Coil assembly, plasma generating device and coating equipment

Abstract

The invention relates to the technical field of semiconductor coating, and discloses a coil assembly, a plasma generating device and coating equipment. Wherein the coil assembly comprises two or more coil units which are connected in parallel and is used for providing an excitation magnetic field under the driving of a radio frequency power supply so as to ionize gas to be treated into plasma, and each coil unit is formed by connecting at least two radio frequency coils in series. By means of the design and the connection mode of the coil, the size of the coil assembly can be increased by increasing the number of the coil units or the number of the radio frequency coils under the condition that the impedance is kept consistent, and therefore the coil assembly is suitable for a large-size plasma generation device.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor coating, and particularly to a coil assembly, a plasma generating device and a coating equipment. Background Art

[0002] Currently, in the process of semiconductor coating, a capacitively coupled (Inductively Coupled Plasma, ICP) plasma generating device is usually used to generate plasma of process gas introduced therein, so as to process wafers placed in the coating equipment.

[0003] In the process of implementing the embodiments of the present disclosure, it is found that at least the following problems exist in the related art:

[0004] The overall design structure of the plasma generating device in the related art is usually applied to the single-sided coating process, resulting in that the plasma generating device in the related art cannot meet the coating requirements of large size and large quantity, and the process cost is relatively high. At the same time, the coil assembly applied in the plasma generating device usually has a small size, and there are technical problems of uneven single power load, impedance and plasma formation in the process of applying to the process of coating requirements of large size and large quantity.

[0005] It should be noted that the information disclosed in the above background art section is only used to enhance the understanding of the background of the present application, and thus may include information that does not constitute the prior art known to those of ordinary skill in the art. Summary of the Invention

[0006] In order to have a basic understanding of some aspects of the disclosed embodiments, a simple summary is given below. The summary is not a general review, nor is it intended to identify key / important constituent elements or delineate the protection scope of these embodiments, but is rather a prelude to the detailed description that follows.

[0007] Embodiments of the present disclosure provide a coil assembly, a plasma generating device and a coating equipment to meet the coating requirements of large size and large quantity, reduce the process cost and improve the uniformity of plasma formation.

[0008] In some embodiments, the coil assembly includes two or more coil units connected in parallel, and is configured to provide an excitation magnetic field under the drive of a radio frequency power supply to ionize a gas to be processed into plasma, wherein each coil unit is composed of at least two radio frequency coils connected in series.

[0009] Optionally, the radio frequency coil is a multi-turn spiral winding structure, and in each of the coil units and between two adjacent coil units, the winding directions of two adjacent radio frequency coils are opposite, so that the current directions in the adjacent coil segments of two adjacent radio frequency coils are the same.

[0010] Optionally, the coil assembly further includes: transition segments, which are arranged in each coil unit and are electrically connected to the ends of two adjacent radio frequency coils arranged in the coil unit respectively, so that multiple radio frequency coils in each coil unit form a series structure.

[0011] Optionally, the coil assembly further includes: a first conduction post, which is electrically connected to the radio frequency coil A1 in each coil unit respectively, so that each coil unit forms a parallel connection. Wherein, in the case where at least two radio frequency coils are connected in series to form a series coil chain, the radio frequency coil A1 is the radio frequency coil at one end of the series coil chain; a first current guiding end, which is arranged on the first conduction post and is used as one end of the current input end or output end.

[0012] Optionally, the coil assembly further includes: a second conduction post, which is electrically connected to the radio frequency coil A2 in each coil unit respectively, so that each coil unit forms a parallel connection. Wherein, in the case where at least two radio frequency coils are connected in series to form a series coil chain, the radio frequency coil A2 is the radio frequency coil at the end of the series coil chain far from the radio frequency coil A1; a second current guiding end, which is arranged on the second conduction post and is used as the corresponding other end of the current input end or output end.

[0013] Optionally, two or more coil units connected in parallel are arranged in an array, wherein: each coil unit includes one radio frequency coil A1 and one radio frequency coil A2, the radio frequency coils A1 of each coil unit are arranged adjacent to each other and are connected in parallel through the first conduction post, the radio frequency coil A1 is connected in series to the radio frequency coil A2 through the transition segment, and the radio frequency coils A2 of each coil unit are connected in parallel through the second conduction post.

[0014] In some embodiments, the plasma generating device includes: an ion chamber skeleton, which is arranged as a multi-faceted housing structure and internally forms a plasma chamber for accommodating the gas to be processed, and the plasma chamber includes an intake end face and an outlet end face arranged opposite to each other; an intake pipeline, which is configured to enable the gas to be processed to enter the plasma chamber from the intake end face; the coil assembly as described in the present application, which is arranged on the ion chamber skeleton and beside the gas flow path, that is, during the process that the gas to be processed flows from the intake end face to the outlet end face, the gas to be processed is ionized into plasma by exciting a magnetic field.

[0015] Optionally, the intake pipeline is arranged along the outer wall of the ion chamber framework. When the intake end face is arranged at the top, bottom or side of the plasma chamber, the intake pipeline extends to the intake end face and the outlet end face is always arranged opposite to the intake end face.

[0016] Optionally, during the process that the gas to be processed flows from the intake end face to the outlet end face, the coil assembly is arranged on one side or multiple sides of the gas flow path.

[0017] Optionally, the ion chamber framework is a rectangular polyhedron structure; or, the ion chamber framework is a triangular polyhedron structure; or, the ion chamber framework is a polyhedron structure jointly composed of triangles and rectangles; or, the ion chamber framework is a polyhedron structure composed of polygons with more than four sides.

[0018] Optionally, the plasma generating device further includes: a gas homogenizing assembly, which is embedded in the plasma chamber and located at the intake end face, and is used for homogenizing the gas to be processed from the intake pipeline.

[0019] Optionally, the gas homogenizing assembly includes a primary gas homogenizing plate and a secondary gas homogenizing plate with a laminated structure, and the primary gas homogenizing plate and the secondary gas homogenizing plate are embedded in the ion chamber framework.

[0020] Optionally, the plasma generating device further includes: a dielectric plate, which is embedded in the plasma chamber and is arranged adjacent to the coil assembly.

[0021] Optionally, the material of the dielectric plate includes quartz or ceramic.

[0022] Optionally, the plasma generating device further includes: a grid assembly, which is embedded in the plasma chamber and located at the outlet end face, and is used for homogenizing the gas to be processed after plasma treatment.

[0023] Optionally, the plasma generating device further includes: a matcher, which is arranged on the outer wall of the ion chamber framework and is arranged corresponding to the coil assembly, and is used for matching the radio frequency power supply and coupling the coil assembly.

[0024] Optionally, the plasma generating device further includes: a capacitor assembly, which is arranged on the outer wall of the ion chamber framework and is connected to the coil assembly, and is used for adjusting the capacitance of the coil assembly.

[0025] Optionally, the plasma generating device further includes: a vacuum pumping system, which is arranged on the outer wall of the ion chamber framework and is used for pumping vacuum for the coil chamber where the coil assembly is located. Among them, the coil chamber and the plasma chamber are two independent chambers separated from each other.

[0026] Optionally, the plasma generating device further includes: a cooling system disposed on the outer wall of the ion chamber framework for cooling the ion chamber framework, the coil assembly, the matcher, and / or the mounting structure of the coil assembly of the plasma generating device.

[0027] In some embodiments, the coating equipment includes the coil assembly as described in the present application or the plasma generating device as described in the present application.

[0028] The coil assembly, the plasma generating device, and the coating equipment provided by the embodiments of the present disclosure can achieve the following technical effects:

[0029] By providing an ion chamber framework with a multi-faceted housing structure to form a plasma chamber for accommodating the gas to be processed, the gas to be processed enters from the intake end face of the plasma chamber and flows out from the outlet end face of the plasma chamber. At the same time, by disposing the coil assembly on the ion chamber framework and beside the gas flow path, in this way, during the process that the gas to be processed flows from the intake end face to the outlet end face, the gas to be processed can be ionized into plasma by exciting a magnetic field. Relying on the above structural layout method, the coating requirements for large size, large batch, and high-power starting can be met, and the process cost is reduced.

[0030] In addition, the coil assembly of the present application includes two or more coil units connected in parallel, which are used to provide an exciting magnetic field under the drive of a radio frequency power supply to ionize the gas to be processed. Each of the coil units is composed of at least two radio frequency coils connected in series. In this way, relying on the above design and connection method of the coils, while maintaining the same impedance, by increasing the number of coil units or the number of radio frequency coils, the size of the coil assembly can be increased to adapt to a large-size plasma generating device. At the same time, the coil assembly can adopt a connection method of first parallel connection and then series connection, so that the current directions of adjacent two multi-turn coils are the same, thereby reducing the interference between the coils and improving the uniformity of the plasma.

[0031] The above general description and the following description are only exemplary and explanatory, and are not used to limit the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] One or more embodiments are exemplarily illustrated by corresponding drawings. These exemplary illustrations and the drawings do not constitute limitations on the embodiments. Elements with the same reference numerals in the drawings are shown as similar elements. The drawings do not constitute a scale limitation, and among them:

[0033] Figure 1 is a schematic structural diagram of a plasma generating device provided by an embodiment of the present disclosure;

[0034] Figure 2 It is a schematic structural diagram of another plasma generating device provided by an embodiment of the present disclosure;

[0035] Figure 3 It is a schematic structural diagram of another plasma generating device provided by an embodiment of the present disclosure;

[0036] Figure 4 It is a schematic structural diagram of another plasma generating device provided by an embodiment of the present disclosure;

[0037] Figure 5 It is a schematic structural diagram of another plasma generating device provided by an embodiment of the present disclosure;

[0038] Figure 6 It is a schematic structural diagram of a coil assembly provided by an embodiment of the present disclosure;

[0039] Figure 7 It is a schematic structural diagram of another coil assembly provided by an embodiment of the present disclosure.

[0040] Reference numerals:

[0041] 1 - Ion cavity skeleton; 101 - Plasma chamber; 102 - Intake end face; 103 - Outlet end face; 104 - Coil chamber; 2 - Inlet pipeline; 3 - Coil assembly; 4 - RF coil; 5 - First diversion end; 6 - Second diversion end; 7 - First conduction column; 8 - Second conduction column; 9 - Transition section; 1001 - Primary gas - equalizing plate; 1002 - Secondary gas - equalizing plate; 11 - Dielectric plate; 12 - Grid assembly; 13 - Matcher; 14 - Capacitor assembly. Detailed implementation manners

[0042] In order to more comprehensively understand the features and technical content of the embodiments of the present disclosure, the implementation of the embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. The attached drawings are only for reference and explanation purposes and are not used to limit the embodiments of the present disclosure. In the following technical description, for the sake of explanation, multiple details are provided to fully understand the disclosed embodiments. However, one or more embodiments can still be implemented without these details. In other cases, well - known structures and devices can be shown in a simplified manner.

[0043] The terms "first", "second", etc. in the specification, claims and above - mentioned drawings of the embodiments of the present disclosure are used to distinguish similar objects and do not necessarily describe a specific order or sequence. It should be understood that such used data can be interchanged under appropriate circumstances so as to implement the embodiments of the present disclosure described herein. In addition, the terms "comprising" and "having" and any variations thereof are intended to cover non - exclusive inclusion.

[0044] In the embodiments of the present disclosure, the orientation or positional relationship indicated by terms such as "upper", "lower", "inner", "middle", "outer", "front", "rear", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the embodiments of the present disclosure and their embodiments, and are not used to limit that the indicated devices, elements or components must have a specific orientation, or be constructed and operated in a specific orientation. Moreover, in addition to being able to represent an orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the embodiments of the present disclosure can be understood according to specific circumstances.

[0045] In addition, the terms "arranged", "connected", "fixed" should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or there can be internal communication between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present disclosure can be understood according to specific circumstances.

[0046] Unless otherwise specified, the term "plurality" means two or more.

[0047] In the embodiments of the present disclosure, the character " / " indicates that the objects before and after are in an "or" relationship. For example, A1 / A2 means: A1 or A2.

[0048] The term "and / or" is an associative relationship describing objects, indicating that three relationships can exist. For example, A1 and / or A2 means: A1 or A2, or, A1 and A2 these three relationships.

[0049] It should be noted that, without conflict, the embodiments in the embodiments of the present disclosure and the features in the embodiments can be combined with each other.

[0050] Combined with Figures 1 to 5As shown in the figure, an embodiment of the present disclosure provides a plasma generating device, which includes an ion chamber skeleton 1, an intake pipeline 2, and a coil assembly 3. Among them, the ion chamber skeleton 1 is arranged as a multi-faceted shell structure, and a plasma chamber 101 for accommodating the gas to be processed is formed inside. The plasma chamber 101 is an independent chamber structure from the coil chamber 104 where the coil is located. It includes an intake end face 102 and an outlet end face 103 arranged opposite to each other. Here, "arranged opposite to each other" means that the intake end face 102 and the outlet end face 103 are always two end faces arranged face to face in the multi-faceted shell structure. Since the ion chamber skeleton 1 is arranged as a multi-faceted shell structure, the intake end face 102 of the plasma chamber 101 can be respectively arranged at the top, bottom, or side of the plasma chamber 101. Correspondingly, the intake pipeline 2 extends to the intake end face 102 to ensure that the starting point of the gas flow path is always the intake end face 102, and the outlet end face 103 is always arranged opposite to the intake end face 102. The intake pipeline 2 is configured to allow the gas to be processed to enter the plasma chamber 101 from the intake end face 102, and after passing through the plasma chamber 101, flow out from the outlet end face 103. The coil assembly 3 is arranged on the ion chamber skeleton 1 and is located beside the gas flow path. The "beside" includes one side or multiple sides, such as one side, two sides, three sides, four sides, etc., which will not be enumerated here. That is, the coil assembly 3 can be arranged on one side or multiple sides of the gas flow path according to the requirements of gas flow rate, gas ignition, and gas ionization. In this way, during the process of the gas to be processed flowing from the intake end face 102 to the outlet end face 103, the gas to be processed is ionized into plasma by exciting the magnetic field from one side or multiple sides of the gas flow path.

[0051] By using the plasma generating device provided by the embodiment of the present disclosure, by arranging the ion chamber skeleton 1 with a multi-faceted shell structure, a plasma chamber 101 for accommodating the gas to be processed is formed, so that the gas to be processed enters from the intake end face 102 of the plasma chamber 101 and flows out from the outlet end face 103 of the plasma chamber 101. At the same time, by arranging the coil assembly 3 on the ion chamber skeleton 1 and beside the gas flow path, in this way, during the process of the gas to be processed flowing from the intake end face 102 to the outlet end face 103, the gas to be processed can be ionized into plasma by exciting the magnetic field. Relying on the above structural layout method, the coating requirements of large size, large quantity, and high-power ignition can be met, and the process cost is reduced.

[0052] In one embodiment of the present application, the ion chamber skeleton 1 is a rectangular polyhedron structure. For example, it can be a rectangular hexahedron structure or an octahedron structure. Alternatively, the ion chamber skeleton 1 is a triangular polyhedron structure. For example, it can be a triangular three-sided body structure or a hexahedron structure. Alternatively, the ion chamber skeleton 1 is a polyhedron structure jointly composed of triangles and rectangles. For example, it can be a polyhedron structure jointly spliced by a cube composed of triangles and a cube composed of rectangles. Alternatively, the ion chamber skeleton 1 is a polyhedron structure composed of polygons with more than four sides. For example, it can be a polyhedron structure formed by splicing polygon structures such as hexagons or octagons.

[0053] In one embodiment of the present application, in combination with Figure 2 、 Figure 4 and Figure 5 as shown, the plasma generating device of the present application further includes a gas homogenizing component and a dielectric plate 11. Among them, the gas homogenizing component is embedded in the plasma chamber 101 and located at the intake end face 102 for homogenizing the gas to be processed from the intake pipeline 2. The gas homogenizing component includes a first-stage gas homogenizing plate 1001 and a second-stage gas homogenizing plate 1002 with a laminated structure. The first-stage gas homogenizing plate 1001 and the second-stage gas homogenizing plate 1002 are embedded in the ion chamber skeleton 1. Among them, the first-stage gas homogenizing plate 1001 is directly arranged corresponding to the intake port of the intake pipeline 2, so as to achieve primary gas homogenization. And the second-stage gas homogenizing plate 1002 is evenly laid on the intake end face 102 of the plasma chamber 101, so as to achieve secondary gas homogenization. That is, the gas to be processed flows through the intake pipeline 2 to the intake end face 102 and is homogenized under the action of the first-stage gas homogenizing plate 1001 and the second-stage gas homogenizing plate 1002, and then enters the plasma chamber 101 with a relatively uniform air flow. The dielectric plate 11 is embedded in the plasma chamber 101 and is arranged adjacent to the coil assembly 3. Among them, the adjacent arrangement includes being in close contact with the coil assembly 3 or having a certain gap between the dielectric plate 11 and the coil assembly 3. Preferably, the material of the dielectric plate 11 of the present application includes quartz or ceramic. In this way, the relatively thick material of quartz or ceramic can enable the protective plate to be replaced separately after coating without replacing the dielectric plate 11, further reducing the process cost.

[0054] In one embodiment of the present application, in combination with Figures 1 to 5As shown in the figure, the plasma generating device of the present application further includes a grid assembly 12, a matcher 13, a capacitor assembly 14, a vacuum pumping system, and a cooling system. Among them, the grid assembly 12 is embedded in the plasma chamber 101 and located at the gas outlet end face 103, and is used to homogenize the gas to be processed after plasma ionization. Specifically, the grid assembly 12 includes a screen grid, an accelerating grid, and a decelerating grid. The screen grid, the accelerating grid, and the decelerating grid are sequentially connected to the positive electrode, the negative electrode, and the ground of the grid assembly 12. The multi-layer function of the grid assembly 12 is equivalent to the usage of the grid of a radio frequency ion source, and can play a role in controlling the ion beam. The potential of the screen grid is a positive bias voltage, which has the function of electrostatic shielding, preventing capacitive coupling between grids and accelerating ionization. The function of the accelerating grid is to bias the negative electrode to focus ions and perform forward acceleration. The function of the decelerating grid is to provide ground potential protection. The accelerated ions decelerate after passing through the accelerating grid and exit the grid with an ion energy approximately equal to the beam voltage. The matcher 13 is arranged on the outer wall of the ion chamber skeleton 1 and corresponds to the coil assembly 3, and is used to match the radio frequency power supply and couple the coil assembly 3. The capacitor assembly 14 is arranged on the outer wall of the ion chamber skeleton 1 and is connected to the coil assembly 3, and is used to adjust the capacitance of the coil assembly 3. The vacuum pumping system is arranged on the outer wall of the ion chamber skeleton 1 and is used to evacuate the coil chamber 104 where the coil assembly 3 is located. Among them, the coil chamber 104 and the plasma chamber 101 are two independent chambers separated from each other. The cooling system is arranged on the outer wall of the ion chamber skeleton 1 and is used to cool the ion chamber skeleton 1, the coil assembly 3, the matcher 13, and / or the mounting structure of the coil assembly 3 of the plasma generating device. Preferably, the cooling system can be a cooling water circulation pipeline, and the inlet and outlet of the cooling water are provided on the ion chamber skeleton 1, the coil assembly 3, the matcher 13, and / or the mounting structure of the coil assembly 3.

[0055] At the same time, in combination with Figure 5 and Figure 6 As shown in the figure, the embodiment of the present disclosure provides a coil assembly, including two or more coil units connected in parallel, which are used to provide an excitation magnetic field under the drive of a radio frequency power supply to ionize the gas to be processed into plasma. Among them, each coil unit is composed of at least two radio frequency coils 4 connected in series. Specifically, the radio frequency coil 4 is a multi-turn spiral winding structure, and in each coil unit and between adjacent two coil units, the winding directions of adjacent two radio frequency coils 4 are opposite, so that the current directions in the adjacent coil segments of adjacent two radio frequency coils 4 are the same. That is to say, whether it is the adjacent two radio frequency coils 4 in the same coil unit or the adjacent two radio frequency coils 4 in any adjacent two coil units, their winding directions are opposite, so that the current directions in the adjacent coil segments of adjacent two radio frequency coils 4 are the same.

[0056] By adopting the coil assembly provided by the embodiments of the present disclosure, two or more coil units connected in parallel are provided to provide an excitation magnetic field under the drive of a radio frequency power supply to ionize a gas to be processed into plasma. Each coil unit is composed of at least two radio frequency coils 4 connected in series. In this way, relying on the above coil design and connection method, while keeping the impedance consistent, the size of the coil assembly can be increased by increasing the number of coil units or the number of radio frequency coils, so as to adapt to a large-size plasma generating device. At the same time, the coil assembly can adopt a connection method of first parallel connection and then series connection, so that the current directions of two adjacent multi-turn coils are the same, thereby reducing the interference between the coils and improving the uniformity of the plasma.

[0057] In an embodiment of the present application, as shown in combination with Figure 6 and Figure 7 , the coil assembly 3 of the present application further includes a transition section 9, a first conduction post 7, a first current guiding end 5, a second conduction post 8 and a second current guiding end 6. The transition section 9 is arranged in each coil unit and is electrically connected to the ends of two adjacent radio frequency coils 4 in the coil unit, so that a series structure is formed by the multiple radio frequency coils 4 in each coil unit. The first conduction post 7 is electrically connected to the radio frequency coil A1 in each coil unit, so that each coil unit forms a parallel connection. In the case where at least two radio frequency coils 4 are connected in series to form a series coil chain, the radio frequency coil A1 is the radio frequency coil 4 at one end of the series coil chain. For example, if a coil unit is formed by three radio frequency coils 4 connected in series, it can be defined as a head radio frequency coil, a middle radio frequency coil and a tail radio frequency coil, then the radio frequency coil A1 is the head radio frequency coil or the tail radio frequency coil. The first current guiding end 5 is arranged on the first conduction post 7 and is used as one of the current input end or output end, that is, the first current guiding end 5 can be used as both the current input end and the current output end. The second conduction post 8 is electrically connected to the radio frequency coil A2 in each coil unit, so that each coil unit forms a parallel connection. In the case where at least two radio frequency coils 4 are connected in series to form a series coil chain, the radio frequency coil A2 is the radio frequency coil 4 at the end of the series coil chain far from the radio frequency coil A1. For example, if a coil unit is formed by three radio frequency coils 4 connected in series, it can be defined as a head radio frequency coil, a middle radio frequency coil and a tail radio frequency coil. In the case where the radio frequency coil A1 is the head radio frequency coil, the radio frequency coil A2 is the tail radio frequency coil; in the case where the radio frequency coil A1 is the tail radio frequency coil, the radio frequency coil A2 is the head radio frequency coil. The second current guiding end 6 is arranged on the second conduction post 8 and is used as the corresponding other end of the current input end or output end. That is, when the first current guiding end 5 is the current input end, the second current guiding end 6 is the current output end; when the first current guiding end 5 is the current output end, the second current guiding end 6 is the current input end.

[0058] In a practical application, in combination with Figure 6 As shown, the radio frequency coil 4 of the present application can be wound by multiple turns of coil segments in a rectangular, circular or triangular manner. The first conduction column 7 and the second conduction column 8 can be rectangular door column structures. The end of the first conduction column 7 is electrically connected to the end of the innermost coil segment of the corresponding radio frequency coil A1 and is bent at 90°. The end of the second conduction column 8 is electrically connected to the end of the outermost coil segment of the corresponding radio frequency coil A2 and is bent at 90°. The first current guiding end 5 can be arranged in the middle of the first conduction column 7 to form a protruding part. The second current guiding end 6 can be arranged in the middle of the second conduction column 8 to form a protruding part, and the first current guiding end 5 and the second current guiding end 6 can be located on the same straight line, so as to facilitate the connection of an external radio frequency power supply.

[0059] Correspondingly, the transition section 9 of the present application is arranged in each coil unit. The two ends of the transition section 9 are respectively electrically connected to the central area and the edge area of two adjacent radio frequency coils 4 in the coil unit, so as to connect the multiple radio frequency coils 4 in each coil unit in series. For example, the transition section 9 of the present application can be a straight-line door frame structure with a bent section, so as to ensure the stability of the series connection of the radio frequency coils 4 while minimizing the loss. At the same time, the heights of the bent section, the first conduction column 7 and the second conduction column 8 are the same, so that it is convenient for design and installation.

[0060] In another practical application, in combination with Figure 7 As shown, two or more coil units connected in parallel are arranged in an array. Among them, each coil unit includes a radio frequency coil A1 and a radio frequency coil A2. As explained above, each coil unit may further include one or more radio frequency coils located between the radio frequency coil A1 and the radio frequency coil A2. The radio frequency coils A1 of each coil unit are arranged adjacent to each other and are connected in parallel through the first conduction column 7. The radio frequency coil A1 is connected in series to the radio frequency coil A2 through the transition section 9. It can be understood that when one or more radio frequency coils are further included between the radio frequency coil A1 and the radio frequency coil A2, the same transition section 9 is used to realize the series connection method. The radio frequency coils A2 of each coil unit are connected in parallel through the second conduction column 8. In this way, the current can enter the radio frequency coil A1 along two opposite directions through the first current guiding end 5 and the first conduction column 7. Taking a coil unit including a radio frequency coil A1 and a radio frequency coil A2 as an example, as Figure 7As shown by the coil unit on the left side in the figure, the current flows counterclockwise in the RF coil A1, then flows through the transition section 9 to the RF coil A2, and the current flows clockwise in the RF coil A2, and then flows out of the coil unit through the second conduction column 8 and the second current guiding end 6. Similarly, the current flow path in the other coil unit is the same, but the flow direction is completely opposite. In this way, the current directions in several adjacent coil segments between two adjacent RF coils A1 and between the RF coil A1 and the RF coil A2 are the same, which can reduce the interference between coils and improve the magnetic field uniformity.

[0061] In summary, the coil assemblies can be compatible on both sides of the plasma generating device of the present application to meet the high-power starting requirements. The coil assemblies are arranged in a plurality of mosquito coil-shaped coils, and with a specially designed connection and winding method, the currents in two adjacent RF coils are in the same direction, reducing the interference between coils and improving the uniformity. In addition, in the case of large equipment requirements, the matching requirements of the RF coils are consistent with the impedance of the coils after connection, and repeated tests are not required. The requirements of a large-sized coating chamber can be achieved by increasing the number of mosquito coil-shaped RF coils. Compared with directly preparing a single large-sized coil, the process cost is reduced.

[0062] In addition, the embodiments of the present disclosure provide a coating device, including the coil assembly as described in the present application or the plasma generating device as described in the present application.

[0063] The above description and the drawings fully illustrate the embodiments of the present disclosure so that those skilled in the art can practice them. Other embodiments may include structural and other changes. The embodiments only represent possible variations. Unless explicitly required, the individual components and functions are optional, and the order of operations can vary. Parts and features of some embodiments may be included in or substituted for parts and features of other embodiments. The embodiments of the present disclosure are not limited to the structures already described and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present disclosure is only limited by the appended claims.

Claims

1. A coil assembly, characterized in that, It includes two or more coil units connected in parallel, which are used to provide an excitation magnetic field under the drive of a radio frequency power supply to ionize the gas to be processed into plasma. Each of the coil units is composed of at least two radio frequency coils connected in series.

2. The coil assembly according to claim 1, wherein, The radio frequency coils are of a multi-turn spiral winding structure, and in each coil unit and between two adjacent coil units, the winding directions of two adjacent radio frequency coils are opposite, so that the current directions in the adjacent coil segments of two adjacent radio frequency coils are the same.

3. The coil assembly according to claim 1, wherein, It further includes: Transition segments, which are arranged in each coil unit and are respectively electrically connected to the ends of two adjacent radio frequency coils in the coil unit, so that multiple radio frequency coils in each coil unit form a series structure.

4. The coil assembly according to claim 1, characterized in that, It further includes: A first conduction post, which is respectively electrically connected to the radio frequency coil A1 in each coil unit, so that each coil unit forms a parallel connection. When at least two radio frequency coils are connected in series to form a series coil chain, the radio frequency coil A1 is the radio frequency coil at one end of the series coil chain. A first current guiding end, which is arranged on the first conduction post and is used as one of the input end or output end of the current.

5. The coil assembly according to claim 4, wherein It further includes: A second conduction post, which is respectively electrically connected to the radio frequency coil A2 in each coil unit, so that each coil unit forms a parallel connection. When at least two radio frequency coils are connected in series to form a series coil chain, the radio frequency coil A2 is the radio frequency coil at the end of the series coil chain far from the radio frequency coil A1. A second current guiding end, which is arranged on the second conduction post and is used as the corresponding other end of the input end or output end of the current.

6. The coil assembly according to claim 5, wherein, Two or more coil units connected in parallel are arranged in an array, where: Each coil unit includes one radio frequency coil A1 and one radio frequency coil A2. The radio frequency coils A1 of each coil unit are adjacent to each other and are connected in parallel through the first conduction post. The radio frequency coil A1 is connected in series to the radio frequency coil A2 through the transition segment. The radio frequency coils A2 of each coil unit are connected in parallel through the second conduction post.

7. A plasma generating device, characterized in that, It includes: An ion chamber skeleton, which is set as a multi-faceted shell structure and internally forms a plasma chamber for accommodating the gas to be processed. The plasma chamber includes an intake end face and an outlet end face arranged opposite to each other. An intake pipeline, which is configured to allow the gas to be processed to enter the plasma chamber from the intake end face. The coil assembly according to any one of claims 1 to 6, which is arranged on the ion chamber skeleton and beside the gas flow path, that is, during the process that the gas to be processed flows from the intake end face to the outlet end face, the gas to be processed is ionized into plasma by the excitation magnetic field.

8. The plasma generating device according to claim 7, characterized in that, The intake pipeline is arranged along the outer wall of the ion chamber skeleton. When the intake end face is arranged at the top, bottom or side of the plasma chamber, the intake pipeline extends to the intake end face and the outlet end face always remains opposite to the intake end face.

9. The plasma generating device according to claim 7, characterized in that, During the process that the gas to be processed flows from the intake end face to the outlet end face, the coil assembly is arranged on one or more sides of the gas flow path.

10. The plasma generating device according to claim 7, wherein The ion chamber skeleton is a rectangular polyhedron structure; or, The ion chamber skeleton is a triangular polyhedron structure; or, The ion chamber skeleton is a polyhedron structure jointly composed of triangles and rectangles; or, The ion chamber skeleton is a polyhedron structure composed of polyhedrons with more than four sides.

11. The plasma generating device according to claim 7, characterized in that, It further includes: A gas homogenizing component, embedded in the plasma chamber and located at the intake end face, for homogenizing the gas to be processed from the intake pipeline.

12. The plasma generating device according to claim 11, characterized in that, The gas homogenizing component includes a primary gas homogenizing plate and a secondary gas homogenizing plate with a laminated structure, and the primary gas homogenizing plate and the secondary gas homogenizing plate are embedded in the ion chamber skeleton.

13. The plasma generating device according to claim 7, characterized in that, It further includes: A dielectric plate, embedded in the plasma chamber and arranged adjacent to the coil assembly.

14. The plasma generating device according to claim 13, characterized in that, The material of the dielectric plate includes quartz or ceramic.

15. The plasma generating device according to claim 7, characterized in that, It further includes: A grid assembly, embedded in the plasma chamber and located at the outlet end face, for homogenizing the plasma-processed gas to be processed.

16. The plasma generating device according to claim 7, wherein It further includes: A matcher, arranged on the outer wall of the ion chamber skeleton and corresponding to the coil assembly, for matching the RF power supply and coupling the coil assembly.

17. The plasma generating device according to claim 7, wherein It further includes: A capacitor assembly, arranged on the outer wall of the ion chamber skeleton and connected to the coil assembly, for adjusting the capacitance of the coil assembly.

18. The plasma generating device according to claim 7, characterized in that, It further includes: A vacuum pumping system, arranged on the outer wall of the ion chamber skeleton, for pumping vacuum on the coil chamber where the coil assembly is located, wherein the coil chamber and the plasma chamber are two independent chambers separated from each other.

19. The plasma generating device according to claim 7, wherein, It further includes: A cooling system, arranged on the outer wall of the ion chamber skeleton, for cooling the ion chamber skeleton, the coil assembly, the matcher and / or the installation structure of the coil assembly of the plasma generating device.

20. A coating device, characterized in that, It includes the coil assembly according to any one of claims 1 to 6 or the plasma generating device according to any one of claims 7 to 19.

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