Automatic cleaning and drying all-in-one machine for quartz wafers

Abstract

The invention relates to the technical field of quartz wafer processing, in particular to an automatic cleaning and drying all-in-one machine for a quartz wafer. According to the technical scheme, the folding and unfolding device comprises an installation disc rotationally installed on a hydraulic rod, a plurality of installation rods rotationally installed on the installation disc and clamp assemblies rotationally installed at the bottoms of the installation rods, the folding and unfolding device further comprises a protruding base arranged in a drying shell, and a spin-drying device and a heating air pipe are arranged on the peripheral side of the protruding base. And a cleaning mechanism is arranged in the cleaning shell. The multiple mounting rods are in a folded shape in the cleaning shell and are in an unfolded shape in the drying shell, so that the distance between the multiple quartz wafers is small during cleaning, the multiple quartz wafers can be cleaned in a unified mode through a single cleaning mechanism, the usage amount of a cleaning solution is relatively small, and the cleaning efficiency is improved. And during drying, the distance between the plurality of quartz wafers is far, so that the heat during drying is uniform, and the condensation phenomenon is avoided.

Description

Technical Field

[0001] The invention relates to the technical field of quartz wafer processing, and in particular to an automatic quartz wafer cleaning and drying integrated machine. Background Art

[0002] Quartz crystal is a kind of quartz (silicon dioxide, SiO 2 ) are widely used in electronics, optics and precision instruments. The etching of quartz wafers aims to remove the excess part of the surface of the quartz wafer by chemical methods to achieve the required size and shape. After that, it is necessary to clean the etched quartz wafer efficiently and thoroughly to ensure that its surface is clean and free of impurities, laying a good foundation for subsequent drying and further processing.

[0003] Combining cleaning and drying together can improve efficiency and reduce the number of transfers of quartz wafers between different steps, thereby reducing the risk of contamination. At present, when the cleaning and drying machine is in use, several quartz wafers to be cleaned are placed in it, and several quartz wafers are uniformly placed in their designated fixtures, and the relative distance between the fixtures is stable, which makes the distance between the placed quartz wafers remain unchanged whether they are being cleaned or dried.

[0004] However, it is found in use that if the distance between adjacent quartz wafers during cleaning is too far, the amount of cleaning solution used will increase, resulting in an increase in cleaning costs. If the position of adjacent quartz wafers during drying is too close, the airflow and heat will be uneven, and condensation will easily occur, causing moisture to gather between adjacent wafers to form condensation droplets. Summary of the invention

[0005] The purpose of the present invention is to solve the problems existing in the background technology and to provide an automatic quartz wafer cleaning and drying machine.

[0006] The technical solution of the present invention is: an automatic quartz wafer cleaning and drying machine, comprising a hydraulic rod, a cleaning shell and a drying shell fixed to an upper frame from top to bottom, the hydraulic rod is telescopically movable in the cleaning shell and the drying shell, and a folding and opening device is provided between the cleaning shell and the drying shell; The folding and stretching device includes a mounting plate rotatably mounted on a hydraulic rod, a plurality of mounting rods rotatably mounted on the mounting plate, and a clamp assembly rotatably mounted at the bottom of the mounting rods. The folding and stretching device also includes a raised seat arranged in a drying shell, a spin drying device and a heating duct are arranged on the peripheral side of the raised seat, and a cleaning mechanism is arranged in the cleaning shell; The plurality of mounting rods are in a retracted state when in the cleaning shell, and in an expanded state when in the drying shell.

[0007] Preferably, a connecting block is fixed to the outer side of the end of the mounting rod, and the clamp assembly includes a frame body, which is rotatably mounted on the connecting block, and movable grooves are provided on the inner walls on both sides of the frame body, and an arc groove is provided on the side of the movable groove away from the mounting rod. The clamp assembly also includes a clamp body, and sliders are fixedly mounted on both sides of the clamp body, and the sliders are slidably mounted in the movable grooves, and an arc head that matches the arc groove is provided on the side of the slider away from the mounting rod.

[0008] Preferably, auxiliary wheels are rotatably mounted on both sides of the clamp body, and the clamp body includes a clamping groove.

[0009] Preferably, the raised seat is divided into an upper protrusion and a lower arc, a plurality of limit grooves are provided on the peripheral side of the upper protrusion, an entrance is provided in the middle of the upper protrusion, and the entrance includes a socket, the spin-drying device includes a spin-drying seat, the raised seat is fixed on the spin-drying seat, the bottom of the spin-drying seat is fixedly connected to the output end of the motor, the motor is fixed in the drying shell, and the symmetry axis of the raised seat and the output end of the motor are located on the same horizontal line.

[0010] Preferably, the spin-drying device also includes a filter circular plate and a fixed circular plate fixed on the spin-drying seat, the filter circular plate and the fixed circular plate are arranged in a shape surrounding a lower arc body, the peripheral side of the lower arc body is fixedly connected to the fixed circular plate, and a spin-drying chamber is formed between the filter circular plate and the fixed circular plate, and a drainage frame is installed at the bottom of the drying shell, and the spin-drying chamber and the drainage frame are connected.

[0011] Preferably, a heating fan is installed on the frame, and a heating air duct is connected to the heating fan. The heating air duct includes a plurality of air outlets located above the raised seat, and a plurality of exhaust ports are provided on the top of the drying shell.

[0012] Preferably, the cleaning mechanism includes two cleaning water pipes distributed from bottom to bottom, the cleaning water pipes are provided with a plurality of spray heads inclined toward the direction of the hydraulic rod, a partition sealing device is provided between the cleaning shell and the drying shell, the partition sealing device includes a baffle located between the two cleaning water pipes, and the fixture body is located on the baffle when the quartz wafer is cleaned.

[0013] Preferably, the partition sealing device also includes a storage shell fixed on the drying shell and connected to the cleaning shell, a sealing seat is slidably installed in the storage shell, an electric push rod fixed to the drying shell is provided outside the storage shell, the pushing end of the electric push rod is fixedly connected to the sealing seat, a liquid collecting shell is fixed on the storage shell, a drain port located below the cleaning water pipe is provided in the cleaning shell, the drain port is connected to the liquid collecting shell, the drain port is connected to the drain pipe, a plug seat adapted to the drain port is fixed on the sealing seat, the sealing seat and the plug seat are provided with openings for the hydraulic rod to pass through, and a sealing cover is fixed on the hydraulic rod.

[0014] Compared with the existing technology, the beneficial effects of the present invention are as follows: the present scheme uses a folding and expanding device to push a plurality of mounting rods to move through a hydraulic rod, so that the plurality of mounting rods are folded in a cleaning shell and expanded in a drying shell, so that the distance between a plurality of quartz wafers is closer during cleaning, which makes it possible to uniformly clean a large number of quartz wafers through a single cleaning mechanism, thereby using a relatively small amount of cleaning solution, and the distance between a plurality of quartz wafers is far during drying, so that the heat during drying is uniform and no condensation occurs. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a structural schematic diagram of the present invention; Figure 2 It is a schematic diagram of the cross-sectional structure of the present invention; Figure 3 It is a structural schematic diagram of the partition sealing device of the present invention; Figure 4 It is a structural schematic diagram of the clamp assembly of the present invention; Figure 5 It is a schematic diagram of the structure of the raised seat of the present invention; Figure 6 It is a structural schematic diagram of the drying device of the present invention; Figure 7 It is a structural schematic diagram of the hydraulic rod of the present invention when it moves into the drying shell; Figure 8 It is a structural schematic diagram of the baffle of the present invention.

[0016] Reference numerals: 1, cleaning housing; 2, drying housing; 3, partition sealing device; 4, mounting plate; 5, mounting rod; 6, clamp assembly; 7, raised seat; 8, spin drying device; 9, heating air duct; 10, heating fan; 11, exhaust port; 31, storage housing; 33, sealing seat; 32, liquid collecting housing; 33, sealing seat; 34, plug seat; 35, drain port; 36, electric push rod; 37, drain pipe; 51, connecting block; 61, frame; 62 , fixture body; 63, movable groove; 64, slider; 65, arc groove; 66, arc head; 67, auxiliary wheel; 68, clamping groove; 71, upper protrusion; 72, lower arc body; 73, limit groove; 74, entrance; 75, socket; 81, filter circular plate; 82, fixed circular plate; 83, motor; 84, spin dryer seat; 85, spin dryer chamber; 86, drainage frame; 100, hydraulic rod; 200, baffle; 300, cleaning water pipe; 400, sealing cover. DETAILED DESCRIPTION

[0017] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0018] See attached Figure 1-8 , an automatic quartz wafer cleaning and drying machine, comprising a hydraulic rod 100, a cleaning shell 1 and a drying shell 2 fixed to an upper frame from top to bottom, the hydraulic rod 100 is telescopically movable in the cleaning shell 1 and the drying shell 2, and a folding and opening device is provided between the cleaning shell 1 and the drying shell 2; The folding and stretching device includes a mounting plate 4 rotatably mounted on a hydraulic rod 100, a plurality of mounting rods 5 rotatably mounted on the mounting plate 4, and a clamp assembly 6 rotatably mounted at the bottom of the mounting rods 5. The folding and stretching device also includes a raised seat 7 arranged in the drying housing 2, a spin-drying device 8 and a heating air duct 9 are arranged on the peripheral side of the raised seat 7, and a cleaning mechanism is arranged in the cleaning housing 1; The plurality of mounting rods 5 are in a retracted state when in the cleaning housing 1 , and in an expanded state when in the drying housing 2 .

[0019] During operation, the quartz wafer to be cleaned is fixed by the clamp assembly 6. When the plurality of mounting rods 5 are located in the cleaning housing 1, the plurality of clamp assemblies 6 will be retracted along with the retraction of the mounting rods 5, and the quartz wafer thereon can be cleaned by the cleaning mechanism. At this time, the retracted clamp assembly 6 will make the distance between the plurality of quartz wafers closer, so that more quartz wafers can be cleaned uniformly by a single cleaning mechanism, and then the amount of cleaning solution used is relatively small. When the cleaning is completed and needs to be dried, when the plurality of mounting rods 5 move into the drying shell 2 along with the hydraulic rod 100, the mounting rods 5 will contact the raised seats 7. The special shape of the raised seats 7 will cause the plurality of mounting rods 5 to be stretched open, and the plurality of clamp assemblies 6 will be stretched open as the mounting rods 5 are stretched open, so that the distance between the plurality of quartz wafers will be farther, and then more quartz wafers can be dried at a relatively long distance through the spin-drying device 8 and the heating air duct 9, so that the drying heat is even and no condensation occurs.

[0020] Specifically, a connecting block 51 is fixed to the outer side of the end of the mounting rod 5, and the clamp assembly 6 includes a frame 61, which is rotatably mounted on the connecting block 51, and the inner walls of both sides of the frame 61 are provided with moving grooves 63, and the side of the moving groove 63 away from the mounting rod 5 is provided with an arc groove 65, and the clamp assembly 6 also includes a clamp body 62, and sliders 64 are fixedly mounted on both sides of the clamp body 62, and the slider 64 is slidably mounted in the moving groove 63, and the side of the slider 64 away from the mounting rod 5 is provided with an arc head 66 adapted to the arc groove 65, and auxiliary wheels 67 are rotatably mounted on both sides of the clamp body 62, and the clamp body 62 includes a clamping groove 68; Before using the device, the quartz wafer to be cleaned needs to be installed in the fixture body 62, and fixed by clamping the quartz wafer into the clamping groove 68; It should be noted that the clamp body 62 is a common clamp in the technical field. This solution mainly focuses on the matching relationship between the clamp body 62 and the frame 61, so the clamp body 62 will not be described in detail. The quartz chip fixed in the clamp body 62 can move with the extension and retraction of the mounting rod 5, and can also move with the rotation of the mounting rod 5, and can move with the rotation of the frame 61, which provides a basis for its folding and expansion, and the auxiliary wheel 67 is provided to facilitate the movement of the clamp assembly 6.

[0021] In addition, in the present embodiment, the raised seat 7 is divided into an upper raised portion 71 and a lower arc body 72, a plurality of limit grooves 73 are provided on the peripheral side of the upper raised portion 71, an entrance 74 is provided in the middle of the upper raised portion 71, and the entrance 74 includes a socket 75, the drying device 8 includes a drying seat 84, the raised seat 7 is fixed on the drying seat 84, the bottom of the drying seat 84 is fixedly connected to the output end of the motor 83, the motor 83 is fixed in the drying shell 2, the symmetry axis of the raised seat 7 and the output end of the motor 83 are located on the same horizontal line, the drying device 8 also includes a filter circular plate 81 and a fixed circular plate 82 fixed on the drying seat 84, the filter circular plate 81 and the fixed circular plate 82 are arranged to surround the lower arc body 72, the peripheral side of the lower arc body 72 is fixedly connected to the fixed circular plate 82, a drying chamber 85 is formed between the filter circular plate 81 and the fixed circular plate 82, a drainage frame 86 is installed at the bottom of the drying shell 2, and the drying chamber 85 and the drainage frame 86 are connected.

[0022] like Figure 7 As shown, during the specific operation, after the quartz wafer is cleaned in the cleaning shell 1, the hydraulic rod 100 is started to extend and move into the drying shell 2, so as to drive the installation rod 5 to move into the drying shell 2. When the clamp assembly 6 moves into the drying shell 2, the clamp assembly 6 is in a vertical state due to the downward gravity. As the hydraulic rod 100 continues to move, the hydraulic rod 100 will penetrate into the socket 75, and the clamp assembly 6 will contact the top of the upper protrusion 71 outside the entrance 74. As it continues to move, the installation rod 5 will enter the limiting groove 73 and be supported by the limiting groove 73 in an inclined state. Finally, the installation plate 4 will enter the entrance 74, and several inclined installation rods 5 will form a stretched shape, so that the clamp assembly 6 will also be stretched. Then the clamp assembly 6 will fall into the spin-drying chamber 85, and the spin-drying chamber 85 is driven to rotate by starting the motor 83, so that the centrifugal force is generated by high-speed rotation for dehydration. Figure 7 In FIG. 1 , the moving direction S of the clamp assembly 6 is marked.

[0023] It should also be noted that a heating fan 10 is installed on the frame, and the heating air duct 9 is connected to the heating fan 10. The heating air duct 9 includes a plurality of air outlets located above the raised seat 7, and a plurality of exhaust ports 11 are opened on the top of the drying shell 2; When the drying device 8 completes its operation, the heating fan 10 can be started to generate hot air to be input into the heating air duct 9. The heating air duct 9 is provided with multiple air outlets aimed at the top of the drying chamber 85, so that the quartz wafer located in the drying chamber 85 can be dried.

[0024] Furthermore, in this embodiment, Figure 3 and Figure 8 As shown, the cleaning mechanism includes two cleaning water pipes 300 distributed from bottom to bottom, and the cleaning water pipes 300 are provided with a plurality of spray heads inclined toward the hydraulic rod 100. A partition sealing device 3 is provided between the cleaning shell 1 and the drying shell 2. The partition sealing device 3 includes a baffle 200 located between the two cleaning water pipes 300. When the quartz wafer is cleaned, the fixture body 62 is located on the baffle 200. Specifically, the cleaning water pipe 300 is provided with a liquid inlet connected to an external liquid supply device. When the quartz wafer is cleaned, the auxiliary wheel 67 falls on the baffle 200, so that the clamp assembly 6 is horizontal, which is convenient for comprehensive cleaning of the quartz wafer. The inclined spray head arranged on the cleaning water pipe 300 discharges water in the direction of the hydraulic rod 100, so that the cleaning solution will be sprayed directly onto the quartz wafer. The cleaning water pipes 300 arranged up and down can clean the upper and lower parts of the quartz wafer, ensuring the cleanliness of the cleaning. In addition, because the water discharged from the spray head is diffused, one spray head can clean at least two quartz wafers that are close to each other. In addition, because the distance is close, the water after the impact spray can also clean the quartz wafer, so this has the effect of saving cleaning solution.

[0025] It should also be noted that the partition sealing device 3 also includes a storage shell 31 fixed on the drying shell 2 and connected to the cleaning shell 1, a sealing seat 33 is slidably installed in the storage shell 31, an electric push rod 36 fixed on the drying shell 2 is provided outside the storage shell 31, and the pushing end of the electric push rod 36 is fixedly connected to the sealing seat 33, a liquid collecting shell 32 is fixed on the storage shell 31, a drain port 35 located below the cleaning water pipe 300 is opened in the cleaning shell 1, the drain port 35 is connected to the liquid collecting shell 32, and the drain port 35 is connected to a drain pipe 37, a plug seat 34 adapted to the drain port 35 is fixed on the sealing seat 33, and the sealing seat 33 and the plug seat 34 are provided with openings for the hydraulic rod 100 to pass through, and a sealing cover 400 is fixed on the hydraulic rod 100; Specifically, when the quartz wafer is cleaned, the electric push rod 36 is started to push the sealing seat 33 into the cleaning shell 1, so that the two sealing seats 33 can seal the bottom of the cleaning shell 1, and the hydraulic rod 100 will enter the opening when it is extended and moved, so that the two sealing seats 33 and the plug seat 34 can surround and seal the bottom of the hydraulic rod 100, and the liquid generated by cleaning will be discharged into the liquid collecting shell 32 through the drain port 35, and finally discharged through the drain pipe 37. In this way, during cleaning, the liquid will not flow into the drying shell 2, thereby ensuring the dryness of the drying shell 2.

[0026] Working principle: Before the operation, the clamp assembly 6 is first moved to the outside of the cleaning housing 1 by the hydraulic rod 100, and the quartz wafer is fixed by the clamp body 62. Then the hydraulic rod 100 is started to move into the cleaning housing 1. When the hydraulic rod 100 moves, the frame 61 will be in a vertical state due to the downward weight, and the clamp body 62 will also move out of the frame 61 and be in a vertical state due to the downward weight. The slider 64 will move from the moving groove 63 to the arc groove 65, and the installation rod 5 will also be in a vertical state due to the downward weight, so that a number of installation rods 5 are in a retracted state. At this time, the hydraulic rod 100 moves above the cleaning housing 1, and the two sealing seats 33 are closed to seal the bottom; During cleaning, as the hydraulic rod 100 is continuously extended, the clamp assembly 6 moves to the baffle 200, and the clamp body 62 contacts the baffle 200, so that the baffle 200 supports it. As the frame 61 also moves to this position, the frame 61 and the baffle 200 are flush. At this time, the hydraulic rod 100 is closed, so that the clamp body 62 is supported by the baffle 200 to form a horizontal shape, and the slider 64 is moved back to the moving groove 63 due to the resistance of the wall of the cleaning shell 1. At this time, the hydraulic rod 100 is located between the two sealing seats 33 at the bottom of the cleaning shell 1. Then, the cleaning solution is input into the cleaning water pipe 300 through the external liquid supply device, and the inclined spray heads of the two cleaning water pipes 300 clean the quartz wafer, and the cleaned water is discharged from the drain port 35; During drying, after the liquid in the cleaning shell 1 is drained, the electric push rod 36 is started to pull the sealing seat 33 into the storage shell 31. At this time, the plug seat 34 will move into the drain port 35 to block it to prevent liquid backflow. At this time, the bottom of the cleaning shell 1 is opened, and the hydraulic rod 100 is started again to move into the drying shell 2. During the movement, the clamp assembly 6 passes through the baffle 200, and it is no longer supported and is vertical again due to the downward gravity. The slider 64 moves to the arc groove 65 again, and then as the hydraulic rod 100 continues to extend and move, the clamp assembly 6 and the mounting rod 5 will fall on the upper protrusion 71, and then the mounting rod 5 will enter the limit groove 73 , and the hydraulic rod 100 enters the inlet 74 and moves downward continuously, the support of the limit groove 73 will cause the installation rod 5 to rotate, and a plurality of installation rods 5 will be spread out, so that the clamp assembly 6 moves on the lower arc body 72, and the lower arc body 72 forms a support for the clamp assembly 6. When the hydraulic rod 100 moves into the socket 75, the hydraulic rod 100 stops moving. At this time, the installation rod 5 will push the clamp assembly 6 to the edge of the lower arc body 72, and the edge of the lower arc body 72 is the spin-drying chamber 85. At this time, the clamp assembly 6 will be in a vertical shape again due to the downward gravity because it has no support again, so that the clamp body 62 completes entering the spin-drying chamber 85; At this time, the motor 83 is started to drive the spin-drying device 8 and the raised seat 7 to rotate. At this time, because the mounting rod 5 is inserted into the limiting groove 73, the rotation of the raised seat 7 drives the mounting rod 5 to rotate, so that the mounting plate 4 rotates along the hydraulic rod 100, so that the quartz wafer in the clamp body 62 is dehydrated by generating centrifugal force through high-speed rotation; After dehydration is completed, the heating fan 10 is started to generate hot air and input into the heating air duct 9. The heating air duct 9 is provided with multiple air outlets aimed at the top of the spin-drying chamber 85, so that the quartz wafer located in the spin-drying chamber 85 can be dried.

[0027] The above are only preferred specific implementation modes of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical solutions and inventive concepts of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A quartz wafer automatic cleaning and drying machine, characterized in that: It comprises a hydraulic rod (100), a cleaning shell (1) and a drying shell (2) fixed to an upper frame from top to bottom, the hydraulic rod (100) being telescopically movable in the cleaning shell (1) and the drying shell (2), and a folding and stretching device being provided between the cleaning shell (1) and the drying shell (2); The folding and stretching device comprises a mounting plate (4) rotatably mounted on a hydraulic rod (100), a plurality of mounting rods (5) rotatably mounted on the mounting plate (4), and a clamp assembly (6) rotatably mounted at the bottom of the mounting rods (5). The folding and stretching device also comprises a raised seat (7) arranged in a drying shell (2), a spin-drying device (8) and a heating air duct (9) are arranged on the peripheral side of the raised seat (7), and a cleaning mechanism is arranged in the cleaning shell (1); The plurality of mounting rods (5) are in a retracted state when in the cleaning housing (1), and in an expanded state when in the drying housing (2).

2. The automatic quartz wafer cleaning and drying machine according to claim 1, characterized in that: A connecting block (51) is fixed to the outer side of the end of the mounting rod (5); the clamp assembly (6) comprises a frame (61) which is rotatably mounted on the connecting block (51); movable grooves (63) are provided on the inner walls of both sides of the frame (61); an arc groove (65) is provided on the side of the movable groove (63) away from the mounting rod (5); the clamp assembly (6) further comprises a clamp body (62); sliders (64) are fixedly mounted on both sides of the clamp body (62); the sliders (64) are slidably mounted in the movable grooves (63); an arc head (66) adapted to the arc groove (65) is provided on the side of the slider (64) away from the mounting rod (5).

3. The automatic quartz wafer cleaning and drying machine according to claim 2, characterized in that: Auxiliary wheels (67) are rotatably mounted on both sides of the clamp body (62), and the clamp body (62) comprises a clamping groove (68).

4. The automatic quartz wafer cleaning and drying machine according to claim 1, characterized in that: The raised seat (7) is divided into an upper raised portion (71) and a lower arc (72). A plurality of limit grooves (73) are provided on the circumference of the upper raised portion (71). An entrance (74) is provided in the middle of the upper raised portion (71). The entrance (74) includes a socket (75). The spin-drying device (8) includes a spin-drying seat (84). The raised seat (7) is fixed on the spin-drying seat (84). The bottom of the spin-drying seat (84) is fixedly connected to an output end of a motor (83). The motor (83) is fixed in a drying housing (2). The symmetry axis of the raised seat (7) and the output end of the motor (83) are located on the same horizontal line.

5. The automatic quartz wafer cleaning and drying machine according to claim 4, characterized in that: The spin-drying device (8) further comprises a filter circular plate (81) and a fixed circular plate (82) fixed on the spin-drying seat (84); the filter circular plate (81) and the fixed circular plate (82) are arranged in a shape of surrounding the lower arc body (72); the peripheral side of the lower arc body (72) is fixedly connected to the fixed circular plate (82); a spin-drying chamber (85) is formed between the filter circular plate (81) and the fixed circular plate (82); a drainage frame (86) is installed at the bottom of the drying housing (2); and the spin-drying chamber (85) and the drainage frame (86) are connected.

6. The automatic quartz wafer cleaning and drying machine according to claim 1, characterized in that: A heating fan (10) is installed on the frame, and a heating air duct (9) is connected to the heating fan (10). The heating air duct (9) includes a plurality of air outlets located above the raised seat (7), and a plurality of exhaust ports (11) are provided on the top of the drying shell (2).

7. The automatic quartz wafer cleaning and drying machine according to claim 2, characterized in that: The cleaning mechanism comprises two cleaning water pipes (300) distributed from bottom to bottom, the cleaning water pipes (300) are provided with a plurality of spray heads inclined in the direction of the hydraulic rod (100), a partition sealing device (3) is provided between the cleaning shell (1) and the drying shell (2), the partition sealing device (3) comprises a baffle (200) located between the two cleaning water pipes (300), and the clamp body (62) is located on the baffle (200) when the quartz wafer is cleaned.

8. The automatic quartz wafer cleaning and drying machine according to claim 7, characterized in that: The partition sealing device (3) further comprises a storage shell (31) fixed on the drying shell (2) and connected to the cleaning shell (1); a sealing seat (33) is slidably mounted in the storage shell (31); an electric push rod (36) fixed to the drying shell (2) is arranged outside the storage shell (31); a pushing end of the electric push rod (36) is fixedly connected to the sealing seat (33); a liquid collecting shell (32) is fixed to the storage shell (31); a liquid discharge port (35) located below the cleaning water pipe (300) is provided in the cleaning shell (1); the liquid discharge port (35) is connected to the liquid collecting shell (32); the liquid discharge port (35) is connected to a liquid discharge pipe (37); a plug seat (34) adapted to the liquid discharge port (35) is fixed to the sealing seat (33); an opening for the hydraulic rod (100) to pass through is provided in the sealing seat (33) and the plug seat (34); a sealing cover (400) is fixed to the hydraulic rod (100).

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