Metallographic etching device and control method and device thereof

Abstract

The invention discloses a metallographic etching device and a control method and device thereof, and relates to the technical field of metallographic etching. The controller can automatically control the second guide rail to slide on the first guide rail so as to change the horizontal position of the metallographic specimen clamped by the clamp, and control the clamping part to slide on the second guide rail so as to change the vertical position of the metallographic specimen clamped by the clamp; the metallographic sample is sequentially stretched into the etching liquid in the etching container, the flushing liquid in the flushing container, the cleaning liquid in the cleaning container and the front of the fan, etching, flushing, cleaning and blow-drying of the metallographic sample are sequentially completed, automatic etching of the metallographic phase can be achieved, and the metallographic phase etching efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of metallographic etching, and particularly to a metallographic etching device, its control method, and device. Background Art

[0002] When observing the metallographic structure of a metal material, it is necessary to etch it to reveal the metallographic structure of the material, and after etching, it is also necessary to perform rinsing, cleaning, and drying in sequence. Currently, the etching process of metal materials is manually completed by humans, resulting in low efficiency. Summary of the Invention

[0003] The present invention solves the technical problem of how to improve the efficiency of metallographic etching by providing a metallographic etching device, its control method, and device.

[0004] On the one hand, the present invention provides the following technical solution:

[0005] A metallographic etching device includes a test bench, a support part, a first guide rail, a second guide rail, a clamping part, an etching container, a rinsing container, a cleaning container, a fan, a controller, a first driving member, and a second driving member;

[0006] One end of the support part is fixed to the test bench, and the other end of the support part is fixedly connected to the first guide rail;

[0007] The second guide rail is slidably connected to the first guide rail;

[0008] One end of the clamping part is slidably connected to the second guide rail, and the other end of the clamping part is provided with a clamp for clamping a metallographic specimen;

[0009] The etching container, the rinsing container, the cleaning container, and the fan are all placed on the test bench and are all located below the first guide rail;

[0010] The controller is electrically connected to the first driving member, the second driving member, and the fan respectively;

[0011] The first driving member is used to drive the second guide rail to slide horizontally on the first guide rail, and the second driving member is used to drive the clamping part to slide vertically on the second guide rail.

[0012] In some embodiments, the support part includes a first support rod and a second support rod;

[0013] One end of the first support rod is fixed to the test bench, and the other end of the first support rod is fixedly connected to the first end of the first guide rail;

[0014] One end of the second support rod is fixed to the test bench, and the other end of the second support rod is fixedly connected to the second end of the first guide rail.

[0015] In some embodiments, the second guide rail includes a sliding portion and a slide rail;

[0016] One side of the sliding portion is slidably connected to the first guide rail, the other side of the sliding portion is fixedly connected to one side of the slide rail, the other side of the slide rail is slidably connected to the clamping portion, and the sliding direction of the sliding portion on the first guide rail is the horizontal direction.

[0017] In some embodiments, the etching container, the rinsing container, the cleaning container and the fan are sequentially arranged on the test bench.

[0018] In some embodiments, the metallographic etching device further includes a porous fixture, and a plurality of through holes are provided on the porous fixture, and the etching container, the rinsing container and the cleaning container are respectively placed in different through holes.

[0019] On the other hand, the present invention also provides the following technical solutions:

[0020] A control method for a metallographic etching device, which is applied to the controller described above, includes:

[0021] After the clamp clamps the metallographic specimen, control the positions of the second guide rail and the clamping portion based on a first preset control logic to immerse the metallographic specimen in the etching solution in the etching container for a first duration; the first duration is the etching duration corresponding to the metallographic specimen;

[0022] After the first duration, control the positions of the second guide rail and the clamping portion based on a second preset control logic to rinse the metallographic specimen in the rinsing solution in the rinsing container for a second duration; the second duration is the rinsing duration corresponding to the metallographic specimen;

[0023] After the second duration, control the positions of the second guide rail and the clamping portion based on a third preset control logic to clean the metallographic specimen in the cleaning solution in the cleaning container for a third duration; the third duration is the cleaning duration corresponding to the metallographic specimen;

[0024] After the third duration, control the positions of the second guide rail and the clamping portion based on a fourth preset control logic to dry the metallographic specimen in front of the fan for a fourth duration; the fourth duration is the drying duration corresponding to the metallographic specimen.

[0025] In some embodiments, when the metallographic specimen is low-carbon steel, the first duration, the second duration, the third duration and the fourth duration are 15 s, 5 s, 3 s and 5 s in sequence;

[0026] When the metallographic specimen is medium carbon steel, the first duration, the second duration, the third duration, and the fourth duration are 12 s, 5 s, 3 s, and 5 s in sequence;

[0027] When the metallographic specimen is high carbon steel, the first duration, the second duration, the third duration, and the fourth duration are 8 s, 5 s, 3 s, and 5 s in sequence.

[0028] On the other hand, the present invention also provides the following technical solution:

[0029] A control device for a metallographic etching device, applied to the controller above, includes:

[0030] A first control module, configured to, after the clamp holds the metallographic specimen, control the positions of the second guide rail and the clamping part based on a first preset control logic, so as to immerse the metallographic specimen in the etching solution in the etching container for the first duration; the first duration is the etching duration corresponding to the metallographic specimen;

[0031] A second control module, configured to, after the first duration, control the positions of the second guide rail and the clamping part based on a second preset control logic, so as to rinse the metallographic specimen in the rinsing solution in the rinsing container for the second duration; the second duration is the rinsing duration corresponding to the metallographic specimen;

[0032] A third control module, configured to, after the second duration, control the positions of the second guide rail and the clamping part based on a third preset control logic, so as to clean the metallographic specimen in the cleaning solution in the cleaning container for the third duration; the third duration is the cleaning duration corresponding to the metallographic specimen;

[0033] A fourth control module, configured to, after the third duration, control the positions of the second guide rail and the clamping part based on a fourth preset control logic, so as to dry the metallographic specimen in front of the fan for the fourth duration; the fourth duration is the drying duration corresponding to the metallographic specimen.

[0034] On the other hand, the present invention also provides the following technical solution:

[0035] A computer device, including a memory, a processor, and a computer program stored on the memory, where the processor executes the computer program to implement the steps of any one of the control methods of the metallographic etching device above.

[0036] On the other hand, the present invention also provides the following technical solution:

[0037] A computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of any one of the control methods of the metallographic etching device above are implemented.

[0038] One or more technical solutions provided by the present invention have at least the following technical effects or advantages:

[0039] The present invention can automatically control the second guide rail to slide on the first guide rail by a controller to change the horizontal position of the metallographic specimen clamped by the clamp, and control the clamping part to slide on the second guide rail to change the vertical position of the metallographic specimen clamped by the clamp. Then, the metallographic specimen is successively inserted into the etching solution in the etching container, the rinsing solution in the rinsing container, the cleaning solution in the cleaning container, and in front of the fan, successively completing the etching, rinsing, cleaning, and drying of the metallographic specimen, and can realize the automatic etching of the metallography, improving the efficiency of metallographic etching. Description of the Drawings

[0040] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the drawings required for description in the embodiments. Obviously, the following drawings are some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0041] Figure 1 It is a schematic structural diagram of the metallographic etching device in the embodiment of the present invention;

[0042] Figure 2 It is a flowchart of the control method of the metallographic etching device in the embodiment of the present invention;

[0043] Figure 3 It is a schematic diagram of the control device of the metallographic etching device in the embodiment of the present invention.

[0044] Description of the Reference Numerals:

[0045] 10 - test bench; 20 - first support rod; 21 - second support rod; 30 - first guide rail; 40 - second guide rail; 401 - sliding part; 402 - slide rail; 41 - first driving member; 50 - clamping part; 501 - clamp; 51 - second driving member; 60 - etching container; 70 - rinsing container; 80 - cleaning container; 90 - fan; 100 - porous fixture. Detailed Embodiments

[0046] The embodiments of the present invention solve the technical problem of how to improve the efficiency of metallographic etching by providing a metallographic etching device and its control method and device.

[0047] In order to better understand the technical solutions of the present invention, the following will elaborate on the technical solutions of the present invention in combination with the drawings in the specification and specific embodiments.

[0048] As Figure 1As shown in the figure, the metallographic etching device of the embodiment of the present invention includes a test bench 10, a support part, a first guide rail 30, a second guide rail 40, a first driving member 41, a clamping part 50, a second driving member 51, an etching container 60, a flushing container 70, a cleaning container 80, a fan 90 and a controller; one end of the support part is fixed to the test bench 10, and the other end of the support part is fixedly connected to the first guide rail 30; the second guide rail 40 is slidably connected to the first guide rail 30; one end of the clamping part 50 is slidably connected to the second guide rail 40, and the other end of the clamping part 50 is provided with a clamp 501 for clamping a metallographic specimen; the etching container 60, the flushing container 70, the cleaning container 80 and the fan 90 are all placed on the test bench 10 and are all located below the first guide rail 30; the controller is electrically connected to the first driving member 41, the second driving member 51 and the fan 90 respectively; the first driving member 51 is used to drive the second guide rail 40 to slide horizontally on the first guide rail 30, and the second driving member 51 is used to drive the clamping part 50 to slide vertically on the second guide rail 40.

[0049] Among them, the support part is used to support and fix the first guide rail 30; in some embodiments, the support part can be only a single support rod, one end of the support rod is fixed to the test bench 10, and the other end is fixedly connected to one end of the first guide rail 30. However, the stability of a single support rod is poor. To improve the structural stability of the metallographic etching device, in some embodiments, such as Figure 1 As shown in the figure, the support part can include a first support rod 20 and a second support rod 21; one end of the first support rod 20 is fixed to the test bench 10, and the other end of the first support rod 20 is fixedly connected to the first end of the first guide rail 30; one end of the second support rod 21 is fixed to the test bench 10, and the other end of the second support rod 21 is fixedly connected to the second end of the first guide rail 30. The first support rod 20 and the second support rod 21 can both be vertically arranged, the lower ends of the first support rod 20 and the second support rod 21 are both fixed to the test bench 10, and the upper ends of the first support rod 20 and the second support rod 21 are respectively fixedly connected to both ends of the first guide rail 30. The stability of the two support rods is strong, and the structural stability of the metallographic etching device can be improved.

[0050] Among them, the first driving member 41 and the second driving member 51 can both be common motor driving devices, and the controller is used to control the operation of the first driving member 41 and the second driving member 51.

[0051] Among them, the first guide rail 30 is horizontally arranged, and the second guide rail 40 can slide on the first guide rail 30, so as to change the horizontal position of the clamping part 50 (clamp 501), and further change the horizontal position of the metallographic specimen clamped by the clamp 501.

[0052] In some embodiments, such as Figure 1As shown, the second guide rail 40 may include a sliding part 401 and a slide rail 402; one side of the sliding part 401 is slidably connected to the first guide rail 30, the other side of the sliding part 401 is fixedly connected to one side of the slide rail 402, and the other side of the slide rail 402 is slidably connected to the clamping part 50. The sliding direction of the sliding part 401 on the first guide rail 30 is the horizontal direction. The slide rail 402 is vertically arranged, and the clamping part 50 can slide on the slide rail 402. Thus, when the clamping part 50 slides on the slide rail 402, the vertical position of the clamping part 50 (the clamp 501) will change, thereby changing the vertical position of the metallographic specimen clamped by the clamp 501.

[0053] Among them, the clamp 501 may be a common clip structure.

[0054] Among them, the etching container 60 is used to hold the etching solution, and the etching solution is used to etch the metallographic specimen. In some embodiments, the etching solution may be a 4% nitric acid alcohol solution; the rinsing container 70 is used to hold the rinsing solution, and the rinsing solution is used to clean the etching solution attached to the metallographic specimen. In some embodiments, the rinsing solution may be pure water; the cleaning container 80 is used to hold the cleaning solution, and the cleaning solution is used to absorb the rinsing solution attached to the metallographic specimen. In some embodiments, the cleaning solution may be industrial alcohol; the fan 90 is used to blow dry the cleaning solution attached to the metallographic specimen.

[0055] The positions of the etching container 60, the rinsing container 70, the cleaning container 80, and the fan 90 on the test bench 10 may be random, and only need to be in a straight line. However, in order to improve the test efficiency, in some embodiments, the etching container 60, the rinsing container 70, the cleaning container 80, and the fan 90 may be arranged in sequence on the test bench 10. In this way, the metallographic specimen can be controlled to extend into the etching container 60, the rinsing container 70, the cleaning container 80, and the fan 90 in sequence, and the processes of etching, rinsing, cleaning, and drying can be carried out in sequence, improving the test efficiency. The heights of the etching container 60, the rinsing container 70, the cleaning container 80, and the fan 90 may be basically the same.

[0056] Since the etching container 60, the rinsing container 70, and the cleaning container 80 are not fixed on the test bench 10, the relative positions between the etching container 60, the rinsing container 70, and the cleaning container 80 may move. To improve the stability of the etching container 60, the rinsing container 70, and the cleaning container 80, in some embodiments, the metallographic etching device may further include a porous fixture 100. The porous fixture 100 is provided with a plurality of through holes, and the etching container 60, the rinsing container 70, and the cleaning container 80 are respectively placed in different through holes. In this way, the etching container 60, the rinsing container 70, and the cleaning container 80 can be restricted together by the porous fixture 100 to prevent the relative positions from moving.

[0057] Such as Figure 2As shown, the embodiments of the present invention further provide a control method for a metallographic etching device applied to a controller, including:

[0058] Step S1, after the clamp 501 holds the metallographic specimen, control the positions of the second guide rail 40 and the clamping part 50 based on a first preset control logic to immerse the metallographic specimen in the etching solution in the etching container 60 for a first duration; the first duration is the etching duration corresponding to the metallographic specimen;

[0059] Step S2, after the first duration, control the positions of the second guide rail 40 and the clamping part 50 based on a second preset control logic to rinse the metallographic specimen in the rinsing solution in the rinsing container 70 for a second duration; the second duration is the rinsing duration corresponding to the metallographic specimen;

[0060] Step S3, after the second duration, control the positions of the second guide rail 40 and the clamping part 50 based on a third preset control logic to clean the metallographic specimen in the cleaning solution in the cleaning container 80 for a third duration; the third duration is the cleaning duration corresponding to the metallographic specimen;

[0061] Step S4, after the third duration, control the positions of the second guide rail 40 and the clamping part 50 based on a fourth preset control logic to dry the metallographic specimen in front of the fan 90 for a fourth duration; the fourth duration is the drying duration corresponding to the metallographic specimen.

[0062] First, fix the polished metallographic specimen on the clamp 501, with the polished surface of the metallographic specimen facing down and parallel to the horizontal plane.

[0063] Among them, the first preset control logic may include: first control the second guide rail 40 to slide to the first position of the first guide rail 30. When the second guide rail 40 is at the first position of the first guide rail 30, the second guide rail 40 is above the etching container 60; then control the clamping part 50 to slide to the first position of the second guide rail 40. When the clamping part 50 is at the first position of the second guide rail 40, the metallographic specimen held by the clamp 501 is in the etching solution in the etching container 60; finally, keep the positions of the second guide rail 40 and the clamping part 50 unchanged within the first duration.

[0064] Among them, the second preset control logic may include: first control the clamping part 50 to slide to the second position of the second guide rail 40. When the clamping part 50 is at the second position of the second guide rail 40, the metallographic specimen is separated from the etching container 60; then control the second guide rail 40 to slide to the second position of the first guide rail 30. When the second guide rail 40 is at the second position of the first guide rail 30, the second guide rail 40 is above the rinsing container 70; then control the clamping part 50 to slide to the first position of the second guide rail 40. When the clamping part 50 is at the first position of the second guide rail 40, the metallographic specimen held by the clamp 501 is in the rinsing solution in the rinsing container 70; finally, keep the positions of the second guide rail 40 and the clamping part 50 unchanged within the second duration.

[0065] Among them, the third preset control logic may include: first, controlling the clamping portion 50 to slide to the second position of the second guide rail 40. When the clamping portion 50 is at the second position of the second guide rail 40, the metallographic specimen is separated from the rinsing container 70; then, controlling the second guide rail 40 to slide to the third position of the first guide rail 30. When the second guide rail 40 is at the third position of the first guide rail 30, the second guide rail 40 is above the cleaning container 80; then, controlling the clamping portion 50 to slide to the first position of the second guide rail 40. When the clamping portion 50 is at the first position of the second guide rail 40, the metallographic specimen clamped by the clamp 501 is in the cleaning liquid in the cleaning container 80; finally, keeping the positions of the second guide rail 40 and the clamping portion 50 unchanged for a third period of time.

[0066] Among them, the fourth preset control logic may include: first, controlling the clamping portion 50 to slide to the second position of the second guide rail 40. When the clamping portion 50 is at the second position of the second guide rail 40, the metallographic specimen is separated from the cleaning container 80; then, controlling the second guide rail 40 to slide to the fourth position of the first guide rail 30. When the second guide rail 40 is at the fourth position of the first guide rail 30, the second guide rail 40 is above the fan 90; then, controlling the clamping portion 50 to slide to the first position of the second guide rail 40 and turning on the fan 90. When the clamping portion 50 is at the first position of the second guide rail 40, the metallographic specimen clamped by the clamp 501 is in front of the fan 90; then, keeping the positions of the second guide rail 40 and the clamping portion 50 unchanged for a fourth period of time; finally, after the fourth period of time, turning off the fan 90.

[0067] Among them, the first position, the second position, the third position, and the fourth position of the first guide rail 30, the first position and the second position of the second guide rail 40, the first period of time, the second period of time, the third period of time, and the fourth period of time corresponding to each type of metallographic specimen may all be pre-stored in the controller.

[0068] In some embodiments, when the metallographic specimen is low-carbon steel, the first period of time, the second period of time, the third period of time, and the fourth period of time may be 15 s, 5 s, 3 s, and 5 s in sequence; when the metallographic specimen is medium-carbon steel, the first period of time, the second period of time, the third period of time, and the fourth period of time are 12 s, 5 s, 3 s, and 5 s in sequence; when the metallographic specimen is high-carbon steel, the first period of time, the second period of time, the third period of time, and the fourth period of time may be 8 s, 5 s, 3 s, and 5 s in sequence.

[0069] As described above, in the embodiment of the present invention, the controller can automatically control the second guide rail 40 to slide on the first guide rail 30 to change the horizontal position of the metallographic specimen clamped by the clamp 501, and control the clamping part 50 to slide on the second guide rail 40 to change the vertical position of the metallographic specimen clamped by the clamp 501. Then, the metallographic specimen is successively inserted into the etching solution in the etching container 60, the rinsing solution in the rinsing container 70, the cleaning solution in the cleaning container 80, and in front of the fan 90, successively completing the etching, rinsing, cleaning, and drying of the metallographic specimen, realizing the automatic etching of the metallography and improving the efficiency of metallographic etching.

[0070] As Figure 3 shown, the embodiment of the present invention also provides a control device for a metallographic etching device applied to a controller, including:

[0071] A first control module, configured to, after the clamp 501 clamps the metallographic specimen, control the positions of the second guide rail 40 and the clamping part 50 based on a first preset control logic to place the metallographic specimen in the etching solution in the etching container 60 for etching for a first duration; the first duration is the etching duration corresponding to the metallographic specimen;

[0072] A second control module, configured to, after the first duration, control the positions of the second guide rail 40 and the clamping part 50 based on a second preset control logic to place the metallographic specimen in the rinsing solution in the rinsing container 70 for rinsing for a second duration; the second duration is the rinsing duration corresponding to the metallographic specimen;

[0073] A third control module, configured to, after the second duration, control the positions of the second guide rail 40 and the clamping part 50 based on a third preset control logic to place the metallographic specimen in the cleaning solution in the cleaning container 80 for cleaning for a third duration; the third duration is the cleaning duration corresponding to the metallographic specimen;

[0074] A fourth control module, configured to, after the third duration, control the positions of the second guide rail 40 and the clamping part 50 based on a fourth preset control logic to place the metallographic specimen in front of the fan 90 for drying for a fourth duration; the fourth duration is the drying duration corresponding to the metallographic specimen.

[0075] In some embodiments, when the metallographic specimen is low-carbon steel, the first duration, the second duration, the third duration, and the fourth duration can be 15 s, 5 s, 3 s, and 5 s in sequence; when the metallographic specimen is medium-carbon steel, the first duration, the second duration, the third duration, and the fourth duration are 12 s, 5 s, 3 s, and 5 s in sequence; when the metallographic specimen is high-carbon steel, the first duration, the second duration, the third duration, and the fourth duration can be 8 s, 5 s, 3 s, and 5 s in sequence.

[0076] Based on the same inventive concept as the control method of the metallographic etching device described above, an embodiment of the present invention further provides a computer device, including a memory, a processor, and a computer program stored on the memory, and the processor executes the computer program to implement the steps of any one of the control methods of the metallographic etching device described above.

[0077] Since the computer device introduced in the embodiment of the present invention is the computer device adopted to implement the control method of the metallographic etching device in the embodiment of the present invention, based on the control method of the metallographic etching device introduced in the embodiment of the present invention, those skilled in the art can understand the specific implementation manners and various variations of the computer device in the embodiment of the present invention. Therefore, the specific implementation of how the computer device implements the method in the embodiment of the present invention will not be described in detail here. As long as the computer device adopted by those skilled in the art to implement the control method of the metallographic etching device in the embodiment of the present invention belongs to the scope protected by the present invention.

[0078] Based on the same inventive concept as the control method of the metallographic etching device described above, the present invention further provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, it implements the steps of any one of the control methods of the metallographic etching device described above.

[0079] Those skilled in the art should understand that the embodiments of the present invention can be provided as a method, a system, or a computer program product. Therefore, the present invention can take the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present invention can take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0080] The present invention is described with reference to the flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to embodiments of the present invention. It should be understood that each flow and / or block in the flowcharts and / or block diagrams, and the combination of flows and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to the processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing devices to generate a machine, so that the instructions executed by the processor of the computer or other programmable data processing devices generate for implementing in the process Figure 1 each process or multiple processes and / or blocks Figure 1means for the functions specified in one or more blocks. These computer program instructions may also be stored in a computer-readable memory that can direct a computer or other programmable data processing apparatus to work in a particular manner, such that the instructions stored in the computer-readable memory produce a manufacture including an instruction means that implements the functions specified in the process Figure 1 one or more processes and / or blocks Figure 1 means for the functions specified in one or more blocks.

[0081] These computer program instructions may also be loaded onto a computer or other programmable data processing apparatus, such that a series of operational steps are performed on the computer or other programmable apparatus to produce a computer-implemented process, so that the instructions executed on the computer or other programmable apparatus provide steps for implementing the functions specified in the process Figure 1 one or more processes and / or blocks Figure 1 means for the functions specified in one or more blocks.

[0082] Although the preferred embodiments of the present invention have been described, additional changes and modifications can be made by those skilled in the art once they learn the basic creative concept. Therefore, the appended claims are intended to be construed to include the preferred embodiments as well as all changes and modifications falling within the scope of the present invention.

[0083] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, the present invention is also intended to include these modifications and variations.

Claims

1. A metallographic etching device, characterized in that: It includes a test bench, a support part, a first guide rail, a second guide rail, a clamping part, an etching container, a flushing container, a cleaning container, a fan, a controller, a first driving member and a second driving member; One end of the support portion is fixed to the test bench, and the other end of the support portion is fixedly connected to the first guide rail; The second guide rail is slidably connected to the first guide rail; One end of the clamping portion is slidably connected to the second guide rail, and the other end of the clamping portion is provided with a clamp for clamping the metallographic sample; The etching container, the flushing container, the cleaning container and the fan are all placed on the test bench and are all located below the first guide rail; The controller is electrically connected to the first driving member, the second driving member and the fan respectively; The first driving member is used to drive the second guide rail to slide along the horizontal direction on the first guide rail, and the second driving member is used to drive the clamping portion to slide along the vertical direction on the second guide rail.

2. The metallographic etching device according to claim 1, characterized in that: The support portion includes a first support rod and a second support rod; One end of the first support rod is fixed to the test bench, and the other end of the first support rod is fixedly connected to the first end of the first guide rail; One end of the second support rod is fixed to the test bench, and the other end of the second support rod is fixedly connected to the second end of the first guide rail.

3. The metallographic etching device according to claim 1, characterized in that: The second guide rail includes a sliding portion and a slide rail; One side of the sliding part is slidably connected to the first guide rail, the other side of the sliding part is fixedly connected to one side of the slide rail, the other side of the slide rail is slidably connected to the clamping part, and the sliding direction of the sliding part on the first guide rail is horizontal.

4. The metallographic etching device according to claim 1, characterized in that: The etching container, the flushing container, the cleaning container and the fan are arranged in sequence on the test bench.

5. The metallographic etching device according to claim 1, characterized in that: It also includes a porous fixture, which is provided with a plurality of through holes, and the etching container, the rinsing container, and the cleaning container are respectively placed in different through holes.

6. A control method for a metallographic etching device, applied to the controller according to any one of claims 1 to 5, characterized in that: include: After the clamp has clamped the metallographic sample, the position of the second guide rail and the clamping portion is controlled based on the first preset control logic to place the metallographic sample in the etching liquid in the etching container and etch for a first time period; The first duration is the etching duration corresponding to the metallographic sample; After the first time period, the positions of the second guide rail and the clamping portion are controlled based on a second preset control logic to place the metallographic sample in a rinse liquid in a rinse container for a second rinse time period; the second time period is a rinse time period corresponding to the metallographic sample; After the second time period, the positions of the second guide rail and the clamping portion are controlled based on a third preset control logic to place the metallographic sample in a cleaning liquid in a cleaning container for cleaning for a third time period; the third time period is the cleaning time period corresponding to the metallographic sample; After the third time period, the positions of the second guide rail and the clamping portion are controlled based on a fourth preset control logic to place the metallographic sample in front of the fan and dry it for a fourth time period; the fourth time period is the drying time corresponding to the metallographic sample.

7. The control method of the metallographic etching device according to claim 6, characterized in that: When the metallographic sample is low carbon steel, the first time length, the second time length, the third time length, and the fourth time length are 15s, 5s, 3s, and 5s respectively; When the metallographic sample is medium carbon steel, the first time length, the second time length, the third time length, and the fourth time length are 12s, 5s, 3s, and 5s respectively; When the metallographic sample is high carbon steel, the first time length, the second time length, the third time length, and the fourth time length are 8s, 5s, 3s, and 5s respectively.

8. A control device for a metallographic etching device, applied to the controller according to any one of claims 1 to 5, characterized in that: include: A first control module is used to control the position of the second guide rail and the clamping part based on a first preset control logic after the clamp clamps the metallographic sample, so as to place the metallographic sample in the etching liquid in the etching container and etch it for a first time period; The first duration is the etching duration corresponding to the metallographic sample; A second control module is used for controlling the position of the second guide rail and the clamping portion based on a second preset control logic after the first time period, so as to place the metallographic sample in the flushing liquid in the flushing container and flush for a second time period; the second time period is the flushing time period corresponding to the metallographic sample; A third control module is used to control the positions of the second guide rail and the clamping portion based on a third preset control logic after the second time period, so as to place the metallographic sample in the cleaning liquid in the cleaning container for cleaning for a third time period; the third time period is the cleaning time period corresponding to the metallographic sample; The fourth control module is used to control the position of the second guide rail and the clamping portion based on a fourth preset control logic after the third time period, so as to place the metallographic sample in front of the fan and dry it for a fourth time period; the fourth time period is the drying time corresponding to the metallographic sample.

9. A computer device, characterized in that: The invention comprises a memory, a processor and a computer program stored in the memory, wherein the processor executes the computer program to implement the steps of the method according to claim 6 or 7.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method according to claim 6 or 7 are implemented.

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