Object holding apparatus, exposure apparatus, object moving method, and object holding system

Abstract

The object holding device includes: a holding portion that holds an object and is driven in a first direction that is a scanning direction of the object and a second direction that is orthogonal to the first direction in a horizontal plane; and a pair of linear motors each including a first unit having a plurality of armature modules each including a magnetic body core and a coil, and a second unit having a plurality of armature modules each including a magnetic body core and a coil, and applying a thrust force in the first direction and a thrust force in the second direction to the holding portion. The magnetic body core has two or more protruding portions protruding in the second direction, the coil is wound around the magnetic body core and through which a current having the same potential flows, and the second unit has a magnet module disposed between two adjacent protruding portions. The magnet module includes a plurality of permanent magnets arranged while changing polarity in the first direction, and at least a portion of each of the plurality of permanent magnets is housed in a space sandwiched between the two adjacent protrusions.

Description

Technical Field

[0001] The present invention relates to an object holding device, an exposure device, an object moving method, and an object holding system. Background Art

[0002] Conventionally, in a lithography process for manufacturing electronic devices (micro-devices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), a step-and-scan type exposure device (so-called scanning stepper (also referred to as a scanner)) is used, in which a mask or a reticle (hereinafter collectively referred to as "mask") and a glass substrate or a wafer (hereinafter collectively referred to as "substrate") are synchronously moved along a predetermined scanning direction (scanning direction), and a pattern formed on the mask is transferred onto the substrate using an energy beam.

[0003] In an exposure device, due to the development of light sources represented by UV-LED (Ultraviolet-Light Emitting Dioder), the illuminance of the illumination system has been dramatically improved, and even if various stages including a mask stage are driven at high speed, the exposure amount can be ensured. Therefore, higher speeds of driving various stages including the mask stage are increasingly pursued. The throughput is increased by increasing the driving speed of various stages.

[0004] As a driving device for driving a mask stage in the scanning direction, for example, a linear motor is used (for example, Patent Document 1).

[0005] Prior Art Documents

[0006] Patent Documents

[0007] Patent Document 1: Japanese Unexamined Patent Application Publication No. 2017-15995 Summary of the Invention

[0008] According to a first disclosed aspect, an object holding device includes: a holding unit that holds an object and is driven in a first direction that is a scanning direction of the object and in a second direction that is orthogonal to the first direction in a horizontal plane; and a pair of linear motors, each of which includes a first unit and a second unit, and applies a thrust in the first direction and a thrust in the second direction to the holding unit. The first unit has a plurality of armature modules, each of the plurality of armature modules includes a magnetic core and a coil, the magnetic core has two or more protrusions protruding in the second direction, the coil is wound around the magnetic core and conducts a current of the same potential, the second unit has a magnet module disposed between two adjacent protrusions, and the magnet module includes a plurality of permanent magnets disposed while changing polarities in the first direction, and at least a part of each of the plurality of permanent magnets is accommodated in a space sandwiched between the two adjacent protrusions.

[0009] According to the second disclosed aspect, an exposure apparatus includes: the above-described object holding device; and a pattern forming device that forms a pattern possessed by the object on an object to be exposed by an exposure operation of exposing the object to be exposed with an energy beam via the object held by the object holding device.

[0010] According to the third disclosed aspect, an object moving method includes: arranging a pair of first units such that a first direction is orthogonal to a scanning direction of an object, the pair of first units each having a plurality of armature modules, the plurality of armature modules each including a magnetic core and a coil, the magnetic core having two or more protrusions protruding in the first direction, the coil being wound around the magnetic core and having a current flowing therethrough with the same phase; arranging a pair of second units each having a magnet module including a plurality of permanent magnets arranged while changing polarities in a second direction and arranged between two adjacent ones of the protrusions such that the second direction is parallel to the scanning direction and at least a part of each of the plurality of permanent magnets is received in a space sandwiched between the two adjacent protrusions; and applying a thrust in the scanning direction and a thrust in a direction orthogonal to the scanning direction in a horizontal plane to a holding unit holding the object by a pair of linear motors each constituted by the first unit and the second unit, thereby moving the object in the scanning direction and the orthogonal direction.

[0011] According to the fourth disclosed aspect, an object holding system includes an object holding device and a control device, the object holding device including: a holding unit that holds an object and is driven in a first direction as a scanning direction of the object and in a second direction orthogonal to the first direction in a horizontal plane; and a pair of linear motors each including a first unit and a second unit that apply a thrust in the first direction and a thrust in the second direction to the holding unit, the first unit having a plurality of armature modules, the plurality of armature modules each including a magnetic core and a coil, the magnetic core having two or more protrusions protruding in the second direction, the coil being wound around the magnetic core and having a current flowing therethrough with the same phase, the second unit having a magnet module arranged between two adjacent ones of the protrusions, the magnet module including a plurality of permanent magnets arranged while changing polarities in the first direction, the control device controlling the pair of linear motors, and at least a part of each of the plurality of permanent magnets being received in a space sandwiched between the two adjacent protrusions.

[0012] It should be noted that the configurations of the following embodiments can be appropriately modified, and also, at least a part thereof can be replaced with other components. In addition, constituent elements whose arrangements are not particularly limited are not limited to the arrangements disclosed in the embodiments and can be arranged at positions where their functions can be achieved. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 is a schematic diagram showing the configuration of an exposure apparatus according to an embodiment.

[0014] Figure 2 (A) of is a top view of a mask stage apparatus according to an embodiment, Figure 2 (B) of is a side view of a mask stage apparatus according to an embodiment.

[0015] Figure 3 (A) of is a perspective view showing the configuration of a linear motor, Figure 3 (B) of is a side view for explaining the arrangement of a first unit and a second unit in the embodiment.

[0016] Figure 4 (A) of and Figure 4 (B) of are side views for explaining the force generated between the first unit and the second unit, Figure 4 (C) of is a side view for explaining the thrust in the Y-axis direction applied to the stage body.

[0017] Figure 5 is a block diagram showing a configuration example of a mask stage control device that controls the driving of a first linear motor and a second linear motor.

[0018] Figure 6 (A) of is a top view of a mask stage apparatus according to a modified example, Figure 6 (B) of is a side view of a mask stage apparatus according to a modified example. DETAILED DESCRIPTION OF THE EMBODIMENT

[0019] As described above, as a driving device for driving a mask stage in a scanning direction, for example, a linear motor is used. The mask stage has a configuration of a 3-degree-of-freedom (DOF) planar stage with X-axis, Y-axis, and θz-axis freedoms in a plane in order to synchronize with a substrate stage.

[0020] Here, when it is desired to adopt a core linear motor with a high magnetic flux density and high efficiency in order to meet the requirement of high-speed driving of the mask stage, it is difficult to mount a general core linear motor on a 3DOF planar stage such as a mask stage because a strong magnetic attraction force is generated between the core (iron core) and the permanent magnet part. In the present embodiment, a core linear motor with a high magnetic flux density and high efficiency is mounted on the mask stage, and high-speed driving of the mask stage and position control in the X-axis direction, Y-axis direction, and θz direction of the mask stage are achieved.

[0021] Based on Figures 1 to 5 An exposure apparatus 10 according to an embodiment will be described.

[0022] (Configuration of Exposure Device)

[0023] Figure 1 FIG. is a diagram schematically showing the configuration of an exposure device 10 according to an embodiment.

[0024] The exposure device 10 is a scanning stepper (scanner) that transfers a pattern formed on a mask MSK onto a substrate P by driving the mask MSK and a glass substrate (hereinafter referred to as "substrate") P in the same direction at the same speed relative to a projection optical system PL. The substrate P is, for example, a rectangular glass substrate used in a liquid crystal display device (flat panel display), and the length of at least one side or the diagonal length is 500 mm or more.

[0025] Hereinafter, the direction in which the mask MSK and the substrate P are driven during scanning exposure (scanning direction) is defined as the X-axis direction, the direction in the horizontal plane orthogonal thereto is defined as the Y-axis direction, the direction orthogonal to the X-axis and the Y-axis is defined as the Z-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are defined as the θx, θy, and θz directions, respectively. In addition, the X-axis position, Y-axis position, and θz position of a stage body 60 included in a mask stage device MST described later may be referred to as the X position, Y position, and θz position, respectively.

[0026] The exposure device 10 includes an illumination system IOP, a mask stage device MST that holds a mask MSK, a projection optical system PL, a main body 70 that supports them, a substrate stage PST that holds a substrate P, and a control device 600. The control device 600 includes a mask stage control device 400 that controls the mask stage device MST and a substrate stage control device 500 that controls the substrate stage PST.

[0027] The main body 70 includes a base (vibration isolation table) 71, columns 72A and 72B, and an optical platform 73. The base (vibration isolation table) 71 is disposed on a floor F, removes vibration from the floor F, and supports the columns 72A, 72B, etc. The columns 72A and 72B each have a frame shape, and the column 72A is disposed inside the column 72B. The optical platform 73 has a flat plate shape and is fixed to the top of the column 72A.

[0028] The illumination system IOP is disposed above the main body 70. The illumination system IOP irradiates illumination light IL onto the mask MSK.

[0029] The mask stage device MST includes a stage body 60 and is fixed, for example, by vacuum adsorption (or electrostatic adsorption) with a pattern surface ([ Figure 1A mask MSK for the lower surface) therein. The mask stage device MST is driven in the scanning direction (X-axis direction) by a pair of linear motors 100 described later with a prescribed stroke, and is minutely driven in the non-scanning directions (Y-axis direction and θz direction). The configuration of the mask stage device MST will be described in detail later.

[0030] The projection optical system PL is supported on an optical table 73 below (-Z side) the mask stage device MST. The projection optical system PL forms, for example, an image field having a rectangular shape with the Y-axis direction as the length direction. It should be noted that the projection area of the projection optical system PL is sometimes referred to as the exposure area.

[0031] When the illumination area on the mask MSK is illuminated by the illumination light IL from the illumination system IOP, the illumination light IL that has passed through the mask MSK forms an image (partially erect image) of the circuit pattern of the mask MSK in the illumination area on the substrate P disposed on the image plane side of the projection optical system PL via the projection optical system PL (exposure area (conjugate to the illumination area)). Here, a resist (sensitizer) is coated on the surface of the substrate P. The mask stage device MST and the substrate stage PST are driven synchronously, that is, the mask MSK is driven in the scanning direction (X-axis direction) relative to the illumination area (illumination light IL), and by driving the substrate P in the same scanning direction relative to the exposure area (illumination light IL), the substrate P is exposed and the pattern of the mask MSK is transferred onto the substrate P.

[0032] The substrate stage PST is disposed on a base (vibration isolation table) 71 below (-Z side) the projection optical system PL. The substrate P is held on the substrate stage PST by a substrate holder (not shown).

[0033] The position information in the XY plane of the substrate stage PST (including rotational information (deflection amount (rotation amount θz in the θz direction), pitch amount (rotation amount θx in the θx direction), yaw amount (rotation amount θy in the θy direction))) is measured by an interferometer system. The interferometer system measures the position of the substrate stage PST by irradiating a length measuring beam from the optical table 73 to a moving mirror (or a mirror-processed reflecting surface (not shown)) provided at the end of the substrate stage PST and receiving the reflected light from the moving mirror. The measurement result is supplied to the substrate stage control device 500, and the substrate stage control device 500 drives the substrate stage PST in accordance with the measurement result of the interferometer system.

[0034] In the exposure apparatus 10, alignment measurement (such as EGA, etc.) is performed before exposure, and based on the result thereof, the substrate P is exposed according to the following steps. First, in accordance with the instructions of the mask stage control device 400 and the substrate stage control device 500, the mask stage device MST and the substrate stage PST are synchronously driven in the X-axis direction. Thereby, scanning exposure is performed on the first irradiation area on the substrate P. When the scanning exposure for the first irradiation area is completed, the substrate stage control device 500 moves (steps) the substrate stage PST to the position corresponding to the second irradiation area. Then, scanning exposure is performed on the second irradiation area. Similarly, the substrate stage control device 500 repeatedly performs stepping between the irradiation areas of the substrate P and scanning exposure for the irradiation areas. Thereby, the pattern of the mask MSK is transferred to all the irradiation areas on the substrate P.

[0035] (Configuration of the mask stage device MST)

[0036] Next, the configuration of the mask stage device MST in the present embodiment will be described. Figure 2 FIG. (A) is a top view of the mask stage device MST, Figure 2 and FIG. (B) is a side view of the mask stage device MST. It should be noted that, in Figure 2 FIG. (B), for the second unit 300 described later, a cross section including the permanent magnet 301 described later is shown. In addition, Figure 2 the illustration of some elements is omitted in FIG. (B).

[0037] As Figure 2 shown in FIG. (A) and Figure 2 FIG. (B), the mask stage device MST includes a pair of X-beams 61, a stage body 60 that holds the mask MSK, a pair of linear motors 100 that apply a thrust to the stage body 60, and the like.

[0038] A pair of X-beams 61 are fixed to, for example, the column 72B. The pair of X-beams 61 are members extending in the X-axis direction, and are arranged separately in the Y-axis direction and parallel to each other.

[0039] The stage body 60 is formed of a plate-like member having a rectangular shape in a top view, and a rectangular long hole-shaped opening 60a having the X-axis direction as the length direction is formed in the central portion thereof. The mask MSK is inserted into the opening 60a. On the +Y side and -Y side wall surfaces of the wall surface defining the opening 60a, a plurality (for example, five) of holding members (not shown) are respectively installed at a predetermined interval in the X-axis direction. The holding members include adsorption pads for adsorbing and holding the mask MSK from below.

[0040] In addition, air bearings 62, which are a type of aerostatic bearing, are respectively installed near, for example, the four corners of the lower surface of the stage body 60 (see Figure 2(B)). By ejecting pressurized gas from, for example, four air bearings 62, the stage body 60 floats non - contactingly with a minute gap on the platform 65 supported by the column 72B.

[0041] In addition, as Figure 2 shown in (A) of, on the side surface of the - X side of the stage body 60, a pair of X - moving mirrors 63X having reflecting surfaces orthogonal to the X - axis are mounted at a prescribed interval in the Y - axis direction. In addition, a Y - moving mirror 63Y (bar mirror; a mirror in the shape of a strip) having a reflecting surface orthogonal to the Y - axis is mounted on the side surface of the - Y side of the stage body 60.

[0042] The position information of the stage body 60 (i.e., the mask MSK) in the XY plane is always detected by a laser interferometer system (hereinafter referred to as the mask interferometer system) including a pair of X - laser interferometers 64X respectively corresponding to the pair of X - moving mirrors 63X and a Y - laser interferometer 64Y corresponding to the Y - moving mirror 63Y with a resolution of, for example, about 0.5 to 1 nm. The position information of the stage body 60 in the θz direction is obtained based on the outputs of the pair of X - laser interferometers 64X.

[0043] The stage body 60 is driven in the X - axis direction, Y - axis direction, and θz direction by a pair of linear motors 100. The pair of linear motors 100 are opposed to each other across the stage body 60 in the Y - axis direction. Specifically, the pair of linear motors 100 includes a first linear motor 100a disposed on the + Y side of the stage body 60 and a second linear motor 100b disposed on the - Y side of the stage body 60.

[0044] (Configuration of the linear motor 100)

[0045] Next, the configuration of the linear motor 100 will be described. Figure 3 (A) of is a perspective view showing the configuration of the linear motor 100. As Figure 3 shown in (A) of, the linear motor 100 includes a first unit 200 and a second unit 300.

[0046] The first unit 200 includes a plurality of armature module groups 211 arranged in the X - axis direction. Each armature module group 211 includes armature modules 210U, 210V, and 210W. In the following description, when there is no need to particularly distinguish, the armature modules 210U, 210V, and 210W are denoted as armature module 210. The armature modules 210U, 210V, and 210W are, for example, housed in a frame 250 having an E - shaped cross - section (see Figure 2 (A) of).

[0047] Each armature module 210 includes a magnetic core 201 having three protrusions 201a protruding in the Y-axis direction and a coil 203 wound around the magnetic core 201. The coil 203 of the armature module 210U is applied with a U-phase voltage, the coil 203 of the armature module 210V is applied with a V-phase voltage, and the coil 203 of the armature module 210W is applied with a W-phase voltage. That is, currents of the same phase (U-phase) flow in the coil 203 of the armature module 210U. In addition, currents of the same phase (V-phase) flow in the coil 203 of the armature module 210V. In addition, currents of the same phase (W-phase) flow into the coil 203 of the armature module 210W.

[0048] In the armature modules 210U, 210V, and 210W, the winding directions of the respective coils 203 through which currents of the same phase flow are adjusted so that the magnetic flux closed loops are formed with different polarities of the electromagnets of the respective protrusions 201a. For example, as shown in the armature module 210U of (A) of Figure 3 , the winding directions of the respective coils 203 are adjusted so that the magnetic flux closed loops formed at a certain moment become magnetic flux closed loops A1 and A2.

[0049] The second unit 300 includes a magnet module 310 including a plurality of permanent magnets 301. In the present embodiment, the second unit 300 includes two magnet modules 310. In each magnet module 310, the plurality of permanent magnets 301 are arranged while changing their polarities in the X-axis direction (polarities are alternately arranged).

[0050] Figure 3 (B) of Figure 3 is a side view for explaining the configuration of the first unit 200 and the second unit 300 in the present embodiment. In Figure 3 (B), for the second unit 300, a cross section including the permanent magnet 301 is shown. As shown in Figure 3 (B), each magnet module 310 is arranged between two adjacent protrusions 201a of the magnetic core 201 of the armature module 210. It should be noted that in Figure 3 (A) and

[0051] (B), "N" and "S" respectively represent the N pole and the S pole of the permanent magnet 301.

[0052] In the present embodiment, as shown inFigure 2 and (B) of Figure 3 As shown in (B) of Figure 3 , the first unit 200 is fixed to the X beam 61, and the second unit 300 is fixed to the stage main body 60. In the present embodiment, the first unit 200 and the second unit 300 are arranged such that a part of each of the plurality of permanent magnets 301 included in the magnet module 310 is housed in the space SP1 sandwiched between two adjacent protruding portions 201a of the magnetic core 201, and the other part of each of the plurality of permanent magnets 301 protrudes from the space SP1. Thus, as shown in (B) of Figure 3 a magnetic attraction force MAF is generated between the first unit 200 and the second unit 300 in the Y-axis direction. It should be noted that at least a part of each of the plurality of permanent magnets 301 may be housed in the space SP1 sandwiched between two adjacent protruding portions 201a of the magnetic core 201.

[0053] The magnitude of the magnetic attraction force MAF generated between the first unit 200 and the second unit 300 varies with the area of the part housed in the space SP1 sandwiched between two adjacent protruding portions 201a of the magnetic core 201 between the permanent magnets 301. In the linear motor 100 of the present embodiment, the magnetic attraction force MAF becomes minimum when the entire permanent magnet 301 is housed in the space SP1. If the magnetic attraction force MAF between the first unit 200 and the second unit 300 is large, it will affect the driving of the linear motor 100. Therefore, when using the linear motor 100 of the present embodiment, the first unit 200 and the second unit 300 have been arranged such that the entire permanent magnet 301 is housed in the space SP1.

[0054] The inventor of the present application found that by generating an appropriate magnitude of the magnetic attraction force MAF between the first unit 200 and the second unit 300, the thrust in the Y-axis direction applied to the stage main body 60 by the first linear motor 100a and the thrust in the Y-axis direction applied to the stage main body 60 by the second linear motor 100b can be changed by the d-axis current.

[0055] Therefore, in the present embodiment, the magnetic attraction force MAF is intentionally generated between the first unit 200 and the second unit 300, and the d-axis current applied to the coil 203 is changed. Thus, the thrust in the Y-axis direction applied to the stage main body 60 can be changed in the first linear motor 100a and the second linear motor 100b respectively by the force caused by the increase and decrease of the magnetic flux based on the d-axis current. Thereby, the thrust in the Y-axis direction of the stage main body 60 can be adjusted, and the position of the stage main body 60 in the Y-axis direction can be adjusted.

[0056] The control of the position of the stage main body 60 in the Y-axis direction based on the control of the d-axis current will be described in detail. Figure 4 and (A) of Figure 4(B) is a side view for explaining the force generated between the first unit 200 and the second unit 300. Figure 4 (C) is a side view for explaining the thrust in the Y-axis direction applied to the stage main body 60. It should be noted that in Figure 4 (A) to Figure 4 (C), a cross-section including the permanent magnet 301 is shown for the second unit 300.

[0057] Figure 4 The left side of the illustration in (A) shows the state before supplying the d-axis current to the coil 203. Figure 4 The magnetic flux lines shown in (A) are formed by the q-axis current.

[0058] As Figure 4 shown in (A), in a state where no d-axis current is supplied to the coil 203 (d-axis current = 0), a magnetic attractive force MAF is generated between the first unit 200 and the second unit 300. Here, in Figure 4 the state of (A), when a positive d-axis current is supplied to the coil 203, as Figure 4 shown in the central illustration of (A), a force GF1 based on the increase and decrease of magnetic flux is generated between the first unit 200 and the second unit 300. The force GF1 is a force in the direction opposite to the magnetic attractive force MAF.

[0059] A magnetic attractive force MAF is also generated between the first unit 200 and the second unit 300, but since the magnetic attractive force MAF is weakened by the force GF1, the resultant force TF of the force GF1 and the magnetic attractive force MAF is smaller than the magnetic attractive force MAF. As a result, as Figure 4 shown in the right side illustration of (A), the resultant force TF (< magnetic attractive force MAF) of the force GF1 and the magnetic attractive force MAF becomes the force generated between the first unit 200 and the second unit 300.

[0060] In addition, Figure 4 the left side illustration of (B) shows the state before supplying the d-axis current to the coil 203, similar to Figure 4 (A). In Figure 4 the state of (B), when a negative d-axis current is supplied to the coil 203, as Figure 4 shown in the central illustration of (B), a force GF2 based on the increase and decrease of magnetic flux is generated between the first unit 200 and the second unit 300. The force GF2 is a force in the same direction as the magnetic attractive force MAF.

[0061] A magnetic attractive force MAF is also generated between the first unit 200 and the second unit 300, and since the magnetic attractive force MAF is enhanced by the force GF2, the resultant force TF of the force GF2 and the magnetic attractive force MAF is larger than the magnetic attractive force MAF. As a result, as Figure 4As shown in the figure on the right side of (B), the resultant force TF (> magnetic attractive force MAF) of the force GF2 and the magnetic attractive force MAF becomes the force generated between the first unit 200 and the second unit 300.

[0062] It should be noted that from the viewpoint of the position control in the Y-axis direction of the stage main body 60, the first unit 200 and the second unit 300 of the first linear motor 100a and the first unit 200 and the second unit 300 of the second linear motor 100b only need to be arranged so that their respective magnetic attractive forces MAF become magnetic attractive forces of appropriate magnitudes. In addition, the magnetic attractive force MAF generated between the first unit 200 and the second unit 300 of the first linear motor 100a and the magnetic attractive force MAF generated between the first unit 200 and the second unit 300 of the second linear motor 100b may be the same or different.

[0063] In the present embodiment, as Figure 4 shown in (C), the first linear motor 100a is arranged on the +Y side of the stage main body 60, and the second linear motor 100b is arranged on the -Y side of the stage main body 60. Here, for example, the mask stage control device 400 supplies a positive d-axis current to the second linear motor 100b and supplies a negative d-axis current to the first linear motor 100a. In this case, as Figure 4 shown in (C), the resultant force TF1 in the +Y direction is applied to the stage main body 60 by the first linear motor 100a, and the resultant force TF2 in the -Y direction is applied to the stage main body 60 by the second linear motor 100b. That is, the direction of the thrust in the Y-axis direction applied to the stage main body 60 by the first linear motor 100a is opposite to the direction of the thrust in the Y-axis direction applied to the stage main body 60 by the second linear motor 100b.

[0064] As Figure 4 shown in (C), since the resultant force TF1 in the +Y direction is greater than the resultant force TF2 in the -Y direction, a thrust THF in the +Y direction is applied to the stage main body 60 as a whole, and the stage main body 60 moves in the +Y direction. In this way, by controlling the d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b, the position of the stage main body 60 in the Y-axis direction can be controlled.

[0065] The d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b can be determined by calculating the thrust applied to the stage main body 60 in the Y-axis direction and distributing this thrust to the first linear motor 100a and the second linear motor 100b.

[0066] Specifically, the d-axis current supplied to the coil 203 of the first linear motor 100a and the d-axis current supplied to the coil 203 of the second linear motor 100b may be determined in the following manner, that is, the resultant force in the linear motor 100 located in the direction in which the stage body 60 is desired to move (+Y direction or -Y direction) (the resultant force in the direction in which the stage body 60 is desired to move) is made greater than the resultant force in the other linear motor 100 (the resultant force in the direction opposite to the direction in which the stage body 60 is desired to move).

[0067] Here, when d-axis currents in opposite directions are applied to the coil 203 of the first linear motor 100a and the coil 203 of the second linear motor 100b, the maximum thrust can be generated in the axial direction.

[0068] It should be noted that it is not necessary to apply d-axis currents to the coils 203 of both the first linear motor 100a and the second linear motor 100b, and it is sufficient to apply d-axis currents to the coils 203 of at least one of the first linear motor 100a and the second linear motor 100b. That is, as long as the resultant force in the linear motor 100 located in the direction in which the stage body 60 is desired to move (+Y direction or -Y direction) (the resultant force in the direction in which the stage body 60 is desired to move) is greater than the resultant force in the other linear motor 100 (the resultant force in the direction opposite to the direction in which the stage body 60 is desired to move), the stage body 60 can be moved in the desired direction.

[0069] Figure 5 It is a block diagram showing a configuration example of a mask stage control device 400 that controls the driving of the first linear motor 100a and the second linear motor 100b.

[0070] The mask stage control device 400 includes addition / subtraction circuits 401 to 403, an X position control unit 411, a θz position control unit 412, a Y position control unit 413, an X-axis thrust calculation unit 460, a Y-axis thrust calculation unit 470, a magnetic attraction force calculation unit 480, a q-axis current command value calculation unit 420, a d-axis current command value calculation unit 430, a first current vector control unit 440a, a second current vector control unit 440b, a first motor amplifier 450a, and a second motor amplifier 450b.

[0071] The addition / subtraction circuit 401 obtains the deviation (X position deviation) between the target value of the X position of the stage body 60 input from the outside and the X position (X actual position) of the stage body 60 detected by the mask interferometer system.

[0072] The addition / subtraction circuit 402 obtains the deviation (θz position deviation) between the target value of the θz position of the stage body 60 input from the outside and the θz position (θz actual position) of the stage body 60 detected by the mask interferometer system.

[0073] The addition and subtraction circuit 403 calculates the deviation (Y position deviation) of the target value of the Y position of the stage body 60 input from the outside and the Y position (Y actual position) of the stage body 60 detected by the mask interferometer system.

[0074] The X position control unit 411 calculates a command value for the thrust in the X-axis direction (X-axis thrust) based on the deviation of the X position calculated by the addition and subtraction circuit 401.

[0075] The θz position control unit 412 calculates a command value for the thrust in the θz direction (θz direction thrust) based on the deviation of the θz position (θz position deviation) calculated by the addition and subtraction circuit 402.

[0076] The X-axis thrust calculation unit 460 calculates a command value for the thrust in the X-axis direction (X-axis thrust command value) of the first linear motor 100a and a command value for the thrust in the X-axis direction (X-axis thrust command value) of the second linear motor 100b based on the command value for the thrust in the X-axis direction calculated by the X position control unit 411 and the command value for the thrust in the θz direction calculated by the θz position control unit 412.

[0077] The q-axis current command value calculation unit 420 calculates the q-axis current command value of the first linear motor 100a and the q-axis current command value of the second linear motor 100b based on the X-axis thrust command value of the first linear motor 100a and the X-axis thrust command value of the second linear motor 100b calculated by the X-axis thrust calculation unit 460.

[0078] On the other hand, the Y position control unit 413 calculates a command value for the thrust in the Y-axis direction (Y-axis thrust) based on the deviation of the Y position (Y position deviation) calculated by the addition and subtraction circuit 403.

[0079] The Y-axis thrust calculation unit 470 calculates a command value for the thrust in the Y-axis direction (Y-axis thrust command value) of the first linear motor 100a and a command value for the thrust in the Y-axis direction (Y-axis thrust command value) of the second linear motor 100b based on the command value for the thrust in the Y-axis direction calculated by the Y position control unit 413.

[0080] The magnetic attraction force calculation unit 480 calculates the magnetic attraction force of the first linear motor 100a and the magnetic attraction force of the second linear motor 100b based on the actual position of the stage main body 60. The magnetic attraction force MAF varies according to the degree to which the permanent magnet 301 is accommodated in the space SP1 sandwiched between the adjacent protruding portions 201a of the magnetic core 201. In addition, due to the driving of the stage main body 60 in the X-axis direction, the magnetic attraction force MAF also changes slightly due to the change in the positional relationship between the first unit 200 and the second unit 300. Therefore, in the present embodiment, the magnetic attraction force calculation unit 480 calculates the positional relationship between the magnetic core 201 and the permanent magnet 301 based on the actual X position, actual Y position, and actual θz position of the stage main body 60, and calculates the magnetic attraction force of the first linear motor 100a and the magnetic attraction force of the second linear motor 100b according to the calculated positional relationship.

[0081] The d-axis current command value calculation unit 430 calculates the d-axis current command value of the first linear motor 100a based on the Y-axis thrust command value of the first linear motor 100a calculated by the Y-axis thrust calculation unit 470 and the magnetic attraction force of the first linear motor 100a calculated by the magnetic attraction force calculation unit 480. In addition, the d-axis current command value calculation unit 430 calculates the d-axis current command value of the second linear motor 100b based on the Y-axis thrust command value of the second linear motor 100b calculated by the Y-axis thrust calculation unit 470 and the magnetic attraction force of the second linear motor 100b calculated by the magnetic attraction force calculation unit 480.

[0082] The first current vector control unit 440a calculates the command values of the voltages of the U-phase, V-phase, and W-phase applied to the first linear motor 100a (first UVW-phase voltage command values) based on the q-axis current command value of the first linear motor 100a calculated by the q-axis current command value calculation unit 420, the d-axis current command value of the first linear motor 100a calculated by the d-axis current command value calculation unit 430, and the actual q-axis current and actual d-axis current of the first linear motor 100a detected by a detection unit (not shown), and outputs the command values to the first motor amplifier 450a.

[0083] In addition, the second current vector control unit 440b calculates the command values of the voltages of the U-phase, V-phase, and W-phase applied to the second linear motor 100b (second UVW-phase voltage command values) based on the q-axis current command value of the second linear motor 100b calculated by the q-axis current command value calculation unit 420, the d-axis current command value of the second linear motor 100b calculated by the d-axis current command value calculation unit 430, and the actual q-axis current and actual d-axis current of the second linear motor 100b detected by a detection unit (not shown), and outputs the command values to the second motor amplifier 450b.

[0084] The first motor amplifier 450a applies voltages of the U-phase, V-phase, and W-phase (first UVW-phase voltages) to the armature modules 210U, 210V, and 210W of the first linear motor 100a, respectively, according to the voltage command values of the U-phase, V-phase, and W-phase input from the first current vector control unit 440a.

[0085] In addition, the second motor amplifier 450b applies voltages of the U-phase, V-phase, and W-phase (second UVW-phase voltages) to the armature modules 210U, 210V, and 210W of the second linear motor 100b, respectively, according to the voltage command values of the U-phase, V-phase, and W-phase input from the second current vector control unit 440b.

[0086] In this way, it is possible to adjust the X position and θz position of the stage body 60 by controlling the thrusts in the X-axis direction of the first linear motor 100a and the second linear motor 100b by using the q-axis current, and to adjust the Y position of the stage body 60 by controlling the thrusts in the Y-axis direction of the first linear motor 100a and the second linear motor 100b by using the d-axis current.

[0087] As described in detail above, according to the present embodiment, the mask stage apparatus MST includes: a stage body 60 that holds a mask MSK, which is driven in the X-axis direction as the scanning direction of the mask MSK and in the Y-axis direction orthogonal to the X-axis direction in a horizontal plane; and a pair of linear motors 100 that apply a thrust in the X-axis direction and a thrust in the Y-axis direction to the stage body 60. The pair of linear motors 100 each include a first unit having a plurality of armature modules 210U, 210V, 210W and a second unit having a magnet module 310. Among them, the plurality of armature modules 210U, 210V, 210W include a magnetic core 201 having three protrusions 201a and coils 203 wound around the magnetic core 201 and through which currents of the same potential flow. The magnet module 310 includes a plurality of permanent magnets 301 arranged while changing their polarities in the X-axis direction, and is housed between two adjacent protrusions 201a. And at least a part of each of the plurality of permanent magnets 301 is housed in a space SP1 sandwiched between two adjacent protrusions 201a of the magnetic core 201. Thus, since a magnetic attraction force MAF is generated between the first unit 200 and the second unit 300, the force generated between the first unit 200 and the second unit 300 can be controlled by controlling the d-axis current supplied to each of the pair of linear motors 100. As a result, the position of the stage body 60 in the Y-axis direction can be controlled by using the pair of linear motors 100, and there is no need to provide, for example, a voice coil motor for position control of the stage body 60. That is, not only can the position of the stage body 60 in the X-axis direction and the θz direction be controlled with a simple configuration using the pair of linear motors 100, but also the position of the stage body 60 in the Y-axis direction can be controlled. In addition, compared with a coreless linear motor, the linear motor 100 of the present embodiment can increase the magnetic flux density due to the presence of the magnetic core 201. Thus, compared with a coreless linear motor, the stage body 60 can be driven at a high speed. In this way, in the mask stage apparatus MST of the present embodiment, high-speed driving of the stage body 60 and position control of the stage body 60 in three directions (X-axis direction, Y-axis direction, θz direction) can be achieved by using a pair of linear motors 100.

[0088] In addition, according to the present embodiment, the stage body 60 can rotate about the Z-axis direction orthogonal to the X-axis direction and the Y-axis direction. That is, the stage body 60 has three degrees of freedom. Thus, the driving of the stage body 60 can be synchronized with the driving of the substrate stage.

[0089] In addition, according to the present embodiment, the pair of linear motors 100 are opposed to each other with the stage body 60 interposed therebetween in the Y-axis direction. Thus, the stage body 60 can be moved in either the +Y direction or the -Y direction.

[0090] In addition, according to the present embodiment, the direction of the thrust force in the Y-axis direction applied to the stage body 60 by one of the pair of linear motors 100 is opposite to the direction of the thrust force in the Y-axis direction applied to the stage body 60 by the other of the pair of linear motors 100. Thus, the stage body 60 can be moved in either the +Y direction or the -Y direction by controlling the magnitude relationship between the two thrust forces in opposite directions.

[0091] In addition, according to the present embodiment, the mask stage apparatus MST includes a mask stage control device 400 that generates and controls the d-axis current and the q-axis current supplied to the opposing coils 203. The mask stage control device 400 changes the thrust force in the Y-axis direction applied to the stage body 60 by changing the d-axis current. Thus, the position of the stage body 60 in the Y-axis direction can be changed.

[0092] In addition, according to the present embodiment, the mask stage control device 400 adjusts the thrust force in the Y-axis direction applied to the stage body 60 by making the d-axis current supplied to one of the pair of linear motors 100 different from the d-axis current supplied to the other of the pair of linear motors 100. Thus, the stage body 60 can be moved in either the +Y direction or the -Y direction.

[0093] In addition, according to the present embodiment, the mask stage control device 400 determines the d-axis currents supplied to the pair of linear motors 100 based on the difference between the target position of the stage body 60 in the Y-axis direction and the actual position of the stage body 60 in the Y-axis direction. Thus, the position of the stage body 60 can be made closer to the target position in the Y-axis direction.

[0094] It should be noted that, in the above embodiment, the first unit 200 is fixed to the X beam 61 and the second unit 300 is fixed to the stage body 60, but this is not limiting. Figure 6 (A) of is a top view of a modified mask stage apparatus MST-1, Figure 6 (B) of is a side view of the modified mask stage apparatus MST-1. It should be noted that, in Figure 6 (B), a cross-section including the permanent magnet 301 is shown for the second unit 300.

[0095] As Figure 6 shown in (A) of and Figure 6 (B) of, the first unit 200 may be fixed to the stage body 60 and the second unit 300 may be fixed to the X beam 61. In this case, the first unit 200 may include one or more armature module groups 211 including the armature modules 210U, 210V, and 210W. Since the other configurations are the same as those of the embodiment, detailed description thereof is omitted.

[0096] In addition, in the above-described embodiment, the case where the magnetic core 201 of the armature module 210 of the first unit 200 has three protrusions 201a and the second unit 300 has two magnet modules 310 has been described, but it is not limited thereto. For example, the magnetic core 201 of the armature module 210 of the first unit 200 may have two protrusions 201a, and the second unit 300 may have one magnet module 310. In this case, one magnet module 310 may be disposed between the two protrusions 201a. In addition, the magnetic core 201 of the armature module 210 of the first unit 200 may have N (N is a natural number of 4 or more) protrusions 201a, and the second unit 300 may have N - 1 magnet modules 310.

[0097] In addition, in the above-described embodiment, the case where the exposure apparatus 10 is an exposure apparatus that transfers the pattern of the mask MSK to the glass substrate has been described, but the exposure apparatus 10 may be, for example, a semiconductor exposure apparatus that forms the pattern formed on the photomask (or partial mask) on the wafer.

[0098] In addition, not limited to the exposure apparatus 10, the above-described embodiment may be applied to an apparatus that holds an object and performs position control in two directions intersecting in the horizontal plane.

[0099] The above-described embodiment is a preferred embodiment of the present invention. However, it is not limited thereto, and various modifications can be made without departing from the gist of the present invention.

[0100] Description of Reference Numerals

[0101] 10 Exposure apparatus

[0102] 60 Stage body

[0103] 100 Linear motor

[0104] 100a First linear motor

[0105] 100b Second linear motor

[0106] 200 First unit

[0107] 201 Magnetic core

[0108] 201a Protrusion

[0109] 203 Coil

[0110] 210, 210U, 210V, 210W Armature module

[0111] 300 Second unit

[0112] 301 Permanent magnet

[0113] 310 Magnet module

[0114] MSK mask

[0115] MST mask stage device.

Claims

1. An object holding device, comprising: A holding part for holding an object, which is driven in a first direction as the scanning direction of the object and in a second direction orthogonal to the first direction in a horizontal plane; And A pair of linear motors, each of which includes a first unit and a second unit, and applies a thrust in the first direction and a thrust in the second direction to the holding part, The first unit has a plurality of armature modules, each of the plurality of armature modules includes a magnetic core and a coil, the magnetic core has two or more protrusions protruding in the second direction, and the coil is wound around the magnetic core and has the same phase current flowing through it, The second unit has a magnet module disposed between two adjacent protrusions, and the magnet module includes a plurality of permanent magnets disposed with their polarities changing in the first direction, At least a part of each of the plurality of permanent magnets is accommodated in a space sandwiched between the two adjacent protrusions.

2. The object holding device according to claim 1, wherein The other parts of each of the plurality of permanent magnets on the side opposite to the protrusion are exposed from the space.

3. The object holding device according to claim 1 or 2, wherein The holding part can rotate about a third direction orthogonal to the first direction and the second direction.

4. The object holding device according to any one of claims 1 to 3, wherein The pair of linear motors are opposed to each other with the holding part interposed therebetween in the second direction.

5. The object holding device according to claim 4, wherein The direction of a first thrust in the second direction applied to the holding part by one of the pair of linear motors is opposite to the direction of a second thrust in the second direction applied to the holding part by the other of the pair of linear motors.

6. The object holding device according to any one of claims 1 to 5, wherein There is provided a current control unit for generating and controlling a d-axis current and a q-axis current supplied to the coil, The current control unit changes the thrust in the second direction applied to the holding part by changing the d-axis current.

7. The object holding device according to claim 6, wherein The current control unit adjusts the thrust in the second direction applied to the holding part by making the d-axis current supplied to one of the pair of linear motors different from the d-axis current supplied to the other of the pair of linear motors.

8. The object holding device according to claim 6 or 7, wherein The current control unit determines the d-axis currents supplied to the pair of linear motors respectively based on the difference between the target position of the holding part in the second direction and the actual position of the holding part in the second direction.

9. The object holding device according to any one of claims 1 to 8, wherein The second unit is fixed to the holding part.

10. The object holding device according to any one of claims 1 to 8, wherein The first unit is fixed to the holding part.

11. An exposure device, comprising: The object holding device according to any one of claims 1 to 10; And A pattern forming apparatus forms a pattern possessed by an object on an exposure object by an exposure operation of exposing the exposure object with an energy beam via the object held by the object holding device.

12. An object moving method, comprising: Arranging a pair of first units such that a first direction is orthogonal to a scanning direction of an object, each of the pair of first units having a plurality of armature modules, each of the plurality of armature modules including a magnetic core and a coil, the magnetic core having two or more protrusions protruding in the first direction, the coil being wound around the magnetic core and having a current flowing therethrough with the same phase; Arranging a pair of second units each having a magnet module including a plurality of permanent magnets arranged while changing polarities in a second direction and arranged between two adjacent protrusions, such that the second direction is parallel to the scanning direction and at least a part of each of the plurality of permanent magnets is received in a space sandwiched between the two adjacent protrusions; and Applying a thrust in the scanning direction and a thrust in a direction orthogonal to the scanning direction in a horizontal plane to a holding part holding the object by a pair of linear motors each constituted by the first unit and the second unit, to move the object in the scanning direction and the orthogonal direction.

13. An object holding system, comprising an object holding device and a control device, The object holding device includes: A holding part for holding an object, which is driven in a first direction as a scanning direction of the object and in a second direction orthogonal to the first direction in a horizontal plane; And A pair of linear motors each including a first unit and a second unit, applying a thrust in the first direction and a thrust in the second direction to the holding part, the first unit having a plurality of armature modules, each of the plurality of armature modules including a magnetic core and a coil, the magnetic core having two or more protrusions protruding in the second direction, the coil being wound around the magnetic core and having a current flowing therethrough with the same phase, the second unit having a magnet module arranged between two adjacent protrusions, the magnet module including a plurality of permanent magnets arranged while changing polarities in the first direction, The control device controls the pair of linear motors, At least a part of each of the plurality of permanent magnets is received in a space sandwiched between the two adjacent protrusions.

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