X-ray scattering measurement equipment, monitoring method and medium

Abstract

An X-ray scattering measurement device comprises a collimation monochromator, a monitoring and adjusting system, an X-ray source and a monitoring detector. The collimation monochromator receives X-rays emitted by the X-ray source and outputs a main path X-ray beam and a peripheral X-ray beam from the collimation monochromator; the monitoring detector detects the peripheral X-ray beam to obtain intensity information of the peripheral X-ray beam; and the monitoring and adjusting system processes the intensity information to obtain intensity monitoring data of the X-rays, and monitors the X-ray source according to the intensity monitoring data. Useless peripheral X-ray beams in a measuring light path are used as monitoring objects, real-time monitoring of an X-ray source can be realized without interrupting a measuring process, and any loss of flux of the measuring light beams cannot be caused; meanwhile, the state of the X-ray source is judged according to the real-time monitoring result, corresponding adjustment measures can be taken in time, abnormal points of the measurement result can be located at the first time, automatic analysis and processing of the abnormal measurement result are facilitated, and the root cause analysis efficiency of abnormal measurement is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of optical measurement equipment, and in particular to an X-ray scattering measurement equipment, a monitoring method and a medium. Background Art

[0002] Critical Dimension Small Angle X-ray Scattering (CD-SAXS) is a transmission variable angle X-ray scattering measurement technology that can be used to measure complex periodic structural features of 1-100 nanometers. Taking the measurement of high aspect ratio structures (HAR) of semiconductor devices as an example, the X-ray beam penetrates the semiconductor device and scatters from the HAR structure. By detecting the angular distribution information of the scattered X-rays of the HAR structure, the three-dimensional morphology of the HAR structure can be reconstructed through the CD-SAXS analysis algorithm, thereby realizing the measurement of the critical dimensions of the HAR structure in the lateral and depth directions.

[0003] Since the X-ray light source configured for CD-SAXS measurement equipment needs to have characteristics such as high power and high brightness, the X-ray light sources that currently meet this characteristic mainly include synchrotron radiation X-ray light sources, liquid metal target X-ray light sources, rotating anode target X-ray light sources, etc.; among them, synchrotron radiation X-ray light sources are large scientific facilities with extremely high construction and maintenance costs, and are not suitable for widespread use in CD-SAXS equipment; therefore, existing CD-SAXS measurement equipment usually uses liquid metal target X-ray light sources or rotating anode target X-ray light sources; but compared with fixed anode target light sources, the structures of these two light sources are more complicated, so their intensity stability is poor; and in the measurement process, the stability of the X-ray light source intensity is the key factor to ensure the accuracy and consistency of the measurement results; therefore, how to monitor and control the X-ray light source has become a technical problem that needs to be urgently solved in the industry. Summary of the invention

[0004] The main technical problem solved by the present invention is to provide an X-ray scattering measurement device, a monitoring method and a medium, which can realize real-time monitoring and adjustment of the X-ray light source.

[0005] According to the first aspect, an embodiment provides an X-ray scattering measurement device, comprising: X-ray source; A collimating monochromator is arranged on the X-ray emission path of the X-ray source; the collimating monochromator receives the X-rays emitted by the X-ray source, and outputs a main X-ray beam and a peripheral X-ray beam from the collimating monochromator; wherein the main X-ray beam is used to irradiate the sample to be tested, the main X-ray beam is the X-ray output after multiple reflections from the collimating monochromator, and the peripheral X-ray beam is the X-ray output after a single reflection from the collimating monochromator and / or without being reflected from the collimating monochromator; A detection system receives scattered X-rays formed after the main X-ray beam passes through the sample to be tested, and outputs measurement information of the morphology of the sample to be tested; A monitoring detector is arranged on the optical path of the peripheral X-ray beam; the monitoring detector detects the peripheral X-ray beam and outputs the intensity information of the peripheral X-ray beam; A monitoring and adjustment system is connected to the X-ray source and the monitoring detector respectively; the monitoring and adjustment system processes the intensity information to obtain intensity monitoring data about the X-rays, and monitors the X-ray source according to the intensity monitoring data.

[0006] In one embodiment, the main X-ray beam is an X-ray output from the collimating monochromator after being reflected twice by the collimating monochromator, and the peripheral X-ray beam is an X-ray output from the collimating monochromator after being reflected once by the collimating monochromator.

[0007] In one embodiment, the number of the monitoring detectors is set to be multiple, and the multiple monitoring detectors respectively detect a corresponding beam of the peripheral X-ray beam.

[0008] In one embodiment, the monitoring and adjustment system sums the number of photons of the peripheral X-ray beam output by at least two of the monitoring detectors, and uses the sum of the number of photons as the intensity monitoring data to monitor the X-ray source; wherein the intensity information includes the number of photons.

[0009] In one embodiment, the monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. When the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

[0010] In one embodiment, the monitoring and adjustment system further compares the intensity monitoring data with a second preset intensity threshold, and the second preset intensity threshold is greater than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for adjusting the output power of the X-ray source, outputting instruction information for adjusting the environmental parameters of the environment in which the X-ray source is located; When the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for pausing the X-ray source from emitting X-rays, and outputting an abnormal alarm.

[0011] In one embodiment, it also includes an environmental control system for monitoring and adjusting environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

[0012] According to a second aspect, an embodiment provides a monitoring method for an X-ray scattering measurement device, comprising: Controlling the X-ray source to emit X-rays; The peripheral X-ray beam output from the collimator monochromator is detected by a monitoring detector arranged at the exit of the collimator monochromator; wherein the X-rays emitted by the X-ray source pass through the collimator monochromator, and the peripheral X-ray beam and the main X-ray beam irradiating the sample to be tested are output; the main X-ray beam is the X-ray output after multiple reflections from the collimator monochromator, and the peripheral X-ray beam is the X-ray output after a single reflection from the collimator monochromator and / or without being reflected from the collimator monochromator; The intensity information of the peripheral X-ray beam output by the monitoring detector is processed by a monitoring and adjusting system respectively connected to the monitoring detector and the X-ray source to obtain intensity monitoring data about the X-rays, and the X-ray source is monitored according to the intensity monitoring data.

[0013] In one embodiment, monitoring the X-ray source according to the intensity monitoring data includes: The intensity monitoring data is compared with a first preset intensity threshold, and if the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

[0014] In one embodiment, the monitoring the X-ray source according to the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold; If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, perform the following steps: Determining whether the environmental parameters of the environment in which the X-ray source is located deviate from the preset environmental reference values; If the environmental parameter deviates from the preset environmental reference value, output instruction information for adjusting the environmental parameter, and after the environmental parameter is adjusted to the preset environmental reference value, compare the intensity monitoring data obtained after adjusting the environmental parameter with the first preset intensity threshold and / or the second preset intensity threshold, and generate an abnormal monitoring and adjustment report; If the environmental parameter does not deviate from the preset environmental reference value, output instruction information for adjusting the output power of the X-ray source until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and generate an abnormal monitoring and adjustment report; If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting instruction information for pausing the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

[0015] In one embodiment, the detecting the peripheral X-ray beam output from the collimator monochromator by means of a monitoring detector disposed at the exit of the collimator monochromator comprises: respectively disposing a monitoring detector in the optical path of the plurality of peripheral X-ray beams output from the collimator monochromator, and detecting the number of photons corresponding to one of the peripheral X-ray beams by means of the monitoring detector; The processing of the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data about the X-rays includes: summing the number of photons output by multiple monitoring detectors and using the sum of the number of photons as the intensity monitoring data.

[0016] According to the third aspect, an embodiment provides a computer-readable storage medium, on which a computer program is stored. The computer program can be executed by a processor to implement the monitoring method described in the second aspect.

[0017] According to the above-mentioned embodiment, the X-ray scattering measurement equipment includes a collimating monochromator, a monitoring and adjusting system, an X-ray source and a monitoring detector; the collimating monochromator receives the X-rays emitted by the X-ray source and outputs the main X-ray beam and the peripheral X-ray beam from the collimating monochromator; the monitoring detector detects the peripheral X-ray beam to obtain the intensity information of the peripheral X-ray beam; the monitoring and adjusting system processes the intensity information to obtain the intensity monitoring data of the X-ray, and monitors the X-ray source according to the intensity monitoring data. By using the useless peripheral X-ray beam in the measurement optical path as the monitoring object, the real-time monitoring of the X-ray intensity can be realized without interrupting the measurement process, and the flux of the measurement beam will not be lost during the monitoring process; at the same time, the state of the X-ray source can be judged according to the real-time monitoring results, so that the corresponding adjustment measures can be taken in a timely manner, and the abnormal points of the measurement results can be located at the first time, which is conducive to the automatic analysis and processing of abnormal measurement results and improves the efficiency of root cause analysis of abnormal measurements. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 FIG. 4 is a schematic diagram of a system structure architecture of an X-ray scattering measurement device according to an embodiment.

[0019] Figure 2 for Figure 1A partially enlarged schematic diagram of the system structure of the X-ray scattering measurement equipment.

[0020] Figure 3 The figure is a schematic diagram of the relative spatial distribution of each light beam at the exit of a collimating monochromator according to an embodiment.

[0021] Figure 4 FIG. 1 is a schematic diagram showing the arrangement principle of monitoring detectors in an X-ray scattering measurement device according to an embodiment.

[0022] Figure 5 The figure is a schematic diagram of the process principle of a monitoring method according to an embodiment.

[0023] Figure 6 The figure is a schematic diagram of the process principle of the monitoring step in a monitoring method of an embodiment.

[0024] Figure 7 The present invention is a logic flow chart of monitoring steps in a monitoring method according to an embodiment.

[0025] In the figure: 10. X-ray source; 20. Collimation monochromator; 30. Vacuum collimation system; 40. Translation stage system; 50. Detection system; 51. Vacuum scattering system; 52. X-ray detector; 60. Monitoring detector; 70. Monitoring and adjustment system; 80. Environmental control system; L1. Main X-ray beam; L2. Peripheral X-ray beam. DETAILED DESCRIPTION

[0026] The present invention is further described in detail below by specific embodiments in conjunction with the accompanying drawings. Wherein similar elements in different embodiments adopt associated similar element numbers. In the following embodiments, many detailed descriptions are for making the present application better understood. However, those skilled in the art can easily recognize that some features can be omitted in different situations, or can be replaced by other elements, materials, methods. In some cases, some operations related to the present application are not shown or described in the specification, this is to avoid the core part of the present application being overwhelmed by too much description, and for those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations according to the description in the specification and the general technical knowledge in the art.

[0027] In addition, the features, operations or characteristics described in the specification can be combined in any appropriate manner to form various implementations. At the same time, the steps or actions in the method description can also be interchanged or adjusted in a manner that is obvious to those skilled in the art. Therefore, the various sequences in the specification and the drawings are only for the purpose of clearly describing a certain embodiment and are not meant to be a required sequence, unless otherwise specified that a certain sequence must be followed.

[0028] The serial numbers assigned to the components herein, such as "first", "second", etc., are only used to distinguish the objects described and do not have any order or technical meaning. The "connection" and "coupling" mentioned in this application, unless otherwise specified, include direct and indirect connections (couplings).

[0029] At present, the monitoring method used for the X-ray source of CD-SAXS (critical dimension small angle X-ray scattering) measurement equipment is mainly regular sampling detection, that is, during the use of the equipment, an X-ray detector is regularly inserted into the main X-ray measurement optical path, and the state of the X-ray source is judged by detecting the change of the X-ray intensity relative to the previous value, and corresponding measures are taken according to the state of the X-ray source, such as adjusting the output power of the X-ray source, re-calibrating the light intensity of the detection system and the algorithm analysis system, etc.

[0030] However, this monitoring method has the following disadvantages: 1. It is necessary to interrupt the measurement process of the measuring equipment, which will greatly reduce the measurement flux of the equipment and cause loss of X-ray intensity in the main optical path of the measurement; 2. Due to the regular sampling test, it is often impossible to find the abnormality of the X-ray source in time; although it is possible to find the abnormality of the X-ray source through the change of the final measurement result, because the measurement result is mainly related to the morphology of the sample itself, it is impossible to locate the abnormal cause of the measurement result to the X-ray source in the first time, making it difficult to analyze the root cause of the abnormal point of the measurement result; 3. Since the abnormality of the X-ray source cannot be discovered immediately, the reliability of some of the measurement data before the abnormality is discovered is also reduced; 4. Since causal analysis cannot be decoupled from the measurement results of sample morphology, it is difficult to automatically analyze and process abnormal measurement results, which will greatly increase the cost of daily operation and maintenance of measurement equipment.

[0031] See also Figures 1 to 4 The embodiment of the present application provides an X-ray scattering measurement device (hereinafter referred to as the measurement device), for example, a CD-SAXS measurement device that can be used to measure the critical dimensions of nano-etching structures in semiconductor devices; the measurement device realizes real-time monitoring and automatic adjustment of the X-ray source by monitoring useless X-rays in the optical path of the device; the measurement device includes an X-ray source 10, a collimating monochromator 20, a vacuum collimation system 30, a translation stage system 40, a detection system 50, a monitoring detector 60, a monitoring and adjustment system 70, and other functional components that exist as needed, which are described in detail below.

[0032] See also Figure 1 and Figure 2, the collimating monochromator 20 is arranged between the X-ray source 10 and the vacuum collimation system 30; wherein the X-ray source 10 is mainly used to generate and emit X-rays (such as a point-divergent X-ray beam). In some embodiments, the X-ray source 10 may also be specifically an X-ray light source, such as a liquid metal target X-ray light source, a rotating anode target X-ray light source, etc.

[0033] The collimating monochromator 20 is equivalent to being arranged on the X-ray emission path of the X-ray source 10, and is mainly used to receive the X-rays emitted by the X-ray source 10, and convert the received X-rays (such as a point-divergent complex X-ray beam) into a quasi-monochromatic and quasi-parallel X-ray beam.

[0034] The vacuum collimation system 30 is used to further collimate the X-ray beam output by the collimator monochromator 20, and to achieve precise control of the X-ray beam spot size, so as to ultimately project the X-rays onto the sample to be tested; for example, the vacuum collimation system 30 may include a plurality of slit systems, and the optical path between the slit systems may be in a vacuum environment, thereby reducing the attenuation effect of air on the X-ray beam.

[0035] As for the collimator monochromator 20, the X-rays received by the collimator monochromator 20 will usually output different types of X-ray beams from different outlets of the collimator monochromator 20 after entering the collimator monochromator 20. These X-ray beams include X-rays output from the collimator monochromator 20 after multiple emissions from the collimator monochromator 20, X-rays output from the collimator monochromator 20 after a single reflection from the collimator monochromator 20, and X-rays directly output from the collimator monochromator 20 without being reflected by the collimator monochromator 20; wherein, the X-rays output after multiple reflections from the collimator monochromator 20 are the X-rays used for measurement by the measuring equipment, and such X-rays will enter the vacuum collimation system 30 and irradiate the sample to be measured after collimation and spot size control, while the X-rays output after a single reflection from the collimator monochromator 20 and without being emitted by the collimator monochromator 20 are discarded or useless X-rays, and do not need to irradiate the sample to be measured (for example, such X-ray beams will be blocked by the vacuum collimation system 30 and cannot irradiate the sample to be measured).

[0036] Therefore, for the convenience of distinction and description, the X-ray beam output from the collimating monochromator 20 and ultimately used to irradiate the sample to be tested (i.e., the X-ray beam output after multiple reflections from the collimating monochromator 20) is defined as the main X-ray beam L1, and other X-ray beams output from the collimating monochromator 20 that are not needed or cannot irradiate the sample to be tested (e.g., the X-ray beam output after a single reflection from the collimating monochromator 20 or without reflection from the collimating monochromator 20) are defined as the peripheral X-ray beam L2.

[0037] For example, see Figure 3 , Figure 3The relative spatial distribution relationship of various X-ray beams output from different outlets of a multilayer monochromator (such as a Montel monochromator) on the optical axis cross section of the monochromator is shown in FIG. Figure 3 It can be seen from the figure that when the point divergent X-ray beam generated by the X-ray source 10 passes through the collimating monochromator 20, the following three types of X-ray beams are usually output from the collimating monochromator 20: The first X-ray beam is a quasi-parallel monochromatic X-ray beam output from the collimator monochromator 20 after being reflected twice by the multi-layer film structure of the collimator monochromator 20. This X-ray beam is exactly the main beam required for measurement by the measuring device. It can be collimated and the spot size controlled by the vacuum collimator system 30 to irradiate the sample to be measured; that is, this X-ray beam is the main X-ray beam L1; The second X-ray beam is an X-ray beam output from the collimating monochromator 20 after a single reflection from the multilayer film structure of the collimating monochromator 20, and the third X-ray beam is an X-ray beam output from the outlet of the collimating monochromator 20 without being reflected by the multilayer film structure of the collimating monochromator 20; these two types of X-ray beams are usually blocked by the vacuum collimation system 30 and will not irradiate the sample to be tested; therefore, the peripheral X-ray beam L2 can be understood as one or both of these two types of X-ray beams.

[0038] That is, the main X-ray beam L1 can also be understood as the X-ray beam output from the collimating monochromator 20 and eventually involved in the measurement, while the peripheral X-ray beam L2 can be understood as the useless X-ray beam output from the collimating monochromator 20 but not involved in the measurement.

[0039] See also Figure 1 The translation stage system 40 is arranged between the vacuum collimation system 30 and the detection system 50; wherein the translation stage system 40 can have multiple degrees of freedom of movement (for example, including the degrees of freedom of movement along the three axes of X, Y, and Z and the degrees of freedom of rotation around the three axes of X, Y, and Z), and is mainly used to carry the sample to be tested, so as to achieve precise positioning of any point on the sample to be tested, and at the same time, realize the adjustment and scanning control of the angular position of the sample to be tested relative to the axis of the optical path.

[0040] The detection system 50 is mainly used to receive scattered X-rays (such as X-rays scattered by periodic nano-etching structures in semiconductor devices) after the main X-ray beam L1 passes through the sample to be tested, so as to output measurement information of the morphology of the sample to be tested (such as the three-dimensional morphology of the periodic nano-etching structure in the semiconductor device) by detecting the intensity and angular distribution information of the scattered X-rays generated by the sample to be tested.

[0041] For example, see Figure 1The detection system 50 includes a vacuum scattering system 51 and an X-ray detector 52; wherein the vacuum scattering system 51 may include a high vacuum cavity structure, and the vacuum scattering system 51 is used to provide a vacuum transmission environment for the scattered X-rays generated by the sample to be tested to be transmitted to the X-ray detector 52, so as to reduce the attenuation of the scattered X-ray signals caused by the air during the transmission process; and the X-ray detector is used to detect the intensity and angular distribution information of the scattered X-ray signals, thereby outputting the measurement information of the morphology of the sample to be tested.

[0042] See also Figure 1 , Figure 2 and Figure 4 The monitoring detector 60 is arranged at the exit of the collimating monochromator 20 and is located in the optical path of the peripheral X-ray beam L2; for example, the monitoring detector 60 is arranged downstream of the collimating monochromator 20 and is located between the collimating monochromator 20 and the vacuum collimation system 30; the monitoring detector 60 is mainly used to detect the peripheral X-ray beam L2 and output the intensity information of the peripheral X-ray beam L2.

[0043] Exemplarily, the monitoring detector 60 includes a photon counter, and the monitoring detector 60 detects the number of photons of the peripheral X-ray beam L2, so that the intensity information of the peripheral X-ray beam L2 is determined by using the number of photons.

[0044] Of course, the monitoring detector 60 may also adopt other types of X-ray signal detection devices. For example, the monitoring detector 60 can output the light intensity as intensity information by detecting the light intensity of the peripheral X-ray beam L2.

[0045] See also Figure 1 and Figure 2 The monitoring and adjusting system 70 is connected to the X-ray source 10 and the monitoring detector 60 respectively. The monitoring and adjusting system 70 can be understood as a device or system which is constructed by a combination of a controller, a processor and related functional components and has functions such as data analysis and processing; the monitoring and adjusting system 70 is mainly used to receive and process the intensity information output by the monitoring detector 60 to obtain intensity monitoring data about the X-rays, and monitor the X-ray source 10 according to the intensity monitoring data.

[0046] Exemplarily, the monitoring and adjustment system 70 may compare the intensity monitoring data with a preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0047] If the monitoring and adjusting system 70 determines that the intensity stability of the X-ray source 10 is normal, the monitoring and adjusting system 70 only generates a monitoring record report in the form of a document so that the measurement process of the measurement equipment can proceed normally and continuously.

[0048] If the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal, the monitoring and adjustment system 70 outputs instruction information for adjusting the X-ray source 10 (such as outputting instruction information to the control system of the vector measurement equipment), so that the measurement equipment can automatically and autonomously adjust the output power of the X-ray source 10, adjust the environmental parameters of the environment in which the X-ray source 10 is located, pause the X-ray source 10 from emitting X-rays, pause the measurement process, generate an abnormal monitoring report in the form of a document, output an abnormal alarm, generate an abnormal monitoring and adjustment report in the form of a document, and other operations.

[0049] It should be noted that the description of the "control system of the measuring equipment" is introduced in this article only to understand the role of the monitoring and adjustment system 70 in the measuring equipment, and the control system can be understood as a collection of related components used to regulate and manage related functional devices, functional systems, etc. in the measuring equipment. The control system can support the realization of all or part of the functions of the measuring equipment.

[0050] That is to say, in some embodiments, the monitoring and adjustment system 70 may be a functional system independently provided relative to the control system of the measuring device, and the monitoring and adjustment system 70 cooperates with the control system of the measuring device to analyze and process the intensity information output by the monitoring detector 60 with the help of the monitoring and adjustment system 70, so as to issue corresponding instruction information to the control system of the measuring device according to the obtained intensity monitoring data, so as to prompt the control system of the measuring device to make corresponding adjustments to the X-ray source 10, etc. In other embodiments, the monitoring and adjustment system 70 may be a part of the control system of the measuring device, or the control system of the measuring device has the functions of the monitoring and adjustment system 70, so that the monitoring and adjustment system 70 can directly make corresponding adjustments to the X-ray source 10, etc. according to the intensity monitoring data.

[0051] Therefore, based on the cooperation between the monitoring detector 60 and the monitoring and adjustment system 70, a monitoring system that is relatively independent of the main measurement system can be combined and constructed in the system structure architecture of the measuring equipment, and useless X-rays in the optical path of the measuring equipment (i.e., the peripheral X-ray beam L2) are used as real-time monitoring objects. By analyzing and processing the intensity information of the peripheral X-ray beam L2, real-time monitoring of the X-ray source 10 can be achieved.

[0052] First, the measuring device can execute both the measuring and monitoring processes simultaneously during use, that is, the measuring process and the monitoring process are carried out in parallel; this will not cause any loss to the measuring flux (or the main X-ray beam L1) of the measuring device, and effectively ensures the measuring efficiency of the measuring device.

[0053] Secondly, during the monitoring process, the intensity stability of the X-ray source 10 can be determined in real time, and corresponding countermeasures can be automatically taken for more common abnormal monitoring results, such as adjusting the output power of the X-ray source 10; this effectively reduces the frequency of manual intervention required to handle abnormalities during equipment maintenance, thereby reducing the downtime of the measuring equipment and reducing the labor cost of daily operation and maintenance of the equipment.

[0054] Third, based on the monitoring results, the abnormality of the measurement results can be located to the X-ray source 10 in the first time, which can provide support for automatic analysis, processing and judgment of the root cause relationship between the abnormal measurement results and the abnormal state of the X-ray source 10, and can effectively improve the accuracy and consistency of the measurement results.

[0055] To describe the measuring device more clearly and in detail, the following mainly takes the example that the monitoring detector 60 can count the photons of the peripheral X-ray beam L2 and output the number of photons as intensity information to explain the structural architecture, monitoring principle, etc. of the measuring device.

[0056] For some examples, see Figure 1 , Figure 2 and Figure 4 The number of monitoring detectors 60 is set to be multiple, and the multiple monitoring detectors 60 are arranged in the optical path corresponding to a peripheral X-ray beam L2; for example, see Figure 4 A monitoring detector 60 is respectively arranged at the exit of the collimating monochromator 20 and on both sides of the optical path of the main X-ray beam L1, so that the two monitoring detectors 60 can detect the two peripheral X-ray beams L2 output from the collimating monochromator 20 after a single reflection from the collimating monochromator 20; for another example, the number of the monitoring detectors 60 is set to three, two of which are used to detect the two peripheral X-ray beams L2 output after a single reflection from the collimating monochromator 20, and the remaining monitoring detector 60 is used to detect the one peripheral X-ray beam L2 output without being reflected by the collimating monochromator 20.

[0057] Of course, based on the different numbers or types of X-ray beams output from the outlet of the collimating monochromator 20, the monitoring detectors 60 may also be set to other numbers, which will not be elaborated here.

[0058] Correspondingly, the monitoring and adjustment system 70 is configured to sum the number of photons obtained by the multiple monitoring detectors 60, and use the sum of the photon numbers (i.e., the sum of the number of photons detected by the multiple monitoring detectors 60) as intensity monitoring data to monitor the X-ray source 10.

[0059] By using multiple monitoring detectors 60 to detect the number of photons in the peripheral X-ray beam L2 and using the monitoring and adjustment system 70 to sum the number of photons output by each monitoring detector 60, the signal strength of the signal received by the monitoring and adjustment system 70 can be guaranteed, and the accuracy of the intensity monitoring data obtained by the monitoring and adjustment system 70 can be improved, thereby providing strong support for the precise adjustment of the X-ray source 10; at the same time, by counting the photons in the peripheral X-ray beam L2, the performance of the X-ray source 10 can be determined more directly, ensuring the accuracy of the intensity monitoring data obtained.

[0060] For some examples, see Figure 1 and Figure 2 The measuring device further includes an environmental control system 80 connected to the monitoring and adjusting system 70, and the environmental control system 80 is used to monitor and adjust the environmental parameters of the environment in which the X-ray source 10 is located (such as the temperature of the internal and external environment of the X-ray source 10) to provide a guarantee for the stability of the X-ray source 10. Suitably, the monitoring and adjusting system 70 can receive the environmental parameters monitored by the environmental control system 80, so that when the environmental parameters change, the monitoring and adjusting system 70 can directly or indirectly send instruction information to the environmental control system 80 to adjust the environmental parameters of the X-ray source 10 according to the intensity monitoring data, thereby realizing the adjustment operation of the environmental parameters of the X-ray source 10.

[0061] As described above, in some embodiments, the monitoring and adjustment system 70 can compare the intensity monitoring data with a preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal based on the comparison result.

[0062] Specifically, the preset intensity threshold may include a first preset intensity threshold and a second preset intensity threshold, and the first preset intensity threshold is less than the second preset intensity threshold; when the intensity monitoring data (the total number of photons obtained by real-time monitoring, or the amplitude of the change in the total number of photons within a preset time period, etc.) is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal.

[0063] When it is determined that the intensity stability of the X-ray source 10 is normal, the monitoring and adjustment system 70 may only generate a monitoring record report in a document form to avoid affecting the measurement process of the measurement equipment.

[0064] When it is determined that the intensity stability of the X-ray source 10 is abnormal and the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system 70 can output instruction information to suspend the measurement process and / or suspend the X-ray source 10 from emitting X-rays, and can simultaneously output an abnormal alarm or generate an abnormal monitoring report, etc., so that equipment engineers can manually intervene in the adjustment and maintenance operations of the measurement equipment.

[0065] When it is determined that the intensity stability of the X-ray source 10 is abnormal and the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 70 outputs instruction information for adjusting the X-ray source 10. The instruction information may include instruction information for pausing the measurement process, instruction information for controlling the environmental control system 80 to adjust the environmental parameters of the environment in which the X-ray source 10 is located, instruction information for adjusting the output power of the X-ray source 10, generating abnormal monitoring and adjustment reports, etc.; so that the measurement equipment can adjust the X-ray source 10 by itself, so as to continue the measurement process after the X-ray source 10 returns to normal.

[0066] In other embodiments, different functional modes may be assigned to the measuring device according to actual needs and based on the cooperation between the monitoring adjustment system 70 and the monitoring detector 60 .

[0067] For example, the preset intensity threshold is a first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 can output instruction information such as pausing the measurement process, pausing the emission of the X-ray source 10, and can also output abnormal alarms, generate abnormal monitoring reports, etc. at the same time, so that equipment engineers can directly intervene.

[0068] For another example, the preset intensity threshold is a first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report; when the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 can output instruction information such as pausing the measurement process and adjusting the X-ray source 10 (such as adjusting the output power of the X-ray source 10, adjusting the environmental parameters of the environment in which the X-ray source 10 is located), and can simultaneously generate abnormal monitoring and adjustment reports, etc., to realize automatic analysis and regulation of the measurement equipment, so as to continue the measurement process when the intensity stability of the X-ray source 10 returns to normal.

[0069] It should be noted that the preset intensity threshold, the first preset intensity threshold, the second preset intensity threshold, etc. described in this article can be determined according to actual needs. These intensity thresholds can be specific data values ​​(such as photon count values) or data value ranges.

[0070] It should be noted that Figure 1 and Figure 2 The bold solid lines in the figure represent the connection relationship between the relevant functional components, and the bold dotted lines represent the main measurement beam or measurement optical path of the measurement equipment. Figure 4 The bold solid line in the figure represents the main X-ray beam L1, and the bold dotted line represents the peripheral X-ray beam L2.

[0071] See also Figures 5 to 7 Combined with Figures 1 to 4 The present application also provides a monitoring method for an X-ray scattering measurement device, which can realize real-time monitoring and adjustment of the X-ray scattering measurement device of the above-mentioned embodiment; please refer to Figure 5 The monitoring method includes steps 100 to 300, which are described in detail below.

[0072] Step 100: Control the X-ray source 10 to emit X-rays.

[0073] Specifically, by controlling the X-ray source 10 to emit X-rays, the measuring device is switched to a use state (e.g., a state of executing a measuring process), and the collimating monochromator 20 receives the X-rays emitted by the X-ray source 10 and can output a main X-ray beam L1 and a peripheral X-ray beam L2; wherein the peripheral X-ray beam L2 is an X-ray that is reflected once by the collimating monochromator 20 or is not emitted by the collimating monochromator 20, and the main X-ray beam L1 is an X-ray beam that is emitted multiple times by the collimating monochromator 20; the main X-ray beam L1 is irradiated onto the sample to be measured carried by the translation stage system 40 after being collimated and the spot size is controlled by the vacuum collimation system 30; and the detection system 50 receives the scattered X-rays generated by the sample to be measured, thereby outputting measurement information with the morphology of the sample to be measured.

[0074] Step 200 , detecting the peripheral X-ray beam L2 output from the collimating monochromator 20 , and obtaining the intensity information of the peripheral X-ray beam L2 .

[0075] For example, see Figure 2 , the peripheral X-ray beam L2 is detected and the intensity information of the peripheral X-ray beam L2 is outputted by the monitoring detector 60 disposed at the exit of the collimating monochromator 20 (that is, arranged in the optical path of the peripheral X-ray beam L2). For example, the monitoring detector 60 counts the photons of the detected peripheral X-ray beam L2 and outputs the number of photons as the intensity information.

[0076] Step 300 , processing the intensity information of the peripheral X-ray beam L2 , obtaining intensity monitoring data about the X-rays, and monitoring the X-ray source 10 according to the intensity monitoring data.

[0077] For example, see Figure 2 , through the monitoring and adjustment system 70 connected to the X-ray source 10 and the monitoring detector 60 respectively, the intensity information output by the monitoring detector 60 is received and processed to obtain intensity monitoring data, and the X-ray source 10 is monitored according to the intensity monitoring data.

[0078] For example, see Figure 2 A monitoring detector 60 is respectively arranged in the optical path of the multiple peripheral X-ray beams L2 output by the collimating monochromator 20. Each monitoring detector 60 detects the number of photons corresponding to a peripheral X-ray beam L2. The total number of photons can be obtained by summing the number of photons output by each monitoring detector 60, and the total number of photons is used as the intensity monitoring data.

[0079] Therefore, the useless peripheral X-ray beam L2 in the measuring optical path of the measuring equipment is taken as the monitoring object, and the intensity monitoring data of the X-rays is obtained according to the intensity information based on the peripheral X-ray beam L2, and the X-ray source 10 is monitored according to the intensity monitoring data; the X-ray source 10 can be monitored in real time synchronously without affecting the measuring process of the measuring equipment; in this way, the measuring flux of the measuring equipment will not be lost, and the state of the X-ray source 10 can be judged in real time according to the intensity monitoring data, so as to automatically take corresponding countermeasures for more common abnormal monitoring results without the need for manual intervention of equipment engineers, thereby effectively reducing the manpower cost of daily operation of the measuring equipment and ensuring the accuracy of the measurement results.

[0080] As described above, step 300 mainly includes the steps of processing the intensity information of the peripheral X-ray beam L2 to obtain the intensity monitoring data of the X-rays, and monitoring the X-ray source 10 according to the intensity monitoring data; in some embodiments, please refer to Figure 6 and Figure 7 The step of monitoring the X-ray source 10 according to the intensity monitoring data includes steps 310 to 330.

[0081] Step 310 , comparing the intensity monitoring data with a preset intensity threshold, and judging whether the intensity stability of the X-ray source 10 is normal according to the comparison result.

[0082] Specifically, when the intensity monitoring data (for example, the total number of photons obtained by the monitoring and adjustment system 70 by summing the number of photons detected and output by each monitoring detector 60) is less than or equal to the preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the preset intensity threshold, the monitoring and adjustment system 70 determines that the intensity stability of the X-ray source 10 is abnormal.

[0083] Among them, the preset intensity threshold can be determined according to the state of the X-ray source 10 (such as the intensity stability state) required when the measurement equipment normally performs the measurement process; the preset intensity threshold can be a specific data value (such as the photon number value) or a data value range.

[0084] Step 320: If the intensity stability of the X-ray source 10 is normal, a monitoring record report is generated.

[0085] Specifically, when the intensity stability of the X-ray source 10 is normal, if the measuring device is in a state of executing a measurement process, there is no need to interrupt the measurement process. At this time, the monitoring and adjustment system 70 can only generate a monitoring record report; if the measuring device is in a state of pausing the measurement process, at this time, the monitoring and adjustment system 70 can output instruction information to control the measuring device to continue the measurement process and generate a monitoring record report.

[0086] Step 330: If the intensity stability of the X-ray source 10 is abnormal, the measurement process is suspended.

[0087] For example, see Figure 7 The preset intensity threshold includes a first preset intensity threshold and a second preset intensity threshold, the first preset intensity threshold is less than the second preset intensity threshold; when the intensity monitoring data is less than or equal to the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be normal, and when the intensity monitoring data is greater than the first preset intensity threshold (that is, the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, or the intensity monitoring data is greater than or equal to the second preset intensity threshold), the intensity stability of the X-ray source 10 is determined to be abnormal.

[0088] In the case where the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the second preset intensity threshold, the monitoring and adjustment system 70 can perform the following operations: output command information to pause the measurement process, output command information to pause the X-ray source 10 from emitting X-rays, output abnormal alarms, generate abnormal monitoring reports, etc., so that equipment engineers can intervene manually.

[0089] In the case where the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system 70 performs the following operations: outputs instruction information for pausing the measurement process, outputs instruction information for adjusting the output power of the X-ray source 10 or adjusting the environmental parameters of the X-ray source 10, generates abnormal monitoring and adjustment reports, etc., to achieve automatic and autonomous adjustment of the measurement equipment.

[0090] For example, the preset intensity threshold is the first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source 10 is abnormal. At this time, the monitoring and adjustment system 70 performs the following operations: outputs instruction information to pause the measurement process or outputs instruction information to pause the X-ray source 10 from emitting X-rays, outputs an abnormal alarm, generates an abnormal monitoring report, etc.

[0091] For example, the preset intensity threshold is the first preset intensity threshold. When the intensity monitoring data is less than or equal to the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be normal; when the intensity monitoring data is greater than the first preset intensity threshold, the intensity stability of the X-ray source 10 is determined to be abnormal. At this time, the monitoring and adjustment system 70 performs the following operations: outputting instruction information for pausing the measurement process, outputting instruction information for adjusting the output power of the X-ray source 10 or adjusting the environmental parameters of the X-ray source 10, generating abnormal monitoring and adjustment reports, etc.

[0092] For some examples, see Figure 7 When the intensity stability of the X-ray source 10 is abnormal, and it is necessary to pause the measurement process, adjust the X-ray source 10, generate abnormal monitoring and adjustment reports, and other adjustment operations, the steps may specifically include steps 331 to 333.

[0093] Step 331 , suspending the measurement process, and determining whether the environmental parameters of the environment in which the X-ray source 10 is located deviate from the preset environmental reference values.

[0094] Specifically, the monitoring and adjustment system 70 can compare the environmental parameters monitored by the environmental control system 80 with the preset environmental reference values ​​through the environmental parameters monitored by the environmental control system 80 to determine whether the environmental parameters of the X-ray source 10 have changed relative to the preset environmental reference values; wherein the preset environmental reference value can be understood as the environmental conditions that need to be provided for the X-ray source 10 when the measuring equipment normally executes the measurement process (for example, the internal and external environmental temperatures of the X-ray source 10), and the preset environmental reference value can be a specific value or a range of values.

[0095] Step 332, if the environmental parameters of the environment in which the X-ray source 10 is located deviate from the preset environmental reference values, the environmental parameters are adjusted to the preset environmental reference values, and the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0096] Specifically, if the environmental parameters deviate from the preset environmental reference values, the monitoring and adjustment system 70 may directly or indirectly send instruction information for adjusting the environmental parameters to the environmental control system 80, so that the environmental parameters can be adjusted to the preset environmental reference values ​​by using the environmental control system 80, so that the environmental parameters of the X-ray source 10 return to normal; then, the intensity monitoring data obtained after adjusting the environmental parameters is compared with the preset intensity threshold to continue to determine whether the intensity stability of the X-ray source 10 has returned to normal.

[0097] Step 333, if the environmental parameters of the environment in which the X-ray source 10 is located do not deviate from the preset environmental reference values, adjust the output power of the X-ray source 10 until the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold, and generate an intensity monitoring and adjustment report.

[0098] Specifically, when it is determined that the environmental parameters have not changed, it can be basically concluded that the output power of the X-ray source 10 affects the intensity stability of the X-ray source 10; therefore, at this time, by adjusting the output power of the X-ray source 10, the intensity stability of the X-ray source 10 can be restored to normal; after the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold (for example, less than or equal to the first preset intensity threshold), the monitoring and adjustment system 70 can output instruction information to continue the measurement process, and generate an abnormal monitoring and adjustment report based on the abnormal monitoring situation and the adjustment process.

[0099] Based on this, since the process steps of the entire monitoring method can be carried out in real time during the measurement process of the measuring equipment, it is possible to promptly discover whether the abnormal measurement results are caused by the abnormality of the X-ray source 10, and automatically and in real time take corresponding countermeasures for the abnormality of the X-ray source 10, thereby ensuring the measurement efficiency of the equipment and greatly improving the efficiency of the root cause analysis of the abnormal measurement results, thereby ensuring the accuracy of the measurement results.

[0100] Those skilled in the art will appreciate that all or part of the functions of the various methods in the above embodiments may be implemented by hardware or by computer programs. When all or part of the functions in the above embodiments are implemented by computer programs, the program may be stored in a computer-readable storage medium, which may include: a read-only memory, a random access memory, a disk, an optical disk, a hard disk, etc. The program is executed by a computer to implement the above functions. For example, the program is stored in the memory of the device, and when the program in the memory is executed by the processor, all or part of the above functions can be implemented.

[0101] In addition, when all or part of the functions in the above-mentioned embodiments are implemented by means of a computer program, the program can also be stored in a storage medium such as a server, another computer, a disk, an optical disk, a flash drive or a mobile hard disk, and saved to the memory of a local device by downloading or copying, or the system of the local device is updated. When the program in the memory is executed by the processor, all or part of the functions in the above-mentioned embodiments can be implemented.

[0102] The above specific examples are used to illustrate the present invention, which is only used to help understand the present invention and is not intended to limit the present invention. For those skilled in the art, according to the concept of the present invention, some simple deductions, modifications or substitutions can be made.

Claims

1. An X-ray scattering measurement device, characterized in that: include: X-ray source; a collimating monochromator, arranged on the X-ray emission path of the X-ray source; The collimating monochromator receives the X-rays emitted by the X-ray source, and outputs a main X-ray beam and a peripheral X-ray beam from the collimating monochromator; wherein the main X-ray beam is used to irradiate the sample to be tested, the main X-ray beam is the X-ray output after multiple reflections from the collimating monochromator, and the peripheral X-ray beam is the X-ray output after a single reflection from the collimating monochromator and / or without being reflected from the collimating monochromator; A detection system receives scattered X-rays formed after the main X-ray beam passes through the sample to be tested, and outputs measurement information of the morphology of the sample to be tested; A monitoring detector is arranged on the optical path of the peripheral X-ray beam; the monitoring detector detects the peripheral X-ray beam and outputs the intensity information of the peripheral X-ray beam; A monitoring and adjustment system is connected to the X-ray source and the monitoring detector respectively; the monitoring and adjustment system processes the intensity information to obtain intensity monitoring data about the X-rays, and monitors the X-ray source according to the intensity monitoring data.

2. The X-ray scattering measurement device according to claim 1, characterized in that: The main X-ray beam is an X-ray output from the collimating monochromator after being reflected twice by the collimating monochromator, and the peripheral X-ray beam is an X-ray output from the collimating monochromator after being reflected once by the collimating monochromator.

3. The X-ray scattering measurement device according to claim 2, characterized in that: The number of the monitoring detectors is set to be multiple, and the multiple monitoring detectors respectively detect a corresponding beam of the peripheral X-ray beam.

4. The X-ray scattering measurement device according to claim 3, characterized in that: The monitoring and adjustment system sums the number of photons of the peripheral X-ray beams outputted by at least two of the monitoring detectors, and uses the sum of the number of photons as the intensity monitoring data to monitor the X-ray source; wherein the intensity information includes the number of photons.

5. The X-ray scattering measurement device according to any one of claims 1 to 4, characterized in that: The monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. When the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

6. The X-ray scattering measurement device according to claim 5, characterized in that: The monitoring and adjustment system further compares the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for adjusting the output power of the X-ray source, outputting instruction information for adjusting the environmental parameters of the environment in which the X-ray source is located; When the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information for pausing the X-ray source from emitting X-rays, and outputting an abnormal alarm.

7. The X-ray scattering measurement device according to claim 6, characterized in that: It also includes an environmental control system for monitoring and adjusting environmental parameters of the environment in which the X-ray source is located; the environmental control system is connected to the monitoring and adjustment system to output the monitored environmental parameters to the monitoring and adjustment system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjustment system.

8. A method for monitoring an X-ray scattering measurement device, characterized in that: include: Controlling the X-ray source to emit X-rays; The peripheral X-ray beam output from the collimator monochromator is detected by a monitoring detector arranged at the exit of the collimator monochromator; wherein the X-rays emitted by the X-ray source pass through the collimator monochromator, and the peripheral X-ray beam and the main X-ray beam irradiating the sample to be tested are output; the main X-ray beam is the X-ray output after multiple reflections from the collimator monochromator, and the peripheral X-ray beam is the X-ray output after a single reflection from the collimator monochromator and / or without being reflected from the collimator monochromator; The intensity information of the peripheral X-ray beam output by the monitoring detector is processed by a monitoring and adjusting system respectively connected to the monitoring detector and the X-ray source to obtain intensity monitoring data about the X-rays, and the X-ray source is monitored according to the intensity monitoring data.

9. The monitoring method according to claim 8, characterized in that: The monitoring of the X-ray source according to the intensity monitoring data comprises: The intensity monitoring data is compared with a first preset intensity threshold, and if the intensity monitoring data is greater than the first preset intensity threshold, it is determined that the intensity stability of the X-ray source is abnormal.

10. The monitoring method according to claim 9, characterized in that: The monitoring the X-ray source according to the intensity monitoring data further includes: comparing the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold; If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, perform the following steps: Determining whether the environmental parameters of the environment in which the X-ray source is located deviate from the preset environmental reference values; If the environmental parameter deviates from the preset environmental reference value, output instruction information for adjusting the environmental parameter, and after the environmental parameter is adjusted to the preset environmental reference value, compare the intensity monitoring data obtained after adjusting the environmental parameter with the first preset intensity threshold and / or the second preset intensity threshold, and generate an abnormal monitoring and adjustment report; If the environmental parameter does not deviate from the preset environmental reference value, output instruction information for adjusting the output power of the X-ray source until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold, and generate an abnormal monitoring and adjustment report; If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the following steps are performed: outputting instruction information for pausing the X-ray source from emitting X-rays, and / or outputting an abnormal alarm.

11. The monitoring method according to any one of claims 8 to 10, characterized in that: The monitoring detector disposed at the exit of the collimator monochromator is used to detect the peripheral X-ray beam output from the collimator monochromator, comprising: disposing a monitoring detector in the optical path of each of the plurality of peripheral X-ray beams output from the collimator monochromator, and detecting the number of photons corresponding to one of the peripheral X-ray beams by the monitoring detector; The processing of the intensity information of the peripheral X-ray beam output by the monitoring detector to obtain intensity monitoring data about the X-rays includes: summing the number of photons output by multiple monitoring detectors and using the sum of the number of photons as the intensity monitoring data.

12. A computer-readable storage medium, characterized in that: A computer program is stored on the medium, and the computer program can be executed by a processor to implement the monitoring method according to any one of claims 8 to 11.

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