Precise regeneration method for AMEC yttrium oxide coating part of 8-inch chip manufacturing etching machine

Abstract

The invention relates to the technical field of semiconductor equipment surface regeneration, in particular to a precise regeneration method of an AMEC yttrium oxide coating part of an 8-inch chip manufacturing etching machine, which comprises the following steps: putting glass bead abrasive and water into a mixing tank according to a ratio of 1: 0.5, and starting the mixing tank to fully and uniformly mix the abrasive and the water to form abrasive mixed liquid; the yttrium oxide coating part is placed in a wet sand blasting machine, the spraying part faces upwards, after the surface of the part is determined, a spraying gun is started, and sand blasting treatment is conducted on the surface of the part through the spraying gun under the strong thrust effect of 1.5 kg / cm < 2 > compressed air; after sand blasting treatment is completed, residues on the surface of the component are detected through a detection device, and if the residues are found, the steps are repeated till the clean and rough film layer surface is exposed; the abrasive and the sewage after spraying are separated and recycled through a recycling system; compared with an original pneumatic polishing machine for polishing the surface of a component, more operation time is saved; and attachments in pores of the coating can be cleaned more thoroughly.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment surface regeneration, and in particular to a precise regeneration method for AMEC yttria coating components of an 8-inch chip manufacturing etching machine. Background Art

[0002] During the construction of a building project, a large amount of dust is inevitably generated due to the excavation and transportation of debris. The main pollutant in the air is dust pollution. In order to prevent and control air pollution, the existing technology mostly uses water spraying devices to reduce dust in the air. However, this method will make the ground slippery and affect the construction progress. Therefore, it is necessary to stop the construction before operating. Moreover, spraying water alone cannot purify the air, and the effect of preventing and controlling air pollution is general.

[0003] Most of the existing grinding of yttrium oxide coated parts removes material by friction between the high-speed rotating grinding head and the surface of the part, resulting in uneven surface roughness of the part, local over-grinding and depression, or insufficient grinding and uneven surface smoothness. At the same time, the yttrium oxide coating wears quickly and has a short life. It is also impossible to perform deep treatment, and the parts are not thoroughly cleaned and have residual attachments.

[0004] Therefore, in order to solve the above-mentioned problems of depressions caused by local over-polishing, or insufficient surface smoothness caused by insufficient polishing, and the inability to perform deep processing, incomplete component cleaning, and residual attachments, a precise regeneration method for AMEC yttrium oxide coated components of the 8-inch chip manufacturing etching machine can be designed. Summary of the invention

[0005] In order to overcome the problem of dents caused by local over-grinding, or the surface being not smooth enough due to insufficient grinding, and the inability to perform deep processing, the parts are not thoroughly cleaned, and there are problems of residual attachments.

[0006] The technical solution of the present invention is: a precise regeneration method for AMEC yttria coating components of an 8-inch chip manufacturing etching machine, comprising the following steps:

[0007] Step 1: Put glass bead abrasive and water into a mixing tank at a ratio of 1:0.5, start the mixing tank to fully and evenly mix the abrasive and water to form an abrasive mixed liquid;

[0008] Step 2: Place the yttria-coated part in the wet sandblasting machine with the spraying part facing upward. After the surface of the part is determined, start the spray gun at 1.5kg / cm 2 Under the powerful thrust of compressed air, the surface of the component is sandblasted by a spray gun;

[0009] Step 3: After the sandblasting is completed, turn off the sandblasting machine, take out the parts, and use the detection device to detect the residues on the surface of the parts. If residues are found, repeat the above steps until a clean and rough film surface is exposed, ready for subsequent painting or other processing procedures;

[0010] Step 4: After the blasting is completed, the abrasive and wastewater are separated and recycled through the recycling system.

[0011] Preferably, the distance between the spray gun and the component is 10 to 15 cm, and the spraying time at the same part is ≤ 3 s.

[0012] Preferably, the recovery system includes a primary collection box, a sedimentation separation tank, a filtering device, an abrasive cleaning and regeneration device and a sewage treatment and discharge device.

[0013] Preferably, after the abrasive and wastewater are sprayed from the spray gun onto the workpiece surface, the wastewater flows into the primary collection box of the recovery system along the recovery channel due to gravity. A special recovery channel is provided at the bottom or side of the wet sandblasting machine and connected to the recovery system.

[0014] Preferably, the abrasive and sewage mixture is pumped from the primary collection box to a sedimentation separation tank, where the mixture is allowed to stand for 10 to 30 minutes using the density difference between the abrasive and water. Larger particles of abrasive settle to the bottom of the tank first, while sewage containing smaller particles of abrasive and impurities is suspended in the upper layer.

[0015] Preferably, the precipitated sewage flows out through the drain outlet and enters the primary filtration device. The primary filtration device adopts a multi-layer filter structure. The apertures of the filters are arranged in sequence from large to small. The larger impurity particles in the sewage are first intercepted, such as broken abrasive fragments and large pieces of dirt fallen off the surface of the workpiece, and then the small particles are gradually filtered out to preliminarily purify the sewage.

[0016] Preferably, the abrasives settled at the bottom of the separation tank are discharged through the discharge port and transported to the abrasive cleaning equipment. The cleaning equipment adopts a combination of water flushing and stirring, and uses high-pressure water to wash away the dirt, impurities and residual tiny particles attached to the surface of the abrasive, and at the same time stirs the abrasive; the cleaned abrasive is drained or dried to restore its original performance and particle size distribution.

[0017] Preferably, a proper amount of flocculant is added to the sewage after primary filtration to aggregate the tiny suspended particles in the sewage into larger flocs, which are then further removed by sedimentation or filtration. The treated sewage that meets the standards is discharged into the municipal sewage network.

[0018] Preferably, the pore size of the first filter layer is 2-5 mm, the pore size of the second filter layer is 0.5-2 mm, and the pore size of the third filter layer is 0.1-0.5 mm.

[0019] The beneficial effects of the present invention are as follows: the addition of water can reduce the impact force of the abrasive on the workpiece, reduce the damage to the workpiece surface, and can take away the heat generated by the impact and the broken abrasive particles, reduce the cracks or local peeling of the coating, can well maintain its integrity, extend the service life, and reduce dust pollution; during the blasting process of the wet sandblasting machine, the abrasive particles impact the surface of the yttrium oxide coating component at a high speed, which can finely shape the microstructure of the coating surface; it can remove tiny protrusions, flaws and uneven parts on the surface, so that the surface roughness reaches an ideal uniform state, which can enhance the gap between the coating and the substrate Adhesion, enhance the adhesion between the coating and the substrate; wet sandblasting machine saves more working time than the original pneumatic polishing machine for polishing the surface of components; the attachments in the pores of the coating are cleaned more thoroughly; and the amount of dust generated by the wet sandblasting machine is far less than that of dry sandblasting, which can not only reduce the pollution to the working environment and protect the health of the operators, but also avoid the dust adsorbed on the surface of the components and affecting the polishing effect and subsequent processing quality; and through appropriate injection pressure, distance and swing mode of the spray gun, large-area surface polishing can be achieved in a shorter time, greatly improving work efficiency, shortening production cycle, and thus improving production capacity. DETAILED DESCRIPTION

[0020] The present invention will be further described below in conjunction with the embodiments.

[0021] Example 1

[0022] Put glass bead abrasive and water in a mixing tank at a ratio of 1:0.5, start the mixing tank to mix the abrasive and water fully and evenly to form an abrasive mixture; place the yttrium oxide coated part in the wet sandblasting machine, with the spraying part facing upward and 10 cm away from the spray gun. After the surface of the part is determined, start the spray gun at 1.5 kg / cm 2Under the powerful thrust of compressed air, the surface of the component is sandblasted by a spray gun, and the spraying time of the same part is ≤3s; after the sandblasting is completed, the sandblasting machine is turned off, the component is taken out, and the residue on the surface of the component is detected by the detection device. If residue is found, the above steps are repeated until a clean and rough film surface is exposed, ready for subsequent coating or other processing procedures; during the spraying process, the sewage flows into the primary collection box of the recovery system along the recovery channel under the action of gravity. From the primary collection box, the abrasive and sewage mixture will be pumped to the sedimentation separation tank. In the sedimentation tank, the density difference between the abrasive and water is used, and the mixed liquid is left to stand for 10 minutes. The larger particles of abrasive will first settle to the bottom of the tank, and the sewage containing smaller particles of abrasive and impurities will be suspended in the upper layer; the precipitated sewage flows out through the drain port and enters the primary filtration device, and passes through the 2mm filter screen in turn. , 0.5mm filter screen and 0.1mm filter screen are used to intercept the broken abrasive fragments and large dirt pieces falling off the surface of the workpiece in the sewage, and then gradually filter out the small particles to preliminarily purify the sewage to prevent these impurities from clogging or damaging the subsequent treatment equipment. The abrasives settled at the bottom of the separation tank are discharged through the discharge port and transported to the abrasive cleaning equipment. The cleaning equipment adopts a combination of water flushing and stirring. The dirt, impurities and residual tiny particles attached to the surface of the abrasive are washed away by high-pressure water flow, and the abrasive is turned over by stirring. The cleaned abrasive is drained or dried to restore its original performance and particle size distribution. An appropriate amount of flocculant is added to the sewage after primary filtration to make the tiny suspended particles in the sewage condense into larger flocs, which are then further removed by sedimentation or filtration. The treated sewage that meets the standards is discharged into the municipal sewage network.

[0023] Example 2

[0024] Put glass bead abrasive and water in a mixing tank at a ratio of 1:0.5, start the mixing tank to mix the abrasive and water fully and evenly to form an abrasive mixture; place the yttrium oxide coated part in the wet sandblasting machine, with the spraying part facing upward and 15 cm away from the spray gun. After the surface of the part is determined, start the spray gun at 1.5 kg / cm 2Under the powerful thrust of compressed air, the surface of the component is sandblasted by a spray gun, and the spraying time of the same part is ≤3s; after the sandblasting is completed, the sandblasting machine is turned off, the component is taken out, and the residue on the surface of the component is detected by the detection device. If residue is found, the above steps are repeated until a clean and rough film surface is exposed, ready for subsequent coating or other processing procedures; during the spraying process, the sewage flows into the primary collection box of the recycling system along the recovery channel under the action of gravity. From the primary collection box, the abrasive and sewage mixture will be pumped to the sedimentation separation tank. In the sedimentation tank, the density difference between the abrasive and water is used, and the mixed liquid is left to stand for 30 minutes. The larger particles of abrasive first settle to the bottom of the tank, and the sewage containing smaller particles of abrasive and impurities is suspended in the upper layer; the precipitated sewage flows out through the drain port and enters the primary filtration device, passing through the 5mm filter, 2mm filter and 0.5mm filter in turn, first intercepting the broken abrasive fragments in the sewage, large pieces of dirt falling off the surface of the workpiece, and then gradually filtering out the small particles, and preliminarily purifying The abrasives deposited at the bottom of the separation tank are discharged through the discharge port and transported to the abrasive cleaning equipment. The cleaning equipment uses a combination of water flushing and stirring to use high-pressure water to wash away the dirt, impurities and residual tiny particles attached to the surface of the abrasives, and stir the abrasives at the same time. The washed abrasives are drained or dried to restore their original performance and particle size distribution. An appropriate amount of flocculant is added to the sewage after primary filtration to make the tiny suspended particles in the sewage condense into larger flocs, which are then further removed by sedimentation or filtration. The treated sewage that meets the standards is discharged into the municipal sewage network. When the abrasive recovery requirements are too high, after the primary filtration of the sewage, centrifugal separation technology is used to further separate it. The sewage after primary filtration is introduced into a high-speed rotating centrifuge, and the centrifugal force is used to make the tiny abrasive particles gather to the inner wall of the centrifuge, while the purified water is discharged from the center of the centrifuge. After separation, the abrasives are cleaned.

[0025] The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine using Examples 1 and 2 can remove tiny protrusions, flaws and uneven parts on the surface, so that the surface roughness reaches an ideal uniform state, and can enhance the adhesion between the coating and the substrate; the wet sandblasting machine saves more operating time than the original pneumatic polishing machine for polishing the surface of the component; the attachments in the pores of the coating are cleaned more thoroughly; and the amount of dust generated by the wet sandblasting machine is far less than that of dry sandblasting, which can not only reduce the pollution to the working environment and protect the health of the operators, but also avoid the dust adsorbed on the surface of the component to affect the polishing effect and subsequent processing quality.

Claims

The precision regeneration method of AMEC yttria coating parts of 1.8-inch chip manufacturing etching machine includes the following steps: Step 1: Put glass bead abrasive and water into a mixing tank at a ratio of 1:0.5, start the mixing tank to fully and evenly mix the abrasive and water to form an abrasive mixed liquid; Step 2: Place the yttria-coated part in the wet sandblasting machine with the spraying part facing upward. After the surface of the part is determined, start the spray gun at 1.5kg / cm 2 Under the powerful thrust of compressed air, the surface of the component is sandblasted by a spray gun; Step 3: After the sandblasting is completed, turn off the sandblasting machine, take out the parts, and use the detection device to detect the residues on the surface of the parts. If residues are found, repeat the above steps until a clean and rough film surface is exposed, ready for subsequent painting or other processing procedures; Step 4: After the blasting is completed, the abrasive and wastewater are separated and recycled through the recycling system.

2. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 1, characterized in that: The distance between the spray gun and the component is 10 to 15 cm, and the spraying time on the same part is ≤ 3 s.

3. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 1, characterized in that: The recycling system includes a primary collection box, a sedimentation and separation tank, a filtering device, an abrasive cleaning and regeneration device, and a sewage treatment and discharge device.

4. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 3, characterized in that: When the abrasive and wastewater are sprayed from the spray gun onto the workpiece surface, the wastewater flows into the primary collection box of the recovery system along the recovery channel due to gravity.

5. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 4, characterized in that: From the primary collection box, the abrasive and sewage mixture will be pumped to the sedimentation separation tank. In the sedimentation tank, the density difference between the abrasive and water is used to allow the mixture to stand for 10 to 30 minutes. The larger particles of abrasive will settle to the bottom of the tank first, and the sewage containing smaller particles of abrasive and impurities will be suspended in the upper layer.

6. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 5, characterized in that: The precipitated sewage flows out through the drain outlet and enters the primary filtration device. The primary filtration device adopts a multi-layer filter structure. The apertures of the filters are arranged in sequence from large to small. They first intercept larger impurity particles in the sewage, such as broken abrasive fragments and large pieces of dirt fallen off the surface of the workpiece, and then gradually filter out small particles to preliminarily purify the sewage.

7. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 5, characterized in that: The abrasives settled at the bottom of the separation tank are discharged through the discharge port and transported to the abrasive cleaning equipment. The cleaning equipment adopts a combination of water flushing and stirring. The high-pressure water flow is used to wash away the dirt, impurities and residual tiny particles attached to the surface of the abrasive, and the abrasive is turned over by stirring. The cleaned abrasive is drained or dried to restore its original performance and particle size distribution.

8. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 6, characterized in that: Add an appropriate amount of flocculant to the sewage after primary filtration to make the tiny suspended particles in the sewage coagulate into larger flocs, which are then further removed through sedimentation or filtration. The treated sewage that meets the standards is discharged into the municipal sewage network.

9. The precise regeneration method of the AMEC yttria coating components of the 8-inch chip manufacturing etching machine according to claim 6, characterized in that: The aperture of the first filter layer is 2-5 mm, the aperture of the second filter layer is 0.5-2 mm, and the aperture of the third filter layer is 0.1-0.5 mm.