the second clamping block 2208 contacts the inner cavity of the second clamping hole 2206, and the second guide rods 2209 are fixedly connected on both sides of the second clamping block 2208, and the surface of the second guide rods 2209 is slidably connected to the inner cavity of the vertical groove 2202. Both sides of the pretreatment area 11 are The electric push rod 2210 is fixedly connected, and the telescopic end of the electric push rod 2210 is fixedly connected to a guide block 2211. One side of the guide block 2211 penetrates into the inner cavity of the pretreatment area 11. A hole is provided on the inner wall of the pretreatment area 11. The surface of the guide block 2211 is slidably connected to the inner cavity of the hole. The bottom of the guide block 2211 is fixedly connected to a clamping rod 2212. The surface of the first guide rod 2203 is provided with a clamping groove 2213 used in conjunction with the clamping rod 2212. The surface of the clamping rod 2212 is slidably connected to the inner cavity of the hole. The second guide rod 2209 is in contact with the inner cavity, and the upper surface of the second guide rod 2209 is fixedly connected with a rubber block 2214, which is used to reduce the impact force when the first guide rod 2203 falls into the vertical groove 2202; by setting the guide unit 22, it is possible to smoothly guide the photovoltaic silicon wafers to the bottom of the hydraulic rod 2102, thereby realizing automatic loading during pretreatment of the photovoltaic silicon wafers and guiding the photovoltaic silicon wafers during immersion, thereby ensuring the continuity of the pretreatment process and improving the pretreatment efficiency of the photovoltaic silicon wafers.

[0028] An extension plate 2215 is fixedly connected to the inner side of the pretreatment area 11, and a special-shaped plate 2216 is fixedly connected to one side of the extension plate 2215. An L-shaped groove 2217 is provided on the inner wall of the positioning block 2204, and a stopper 2218 is slidably connected to the inner cavity of the L-shaped groove 2217. A stopper rod 2219 is fixedly connected to one side of the material basket 2104, and one end of the stopper rod 2219 contacts one side of the stopper block 2218. The cooperation between the stopper rod 2219 and the stopper block 2218 To limit the maximum displacement of the material basket 2104, a connecting rod 2220 is fixedly connected to one side of the stopper 2218, and the connecting rod 2220 is slidably connected to the inner cavity of the L-shaped groove 2217. One end of the connecting rod 2220 is rotatably connected to a roller 2221 through a bearing, and the roller 2221 is rollingly connected to the surface of the special-shaped plate 2216. A tension spring 2222 is fixedly connected to the inner bottom of the L-shaped groove 2217, and one end of the tension spring 2222 is connected to the connecting rod 2220. The bottom is fixedly connected; by setting the extension plate 2215, the special-shaped plate 2216, the stopper 2218, the stopper rod 2219, the connecting rod 2220, the roller 2221 and the tension spring 2222, as the positioning block 2204 moves toward the direction of the first conveyor belt 14, the roller 2221 contacts the high point of the special-shaped plate 2216, so that the connecting rod 2220 rises a certain distance, and when the connecting rod 2220 rises, the tension spring 2222 is pulled. The material basket 2104 is extended, and the rise of the connecting rod 2220 causes the stop block 2218 to move upward in the inner cavity of the L-shaped groove 2217. The material basket 2104 follows the conveying of the first conveyor belt 14 and drives the stop rod 2219 to contact the stop block 2218, thereby limiting the moving distance of the material basket 2104 and preventing the material basket 2104 from moving excessively. The tension spring 2222 can reset the vertical displacement of the connecting rod 2220 when the roller 2221 moves to the lower part of the special-shaped plate 2216.

[0029] The inner bottom wall of the first clamping hole 2205 is rotatably connected to a plurality of friction rollers 2223 via a one-way bearing, and the surface of the friction roller 2223 is fixedly connected to a silicone pad 2224, and the surface of the friction roller 2223 contacts the bottom of the first clamping block 2207; by setting the one-way bearing, the friction roller 2223 and the silicone pad 2224, the material basket 2104 can be smoothly moved in the forward direction and blocked in the reverse direction, thereby ensuring the stability of the material basket 2104 after movement.

[0030] Support plates 2225 are fixedly connected to both sides of the pretreatment area 11, and a guide ring 2226 is fixedly sleeved on the surface of the telescopic end of the electric push rod 2210, and a guide column 2227 is fixedly connected to the lower surface of the guide ring 2226. A guide groove 2228 used in conjunction with the guide column 2227 is provided on the top of the support plate 2225, and the surface of the guide column 2227 is slidably connected to the inner cavity of the guide groove 2228; by setting the support plate 2225, the guide ring 2226, the guide column 2227 and the guide groove 2228, the guidance of the moving trajectory of the telescopic end of the electric push rod 2210 is achieved, and the stability of the telescopic end of the electric push rod 2210 during extension and retraction is increased.

[0031] The specific implementation method of this embodiment is as follows: when the material basket 2104 full of photovoltaic silicon wafers passes through the first conveyor belt 14 and moves to one end of the first clamping block 2207 and begins to embed into the first clamping hole 2205 on one side of the positioning block 2204, in the initial state, the positioning block 2204 is located at the position closest to the first conveyor belt 14. When one end of the first clamping block 2207 is embedded in the inner cavity of the first clamping hole 2205, the first clamping block 2207 will contact the first friction roller 2223 at the same time, pushing the friction roller 2223 to rotate. As the first clamping block 2207 continues to move, the first clamping block 2207 will successively contact all the friction rollers 2223. Since the friction roller 2223 is driven by a one-way bearing, the reverse rotation of the friction roller 2223 is locked to avoid The first card block 2207 is moved back, and the friction between the friction roller 2223 and the first card block 2207 is increased by the silicone pad 2224, thereby improving the stability of the first card block 2207 after it is embedded in the first card hole 2205. When the first card block 2207 is completely embedded in the first card hole 2205, before that, the stopper 2218 is raised to a certain height by the cooperation of the extension plate 2215, the special-shaped plate 2216, the stopper 2218, the connecting rod 2220, the roller 2221 and the tension spring 2222, so as to block the stopper 2219 on one side of the material basket 2104, thereby limiting the moving distance of the material basket 2104 and avoiding excessive movement of the material basket 2104. The two electric push rods 2210 are started by the controller 17, and the two electric push rods 2210 are started. The telescopic end of 210 is retracted, and the clamping rod 2212 is embedded in the inner cavity of the clamping groove 2213. As the telescopic end of the electric push rod 2210 is retracted, the guide block 2211 and the clamping rod 2212 are driven to move in the direction of the second clamping block 2208. The movement of the clamping rod 2212 drives the first guide rod 2203 to move, and the movement of the first guide rod 2203 drives the positioning block 2204 embedded with the first clamping block 2207 to move, thereby realizing the conveying of the material basket 2104 with the photovoltaic silicon wafers stacked thereon. When the first guide rod 2203 moves from the inner cavity of the horizontal groove 2201 to the entrance of the vertical groove 2202, the first guide rod 2203 moves to the top of the rubber block 2214. At the same time, the second clamping block 2208 is completely embedded in the inner cavity of the second clamping hole 2206, realizing the second clamping block 2 208 is engaged with the positioning block 2204. During the movement of the positioning block 2204, the roller 2221 is driven to move on the surface of the special-shaped plate 2216 until the roller 2221 moves to the lowest point of the special-shaped plate 2216. The reaction force of the tension spring 2222 causes the stopper 2218 to sink into the inner cavity of the L-shaped groove 2217, thereby canceling the obstruction of the stopper 2219. At this time, the hydraulic rod 2102 is driven to extend downward through the telescopic end of the hydraulic rod 2102 to press the material basket 2104 downward through the basket cover 2103. During the downward movement of the material basket 2104, the positioning block 2204 and the two first guide rods 2203 are driven downward. During the vertical movement, the first guide rod 2203 is guided by the vertical groove 2202. When the first guide rod 2203 moves downward,The clamping rod 2212 is separated from the inner cavity of the clamping slot 2213, and the downward movement of the positioning block 2204 pushes the second clamping block 2208 to move downward. There is a proper amount of friction between the second clamping block 2208 and the second clamping hole 2206, which ensures the stability of the engagement between the second clamping block 2208 and the second clamping hole 2206 when the basket 2104 moves vertically. The downward movement of the second clamping block 2208 simultaneously drives the second guide rod 2209 to move downward in the inner cavity of the vertical slot 2202, ensuring the stability of the second clamping block 2208 when moving vertically, thereby achieving the guidance of the basket 2104 containing photovoltaic silicon wafers during loading and soaking, ensuring the smooth progress of the pretreatment process, and improving the efficiency of photovoltaic silicon wafer pretreatment.

[0032] Example 3: Please refer to Figure 1-Figure 10 The present invention provides a technical solution: a photovoltaic silicon wafer pretreatment cleaning machine. The present invention makes corresponding improvements to the technical problems mentioned in the background technology. The processing mechanism 2 also includes a moving unit 23, which is arranged on the opposite side of the support frame 2101. The moving unit 23 is used in conjunction with the soaking unit 21 and the guide unit 22. The moving unit 23 is used to realize the transfer of the photovoltaic silicon wafer after the soaking is completed.

[0033] As a further limitation of the processing mechanism 2 of the present invention, the mobile unit 23 includes a positioning plate 2301 fixedly connected to the inner side of the support frame 2101, the number of the positioning plates 2301 is two, and the two positioning plates 2301 are arranged opposite to each other. The top of the positioning plate 2301 is rotatably connected to a rotating cylinder 2302 through a bearing, and a spiral groove 2303 is provided on the inner wall of the rotating cylinder 2302. A connecting column 2304 is slidably connected to the inner cavity of the rotating cylinder 2302. A short rod 2305 used in conjunction with the spiral groove 2303 is fixedly connected to the surface of the connecting column 2304. The surface of the short rod 2305 is slidably connected to the inner cavity of the spiral groove 2303. The top of the connecting column 2304 is fixedly connected to a touch plate 2306. The telescopic end of the hydraulic rod 2102 is fixedly connected to a lifting plate 2307. The top of the lifting plate 2307 is connected to the bottom of the touch plate 2306. The surface of the rotating cylinder 2302 is fixedly connected with a spring telescopic rod 2308, and the telescopic end of the spring telescopic rod 2308 is fixedly connected with a push block 2309. Both sides of the material basket 2104 are fixedly connected with blocks 2310. The push block 2309 is used to apply thrust to the block 2310. One end of the push block 2309 is rotatably connected with a roller 2311 through a rotating shaft, and the surface of the roller 2311 is in rolling contact with the surface of the material basket 2104. By setting up the moving unit 23, the telescopic end of the hydraulic rod 2102 can be retracted to push the touch plate 2306, so as to realize the rotation of the spring telescopic rod 2308 and make the push block 2309 push the block 2310, so that the pre-treated photovoltaic silicon wafers are moved to the second conveyor belt 15 together with the material basket 2104, thereby realizing the automatic unloading of the pre-treated photovoltaic silicon wafers.

[0034] Two relatively arranged sliding grooves 2312 are provided on the inner side of the support frame 2101, the surface of the touch plate 2306 is slidably connected to the inner cavity of the sliding groove 2312, the inner wall of the sliding groove 2312 is fixedly connected with a sliding column 2313, and the inner wall of the touch plate 2306 is slidably connected to the surface of the sliding column 2313; by setting the sliding groove 2312 and the sliding column 2313, the vertical displacement of the touch plate 2306 is guided, thereby increasing the stability of the touch plate 2306 during vertical displacement.

[0035] A third spring 2314 is fixedly connected to the inner bottom of the slide groove 2312, one end of the third spring 2314 is fixedly connected to the bottom of the touch plate 2306, and the third spring 2314 is slidably mounted on the surface of the slide rod; by setting the third spring 2314, when the touch plate 2306 moves upward, the third spring 2314 is stretched, and when the touch plate 2306 loses its lifting force, the reaction force of the third spring 2314 can achieve the resetting of the touch plate 2306.

[0036] The specific implementation of this embodiment is as follows: after the pretreatment of the photovoltaic silicon wafers is completed, the hydraulic rod 2102 drives the basket cover 2103 to move up to the initial height. At this time, the material basket 2104 containing the photovoltaic silicon wafers is located on the top of the first telescopic rod 2105, and the bottom of the material basket 2104 is flush with the top of the second conveyor belt 15. The controller 17 is used to control the telescopic end of the hydraulic rod 2102 to move up and retract, and at this time, the two lifting plates 2307 are driven to push the two touch plates 2306 from bottom to top, so that the touch plates 2306 move up, and the upward movement of the touch plates 2306 drives the connecting column 2304 to move up, and the upward movement of the connecting column 2304 drives the short rod 2305 to move up, and the cooperation between the short rod 2305 and the spiral groove 2303 makes the rotating cylinder 2302 rotate, and the rotation of the rotating cylinder 2302 drives the spring telescopic rod 2308 to rotate, and the rotation of the spring telescopic rod 2308 makes the push block 2309 and the blocking block 2310 contacts and generates thrust on the blocking block 2310. During the rotation of the push block 2309, it first contacts the side of the material basket 2104 through the roller 2311. The roller 2311 can reduce the friction between the push block 2309 and the material basket 2104. The setting of the spring telescopic rod 2308 ensures that the push block 2309 always keeps in contact with the blocking block 2310, thereby realizing the smooth pushing of the material basket 2104 and moving the material basket 2104 to the top of the second conveyor belt 15. When a part of the material basket 2104 contacts the second conveyor belt 15, the second conveyor belt 15 is started by the controller 17 to realize the fixed distance transportation of the material basket 2104, ensuring that the pre-treated photovoltaic silicon wafers can be stably placed on the top of the second conveyor belt 15. Subsequently, the photovoltaic silicon wafers are taken out manually or by external robotic arm equipment and placed on the third conveyor belt 16 for subsequent cleaning and drying.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0038] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A photovoltaic silicon wafer pretreatment cleaning machine, comprising a main body (1), the main body (1) comprising a pretreatment area (11), one side of the pretreatment area (11) is fixedly connected to a cleaning area (12), one side of the cleaning area (12) is fixedly connected to a drying area (13), one side of the pretreatment area (11) is placed with a first conveyor belt (14), the inner cavity of the pretreatment area (11) is rotatably connected to a second conveyor belt (15) and a third conveyor belt (16), the outer side of the cleaning area (12) is fixedly connected to a controller (17), the controller (17) is used to control all power supplies, and is characterized in that: The inner cavity of the pre-treatment area (11) is provided with a treatment mechanism (2); The processing mechanism (2) comprises a soaking unit (21), the soaking unit (21) being arranged in the inner cavity of the pre-processing area (11), and the soaking unit (21) being used to perform soaking processing on the photovoltaic silicon wafer; The processing mechanism (2) comprises a guiding unit (22), the guiding unit (22) being arranged in the inner cavity of the pre-processing area (11), the guiding unit (22) being used in conjunction with the soaking unit (21), and the guiding unit (22) being used to guide the photovoltaic silicon wafers in the basket; The processing mechanism (2) further comprises a moving unit (23), wherein the moving unit (23) is arranged on the opposite side of the support frame (2101), and the moving unit (23) is used in conjunction with the soaking unit (21) and the guiding unit (22), and the moving unit (23) is used to achieve the transfer of the photovoltaic silicon wafer after the soaking is completed.

2. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 1, characterized in that: The soaking unit (21) comprises a support frame (2101), the opposite side of the support frame (2101) is fixedly connected to the outer surface of the pretreatment zone (11), the inner top of the support frame (2101) is fixedly connected to a hydraulic rod (2102), the telescopic end of the hydraulic rod (2102) is fixedly connected to a basket cover (2103), a material basket (2104) is placed on the top of the first conveyor belt (14), the basket cover (2103) is used in conjunction with the material basket (2104), the inner bottom of the pretreatment zone (11) is fixedly connected to a first telescopic rod (2105), the telescopic end of the first telescopic rod (2105) is fixedly connected to a limiting plate (2106), a first spring (2107) is slidably sleeved on the surface of the first telescopic rod (2105), one end of the first spring (2107) is fixedly connected to the inner bottom of the pretreatment zone (11), and the other end of the first spring (2107) is fixedly connected to the bottom of the limiting plate (2106).

3. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 2, characterized in that: The top of the basket cover (2103) is provided with a plurality of equidistantly arranged irregular holes (2108), the irregular holes (2108) being used to increase the generation of bubbles, and the bottom of the material basket (2104) is provided with a plurality of equidistantly arranged leakage holes (2109).

4. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 2, characterized in that: The guide unit (22) comprises a guide groove opened on the opposite side of the inner cavity of the pretreatment area (11), the guide groove comprising a transverse groove (2201) and a vertical groove (2202), the transverse groove (2201) and the vertical groove (2202) being connected in an L shape, the inner cavities of the two guide grooves are both slidably connected to a first guide rod (2203), the opposite ends of the two first guide rods (2203) are commonly fixedly connected to a positioning block (2204), and one side of the positioning block (2204) is provided with a first clamping hole (2201). 205 and a second clamping hole (2206), the bottom of the material basket (2104) is fixedly connected with a first clamping block (2207), the surface of the first clamping block (2207) is in contact with the inner cavity of the first clamping hole (2205), the top of the limiting plate (2106) is fixedly connected with a second clamping block (2208), the surface of the second clamping block (2208) is in contact with the inner cavity of the second clamping hole (2206), and the second guide rods (2208) are fixedly connected on both sides of the second clamping block (2208). 209), the surface of the second guide rod (2209) is slidably connected to the inner cavity of the vertical groove (2202), both sides of the pretreatment area (11) are fixedly connected with electric push rods (2210), the telescopic end of the electric push rod (2210) is fixedly connected with a guide block (2211), one side of the guide block (2211) penetrates into the inner cavity of the pretreatment area (11), the inner wall of the pretreatment area (11) is provided with a hole, the surface of the guide block (2211) is slidably connected to the inner cavity of the hole, A clamping rod (2212) is fixedly connected to the bottom of the guide block (2211); a clamping groove (2213) used in conjunction with the clamping rod (2212) is provided on the surface of the first guide rod (2203); the surface of the clamping rod (2212) contacts the inner cavity of the clamping groove (2213); a rubber block (2214) is fixedly connected to the upper surface of the second guide rod (2209); the rubber block (2214) is used to reduce the impact force when the first guide rod (2203) falls into the vertical groove (2202).

5. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 4, characterized in that: An extension plate (2215) is fixedly connected to the inner side of the pretreatment area (11), a special-shaped plate (2216) is fixedly connected to one side of the extension plate (2215), an L-shaped groove (2217) is provided on the inner wall of the positioning block (2204), a stopper (2218) is slidably connected to the inner cavity of the L-shaped groove (2217), a stopper (2219) is fixedly connected to one side of the material basket (2104), one end of the stopper (2219) is in contact with one side of the stopper (2218), and the cooperation between the stopper (2219) and the stopper (2218) is realized. Now, for limiting the maximum displacement of the material basket (2104), a connecting rod (2220) is fixedly connected to one side of the stopper (2218), and the connecting rod (2220) is slidably connected to the inner cavity of the L-shaped groove (2217). One end of the connecting rod (2220) is rotatably connected to a roller (2221) through a bearing, and the roller (2221) is rollingly connected to the surface of the special-shaped plate (2216). A tension spring (2222) is fixedly connected to the inner bottom of the L-shaped groove (2217), and one end of the tension spring (2222) is fixedly connected to the bottom of the connecting rod (2220).

6. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 4, characterized in that: The inner bottom wall of the first clamping hole (2205) is rotatably connected to a plurality of friction rollers (2223) via a one-way bearing, the surfaces of the friction rollers (2223) are fixedly connected to silicone pads (2224), and the surfaces of the friction rollers (2223) are in contact with the bottom of the first clamping block (2207).

7. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 4, characterized in that: Support plates (2225) are fixedly connected to both sides of the pretreatment area (11); a guide ring (2226) is fixedly sleeved on the surface of the telescopic end of the electric push rod (2210); a guide column (2227) is fixedly connected to the lower surface of the guide ring (2226); a guide groove (2228) for use with the guide column (2227) is formed on the top of the support plate (2225); and the surface of the guide column (2227) is slidably connected to the inner cavity of the guide groove (2228).

8. The photovoltaic silicon wafer pretreatment cleaning machine according to claim 4, characterized in that: The mobile unit (23) comprises a positioning plate (2301) fixedly connected to the inner side of the support frame (2101), the number of the positioning plates (2301) is two, the two positioning plates (2301) are arranged opposite to each other, the top of the positioning plate (2301) is rotatably connected to a rotating cylinder (2302) via a bearing, the inner wall of the rotating cylinder (2302) is provided with a spiral groove (2303), the inner cavity of the rotating cylinder (2302) is slidably connected to a connecting column (2304), the surface of the connecting column (2304) is fixedly connected to a short rod (2305) used in conjunction with the spiral groove (2303), the surface of the short rod (2305) is slidably connected to the inner cavity of the spiral groove (2303), the top of the connecting column (2304) is fixedly connected to the inner cavity of the spiral groove (2303), the surface of the short rod (2305) is slidably connected to the inner cavity of the spiral groove (2303), and the top of the connecting column (2304) is fixedly connected to the inner cavity of the spiral groove (2303). The rotating cylinder (2302) is fixedly connected with a touch plate (2306), the telescopic end of the hydraulic rod (2102) is fixedly connected with a lifting plate (2307), the top of the lifting plate (2307) is in contact with the bottom of the touch plate (2306), the surface of the rotating cylinder (2302) is fixedly connected with a spring telescopic rod (2308), the telescopic end of the spring telescopic rod (2308) is fixedly connected with a push block (2309), both sides of the material basket (2104) are fixedly connected with a blocking block (2310), the pushing block (2309) is used to apply a thrust to the blocking block (2310), one end of the pushing block (2309) is rotatably connected with a roller (2311) via a rotating shaft, and the surface of the roller (2311) is in rolling contact with the surface of the material basket (2104).

9. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 8, characterized in that: The inner side of the support frame (2101) is provided with two slide grooves (2312) arranged opposite to each other, the surface of the touch plate (2306) is slidably connected to the inner cavity of the slide groove (2312), the inner wall of the slide groove (2312) is fixedly connected with a slide column (2313), and the inner wall of the touch plate (2306) is slidably connected to the surface of the slide column (2313).

10. A photovoltaic silicon wafer pretreatment cleaning machine according to claim 9, characterized in that: A third spring (2314) is fixedly connected to the inner bottom of the slide groove (2312), one end of the third spring (2314) is fixedly connected to the bottom of the touch plate (2306), and the third spring (2314) is slidably sleeved on the surface of the slide rod.

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