Adsorption fixing device for monocrystalline silicon electrode

Abstract

The invention discloses an adsorption fixing device for a monocrystalline silicon electrode. The adsorption fixing device comprises an adsorption disc and an air suction assembly, an adsorption hole is formed in the adsorption disc, the adsorption disc is provided with a bearing surface for bearing a monocrystalline silicon electrode, an annular adsorption groove is formed in the bearing surface, and the adsorption groove is connected with the adsorption hole; the air suction assembly is communicated with the adsorption hole and is used for sucking air in the adsorption groove for the adsorption hole. The monocrystalline silicon electrode is fixed in an adsorption fixing mode, the monocrystalline silicon electrode does not need to be clamped by a clamp, and the surface of the monocrystalline silicon electrode can be prevented from being scratched when the monocrystalline silicon electrode is clamped by the clamp.

Description

Technical Field

[0001] The present application relates to the field of semiconductor technology, and in particular to an adsorption and fixing device for a single crystal silicon electrode. Background Art

[0002] During the production and processing of single crystal silicon electrodes, in order to prevent the single crystal silicon electrodes from moving due to factors such as vibration during processing and causing processing errors, a fixing device is usually used to fix the single crystal silicon electrodes.

[0003] However, in the related art, a clamp is usually used to fix the single crystal silicon electrode, and the clamp is likely to scratch the surface of the single crystal silicon electrode when clamping the single crystal silicon electrode. Summary of the invention

[0004] The present application provides an adsorption and fixing device for a single crystal silicon electrode, which fixes the single crystal silicon electrode by adsorption, without the need to use a clamp to clamp the single crystal silicon electrode, thereby preventing the clamp from scratching the surface of the single crystal silicon electrode when clamping the single crystal silicon electrode.

[0005] The present application provides an adsorption and fixing device for a single crystal silicon electrode, comprising:

[0006] An adsorption plate, wherein an adsorption hole is provided on the adsorption plate, the adsorption plate has a bearing surface for bearing a single crystal silicon electrode, an annular adsorption groove is provided on the bearing surface, and the adsorption groove is connected to the adsorption hole;

[0007] An air suction component is communicated with the adsorption hole, and the air suction component is used to absorb air in the adsorption groove for the adsorption hole.

[0008] In some embodiments of the present application, a plurality of adsorption grooves are provided, and the plurality of adsorption grooves are spaced apart from the inside to the outside.

[0009] In some embodiments of the present application, it is characterized in that a first groove is provided between two adjacent adsorption grooves, and the first groove extends along the circumference of the adsorption groove and is arranged at intervals with the adsorption groove.

[0010] In some embodiments of the present application, it is characterized in that a second groove is provided in the central area of ​​the adsorption plate, and the adsorption groove is provided around the second groove and is spaced apart from the second groove.

[0011] In some embodiments of the present application, a protrusion structure is provided on the bottom wall surface of the adsorption groove, and the adsorption hole is provided on the side of the protrusion structure away from the bottom wall surface of the adsorption groove, and the adsorption hole is located in the adsorption groove.

[0012] In some embodiments of the present application, the protruding structure extends along the circumference of the adsorption groove to separate the adsorption groove into a first groove body located inside the protruding structure and a second groove body located outside the protruding structure.

[0013] In some embodiments of the present application, the adsorption plate is made of aluminum or aluminum alloy.

[0014] In some embodiments of the present application, the adsorption plate includes: a support platform; a boss, the boss is arranged on the support platform and protrudes from the support platform, and the side surface of the boss away from the support platform is the bearing surface.

[0015] In some embodiments of the present application, the suction component includes: an exhaust pipe, which is located in the adsorption plate; an exhaust pump, which is arranged back to back with the supporting surface and connected to the adsorption plate, and the exhaust pump is connected to the adsorption hole through the exhaust pipe to provide adsorption force for the adsorption hole.

[0016] In some embodiments of the present application, a vent hole is provided on the outer peripheral side of the adsorption disk, the vent hole is connected to the adsorption hole through the exhaust pipe, and a detachable sealing plug is provided at the vent hole, and the sealing plug is used to seal the vent hole.

[0017] The beneficial effects of the present application are as follows: when it is necessary to fix the single crystal silicon electrode, the single crystal silicon electrode can be placed on the bearing surface of the adsorption disk, and the adsorption disk is used to provide support for the single crystal silicon electrode. After the position of the single crystal silicon electrode is adjusted so that the single crystal silicon electrode covers the adsorption groove and fits the bearing surface, an air suction component is used to absorb the air in the adsorption groove through the adsorption hole, thereby generating a negative pressure in the adsorption groove, thereby providing an adsorption force for the single crystal silicon electrode, so that the single crystal silicon electrode can be stably fixed on the bearing surface. By fixing the single crystal silicon electrode by the adsorption force, there is no need to use a clamp to clamp the single crystal silicon electrode, and the clamp can avoid the single crystal silicon electrode from being damaged when clamping the single crystal silicon electrode. The electrode surface is scratched, which improves the yield rate. After the processing is completed, the suction component stops suctioning, and the suction force of the suction tank on the single crystal silicon electrode disappears. Then the single crystal silicon electrode can be removed from the carrying surface. The fast and stable adsorption method greatly shortens the installation and fixing time of the single crystal silicon electrode, and can realize fast loading and unloading operations, thereby improving the production efficiency of the single crystal silicon electrode, reducing the labor intensity of workers, and improving the comfort of work. The uniform adsorption force can ensure that the single crystal silicon electrode has a high flatness and maintains good position accuracy during the processing, thereby reducing processing errors and improving product quality. In addition, compared with setting a plurality of grid-distributed exhaust grooves on the bearing surface of the adsorption disk, using the exhaust grooves to fit the single crystal silicon electrode and provide adsorption force, it is necessary to set an annular sealing strip between the bearing surface and the single crystal silicon electrode to ensure sealing and adsorption force. The formation and removal of the sealing strip both take a long time, which reduces the processing efficiency. In addition, for the single crystal silicon electrode with holes, the through hole on the single crystal silicon electrode is easily connected to the exhaust groove, resulting in pressure relief and failure to effectively adsorb the single crystal silicon electrode. In the present application, by setting an annular adsorption groove, the adsorption area of ​​the adsorption disk can be increased, thereby effectively ensuring that the adsorption disk is able to adsorb the single crystal silicon electrode. The adsorption force of the electrode can be enhanced, and the peripheral side of the single crystal silicon electrode can be adsorbed, so that the single crystal silicon electrode is fixed on the adsorption disk more stably and firmly, so that there is no need to set a ring-shaped sealing strip between the bearing surface and the single crystal silicon electrode, and there is no need to form and clean the sealing strip. The adsorption groove can more easily avoid the through hole on the single crystal silicon electrode, so that the single crystal silicon electrode with a through hole can be better adsorbed. In addition, the adsorption fixing device can be reused many times, is not prone to wear and debris residue, can improve processing efficiency and reduce production costs, and can reduce energy consumption in the production process at the same time, which is conducive to energy conservation and emission reduction, and is easier to integrate with automated production lines. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the related technologies, the drawings required for use in the embodiments or the related technical descriptions are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0019] Figure 1 This is a schematic diagram of the structure of an adsorption and fixing device in one embodiment of the present application;

[0020] Figure 2 This is a schematic diagram of the structure of a single crystal silicon electrode and an adsorption fixing device in one embodiment of the present application;

[0021] Figure 3 for Figure 2 Schematic diagram of some structures in .

[0022] Reference numerals:

[0023] 10. Adsorption plate; 111. Adsorption hole; 112. Vent hole; 12. Carrying surface; 13. Adsorption groove; 14. First groove; 15. Second groove; 16. Protruding structure; 17. Support platform; 18. Boss; 19. Accommodating groove; 20. Air suction component; 21. Exhaust pipe; 211. Main pipe; 212. Branch pipe; 22. Exhaust pump; 30. Monocrystalline silicon electrode. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical solution and advantages of the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0025] The present application provides an adsorption and fixing device for a single crystal silicon electrode to solve the technical problem in the related art that a clamp is usually used to fix the single crystal silicon electrode, and the clamp is prone to scratching the surface of the single crystal silicon electrode when clamping the single crystal silicon electrode.

[0026] Specifically, Figures 1 to 3 As shown, the adsorption fixing device includes an adsorption plate 10 and an air suction component 20; the adsorption plate 10 is provided with an adsorption hole 111, the adsorption plate 10 has a bearing surface 12 for supporting a single crystal silicon electrode 30, and an annular adsorption groove 13 is provided on the bearing surface 12, the adsorption groove 13 is connected to the adsorption hole 111, and the adsorption groove 13 can be a circular ring groove, a square ring groove or other shapes; the air suction component 20 is connected to the adsorption hole 111, and the air suction component 20 is used to absorb the air in the adsorption groove 13 for the adsorption hole 111.

[0027] It can be understood that in the present application, when it is necessary to fix the single crystal silicon electrode 30, the single crystal silicon electrode 30 can be placed on the bearing surface 12 of the adsorption disk 10, and the adsorption disk 10 is used to provide support for the single crystal silicon electrode 30. After adjusting the position of the single crystal silicon electrode 30 so that the single crystal silicon electrode 30 covers the adsorption groove 13 and fits the bearing surface 12, the suction component 20 is used to absorb the air in the adsorption groove 13 through the adsorption hole 111, thereby generating a negative pressure in the adsorption groove 13, thereby providing an adsorption force for the single crystal silicon electrode 30, so that the single crystal silicon electrode 30 can be stably fixed on the bearing surface 12. By fixing the single crystal silicon electrode 30 by the adsorption force, there is no need to use a clamp to clamp the single crystal silicon electrode 30, which can avoid the clamp being clamped in the clamp. When the single crystal silicon electrode 30 is held, scratches are caused on the surface of the single crystal silicon electrode 30, thereby improving the yield rate. After the processing is completed, the suction component 20 stops suctioning, and the suction force of the suction groove 13 on the single crystal silicon electrode 30 disappears, and then the single crystal silicon electrode 30 can be removed from the carrying surface 12. The fast and stable adsorption method greatly shortens the installation and fixing time of the single crystal silicon electrode 30, and can realize fast loading and unloading operations, thereby improving the production efficiency of the single crystal silicon electrode 30, reducing the labor intensity of workers, and improving work comfort. The uniform adsorption force can ensure that the single crystal silicon electrode 30 has a high flatness and maintains good position accuracy during the processing, thereby reducing processing errors and improving product quality.

[0028] In addition, compared with setting a plurality of grid-distributed exhaust grooves on the bearing surface 12 of the adsorption plate 10, and using the exhaust grooves to fit the single crystal silicon electrode 30 and provide adsorption force, it is necessary to set an annular sealing strip between the bearing surface 12 and the single crystal silicon electrode 30 to ensure sealing and adsorption force. The formation and removal of the sealing strip both take a long time, which reduces the processing efficiency. Moreover, for the single crystal silicon electrode 30 with holes, the through hole on the single crystal silicon electrode 30 is easily connected to the exhaust groove, resulting in pressure relief and inability to effectively adsorb the single crystal silicon electrode 30. In the present application, by setting an annular adsorption groove 13, the adsorption area of ​​the adsorption plate 10 can be increased, thereby effectively ensuring the adsorption force of the adsorption plate 10 on the single crystal silicon electrode 30. , and the surrounding side of the single crystal silicon electrode 30 can be adsorbed, so that the single crystal silicon electrode 30 is fixed on the adsorption disk 10 more stably and firmly, so there is no need to set a ring-shaped sealing strip between the bearing surface 12 and the single crystal silicon electrode 30, and there is no need to form and clean the sealing strip, and the adsorption groove 13 is easier to avoid the through hole on the single crystal silicon electrode 30 (for example, the adsorption groove 13 is placed on the inside or outside of the through hole), so that the single crystal silicon electrode 30 with a through hole can be better adsorbed. In addition, the adsorption and fixing device can be reused many times, is not prone to wear and debris residue, can improve processing efficiency and reduce production costs, and at the same time can reduce energy consumption in the production process, help to achieve energy conservation and emission reduction, and is easier to integrate with automated production lines.

[0029] In some embodiments, the adsorption grooves 13 are provided with a plurality of them, and the plurality of adsorption grooves 13 are distributed in sequence from the inside to the outside. It is understandable that when the workpiece is adsorbed and fixed on the bearing surface 12, the portion of the workpiece corresponding to the adsorption groove 13 is in a suspended state. The larger the groove width of a single adsorption groove 13, the larger the area of ​​the suspended portion corresponding to the single adsorption groove 13 on the workpiece, and the adsorption force easily causes the fragile and thin workpiece to break; and in the present application, by providing a plurality of adsorption grooves 13, on the basis of increasing the adsorption area of ​​the adsorption disk 10 to increase the adsorption force on the workpiece, the groove width of a single adsorption groove 13 can be designed to be smaller, thereby preventing the adsorption force from causing the fragile and thin workpiece to break. It should also be noted that the number of adsorption grooves 13 can be 2, 3 or more, which can be selected according to actual needs, and the groove width of the adsorption groove 13 can also be selected according to actual needs; the number of adsorption holes 111 can be the same as the number of adsorption grooves 13, or it can be greater than the number of adsorption grooves 13, and one adsorption groove 13 is connected to at least one adsorption hole 111.

[0030] Among them, a first groove 14 is arranged between two adjacent adsorption grooves 13, and the first groove 14 extends along the circumference of the adsorption groove 13, and is arranged at intervals with the adsorption groove 13; it can be understood that when the workpiece is adsorbed and fixed on the bearing surface 12, the workpiece will cover the first groove 14, and the part of the workpiece corresponding to the first groove 14 is also in a suspended state and will not contact the bearing surface 12, thereby reducing the contact area between the workpiece and the bearing surface 12, and preventing the friction between the bearing surface 12 and the workpiece from causing wear to the workpiece. In addition, the first groove 14 can also reduce the material and overall weight of the adsorption plate 10, thereby reducing the production cost of the adsorption plate 10.

[0031] In some embodiments, a second groove 15 is provided in the central area of ​​the adsorption disk 10, and the adsorption groove 13 is provided around the second groove 15 and is spaced apart from the second groove 15. When the workpiece is adsorbed and fixed on the bearing surface 12, the workpiece will cover the second groove 15, and the portion of the workpiece corresponding to the second groove 15 is also in a suspended state and will not contact the bearing surface 12, thereby further reducing the contact area between the workpiece and the bearing surface 12, preventing the friction between the bearing surface 12 and the workpiece from causing wear to the workpiece. In addition, the second groove 15 can also reduce the material and overall weight of the adsorption disk 10, thereby reducing the production cost of the adsorption disk 10.

[0032] It should also be noted that, taking the innermost adsorption groove 13 among the multiple adsorption grooves 13 as the first adsorption groove 13 as an example, the first adsorption groove 13 is arranged around the second groove 15, and is spaced apart from the second groove 15, the adsorption groove 13 adjacent to the first adsorption groove 13 is the second adsorption groove 13, the second adsorption is arranged around the outer side of the first adsorption groove 13, and is spaced apart from the first adsorption groove 13, and the first groove 14 is arranged between the second adsorption groove 13 and the first adsorption groove 13.

[0033] Continue to see Figures 1 to 3 As shown, in some embodiments of the present application, a protruding structure 16 is provided on the bottom wall surface of the adsorption groove 13, and the adsorption hole 111 is provided on the side of the protruding structure 16 away from the bottom wall surface of the adsorption groove 13, and the adsorption hole 111 is located in the adsorption groove 13. It should be noted that by providing the protruding structure 16 in the adsorption groove 13 and providing the adsorption hole 111 on the protruding groove, when the single crystal silicon electrode 30 is placed on the bearing surface 12, the distance between the adsorption hole 111 and the single crystal silicon electrode 30 is smaller, and the adsorption hole 111 can be used to directly provide adsorption force for the OEM workpiece, thereby further improving the adsorption force on the single crystal silicon electrode 30. Among them, the adsorption hole 111 is located in the adsorption groove 13, which means that the distance between the adsorption hole 111 and the bottom wall surface of the adsorption groove 13 is smaller than the distance between the bearing surface 12 and the bottom wall surface of the adsorption groove 13, so that the adsorption hole 111 can be hidden in the adsorption groove 13.

[0034] Furthermore, the protrusion structure 16 extends along the circumference of the adsorption groove 13 to separate the adsorption groove 13 into a first groove body located on the inner side of the protrusion structure 16 and a second groove body located on the outer side of the protrusion structure 16, which can reduce the volume of the adsorption groove 13, so that the adsorption hole 111 can empty the air in the adsorption groove 13 more quickly and provide greater adsorption force.

[0035] In some embodiments, the adsorption plate 10 is made of aluminum or aluminum alloy. The adsorption plate 10 made of aluminum or aluminum alloy has sufficient structural strength to provide stable support for the single crystal silicon electrode 30. At the same time, compared with steel, aluminum and aluminum alloy are softer, and are easier to process and trim, so that the single crystal silicon electrode 30 is less damaged when it collides and rubs against the adsorption plate 10, thereby reducing the scrap rate of the single crystal silicon electrode 30.

[0036] Specifically, the suction plate 10 includes a support platform 17 and a boss 18, wherein the boss 18 is arranged on the support platform 17 and protrudes from the support platform 17, and the side of the boss 18 away from the support platform 17 is the bearing surface 12. It can be understood that the boss 18 is used to carry the workpiece, and the boss 18 and the support platform 17 will form a stepped structure. When placing the single crystal silicon electrode 30, if the edge of the single crystal silicon electrode 30 extends from the edge of the boss 18, the edge of the single crystal silicon electrode 30 can be in a suspended state, and the worker can push the single crystal silicon electrode 30 to move it to the boss 18. After the processing is completed, the worker can first move the single crystal silicon electrode 30, so that the edge of the single crystal silicon electrode 30 extends from the edge of the boss 18, and then lift the single crystal silicon electrode 30, so that the single crystal silicon electrode 30 can be taken and placed more conveniently. Among them, the support platform 17 and the bump can be formed in one piece, or they can be formed separately and then spliced ​​by welding, clamping, screw connection or other methods.

[0037] In some embodiments, the suction component 20 includes an exhaust pipe 21 and an exhaust pump 22; the exhaust pipe 21 is located in the adsorption plate 10, so that the extraction pipe can be hidden in the adsorption plate 10, which can reduce the overall volume of the adsorption fixing device and prevent the single crystal silicon electrode 30 from colliding with the extraction pipe; the extraction pump is arranged back to back to the supporting surface 12 and is connected to the adsorption plate 10, and the exhaust pump 22 is connected to the adsorption hole 111 through the exhaust pipe 21 to provide suction for the adsorption hole 111. When the extraction pump is started, it can absorb the air in the adsorption groove 13 through the adsorption hole 111, thereby providing adsorption force for the single crystal silicon electrode 30. The extraction pump can be a vacuum pump.

[0038] In some embodiments, a receiving groove 19 is disposed on the adsorption disk 10 , and the receiving groove 19 is disposed opposite to the bearing surface 12 . The extraction pump can be disposed in the receiving groove 19 to further reduce the overall volume of the adsorption fixing device.

[0039] In some embodiments, a vent hole 112 is provided on the outer peripheral side of the adsorption disk 10, and the vent hole 112 is connected to the adsorption hole 111 through the exhaust pipe 21. A detachable sealing plug is provided at the vent hole 112, and the sealing plug is used to seal the vent hole 112. It can be understood that when the single crystal silicon electrode 30 is adsorbed and fixed, the vent hole 112 can be plugged with a sealing plug to seal the vent hole 112 to prevent pressure relief during the exhaust process. When the processing is completed, the sealing plug can be removed, and the outside air can enter the adsorption tank 13 through the vent hole 112 and the extraction pipe, and the negative pressure state in the adsorption tank 13 is released. Then, the single crystal silicon electrode 30 can be separated from the bearing surface 12, so that the single crystal silicon electrode 30 can be removed faster, thereby further improving the processing efficiency.

[0040] Specifically, the exhaust pipe 21 may include a main pipe 211 and a branch pipe 212, one end of the main pipe 211 is connected to the exhaust pump 22, the other end of the main pipe 211 is connected to the vent hole 112, one end of the branch pipe 212 is connected to the main pipe 211, the other end of the branch pipe 212 is connected to the adsorption hole 111, the number of the branch pipes 212 is the same as the number of the adsorption holes 111, and the branch pipes 212 correspond to the adsorption holes 111 one by one.

[0041] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A device for adsorbing and fixing a single crystal silicon electrode, characterized in that: include: An adsorption plate, wherein an adsorption hole is provided on the adsorption plate, the adsorption plate has a bearing surface for bearing a single crystal silicon electrode, an annular adsorption groove is provided on the bearing surface, and the adsorption groove is connected to the adsorption hole; An air suction component is communicated with the adsorption hole, and the air suction component is used to absorb air in the adsorption groove for the adsorption hole.

2. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: A plurality of adsorption grooves are provided, and the plurality of adsorption grooves are sequentially spaced and distributed from the inside to the outside.

3. The adsorption and fixing device for a single crystal silicon electrode according to claim 2, characterized in that: A first groove is arranged between two adjacent adsorption grooves. The first groove extends along the circumference of the adsorption groove and is arranged at intervals from the adsorption groove.

4. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: A second groove is arranged in the central area of ​​the adsorption plate, and the adsorption grooves are arranged around the second groove and are spaced apart from the second groove.

5. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: A protrusion structure is arranged on the bottom wall surface of the adsorption groove, and the adsorption hole is arranged on a side of the protrusion structure away from the bottom wall surface of the adsorption groove, and the adsorption hole is located in the adsorption groove.

6. The adsorption and fixing device for a single crystal silicon electrode according to claim 5, characterized in that: The protruding structure extends along the circumference of the adsorption groove to separate the adsorption groove into a first groove body located inside the protruding structure and a second groove body located outside the protruding structure.

7. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: The adsorption disk is made of aluminum or aluminum alloy.

8. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: The adsorption disk comprises: Support table; The boss is arranged on the support platform and protrudes from the support platform, and the side surface of the boss away from the support platform is the bearing surface.

9. The adsorption and fixing device for a single crystal silicon electrode according to claim 1, characterized in that: The air intake assembly comprises: An air extraction pipe, the air extraction pipe is located in the adsorption disk; An air pump is disposed opposite to the bearing surface and connected to the adsorption plate. The air pump is connected to the adsorption hole through the air suction pipe to provide adsorption force for the adsorption hole.

10. The adsorption and fixing device for a single crystal silicon electrode according to claim 9, characterized in that: A vent hole is arranged on the outer peripheral side of the adsorption disk, and the vent hole is connected to the adsorption hole through the exhaust pipe. A detachable sealing plug is arranged at the vent hole, and the sealing plug is used to seal the vent hole.

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