X-ray scattering measurement equipment, monitoring method and medium

Abstract

An X-ray scattering measurement device comprises an X-ray source, a monitoring detector, a monitoring adjusting system and a vacuum collimation system, and the vacuum collimation system comprises a first slit; when X-rays emitted by the X-ray source irradiate the first slit, the part, blocked by the first slit, in the X-rays forms first scattering X-rays; the monitoring detector is used for detecting the first scattering X-ray and outputting intensity information; and the monitoring and adjusting system processes the intensity information to obtain intensity monitoring data of the X-rays, and monitors the X-ray source according to the intensity monitoring data. Since the first scattering X-ray belongs to useless X-ray which is blocked by the first slit of the vacuum collimation system and cannot participate in measurement, the useless X-ray in the measuring light path is used as a monitoring object, and the X-ray source can be monitored in real time without interrupting the measuring process; meanwhile, the state of the X-ray source is judged according to the real-time monitoring result, the reason causing the abnormal measurement result can be automatically recognized, countermeasures are adopted, and the intensity stability of the X-ray source is guaranteed.

Description

Technical Field

[0001] The present invention relates to the field of optical measurement equipment, and in particular to an X-ray scattering measurement equipment, a monitoring method and a medium. Background Art

[0002] Critical Dimension Small Angle X-ray Scattering (CD-SAXS) is a transmission variable angle X-ray scattering measurement technology that can be used to measure complex periodic structural features of 1-100 nanometers. Taking the measurement of high aspect ratio structures (HAR) of semiconductor devices as an example, the X-ray beam penetrates the semiconductor device and scatters from the HAR structure. By detecting the angular distribution information of the scattered X-rays of the HAR structure, the three-dimensional morphology of the HAR structure can be reconstructed through the CD-SAXS analysis algorithm, thereby realizing the measurement of the critical dimensions of the HAR structure in the lateral and depth directions.

[0003] Since the X-ray light source configured for CD-SAXS measurement equipment needs to have characteristics such as high power and high brightness, the X-ray light sources that currently meet this characteristic mainly include synchrotron radiation X-ray light sources, liquid metal target X-ray light sources, rotating anode target X-ray light sources, etc.; among them, synchrotron radiation X-ray light sources are large scientific facilities with extremely high construction and maintenance costs, and are not suitable for widespread use in CD-SAXS equipment; therefore, existing CD-SAXS measurement equipment usually uses liquid metal target X-ray light sources or rotating anode target X-ray light sources; but compared with fixed anode target light sources, the structures of these two light sources are more complicated, so their intensity stability is poor; and in the measurement process, the intensity stability of the X-ray light source is the key factor to ensure the accuracy and consistency of the measurement results; therefore, how to monitor and control the X-ray light source has become a technical problem that needs to be urgently solved in the industry. Summary of the invention

[0004] The main technical problem solved by the present invention is to provide an X-ray scattering measurement device, a monitoring method and a medium, which can realize real-time monitoring and adjustment of an X-ray source.

[0005] According to the first aspect, an embodiment provides an X-ray scattering measurement device, comprising: An X-ray source, used for emitting X-rays; a vacuum collimation system, arranged on an X-ray emission path of the X-ray source, the vacuum collimation system comprising a first slit; when the X-rays emitted by the X-ray source irradiate the first slit, the portion of the X-rays passing through the first slit forms a measurement X-ray beam, and the portion of the X-rays blocked by the first slit forms a first scattered X-ray; the measurement X-ray beam is used to irradiate a sample to be measured; A detection system, used for receiving the second scattered X-rays formed after the measuring X-ray beam passes through the sample to be measured, and outputting the measurement information of the morphology of the sample to be measured; a monitoring detector, arranged on an optical path of the first scattered X-ray; the monitoring detector detects the first scattered X-ray and outputs intensity information of the first scattered X-ray; A monitoring and adjustment system is connected to the X-ray source and the monitoring detector respectively; the monitoring and adjustment system processes the intensity information to obtain intensity monitoring data about the X-rays, and monitors the X-ray source according to the intensity monitoring data.

[0006] In one embodiment, the number of the monitoring detectors is set to be multiple; the multiple monitoring detectors are arranged around the opening center line of the first slit and at intervals on one side of the first slit close to the X-ray source.

[0007] In one embodiment, the first slit includes a plurality of slits, and the plurality of slits together define an opening of the first slit; the plurality of monitoring detectors correspond one-to-one to the plurality of slits, so that each monitoring detector can detect the first scattered X-rays blocked by the corresponding slit.

[0008] In one embodiment, the monitoring detector detects the number of photons of the first scattered X-ray and uses the number of photons to determine the intensity information; the monitoring and adjustment system processes the intensity information to obtain the intensity monitoring data.

[0009] In one embodiment, the monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. When the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

[0010] In one embodiment, the monitoring and adjustment system further compares the intensity monitoring data with a second preset intensity threshold, and the second preset intensity threshold is less than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for adjusting the output power of the X-ray source, outputting instruction information for adjusting the environmental parameters of the environment in which the X-ray source is located, and outputting instruction information for adjusting the spatial position of the X-ray source; When the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for pausing the X-ray source from emitting X-rays, and outputting an abnormal alarm.

[0011] In one embodiment, it further comprises a first translation stage system and / or an environmental control system; wherein: The X-ray source is arranged on the first translation stage system; the translation stage system is connected to the monitoring and adjustment system to adjust the spatial position of the X-ray source according to the instruction information output by the monitoring and adjustment system; The environmental control system is used to monitor and adjust the environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

[0012] According to a second aspect, an embodiment provides a monitoring method for an X-ray scattering measurement device, comprising: Controlling the X-ray source to emit X-rays; Detecting, by a monitoring detector, first scattered X-rays formed by being blocked by a first slit of the vacuum collimation system, and obtaining intensity information of the first scattered X-rays; The intensity information is processed by a monitoring and adjustment system respectively connected to the X-ray source and the monitoring detector to obtain intensity monitoring data about the X-rays, and the X-ray source is monitored according to the intensity monitoring data.

[0013] In one embodiment, monitoring the X-ray source according to the intensity monitoring data includes: The intensity monitoring data is compared with a first preset intensity threshold, and if the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

[0014] In one embodiment, the monitoring the X-ray source according to the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold; If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, perform the following steps: Determining whether an environmental parameter of the environment in which the X-ray source is located deviates from a preset environmental reference value; If the environmental parameter deviates from the preset environmental reference value, then the instruction information for adjusting the environmental parameter is output, so that after the environmental parameter is adjusted to the preset environmental reference value, the intensity monitoring data obtained after the environmental parameter is adjusted is compared with the first preset intensity threshold and the second preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the environmental parameter does not deviate from the preset environmental reference value, determining whether the intensity information output by the plurality of monitoring detectors changes synchronously; If the intensity information obtained by the plurality of monitoring detectors changes synchronously, then the instruction information for adjusting the output power of the X-ray source is output, until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the intensity information obtained by the plurality of monitoring detectors does not change synchronously, then the instruction information for adjusting the spatial position of the X-ray source is output, so that after the intensity information obtained by each monitoring detector returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source is compared with the first preset intensity threshold and the second preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting instruction information for pausing the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

[0015] In one embodiment, detecting the first scattered X-rays blocked by the first slit of the vacuum collimation system by a monitoring detector to obtain the intensity information of the first scattered X-rays includes: detecting the number of photons of the corresponding first scattered X-rays by a plurality of monitoring detectors arranged at intervals around the opening center line of the first slit; Wherein, the intensity information obtained by each monitoring detector includes the number of photons.

[0016] According to a third aspect, an embodiment provides a computer-readable storage medium, on which a computer program is stored. The computer program can be executed by a processor to implement the monitoring method described in the first aspect.

[0017] According to the above-mentioned embodiment, the X-ray scattering measurement equipment includes an X-ray source, a monitoring detector, a monitoring and adjusting system, and a vacuum collimation system, wherein the vacuum collimation system includes a first slit; when the X-ray emitted by the X-ray source irradiates the first slit, the part of the X-ray blocked by the first slit forms a first scattered X-ray; the monitoring detector is used to detect the first scattered X-ray and output intensity information; the monitoring and adjusting system processes the intensity information to obtain X-ray intensity monitoring data, and monitors the X-ray source according to the intensity monitoring data. Since the first scattered X-ray is a useless X-ray that is blocked by the vacuum collimation system and cannot participate in the measurement, the useless X-ray in the measurement optical path is used as the monitoring object, and the X-ray source can be monitored in real time without interrupting the measurement process; at the same time, the state of the X-ray source is judged according to the real-time monitoring results, and the cause of the abnormal measurement result can be automatically identified and countermeasures can be adopted to ensure the intensity stability of the X-ray source. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1FIG. 4 is a schematic diagram of a system structure architecture of an X-ray scattering measurement device according to an embodiment.

[0019] Figure 2 for Figure 1 A partially enlarged schematic diagram of the system structure of the X-ray scattering measurement equipment.

[0020] Figure 3 FIG. 1 is a schematic diagram showing the arrangement principle of monitoring detectors in an X-ray scattering measurement device according to an embodiment.

[0021] Figure 4 FIG. 1 is a schematic diagram of the formation principle of the first scattered X-ray in an X-ray scattering measurement device according to an embodiment.

[0022] Figure 5 FIG. 4 is a schematic diagram of the structure of a first slit in an X-ray scattering measurement device according to an embodiment.

[0023] Figure 6 The figure is a schematic diagram of the process principle of a monitoring method according to an embodiment.

[0024] Figure 7 The figure is a schematic diagram of the process principle of the monitoring step in a monitoring method of an embodiment.

[0025] Figure 8 The present invention is a logic flow chart of monitoring steps in a monitoring method according to an embodiment.

[0026] In the figure: 10. X-ray source; 20. Vacuum collimation system; 21. First slit; 21a. Slit; 22. Second slit; 23. Third slit; 30. Second translation stage system; 40. Detection system; 41. Vacuum scattering system; 42. X-ray detector; 50. Monitoring detector; 60. Monitoring and adjustment system; 70. First translation stage system; 80. Environmental control system; L1. Measurement of X-ray beam; L2. First scattered X-ray. DETAILED DESCRIPTION

[0027] The present invention is further described in detail below by specific embodiments in conjunction with the accompanying drawings. Wherein similar elements in different embodiments adopt associated similar element numbers. In the following embodiments, many detailed descriptions are for making the present application better understood. However, those skilled in the art can easily recognize that some features can be omitted in different situations, or can be replaced by other elements, materials, methods. In some cases, some operations related to the present application are not shown or described in the specification, this is to avoid the core part of the present application being overwhelmed by too much description, and for those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations according to the description in the specification and the general technical knowledge in the art.

[0028] In addition, the features, operations or characteristics described in the specification can be combined in any appropriate manner to form various implementations. At the same time, the steps or actions in the method description can also be interchanged or adjusted in a manner that is obvious to those skilled in the art. Therefore, the various sequences in the specification and the drawings are only for the purpose of clearly describing a certain embodiment and are not meant to be a required sequence, unless otherwise specified that a certain sequence must be followed.

[0029] The serial numbers assigned to the components herein, such as "first", "second", etc., are only used to distinguish the objects described and do not have any order or technical meaning. The "connection" and "coupling" mentioned in this application, unless otherwise specified, include direct and indirect connections (couplings).

[0030] At present, the monitoring method used for the X-ray source of CD-SAXS (critical dimension small angle X-ray scattering) measurement equipment is mainly regular sampling detection, that is, during the use of the equipment, an X-ray detector is regularly inserted into the main X-ray measurement optical path, and the state of the X-ray source is judged by detecting the change of the X-ray intensity relative to the previous value, and corresponding measures are taken according to the state of the X-ray source, such as adjusting the output power of the X-ray source, re-calibrating the light intensity of the detection system and the algorithm analysis system, etc.

[0031] However, this monitoring method has the following disadvantages: 1. It is necessary to interrupt the measurement process of the measuring equipment, which will greatly reduce the measurement flux of the equipment and cause loss of X-ray intensity in the main optical path of the measurement; 2. Due to the regular sampling test, it is often impossible to find the abnormality of the X-ray source in time; although it is possible to find the abnormality of the X-ray source through the change of the final measurement result, because the measurement result is mainly related to the morphology of the sample itself, it is impossible to directly locate the cause of the abnormal measurement result to the X-ray source in the first place, making it difficult to analyze the root cause of the abnormal point of the measurement result; 3. Since the abnormality of the X-ray source cannot be discovered immediately, the reliability of some of the measurement data before the abnormality is discovered is also reduced; 4. Since causal analysis cannot be decoupled from the measurement results of sample morphology, it is difficult to automatically analyze and process abnormal measurement results, which will greatly increase the cost of daily operation and maintenance of measurement equipment.

[0032] 5. Since the X-ray source usually needs to be installed on a multi-degree-of-freedom electric translation table, the vibration generated by the electric translation table is also a factor that causes abnormal measurement results or unstable X-ray sources. However, existing monitoring methods are unable to monitor these influencing factors, which will further increase the difficulty of root cause analysis of abnormal measurement results.

[0033] See also Figures 1 to 5 The embodiment of the present application provides an X-ray scattering measurement device (hereinafter referred to as the measurement device), which can be used to measure the critical dimensions of nano-etched structures in semiconductor devices; the measurement device includes an X-ray source 10, a vacuum collimation system 20, a second translation stage system 30, a detection system 40, a monitoring detector 50, a monitoring adjustment system 60, and other functional components that exist as needed; the measurement device can achieve real-time monitoring and automatic adjustment of the X-ray source 10 by monitoring useless X-rays in the optical path of the measurement device through the cooperation of the monitoring detector 50 and the monitoring adjustment system 60; the specific description is as follows.

[0034] See also Figure 1 , the X-ray source 10 is mainly used to generate and emit X-rays (e.g., a point-divergent X-ray beam); in some embodiments, the X-ray source 10 may also be specifically an X-ray light source, such as a liquid metal target X-ray light source, a rotating anode target X-ray light source, etc. In other embodiments, the X-ray source 10 may also be a combination of an X-ray light source and a collimating monochromator (e.g., a Montel monochromator with a multilayer film structure), the collimating monochromator receives the X-rays emitted by the X-ray light source, and converts the received X-rays (e.g., a point-divergent complex X-ray beam) into a quasi-monochromatic quasi-parallel X-ray beam and then outputs it, thereby realizing the function of the X-ray source 10 to emit an X-ray beam.

[0035] See also Figure 1 The vacuum collimation system 20 is arranged on the X-ray emission path of the X-ray source 10. The vacuum collimation system 20 includes one or more slits, which can limit the opening angle of the X-ray beam, block astigmatism, improve energy resolution, etc., so that the vacuum collimation system 20 can further collimate the X-ray beam output by the X-ray source 10 and realize precise control of the X-ray beam spot size, so as to finally project the X-ray to the sample to be tested.

[0036] For example, see Figure 1 , the vacuum collimation system 20 includes a first slit 21, a third slit 23, and a second slit 22 located between the first slit 21 and the third slit 23; wherein the first slit 21 is located at one end of the vacuum collimation system 20 close to the X-ray source 10; that is, in some embodiments, the first slit 21 can be understood as an entrance slit for the vacuum collimation system 20 to receive X-rays, and the third slit 23 can be understood as an exit slit for the vacuum collimation system 20 to output X-rays. The first slit 21, the second slit 22, and the third slit 23 and the optical paths therebetween can be in a vacuum environment to reduce the attenuation of the X-ray beam caused by air during transmission.

[0037] See also Figure 3When the X-rays emitted by the X-ray source 10 irradiate the first slit 21, a part of the X-rays will pass through the opening of the first slit 21. After being processed by the vacuum collimation system 20 (for example, after being processed by the second slit 22 and the third slit 23), this part of the X-rays will be guided by the vacuum collimation system 20 and projected onto the sample to be measured to participate in the measurement; the other part of the X-rays will be blocked by the first slit 21 and cannot participate in the measurement. For the convenience of distinction and description, the part of the X-rays that passes through the first slit 21 is defined as the measurement X-ray beam L1, and the part of the X-rays that is blocked by the first slit 21 (for example, the X-rays that are scattered due to being blocked by the first slit 21) is defined as the first scattered X-ray L2; it can be understood that the measurement X-ray beam L1 is an X-ray beam used to irradiate the sample to be measured and participate in the measurement.

[0038] See also Figure 1 The second translation stage system 30 is arranged between the vacuum collimation system 20 and the detection system 40; wherein the second translation stage system 30 can have multiple degrees of freedom of movement (for example, including the degrees of freedom of movement along the three axes of X, Y, and Z and the degrees of freedom of rotation around the three axes of X, Y, and Z), and is mainly used to carry the sample to be tested, so as to achieve precise positioning of any point on the sample to be tested, and at the same time, realize the adjustment and scanning control of the angular position of the sample to be tested relative to the axis of the optical path.

[0039] The detection system 40 is mainly used to receive and measure the scattered X-rays (e.g., X-rays scattered by periodic nano-etching structures in semiconductor devices) generated by the X-ray beam L1 after passing through the sample to be tested. For the sake of distinction, the scattered X-rays generated by the sample to be tested are defined as second scattered X-rays. By detecting the intensity and angular distribution information of the second scattered X-rays, measurement information of the morphology of the sample to be tested (e.g., the three-dimensional morphology of the periodic nano-etching structures in semiconductor devices) can be output.

[0040] For example, see Figure 1 The detection system 40 includes a vacuum scattering system 41 and an X-ray detector 42; wherein the vacuum scattering system 41 may include a high vacuum cavity structure, and the vacuum scattering system 41 is used to provide a vacuum transmission environment for the second scattered X-rays generated by the sample to be tested to be transmitted to the X-ray detector 42, so as to reduce the attenuation of the second scattered X-rays caused by the air during the transmission process; and the X-ray detector is used to detect the intensity and angular distribution information of the second scattered X-rays, thereby outputting the measurement information of the morphology of the sample to be tested.

[0041] See also Figures 1 to 3The monitoring detector 50 is arranged on the optical path of the first scattered X-ray L2. For example, in the direction of the optical path of the measuring X-ray beam L1, the monitoring detector 50 is arranged on the side of the first slit 21 close to the X-ray source 10; the monitoring detector 50 is mainly used to detect the first scattered X-ray L2 and output the intensity information of the first scattered X-ray L2.

[0042] Exemplarily, the monitoring detector 50 includes a photon counter, and the number of photons of the first scattered X-ray L2 is detected by the monitoring detector 50, and the intensity information of the first scattered X-ray L2 is determined by using the number of photons.

[0043] Of course, the monitoring detector 50 may also adopt other types of X-ray signal detection devices. For example, the monitoring detector 50 can output the light intensity as intensity information by detecting the light intensity of the first scattered X-ray L2.

[0044] See also Figure 1 and Figure 2 The monitoring and adjusting system 60 is respectively connected to the X-ray source 10 and the monitoring detector 50. The monitoring and adjusting system 60 can be understood as a device or system which is constructed by a combination of a controller, a processor and related functional components and has functions such as data analysis and processing; the monitoring and adjusting system 60 is mainly used to receive and process the intensity information output by the monitoring detector 50 to obtain intensity monitoring data about the X-rays, and monitor the X-ray source 10 according to the intensity monitoring data.

[0045] Exemplarily, the monitoring and adjustment system 60 may compare the intensity monitoring data with a preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0046] If the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is normal, the monitoring and adjusting system 60 may only generate a monitoring record report in the form of a document so that the measurement process of the measurement equipment can proceed normally and continuously.

[0047] If the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal, the monitoring and adjustment system 60 outputs instruction information for adjusting the X-ray source 10 (such as outputting instruction information to the control system of the vector measurement equipment), so that the measurement equipment can automatically and autonomously adjust the output power of the X-ray source 10, adjust the environmental parameters of the environment in which the X-ray source 10 is located, adjust the spatial position of the X-ray source 10, pause the X-ray source 10 from emitting X-rays, pause the measurement process, generate an abnormal monitoring report in the form of a document, output an abnormal alarm, generate an abnormal monitoring and adjustment report in the form of a document, and other operations.

[0048] It should be noted that the description of the "control system of the measuring equipment" is introduced in this article only to understand the role of the monitoring and adjustment system 60 in the measuring equipment, and the control system can be understood as a collection of related components used to regulate and manage related functional devices, functional systems, etc. in the measuring equipment. The control system can support the realization of all or part of the functions of the measuring equipment.

[0049] That is to say, in some embodiments, the monitoring and adjustment system 60 may be a functional system independently provided relative to the control system of the measuring device, and the monitoring and adjustment system 60 cooperates with the control system of the measuring device to analyze and process the intensity information output by the monitoring detector 50 with the help of the monitoring and adjustment system 60, so as to issue corresponding instruction information to the control system of the measuring device according to the obtained intensity monitoring data, so as to prompt the control system of the measuring device to make corresponding adjustments to the X-ray source 10, etc. In other embodiments, the monitoring and adjustment system 60 may be a part of the control system of the measuring device, or the control system of the measuring device has the functions of the monitoring and adjustment system 60, so that the monitoring and adjustment system 60 can directly make corresponding adjustments to the X-ray source 10, etc. according to the intensity monitoring data.

[0050] Therefore, based on the cooperation between the monitoring detector 50 and the monitoring and adjustment system 60, a monitoring system relatively independent of the main measurement system can be combined and constructed in the system structure architecture of the measuring equipment, and useless X-rays (i.e., the first scattered X-rays L2) in the optical path of the measuring equipment are used as real-time monitoring objects. By analyzing and processing the intensity information of the first scattered X-rays L2, real-time monitoring and automatic adjustment of the X-ray source 10 can be achieved.

[0051] Firstly, the measuring device can simultaneously execute the two processes of measurement and monitoring during use, that is, the measuring process and the monitoring process are carried out in parallel; this will not cause any loss to the measuring flux (or measuring X-ray beam L1) of the measuring device, and effectively ensures the measuring efficiency of the measuring device.

[0052] Secondly, during the monitoring process, the intensity stability of the X-ray source 10 can be determined in real time, and corresponding countermeasures can be automatically taken for more common abnormal monitoring results, such as adjusting the output power of the X-ray source 10; this effectively reduces the frequency of manual intervention required to handle abnormalities during equipment maintenance, thereby reducing the downtime of the measuring equipment and reducing the labor cost of daily operation and maintenance of the equipment.

[0053] Third, based on the monitoring results, the abnormality of the measurement results can be located to the X-ray source 10 in the first time, which can provide support for automatic analysis, processing and judgment of the root cause relationship between the abnormal measurement results and the abnormal state of the X-ray source 10, and can effectively improve the accuracy and consistency of the measurement results.

[0054] Fourthly, using the monitoring detector 50 to detect the first scattered X-ray L2 formed by blocking the first slit 21 can not only avoid the interference of the vibration of the X-ray source 10 on the monitoring process and ensure the accuracy of the monitoring results, but also provide support for real-time monitoring of the structural stability of the X-ray source 10, so as to include other factors affecting the intensity stability of the X-ray source 10 into the scope of real-time monitoring, which is conducive to more accurate automatic adjustment of the X-ray source 10.

[0055] For some examples, see Figures 1 to 3 The number of monitoring detectors 50 is set to be multiple, and the multiple monitoring detectors 50 are arranged at intervals around the center line of the opening of the first slit 21 on the side of the first slit 21 close to the X-ray source 10; for example, two monitoring detectors 50 are symmetrically arranged about the center line of the opening of the first slit 21.

[0056] Considering that the optical axis of the X-ray beam incident on the vacuum collimation system 20 (e.g., the X-ray beam output from the collimation monochromator) may deviate from the opening center line of the first slit 21, this may cause a portion of the X-ray beam to be unevenly scattered due to the blocking of the first slit 21, for example Figure 4 As shown, the signal intensity of the first scattered X-ray L2 formed above the first slit 21 is relatively strong, while the signal intensity of the first scattered X-ray L2 formed below the first slit 21 is relatively weak; therefore, by providing at least two monitoring detectors 50, effective detection of the first scattered X-ray L2 can be achieved, and the signal intensity and signal-to-noise ratio received by the monitoring and adjustment system 60 can be improved, thereby obtaining more accurate intensity monitoring data.

[0057] For some examples, see Figure 5 The first slit 21 adopts a four-blade slit structure, which includes four slits 21a with blades, and the blades of the four slits 21a jointly define the opening of the first slit 21; specifically, the four slits 21a can be divided into two groups, the two slits 21a in one group are vertically opposite to each other and the blades are arranged in parallel, and the two slits 21a in the other group are horizontally opposite to each other and the blades are arranged in parallel, and each slit 21a can be driven by a linear drive device; in this way, by driving the four slits 21a to move, the size and shape of the opening of the first slit 21 can be limited by the blades of the four slits 21a, so as to constrain the X-rays irradiating the first slit 21 in both the horizontal and vertical directions, thereby forming a measurement X-ray beam L1 and a first scattered X-ray L2.

[0058] Correspondingly, the number of monitoring detectors 50 can be set to four, and the four monitoring detectors 50 correspond one-to-one to the four slits 21a, so that each monitoring detector 50 can detect the first scattered X-ray L2 formed by being blocked by the corresponding slit 21a, thereby ensuring the signal strength of the intensity information received by the monitoring adjustment system.

[0059] Of course, the first slit 21 may also adopt a slit structure with other numbers of blades. In this case, the number of monitoring detectors 50 may be configured according to the number of slits 21 a or blade edges of the first slit 21 .

[0060] As described above, in some embodiments, the monitoring detector 50 is used to detect the number of photons of the first scattered X-ray L2, and the intensity information is determined by the number of photons. When multiple monitoring detectors 50 are provided, the monitoring and adjustment system 60 processes the intensity information obtained by each monitoring detector 50 to obtain intensity monitoring data. For example, the monitoring and adjustment system 60 can sum the number of photons detected by multiple monitoring detectors 50, and use the sum of the number of photons (i.e., the sum of the number of photons detected by multiple monitoring detectors 50) as the intensity monitoring data to monitor the X-ray source 10.

[0061] By counting the photons of the first scattered X-ray L2 by multiple monitoring detectors 50 and using the monitoring and adjustment system 60 to process the intensity information obtained by each monitoring detector 50 (for example, summing the number of photons detected by each monitoring detector 50), the signal strength of the signal received by the monitoring and adjustment system 60 can be guaranteed, and the accuracy of the intensity monitoring data obtained by the monitoring and adjustment system 60 can be improved, thereby providing strong support for the precise adjustment of the X-ray source 10; at the same time, by counting the photons of the first scattered X-ray L2, the performance of the X-ray source 10 can be determined more directly, ensuring the accuracy of the intensity monitoring data obtained.

[0062] For some examples, see Figure 1 and Figure 2 The measuring device further includes a first translation stage system 70, which may have multiple degrees of freedom, such as the degrees of freedom of movement along the X, Y, and Z axes and the degrees of freedom of rotation around the X, Y, and Z axes; the first translation stage system 70 is mainly used to carry the X-ray source 10, which can also be understood as the X-ray source 10 being mounted on the first translation stage system 70. The spatial position of the X-ray source 10 relative to the vacuum collimation system 60 can be adjusted by the first translation stage system 70 to achieve optical path alignment adjustment.

[0063] The monitoring and adjustment system 60 is connected to the first translation stage system 70 so that the first translation stage system 70 can adjust the position of the X-ray source 10 relative to the vacuum collimation system 60 according to the command information output by the monitoring and adjustment system 60; in this way, by monitoring and adjusting the first translation stage system 70, real-time monitoring and adjustment of unstable factors such as vibration of the X-ray source 10 can be achieved.

[0064] It should be noted that the spatial position of the X-ray source 10 mentioned herein refers to the relative spatial position of the X-ray source 10 and the vacuum collimation system 20 (specifically, the first slit 21 ).

[0065] For some examples, see Figure 1 and Figure 2 The measuring device further includes an environmental control system 80 connected to the monitoring and adjusting system 60, and the environmental control system 80 is used to monitor and adjust the environmental parameters of the environment in which the X-ray source 10 is located (such as the temperature of the internal and external environment of the X-ray source 10) to provide a guarantee for the stability of the X-ray source 10. Suitably, the monitoring and adjusting system 60 can receive the environmental parameters monitored by the environmental control system 80, so that when the environmental parameters change, the monitoring and adjusting system 60 can directly or indirectly send instruction information to the environmental control system 80 to adjust the environmental parameters of the X-ray source 10 according to the intensity monitoring data, thereby realizing the adjustment operation of the environmental parameters of the X-ray source 10.

[0066] As described above, in some embodiments, the monitoring and adjustment system 60 may compare the intensity monitoring data with a preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0067] Specifically, the preset intensity threshold may include a first preset intensity threshold and a second preset intensity threshold, and the first preset intensity threshold is less than the second preset intensity threshold; when the intensity monitoring data (the total number of photons obtained by real-time monitoring, or the amplitude of the change in the total number of photons within a preset time period, etc.) is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal.

[0068] When it is determined that the intensity stability of the X-ray source 10 is normal, the monitoring and adjustment system 60 may only generate a monitoring record report in a document form to avoid affecting the measurement process of the measurement equipment.

[0069] When it is determined that the intensity stability of the X-ray source 10 is abnormal and the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system 60 can output instruction information to suspend the measurement process and / or suspend the X-ray source 10 from emitting X-rays, and can simultaneously output an abnormal alarm or generate an abnormal monitoring report, etc., so that equipment engineers can manually intervene in the adjustment and maintenance operations of the measurement equipment.

[0070] When it is determined that the intensity stability of the X-ray source 10 is abnormal and the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 60 outputs instruction information for adjusting the X-ray source 10. The instruction information may include instruction information for pausing the measurement process, instruction information for controlling the environmental control system 80 to adjust the environmental parameters of the environment in which the X-ray source 10 is located, instruction information for adjusting the output power of the X-ray source 10, instruction information for controlling the second translation stage system 90 to adjust the position of the X-ray source 10, generating abnormal monitoring and adjustment reports, etc.; so that the measuring equipment can adjust the X-ray source 10 by itself, so as to continue the measurement process after the intensity stability of the X-ray source 10 returns to normal.

[0071] In other embodiments, different functional modes may be assigned to the measuring device according to actual needs and based on the cooperation between the monitoring adjustment system 60 and the monitoring detector 50 .

[0072] For example, the preset intensity threshold is the first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 60 can output instruction information such as pausing the measurement process, pausing the emission of the X-ray source 10, and can also output abnormal alarms, generate abnormal monitoring reports, etc. at the same time, so that equipment engineers can directly intervene.

[0073] For another example, the preset intensity threshold is a first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 60 can output instruction information for pausing the measurement process and adjusting the X-ray source 10 (such as adjusting the output power of the X-ray source 10, adjusting the environmental parameters of the environment in which the X-ray source 10 is located, adjusting the spatial position of the X-ray source 10, etc.), and can simultaneously generate abnormal monitoring and adjustment reports, etc., to realize automatic analysis and regulation of the measurement equipment, so as to continue the measurement process when the intensity stability of the X-ray source 10 returns to normal.

[0074] It should be noted that the preset intensity threshold, the first preset intensity threshold, the second preset intensity threshold, etc. described in this article can be determined according to actual needs. These intensity thresholds can be specific data values ​​(such as photon count values) or data value ranges.

[0075] It should be noted that Figure 1 and Figure 2The bold solid lines in the figure represent the connection relationship between the relevant functional components, and the bold dotted lines represent the main measurement beam or measurement optical path of the measurement equipment. Figure 4 The dashed line in φ represents the opening center line of the first slit 21 , and the dotted line represents the optical axis of the X-ray beam irradiating the first slit 21 .

[0076] See also Figures 6 to 8 Combined with Figures 1 to 5 The present application also provides a monitoring method for an X-ray scattering measurement device, which can realize real-time monitoring and adjustment of the X-ray scattering measurement device of the above-mentioned embodiment; please refer to Figure 6 The monitoring method includes steps 100 to 300, which are described in detail below.

[0077] Step 100: Control the X-ray source 10 to emit X-rays.

[0078] Specifically, by controlling the X-ray source 10 to emit X-rays, the measuring device is switched to a use state (e.g., a state of executing a measurement process). When the X-rays emitted by the X-ray source 10 irradiate the first slit 21, the portion of the X-rays that passes through the first slit 21 forms a measuring X-ray beam L1, and the portion blocked by the first slit 21 forms a first scattered X-ray L2; wherein the measuring X-ray beam L1 will eventually irradiate the sample to be measured carried by the second translation stage system 30; and the detection system 40 receives the scattered X-rays (i.e., the second scattered X-rays) generated by the sample to be measured, thereby outputting measurement information of the morphology of the sample to be measured.

[0079] Step 200: Detect the first scattered X-ray L2 to obtain the intensity information of the first scattered X-ray L2.

[0080] For example, see Figure 2 and Figure 3 The monitoring detector 50 disposed on the optical path of the first scattered X-ray L2 detects the number of photons of the first scattered X-ray L2, and uses the number of photons to determine and obtain the intensity information of the first scattered X-ray L2.

[0081] Step 300: Process the intensity information of the first scattered X-ray L2 to obtain intensity monitoring data about the X-ray, and monitor the X-ray source 10 according to the intensity monitoring data.

[0082] Specifically, see Figure 2 , through the monitoring and adjustment system 60 connected to the X-ray source 10 and the monitoring detector 50 respectively, the intensity information output by the monitoring detector 50 is received and processed to obtain intensity monitoring data, and the X-ray source 10 is monitored according to the intensity monitoring data.

[0083] For some examples, see Figure 2 and Figure 3A plurality of monitoring detectors 50 are arranged at positions close to the X-ray source 10 in the direction of the optical path of the measuring X-ray beam L1 at the first slit 21. The plurality of monitoring detectors 50 are arranged at intervals around the opening center line of the first slit 21. The number of photons corresponding to the first scattered X-ray L2 is detected by the monitoring detectors 50. The number of photons output by each monitoring detector 50 can be summed up by the monitoring adjustment system 60 to obtain the total number of photons, thereby obtaining intensity monitoring data.

[0084] Therefore, the useless first scattered X-ray L2 in the measuring optical path of the measuring equipment is taken as the monitoring object, and the intensity monitoring data of the X-ray is obtained according to the intensity information based on the first scattered X-ray L2, and the X-ray source 10 is monitored according to the intensity monitoring data; the X-ray source 10 can be monitored in real time synchronously without affecting the measuring process of the measuring equipment; in this way, the measuring flux of the measuring equipment will not be lost, and the state of the X-ray source 10 can be judged in real time according to the intensity monitoring data, so as to automatically take corresponding countermeasures for more common abnormal monitoring results without the need for manual intervention of equipment engineers, thereby effectively reducing the manpower cost of daily operation of the measuring equipment and ensuring the accuracy of the measurement results.

[0085] As described above, step 300 mainly includes the steps of processing the intensity information of the first scattered X-ray L2 to obtain the intensity monitoring data of the X-ray, and monitoring the X-ray source 10 according to the intensity monitoring data. Figure 8 The step of monitoring the X-ray source 10 according to the intensity monitoring data includes steps 310 to 330.

[0086] Step 310 , comparing the intensity monitoring data with a preset intensity threshold, and judging whether the intensity stability of the X-ray source 10 is normal according to the comparison result.

[0087] Specifically, when the intensity monitoring data (for example, the total number of photons obtained by the monitoring and adjustment system 60 by summing the number of photons detected and output by each monitoring detector 50) is less than or equal to a preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the preset intensity threshold, the monitoring and adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal.

[0088] Among them, the preset intensity threshold can be determined according to the state of the X-ray source 10 (such as the intensity stability state) required when the measurement equipment normally performs the measurement process; the preset intensity threshold can be a specific data value (such as the photon number value) or a data value range.

[0089] Step 320: If the intensity stability of the X-ray source 10 is normal, a monitoring record report is generated.

[0090] Specifically, when the intensity stability of the X-ray source 10 is normal, if the measuring device is in a state of executing a measurement process, there is no need to interrupt the measurement process. At this time, the monitoring and adjustment system 60 can only generate a monitoring record report; if the measuring device is in a state of pausing the measurement process, at this time, the monitoring and adjustment system 60 can output instruction information to control the measuring device to continue the measurement process and generate a monitoring record report.

[0091] Step 330: If the intensity stability of the X-ray source 10 is abnormal, the measurement process is suspended.

[0092] For some examples, see Figure 8 The preset intensity threshold includes a first preset intensity threshold and a second preset intensity threshold, the first preset intensity threshold is less than the second preset intensity threshold; when the intensity monitoring data is less than or equal to the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is normal, and when the intensity monitoring data is greater than the first preset intensity threshold (that is, the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, or the intensity monitoring data is greater than or equal to the second preset intensity threshold), it is determined that the intensity stability of the X-ray source 10 is abnormal.

[0093] In the case where the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the second preset intensity threshold, the monitoring and adjustment system 60 can perform the following operations: output command information to pause the measurement process, output command information to pause the X-ray source 10 from emitting X-rays, output abnormal alarms, generate abnormal monitoring reports, etc., so that equipment engineers can intervene manually.

[0094] In the case where the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 60 performs the following operations: outputs instruction information for pausing the measurement process, outputs instruction information for adjusting the output power of the X-ray source 10, outputs instruction information for adjusting the environmental parameters of the X-ray source 10, outputs instruction information for adjusting the spatial position of the X-ray source 10, generates abnormal monitoring and adjustment reports, etc., to achieve automatic and autonomous adjustment of the measurement equipment.

[0095] In other embodiments, the preset intensity threshold is a single preset threshold, for example, the preset intensity threshold is a first preset intensity threshold; when the intensity monitoring data is less than or equal to the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is abnormal.

[0096] In the case where it is determined that the intensity stability of the X-ray source 10 is abnormal, the monitoring and adjustment system 60 may only perform the following operations: outputting instruction information for pausing the measurement process, outputting instruction information for pausing the X-ray source 10 to emit X-rays, outputting abnormal alarms, generating abnormal monitoring reports, etc. The monitoring and adjustment system 60 may also only perform the following operations: outputting instruction information for pausing the measurement process, outputting instruction information for adjusting the output power of the X-ray source 10, outputting instruction information for adjusting the environmental parameters of the X-ray source 10, outputting instruction information for adjusting the position of the X-ray source 10, generating abnormal monitoring and adjustment reports, etc.

[0097] For some examples, see Figure 8 When the intensity stability of the X-ray source 10 is abnormal and it is necessary to pause the measurement process, adjust the X-ray source 10, etc., the steps may specifically include steps 331 to 335.

[0098] Step 331 , suspending the measurement process, and determining whether the environmental parameters of the environment in which the X-ray source 10 is located deviate from the preset environmental reference values.

[0099] Specifically, the monitoring and adjustment system 60 can compare the environmental parameters monitored by the environmental control system 80 with the preset environmental reference values ​​through the environmental parameters monitored by the environmental control system 80 to determine whether the environmental parameters of the X-ray source 10 have changed relative to the preset environmental reference values; wherein the preset environmental reference value can be understood as the environmental conditions that need to be provided for the X-ray source 10 when the measuring equipment normally executes the measurement process (for example, the internal and external environmental temperatures of the X-ray source 10), and the preset environmental reference value can be a specific value or a range of values.

[0100] Step 332, if the environmental parameters of the environment in which the X-ray source 10 is located deviate from the preset environmental reference values, the environmental parameters are adjusted to the preset environmental reference values, and the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0101] Specifically, if the environmental parameters deviate from the preset environmental reference values, the monitoring and adjustment system 60 may directly or indirectly send instruction information for adjusting the environmental parameters to the environmental control system 80, so that the environmental parameters can be adjusted to the preset environmental reference values ​​by using the environmental control system 80, so that the environmental parameters of the X-ray source 10 return to normal; then, the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity thresholds (i.e., the first preset intensity threshold and the second preset intensity threshold) and an abnormal monitoring and adjustment report is generated to continue to determine whether the intensity stability of the X-ray source 10 has returned to normal.

[0102] Step 333 , if the environmental parameters of the environment in which the X-ray source 10 is located do not deviate from the preset environmental reference values, it is determined whether the intensity information obtained or output by the multiple monitoring detectors 50 changes synchronously.

[0103] For example, it is determined whether the photon number monitoring values ​​(which can also be understood as intensity information) output by multiple monitoring detectors 50 increase or decrease synchronously relative to the previous values; if the monitoring values ​​of each monitoring detector 50 change synchronously, it means that the second translation stage system 90 is stable (that is, the spatial position of the X-ray source 10 relative to the vacuum collimation system 20 has not changed), and it means that the abnormality in the intensity stability of the X-ray source 10 is mainly caused by the attenuation of the filament of the X-ray source 10.

[0104] If the monitoring values ​​of the monitoring detectors 50 do not increase or decrease synchronously, it means that the abnormal intensity stability of the X-ray source 10 may be caused by factors such as the vibration of the second translation stage system 90 (that is, the position of the X-ray source 10 relative to the vacuum collimation system 20 has changed).

[0105] Step 334, if the intensity information obtained or output by multiple monitoring detectors 50 changes synchronously, adjust the output power of the X-ray source 10 until the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the first preset intensity threshold, and generate an intensity monitoring and adjustment report.

[0106] Specifically, after excluding the environmental parameters, relative position, etc. of the X-ray source 10 as factors that cause the abnormal intensity stability of the X-ray source 10, it can be basically determined that the output power of the X-ray source 10 affects the intensity stability of the X-ray source 10; therefore, at this time, by adjusting the output power of the X-ray source 10, the intensity stability of the X-ray source 10 can be restored to normal; after the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold (for example, less than or equal to the first preset intensity threshold), the monitoring and adjustment system 60 can output instruction information to continue the measurement process, and generate an abnormal monitoring and adjustment report based on the abnormal monitoring situation and the adjustment process.

[0107] Step 335, if the intensity information output by multiple monitoring detectors 50 does not change synchronously, the spatial position of the X-ray source 10 is adjusted, so that after the intensity information output by each monitoring detector 50 returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source 10 is compared with the preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0108] Specifically, if the intensity information output by the plurality of monitoring detectors 50 does not change synchronously, the monitoring and adjustment system 60 outputs instruction information for controlling the movement of the second translation stage system 90, so as to drive the X-ray source 10 to change its position synchronously with the help of the second translation stage system 90, so as to achieve fine adjustment of the relative spatial position between the X-ray source 10 and the vacuum collimation system 20; after the intensity information output by each monitoring detector 50 returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source 10 is compared with the preset intensity threshold (i.e., the first preset intensity threshold and the second preset intensity threshold) to continue to determine whether the intensity stability of the X-ray source 10 has returned to normal.

[0109] It should be noted that the "preset intensity reference value" mentioned here can be understood as a specific data value determined by intensity information obtained by each monitoring detector 50 detecting the first scattered X-ray L2 when the X-ray source 10 is operating stably. In other words, the preset intensity reference value can be determined based on the monitoring values ​​of each monitoring detector 50 when the X-ray source 10 is operating stably.

[0110] Based on this, since the process steps of the entire monitoring method can be carried out in real time during the measurement process of the measuring equipment, it is possible to promptly discover whether the abnormal measurement results are caused by the abnormality of the X-ray source 10, and automatically and in real time take corresponding countermeasures for the abnormality of the X-ray source 10, thereby ensuring the measurement efficiency of the equipment and greatly improving the efficiency of the root cause analysis of the abnormal measurement results, thereby ensuring the accuracy of the measurement results.

[0111] Those skilled in the art will appreciate that all or part of the functions of the various methods in the above embodiments may be implemented by hardware or by computer programs. When all or part of the functions in the above embodiments are implemented by computer programs, the program may be stored in a computer-readable storage medium, which may include: a read-only memory, a random access memory, a disk, an optical disk, a hard disk, etc. The program is executed by a computer to implement the above functions. For example, the program is stored in the memory of the device, and when the program in the memory is executed by the processor, all or part of the above functions can be implemented.

[0112] In addition, when all or part of the functions in the above-mentioned embodiments are implemented by means of a computer program, the program can also be stored in a storage medium such as a server, another computer, a disk, an optical disk, a flash drive or a mobile hard disk, and saved to the memory of a local device by downloading or copying, or the system of the local device is updated. When the program in the memory is executed by the processor, all or part of the functions in the above-mentioned embodiments can be implemented.

[0113] The above specific examples are used to illustrate the present invention, which is only used to help understand the present invention and is not intended to limit the present invention. For those skilled in the art, according to the concept of the present invention, some simple deductions, modifications or substitutions can be made.

Claims

1. An X-ray scattering measurement device, characterized in that: include: An X-ray source, for emitting X-rays; a vacuum collimation system, arranged on an X-ray emission path of the X-ray source, the vacuum collimation system comprising a first slit; when the X-rays emitted by the X-ray source irradiate the first slit, the portion of the X-rays passing through the first slit forms a measurement X-ray beam, and the portion of the X-rays blocked by the first slit forms a first scattered X-ray; the measurement X-ray beam is used to irradiate a sample to be measured; A detection system, used for receiving the second scattered X-rays formed after the measuring X-ray beam passes through the sample to be measured, and outputting the measurement information of the morphology of the sample to be measured; a monitoring detector, arranged on an optical path of the first scattered X-ray; the monitoring detector detects the first scattered X-ray and outputs intensity information of the first scattered X-ray; A monitoring and adjustment system is connected to the X-ray source and the monitoring detector respectively; the monitoring and adjustment system processes the intensity information to obtain intensity monitoring data about the X-rays, and monitors the X-ray source according to the intensity monitoring data.

2. The X-ray scattering measurement device according to claim 1, characterized in that: The number of the monitoring detectors is set to be multiple; the multiple monitoring detectors are arranged around the opening center line of the first slit and are spaced apart on one side of the first slit close to the X-ray source.

3. The X-ray scattering measurement device according to claim 2, characterized in that: The first slit includes a plurality of slits, which together define an opening of the first slit; the plurality of monitoring detectors correspond one-to-one to the plurality of slits, so that each monitoring detector can detect the first scattered X-rays blocked by the corresponding slit.

4. The X-ray scattering measurement device according to claim 1, characterized in that: The monitoring detector detects the number of photons of the first scattered X-ray and determines the intensity information using the number of photons; the monitoring and adjustment system processes the intensity information to obtain the intensity monitoring data.

5. The X-ray scattering measurement device according to any one of claims 1 to 4, characterized in that: The monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. When the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

6. The X-ray scattering measurement device according to claim 5, characterized in that: The monitoring and adjustment system further compares the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being less than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for adjusting the output power of the X-ray source, outputting instruction information for adjusting the environmental parameters of the environment in which the X-ray source is located, and outputting instruction information for adjusting the spatial position of the X-ray source; When the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for pausing the X-ray source from emitting X-rays, and outputting an abnormal alarm.

7. The X-ray scattering measurement device according to claim 5, characterized in that: Also includes a first translation stage system and / or an environmental control system; wherein: The X-ray source is arranged on the first translation stage system; the translation stage system is connected to the monitoring and adjustment system to adjust the spatial position of the X-ray source according to the instruction information output by the monitoring and adjustment system; The environmental control system is used to monitor and adjust the environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

8. A monitoring method for an X-ray scattering measurement device, characterized in that: include: Controlling the X-ray source to emit X-rays; Detecting, by a monitoring detector, first scattered X-rays blocked by a first slit of the vacuum collimation system, to obtain intensity information of the first scattered X-rays; The intensity information is processed by a monitoring and adjustment system respectively connected to the X-ray source and the monitoring detector to obtain intensity monitoring data about the X-rays, and the X-ray source is monitored according to the intensity monitoring data.

9. The monitoring method according to claim 8, characterized in that: The monitoring of the X-ray source according to the intensity monitoring data includes: The intensity monitoring data is compared with a first preset intensity threshold, and if the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

10. The monitoring method according to claim 9, characterized in that: The monitoring the X-ray source according to the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold; If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, perform the following steps: Determining whether an environmental parameter of the environment in which the X-ray source is located deviates from a preset environmental reference value; If the environmental parameter deviates from the preset environmental reference value, then the instruction information for adjusting the environmental parameter is output, so that after the environmental parameter is adjusted to the preset environmental reference value, the intensity monitoring data obtained after the environmental parameter is adjusted is compared with the first preset intensity threshold and the second preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the environmental parameter does not deviate from the preset environmental reference value, determining whether the intensity information output by the plurality of monitoring detectors changes synchronously; If the intensity information obtained by the plurality of monitoring detectors changes synchronously, then the instruction information for adjusting the output power of the X-ray source is output, until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the intensity information obtained by the plurality of monitoring detectors does not change synchronously, then the instruction information for adjusting the spatial position of the X-ray source is output, so that after the intensity information obtained by each monitoring detector returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source is compared with the first preset intensity threshold and the second preset intensity threshold, and an abnormal monitoring and adjustment report is generated; If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting instruction information for pausing the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

11. The monitoring method according to any one of claims 8 to 10, characterized in that: The step of detecting the first scattered X-rays blocked by the first slit of the vacuum collimation system by means of a monitoring detector to obtain the intensity information of the first scattered X-rays comprises: detecting the number of photons of the corresponding first scattered X-rays by means of a plurality of monitoring detectors arranged at intervals around the opening center line of the first slit; Wherein, the intensity information obtained by each monitoring detector includes the number of photons.

12. A computer-readable storage medium, characterized in that: A computer program is stored on the medium, and the computer program can be executed by a processor to implement the monitoring method according to any one of claims 8 to 11.

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