Automated system for removable reaction units of epitaxial reactors

Abstract

The present invention relates to an automated transporter for transporting a removable reaction unit for preventive maintenance operations, where the reaction unit can be used in a reactor for epitaxially depositing a semiconductor film on a substrate. The invention also relates to a removable reaction unit of a reactor, which reaction unit is adapted to cooperate with the automated transporter described above, and to an assembly incorporating the reaction unit and the automated transporter.

Description

Technical Field

[0001] The present invention relates to the field of automation, and in particular to an automated handler for handling removable reaction units for preventive maintenance operations, wherein the reaction units are used in a reactor for epitaxially depositing semiconductor films on substrates.

[0002] The present invention also relates to a removable reaction unit of a reactor, which is suitable for cooperating with the automated handling machine described above, and a component incorporating the automated handling machine. Background Art

[0003] Epitaxial growth equipment used in the semiconductor industry may include a reactor containing a reaction and deposition chamber where the chemical vapor deposition process occurs. As a result of the deposition process, various parts of the chamber will experience unwanted product buildup and will need to be cleaned or replaced after reaching a certain thickness to avoid affecting the quality and performance of the reaction and deposition process.

[0004] As a result, consumable components within the reaction chamber, as well as the walls and parts that make up the reaction chamber itself, require preventative maintenance operations that require periodic entry into the reaction chamber to remove, maintain, or replace the components and parts.

[0005] These operations severely affect the downtime of the reactor and its output, and this problem is particularly pronounced in hot wall reactors used for depositing SiC, where maintenance operations occur frequently, once or more a week, and require stopping the reactor for many hours.

[0006] The above can also be observed with advantageous reactor designs used in the art, such as those described in EP1570107 and WO2021105841, which are chosen for their excellent thermal profiles and ease of assembly.

[0007] In these cases, removing, cleaning and replacing the relevant parts of the reaction chamber is a time-consuming process, mostly done manually. In fact, the replacement or cleaning of parts requires an operator to access the various components located inside the reaction chamber from within the machine.

[0008] In general, the process requires complete cooling of the reactor and the reaction chamber, does not wish to expose the latter to air, and requires the presence of an operator during all stages.

[0009] In the best case, where the reactor is of the removable type, the reactor can be pulled out of the machine in its entirety via mechanical means. However, this process still suffers from the above-mentioned disadvantages: access to the chamber is not automated or automatable, since it is still done manually, the reactor is exposed to the air, and its displacement (and handling) is cumbersome and requires manual intervention. Most importantly, downtime is still disadvantageously long, since it takes at least eight hours to complete all the necessary operations.

[0010] In some latest generation reactors, handling of the substrate holders is performed in an automated manner. Therefore, any additional automation system should fit into the limited space available in the machine and be adapted not to interfere with the automation used to handle the substrate holders.

[0011] It would therefore be desirable to automate the process of insertion and replacement of reaction units in a reactor; particularly, although not exclusively, for periodic preventative maintenance operations.

[0012] In addition, it is desirable to provide an automated handling machine and assembly suitable for performing automated handling of a removable reaction unit of a reaction chamber and avoiding exposure thereof to air. In addition, it is desirable to provide a removable reaction unit of a reaction chamber suitable for cooperating with the automated handling machine.

[0013] Furthermore, it would be desirable to provide an automated handler that is capable of automated handling without interfering with the substrate holder, if present. Summary of the invention

[0014] This application claims priority to IT application 102023000024663 filed on November 21, 2023, the entire contents of which are incorporated herein by reference. In particular, but not exclusively, the following are incorporated by reference: claims 1-16, Figure 1-3 and the corresponding parts of the description.

[0015] This application claims priority to IT application 102023000024660 filed on November 21, 2023, the entire contents of which are incorporated herein by reference. In particular, but not exclusively, the following are incorporated by reference: claims 1-22, Figure 1-3 and the corresponding parts of the description.

[0016] An object of the present invention is to overcome the drawbacks of the prior art. More specifically, an object of the present invention is to provide an automated handling machine suitable for carrying out the handling of removable reaction units of a reaction chamber, preferably avoiding their exposure to air.

[0017] Another object of the present invention is to provide an automated transporter capable of alternately performing automated transport of a reaction unit and a substrate holder.

[0018] Another object of the present invention is to provide a reaction chamber equipped with a removable reaction unit, wherein the reaction unit is suitable for cooperating with the automated handling machine described above, and wherein the reaction chamber is suitable for depositing SiC and GaN films on semiconductor substrates in a hot wall cross-flow reactor.

[0019] Another object of the invention is to provide an assembly suitable for performing automated handling of reaction units for preventive maintenance operations reducing downtimes.

[0020] The primary objectives set out above are achieved by the invention as described in the accompanying claims, which form an integral part of the present description.

[0021] Please note that the use of reference signs in the claims does not limit their scope. The only purpose of reference signs is to make the claims easier to understand.

[0022] This summary is provided to introduce some concepts in a simplified form. These concepts are further described in the detailed description of the example embodiments disclosed below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 I and II in FIG. 1 respectively provide simplified schematic diagrams of an automated transport machine in two positions according to an embodiment of the present invention.

[0024] Figure 2 A simplified schematic diagram of a reaction chamber according to an embodiment of the present invention is provided.

[0025] Figure 3 A simplified schematic diagram of components according to an embodiment of the present invention is provided.

[0026] It should be understood that the elements in the drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the size of some elements in the drawings may have been omitted, or on the other hand, exaggerated relative to other elements to help improve the understanding of the illustrated embodiments of the present disclosure. DETAILED DESCRIPTION

[0027] Although certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention and their obvious modifications and equivalents. Therefore, it is intended that the scope of the disclosed invention should not be limited by the specifically disclosed embodiments described below.

[0028] Cylindrical epitaxial reactors, such as those described in EP1570107 and US2022411961, have proven commercially successful due to the uniformity and efficiency of chamber heating, simplicity of construction, and quality of deposited films. They can operate at temperatures between 1000-1800°C for SiC and GaN epitaxial film deposition.

[0029] These cylindrical reactors usually extend fairly uniformly in the longitudinal horizontal direction and present a substantially circular cross section.

[0030] They comprise a reaction chamber formed by one or more structural elements. Two of these structural elements may exhibit high sensitivity, for example they may be made of graphite and exhibit a half-moon shape. They may be heated via induction means, such as one or more induction coils wound around the reactor. The other structural elements of the reaction chamber may be made of the same or different material, such as SiC, to give preferential current flow in the sensitive elements and accelerate their inductive heating. In this text and hereinafter, the term "sensitive" refers to a material with high sensitivity that can be effectively heated by induction.

[0031] The reaction chamber described in EP1570107 and US2022411961 is formed via the assembly of the above-mentioned components. This assembly creates an internal space of substantially parallelepiped shape in which the actual reaction takes place. This simple parallelepiped shape cannot be separated and moved as a whole from the constituting sensitive element. In fact, the chamber presents an overall complex profile of substantially circular cross-section and cross-lines, making it difficult to carry.

[0032] A cylindrical reactor like the one described in the above non-limiting example (provided for illustrative purposes only) requires long downtimes for preventive maintenance operations, which are necessary due to the accumulation of deposition material on the interior surfaces of the reaction chamber (including surfaces of disposable or removable components - such as components used to rotate, support and align the substrate, and / or components used to improve the fluid dynamics inside the reaction chamber (directing the flow of carrier gases, precursor gases and exhaust gases)).

[0033] The inventors have devised an alternative reaction chamber design in which the reaction unit where deposition occurs can be removed in its entirety and adapted to cooperate with an automated handling robot.

[0034] According to the new design, the reaction chamber consists of:

[0035] (a) a substantially hollow sensitive housing extending along a longitudinal direction (x) and having an inner surface and an outer surface; and

[0036] (b) A removable reaction unit having an inner surface and an outer surface and comprising four walls which are connected or connectable to each other and extend in a longitudinal direction.

[0037] The reaction unit also has two open or partially open sides: an upstream side and a downstream side. These sides are parallel to a transverse plane (yz) perpendicular to the longitudinal direction.

[0038] The removable reaction unit can have a box-like shape, with four walls substantially parallel to the longitudinal direction. However, they can also converge slightly towards the upstream or downstream side. Their cross section in a transverse plane can present a straight profile or be curved or bent.

[0039] One of the four walls of the reaction unit is a bottom wall, which is provided with a receiving area adapted to receive a substrate holder.The sides (upstream or downstream) may be open or have upstream and / or downstream walls.

[0040] In any case, the upstream side includes upstream holes adapted to receive the flow of carrier and precursor gases for epitaxial deposition. Similarly, the downstream side includes downstream holes adapted to discharge the exhaust gas flow. These holes may occupy the entire upstream / downstream side, or may be holes that pass through the respective upstream and / or downstream walls, if present.

[0041] The reaction unit according to the present invention is mechanically connected to the sensitive housing via a releasable coupling device, which can be used to support and / or fasten and / or align the reaction unit with / to the sensitive housing. The reaction unit and the releasable coupling device are suitable for removing the reaction unit from the sensitive housing or inserting it into the sensitive housing as a whole.

[0042] This allows the reaction unit to be removed and replaced in a simple manner without having to reach inside the reactor machine or without having to displace the entire reactor and sensitive elements outside the machine to access its internal parts and components and expose them to the air.

[0043] The sensitive housing is suitable for being heated by induction, for which purpose it may advantageously be made of graphite. The reaction unit is heated by the sensitive housing primarily by radiation from the sensitive housing.

[0044] The sensitive housing may be in the form of a hollow prism or cylinder with a polygonal, circular, oval or elliptical cross section in a transverse plane. A substantially circular cross section may allow an advantageously uniform heat distribution.

[0045] The sensitive housing can advantageously be opened on one or both sides of the transverse plane (yz) to facilitate access to the reaction unit. During operation, the opening can advantageously be closed with an insulating cover.

[0046] In order to further adjust the thermal radiation distribution, the sensitive housing can present a variable thickness in the longitudinal direction and / or in the transverse plane (yz).

[0047] The four walls of the reaction unit may include a top wall and two side walls. The top wall or bottom wall may be advantageously connected to the two side walls and the upstream and downstream sides by releasable coupling means. This allows easy access to the internal components of the chamber (disposable graphite components and / or the inner surface of the wall) for maintenance and / or replacement.

[0048] The releasable coupling means may advantageously be chosen among non-permanent mechanical interlocking or fastening mechanisms, such as hook and loop mechanisms, snaps or any other female-male fastening / connection means suitable for quick and easy release.

[0049] The inner surface of the sensitive housing may be provided with grooves or protrusions suitable for supporting, positioning and / or releasably securing the reaction unit thereto.

[0050] The reaction unit may also advantageously be provided with projections or recesses on its outer surface, which are adapted to releasably engage with recesses or projections on the inner surface of the sensitive housing by a non-permanent mechanical interlocking or fastening mechanism. Such a mechanism particularly includes any joint with a releasable, i.e. non-permanent, interlocking shape, such as any mechanism in which a projection is adapted to latch onto a corresponding notch or hoop, and includes hook-and-loop mechanisms, buckles, etc.

[0051] The top and bottom walls of the reaction unit may be made of graphite, while the side walls and / or the upstream and downstream sides (if they are only partially open) are made of graphite or silicon carbide.

[0052] Advantageously, each wall of the reaction chamber may be made of graphite, but the interior surfaces of the reaction unit may be covered or coated in whole or in part with SiC, TaC or other materials to protect the graphite components during deposition or during cleaning operations.

[0053] The reaction unit may also include a removable cover of insulating material, located above the downstream hole and provided with at least one opening, which is fully or partially aligned with the downstream hole and is suitable for discharging the exhaust gas flow. The opening of the cover and the downstream hole may optionally be further adapted to allow insertion and removal of the substrate holder. The removable cover may also be coupled to at least one of the four walls via a releasable fastening device.

[0054] According to another embodiment, the reaction unit further comprises a first transition piece, optionally removable, located above the upstream hole and adapted to be coupled to the precursor gas liner.

[0055] Most importantly, the reaction unit of the reaction chamber should further include an engagement device, such as a notch, a protrusion, a hook, a loop or a sliding piece, which is suitable for mechanically coupling and cooperating with the end effector of the automated handling machine as described below, so as to be integrally and automatically removed from / inserted into the sensitive housing. This allows the removal of the reactor unit to be upgraded from manual to automatic.

[0056] The reaction unit is compact and suitable for handling. For example, its dimensions in the lateral plane are 200–400 mm by 30–50 mm, and 200–500 mm in the longitudinal direction. The reaction unit typically weighs 2-10 kg, preferably 2.5-6 kg. The sensitive housing has dimensions of 200-500 mm in the longitudinal direction and a diameter and / or major length of 210-450 mm in the lateral direction.

[0057] According to a first aspect, the present invention relates to an automated handler for a removable reaction unit of a reactor adapted for epitaxial deposition of a semiconductor film on a substrate.

[0058] The automated handler is provided with a selective handling assembly that includes: (i) a first end effector adapted to be mechanically coupled to the removable reaction unit to displace the removable reaction unit in the longitudinal direction (x) (specifically, to remove it from or insert it into the reactor); and (ii) a second end effector adapted to be mechanically coupled to a substrate holder to displace the substrate holder in the longitudinal direction.

[0059] The selective handling assembly includes at least a first actuator adapted to displace the first and second end effectors from a protruding position to a retracted position in the longitudinal direction (x) and vice versa.

[0060] The second end effector is adapted to remove the substrate holder from or insert it into the removable reaction unit; while the first end effector is adapted to remove the removable reaction unit from or insert it into the reactor.

[0061] The term "actuator" refers to a device or part of a machine that allows it to achieve physical movement: it can be used to convert electrical, mechanical, gas, or hydraulic inputs into linear or rotational movement, or a sequential combination of both.

[0062] The above-described automated handler allows for the automatic handling of the substrate holder and the removable reaction unit of the reaction chamber, thus providing a unique compact solution that saves space and does not require on-site and / or manual intervention by an operator.

[0063] In a first embodiment, in the automated handler according to the present invention, the first and second end effectors are mechanically constrained to each other such that when the first end effector is in the protruding position, the second end effector is in the retracted position and vice versa.

[0064] The above embodiment ensures that the handling of the substrate holder and the reaction unit does not interfere with each other.

[0065] In a second embodiment, in the automated handler according to the present invention, the actuator is a stepper motor or a servo motor.

[0066] Furthermore, the selective transport assembly may advantageously, but not necessarily, include two pulleys operated by the actuator and coupled to a belt adapted to engage and displace the first and second end effectors.

[0067] The first and / or second end effector may be a gripper, such as a rod, a prong, a fork, a spade, or a combination thereof.

[0068] To bear the weight of the reaction unit, the end effector can be a metal or ceramic material, such as aluminum or silicon carbide (in oxide or nitride form), or titanium, stainless steel and their alloys. The second end effector can be made of silicon carbide, borosilicate glass, sapphire glass or quartz to avoid substrate contamination.

[0069] According to another embodiment, the automated handling machine according to the invention further comprises traction and pulling means coupled to the selective handling assembly. The traction and pulling means may be linear motors and in any case they are adapted to displace the selective handling assembly from the first handling position to at least the second handling position along the longitudinal direction.

[0070] The first handling position is located inside the reactor and is adapted to selectively engage the first or second end effector of the handling assembly with the reaction unit or the substrate holder. The second handling position is located outside the reactor.

[0071] According to another embodiment, the automated handling machine according to the invention further comprises motorization means coupled to the selective handling assembly and suitable for displacing the selective handling assembly in a vertical direction (z) relative to the ground on which the reactor is placed during operation.

[0072] The automated handling machine may preferably further comprise a screen whose main face is oriented in a plane perpendicular to the longitudinal direction and adapted to allow the first and second end effectors to move through said face or over any side thereof in the longitudinal direction. When the first (or second) end effector is in the extended position, it protrudes from one main face of the screen, while the actuator in the retracted position and the second (or first) end effector are retracted behind said face.

[0073] The screen, advantageously made of quartz, insulates the actuator from the heat of the reaction chamber and further improves the cleanliness of the reaction chamber.

[0074] According to a second aspect, the invention relates to a reaction chamber provided with a removable reaction unit as described above and suitable for epitaxially depositing a semiconductor film on a substrate. It is recalled that, with the novel chamber design of the invention, the reaction chamber comprises a substantially hollow sensitive housing extending in a longitudinal direction (x) and having an inner surface and an outer surface. It also comprises a removable reaction unit having an inner surface and an outer surface and comprising: (i) four walls extending in the longitudinal direction, and (ii) upstream and downstream sides parallel to a transverse plane (yz) perpendicular to said longitudinal direction.

[0075] The four walls of the reaction unit include a bottom wall provided with a receiving area adapted to receive a substrate holder; an upstream side including upstream holes adapted to receive a flow of carrier gas and precursor gas for epitaxial deposition, and a downstream side including downstream holes adapted to discharge a flow of exhaust gas.

[0076] The reaction unit is mechanically connected to the sensitive housing by a releasable coupling device and is integrally movable relative to the sensitive housing.

[0077] The reaction unit is provided with an engagement device, such as a notch or a protrusion, suitable for cooperating with the first end effector of the automated handling machine according to any of the above embodiments.

[0078] In the present invention, by coupling the coupling device of the reaction unit with the first end effector of the automated handling machine, the reaction unit and the automated handling machine, in particular its selective handling assembly, can be advantageously designed to cooperate with each other. Since the reaction unit can be removed from its sensitive housing, the automated handling machine can easily release its releasable coupling device by applying a force in the longitudinal direction or vertical direction (and optionally in any other direction in the transverse plane). This allows the reaction unit to be removed from the reactor or inserted into it without difficulty, thereby facilitating and automating preventive maintenance operations.

[0079] According to a third aspect, the invention relates to an assembly for displacing and handling a reaction unit for performing preventive reactor maintenance operations.

[0080] The assembly includes: (i) a reactor, an automated handler according to any of the embodiments described above, (ii) a transfer chamber, (iii) a unit handling chamber, and (iv) an optional load lock chamber, as described below.

[0081] The reactor of the assembly is suitable for epitaxial deposition of semiconductor films, preferably SiC or GaN, on substrates. Preferably, it is a hot wall cross-flow reactor. It comprises a reaction chamber with a reaction unit that can be removed as a whole from a sensitive housing, such as a removable reaction unit according to the invention, which is equipped with means suitable for cooperating with an automated handling machine.

[0082] The reactor may advantageously comprise an insulation system having one or more insulation components and enclosing the reaction chamber. It may also comprise a liner suitable for conducting a transport gas in the reaction unit and connected to the reaction unit by releasable coupling means.

[0083] The reactor may be protected by a housing, such as a double-walled quartz tube, which allows a cooling fluid to flow in the space between its two walls. It will be apparent to one of ordinary skill in the art that other elements commonly used in reactors such as those described above can and should be present.

[0084] One or more induction coils may be located outside the reactor to heat the sensitive housing and directly or indirectly heat the reaction cells of the reaction chamber.

[0085] The transfer chamber has a first port provided with a first gate valve adapted to receive or unload a reaction unit from / to the reactor via one or more automated machines or via manual means, and a second port provided with a second gate valve.

[0086] The unit handling chamber is placed in communication with the transfer chamber through the second hole and the second gate valve, and is adapted to receive or unload the reaction unit from / to the transfer chamber via a motorized mechanical device.

[0087] The unit handling chamber is suitable for accommodating the reaction unit and is provided with a resealable access, such as a door, hatch, porthole or valve, suitable for removal and insertion of the reaction unit by an operator or an automated handling device.

[0088] The term "regulation" refers to various operations or cycles suitable for preparing the reaction unit before inserting the reactor. In addition or alternatively, the operation or cycle is suitable for making the reaction unit suitable for being approached by an operator or machine, and is suitable for taking out from the assembly to remove or clean parts. Before taking out the reaction unit for cleaning, possible cycles may include the step of generating a vacuum less than 10 mbar, and refilling under an inert gas such as argon, nitrogen, helium or xenon. In addition or in place of the inert gas refilling, the reaction unit can undergo an inert gas purge, and a preferred inert gas is argon.

[0089] An alternative cycle suitable for carrying out on a new / cleaned reaction unit prior to insertion into the reactor may include a heating and vacuum degassing step (in this case the vacuum should preferably be below 1 mbar, even more preferably below 10 -3 millibar).

[0090] In an assembly according to the invention, the transfer chamber may advantageously be adapted to also receive or unload a substrate holder from / to the reactor via the first aperture via motorized mechanical means. The assembly according to this embodiment may optionally and advantageously comprise a load lock chamber placed in communication with the transfer chamber via a third aperture and a third gate valve.

[0091] Thus, the load lock chamber may receive or unload substrate holders from / to the transfer chamber via the motorized mechanism through the third aperture.The load lock chamber may additionally include a resealable access port adapted for removal and insertion of substrate holders by an operator or an automated handling device.

[0092] This embodiment advantageously provides for automated handling of the reaction unit and substrates.

[0093] The presence of a chamber in communication with the reactor avoids exposure of the reaction unit to air during removal from and insertion into the reactor, and the presence of an automated handling device provides a fully automated process that can reduce reactor downtime by up to 70%.

[0094] The illustrations presented herein are not meant to be actual views of any particular material, structure or equipment, but are merely idealized representations for describing embodiments of the present disclosure. Specifically, they are not intended to limit the scope of these aspects and embodiments in any way. In fact, for the sake of brevity, the traditional manufacture, connection, preparation and other functional aspects of the system may not be described in detail. In addition, the connecting lines shown in each figure are intended to represent exemplary functional relationships and / or physical connections between various elements. Many alternative or additional functional relationships or physical connections may exist in actual systems, and / or may not exist in some embodiments.

[0095] Figure 1 I and II in the figure schematically show two different configurations of the selective handling assembly 3010 of the automated handling machine according to an embodiment of the present invention.

[0096] In both figures, the automated handler is adapted to handle a removable reaction unit of a reactor suitable for epitaxially depositing semiconductor films on a substrate (usually placed on a substrate holder), e.g. Figure 2 A removable reaction unit of the reaction chamber shown in FIG.

[0097] The selective handling assembly 3010 comprises a first end effector 3100 comprising two stainless steel prongs adapted to cooperate with and mechanically couple the removable reaction unit to displace it in the longitudinal direction (x). The first end effector is particularly adapted to remove or insert the removable reaction unit from or into the reactor.

[0098] The selective handling assembly 3010 further comprises a second end effector 3200 comprising two quartz tips adapted to mechanically couple with the substrate holder to displace the substrate holder in the longitudinal direction. The second end effector is particularly adapted to remove or insert the substrate holder from or into the removable reaction unit.

[0099] The selective handling assembly includes at least a first actuator (not shown) adapted to displace the first and second end effectors from an extended position to a retracted position, and vice versa, in a longitudinal direction (x). In particular, the first and second end effectors are mechanically constrained to each other such that when the first end effector is in the extended position, the second end effector is in the retracted position, and vice versa.

[0100] The first end effector is connected to a first sliding element 3150, which in turn is coupled to the actuator through a pulley and belt mechanism (not shown).

[0101] The second end effector is connected to a second sliding element 3250, which in turn is coupled to the actuator via a pulley and belt mechanism (not shown).

[0102] Figure 1 1 specifically illustrates the selective handling assembly described above, wherein the second end effector is in an extended position, protruding through its main visible surface from the screen 4000. Because the two end effectors are constrained relative to each other, the first end effector is here in a retracted position behind the screen, as is the actuator.

[0103] Figure 1 II in FIG. 4 shows the selective handling assembly described above, wherein the first end effector is in an extended position, protruding from its major surface from below the bottom side of the screen 4000. In this case, the second end effector is in a retracted position behind the screen, as is the actuator.

[0104] Figure 2 A cross section in a transverse plane (yz) of an embodiment of a reaction chamber 100 of the invention is schematically depicted. The reaction chamber is suitable for epitaxial deposition of semiconductor films on a substrate and comprises a hollow sensitive housing 200 and a reaction cell 300.

[0105] The sensitive housing extends along a longitudinal direction (x) perpendicular to the transverse plane. The sensitive housing has an inner surface 250 and an outer surface and contains a removable reaction unit 300.

[0106] The reaction unit 300 has a box-like shape. It includes four walls 310, 320, 330, 340 extending in the longitudinal direction. The four walls include a top wall 320, two side walls 330, 340 and a bottom wall 310. The bottom wall 310 is provided with a receiving area 311 suitable for receiving a substrate holder 315.

[0107] The reaction unit also includes an upstream side (not shown) and a downstream side 360 ​​parallel to the transverse plane (yz). In this embodiment, the downstream side is a wall provided with a downstream hole 361, which is suitable for receiving a flow of carrier gas and precursor gas for epitaxial deposition. The upstream side is completely open and corresponds to the upstream hole shown by the dashed line 351. The upstream hole is suitable for discharging the exhaust gas flow. The reaction unit is mechanically connected to the sensitive housing via releasable coupling devices 331, 332. It can be moved integrally relative to the sensitive housing, thereby facilitating its insertion and removal from / to the sensitive housing and reducing the time required for preventive maintenance operations.

[0108] To further facilitate preventive maintenance operations, the top wall 320 is connected to the two side walls and the upstream and downstream sides by releasable coupling means 321, such as a female-male interlocking mechanism.

[0109] The handling of the reaction unit can be facilitated and automated by providing the reaction unit with an engagement device, such as notches 371, 372, which is suitable for coupling with a first end effector of an automated handling machine according to the present invention, for example Figure 1 In this case, the first end effector may have a fork shape, which is provided with two prongs suitable for coupling with the notches 371 , 372 .

[0110] Figure 3 A simplified schematic diagram of an assembly 2000 according to an embodiment of the present invention is shown. The assembly is designed to facilitate the displacement and handling of reaction units for preventive reactor maintenance operations. The assembly includes: (i) a reactor 1000, (ii) a system of connecting chambers 2100, 2200, 2300 coupled to the reactor; and (iii) including Figure 1 An automated transport machine 3000 having a selective transport component 3010 .

[0111] The automated handling machine, whose main functional building blocks are thus simplified (identifiable by the mesh pattern), also comprises a pulling and traction device 3400, coupled to the selective handling assembly and suitable for displacing it in the longitudinal direction from a first handling position inside the reactor to at least a second handling position outside the reactor, preferably corresponding to the transfer chamber 2100. The pulling and traction device may be a magnetic motor.

[0112] The automated handling machine also comprises a vertical motorized device 3500 coupled to the selective handling assembly. In general, the coupling between the vertical motorized device and the selective handling assembly can be direct or indirect, for example the coupling can be made by a pulling and tugging device, as shown in this figure.

[0113] The automated handler can extend within the transfer chamber, or it can be placed outside the chamber but still within the enclosure to avoid exposing its load to air. In all cases, it can cooperate with another motorized device within the transfer chamber to transfer the reaction unit and / or substrate holder from the reactor to the transfer chamber or from the transfer chamber to the reactor.

[0114] In this figure, the automated handling machine is in a configuration with the second end effector in an extended position, i.e. placed in the reactor and inside the reaction cell, respectively, through the hole in the downstream drum 700 and the reaction cell hole 401, 361. In this position, the second end effector can engage with the substrate holder to displace it.

[0115] The reactor includes a double-walled quartz tube and is wound with a coil (not shown) for induction heating. The reactor also includes an insulation system 1100 wrapped around the reaction chamber. The reaction chamber includes a sensitive housing 200 and a reaction unit 300.

[0116] The reaction unit has a first transition piece 500 positioned above the upstream hole 351 and coupled to the liner 1200. The reaction unit also comprises a removable cover 400 of thermally insulating material, located above the downstream side 360 ​​and provided with an opening 401 aligned with the downstream hole 361. The reaction unit is equipped with engagement means 371, 372 suitable for coupling with a first end effector of the selective handling assembly 3010 of the automated handling machine 3000.

[0117] The reactor may be connected to the system of connecting chambers 2100, 2200, 2300 via a downstream drum 700 provided with holes and resealing means, such as portholes, doors or valves.

[0118] The chamber system comprises a transfer chamber 2100 having a first hole 2110 provided with a first gate valve 2111 and adapted to receive or unload a reaction unit from / to a reactor via one or more automated machines (or, less preferably, via manual means) through a downstream roller. The transfer chamber also has a second hole 2120 provided with a second gate valve 2121.

[0119] The system of connecting chambers 2100, 2200, 2300 also includes a unit handling chamber 2200 placed in communication with the transfer chamber through a second hole 2120 and a second gate valve 2121. The unit handling chamber is suitable for receiving or unloading reaction units from / to the transfer chamber via a motorized mechanical device, and is provided with a resealable inlet 2210 suitable for taking out and inserting the reaction unit 300 by an operator or an automated handling device.

[0120] The unit handling chamber may be used to condition the reaction unit before it is removed from an assembly or inserted into a reactor via a transfer chamber.

[0121] The system of connected chambers 2100, 2200, 2300 also includes a load lock chamber 2300 placed in communication with the transfer chamber through a third aperture 2130 and a third gate valve 2131. The load lock chamber is adapted to receive or unload substrate holders from / to the transfer chamber through the third aperture via a motorized mechanism (not shown).

[0122] Advantageously, the assembly according to this embodiment is equipped with an automated handling robot 3000 provided with a first end effector suitable for engaging with the reaction unit to remove it from the sensitive housing and insert it into the transfer chamber, and vice versa.

[0123] The automated handler is also provided with a second end effector adapted to engage with the substrate holder for inserting or removing it from the reaction unit, thereby providing a fully automated system.

[0124] The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems and configurations, and other features, functions, acts, and / or properties disclosed herein, as well as any and all equivalents thereof.

[0125] In the description and claims of the present application, the word "comprise" and variations thereof, such as "comprising", do not exclude the presence of other additional elements, components or stages.

[0126] The discussion of documents, contracts, materials, devices, articles etc. is included in the text solely for the purpose of providing a background to the present invention; however, it should not be construed that such material or parts thereof constitute common general knowledge in the field relevant to the present invention before the priority date of each claim attached to this application.

Claims

1. An automated handling machine (3000) for handling a removable reaction unit of a reactor suitable for epitaxially depositing a semiconductor film on a substrate, provided with a selective handling assembly (3010), the selective handling assembly (3010) comprising: - a first end effector (3100) adapted to mechanically couple with the removable reaction unit to displace the reaction unit along the longitudinal direction (x); - a second end effector (3200) adapted to mechanically couple with the substrate holder to displace the substrate holder in a longitudinal direction; Wherein, the selective handling assembly includes at least a first actuator (3300), which is suitable for displacing the first and second end actuators from an extended position to a retracted position in the longitudinal direction, and vice versa; the second end actuator is suitable for removing the substrate holder from or inserting it into the removable reaction unit; and the first end actuator is suitable for removing the removable reaction unit from or inserting it into the reactor.

2. The automated transporter according to claim 1, wherein: The first and second end effectors are mechanically constrained to one another such that when the first end effector is in the extended position, the second end effector is in the retracted position, and vice versa.

3. An automated handling machine according to any one of the preceding claims, wherein: The actuator is a stepper motor or a servo motor.

4. An automated handling machine according to any one of the preceding claims, wherein: The selective transport assembly includes two pulleys operated by the actuator and coupled to a belt adapted to engage and displace the first and second end effectors.

5. An automated handling machine according to any one of the preceding claims, wherein: The first and / or second end effector is a gripper.

6. The automated transporter according to claim 5, wherein: The gripper is selected from one or more of the following elements: a rod, a prong, a fork, a spade, and combinations thereof.

7. An automated handling machine according to any one of the preceding claims, wherein: The first end effector is made of metal or ceramic material, and the second end effector is made of silicon carbide, borosilicate glass, sapphire glass or quartz.

8. The automated transporter according to claim 7, wherein: The first end effector is made of aluminum or silicon carbide in oxide or nitride form, or titanium, stainless steel and alloys thereof.

9. The automated handling machine according to any of the preceding claims, further comprising a traction and pulling device (3400) connected to the selective handling assembly and adapted to displace the selective handling assembly along a longitudinal direction from a first handling position to at least a second handling position.

10. The automated transporter according to claim 9, wherein: The pulling and traction device comprises a linear motor.

11. The automated handling machine according to any of the preceding claims, further comprising a vertical motorization device (3500) coupled to the selective handling assembly and suitable for displacing the selective handling assembly along a vertical direction (z).

12. An automated handling machine according to any of the preceding claims, further comprising a screen (4000) having a main surface oriented in a transverse plane (yz) perpendicular to the longitudinal direction; the screen being suitable for allowing both the first and second end effectors to move in the longitudinal direction through the main surface or across any of its boundaries; the screen being positioned so that the first or second end effector in an extended position protrudes from the main surface, while the first or second end effector and the actuator in a retracted position retract behind the main surface.

13. The automated transporter according to claim 12, wherein: The screen is made of quartz.

14. A reaction chamber (100) for epitaxially depositing a semiconductor film on a substrate, comprising: - a substantially hollow sensitive housing (200) extending along a longitudinal direction (x) and having an inner surface (250) and an outer surface; as well as - a removable reaction unit (300) having an inner surface and an outer surface and comprising: (i) four walls (310, 320, 330, 340) extending along a longitudinal direction, and (ii) an upstream side and a downstream side (350, 360) parallel to a transverse plane (yz) perpendicular to said longitudinal direction; Wherein, the four walls of the reaction unit include a bottom wall (310), which is provided with a receiving area (311) suitable for receiving a substrate holder; the upstream side includes an upstream hole (351) suitable for receiving a carrier gas and a precursor gas flow for epitaxial deposition, and the downstream side includes a downstream hole (361) suitable for discharging an exhaust gas flow; the reaction unit is mechanically connected to the sensitive housing via a releasable connecting device (331, 332), and is movable as a whole relative to the sensitive housing; the reaction unit is provided with a coupling device (371, 372), which is suitable for cooperating with the first end effector of the automated handling machine according to any one of claims 1-13.

15. An assembly (2000) for displacing and transporting a reaction unit for preventive reactor maintenance operations, comprising: - a reactor (1000) for epitaxially depositing a semiconductor film on a substrate and comprising a reaction chamber (100) having a reaction unit (300) which can be removed as a whole from a sensitive housing (200); - The automated handling machine according to any one of claims 1 to 13; - a transfer chamber (2100) comprising a first hole (2110) provided with a first gate valve (2111) suitable for receiving or unloading a reaction unit from / to a reactor via an automated handling machine; and a second hole (2120) provided with a second gate valve (2121); as well as - a unit handling chamber (2200) placed in communication with the transfer chamber through a second hole (2120) and a second gate valve (2121), and adapted to receive or unload reaction units from / to the transfer chamber via a motorized mechanical device; The unit handling chamber is suitable for adjusting the reaction unit and is provided with a resealable entrance (2210) suitable for an operator or an automated handling device to remove and insert the reaction unit.

16. The assembly of claim 15, wherein: The transfer chamber is also suitable for receiving or unloading substrate holders from / to the reactor through the first hole via the automated handler and additional optional motorized mechanical devices; the assembly also includes a load lock chamber (2300), which is placed in communication with the transfer chamber through a third hole (2130) and a third gate valve (2131); the load lock chamber is suitable for receiving or unloading substrate holders from / to the transfer chamber through the third hole via the motorized mechanical device.

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