Shielding device and control method thereof, process chamber and semiconductor process equipment

Abstract

The invention discloses a shielding device and a control method thereof, a process chamber and semiconductor process equipment, the disclosed shielding device comprises a first annular base part (01) and a plurality of movable fan blades (40), the plurality of movable fan blades (40) are rotatably arranged on the first annular base part (01) and are distributed along the circumferential direction of the first annular base part (01), and the plurality of movable fan blades (40) are arranged on the first annular base part (01). A first gap is formed between every two adjacent movable fan blades (40), and the width of the first gap can be changed along with rotation of the movable fan blades (40). According to the scheme, the problem that charged ions in process gas bombard a wafer easily due to the fact that a bias power supply is adopted to couple an electric field for ignition into a process space in the ignition stage of a process chamber related to the related technology can be solved.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor process equipment, and particularly relates to a shielding device, a control method thereof, a process chamber, and semiconductor process equipment. Background Art

[0002] In some semiconductor processes such as integrated circuit manufacturing processes and silicon via manufacturing processes, metal interconnect processes and pre-cleaning processes are essential. The metal interconnect process usually occurs after the pre-cleaning process. The pre-cleaning process needs to excite process gases (such as argon, helium, hydrogen, etc.) to generate plasma, and then bombard the surface of the wafer with the plasma to clean the residues on the wafer. After the pre-cleaning process, the metal interconnect process generates metal particles by bombarding a metal target (such as a copper target, an aluminum target, etc.) with plasma and deposits the metal particles on the wafer to form a metal thin film. The pre-cleaning process can significantly improve the surface adhesion of the wafer, making it easier to deposit the metal thin film subsequently, and can also significantly reduce the resistance of the circuit, thereby reducing the thermal loss of the circuit. When depositing a metal thin film with strong diffusivity, a barrier layer needs to be deposited in advance, and the barrier layer can prevent the subsequent products (such as chips) from leaking electricity.

[0003] Both the pre-cleaning process and the metal interconnect process require a corresponding process chamber to configure a radio frequency coil to excite the process gas and dissociate it into plasma. To avoid the electric field generated by the radio frequency coil (by means of inductive coupling) driving the subsequently generated plasma to cause an adverse bombardment motion, a shielding device (such as a Faraday cage) is also configured in the process chamber related to the related art, and the radio frequency coil is arranged around the shielding device. Since the shielding device has a small magnetic field shielding effect on the radio frequency coil, the magnetic field generated by the radio frequency coil will pass through the shielding device and couple into the process space inside the shielding device, and then control the motion of the plasma in the process space.

[0004] Before the process gas is dissociated into plasma, ignition is required, and ignition requires the radio frequency coil to couple a strong electric field into the shielding device. However, the shielding device will strongly shield the electric field generated by the radio frequency coil, ultimately resulting in a weak electric field coupled into the shielding device by the radio frequency coil. The weak electric field is difficult to ignite the process gas, resulting in the process gas being unable to be dissociated into plasma.

[0005] It can be seen that in the related art, the shielding device causes difficulties in ignition. At the same time, since it is necessary to shield the electric field of the radio frequency coil to avoid the adverse influence of the electric field of the radio frequency coil on the plasma, the shielding device is indispensable.

[0006] To this end, in the ignition stage of the process chamber involved in the related art, an electric field is coupled into the process space through a bias power supply of a wafer carrier (such as an electrostatic chuck). However, the bias power supply relies on capacitive coupling to couple the electric field. This coupling method will form a very high negative bias on the surface of the wafer during ignition, attracting charged ions to bombard the wafer surface, which is likely to damage the functional layer on the wafer and lead to process failure. Summary of the Invention

[0007] The present invention discloses a shielding device, a control method thereof, a process chamber, and a semiconductor process equipment to solve the problem that in the ignition stage of the process chamber involved in the related art, a bias power supply is used to couple an electric field into the process space for ignition, which easily causes ions in the process gas to bombard the wafer.

[0008] To solve the above technical problems, the present invention provides the following technical solutions:

[0009] In a first aspect, an embodiment of the present invention discloses a shielding device. The disclosed shielding device includes a first annular base and a plurality of movable fan blades. The plurality of movable fan blades are rotatably arranged on the first annular base and are distributed along the circumferential direction of the first annular base. A first gap with a variable width that can change with the rotation of the movable fan blades can be formed between two adjacent movable fan blades.

[0010] In a second aspect, an embodiment of the present invention discloses a control method of a shielding device. The shielding device is the shielding device described in the first aspect. The shielding device is applied to a process chamber. The control method includes:

[0011] When the process chamber is in the ignition stage, controlling the rotation of the movable fan blades so that the width of the first gap formed between two adjacent movable fan blades increases;

[0012] When the process chamber is in the process stage, controlling the rotation of the movable fan blades so that the width of the first gap formed between two adjacent movable fan blades decreases.

[0013] In a third aspect, an embodiment of the present invention discloses a process chamber. The disclosed process chamber includes a chamber body and a shielding device arranged in the chamber body. The shielding device is electrically connected to the chamber body in a grounded manner. The shielding device is the shielding device described in the first aspect.

[0014] In a fourth aspect, an embodiment of the present invention discloses a semiconductor process equipment. The disclosed semiconductor process equipment includes a controller and the process chamber described in the third aspect. The controller includes a memory and a processor. The memory stores a computer program. The processor executes the following steps according to the computer program:

[0015] When the process chamber is in the ignition stage, control the rotation of the movable fan blades so that the width of the first gap formed between two adjacent movable fan blades increases;

[0016] When the process chamber is in the process stage, control the rotation of the movable fan blades so that the width of the first gap formed between two adjacent movable fan blades decreases.

[0017] The technical solution adopted by the present invention can achieve the following technical effects:

[0018] The shielding device disclosed in the embodiment of the present invention improves the structure of the shielding device involved in the related art, so that a plurality of movable fan blades included in the shielding device can rotate relative to the first annular base, thereby enabling a first gap with a width that can change with the rotation of the movable fan blades to be formed between two adjacent movable fan blades. In this case, when the process chamber is in the ignition stage, the plurality of movable fan blades rotate to increase the width of the first gap formed between two adjacent movable fan blades. At this time, the shielding function of the shielding device weakens, so that the radio frequency coil surrounding the outside of the shielding device can couple a larger electric field into the process space, thereby making it easier to ignite the process gas in the process space. When the process chamber is in the process stage, the plurality of movable fan blades rotate to decrease the width of the first gap formed between two adjacent movable fan blades. At this time, the shielding function of the shielding device is enhanced, so that the electric field coupled by the radio frequency coil outside the shielding device into the process space is smaller, so that the shielding device can exert a better shielding function, and further avoid the plasma generated in the process space from bombarding the inner wall of the process chamber under the action of a large electric field force.

[0019] The shielding device disclosed in the embodiment of the present invention abandons the design concept of using a bias power supply to couple an electric field into the process space in the ignition stage, overcomes the thinking prejudice in the background technology, and still returns to the contradiction itself for pioneering design. The shielding device is designed into a structure including a plurality of rotatable movable fan blades, so as to adjust the width of the first gap formed by adjacent movable fan blades through the rotation of the movable fan blades, so that the shielding device can ensure that the plasma will not be bombarded by a large electric field force on the inner wall of the process chamber during the process stage, and at the same time, it can also make the ignition in the ignition stage easier to succeed. At the same time, it can also avoid using a bias power supply to couple a large electric field into the process space for ignition in the ignition stage, and finally avoid the problem that the bias power supply is prone to form a large bias electric field resulting in charged ions bombarding the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is a schematic structural diagram of the shielding device disclosed in the embodiment of the present invention;

[0021] Figure 2 is Figure 1 a cross-sectional view of a partial structure of

[0022] Figure 3 is Figure 1 a cross-sectional view of

[0023] Figure 4 and Figure 5 are respectively schematic structural diagrams of the movable fan blade disclosed in the embodiments of the present invention from different perspectives;

[0024] Figure 6 is a schematic assembly diagram of the movable fan blade, the first ring body and the second ring body disclosed in the embodiments of the present invention. Figure 6 Only partial structures of the first ring body and the second ring body are schematically shown therein;

[0025] Figure 7 is a schematic structural diagram of the process chamber disclosed in the embodiments of the present invention.

[0026] Description of reference numerals:

[0027] 01 - first annular base, 10 - first ring body, 20 - second ring body,

[0028] 30 - drive mechanism, 31 - drive motor, 32 - transmission belt, 33 - first engagement portion,

[0029] 40 - movable fan blade, 41 - rotating shaft,

[0030] 50 - chamber body, 51 - chamber cover,

[0031] 60 - wafer carrier, 61 - cooling device,

[0032] 70 - support member, 80 - electrical connector,

[0033] 91 - radio frequency coil, 92 - ceramic cylinder, 93 - radio frequency power supply, 94 - first matcher, 95 - bias power supply, 96 - second matcher, 97 - DC blocking capacitor, 98 - cold pump or molecular pump, 99 - shielding plate, 901 - coaxial cable, 902 - bellows, 903 - filter, 904 - DC power supply, 905 - shielding device. Detailed implementation manners

[0034] To make the objectives, technical solutions and advantages of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below in conjunction with specific embodiments of the present invention and the corresponding drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without making creative efforts shall fall within the scope of protection of the present invention.

[0035] The technical solutions disclosed in each embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

[0036] Please refer to Figures 1 to 6 , an embodiment of the present invention discloses a shielding device. The disclosed shielding device is applied to a process chamber. The disclosed shielding device includes a first annular base 01 and a plurality of movable vanes 40.

[0037] The first annular base 01 is the base of the shielding device and is used to provide an installation foundation for other components of the shielding device. In the embodiment of the present invention, the first annular base 01 may be an annular structure (such as a circular ring structure), and the first annular base 01 provides an installation position for the plurality of movable vanes 40.

[0038] The structure of the first annular base 01 may be various. Among them, the first annular base 01 may include at least one of a first ring body 10 and a second ring body 20.

[0039] For example, the first annular base 01 may only include the first ring body 10, and the first ring body 10 may be a circular ring structure, or may only include the second ring body 20, and the second ring body 20 may be a circular ring structure, or may also include both the first ring body 10 and the second ring body 20. When the first annular base 01 includes the first ring body 10, the first ring body 10 may be located above the plurality of movable vanes 40. When the first annular base 01 includes the second ring body 20, the second ring body 20 may be located below the plurality of movable vanes 40.

[0040] In other embodiments, when the first annular base 01 includes the first ring body 10 and the second ring body 20, the first ring body 10 and the second ring body 20 are spaced apart and may both be circular ring structures. The first ring body 10 and the second ring body 20 are generally parallel or parallel, so that the axes of the first ring body 10 and the second ring body 20 are coaxial or form an included angle or are parallel with a preset size. In a relatively optional solution, the first ring body 10 and the second ring body 20 are coaxially distributed.

[0041] In an embodiment of the present invention, the plurality of movable fan blades 40 are rotatably disposed on the first annular base 01 and are distributed along the circumferential direction of the first annular base 01. When the first annular base 01 only includes the first ring body 10, the first ring body 10 may be located above the plurality of movable fan blades 40, and the first ends of the plurality of movable fan blades 40 may be rotatably connected to the first ring body 10. When the first annular base 01 only includes the second ring body 20, the second ring body 20 may be located below the plurality of movable fan blades 40, and the second ends of the plurality of movable fan blades 40 may be rotatably mounted on the second ring body 20. It should be noted that the first end and the second end of the movable fan blade 40 are opposite ends of the movable fan blade 40, and among them, the first end of the movable fan blade 40 is higher than the second end of the movable fan blade 40.

[0042] When the first annular base 01 includes both the first ring body 10 and the second ring body 20 at the same time, the plurality of movable fan blades 40 are disposed between the first ring body 10 and the second ring body 20 and are distributed along the circumferential direction of the first ring body 10 or the second ring body 20. The plurality of movable fan blades 40 and the first annular base 01 may be made of a metal material, and their materials may be the same or different. The embodiments of the present invention do not make any restrictions, as long as the plurality of movable fan blades 40 and the first annular base 01 can form a shielding device with an electric field shielding function (such as a cylindrical Faraday cage). The two ends of each movable fan blade 40 may be respectively rotatably connected to the first ring body 10 and the second ring body 20, so that each movable fan blade 40 can rotate relative to the first ring body 10 and the second ring body 20. In this structure, since the two ends of the movable fan blade 40 are respectively rotatably connected to the first ring body 10 and the second ring body 20, more stable installation can be achieved, and more stable and accurate rotation of the movable fan blade 40 can also be realized, which is beneficial to accurately adjusting the width of the first gap.

[0043] Among the plurality of movable fan blades 40, a first gap with a width that can change as the movable fan blades 40 rotate can be formed between two adjacent movable fan blades 40, and this first gap can allow a magnetic field to pass through. That is to say, if at least one of the two adjacent movable fan blades 40 rotates, a first gap can be formed between the two adjacent movable fan blades 40, and at the same time, the width of the formed first gap can also be changed. It should be noted that in the embodiments of the present invention, the width of the first gap refers to the dimension in the direction perpendicular to the extension direction of the first gap (i.e., the length direction of the first gap). Optionally, the length direction of the first gap can be considered as the distribution direction of the first ring body 10 and the second ring body 20.

[0044] As can be seen from the description in the background art, the process chamber involved in the embodiments of the present invention has an ignition stage and a process stage. Among them, in the ignition stage, a relatively large electric field needs to be coupled into the process space in the shielding device to complete ignition, and then the process gas in the process space is dissociated into plasma. In the process stage, the plasma formed in the ignition stage is used for corresponding processes, such as pre-cleaning process, thin film deposition process, etc. Since the plasma has been formed in the process stage, there is no need to couple a relatively large electric field into the process space. At this time, the shielding device shields the external electric field as much as possible to avoid the adverse driving of the electric field on the plasma.

[0045] The shielding device disclosed in the embodiments of the present invention improves the structure of the shielding device involved in the related art, so that the shielding device includes a plurality of movable fan blades 40 that can rotate relative to the first annular base 01, so that a first gap whose width can change with the rotation of the movable fan blades 40 can be formed between two adjacent movable fan blades 40. In this case, when the process chamber is in the ignition stage, the plurality of movable fan blades 40 rotate to increase the width of the first gap formed between two adjacent movable fan blades 40. At this time, the shielding function of the shielding device is weakened, so that the radio frequency coil surrounding the outside of the shielding device can couple a relatively large electric field into the process space, so that it is easier to ignite the process gas in the process space. When the process chamber is in the process stage, the plurality of movable fan blades 40 rotate to reduce the width of the first gap formed between two adjacent movable fan blades 40. At this time, the shielding function of the shielding device is enhanced, so that the electric field coupled by the radio frequency coil outside the shielding device into the process space is smaller, so that the shielding device can play a better shielding function, and further avoid the plasma generated in the process space from bombarding the inner wall of the process chamber under the action of a relatively large electric field force.

[0046] The shielding device disclosed in the embodiments of the present invention abandons the design concept of using a bias power supply to couple an electric field into the process space in the ignition stage, overcomes the thinking prejudice in the background art, and still returns to the contradiction itself for pioneering design. The shielding device is designed into a structure including a plurality of movable fan blades 40 that can rotate, so as to adjust the width of the first gap formed between adjacent movable fan blades 40 by the rotation of the movable fan blades 40, so that the shielding device can ensure that the plasma will not be bombarded by a relatively large electric field force on the inner wall of the process chamber in the process stage, and at the same time, it can make the ignition in the ignition stage easier to succeed. At the same time, it can also avoid using a bias power supply to couple a relatively large electric field into the process space for ignition in the ignition stage, and finally avoid the problem that the bias power supply is likely to form a relatively large bias electric field resulting in charged ions bombarding the wafer.

[0047] In addition, since the movable fan blade 40 can rotate to adjust the width of the first gap, even if metal particles are deposited on the surface of the movable fan blade 40 after multiple processes, the movable fan blade 40 can be rotated to form a first gap with a larger width as much as possible during the ignition stage, making ignition more likely to succeed, and the first gap will not be unable to increase due to the deposition of metal particles on the movable fan blade 40.

[0048] In the embodiment of the present invention, as long as the movable fan blade 40 can be rotated, a first gap can be formed between two adjacent movable fan blades 40 and the width of the first gap can be changed. Specifically, the operator can manually control the rotation of the movable fan blade 40 to change the width of the first gap between two adjacent movable fan blades 40. For example, during the ignition stage, the operator manually rotates the movable fan blade 40, so that the width of the first gap formed between two adjacent movable fan blades 40 increases, and can even increase to the maximum value. During the process stage, the operator manually rotates the movable fan blade 40, so that the width of the first gap formed between two adjacent movable fan blades 40 decreases.

[0049] Certainly, in order to be more convenient to drive and improve the automation degree of the shielding device, in a more optional solution, the shielding device disclosed in the embodiment of the present invention may further include a driving mechanism 30, and the driving mechanism 30 can be connected to the plurality of movable fan blades 40, and the driving mechanism 30 is used to drive the plurality of movable fan blades 40 to rotate.

[0050] The driving mechanism 30 is a device for driving the plurality of movable fan blades 40 to rotate, and there are various cooperation methods between the driving mechanism 30 and the movable fan blade 40, which are not limited in the embodiment of the present invention. In some embodiments, each movable fan blade 40 can be configured with its own dedicated driving mechanism 30. During the specific working process, each driving mechanism 30 only drives one movable fan blade 40 connected thereto to rotate. In this case, the rotation of each movable fan blade 40 is driven by a separate driving mechanism 30 and will not be affected by the rotation of other movable fan blades 40. Of course, in this case, the shielding device needs to be configured with more driving mechanisms 30, which will inevitably lead to a higher cost of the shielding device and a more complex structure of the entire shielding device due to the configuration of more driving mechanisms 30.

[0051] Based on this, in other embodiments, the driving mechanism 30 may include a driving motor 31 and a transmission mechanism. The driving motor 31 is connected to each of the plurality of movable fan blades 40 through the transmission mechanism, and the driving motor 31 drives the plurality of movable fan blades 40 to rotate synchronously through the transmission mechanism. The driving mechanism 30 with such a structure can drive all the movable fan blades 40 to rotate through the transmission mechanism, so that it is not necessary to configure a large number of driving mechanisms 30. Of course, such a driving mechanism 30 can also enable the shielding device to use a small number of driving motors 31 to drive all the movable fan blades 40 to rotate, so that it is not necessary to configure a large number of driving motors 31, and ultimately the manufacturing cost and structural complexity of the shielding device can be reduced.

[0052] The driving motor 31 and the transmission mechanism may be one or multiple, and the embodiments of the present invention do not limit this. To improve the driving accuracy, the driving motor 31 may be a stepping motor. Of course, the driving motor 31 may also be other types of motors, and the embodiments of the present invention do not limit the specific type of the driving motor 31.

[0053] The transmission mechanism performs the power transmission function. The transmission mechanism may be a gear transmission mechanism, a chain transmission mechanism, a belt transmission mechanism, etc., and the embodiments of the present invention do not limit the specific type of the transmission mechanism. In an alternative solution, the transmission mechanism may include a transmission belt 32 and a first meshing portion 33. The movable fan blade 40 may be rotatably connected to the first annular base 01 through a rotating shaft 41. For example, the first end of the movable fan blade 40 is rotatably connected to the first ring body 10 through the rotating shaft 41. For example, the second end of the movable fan blade 40 is rotatably connected to the second ring body 20 through the rotating shaft 41. For another example, both ends of the movable fan blade 40 are rotatably connected to the first ring body 10 and the second ring body 20 respectively through the rotating shaft 41. At least one end of the rotating shaft 41 corresponding to each movable fan blade 40 may be provided with a first meshing portion 33. The transmission belt 32 is sleeved outside or lined inside the plurality of movable fan blades 40 and meshes with the first meshing portion 33 corresponding to each movable fan blade 40. The driving motor 31 drives at least one of the plurality of movable fan blades 40 to rotate, and can drive the plurality of movable fan blades 40 to rotate synchronously through the transmission belt 32. In this case, a small number (such as one) of driving motors 31 can be used to drive at least one of the plurality of movable fan blades 40 to rotate, and then the synchronous rotation of all the movable fan blades 40 can be driven through the transmission belt 32. At the same time, the transmission belt 32 can cooperate with a plurality of first meshing portions 33 to achieve transmission. Compared with other types of transmission mechanisms, the structure is relatively simple.

[0054] In the embodiments of the present invention, the transmission belt 32 may be a metal track belt. Of course, it may also be other structures of belt-shaped members capable of meshing transmission. The embodiments of the present invention do not limit the specific material and structure of the transmission belt 32.

[0055] In the embodiment where the two ends of each of the plurality of movable blades 40 are rotatably connected to the first ring body 10 and the second ring body 20 respectively, further optionally, each movable blade 40 may be rotatably connected to the first ring body 10 and the second ring body 20 respectively through an integral rotating shaft (i.e., the rotating shaft 41 is of an integral structure) 41. In this case, both ends of the rotating shaft 41 penetrate through the corresponding movable blade 40 and protrude from both ends of the movable blade 40 respectively. Of course, in another alternative solution, the rotating shaft 41 may be of a split structure. Each rotating shaft 41 may include two shaft segments. Both ends of each movable blade 40 may be fixedly connected to two shaft segments of a corresponding rotating shaft 41 respectively. The two shaft segments of a corresponding rotating shaft 41 are rotatably connected to the first ring body 10 and the second ring body 20 respectively, so as to realize the rotational connection between the movable blade 40 and the first ring body 10 and the second ring body 20 respectively. This structure can enable the rotating shaft 41 to not need to be too long. It only needs to connect two shorter shaft segments to both ends of the movable blade 40 respectively, and respectively make the two shorter shaft segments rotatably connected to the first ring body 10 and the second ring body 20. This structure can save the consumables of the rotating shaft 41. Of course, the embodiment of the present invention does not limit the structure of the rotating shaft 41, as long as the connection between the movable blade 40 and the first ring body 10 and the second ring body 20 can be realized.

[0056] In the embodiment of the present invention, the driving motor 31 may be directly connected to the rotating shaft 41, so as to directly drive the corresponding movable blade 40 to rotate through the rotating shaft 41, and then the movable blade 40 realizes the synchronous rotation of all the movable blades 40 through the transmission mechanism connecting the plurality of movable blades 40. Of course, the driving motor 31 may also be indirectly connected to the rotating shaft 41. Based on this, in an alternative solution, the transmission mechanism may further include a second meshing portion. The second meshing portion is provided on the power output shaft of the driving motor 31 and meshes with the first side of the first meshing portion 33. The transmission belt 32 may mesh with the second side of the first meshing portion 33. The first side and the second side are the opposite sides of the first meshing portion 33. For example, if the transmission belt 32 is sleeved outside the plurality of movable blades 40, then the transmission belt 32 meshes with the outer side of the first meshing portion 33. Correspondingly, the second meshing portion meshes with the inner side of the first meshing portion 33. Another example is that if the transmission belt 32 is lined inside the plurality of movable blades 40, then the transmission belt 32 meshes with the inner side of the first meshing portion 33. Correspondingly, the second meshing portion meshes with the outer side of the first meshing portion 33.

[0057] In this way, there is no need for the drive motor 31 to be directly connected to the rotating shaft 41, so that one of the drive motor 31 and the transmission belt 32 can be arranged outside the plurality of movable fan blades 40, and the other can be arranged inside the plurality of movable fan blades 40, thus making full use of the space on both the inner and outer sides of the shielding device. At the same time, it can also avoid the problem that the drive motor 31 is directly connected to the rotating shaft 41 through its own power output shaft, resulting in the shielding device occupying too much space in the axial direction of the rotating shaft 41.

[0058] Certainly, the inner engagement of the second engagement portion with the first engagement portion 33 is beneficial to arranging the relatively large drive motor 31 in the area surrounded by the first annular base portion 01, thereby achieving full utilization of the area surrounded by the first annular base portion 01.

[0059] As described above, at least one end of the rotating shaft 41 corresponding to each movable fan blade 40 can be provided with a first engagement portion 33. That is to say, the rotating shaft 41 corresponding to each movable fan blade 40 can be provided with a first engagement portion 33 at only one end, or can be provided with first engagement portions 33 at both ends. In a more optional solution, first engagement portions 33 are fixed at both ends of the rotating shaft 41 corresponding to each movable fan blade 40, and there are at least two transmission belts 32. The transmission belt 32 located at one end of the plurality of movable fan blades 40 (which can be regarded as the first end of the movable fan blade 40) can be engaged with the first engagement portion 33 located at the same end of the plurality of movable fan blades 40, and the transmission belt 32 located at the other end of the plurality of movable fan blades 40 (which can be regarded as the second end of the movable fan blade 40) can be engaged with the first engagement portion 33 located at the same end of the plurality of movable fan blades 40. In this case, when the drive motor 31 drives the corresponding movable fan blade 40 to rotate, the corresponding movable fan blade 40 will drive all the movable fan blades 40 to rotate through at least two transmission belts 32. In this case, at least two transmission belts 32 can share the transmitted torque, thereby avoiding the problem that the transmitted torque is too concentrated during the driving process, resulting in the corresponding components being easily damaged due to bearing a large load.

[0060] As described above, the number of driving motors 31 may be one or more. Of course, when there is one driving motor 31, even with just one driving motor 31, all the movable fan blades 40 can be driven to rotate synchronously through a transmission mechanism. However, when there is one driving motor 31, in order to drive all the movable fan blades 40 to rotate, the movable fan blade 40 and the rotating shaft 41 connected to the driving motor 31 will inevitably bear a large torque, which may lead to excessive stress concentration and easy damage, and it is also prone to slipping. Moreover, with only one driving motor 31, it is relatively difficult to achieve a more balanced drive. Based on this, there may be multiple driving motors 31. Specifically, the number of driving motors 31 can be equal to the number of movable fan blades 40, so as to achieve one driving motor 31 driving one movable fan blade 40, and the transmission mechanism can realize the synchronous rotation of all the movable fan blades 40. However, in this case, there is a problem that the excessive number of driving motors 31 may lead to a crowded layout, and it will also result in a relatively high cost of the shielding device. Based on this, in a more optional solution, there may be multiple driving motors 31, and the number of driving motors 31 can be less than the number of movable fan blades 40. In this case, there are multiple driving motors 31, and the multiple driving motors 31 can jointly drive all the movable fan blades 40 to rotate synchronously through a transmission mechanism, avoiding the problem that the torque is overly concentrated on individual movable fan blades 40 caused by using a single driving motor 31, preventing the slipping phenomenon that is likely to occur due to excessive torque, and at the same time, it will not lead to a crowded layout due to too many driving motors 31, and it will also reduce the cost of the shielding device to a certain extent. Of course, the multiple driving motors 31 need to be synchronously driven during the driving process to ensure the normal operation of the transmission belt 32.

[0061] In a further technical solution, among the multiple driving motors 31, at least some of the driving motors 31 are respectively connected to multiple non-adjacent movable fan blades 40, so as to avoid the problem that the layout of the driving motors 31 is too concentrated and unable to achieve a balanced drive. For example, among the multiple movable fan blades 40, one driving motor 31 is provided for every other movable fan blade 40.

[0062] In the embodiment of the present invention, the movable fan blade 40 can be a flat fan blade, for example, the movable fan blade 40 has a flat plate structure. Of course, the movable fan blade 40 can also be an arc-shaped fan blade, and the outer surfaces of the multiple movable fan blades 40 in the same circle can be located on the same cylindrical surface. In this case, with the arc-shaped structure of the movable fan blade 40, it is easier to enclose a cylindrical shielding device. It should be noted that the outer surface of the movable fan blade 40 refers to the surface of the movable fan blade 40 facing away from the process space.

[0063] As described above, a first gap whose width can change with the rotation of the movable fan blades 40 can be formed between two adjacent movable fan blades 40. It should be further clarified here that the ability to form a first gap between two adjacent movable fan blades 40 does not mean that the first gap can always be formed between two adjacent movable fan blades 40 during the rotation process. For example, among the multiple movable fan blades 40, when the movable fan blades 40 rotate, two adjacent movable fan blades 40 may come into contact with each other at a certain position during rotation, and there is no first gap (it can be considered that the width of the first gap is zero). Of course, except for this position, when the movable fan blades 40 rotate to other positions, a first gap can be formed between two adjacent movable fan blades 40.

[0064] For another example, in the preset rotation stroke of the movable fan blades 40, no matter which position the movable fan blades 40 rotate to, a first gap can be formed between two adjacent movable fan blades 40. The rotation of the movable fan blades 40 will not eliminate the first gap (that is, the width of the first gap is not zero), but only change the width of the first gap. That is to say, in the preset rotation stroke of the multiple movable fan blades 40, a first gap is continuously formed between two adjacent movable fan blades 40, that is, the first gap between two adjacent movable fan blades 40 is greater than zero. In this case, the first gap between two adjacent movable fan blades 40 will not disappear.

[0065] In the process stage, metal particles in the process space will deposit on the movable fan blades 40. If a first gap is continuously formed between two adjacent movable fan blades 40, then when the movable fan blades 40 rotate to the position where the width of the first gap is the smallest, the metal particles deposited on the movable fan blades 40 will not be crushed into particles due to the contact of the movable fan blades 40, thereby avoiding the particles formed by crushing from returning to the process space and causing pollution, and even affecting the quality of the process. Of course, this structure enables a first gap to be formed between two adjacent movable fan blades 40 no matter how the movable fan blades 40 rotate, thereby avoiding the problem that the magnetic field generated by the radio frequency coil cannot be coupled to the process space due to the elimination of the first gap. In the embodiment of the present invention, the preset rotation stroke can be 360°, or 180°, or 90°, and the embodiment of the present invention does not make any restrictions. Of course, in the actual design process, when the drive motor 31 is a stepping motor, the maximum rotation angle of the movable fan blades 40 can be limited by restricting the maximum number of forward and reverse steps of the stepping motor, so as to make it meet the preset rotation stroke (substantially a preset rotation angle range).

[0066] In an embodiment of the present invention, the rotating shaft 41 is rotatably connected to the first annular base 01, so as to enable the movable fan blade 40 to rotate relative to the first annular base 01. The structure of the rotating shaft 41 can be various. The end of the rotating shaft 41 can be a flat end or a conical tip. The embodiment of the present invention does not limit the specific shape of the rotating shaft 41. In a relatively optional solution, both ends of the rotating shaft 41 can be conical tips, and the first annular base 01 can be provided with a conical hole adapted to the shape of the conical tip. For example, both the first ring body 10 and the second ring body 20 can be provided with conical holes adapted to the shape of the conical tip. The conical tip is inserted and connected with the conical hole, and the two are rotationally matched. In this case, through the insertion and cooperation of the conical tip and the conical hole of the rotating shaft 41, it is more beneficial for the movable fan blade 40 to be grounded and electrically connected to the first annular base 01 through the rotating shaft 41, and it is also beneficial for a tighter fit.

[0067] In an optional solution, the portion of the rotating shaft 41 between the two conical tips can be cylindrical, and the above-mentioned first engaging portion 33 can be formed on the cylindrical portion of the rotating shaft 41 through an assembly or an integral molding process. Specifically, the first engaging portion 33 can be a toothless gear or a full-tooth gear. If the first engaging portion 33 and the rotating shaft 41 are manufactured by an integral process, finally, the first engaging portion 33 and the rotating shaft 41 can form a gear shaft.

[0068] In an embodiment of the present invention, the plurality of movable fan blades 40 can be distributed in a circle, so that the shielding device forms a single-layer shielding structure. The single-layer shielding structure has a simple structure and can also make the weight of the shielding device smaller, which is convenient for installation into the process chamber.

[0069] Of course, the plurality of movable fan blades 40 can also be distributed in multiple circles, so that the shielding device forms a multi-layer shielding structure. The multi-layer shielding structure can improve the structural strength of the shielding device and make the shielding effect better. At the same time, in the plurality of movable fan blades 40 distributed in multiple circles, a first gap with different widths can be formed between two adjacent movable fan blades 40 in different circles. Through the cooperation of the first gaps located in different circles, the shielding performance of the entire shielding device can be better adjusted.

[0070] In the specific design process, in the movable fan blades 40 distributed in multiple circles, an appropriate interval can be left between two adjacent circles of movable fan blades 40, so that the rotation of each circle of movable fan blades 40 is not easily interfered by the movable fan blades 40 in other circles.

[0071] In an alternative solution, the multiple movable fan blades 40 are distributed in at least two concentric circles, and the multiple movable fan blades 40 in each circle are individually driven by corresponding driving mechanisms 30. Of course, the at least two circles of movable fan blades 40 distributed concentrically may also share the driving mechanism 30, and the embodiments of the present invention do not limit this.

[0072] Considering the working stability, more preferably, the multiple movable fan blades 40 in each circle are individually configured with a driving mechanism 30 for driving, so that the driving mechanism 30 can only drive the movable fan blades 40 in the corresponding circle to rotate, without affecting the movable fan blades 40 in other circles. In this case, once the driving mechanism 30 corresponding to a certain circle of movable fan blades 40 is damaged, the driving mechanisms 30 corresponding to the movable fan blades 40 in other circles can still operate, thereby improving the working stability of the shielding device.

[0073] In a further technical solution, when the driving mechanism 30 includes a driving motor 31 and a transmission belt 32, the driving motors 31 of the driving mechanisms 30 corresponding to the adjacent two circles of movable fan blades 40 can be arranged in the space between the adjacent two circles of movable fan blades 40, so as to make full use of the space between the adjacent two circles of movable fan blades 40, which is beneficial to the miniaturized design of the shielding device. In addition, in a specific embodiment, the transmission belt 32 cooperating with the inner circle of movable fan blades 40 can be located on the side adjacent to the process space. Of course, the transmission belt 32 cooperating with the innermost circle of movable fan blades 40 can be lined on the inner side of the innermost circle of movable fan blades 40 and then located in the process space, so as to make full use of the process space.

[0074] When the multiple movable fan blades 40 are distributed in at least two concentric circles, among the adjacent two circles of movable fan blades 40, the multiple movable fan blades 40 located inside can correspond to the multiple movable fan blades 40 located outside one by one, and their radial projections on the first annular base 01 can completely coincide one by one. In this case, during the rotation of the inner movable fan blades 40 and the outer movable fan blades 40, the first gap between two adjacent inner movable fan blades 40 may not be blocked by the outer movable fan blades 40. Similarly, the first gap between two adjacent outer movable fan blades 40 may not be blocked by the inner movable fan blades 40. Finally, the first gap between two adjacent inner movable fan blades 40 and the first gap between two adjacent outer movable fan blades 40 can be maximized, thereby increasing the maximum value of the width of the first gap, which is more conducive to coupling a larger electric field into the process space by the radio frequency coil during the ignition stage and making the ignition more likely to succeed. It should be noted that in this article, the radial direction of the first annular base 01 is the same as the radial direction of the first ring body 10 and the second ring body 20.

[0075] Of course, in other embodiments, among two adjacent rings of movable fan blades 40, the radial projections of the inner movable fan blade 40 and the outer movable fan blade 40 on the first ring body 10 or the second ring body 20 may partially overlap or may not overlap. Of course, in the case of non-overlap, as long as the first gaps formed between the inner movable fan blades 40 and the first gaps formed between the outer movable fan blades 40 can partially overlap to allow the magnetic field generated by the radio frequency coil to pass through, the embodiments of the present invention do not impose excessive restrictions. Of course, in the case of partial overlap or non-overlap, the multi-layer shielding structure formed by the movable fan blades 40 distributed in multiple rings substantially realizes the offset design of two adjacent rings of movable fan blades 40, which can alleviate the phenomenon that metal particles are deposited on the ceramic cylinder (such as Figure 7 shown) 92 of the process chamber, thereby enabling the ceramic cylinder 92 to be replaced or repaired less frequently.

[0076] In the case where the plurality of movable fan blades 40 are concentrically distributed in at least two rings, there may be one first annular base 01. For example, both the first ring body 10 and the second ring body 20 may be one. Both ends of the movable fan blades 40 distributed in at least two rings can be rotatably connected to the first ring body 10 and the second ring body 20 respectively. In this case, the at least two rings of movable fan blades 40 distributed concentrically can share the first annular base 01. During installation, by installing the first annular base 01 inside the process chamber, the synchronous installation of multiple rings of movable fan blades 40 can be achieved. Of course, in the case where the first annular base 01 includes the first ring body 10 and the second ring body 20, the synchronous installation of multiple rings of movable fan blades 40 can be achieved by installing at least one of the first ring body 10 and the second ring body 20 inside the process chamber, which undoubtedly can reduce the on-site assembly amount. Of course, in the specific design process, the width of the first annular base 01 can be reasonably designed according to the number of distribution rings of the movable fan blades 40. Of course, in the case where the first annular base 01 includes at least one of the first ring body 10 and the second ring body 20, designing the width of the first annular base 01 refers to designing the width of at least one of the first ring body 10 and the second ring body 20. It should be noted that the width of the first annular base 01 refers to the distance between the inner edge and the outer edge of the first annular base 01. Correspondingly, the width of the first ring body 10 refers to the distance between the inner edge and the outer edge of the first ring body 10. Similarly, the width of the second ring body 20 refers to the distance between the inner edge and the outer edge of the second ring body 20.

[0077] Of course, in other embodiments, there may be multiple first annular bases 01, and all the first annular bases 01 may be concentrically distributed. The ends of the movable fan blades 40 in each circle may be respectively rotatably connected to the corresponding first annular bases 01. In a more preferable solution, both the first ring body 10 and the second ring body 20 may be multiple. All the first ring bodies 10 are concentrically distributed, and all the second ring bodies 20 are concentrically distributed. The two ends of the movable fan blades 40 in each circle are respectively rotatably connected to the corresponding first ring body 10 and the second ring body 20. Specifically, the number of the first annular bases 01 may be equal to the number of circles in which the movable fan blades 40 are distributed. For example, the number of the first annular bases 01 may be equal to the number of circles in which the movable fan blades 40 are distributed, so that each circle of movable fan blades 40 can be connected to a corresponding first annular base 01. In this case, each circle of movable fan blades 40 can be connected to the corresponding first annular base 01 to form a shielding monomer, and after the movable fan blades 40 in multiple circles are respectively connected to their corresponding first annular bases 01, a shielding structure including multiple shielding monomers can be formed. In this case, during the manufacturing process, the product manufacturer can manufacture multiple shielding monomers with different diameters, and then can combine them according to the different needs of users, so as to form combinations of multiple shielding monomers with different diameters. This design can achieve flexible combination, so as to better meet the diverse usage needs of users.

[0078] Of course, in this case, multiple shielding monomers can be respectively and independently installed in the process chamber to achieve installation in the process chamber. Of course, the first annular bases 01 between multiple shielding monomers can be connected. For example, the first ring bodies 10 between multiple shielding monomers can be correspondingly connected, and the second ring bodies 20 between multiple shielding monomers can be correspondingly connected. In this case, if one of the multiple first annular bases 01 is installed in the process chamber, all the first annular bases 01 can be installed in the process chamber. For example, if one of the multiple first ring bodies 10 is installed in the process chamber, all the first ring bodies 10 can be installed in the process chamber. If one of the multiple second ring bodies 20 is installed in the process chamber, all the second ring bodies 20 can be installed in the process chamber. Of course, the first annular bases 01 of multiple shielding monomers can also be respectively and independently installed in the process chamber. Further, the first ring bodies 10 of multiple shielding monomers and the second ring bodies 20 of multiple shielding monomers can both be respectively and independently installed in the process chamber.

[0079] Specifically, two adjacent ones of the multiple first annular bases 01 can be connected in a non-detachable manner. For example, two adjacent ones of the multiple first ring bodies 10 can be connected in a non-detachable manner, and two adjacent ones of the multiple second ring bodies 20 can be connected in a non-detachable manner. Considering the flexible combination of the shielding monomers, the multiple first annular bases 01 distributed concentrically can be connected in a detachable manner. For example, the first ring bodies 10 distributed concentrically can be detachably connected to each other, and the second ring bodies 20 distributed concentrically can be detachably connected to each other. In this case, the shielding monomers can be assembled by detachable connection, thereby forming diverse shielding structures.

[0080] In other embodiments, the shielding device disclosed in the embodiments of the present invention may further include a plurality of fixed fan blades. The plurality of fixed fan blades can be distributed at intervals along the circumferential direction of the first annular base 01. The plurality of fixed fan blades can be distributed in at least one circle, and the plurality of fixed fan blades distributed in at least one circle can be located inside or outside the plurality of movable fan blades 40. A second gap can be formed between two adjacent fixed fan blades. In this case, the second gap is a gap with a fixed width. In this case, by controlling the rotation of the movable fan blade 40 to adjust the width of the first gap, and further adjusting the degree of overlap between the first gap and the second gap, it is also possible to change the magnitude of the electric field coupled by the radio frequency coil into the process space, and it is still possible to achieve a stronger electric field coupled into the process space during the ignition stage and a weaker electric field coupled into the process space during the process stage.

[0081] Of course, compared with the embodiment in which the shielding device only includes the movable fan blades 40 distributed in multiple circles, the shielding device including the plurality of fixed fan blades has a slightly worse flexibility in coupling and adjusting the electric field. Of course, the shielding device disclosed in the embodiments of the present invention may not include fixed fan blades and only include the movable fan blades 40.

[0082] In the specific assembly process, the shielding device disclosed in the embodiments of the present invention may further include a second annular base, and the second annular base can provide a fixed installation basis for the fixed fan blades. In other embodiments, the plurality of fixed fan blades can be fixed on the first annular base 01, so as to share the first annular base 01 with the movable fan blades 40, and thus there is no need to specifically configure a second annular base for the fixed fan blades, which is beneficial to simplifying the structure of the shielding device.

[0083] Based on the shielding device disclosed in the embodiments of the present invention, the embodiments of the present invention further disclose a control method for a shielding device. The shielding device is applied to a process chamber, and the control method may include:

[0084] When the process chamber is in the ignition stage, control the rotation of the movable fan blades 40 to increase the width of the first gap between two adjacent movable fan blades 40. In this case, the increase in the width of the first gap is beneficial for the radio frequency coil to couple a larger electric field into the process space, thereby making the ignition more likely to succeed.

[0085] When the process chamber is in the process stage, control the rotation of the movable fan blades 40 to decrease the width of the first gap between two adjacent movable fan blades 40. In this case, the decrease in the width of the first gap enables the shielding device to better shield the electric field generated by the radio frequency coil.

[0086] Assume that the forward rotation of the movable fan blades 40 can increase the width of the first gap between two adjacent movable fan blades 40, then the reverse rotation of the movable fan blades 40 can decrease the width of the first gap between two adjacent movable fan blades 40. In the specific control process, the angle of the forward rotation of the movable fan blades 40 in the ignition stage and the angle of the reverse rotation of the movable fan blades 40 in the process stage can be equal or not equal. In the case where the drive motor 31 is a stepper motor, correspondingly, in the ignition stage, the number of steps for the stepper motor to drive the forward rotation of the movable fan blades 40 and the number of steps for driving the reverse rotation of the movable fan blades 40 in the process stage can be equal or not equal, which is not limited in the embodiments of the present invention.

[0087] In the case where the multiple movable fan blades 40 form a multi-loop distribution structure, among two adjacent loops of movable fan blades 40, the inner loop of movable fan blades 40 and the outer loop of movable fan blades 40 can rotate forward by the same angle in the ignition stage. In the process stage, the reverse rotation angle of the inner loop of movable fan blades 40 can be less than the reverse rotation angle of the outer loop of movable fan blades 40. The advantage of this control is that since the inner loop of movable fan blades 40 is more likely to deposit metal particles, if the inner loop of movable fan blades 40 rotates in reverse (the same as the forward rotation) by the same angle, it is likely to cause the first gap between the inner loop of movable fan blades 40 to be smaller than the first gap between the outer loop of movable fan blades 40, which will actually result in the mismatch of the widths of the first gap between the inner and the outer. If the inner loop of movable fan blades 40 rotates in reverse by a smaller angle, the deposited metal particles will compensate for the inner first gap, so that even if the inner loop of movable fan blades 40 rotates in reverse by a smaller angle, the width of the first gap formed by it can be consistent with the width of the first gap formed by the outer loop of movable fan blades 40 after reverse rotation.

[0088] In an alternative solution, when the process chamber is in the ignition stage, control the rotation of the movable fan blades 40 to make the first gap between two adjacent movable fan blades 40 the largest, so that the ignition can be more easily successful.

[0089] Based on the shielding device disclosed in the embodiments of the present invention, the embodiments of the present invention further disclose a process chamber. Please refer to Figure 7 , the disclosed process chamber includes a chamber body 50 and a shielding device 905 disposed within the chamber body 50. The shielding device 905 is electrically connected to the chamber body 50 in a grounded manner. The shielding device 905 is the shielding device 905 described in the above embodiments. The inner wall of the above-described process chamber is substantially the inner wall of the chamber body 50.

[0090] The process chamber disclosed in the embodiments of the present invention can be a pre-cleaning chamber or a thin film deposition chamber. The embodiments of the present invention do not limit the specific type of the process chamber.

[0091] In an embodiment where the first annular base 01 includes a first ring body 10 and a second ring body 20, further, at least one of the first ring body 10 and the second ring body 20 can be connected to the chamber body 50. Since the chamber body 50 is grounded, therefore, at least one of the first ring body 10 and the second ring body 20 being connected to the chamber body 50 can achieve the grounding of the shielding device 905, and ultimately enable it to exert a better shielding function.

[0092] Please refer to again Figure 7 , the chamber body 50 can include a chamber cover 51. In the case where the process chamber is a thin film deposition chamber, the chamber cover 51 is provided with an upper electrode structure, and the upper electrode structure can include a magnetron and a metal target. In the case where the process chamber is a pre-cleaning chamber, the chamber cover 51 is only a cover plate structure without a magnetron and a metal target. In the case where the first annular base 01 includes a first ring body 10 and a second ring body 20, the first ring body 10 or the second ring body 20 can be connected below the chamber cover 51. Specifically, the shielding device 905 can be fixed to a part of the chamber body 50 located below the chamber cover 51 by screws to achieve the grounded electrical connection of the shielding device 905 (note: the chamber body 50 is grounded). The radio frequency coil 91 can be disposed inside the chamber body 50 and disposed around the shielding device 905. The process chamber further includes a ceramic cylinder 92 disposed inside the chamber body 50. The ceramic cylinder 92 is disposed between the radio frequency coil 91 and the shielding device 905, and the ceramic cylinder 92 is distributed around the shielding device 905. The radio frequency power supply 93 is electrically connected to the radio frequency coil 91 through a first matcher 94, thereby delivering radio frequency energy to the radio frequency coil 91, and further enabling the radio frequency coil 91 to couple the radio frequency energy into the process space.

[0093] Specifically, the process chamber disclosed in the embodiments of the present invention may further include a wafer carrier 60 for carrying a wafer to perform corresponding semiconductor processes, such as a pre-cleaning process, a thin-film deposition process, etc. The wafer carrier 60 is disposed within the chamber body 50 and in the process space. A shielding device 905 is disposed around the wafer carrier 60. A support member 70 may be supported between the bottom end of the shielding device 905 adjacent to the wafer carrier 60 and the bottom wall of the chamber body 50. The support member 70 is electrically connected between the bottom end of the shielding device and the bottom wall of the chamber body 50. In this case, while at least one of the first ring body 10 and the second ring body 20 is grounded to the chamber body 50, the support member 70 further realizes the grounding electrical connection between the shielding device and the chamber body 50, and ultimately can achieve better grounding of the shielding device. Specifically, the support member 70 may be electrically connected to the first ring body 10 or the second ring body 20 close to the bottom wall of the chamber body 50.

[0094] Optionally, the support member 70 may be a metal support member, such as a copper column, or other types of metal columns. Since the metal support member has greater strength, using the metal support member as the support member 70 can not only perform the electrical connection function, but also perform a better support function, and thus can better ensure the stability of the installation of the shielding device 905.

[0095] In the embodiments of the present invention, the support member 70 may be one or multiple. When the support member 70 is multiple, all the support members 70 may be spaced apart to improve the balance and effect of the support. Of course, further, all the support members 70 may be evenly distributed in the circumferential direction of the first annular base 01.

[0096] In a further technical solution, the wafer carrier 60 may further include a cooling device 61. Optionally, the cooling device 61 may be a water cooling device. The cooling device 61 can adjust the temperature of the wafer carrier 60. Please refer to again Figure 7, the cooling device 61 is grounded and connected to the bottom wall of the chamber body 50 through a bellows 902. However, during the design process, the inventor found that due to the certain impedance of the bellows 902 itself, a certain radio frequency voltage will be coupled during high-power radio frequency input. And the gas path for delivering process gas into the process space is arranged below the chamber body 50 (i.e., the part close to the bottom wall of the chamber body 50). Therefore, there is a risk of breakdown at the bottom of the chamber body 50. Based on this, in a further technical solution, the cooling device 61 and the shielding device 905 or the cooling device 61 and the support member 70 can be electrically connected through an electrical connector 80, so that the cooling device 61 and the shielding device 905 are at the same potential, and further the risk of breakdown at the part of the chamber body 50 close to its bottom can be effectively avoided. The electrical connector 80 can be a metal strip, such as a copper strip. In this case, it can also avoid the potential difference between the shielding device 905 and the cooling device 61 from having an adverse effect on semiconductor processes (such as pre-cleaning processes, thin film deposition processes, etc.).

[0097] The electrical connector 80 can be one or at least two. When there are multiple electrical connectors 80, all the electrical connectors 80 can be spaced apart in the circumferential direction of the first annular base 01 to achieve multi-directional electrical connection and improve the electrical connection effect. Further, all the electrical connectors 80 can be evenly distributed in the circumferential direction of the first annular base 01.

[0098] Please refer to again Figure 6 , the process chamber disclosed in the embodiment of the present invention includes a bias power supply 95 and a second matcher 96. The bias power supply 95 inputs radio frequency energy into the wafer carrier 60 through the second matcher 96. The transmission of the radio frequency energy is realized by a coaxial cable 901. A radio frequency electrode is arranged below the wafer carrier 60, and the radio frequency electrode is responsible for evenly distributing the radio frequency energy input by the coaxial cable 901 on the wafer carrier 60 and then coupling it into the process space. The DC power supply 904 is responsible for applying a DC voltage to the wafer carrier 60 to provide an adsorption voltage to adsorb the wafer. In order to prevent the direct current from interfering with the radio frequency alternating current, a DC blocking capacitor 97 is provided at the input of the radio frequency energy, and the DC power supply 904 is electrically connected to the coaxial cable 901 through a filter 903.

[0099] A cold pump or a turbomolecular pump 98 can be provided at the bottom of the chamber body 50 to ensure the vacuum degree of the process space of the process chamber. Of course, in order to prevent the radio frequency signal from interfering with the cold pump or the turbomolecular pump 98, and at the same time prevent the temperature rise in the process chamber from interfering with the cold pump or the turbomolecular pump 98, a shielding plate 99 can be covered on the cold pump or the turbomolecular pump 98 to prevent the radio frequency signal input by the bias power supply 95 from interfering with the cold pump or the turbomolecular pump 98.

[0100] In the process stage, to ensure the process quality, there are certain requirements for the magnetic field coupled to the process space, so as to ensure the constraint on the movement of the plasma. Usually, the bias power supply 95 is regulated to ensure a sufficient magnetic field coupled into the process space. Considering the shielding device 905 disclosed in the embodiments of the present invention, since the shielding device disclosed in the embodiments of the present invention can adjust the width of the first gap, and thus can increase the width of the first gap in the process stage, making the magnetic field coupled to the process space by the RF coil 91 stronger. In this case, the RF energy generated by the RF coil 91 can be fully utilized, and thus conditions can be created for the regulation of the bias power supply 95 in effect, so that the voltage of the bias power supply 95 does not need to be too large. Of course, conversely, in the process stage, the magnitude of the magnetic field coupled to the process space by the bias power supply 95 can also be calculated according to the magnitude of the bias power supply 95, and then the width of the first gap formed between two adjacent movable vanes 40 in the shielding device 905 can be adjusted conversely according to the preset requirements, so that the width of the first gap does not need to be too large, thereby enabling the shielding device 905 to play a greater role in shielding the electric field. Of course, it should be noted that in the technical solution disclosed in the embodiments of the present invention, the bias power supply 95 is still required to couple energy (such as magnetic field, electric field) into the process space in the process stage, but the use of the bias power supply 95 to couple energy into the process space in the ignition stage is abandoned, so as to avoid the adverse drive of the bias power supply on charged ions in the ignition stage.

[0101] It should be noted that in this article, "a plurality of" means at least two.

[0102] Based on the process chamber disclosed in the embodiments of the present invention, the embodiments of the present invention further disclose a semiconductor process equipment. The disclosed semiconductor process equipment includes a controller and the process chamber described in the above embodiments. Among them, the controller includes a memory and a processor. The memory stores a computer program, and the processor executes the following steps according to the computer program:

[0103] When the process chamber is in the ignition stage, control the movable vane 40 to rotate to increase the width of the first gap formed between two adjacent movable vanes 40;

[0104] When the process chamber is in the process stage, control the movable vane 40 to rotate to decrease the width of the first gap formed between two adjacent movable vanes 40.

[0105] As described above, the process chamber disclosed in the embodiments of the present invention can be a pre-cleaning chamber or a thin film deposition chamber. During the process of some semiconductor process equipment, the pre-cleaning process occurs before the thin film deposition process. Based on this, in an alternative solution, the semiconductor process equipment disclosed in the embodiments of the present invention can include both a pre-cleaning chamber and a thin film deposition chamber that adopt the shielding device described in the above embodiments. Of course, the embodiments of the present invention do not limit the specific types of semiconductor process equipment.

[0106] In the above embodiments of the present invention, the differences between the various embodiments are mainly described. As long as the different technical features of the various embodiments are not contradictory, they can be combined to form more specific embodiments. For the sake of brevity, they will not be elaborated here.

[0107] The embodiments of the present invention have been described above with reference to the accompanying drawings. However, the present invention is not limited to the above specific embodiments. The above specific embodiments are merely illustrative and not restrictive. Under the inspiration of the present invention, those of ordinary skill in the art can also make many forms without departing from the spirit of the present invention and the scope protected by the claims, and all of them fall within the protection scope of the present invention.

Claims

1. A shielding device, characterized in that, it includes a first annular base (01) and a plurality of movable fan blades (40). The plurality of movable fan blades (40) are rotatably arranged on the first annular base (01) and are distributed along the circumferential direction of the first annular base (01). A first gap that can change in width as the movable fan blades (40) rotate can be formed between two adjacent movable fan blades (40).

2. The shielding device according to claim 1, characterized in that, the shielding device further includes a driving mechanism (30). The driving mechanism (30) includes a driving motor (31) and a transmission mechanism. The driving motor (31) is connected to the plurality of movable fan blades (40) through the transmission mechanism, and the driving motor (31) drives the plurality of movable fan blades (40) to rotate synchronously through the transmission mechanism.

3. The shielding device according to claim 2, characterized in that, the transmission mechanism includes a transmission belt (32) and a first engagement part (33). The movable fan blade (40) is rotatably connected to the first annular base (01) through a rotating shaft (41). At least one end of the rotating shaft (41) corresponding to each movable fan blade (40) is provided with the first engagement part (33). The transmission belt (32) is sleeved outside the plurality of movable fan blades (40) or lined inside the plurality of movable fan blades (40), and is engaged with the first engagement part (33) corresponding to each movable fan blade (40). The driving motor (31) drives at least one of the plurality of movable fan blades (40) to rotate and can drive the plurality of movable fan blades (40) to rotate synchronously through the transmission belt (32).

4. The shielding device according to claim 3, characterized in that, the transmission mechanism further includes a second engagement part. The second engagement part is arranged on the power output shaft of the driving motor (31) and is engaged with the first side of the first engagement part (33). The transmission belt (32) is engaged with the second side of the first engagement part (33), and the first side and the second side are opposite to each other.

5. The shielding device according to claim 3, characterized in that, both ends of the rotating shaft (41) corresponding to each movable fan blade (40) are fixed with the first engagement part (33). The transmission belt (32) is at least two. The transmission belt (32) at one end of the plurality of movable fan blades (40) is engaged with the first engagement part (33) at the same end of the plurality of movable fan blades (40), and the transmission belt (32) at the other end of the plurality of movable fan blades (40) is engaged with the first engagement part (33) at the same end of the plurality of movable fan blades (40).

6. The shielding device according to claim 2, characterized in that, the driving motors (31) are multiple, and the number of the driving motors (31) is less than the number of the movable fan blades (40).

7. The shielding device according to claim 6, characterized in that, Among the multiple driving motors (31), at least some of the driving motors (31) are respectively connected to a plurality of the movable fan blades (40) that are not adjacent to each other.

8. The shielding device according to claim 1, wherein, the movable fan blade (40) is an arc-shaped fan blade, and the outer surfaces of the movable fan blades (40) located in the same circle can be located on the same cylindrical surface.

9. The shielding device according to claim 1, wherein, during the preset rotation stroke of the multiple movable fan blades (40), two adjacent movable fan blades (40) continuously form the first gap.

10. The shielding device according to claim 1, wherein, a rotating shaft (41) is fixed to the movable fan blade (40), the end of the rotating shaft (41) is a conical tip, the first annular base (01) is provided with a conical hole adapted to the shape of the conical tip, and the conical tip is inserted and connected to the conical hole, and the two are in rotational cooperation.

11. The shielding device according to claim 2, wherein, the multiple movable fan blades (40) are distributed in at least two concentric circles, and the multiple movable fan blades (40) in each circle are individually driven by the corresponding driving mechanism (30).

12. The shielding device according to claim 11, wherein, among two adjacent circles of the movable fan blades (40), the multiple movable fan blades (40) located inside correspond to the multiple movable fan blades (40) located outside one by one, and their projections on the radial direction of the first annular base (01) completely coincide with each other.

13. The shielding device according to claim 11, wherein, there is one first annular base (01), and the ends of the movable fan blades (40) distributed in at least two circles are all rotatably connected to the first annular base (01).

14. The shielding device according to claim 11, wherein, there are multiple first annular bases (01), all the first annular bases (01) are concentrically distributed, and the ends of each circle of movable fan blades (40) are respectively rotatably connected to the corresponding first annular base (01).

15. The shielding device according to claim 14, wherein, the concentrically distributed first annular bases (01) are detachably connected.

16. The shielding device according to any one of claims 1 to 15, wherein, the first annular base (01) includes a first ring body (10), the first ring body (10) is located above the multiple movable fan blades (40), and the first ends of the multiple movable fan blades (40) are rotatably mounted on the first ring body (10); and / or, the first annular base (01) includes a second ring body (20), the second ring body (20) is located below the multiple movable fan blades (40), and the second ends of the multiple movable fan blades (40) are rotatably mounted on the second ring body (20).

17. The shielding device according to any one of claims 1 to 15, wherein, The shielding device further includes a plurality of fixed fan blades, which are spaced apart along the circumferential direction, and the plurality of fixed fan blades are distributed in at least one circle and are located inside or outside the plurality of movable fan blades (40), and a second gap is formed between two adjacent fixed fan blades.

18. A control method for a shielding device, the shielding device being the shielding device according to any one of claims 1 to 17, the shielding device being applied to a process chamber, the control method comprises: When the process chamber is in the ignition stage, controlling the rotation of the movable fan blades (40) so as to increase the width of the first gap formed between two adjacent movable fan blades (40); When the process chamber is in the process stage, controlling the rotation of the movable fan blades (40) so as to decrease the width of the first gap formed between two adjacent movable fan blades (40).

19. A process chamber, characterized in that it includes a chamber body (50) and a shielding device (905) disposed inside the chamber body (50), the shielding device (905) is electrically connected to the chamber body (50) in a grounded manner, and the shielding device (905) is the shielding device (905) according to any one of claims 1 to 17.

20. The process chamber according to claim 19, characterized in that the process chamber further includes a wafer carrier (60), the wafer carrier (60) is disposed inside the chamber body (50), the shielding device (905) is disposed around the wafer carrier (60), and a support member (70) is supported between the bottom end of the shielding device (905) adjacent to the wafer carrier (60) and the bottom wall of the chamber body (50), and the support member (70) electrically connects the shielding device (905) and the bottom wall of the chamber body (50).

21. The process chamber according to claim 20, characterized in that the wafer carrier (60) includes a cooling device (61), and the cooling device (61) is electrically connected to the shielding device (905) or between the cooling device (61) and the support member (70) through an electrical connector (80).

22. The process chamber according to any one of claims 19 to 21, characterized in that the process chamber is a pre-cleaning chamber or a thin film deposition chamber.

23. A semiconductor process equipment, characterized in that it includes a controller and the process chamber according to any one of claims 19 to 22, the controller includes a memory and a processor, the memory stores a computer program, and the processor executes the following steps according to the computer program: When the process chamber is in the ignition stage, controlling the rotation of the movable fan blades (40) so as to increase the width of the first gap formed between two adjacent movable fan blades (40); When the process chamber is in the process stage, controlling the rotation of the movable fan blades (40) so as to decrease the width of the first gap formed between two adjacent movable fan blades (40).

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