Silicon wafer open washing device for semiconductor production

Abstract

The invention discloses a silicon wafer open washing device for semiconductor production, and particularly relates to the technical field of semiconductor material production, the silicon wafer open washing device comprises a washing frame, a washing box and a silicon wafer, the washing box is used for open washing of the silicon wafer, a moving frame moving up and down is installed at the top end of the washing frame, and a sliding seat is slidably connected in the moving frame; the sliding seat is provided with two symmetrical positioning blocks and a flexible assembly, and the flexible assembly is used for keeping elastic contact between the two positioning blocks and the silicon crystal piece and moving the silicon crystal piece at the limited part between the two positioning blocks, so that elastic contact between the connecting seat and the silicon crystal piece can be kept through the arrangement of the flexible assembly; and the silicon wafer is moved at the limited part in the positioning block, so that the shielded part of the silicon wafer in the positioning block is replaced, the cleaning difficulty of the silicon wafer is reduced, and the cleaning efficiency of the equipment on the silicon wafer is improved.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor material production, and in particular to a silicon wafer flat washing device for semiconductor production. Background Art

[0002] Semiconductor is a substance between conductor and non-conductor. Semiconductor materials are generally used to make various chips. Wafers are extracted from silicon materials, and then after the wafers are divided, transistors are etched on the wafers using equipment such as photolithography machines, so that they can be used as electronic component chips. In various stages of silicon wafer manufacturing, such as deposition, removal, patterning and electrical property changes, cleaning is an indispensable step to ensure the smooth progress of subsequent processes. Since silicon wafers may be exposed to various external media during the manufacturing process, such as dust in the environment, chemical residues used in processing, human sebum and sweat, etc., these media may It will cause pollution, therefore, a flat washing device is needed to clean the silicon wafer, so as to ensure the high performance and high reliability of the device; currently in the flat washing process of silicon wafers, a positioner in the device is needed to clamp and restrict the silicon wafer to ensure that the silicon wafer can remain stably clean. When the positioner clamps the silicon wafer, part of the silicon wafer is blocked in the positioner, resulting in the need to remove the silicon wafer after cleaning, and then reinstall the silicon wafer on the positioner in the equipment. Therefore, the difficulty of cleaning the silicon wafer is increased, the speed of cleaning the silicon wafer is affected, and the cleaning efficiency of the equipment for the silicon wafer is reduced. Summary of the invention

[0003] The object of the present invention is to provide a silicon wafer flat cleaning device for semiconductor production to solve the above-mentioned shortcomings in the technology.

[0004] In order to achieve the above-mentioned object, the present invention provides the following technical solutions: a silicon wafer flat washing device for semiconductor production, comprising a cleaning rack, a cleaning box and a silicon crystal piece, wherein the cleaning box is used to flat wash the silicon crystal piece, a moving rack that moves up and down is installed on the top of the cleaning rack, a slide seat is slidably connected inside the moving rack, two symmetrical positioning blocks are provided on the slide seat, and the two positioning blocks are used to clamp the silicon crystal piece and keep the silicon crystal piece in position in the cleaning box;

[0005] The flexible component is used to maintain elastic contact between the two positioning blocks and the silicon crystal piece, and to move the silicon crystal piece at the restricted position between the two positioning blocks. The flexible component includes two connecting seats slidably connected to the two positioning blocks and a pushing arc plate arranged under the two positioning blocks and cooperating with the silicon crystal piece, and the pushing arc plate is used to push the silicon crystal piece to move upward between the two positioning blocks. A point contact component for connection is arranged between the sliding seat and the two positioning blocks, and the point contact component is used to drive the two positioning blocks and the two connecting seats to clamp the silicon crystal piece at two points. A sliding groove is opened in the positioning block, and a guide column is installed in the connecting seat, and one end of the guide column extends into the sliding groove and is connected to a contact plate, and the contact plate is slidably connected in the sliding groove, and a support spring is installed between the contact plate and the sliding groove, and the positioning block A tensioning assembly is provided on one side, and the tensioning assembly is used to adjust the extrusion force between the connecting seat and the silicon crystal piece. A supporting assembly for connection is provided between the sliding seat and the contact assembly, and the supporting assembly is used to drive the contact assembly and the silicon crystal piece to swing in the cleaning box, and drive the arc plate to maintain an inclined contact with the silicon crystal piece, so that the silicon crystal piece can move stably along the two positioning blocks; and the connecting seat can maintain a stable fit with the silicon crystal piece, and the connecting seat maintains an elastic contact with the silicon crystal piece under the elastic action of the supporting spring, reducing the hard contact between the silicon crystal piece and the positioning block, avoiding damage to the silicon crystal piece due to excessive pressure, and at the same time, the elastic contact between the connecting seat and the silicon crystal piece is used to maintain stability between each other without being too tight, ensuring that the silicon crystal piece can be clamped and moved in the connecting seat.

[0006] Preferably, the tensioning assembly includes a connecting ring fixedly connected to an end of the support spring away from the contact plate and a threaded groove opened on one side of the positioning block and communicating with the inside of the slide groove, wherein an adjusting stud is threaded in the threaded groove, and one end of the adjusting stud extends into the slide groove and is rotatably connected to one end of the connecting ring; and the connecting ring is slidably connected to the slide groove, and the adjusting stud moves along the slide groove to push the connecting ring to move synchronously, so that the tension of the support spring between the connecting ring and the contact plate is adjusted, and then the support spring tension adjustment is used to synchronously adjust the extrusion force of the contact between the connecting seat and the silicon crystal part, thereby avoiding that excessive spring tension of the support spring may excessively push the connecting seat, causing hard pressure between the connecting seat and the silicon crystal part and causing damage, and too small tension cannot ensure a good fit between the connecting seat and the silicon crystal part, so that the silicon crystal part can remain sufficiently stable in the connecting seat, ensuring that impurities on the surface of the silicon crystal part can be accurately cleaned.

[0007] Preferably, the touch assembly includes a stand arranged below the sliding seat and two touch plates fixedly connected to the tops of the two positioning blocks, the bottom end of the stand is fixedly connected to the touch frame, and touch grooves are provided on both sides of the touch frame, and two swing arms are fixedly connected to the tops of the two touch plates, and the two swing arms are movably connected in the two touch grooves, the stand is provided with a power assembly, and the power assembly is used to drive the two positioning blocks to open or close; and the positioning block and the touch plate are combined to form an L-shaped structure, so that the positioning block is at a distance below the touch frame, and when the silicon crystal piece is restricted by the positioning block, the silicon crystal piece maintains an appropriate distance between the touch plate and the touch frame, thereby reducing the clamping area of ​​the silicon crystal piece, and at the same time, the positioning block and one side of the connecting seat are in point contact with the silicon crystal piece, which can reduce the restricted area of ​​the silicon crystal piece, so that most of the area of ​​the silicon crystal piece can be flat washed when it is restricted, thereby improving the cleaning efficiency of the silicon crystal piece.

[0008] Preferably, the power assembly includes a push plate frame slidably connected in the vertical frame and two connecting arms rotatably connected to one side of the two swing arms, two connecting shafts for connection are installed between the two sides of the push plate frame and the two connecting arms, a telescopic motor is fixed to the top of the vertical frame, and the telescopic end of the telescopic motor extends into the vertical frame and is fixedly connected to the top middle part of the push plate frame; and the power assembly is used to control the relative closure or opposite opening of the two touch plates and the two positioning blocks, which can keep the silicon crystal piece in a hollow loading state between the positioning block, the connecting seat and the touch plate, so that the silicon crystal piece can be loaded from multiple directions of the positioning block, the connecting seat and the touch plate, thereby reducing the time required for the silicon crystal piece to be clamped and improving the leveling efficiency of the silicon crystal piece.

[0009] Preferably, the support assembly includes a support frame fixedly connected to the bottom end of the sliding seat and a rotating column fixedly connected to one side of the touch frame, the support frame is fixedly connected to a support auxiliary frame on the side close to the vertical frame, the bottom end of the support auxiliary frame is fixedly connected to a mounting seat that cooperates with the rotating column, one side of the pushing arc plate is fixedly connected to a vertical frame, the top of the vertical frame is fixedly connected to a guide frame, and the guide frame and the support frame are slidably connected, and a two-way component for driving the rotating column to rotate and driving the vertical frame to move is provided in the mounting seat.

[0010] Preferably, the two-way component includes a stabilizing column rotatably connected in the mounting seat and cooperating with the rotating column, and a two-way groove opened on one side of the vertical frame, one end of the mounting seat is rotatably connected with a centering column, one end of the centering column is connected with an eccentric disk, one side of the eccentric disk is connected with a fitting column cooperating with the two-way groove, a second gear and a first gear are respectively installed on the stabilizing column and in the mounting seat, a third gear rotatably connected in the mounting seat and meshing with the first gear and the second gear, a servo motor is installed on the mounting seat, and the servo motor is used to drive the third gear to rotate; and one end of the centering column extends into the mounting seat and is connected to the first gear, and the first gear is sleeved on the stabilizing column, and the second gear is sleeved on the stabilizing column, which can be used to drive the rotating column and the centering column to rotate synchronously, which can reduce unnecessary energy transfer, thereby The transmission efficiency of the equipment is improved, and at the same time, the time required for cleaning the silicon crystal pieces in the cleaning box is reduced, the overall operating efficiency is improved, and the cleaning efficiency of the device for the silicon crystal pieces is further improved; in addition, the two-way component can be used to drive the touch component to swing, and the touch component is in an inclined state on one side of the supporting auxiliary frame, so that the two positioning blocks are in an inclined structure. At the same time, the vertical frame drives the push arc plate to move to the left, and pushes the arc plate to approach the two positioning blocks, which is used to position the silicon crystal piece and install it between the two positioning blocks, so that the silicon crystal piece is placed obliquely in the two positioning blocks, and the bottom of the silicon crystal piece is in contact with the top of the push arc plate, which is used to provide greater convenience and operability for the silicon crystal piece loading operation, ensure the continuity and stability of the cleaning process, and the two-way component can drive the touch frame, positioning blocks and silicon crystal pieces to swing in the cleaning box.

[0011] Preferably, the top of the pushing arc plate is arranged in an inclined structure, and the top of the pushing arc plate maintains a slope match with the silicon crystal piece; and the slope match between the pushing arc plate and the silicon crystal piece can prevent mutual interference, so that the pushing arc plate can push the silicon crystal piece stably upward along the positioning block and the connecting seat. In addition, the silicon crystal piece is pushed upward along the positioning block, and the pushing arc plate can be used to temporarily support the bottom of the silicon crystal piece, ensuring the stability of the silicon crystal piece in the positioning block and the connecting seat.

[0012] Preferably, one side of the connecting seat is in an M-shaped structure, and one side of the connecting seat is stably fitted with one side of the silicon crystal piece.

[0013] In the above technical solution, the technical effects and advantages provided by the present invention are:

[0014] 1. By setting up the flexible component, it is possible to achieve elastic contact between the connecting seat and the silicon crystal piece, and to move the restricted part of the silicon crystal piece in the positioning block, so that the blocked part of the silicon crystal piece in the positioning block is replaced, avoiding the need to remove the silicon crystal piece after cleaning and then reinstall the silicon crystal piece on the positioning block in the equipment, thereby reducing the difficulty of cleaning the silicon crystal piece and improving the cleaning efficiency of the equipment for the silicon crystal piece.

[0015] 2. Through the arrangement of the tensioning component, the flexible component and the silicon crystal component, the tension of the support spring between the connecting ring and the contact plate can be adjusted. Then the support spring tension adjustment is used to synchronously adjust the extrusion force of the contact between the connecting seat and the silicon crystal component, thereby avoiding excessive spring tension of the support spring which may push the connecting seat excessively, causing hard pressure between the connecting seat and the silicon crystal component and causing damage, while too small tension cannot ensure a good fit between the connecting seat and the silicon crystal component, so that the silicon crystal component can remain sufficiently stable in the connecting seat, ensuring that impurities on the surface of the silicon crystal component can be accurately cleaned.

[0016] 3. By setting the positioning block, the touch plate, the touch frame and the silicon crystal piece, the positioning block and the touch plate are combined to form an L-shaped structure, which is beneficial for the positioning block to be at a distance below the touch frame, so that when the silicon crystal piece is restricted by the positioning block, the silicon crystal piece maintains an appropriate distance between the touch plate and the touch frame, thereby reducing the clamping area of ​​the silicon crystal piece. At the same time, the positioning block and one side of the connecting seat are in point contact with the silicon crystal piece, which can reduce the restricted area of ​​the silicon crystal piece, so that most of the area of ​​the silicon crystal piece can be washed flat when it is restricted, thereby improving the cleaning efficiency of the silicon crystal piece.

[0017] 4. Through the setting of the bidirectional component and the rotating column, it can be used to drive the rotating column and the centering column to rotate synchronously, which can reduce unnecessary energy transfer, thereby improving the transmission efficiency of the equipment. At the same time, it reduces the time required for cleaning the silicon crystal in the cleaning box, improves the overall operating efficiency, and further improves the cleaning efficiency of the device for silicon crystals.

[0018] 5. By setting up the pushing arc plate, supporting assembly, bidirectional assembly and silicon crystal piece, the slope coordination between the pushing arc plate and the silicon crystal piece can be achieved, which can prevent mutual interference between them, so that the pushing arc plate can push the silicon crystal piece stably upward along the positioning block and the connecting seat. In addition, the silicon crystal piece is pushed upward along the positioning block, and the pushing arc plate can be used to temporarily lift the bottom of the silicon crystal piece, ensuring the stability of the silicon crystal piece in the positioning block and the connecting seat, and further improving the cleaning efficiency of the equipment for the silicon crystal piece. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0020] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 It is a structural schematic diagram of the swing of the touch assembly of the present invention;

[0022] Figure 3 It is a schematic diagram of the structure of the flexible component of the present invention;

[0023] Figure 4 For the present invention Figure 2 A local enlarged view of point A in FIG.

[0024] Figure 5 This is a schematic diagram of the structure of the positioning block of the present invention when it is opened;

[0025] Figure 6 An exploded view of the touch assembly of the present invention;

[0026] Figure 7 It is a schematic diagram of the structure of the assembly of the supporting auxiliary frame and the touch frame of the present invention;

[0027] Figure 8 It is a structural schematic diagram of the bidirectional component of the present invention;

[0028] Fig. 9 It is a structural schematic diagram of the assembly of the vertical frame and the pushing arc plate of the present invention.

[0029] Description of reference numerals:

[0030] 1. Cleaning rack; 11. Moving rack; 12. Sliding seat; 13. Silicon crystal piece; 14. Cleaning box; 15. Positioning block;

[0031] 2. Flexible component; 21. Push arc plate; 22. Connecting seat; 23. Slide groove; 24. Support spring; 25. Contact plate; 26. Guide column;

[0032] 3. Tensioning assembly; 31. Adjusting stud; 32. Threaded groove; 33. Connecting ring;

[0033] 4. Touch assembly; 41. Touch frame; 42. Touch slot; 43. Swing arm; 44. Touch plate; 45. Stand; 46. Push plate frame; 47. Connecting shaft column; 48. Connecting arm; 49. Telescopic motor;

[0034] 5. Support assembly; 51. Support frame; 52. Support auxiliary frame; 53. Mounting seat; 54. Rotating column; 55. Vertical frame; 56. Guide frame;

[0035] 6. Bidirectional assembly; 61. Stabilizing column; 62. First gear; 63. Third gear; 64. Servo motor; 65. Centering column; 66. Eccentric disk; 67. Fitting column; 68. Bidirectional groove; 69. Second gear. DETAILED DESCRIPTION

[0036] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.

[0037] The present invention provides Figure 1-Figure 9 A silicon wafer flat washing device for semiconductor production is shown, comprising: a cleaning rack 1, a cleaning box 14 and a silicon crystal piece 13, a movable rack 11 that moves up and down is installed on the top of the cleaning rack 1, a slide seat 12 is slidably connected inside the movable rack 11, and two symmetrical positioning blocks 15 are provided on the slide seat 12; and a storage box for placing the silicon crystal piece 13 is installed on the cleaning rack 1; the specific structure and principle of the cleaning rack 1, the movable rack 11 and the slide seat 12 are all prior arts, reference (in the authorization announcement number CN216606403U, disclosing a silicon wafer flat washing device for semiconductor production), therefore, the structure is common knowledge known in the art, so it is not described in detail in this application.

[0038] The flexible component 2 is used to maintain elastic resistance between the two positioning blocks 15 and the silicon crystal piece 13, and to move the silicon crystal piece 13 at the restricted position between the two positioning blocks 15. The flexible component 2 includes two connecting seats 22 slidably connected to the two positioning blocks 15 and a pushing arc plate 21 arranged below the two positioning blocks 15 and cooperating with the silicon crystal piece 13, and the pushing arc plate 21 is used to push the silicon crystal piece 13 to move upward between the two positioning blocks 15. A point contact component 4 for connection is arranged between the sliding seat 12 and the two positioning blocks 15, and the point contact component 4 is used to drive the two positioning blocks 15 and the two connecting seats 22 to clamp the silicon crystal piece 13 at two points. A sliding groove 23 is provided in the positioning block 15, and the engagement groove 23 is provided in the positioning block 15. A guide column 26 is installed in the connecting seat 22, and one end of the guide column 26 extends into the slide groove 23 and is connected to a contact plate 25, and the contact plate 25 is slidably connected in the slide groove 23, and a support spring 24 is installed between the contact plate 25 and the slide groove 23. A tensioning assembly 3 is provided on one side of the positioning block 15, and the tensioning assembly 3 is used to adjust the extrusion force between the connecting seat 22 and the silicon crystal piece 13. A supporting assembly 5 for connection is provided between the slide seat 12 and the contact assembly 4, and the supporting assembly 5 is used to drive the contact assembly 4 and the silicon crystal piece 13 to swing in the cleaning box 14, and drive the arc plate 21 to maintain an inclined contact with the silicon crystal piece 13, so that the silicon crystal piece 13 can move stably along the two positioning blocks 15.

[0039] The tensioning assembly 3 includes a connecting ring 33 fixedly connected to the end of the support spring 24 away from the contact plate 25 and a threaded groove 32 opened on one side of the positioning block 15 and communicating with the inside of the slide groove 23. An adjusting stud 31 is threadedly connected in the threaded groove 32, and one end of the adjusting stud 31 extends into the slide groove 23 and is rotatably connected to one end of the connecting ring 33.

[0040] The top of the pushing arc plate 21 is arranged in an inclined structure, and the top of the pushing arc plate 21 and the silicon crystal piece 13 maintain a slope matching.

[0041] One side of the connection seat 22 is in an M-shaped structure, and one side of the connection seat 22 is stably fitted with one side of the silicon crystal piece 13 .

[0042] refer to Figure 1-Figure 6 As shown, the touch assembly 4 includes a stand 45 arranged below the slide 12 and two touch plates 44 fixedly connected to the tops of the two positioning blocks 15, the bottom end of the stand 45 is fixedly connected to the touch frame 41, and touch grooves 42 are provided on both sides of the touch frame 41, and two swing arms 43 are fixedly connected to the tops of the two touch plates 44, and the two swing arms 43 are movably connected in the two touch grooves 42, a power assembly is provided on the stand 45, and the power assembly is used to drive the two positioning blocks 15 to open or close; the power assembly includes a push plate frame 46 slidably connected in the stand 45 and two connecting arms 48 rotatably connected to one side of the two swing arms 43, two connecting shafts 47 for connection are installed between the two sides of the push plate frame 46 and the two connecting arms 48, a telescopic motor 49 is fixed to the top of the stand 45, and the telescopic end of the telescopic motor 49 extends into the stand 45 and is fixedly connected to the middle of the top of the push plate frame 46.

[0043] refer to Figure 1-Figure 7As shown, the support assembly 5 includes a support frame 51 fixedly connected to the bottom end of the slide 12 and a rotating column 54 fixedly connected to one side of the touch frame 41, a support auxiliary frame 52 is fixedly connected to one side of the support frame 51 close to the vertical frame 45, and a mounting seat 53 matched with the rotating column 54 is fixedly connected to the bottom end of the support auxiliary frame 52, a vertical frame 55 is fixedly connected to one side of the push arc plate 21, a guide frame 56 is fixedly connected to the top of the vertical frame 55, and the guide frame 56 is slidably connected to the support frame 51, and a two-way assembly 6 for driving the rotating column 54 to rotate and drive the vertical frame 55 to move is provided in the mounting seat 53; the two-way assembly 6 includes a stabilizing column 61 rotatably connected in the mounting seat 53 and matched with the rotating column 54, and a two-way groove 68 opened on one side of the vertical frame 55, one end of the mounting seat 53 is rotatably connected to a centering column 65, one end of the centering column 65 is connected to an eccentric disk 66, and one side of the eccentric disk 66 is connected to a sticking A second gear 69 and a first gear 62 are respectively installed on the combining column 67, the stabilizing column 61 and the mounting seat 53, a third gear 63 meshing with the first gear 62 and the second gear 69 is rotatably connected in the mounting seat 53, a servo motor 64 is installed on the mounting seat 53, and the servo motor 64 is used to drive the third gear 63 to rotate; in addition, the bidirectional component 6 can be used to drive the touch component 4 to swing, and the touch component 4 is in an inclined state on one side of the supporting auxiliary frame 52, so that the two positioning blocks 15 are in an inclined structure, at the same time, the vertical frame 55 drives the push arc plate 21 to move to the left, and the push arc plate 21 approaches the two positioning blocks 15, which is used to position the silicon crystal piece 13 and install it between the two positioning blocks 15, so that the silicon crystal piece 13 is tilted and placed in the two positioning blocks 15, and the bottom of the silicon crystal piece 13 is kept in contact with the top of the push arc plate 21, which is used to provide greater convenience and operability for the loading operation of the silicon crystal piece 13.

[0044] Through the above technical solution:

[0045] When in use;

[0046] In the first step, the moving frame 11 moves downward to drive the whole to move downward, and then the positioning block 15 approaches the storage box installed on the cleaning frame 1, and the silicon crystal piece 13 is located between the two positioning blocks 15. At this time, the telescopic motor 49 extends downward along the vertical frame 45 to push the push plate frame 46 to move downward synchronously along the vertical frame 45. Then the push plate frame 46 moves downward to drive the two connecting shafts 47 to move downward and contact and push the two connecting arms 48, and the two connecting arms 48 move downward to push the two swing arms 43, so that the two swing arms 43 rotate along the two contact grooves 42, and the movement of the two swing arms 43 drives the two contact plates 44 to move relative to each other, so that the two contact plates 44 push the two positioning blocks 15 to the outside of the silicon crystal piece 13, as the two positioning blocks 15 approach the outside of the silicon crystal piece 13 and the two connecting seats 22 are pre-connected with the silicon crystal piece 13, the two connecting seats 22 are pre-connected with the silicon crystal piece 13, and the two connecting seats 22 are pre-connected with the silicon crystal piece 13. The two sides of the silicon crystal component 13 are in contact, and then the two connecting seats 22 move in opposite directions along the two positioning blocks 15, so that the two connecting seats 22 push the guide posts 26 to move along the slide groove 23 during the movement, which is used to squeeze the support spring 24 between the resistance plate 25 and the connecting ring 33, and then the support spring 24 itself The elastic force generates a reaction force, which is used to push the resistance plate 25 and the guide post 26 to move in opposite directions along the slide groove 23, and then the guide post 26 pushes the two connecting seats 22 in the opposite directions respectively, so that the two connecting seats 22 and the silicon crystal component 13 are relatively squeezed, and then the two connecting seats 22 contact with the two silicon crystal components 13 under the action of the support spring 24 and generate a relative squeezing force, so that the silicon crystal component 13 is clamped between the two connecting seats 22 without being too tight, and the connecting seat 22 and the silicon crystal component 13 can maintain elastic contact.

[0047] In the second step, the moving frame 11 is extended upward to take out the silicon crystal 13 from the storage box, and then the slide 12 moves in the moving frame 11 and drives the support component 5, the touch component 4, the positioning block 15 and the silicon crystal 13 to move above the cleaning box 14, and then waits for the moving frame 11 to extend downward again, so that the silicon crystal 13 invades the interior of the cleaning box 14, and the cleaning box 14 cleans the surface of the silicon crystal 13. At the same time, the positioning block 15 and the touch plate 44 are combined to form an L-shaped structure, which is conducive to the positioning block There is a distance between the positioning block 15 and the touch frame 41 below, so that when the silicon crystal piece 13 is restricted by the positioning block 15, the silicon crystal piece 13 maintains an appropriate distance between the touch plate 44 and the touch frame 41, thereby reducing the clamping area of ​​the silicon crystal piece 13. At the same time, the positioning block 15 and one side of the connecting seat 22 are in point contact with the silicon crystal piece 13, which can reduce the restricted area of ​​the silicon crystal piece 13, so that most of the area of ​​the silicon crystal piece 13 can be washed flat when it is restricted, thereby improving the cleaning efficiency of the silicon crystal piece 13.

[0048] In the third step, when the silicon crystal piece 13 is being cleaned and the blocked part needs to be moved, the servo motor 64 drives the third gear 63 to rotate in the mounting seat 53, and then the mounting seat 53 rotates and engages with the first gear 62 and the second gear 69 respectively. At this time, the second gear 69 rotates to drive the stabilizing column 61 to rotate synchronously, so that the rotating column 54 rotates along the mounting seat 53 under the rotation of the stabilizing column 61, and then the rotating column 54 rotates to drive the touch frame 41 to rotate, so that the rotating column 54 tilts and swings along one side of the supporting auxiliary frame 52, and the silicon crystal piece 13 tilts and moves under the swing of the touch frame 41. In addition, the rotation of the first gear 62 drives the centering column 65 to rotate along the mounting seat 53, and then the centering column 65 rotates to drive the eccentric disk 66 to rotate, so that the eccentric disk 66 moves in a circle along one end of the mounting seat 53. At this time, the rotation of the eccentric disk 66 drives the fitting column 67 to rotate along the two-way groove 68 and engage with the two-way groove 68. The vertical frame 55 is moved to form a resistance between the grooves 68, which is used to push the vertical frame 55 to move, and the movement of the vertical frame 55 drives the guide frame 56 to move along the support frame 51, and the movement of the vertical frame 55 drives the arc plate 21 to move, so that the arc plate 21 moves horizontally under the two positioning blocks 15. At the same time, the silicon crystal piece 13 moves obliquely and contacts the top of the arc plate 21 that moves horizontally, and then the arc plate 21 moves to form a resistance between the silicon crystal piece 13 and push the silicon crystal piece 13 to move upward along the two connecting seats 22. Subsequently, the part of the silicon crystal piece 13 blocked by the two connecting seats 22 is exposed, so that the part of the silicon crystal piece 13 blocked in the positioning block 15 is replaced, avoiding the need to remove the silicon crystal piece 13 after cleaning, and then reinstall the silicon crystal piece 13 on the positioning block 15 in the equipment, reducing the difficulty of cleaning the silicon crystal piece 13 and improving the cleaning efficiency of the equipment for the silicon crystal piece 13.

[0049] The above only describes certain exemplary embodiments of the present invention by way of illustration. Undoubtedly, a person skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. A silicon wafer flat washing device for semiconductor production, comprising a cleaning rack (1), a cleaning box (14) and a silicon wafer (13), wherein a moving rack (11) for moving up and down is installed on the top of the cleaning rack (1), a slide seat (12) is slidably connected inside the moving rack (11), and two symmetrical positioning blocks (15) are provided on the slide seat (12), characterized in that: A flexible component (2) is used to maintain elastic contact between the two positioning blocks (15) and the silicon crystal piece (13), and to move the silicon crystal piece (13) at a position restricted between the two positioning blocks (15). The flexible component (2) comprises two connecting seats (22) slidably connected to the two positioning blocks (15) and a pushing arc plate (21) arranged below the two positioning blocks (15) and cooperating with the silicon crystal piece (13). The pushing arc plate (21) is used to push the silicon crystal piece (13) to move upward between the two positioning blocks (15). A contact component (4) for connection is arranged between the sliding seat (12) and the two positioning blocks (15). The contact component (4) is used to drive the two positioning blocks (15) and the two connecting seats (22) to clamp the silicon crystal piece (13) at two points. A sliding groove (23) is provided in the positioning block (15). The connecting seat A guide column (26) is installed in the (22), and one end of the guide column (26) extends into the slide groove (23) and is connected to a contact plate (25), and the contact plate (25) is slidably connected in the slide groove (23), and a support spring (24) is installed between the contact plate (25) and the slide groove (23), and a tensioning assembly (3) is provided on one side of the positioning block (15), and the tensioning assembly (3) is used to adjust the extrusion force between the connecting seat (22) and the silicon crystal piece (13), and a supporting assembly (5) for connection is provided between the slide seat (12) and the contact assembly (4), and the supporting assembly (5) is used to drive the contact assembly (4) and the silicon crystal piece (13) to swing in the cleaning box (14), and drive the arc plate (21) to maintain an inclined contact with the silicon crystal piece (13), so that the silicon crystal piece (13) moves stably along the two positioning blocks (15).

2. The semiconductor production silicon wafer flat cleaning device according to claim 1, characterized in that: The tensioning assembly (3) comprises a connecting ring (33) fixedly connected to one end of the supporting spring (24) away from the contact plate (25) and a threaded groove (32) provided on one side of the positioning block (15) and communicating with the inside of the slide groove (23); an adjusting stud (31) is threadedly connected in the threaded groove (32), and one end of the adjusting stud (31) extends into the slide groove (23) and is rotatably connected to one end of the connecting ring (33).

3. The semiconductor wafer flat cleaning device according to claim 1, characterized in that: The touch assembly (4) comprises a stand (45) arranged below the slide seat (12) and two touch plates (44) fixedly connected to the tops of the two positioning blocks (15); the bottom end of the stand (45) is fixedly connected to the touch frame (41); both sides of the touch frame (41) are provided with touch grooves (42); the top ends of the two touch plates (44) are fixedly connected to two swing arms (43), and the two swing arms (43) are movably connected in the two touch grooves (42); a power assembly is provided on the stand (45), and the power assembly is used to drive the two positioning blocks (15) to open or close.

4. The semiconductor production silicon wafer flat cleaning device according to claim 3, characterized in that: The power assembly includes a push plate frame (46) slidably connected in the vertical frame (45) and two connecting arms (48) rotatably connected to one side of the two swing arms (43), two connecting shaft columns (47) for connection are installed between the two sides of the push plate frame (46) and the two connecting arms (48), a telescopic motor (49) is fixed at the top of the vertical frame (45), and the telescopic end of the telescopic motor (49) extends into the vertical frame (45) and is fixedly connected to the middle of the top of the push plate frame (46).

5. The semiconductor production silicon wafer flat cleaning device according to claim 3, characterized in that: The support assembly (5) comprises a support frame (51) fixedly connected to the bottom end of the slide seat (12) and a rotating column (54) fixedly connected to one side of the touch frame (41); a support auxiliary frame (52) is fixedly connected to one side of the support frame (51) close to the vertical frame (45); a mounting seat (53) matched with the rotating column (54) is fixedly connected to the bottom end of the support auxiliary frame (52); a vertical frame (55) is fixedly connected to one side of the push arc plate (21); a guide frame (56) is fixedly connected to the top end of the vertical frame (55); and the guide frame (56) is slidably connected to the support frame (51); a bidirectional assembly (6) is provided in the mounting seat (53) for driving the rotating column (54) to rotate and driving the vertical frame (55) to move.

6. The semiconductor production silicon wafer flat cleaning device according to claim 5, characterized in that: The bidirectional component (6) comprises a stabilizing column (61) rotatably connected in the mounting seat (53) and matched with the rotating column (54), and a bidirectional groove (68) provided on one side of the vertical frame (55); one end of the mounting seat (53) is rotatably connected with a centering column (65); one end of the centering column (65) is connected with an eccentric disk (66); one side of the eccentric disk (66) is connected with a fitting column (67) matched with the bidirectional groove (68); a second gear (69) and a first gear (62) are respectively installed on the stabilizing column (61) and in the mounting seat (53); a third gear (63) meshing with the first gear (62) and the second gear (69) is rotatably connected in the mounting seat (53); a servo motor (64) is installed on the mounting seat (53), and the servo motor (64) is used to drive the third gear (63) to rotate.

7. The semiconductor production silicon wafer flat cleaning device according to claim 1, characterized in that: The top of the pushing arc plate (21) is arranged in an inclined structure, and the top of the pushing arc plate (21) and the silicon crystal piece (13) maintain a matching slope.

8. The semiconductor production silicon wafer flat cleaning device according to claim 1, characterized in that: One side of the connection seat (22) is in an M-shaped structure, and one side of the connection seat (22) is stably fitted with one side of the silicon crystal piece (13).

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