Exhaust adjusting device of plasma equipment and plasma equipment

By using the first and second air barriers of the exhaust gas adjustment device in the plasma equipment to adjust the air barrier area and spacing, the problem of difference in air flow velocity between the opposite side and the same side of the exhaust port is solved, and the uniform distribution of the air flow in the reaction chamber and the uniformity of wafer reaction are achieved.

CN120261250AActive Publication Date: 2025-07-04SHANGHAI BANGXIN SEMI TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510717339.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-30
Publication Date
2025-07-04
Estimated Expiration
2045-05-30

AI Technical Summary

Technical Problem

In plasma equipment, the difference in the airflow velocity between the opposite side and the same side of the exhaust port leads to uneven distribution of process gas and gas pressure in the reaction chamber, affecting the uniformity of the reactions in each area of ​​the wafer.

Method used

An exhaust gas adjustment device is adopted, including the first and second air barrier members, which are arranged on the opposite and the same side of the exhaust gas barrier member respectively, and the air flow velocity is balanced by adjusting the air barrier area and spacing.

Benefits of technology

The difference in airflow velocity between the opposite and the same side of the exhaust port is reduced, the consistency of airflow velocity in each area in the reaction chamber is ensured, and the uniformity of wafer reaction and etching quality are improved.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses an exhaust adjusting device of plasma equipment and the plasma equipment, and relates to the field of plasma equipment, and the plasma equipment comprises a reaction cavity, a bearing part which is located in the reaction cavity and is used for bearing a wafer, an exhaust port which is located at one side of the bearing part, and an exhaust part which sleeves the bearing part and is uniformly provided with a plurality of exhaust holes along the circumferential direction. The exhaust adjusting device comprises a first gas blocking piece and a second gas blocking piece. The first gas blocking piece is arranged on the gas outlet side of the gas exhaust piece in a return gas blocking mode and located on the different side of the bearing part from the gas exhaust opening. The second gas blocking piece is arranged on the gas outlet side of the gas exhaust piece in a return gas blocking mode and located on the same side of the bearing part with the gas exhaust opening. And a second gas blocking area formed by the second gas blocking piece for the exhaust gas flow is larger than a first gas blocking area formed by the first gas blocking piece for the exhaust gas flow, so that the gas flow speed on the same side and the gas flow speed on the different sides are balanced. The exhaust flow velocity difference between the different-side area and the same-side area of the exhaust port is reduced, and the flow velocity in the different-side space of the exhaust port and the flow velocity in the same-side space of the exhaust port are balanced.
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Description

Technical Field

[0001] The present disclosure relates to the technical field of plasma equipment, and particularly to an exhaust gas regulating device and a plasma equipment for a plasma equipment. Background Art

[0002] A carrying part for carrying a wafer is provided in a reaction chamber of a plasma equipment. After process gas enters the reaction chamber and reacts with the wafer, reaction by-products and process exhaust gas need to be discharged in time, so as to ensure that subsequent process gas can be evenly distributed in the reaction area, and to ensure the reaction uniformity between the subsequent process gas and the wafer and the stable progress of the reaction process. In related technologies, an exhaust port communicated with the reaction chamber is usually arranged on one side of the carrying part. As a result, the exhaust speed of the process exhaust gas in the space on the same side as the exhaust port is fast, and the exhaust speed of the process exhaust gas in the space on the opposite side of the exhaust port is slow, resulting in a large difference in the exhaust speed of each exhaust area, and further resulting in uneven distribution of the process gas and air pressure in the reaction chamber, affecting the reaction uniformity of each area of the wafer. Summary of the Invention

[0003] In view of the above-mentioned disadvantages of the prior art, the purpose of the present disclosure is to provide an exhaust gas regulating device and a plasma equipment for a plasma equipment, which helps to reduce the air flow speed difference between the areas on the opposite side and the same side of the exhaust port, and balance the air flow speed in the space on the opposite side of the exhaust port and the space on the same side of the exhaust port.

[0004] The present disclosure provides an exhaust gas regulating device for a plasma equipment. The plasma equipment includes a reaction chamber, a carrying part located in the reaction chamber for carrying a wafer, an exhaust port located on one side of the carrying part, and an exhaust member sleeved outside the carrying part and having a plurality of exhaust holes uniformly distributed in the circumferential direction; the exhaust gas regulating device includes: a first air blocking member, which is provided on the air outlet side of the exhaust member for blocking the return of gas, and is located on the opposite side of the carrying part from the exhaust port; and a second air blocking member, which is provided on the air outlet side of the exhaust member for blocking the return of gas, and is located on the same side of the carrying part as the exhaust port; and the second air blocking area formed by the second air blocking member for the discharged air flow is larger than the first air blocking area of the first air blocking member for the discharged air flow, so as to balance the air flow speed on the same side and the opposite side.

[0005] According to some embodiments of the present disclosure, the first air blocking member extends along the circumferential direction of the reaction chamber to form a minor arc shape; the second air blocking member extends along the circumferential direction of the reaction chamber to form a major arc shape, and the arc width is larger than that of the first air blocking member.

[0006] According to some embodiments of the present disclosure, the distance between the first air blocking member and the exhaust member and / or the first air blocking area of the first air blocking member are adjustable, so as to adjust the air flow speed on the opposite side;

[0007] The distance between the second air baffle and the exhaust member and / or the second air baffle area of the second air baffle are / is adjustable to adjust the air flow velocity on the same side.

[0008] According to some embodiments of the present disclosure, it further includes: a first flow velocity monitoring member, disposed in the reaction chamber and on the air outlet side of the exhaust member on the side opposite to the exhaust port, for monitoring the first air flow velocity on the opposite side; a second flow velocity monitoring member, disposed in the reaction chamber and on the air outlet side of the exhaust member on the same side as the exhaust port, for monitoring the second air flow velocity on the same side; and a control unit, connected to the first flow velocity monitoring member, the second flow velocity monitoring member, the first air baffle, and the second air baffle, for controlling the change in the air baffle area and / or the change in the distance from the exhaust member of at least one of the first air baffle and the second air baffle until the velocity difference is within the preset threshold according to the velocity difference between the second air flow velocity and the first air flow velocity being greater than the preset threshold.

[0009] According to some embodiments of the present disclosure, the first air baffle is movably disposed in the direction of approaching or departing from the exhaust member, for adjusting the distance from the exhaust member to adjust the air flow velocity on the opposite side;

[0010] The second air baffle is movably disposed in the direction of approaching or departing from the exhaust member, for adjusting the distance from the exhaust member to adjust the air flow velocity on the same side.

[0011] According to some embodiments of the present disclosure, the first air baffle is relatively swingably or expandably and contractibly disposed with respect to the exhaust member, for adjusting the first air baffle area to adjust the air flow velocity on the opposite side;

[0012] The second air baffle is relatively swingably or expandably and contractibly disposed with respect to the exhaust member, for adjusting the second air baffle area to adjust the air flow velocity on the same side.

[0013] According to some embodiments of the present disclosure, the first air baffle is relatively swingably and expandably and contractibly disposed with respect to the exhaust member, for doubly adjusting the first air baffle area to adjust the air flow velocity on the opposite side;

[0014] The second air baffle is relatively swingably and expandably and contractibly disposed with respect to the exhaust member, for doubly adjusting the second air baffle area to adjust the air flow velocity on the same side.

[0015] According to some embodiments of the present disclosure, the first air baffle and the second air baffle are expandably and contractibly disposed to adjust the first air baffle area and the second air baffle area;

[0016] Among them, the first air blocking member includes a first blocking member, a first unfolding member, and a first driving member. The first unfolding member is arranged relative to the first blocking member so as to be able to move relatively to unfold / fold up. The first driving member is used to drive the movement of the first unfolding member; the second air blocking member includes a second blocking member, a second unfolding member, and a second driving member. The second unfolding member is arranged relative to the second blocking member so as to be able to move relatively to unfold / fold up. The second driving member is used to drive the movement of the second unfolding member.

[0017] According to some embodiments of the present disclosure, the relative movement includes relative sliding or relative swinging.

[0018] The present disclosure also provides a plasma device, including: a device main body provided with a reaction chamber, a carrying part located in the reaction chamber for carrying a wafer, and an exhaust port located on one side of the carrying part; an exhaust member sleeved outside the carrying part and having a plurality of exhaust holes evenly distributed in the circumferential direction; and the exhaust adjustment device as described above.

[0019] Beneficial effects:

[0020] (1) The exhaust adjustment device and the plasma device of the present disclosure help to reduce the air flow velocity difference between the areas on the opposite side and the same side of the exhaust port, and balance the air flow velocities in the spaces on the opposite side and the same side of the exhaust port.

[0021] (2) In the exhaust adjustment device and the plasma device of the present disclosure, the distances between the first air blocking member and the second air blocking member and the exhaust member are adjustable, which is beneficial to respectively adjusting the air flow velocities in the spaces on the opposite side and the same side of the exhaust port.

[0022] (3) In the exhaust adjustment device and the plasma device of the present disclosure, the air blocking areas of the first air blocking member and the second air blocking member are adjustable, which is beneficial to respectively adjusting the air flow velocities in the spaces on the opposite side and the same side of the exhaust port.

[0023] (4) In the exhaust adjustment device and the plasma device of the present disclosure, the control unit can, according to the monitoring results of the first flow velocity monitoring member and the second flow velocity monitoring member on the air flow velocities in the spaces on the opposite side and the same side of the exhaust port, control at least one of the first air blocking member and the second air blocking member to change the air blocking area and / or the distance from the exhaust member, so as to adjust the air flow velocity difference between the spaces on the opposite side and the same side of the exhaust port, which is beneficial to ensuring the consistency of the air flow velocities in the spaces on the opposite side and the same side of the exhaust port. Description of the drawings

[0024] Figure 1 It is a layout schematic diagram of a plasma device according to an embodiment of the present disclosure.

[0025] Figure 2 It is a top view schematic diagram of the plasma device after being turned on according to an embodiment of the present disclosure.

[0026] Figure 3 It is a layout schematic diagram of the plasma device according to another embodiment of the present disclosure.

[0027] Figure 4 It is a structural schematic diagram of a first example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0028] Figure 5 It is a structural schematic diagram of a second example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0029] Figure 6 It is a top view schematic diagram of a second example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0030] Figure 7 It is a structural schematic diagram of a third example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0031] Figure 8 It is a top view schematic diagram of a third example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0032] Figure 9 It is a structural schematic diagram of a fourth example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0033] Figure 10 It is a structural schematic diagram of a fifth example of adjusting the gas blocking area of the first gas blocking member and the second gas blocking member according to the present disclosure.

[0034] Figure 11 It is a connection schematic diagram of the electronic components of the exhaust gas adjustment device according to an embodiment of the present disclosure.

[0035] Reference numerals:

[0036] 11. First gas blocking member; 111. First surface; 112. First blocking member; 113. First expanding and contracting member; 114. First driving member; 115. First carrier; 1151. First axis; 116. First adapter;

[0037] 12. Second gas blocking member; 121. Second surface; 122. Second blocking member; 123. Second expanding and contracting member; 124. Second driving member; 125. Second carrier; 1251. Second axis; 126. Second adapter;

[0038] 13. First belt moving member;

[0039] 14. Second belt moving member;

[0040] 15. First belt ornament

[0041] 16. Second belt ornament

[0042] 17. First flow rate monitoring component

[0043] 18. Second flow rate monitoring component

[0044] 19. Control unit

[0045] 900. Equipment main body; 91. Reaction chamber; 92. Carrying part; 93. Exhaust port; 94. Exhaust component; 941. Exhaust hole Detailed implementation mode

[0046] The following uses specific specific examples to illustrate the implementation modes of the present disclosure. Those skilled in the art can easily understand other advantages and effects of the present disclosure from the information disclosed in the present disclosure. The present disclosure can also be implemented or applied through different specific implementation modes. Various details in the present disclosure can also be modified or changed according to different viewpoints and application modes without departing from the spirit of the present disclosure. It should be noted that, without conflict, the embodiments and features in the embodiments of the present disclosure can be combined with each other

[0047] The following takes the attached drawings as a reference and details the embodiments of the present disclosure so that those skilled in the technical field to which the present disclosure belongs can easily implement it. The present disclosure can be embodied in many different forms and is not limited to the embodiments described herein

[0048] In the description of the present disclosure, the reference terms "one embodiment", "some embodiments", "example", "specific example", or "some examples", etc., mean that the specific features, structures, materials, or characteristics represented in connection with the embodiment or example are included in at least one embodiment or example of the present disclosure. Moreover, the specific features, structures, materials, or characteristics represented can be combined in any one or a group of embodiments or examples in a suitable manner. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples represented in the present disclosure and the features of different embodiments or examples

[0049] In addition, the terms "first" and "second" are only used for indicating purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined with "first" and "second" can explicitly or implicitly include at least one of the features. In the description of the present disclosure, the meaning of "a group" is two or more, unless otherwise specifically defined

[0050] To clearly illustrate the present disclosure, devices irrelevant to the description are omitted, and the same or similar constituent elements throughout the specification are given the same reference signs.

[0051] Throughout the specification, when it is said that a certain device is "connected" to another device, this includes not only the case of "direct connection", but also the case of "indirect connection" with other elements placed therebetween. In addition, when it is said that a certain device "includes" a certain constituent element, unless there is a particularly contrary record, it does not exclude other constituent elements, but means that other constituent elements may also be included.

[0052] Although in some examples the terms first, second, etc. are used herein to denote various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, the first interface and the second interface, etc. are indicated. Furthermore, as used herein, the singular forms "a", "an", and "the" are also intended to include the plural forms unless the context indicates otherwise. It should be further understood that the terms "comprising", "including" indicate the presence of the stated features, steps, operations, elements, modules, items, kinds, and / or groups, but do not exclude the presence, occurrence, or addition of one or a group of other features, steps, operations, elements, modules, items, kinds, and / or groups. The terms "or" and "and / or" used herein are interpreted as inclusive, or meaning any one or any combination. Thus, "A, B, or C" or "A, B, and / or C" means "any one of the following: A; B; C; A and B; A and C; B and C; A, B, and C". An exception to this definition only occurs when the combination of elements, functions, steps, or operations are mutually exclusive in some way.

[0053] The technical terms used herein are only for referring to specific embodiments and are not intended to limit the present disclosure. The singular form used herein also includes the plural form as long as the statement does not clearly indicate the contrary meaning. The meaning of "including" used in the specification is to embody specific characteristics, regions, integers, steps, operations, elements, and / or components, and does not exclude the existence or addition of other characteristics, regions, integers, steps, operations, elements, and / or components.

[0054] Although not defined differently, including the technical terms and scientific terms used herein, all terms have the same meaning as generally understood by those skilled in the technical field to which the present disclosure pertains. Terms defined in commonly used dictionaries are additionally interpreted to have a meaning consistent with the relevant technical literature and the currently presented information, and should not be over-interpreted as ideal or overly formulaic meanings as long as they are not defined.

[0055] Figure 1 It is a layout schematic diagram of a plasma device according to an embodiment of the present disclosure.Figure 1 The arrow in it indicates the flow direction of the gas entering the plasma device. Refer to Figure 1 , the plasma device of the present disclosure embodiment includes a reaction chamber 91, a carrier portion 92 located in the reaction chamber 91 for carrying a wafer, an exhaust port 93 located on one side of the carrier portion 92, and an exhaust member 94 sleeved outside the carrier portion 92 and having a plurality of exhaust holes 941 circumferentially distributed. Thus, after the process gas in the reaction chamber 91 reacts, it will flow from the exhaust holes 941 on the exhaust member 94 to the exhaust port 93 and be discharged from the exhaust port 93. In this embodiment, the exhaust port 93 can be connected to a pumping device, for example, the exhaust port 93 is connected to a vacuum pump, so as to discharge the gas under the pumping of the pumping device. Of course, the pumping device may not be provided at the exhaust port 93 of the present disclosure.

[0056] Optionally, the exhaust member 94 can be in a flat plate shape, and the plurality of exhaust holes 941 on the exhaust member 94 can be arranged at intervals along the circumferential direction of the reaction chamber 91 to form a circle of exhaust holes 941 around the outside of the carrier portion 92, and the exhaust member 94 can be provided with multiple circles of exhaust holes 941 arranged at intervals along the radial direction of the reaction chamber 91. Thus, the exhaust member 94 can exhaust more evenly. Of course, it can be understood that the exhaust member 94 of the present disclosure embodiment includes but is not limited to this and can be adjusted adaptively.

[0057] Refer to Figure 1 , the exhaust adjustment device of the present disclosure embodiment includes a first gas blocking member 11 and a second gas blocking member 12.

[0058] Among them, the first gas blocking member 11 is provided on the outlet side of the exhaust member 94 for returning the blocked gas, and the first gas blocking member 11 and the exhaust port 93 are located on different sides of the carrier portion 92. In this embodiment, the first gas blocking member 11 can be located on different sides of the carrier portion 92 from the exhaust port 93. For example, the first gas blocking member 11 and the exhaust port 93 are respectively located on adjacent two side portions or spaced two side portions of the carrier portion 92, or the first gas blocking member 11 can also be located on opposite sides of the carrier portion 92 from the exhaust port 93.

[0059] The second air-blocking member 12 is arranged on the air outlet side of the exhaust member 94 for supplying return air, and the second air-blocking member 12 and the exhaust port 93 are on the same side of the bearing portion 92. And the second air-blocking area formed by the second air-blocking member 12 for the discharged air flow is larger than the first air-blocking area of the first air-blocking member 11 for the discharged air flow. It should be noted that the first air-blocking area may be the orthographic projection area formed by the projection of the first air-blocking member 11 on the vertical plane of the discharged air flow streamline on its side. For example, when the discharged air flow streamline extends in the up-down direction / axial direction, the first air-blocking area can be understood as the orthographic projection area formed by the projection of the first air-blocking member 11 on the horizontal plane / radial plane on its side. Correspondingly, the second air-blocking area may be the orthographic projection area formed by the second air-blocking member 12 on the vertical plane of the discharged air flow streamline on its side. For example, when the discharged air flow streamline extends in the up-down direction / axial direction, the second air-blocking area can be the orthographic projection area formed by the second air-blocking member 12 on the horizontal plane / radial plane on its side.

[0060] In this embodiment, the first air-blocking member 11 and the second air-blocking member 12 may be arranged parallel to the exhaust member 94, and the area of the second surface 121 of the second air-blocking member 12 facing the exhaust member 94 is larger than the area of the first surface 111 of the first air-blocking member 11 facing the exhaust member 94. Thus, the second air-blocking area can be larger than the first air-blocking area. Or, the first air-blocking member 11 and the second air-blocking member 12 may also be arranged obliquely to the exhaust member 94, the area of the second surface 121 of the second air-blocking member 12 facing the exhaust member 94 is larger than or equal to the area of the first surface 111 of the first air-blocking member 11 facing the exhaust member 94, and the second inclination angle of the second air-blocking member 12 relative to the exhaust member 94 is smaller than the first inclination angle of the first air-blocking member 11 relative to the exhaust member 94. Thus, the second air-blocking area can also be larger than the first air-blocking area.

[0061] Figure 2 It is a top view schematic diagram after the plasma device of the embodiment of the present disclosure is opened. Refer to Figure 1 and Figure 2 , both the first air-blocking member 11 and the second air-blocking member 12 extend along the circumferential direction of the reaction chamber 91 to form arc-shaped members. Thus, along the circumferential direction of the exhaust member 94, the first air-blocking member 11 and the second air-blocking member 12 can uniformly block the gas discharged from the plurality of exhaust holes 941.

[0062] Optionally, the first air baffle 11 extends along the circumferential direction of the reaction chamber 91 to form a minor arc shape. The second air baffle 12 extends along the circumferential direction of the reaction chamber 91 to form a major arc shape, and the arc width is greater than that of the first air baffle 11. Thus, since both the arc length and the arc width of the second air baffle 12 are greater than those of the first air baffle 11, the difference in the air blocking area between the second air baffle 12 and the first air baffle 11 is greater, and the difference in the degree of gas obstruction is greater, which can further reduce the air flow velocity difference between the same side and the opposite side, making the air flow velocity on the same side closer to the air flow velocity on the opposite side.

[0063] Optionally, one or more first supporting members 115, such as one or more first supporting columns, are provided below the first air baffle 11 for stably supporting the first air baffle 11. One or more second supporting members 125, such as a plurality of second supporting columns, are provided below the second air baffle 12 for stably supporting the second air baffle 12.

[0064] In the above embodiment, since the air blocking area formed by the first air baffle 11 in the space on the opposite side of the exhaust port 93 is small, the flow area for the exhaust air flow formed between the area where the first air baffle 11 is located, between the first air baffle 11 and the chamber wall of the reaction chamber 91, and between the first air baffle 11 and the peripheral wall of the supporting portion 92 is large, and the degree of blocking of the exhaust air flow is small, so that the reduction degree of the air flow velocity in the space on the opposite side of the exhaust port 93 is small. The air blocking area formed by the second air baffle 12 in the space on the same side of the exhaust port 93 is large, so that the flow area for the exhaust air flow formed between the area where the second air baffle 12 is located, between the second air baffle 12 and the chamber wall of the reaction chamber 91, and between the second air baffle 12 and the peripheral wall of the supporting portion 92 is small, and the degree of blocking of the exhaust air flow is large, so that the reduction degree of the air flow velocity in the space on the same side of the exhaust port 93 is large. Therefore, the above setting of the present disclosure can reduce the velocity difference between the relatively fast air flow velocity in the same side space and the relatively slow air flow velocity in the opposite side space, and balance the air flow velocities on the same side and the opposite side.

[0065] Optionally, the distance between the first air baffle 11 and the exhaust member 94 and / or the first air blocking area of the first air baffle 11 are / is adjustable to adjust the air flow velocity on the opposite side. The distance between the second air baffle 12 and the exhaust member 94 and / or the second air blocking area of the second air baffle 12 are / is adjustable to adjust the air flow velocity on the same side. Thus, the present disclosure can further adjust the air flow velocities on the opposite side and the same side, which is beneficial to ensuring that the air flow velocities on the opposite side and the same side tend to be the same / close after adjustment.

[0066] Figure 3It is a schematic diagram of the arrangement of a plasma device according to another embodiment of the present disclosure. The distance between the first air baffle 11 and the exhaust member 94 is adjustable to adjust the air flow velocity on the opposite side. Specifically, when the first air baffle 11 approaches the exhaust member 94 so that the distance is reduced, the gas flow velocity decreases, and when it moves away from the exhaust member 94 so that the distance is increased, the gas flow velocity increases. The distance between the second air baffle 12 and the exhaust member 94 and the exhaust port 93 is adjustable to adjust the air flow velocity on the same side. Specifically, when the second air baffle 12 approaches the exhaust member 94, the gas flow velocity decreases, and when it moves away, the flow velocity increases. When it is at a position between the exhaust port 93 and the exhaust member 94, the gas flow velocity reaches the maximum. Thereafter, the closer the second air baffle 12 is to the exhaust port 93, the more the gas flow velocity will decrease. Thus, a change in the distance between the first air baffle 11 or the second air baffle 12 and the exhaust member 94 will cause a change in the air flow velocity on the opposite side or the same side, and further enable the present disclosure to adjust the air flow velocities on the opposite side and the same side by adjusting the distance between the first air baffle 11 and the exhaust member 94 and the distance between the second air baffle 12 and the exhaust member 94, which is beneficial to ensuring that the air flow velocities on the opposite side and the same side tend to be consistent / close.

[0067] Optionally, the first air baffle 11 is movably arranged in the direction of approaching and departing from the exhaust member 94. Thus, when the first air baffle 11 moves closer to the exhaust member 94, the distance between the first air baffle 11 and the exhaust member 94 is reduced, and when the first air baffle 11 moves away from the exhaust member 94, the distance between the first air baffle 11 and the exhaust member 94 becomes larger, so that the distance between the first air baffle 11 and the exhaust member 94 is adjusted. The second air baffle 12 is movably arranged in the direction of approaching and departing from the exhaust member 94. Thus, when the second air baffle 12 moves closer to the exhaust member 94, the distance between the second air baffle 12 and the exhaust member 94 is reduced, and when the second air baffle 12 moves away from the exhaust member 94, the distance between the second air baffle 12 and the exhaust member 94 becomes larger, so that the distance between the second air baffle 12 and the exhaust member 94 is adjusted.

[0068] Optionally, the exhaust adjustment device further includes a first belt moving member 13 and a second belt moving member 14. The first belt moving member 13 is connected to the first air baffle 11 and is used to drive the first air baffle 11 to move in the direction of approaching and departing from the exhaust member 94. The second belt moving member 14 is connected to the second air baffle 12 and is used to drive the second air baffle 12 to move in the direction of approaching and departing from the exhaust member 94.

[0069] Specifically, the first air baffle 11 and the second air baffle 12 are correspondingly and fixedly arranged on the first carrier 115 and the second carrier 125. The first moving member 13 (such as a cylinder or an electric cylinder) is connected to the first carrier 115 and is used to drive the first carrier 115 to drive the first air baffle 11 to move. The second moving member 14 (such as a cylinder or an electric cylinder) is connected to the second carrier 125 and is used to drive the second carrier 125 to drive the second air baffle 12 to move.

[0070] Optionally, the first air baffle area of the first air baffle 11 is adjustable to adjust the air flow velocity on the opposite side. Specifically, when the first air baffle area increases, the air flow velocity on the opposite side decreases; when the first air baffle area decreases, the air flow velocity on the opposite side increases. The second air baffle area of the second air baffle 12 is adjustable to adjust the air flow velocity on the same side. Specifically, when the second air baffle area increases, the air flow velocity on the same side decreases; when the second air baffle area decreases, the air flow velocity on the same side increases. Thus, the present disclosure can adjust the air flow velocities on the opposite side and the same side by adjusting the air baffle areas of the first air baffle 11 and the second air baffle 12, which is also beneficial to ensuring that the air flow velocities on the opposite side and the same side tend to be consistent.

[0071] Optionally, the first air baffle 11 is arranged to be relatively swingable or deployable with respect to the exhaust member 94 to adjust the first air baffle area. The second air baffle 12 is arranged to be relatively swingable or deployable with respect to the exhaust member 94 to adjust the second air baffle area.

[0072] Figure 4 is a schematic structural diagram of the first example of adjusting the air baffle areas of the first air baffle 11 and the second air baffle 12 of the present disclosure. Refer to Figure 4, the first air baffle 11 is disposed on the exhaust member 94 so as to be swingable relative thereto to adjust the first air baffle area. The second air baffle 12 is disposed on the exhaust member 94 so as to be swingable relative thereto to adjust the second air baffle area. Thus, when the first air baffle 11 and the second air baffle 12 swing relative to the exhaust member 94, the inclination angle between the first air baffle 11 or the second air baffle 12 and the exhaust member 94 will change. And when the first air baffle 11 or the second air baffle 12 swings in a direction parallel to the exhaust member 94, so that the angle between the first air baffle 11 and the second air baffle 12 and the exhaust member 94 becomes smaller, the first air baffle area and the second air baffle area correspondingly become larger. When the first air baffle 11 and the second air baffle 12 swing in a direction perpendicular to the exhaust member 94, so that the angle between the first air baffle 11 and the second air baffle 12 and the exhaust member 94 becomes larger, the first air baffle area and the second air baffle area correspondingly become smaller. Thus, the present disclosure can adjust the inclination angle between the first air baffle 11 and the exhaust member 94 and between the second air baffle 12 and the exhaust member 94 by swinging, and further realize the adjustment of the first air baffle area and the second air baffle area.

[0073] Optionally, the exhaust adjustment device further includes a first belt swing member 15 and a second belt swing member 16. The first air baffle 11 is swingably disposed on the first carrier 115 about a first axis 1151, and the first belt swing member 15 is used to drive the first air baffle 11 to swing. The second air baffle 12 is swingably disposed on the second carrier 125 about a second axis 1251, and the second belt swing member 16 is used to drive the second air baffle 12 to swing. Specifically, the first belt swing member 15 may be an inclined cylinder or an electric cylinder, and is respectively rotatably connected to the first air baffle 11 and the first carrier 115, and is used to drive the first air baffle 11 to perform a swinging operation when telescoping. The second belt swing member 16 may be an inclined cylinder or an electric cylinder, and is respectively rotatably connected to the second air baffle 12 and the second carrier 125, and is used to drive the second air baffle 12 to perform a swinging operation when telescoping.

[0074] Figure 5 is a schematic structural view of a second example of adjusting the air baffle area by the first air baffle 11 and the second air baffle 12 of the present disclosure. Figure 6 is a top view schematic diagram of a second example of adjusting the air baffle area by the first air baffle 11 and the second air baffle 12 of the present disclosure. Refer to Figure 5 and Figure 6, the first air baffle 11 is retractably arranged to adjust the first air baffle area. The second air baffle 12 is retractably arranged to adjust the second air baffle area. Thus, when the first air baffle 11 and the second air baffle 12 are in the retracted state, the first air baffle area and the second air baffle area are correspondingly reduced. When the first air baffle 11 and the second air baffle 12 are in the deployed state, the first air baffle area and the second air baffle area are correspondingly increased. Therefore, the present disclosure can adjust the first air baffle area and the second air baffle area by retracting and deploying the first air baffle 11 and the second air baffle 12.

[0075] Optionally, the first air baffle 11 and the second air baffle 12 are arranged to be slidably retractable or swingably retractable.

[0076] For example, referring to Figure 5 and Figure 6 , the first air baffle 11 includes a first blocking member 112, a first retractable member 113, and a first driving member 114. The first retractable member 113 is slidably deployable / retractable with respect to the first blocking member 112, and the first driving member 114 is used to drive the first retractable member 113 to slide so that the first retractable member 113 is deployed with respect to the first blocking member 112 / retracted with respect to the first blocking member 112. The second air baffle 12 includes a second blocking member 122, a second retractable member 123, and a second driving member 124. The second retractable member 123 is slidably deployable / retractable with respect to the second blocking member 122, and the second driving member 124 is used to drive the second retractable member 123 to slide so that the second retractable member 123 is deployed with respect to the second blocking member 122 / retracted with respect to the second blocking member 122. Specifically, the first driving member 114 and the second driving member 124 can be two horizontally arranged cylinders, which are used to drive the first retractable member 113 and the second retractable member 123 to slide horizontally respectively. Thus, the first air baffle 11 and the second air baffle 12 can be slid to achieve retraction and deployment.

[0077] Figure 7 is a schematic structural diagram of a third example of the first air baffle 11 and the second air baffle 12 of the present disclosure for adjusting the air baffle area. Figure 8 is a top view schematic diagram of a third example of the first air baffle 11 and the second air baffle 12 of the present disclosure for adjusting the air baffle area. Referring to Figure 7 and Figure 8, the first air baffle 11 includes a first blocking member 112, a first expanding and retracting member 113, and a first driving member 114. The first expanding and retracting member 113 is swingably disposed relative to the first blocking member 112 for expansion / retraction, and the first driving member 114 is configured to drive the first expanding and retracting member 113 to swing, so that the first expanding and retracting member 113 expands relative to the first blocking member 112 / retracts relative to the first blocking member 112. The second air baffle 12 includes a second blocking member 122, a second expanding and retracting member 123, and a second driving member 124. The second expanding and retracting member 123 is swingably disposed relative to the second blocking member 122 for expansion / retraction, and the second driving member 124 is configured to drive the second expanding and retracting member 123 to swing, so that the second expanding and retracting member 123 expands relative to the second blocking member 122 / retracts relative to the second blocking member 122. Specifically, the first expanding and retracting member 113 and the first blocking member 112 may be relatively swingably connected through a first adapter 116 (a first hinge), and the second expanding and retracting member 123 and the second blocking member 122 may be relatively swingably connected through a second adapter 126 (a second hinge). The first driving member 114 and the second driving member 124 may be two inclined cylinders configured to drive the first expanding and retracting member 113 and the second expanding and retracting member 123 to swing respectively. Thus, the first air baffle 11 and the second air baffle 12 can swing to achieve retraction and expansion.

[0078] Optionally, the first air baffle 11 is relatively swingable and expandable / retractable relative to the exhaust member 94 for doubly adjusting the first air blocking area. The second air baffle 12 is relatively swingable and expandable / retractable relative to the exhaust member 94 for doubly adjusting the second air blocking area. Thus, when adjusting the first air blocking area and the second air blocking area, the swing adjustment method, the expansion / retraction adjustment method, or the swing adjustment plus expansion / retraction adjustment method can be flexibly selected according to the actual situation to adjust the first air blocking area and the second air blocking area. The adjustment method is flexible, which is conducive to fully adjusting the first air blocking area and the second air blocking area, and further fully ensuring that the air flow velocities on the same side and the opposite side tend to be consistent.

[0079] Figure 9 is a schematic structural view of a fourth example of adjusting the air blocking area of the first air baffle 11 and the second air baffle 12 according to the present disclosure. Refer to Figure 9, when the first expanding and retracting member 113 is slidably arranged relative to the first blocking member 112 and the second expanding and retracting member 123 is slidably arranged relative to the second blocking member 122, the first blocking member 112 is swingably arranged on the first carrier 115 around the first axis 1151 and is configured to drive the first expanding and retracting member 113 to swing synchronously, so that the first air blocking member 11 as a whole can swing relatively. The second blocking member 122 is swingably arranged on the second carrier 125 around the second axis 1251 and is configured to drive the second expanding and retracting member 123 to swing synchronously, so that the second air blocking member 12 as a whole can swing relatively. In this case, the present disclosure can adjust the first air blocking area and the second air blocking area in a double-overlay manner. For example, when the first air blocking member 11 or the second air blocking member 12 swings in a direction perpendicular to the exhaust member 94, so that the angle between the first air blocking member 11 or the second air blocking member 12 and the exhaust member 94 becomes larger, and then the first air blocking member 11 or the second air blocking member 12 retracts itself to further reduce the first air blocking area or the second air blocking area. Or when the first air blocking member 11 or the second air blocking member 12 swings in a direction parallel to the exhaust member 94, so that the angle between the first air blocking member 11 or the second air blocking member 12 and the exhaust member 94 becomes smaller, and then the first air blocking member 11 or the second air blocking member 12 expands itself to further increase the first air blocking area or the second air blocking area. Thus, the present disclosure has a large adjustment range for the first air blocking area and the second air blocking area, can fully adjust the first air blocking area and the second air blocking area, and fully ensures that the air flow velocities on the same side and the opposite side tend to be consistent.

[0080] Figure 10 is a schematic structural view of the fifth example of the first air blocking member 11 and the second air blocking member 12 of the present disclosure for adjusting the air blocking area. Refer to Figure 10When the first expansion and contraction member 113 is swingably arranged relative to the first blocking member 112, and the second expansion and contraction member 123 is swingably arranged relative to the second blocking member 122, the first blocking member 112 is swingably arranged on the first carrier 115 about a first axis 1151 and is configured to drive the first expansion and contraction member 113 to swing synchronously, so that the entire first air blocking member 11 can swing relatively. The first driving member 114 is configured to expand and contract correspondingly when the first blocking member 112 and the first expansion and contraction member 113 swing synchronously, so that when the entire first air blocking member 11 swings, the relative positions between the first blocking member 112 and the first expansion and contraction member 113 remain unchanged. The second blocking member 122 is swingably arranged on the second carrier 125 about a second axis 1251 and is configured to drive the second expansion and contraction member 123 to swing synchronously, so that the entire second air blocking member 12 can swing relatively. The second driving member 124 is configured to expand and contract correspondingly when the second blocking member 122 and the second expansion and contraction member 123 swing synchronously, so that when the entire second air blocking member 12 swings, the relative positions between the second blocking member 122 and the second expansion and contraction member 123 remain unchanged.

[0081] Figure 11 is a schematic connection diagram of electronic components of the exhaust gas regulating device according to an embodiment of the present disclosure. Refer to Figure 3 and Figure 11 The exhaust gas regulating device further includes a first flow rate monitoring member 17, a second flow rate monitoring member 18, and a control unit 19. The first flow rate monitoring member 17 is disposed in the reaction chamber 91 and is disposed on the gas outlet side of the exhaust member 94 on the side opposite to the exhaust port 93, and is configured to monitor the first air flow rate on the opposite side to determine the exhaust speed on the opposite side. The second flow rate monitoring member 18 is disposed in the reaction chamber 91 and is disposed on the gas outlet side of the exhaust member 94 on the same side as the exhaust port 93, and is configured to monitor the second air flow rate on the same side to determine the exhaust speed on the same side. The control unit 19 is connected to the first flow rate monitoring member 17, the second flow rate monitoring member 18, the first air blocking member 11, and the second air blocking member 12, and is configured to control the change in the air blocking area of at least one of the first air blocking member 11 and the second air blocking member 12 and / or the change in the distance between the first air blocking member 11 and the second air blocking member 12 and the exhaust member 94 according to the speed difference between the second air flow rate and the first air flow rate being greater than a preset threshold until the speed difference is within the preset threshold, which is beneficial to ensuring the consistency of the air flow rates on the same side and the opposite side.

[0082] For example, when the second air flow velocity is greater than the first air flow velocity and the velocity difference is greater than a preset threshold, the control unit 19 controls the reduction of the first air blocking area of the first air blocking member 11 and / or controls the increase of the second air blocking area of the second air blocking member 12, so that the second air flow velocity can be correspondingly reduced and the first air flow velocity can be correspondingly increased, thereby further reducing the air flow velocity difference between the same side and the opposite side until the velocity difference between the first air flow velocity and the second air flow velocity is reduced within the preset threshold, and thus fully ensuring the consistency of the air flow velocities on the same side and the opposite side.

[0083] Specifically, the first flow velocity monitoring member 17 and the second flow velocity monitoring member 18 may be a first air flow sensor and a second air flow sensor respectively, to monitor the air flow velocities on the opposite side and the same side respectively. When the first air blocking member 11 and the second air blocking member 12 are swingably arranged relative to the exhaust member 94, the control unit 19 is respectively connected to the first belt swinging member 15 and the second belt swinging member 16, and is used to control the change of the swinging angle of driving the first air blocking member 11 and the second air blocking member 12 to swing by controlling the first belt swinging member 15 and the second belt swinging member 16, so as to control the change of the inclination angle of the first air blocking member 11 and the second air blocking member 12, and further control the change of the air blocking area of the first air blocking member 11 and the second air blocking member 12. When the first air blocking member 11 and the second air blocking member 12 are arranged to be collapsible and expandable, the control unit 19 is respectively connected to the first driving member 114 and the second driving member 124, and is used to control the change of the swinging angle of driving the first air blocking member 11 and the second air blocking member 12 to swing or the change of the sliding stroke of sliding by controlling the first driving member 114 and the second driving member 124, so as to control the change of the expansion degree of the first air blocking member 11 and the second air blocking member 12, and further control the change of the air blocking area of the first air blocking member 11 and the second air blocking member 12. At the same time, the control unit 19 is also respectively connected to the first belt moving member 13 and the second belt moving member 14, and is used to control the change of the moving stroke of driving the first air blocking member 11 and the second air blocking member 12 to move by controlling the first belt moving member 13 and the second belt moving member 14, and further control the change of the distance between the first belt moving member 13 and the second belt moving member 14 and the exhaust member 94.

[0084] Refer to Figure 1, the present disclosure also provides a plasma device, which includes a device main body 900, an exhaust member 94, and an exhaust adjustment device as described in the above embodiments. Among them, the device main body 900 is provided with a reaction chamber 91, a carrying portion 92 located in the reaction chamber 91 for carrying a wafer, and an exhaust port 93 located on one side of the carrying portion 92. The exhaust member 94 is sleeved outside the carrying portion 92 and is circumferentially provided with a plurality of exhaust holes 941. The plasma device of the present disclosure can balance the air flow velocities in the spaces on the opposite side and the same side of the exhaust port 93 in the reaction chamber 91, reduce the air flow velocity difference between the opposite side and the same side, balance the air flow velocities on the opposite side and the same side, and further ensure that the reaction gases after reaction in each reaction area of the reaction chamber 91 can be uniformly discharged, thereby ensuring the reaction uniformity on the wafer in the reaction chamber 91. For example, taking the process occurring in the reaction chamber 91 as an etching process, the above setting is beneficial to ensuring the etching uniformity on the surface of the wafer and the etching quality of the wafer.

[0085] The above embodiments are only illustrative of the principles and effects of the present disclosure and are not intended to limit the present disclosure. Any person familiar with this technology can modify or change the above embodiments without departing from the spirit and scope of the present disclosure. Therefore, all equivalent modifications or changes made by those with ordinary knowledge in the technical field without departing from the spirit and technical idea disclosed by the present disclosure should still be covered by the protection scope of the present disclosure.

Claims

1. An exhaust gas regulating device for a plasma device, characterized in that, The plasma device includes a reaction chamber, a carrier part located in the reaction chamber for carrying a wafer, an exhaust port located on one side of the carrier part, and an exhaust member sleeved outside the carrier part and having a plurality of exhaust holes evenly distributed in the circumferential direction; The exhaust gas regulating device includes: A first air baffle member provided on the air outlet side of the exhaust member for blocking the return gas, and located on the side of the carrier part opposite to the exhaust port; And A second air baffle member provided on the air outlet side of the exhaust member for blocking the return gas, and located on the same side of the carrier part as the exhaust port; and the second air baffle area formed by the second air baffle member for the discharged air flow is larger than the first air baffle area of the first air baffle member for the discharged air flow, so as to balance the air flow velocities on the same side and the opposite side.

2. The exhaust gas regulating device according to claim 1, wherein The first air baffle member extends along the circumferential direction of the reaction chamber to form a minor arc shape; The second air baffle member extends along the circumferential direction of the reaction chamber to form a major arc shape, and the arc width is larger than that of the first air baffle member.

3. The exhaust gas regulating device according to claim 1, characterized in that, The distance between the first air baffle member and the exhaust member and / or the first air baffle area of the first air baffle member are adjustable to adjust the air flow velocity on the opposite side; The distance between the second air baffle member and the exhaust member and / or the second air baffle area of the second air baffle member are adjustable to adjust the air flow velocity on the same side.

4. The exhaust gas regulating device according to claim 3, characterized in that It further includes: A first flow velocity monitoring member provided in the reaction chamber and located on the air outlet side of the exhaust member on the side opposite to the exhaust port, for monitoring the first air flow velocity on the opposite side; A second flow velocity monitoring member provided in the reaction chamber and located on the air outlet side of the exhaust member on the same side as the exhaust port, for monitoring the second air flow velocity on the same side; And A control unit connected to the first flow velocity monitoring member, the second flow velocity monitoring member, the first air baffle member and the second air baffle member, and used for controlling the change of the air baffle area and / or the change of the distance between at least one of the first air baffle member and the second air baffle member and the exhaust member according to the velocity difference between the second air flow velocity and the first air flow velocity being greater than a preset threshold until the velocity difference is within the preset threshold.

5. The exhaust gas regulating device according to claim 1, characterized in that, The first air baffle member is movably arranged in the direction of approaching or departing from the exhaust member, for adjusting the distance between the first air baffle member and the exhaust member to adjust the air flow velocity on the opposite side; The second air baffle member is movably arranged in the direction of approaching or departing from the exhaust member, for adjusting the distance between the second air baffle member and the exhaust member to adjust the air flow velocity on the same side.

6. The exhaust gas regulating device according to claim 1, wherein The first air baffle member is relatively swingably arranged or expandable and contractible with respect to the exhaust member, for adjusting the first air baffle area to adjust the air flow velocity on the opposite side; The second air baffle member is relatively swingably arranged or expandable and contractible with respect to the exhaust member, for adjusting the second air baffle area to adjust the air flow velocity on the same side.

7. The exhaust gas regulating device according to claim 1, characterized in that The first air baffle member is relatively swingable and expandable and contractible with respect to the exhaust member, for doubly adjusting the first air baffle area to adjust the air flow velocity on the opposite side; The second air baffle member is relatively swingable and expandable and contractible with respect to the exhaust member, for doubly adjusting the second air baffle area to adjust the air flow velocity on the same side.

8. The exhaust gas regulating device according to claim 1, characterized in that, The first air baffle and the second air baffle are telescopically arranged to adjust the first air baffle area and the second air baffle area; Wherein, the first air baffle includes a first blocking member, a first unfolding member and a first driving member, the first unfolding member is arranged to be relatively movable to unfold / fold up with respect to the first blocking member, and the first driving member is used to drive the first unfolding member to move; the second air baffle includes a second blocking member, a second unfolding member and a second driving member, the second unfolding member is arranged to be relatively movable to unfold / fold up with respect to the second blocking member, and the second driving member is used to drive the second unfolding member to move.

9. The exhaust gas regulating device according to claim 8, characterized in that, The relative movement includes relative sliding or relative swinging.

10. A plasma device, characterized in that, Comprising: A device main body, provided with a reaction chamber, a carrying part located in the reaction chamber for carrying a wafer, and an exhaust port located on one side of the carrying part; An exhaust member, sleeved outside the carrying part and circumferentially provided with a plurality of exhaust holes; and The exhaust adjustment device according to any one of claims 1 to 9.

Citation Information

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