Workbench system and method for manufacturing display panel using same

Abstract

The present application relates to a stage system and a method of manufacturing a display panel, the stage system comprising: a base extending in a first direction and a second direction intersecting the first direction and having a first stroke length; and a plurality of first stages disposed on the base adjacent to each corner portion of the base and moving a second stroke length smaller than the first stroke length in the first direction and the second direction.

Description

Technical Field

[0001] Embodiments relate to a workbench system. More specifically, embodiments relate to a workbench system having improved process reliability and a method of manufacturing a display panel using the workbench system. Background Art

[0002] With the progress of information technology, the importance of display devices as a medium for connecting users and information has become increasingly evident. For example, different types of display devices are widely used in different fields. Examples of these display devices include liquid crystal displays (“LCDs”), organic light emitting displays (“OLEDs”), plasma display panels (“PDPs”), quantum dot displays, and the like.

[0003] A display device includes a display panel, and the display panel includes various layers on a substrate. As the size of the display device becomes more diverse, the size of the substrate also becomes more diverse. For example, the size of the substrate can vary from a substrate forming a display panel included in a large display device such as a television to a substrate forming a display panel included in a virtual reality (“VR”) display device.

[0004] To improve the process reliability of forming a display panel, the control accuracy of a workbench system for supporting the substrate is crucial. Summary of the Invention

[0005] Embodiments provide a high-precision workbench system.

[0006] Embodiments provide a method of manufacturing a display panel using a workbench system.

[0007] However, embodiments are not limited to those described herein. By referring to the detailed description of the present disclosure given below, the above and other embodiments will become more apparent to those of ordinary skill in the art to which the present disclosure pertains.

[0008] According to an embodiment, the workbench system may include a base extending in a first direction and a second direction intersecting the first direction and having a first stroke length, and a plurality of first stages disposed adjacent to each corner portion of the base and capable of moving in the first direction and the second direction by a second stroke length smaller than the first stroke length.

[0009] In an embodiment, the second stroke length may be nanoscale or less.

[0010] In an embodiment, the base may include at least one of granite, ceramics, and invar alloy, and each of the plurality of first stages may include: a first portion disposed on the base and including a piezoelectric actuator; and a second portion disposed on the first portion and including a porous material.

[0011] In an embodiment, a negative pressure can be provided to the second part.

[0012] In an embodiment, the workbench system may further include a second table disposed on the base and spaced apart from the plurality of first tables and including a porous material.

[0013] In an embodiment, a positive pressure can be provided to the second table.

[0014] In an embodiment, the second table may include a plurality of pads, and each of the plurality of pads may include: a main body portion disposed on the base, including a porous material, and having a receiving groove formed in a lower portion of the main body portion; and a height adjusting portion disposed in the receiving groove between the base and the main body portion and including a handle protruding from the main body portion in a plan view.

[0015] In an embodiment, the plurality of pads may be arranged in a tile shape and spaced apart from each other in a first direction and a second direction.

[0016] In an embodiment, as the height adjusting portion rotates, each of the plurality of pads may move upward or downward in a third direction intersecting the first direction and the second direction.

[0017] In an embodiment, an upper surface of the main body portion may be flat, and the remaining surfaces of the main body portion except for the upper surface of the main body portion may be coated.

[0018] In an embodiment, a second hole may be formed in the base in a third direction intersecting the first direction and the second direction, the workbench system may further include a fluid passage passing through the second hole, and a part of the positive pressure may be recovered through the fluid passage.

[0019] In an embodiment, each of the plurality of pads may include a first side, a second side, a third side, and a fourth side in a plan view, and the fluid passage may include a first fluid passage adjacent to the first side, a second fluid passage adjacent to the second side, a third fluid passage adjacent to the third side, and a fourth fluid passage adjacent to the fourth side.

[0020] In an embodiment, the workbench system may further include: a sensor that measures displacements of substrates disposed on the second table and the plurality of first tables, wherein the substrates extend in a first direction and a second direction, and wherein the sensor is spaced apart from the substrates in one of the extending directions of the substrates.

[0021] In an embodiment, a pipe fitting hole may be formed in the base in a third direction intersecting the first direction and the second direction, and the workbench system may further include a pipe passing through the pipe fitting hole and connected to the second table.

[0022] In an embodiment, a first hole may be formed in the base in a third direction intersecting the first direction and the second direction. The table system may further include a lift pin passing through the first hole, and the lift pin may move upward or downward in a third direction intersecting the first direction and the second direction.

[0023] A method of manufacturing a display panel according to an embodiment includes: placing a substrate on a table system including a base and a plurality of first stages, the base extending in a first direction and a second direction intersecting the first direction and having a first stroke length, the plurality of first stages being disposed adjacent to each corner portion of the base on the base and capable of moving in the first direction and the second direction by a second stroke length smaller than the first stroke length, the substrate extending in the first direction and the second direction; and fixing the substrate by the plurality of first stages.

[0024] In an embodiment, the second stroke length may be nanoscale or less.

[0025] In an embodiment, fixing the substrate may include: providing a negative pressure to the plurality of first stages; and adsorbing the substrate by the plurality of first stages.

[0026] In an embodiment, the table system may further include a second stage disposed on the base and spaced apart from the plurality of first stages and including a porous material, and the manufacturing method may further include planarizing the substrate after adsorbing the substrate.

[0027] In an embodiment, planarizing the substrate may include providing a positive pressure to the second stage.

[0028] In an embodiment, the table system may further include a sensor spaced apart from the substrate in one of the extending directions of the substrate and measuring the displacement of the substrate, and after adsorbing the substrate, the manufacturing method may further include: measuring the displacement of the substrate; and changing the position of the substrate when the measured displacement of the substrate is outside a selected range.

[0029] A table system according to an embodiment may include: a base extending in a first direction and a second direction and having a first stroke length; and a plurality of first stages disposed adjacent to each corner portion of the base on the base and movable in the first direction and the second direction by a second stroke length smaller than the first stroke length. By including the base, a table system with a long stroke length and a large area can be realized. For example, by including a plurality of first stages, nanoscale high resolution can be realized.

[0030] For example, the workbench system may further include a second table disposed on the base, spaced apart from the plurality of first tables, and including a porous material. A negative pressure may be provided to the plurality of first tables, and a positive pressure may be provided to the second table. Accordingly, a substrate on the workbench system may be fixed by the plurality of first tables. For example, the influence of friction with the second table may be minimized.

[0031] For example, the second table may include a plurality of pads. The plurality of pads may be spaced apart from each other in a tile form in a first direction and a second direction. Each of the plurality of pads may include a main body portion disposed on the base, including a porous material and including a receiving groove in a lower portion, and a height adjusting portion disposed in the receiving groove between the base and the main body portion and including a handle portion protruding from the main body portion in a plan view. As the height adjusting portion rotates, each of the plurality of pads may move upward or downward in a third direction. Accordingly, the flatness of the substrate suspended by the positive pressure may be precisely controlled.

[0032] For example, a second hole may be formed in the base in a third direction. The workbench system may further include a fluid passage penetrating the second hole. Accordingly, a part of the positive pressure provided to the substrate may be recovered to prevent pressure accumulation and swelling of the substrate due to positive pressure suspension.

[0033] For example, in an embodiment, the workbench system may further include a sensor disposed on the plurality of first tables and the second table, spaced apart from the substrate in one of the extending directions of the substrate, and measuring the displacement of the substrate. In a case where the measured displacement of the substrate is outside a predetermined range, the manufacturing method may further include changing the position of the substrate in a case where the measured displacement of the substrate is outside a selected range. Accordingly, errors may be additionally compensated with high precision. For example, the manufacturing method may provide a small displacement that is difficult to achieve only with the base. Description of the Drawings

[0034] Exemplary, non-limiting embodiments will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings. [[ID=*]] [[ID=*]]

[0035] [[ID=*]] Figure 1 is a perspective schematic view of a workbench system according to an embodiment. [[ID=*]] [[ID=*]]

[0036] [[ID=*]] Figure 2 is [[ID=*]] Figure 1 an enlarged schematic plan view of region A of [[ID=*]] [[ID=*]]

[0037] [[ID=*]] Figure 3 is a view showing a plurality of first tables included in the [[ID=*]] Figure 1 workbench system of [[ID=*]] [[ID=*]]

[0038] [[ID=*]] Figure 4 is [[ID=*]] Figure 3 a schematic front view of region B of [[ID=*]]

[0039] Figure 5 is a schematic view showing a first hole and a second hole defined (or formed) in a Figure 1 workbench system.

[0040] Figure 6 is a schematic cross-sectional view taken along line I-I' of a Figure 5 workbench system.

[0041] Figure 7 , Figure 8 and Figure 9 are schematic views showing a lifting pin included in a Figure 1 workbench system.

[0042] Figure 10 are schematic views showing a piezoelectric actuator included in a Figure 1 workbench system.

[0043] Figure 11 , Figure 12 , Figure 13 , Figure 14 , Figure 15 and Figure 16 are schematic views showing a method for manufacturing a display panel according to another embodiment.

[0044] Figure 17 is a schematic cross-sectional view of a pixel manufactured by a method for manufacturing a display panel using a Figure 1 workbench system and Figure 11 , Figure 12 , Figure 13 , Figure 14 , Figure 15 and Figure 16 workbench system. DETAILED DESCRIPTION

[0045] In the following description, for the purposes of illustration, numerous specific details are set forth in order to provide a thorough understanding of the various embodiments or implementations of the present invention. As used herein, "embodiment" and "implementation" are interchangeable terms, which are non-limiting examples of the apparatus or method disclosed herein. However, it is apparent that the various embodiments may be practiced without these specific details or with one or more equivalent arrangements. Here, the various embodiments are not necessarily exclusive or restrictive of the present disclosure. For example, the specific shapes, configurations, and characteristics of an embodiment may be used or implemented in another embodiment.

[0046] Unless otherwise specified, the illustrated embodiments should be understood to provide features of the present invention. Accordingly, unless otherwise specified, the features, components, modules, layers, films, panels, regions, and / or aspects, etc. (hereinafter, individually or collectively referred to as "elements") of the various embodiments may be combined, separated, interchanged, and / or rearranged in other ways without departing from the scope of the present invention.

[0047] The use of cross-hatching and / or shading in the drawings is generally provided to clarify the boundaries between adjacent elements. Accordingly, unless specified, the presence or absence of cross-hatching or shading does not convey or indicate any preference or requirement for a particular material, material property, dimension, ratio, commonality between the elements shown, and / or any other characteristic, attribute, property, etc. of the elements. Additionally, in the drawings, the dimensions and relative dimensions of the elements may be exaggerated for clarity and / or descriptive purposes. When an embodiment can be implemented differently, a particular process order may be performed differently from the order described. For example, two consecutively described processes may be performed substantially simultaneously or in an order opposite to the order described. Additionally, the same reference numerals denote the same elements.

[0048] When an element or layer is referred to as being "on", "connected to", or "coupled to" another element or layer, it may be directly on, directly connected to, or directly coupled to the other element or layer, or there may be intervening elements or layers. However, when an element or layer is referred to as being "directly on", "directly connected to", or "directly coupled to" another element or layer, there are no intervening elements or layers. To this end, the term "connected" may refer to physical connection, electrical connection, and / or fluid connection with or without intervening elements. Additionally, the axes of the first direction DR1, the second direction DR2, and the third direction DR3 are not limited to the three axes such as the X-axis, Y-axis, and Z-axis of a rectangular coordinate system and may be interpreted in a broader sense. For example, the axes of the first direction DR1, the second direction DR2, and the third direction DR3 may be perpendicular to each other or may represent different directions that are not perpendicular to each other. For the purposes of the present disclosure, "at least one of A and B" may be understood to mean only A, only B, or any combination of A and B. Additionally, "at least one of X, Y, and Z" and "at least one selected from the group consisting of X, Y, and Z" may be interpreted to mean only X, only Y, only Z, or any combination of two or more of X, Y, and Z. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items.

[0049] Although terms such as "first", "second" etc. may be used herein to describe various types of elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. Thus, a first element discussed below may be termed a second element without departing from the teachings of the present disclosure.

[0050] For descriptive purposes, spatial relative terms such as "below", "beneath", "under", "lower", "above", "upper", "on", "over", "higher", "side" (e.g., as in "sidewall") etc. may be used herein and thereby to describe the relationship of one element to another(s) as shown in the figures. In addition to the orientation depicted in the figures, the spatial relative terms are intended to encompass different orientations of the device in use, operation and / or manufacture. For example, if the device in the figures is turned over, an element described as "below" or "beneath" another element or feature will then be oriented "above" the other element or feature. Thus, the term "below" can encompass both an orientation of above and below. Further, the device may be otherwise oriented (e.g., rotated 90 degrees or at other orientations), and thus, the spatial relative descriptors used herein should be interpreted accordingly.

[0051] The terms used herein are for the purpose of describing particular embodiments and are not intended to be limiting. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. Further, the terms "comprising", "comprises", "including" and / or "includes" when used in this specification, specify the presence of the stated features, integers, steps, operations, elements, components, and / or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof. It should also be noted that as used herein, the terms "substantially", "about" and other similar terms are used as approximate terms and not as terms of degree, and are thus used to interpret the inherent deviations of measured, calculated and / or provided values that would be recognized by a person of ordinary skill in the art.

[0052] Various embodiments are described herein with reference to cross-sectional views and / or exploded views that are schematic diagrams of embodiments and / or intermediate structures. Accordingly, variations in the shape of the figures due to, for example, manufacturing techniques and / or tolerances are to be expected. Thus, the embodiments disclosed herein should not necessarily be construed as limited to the shape of the specific regions shown, but should include, for example, deviations in shape resulting from manufacturing. In this manner, the regions shown in the figures are essentially schematic, and the shapes of these regions may not reflect the actual shape of the regions of the device and thus are not necessarily intended to be limiting.

[0053] As is customary in the art, some embodiments are described and illustrated in the drawings with respect to functional blocks, units, and / or modules. Those skilled in the art will understand that these blocks, units, and / or modules are physically implemented by electrical circuits (or optical circuits) such as logic circuits, discrete components, microprocessors, hardwired circuits, memory elements, wiring connectors, etc., which can be formed using semiconductor-based manufacturing technologies or other manufacturing technologies. In cases where the blocks, units, and / or modules are implemented by a microprocessor or other similar hardware, they can be programmed and controlled using software (e.g., microcode) to perform the various functions discussed herein, and can be selectively driven by firmware and / or software. It is also contemplated that each block, unit, and / or module can be implemented by dedicated hardware, or can be implemented as a combination of dedicated hardware for performing some functions and a processor (e.g., one or more programmed microprocessors and associated circuits) for performing other functions. In addition, without departing from the scope of the present invention, each block, unit, and / or module in some embodiments can be physically separated into two or more interacting and discrete blocks, units, and / or modules. Further, without departing from the scope of the present invention, the blocks, units, and / or modules of some embodiments can be physically combined into more complex blocks, units, and / or modules.

[0054] Figure 1 is a schematic perspective view of a workbench system according to an embodiment. Figure 2 is Figure 1 an enlarged schematic plan view of region A of

[0055] Referring Figure 1 , in an embodiment, the workbench system according to the embodiment can include a base 100, a first stage 200, and a second stage 300.

[0056] For example, the base 100 can be used in the manufacturing process of a display device. For example, the base 100 can be used in an inkjet process during the manufacturing process of a display device. For another example, the base 100 can be used in an exposure process during the manufacturing process of a display device. However, the embodiments are not limited thereto. For example, the base 100 can be used in various processes that require precise control during the manufacturing process of a display device.

[0057] For example, the base 100 can be a long-stroke stage. For example, the base 100 can have a multi-layer structure. For example, a stage (e.g., an upper stage) that can move in a second direction DR2 can be disposed on a stage (e.g., a lower stage) that can move in a first direction DR1.

[0058] For example, the second direction DR2 can be perpendicular to the first direction DR1. However, the embodiments are not limited thereto. For example, a stage movable in the first direction DR1 can be provided on a stage movable in the second direction DR2. For another example, the base station 100 can have a single-layer structure.

[0059] For example, the term "upper" can mean above in the third direction DR3. For example, the third direction DR3 can be perpendicular to the first direction DR1 and the second direction DR2 respectively. Similar to the above, the term "lower" can mean below in the direction opposite to the third direction DR3.

[0060] For example, the upper stage and the lower stage can include substantially the same components. For example, the base station 100 can include a substrate, a moving frame, a linear motor, a linear motor track, a linear scale, and at least one air bearing. For example, each of the upper stage and the lower stage can include a substrate, a linear motor, a linear motor track, a linear scale, and an air bearing. Hereinafter, for ease of explanation, the description will focus on the lower stage movable in the first direction DR1.

[0061] For example, the substrate can extend in the first direction DR1 and the second direction DR2. For example, the substrate can define a recessed space from the upper surface to the lower surface of the substrate.

[0062] In an embodiment, the base station 100 can include granite, ceramics, invar, etc. However, the embodiments are not limited thereto. For example, the base station 100 can include various materials.

[0063] The moving frame can be provided on the substrate. A part of the moving frame can be accommodated in the space of the substrate. The moving frame can be spaced apart from the substrate in the third direction DR3. The moving frame can be capable of moving in the first direction DR1 or in the direction opposite to the first direction DR1. For example, the moving frame can have a rectangular planar shape. However, the embodiments are not limited thereto. For example, the moving frame can have various shapes, sizes, etc.

[0064] The linear motor can be provided on one side of the moving frame. For example, the linear motor can be provided on the opposite side of the moving frame. The linear motor can be fixed to the moving frame. For example, the linear motor can include a coil.

[0065] The linear motor track can be provided on the substrate. The linear motor track can extend in the first direction DR1. The linear motor track can define a space in which a part of the linear motor can be accommodated. The linear motor track can not be in contact with the linear motor. For example, the linear motor track and the linear motor can be spaced apart from each other. For example, the linear motor track can include a magnet.

[0066] The linear motor can be capable of moving along the linear motor track in the first direction DR1 or in the direction opposite to the first direction DR1. For example, the linear motor and the linear motor track can move the moving frame. For example, the linear motor and the linear motor track can use electromagnetic force to move the moving frame. The moving frame can be capable of moving in the first direction DR1 or in the direction opposite to the first direction DR1 by the linear motor and the linear motor track. For example, the moving frame can move in a straight line by the linear motor and the linear motor track.

[0067] A linear scale (or encoder) can be provided on the substrate. For example, the linear scale can be provided under the moving frame. The linear scale can extend in the first direction DR1. The linear scale can detect information such as the position, moving distance, and moving speed of the linear motor. For example, the linear scale can provide feedback of the information.

[0068] Air bearings can be provided on the sides of the moving frame. For example, air bearings can be provided on the bottom and / or sides of the moving frame. For example, the air bearings can be fixed to the moving frame within the space defined by the substrate. For example, the air bearings can discharge air to suspend the moving frame from the substrate.

[0069] However, the embodiments are not limited thereto. For example, the base 100 can include one, two, three, five or more air bearings. For another example, the base 100 can further include other components, or some of the components can be omitted.

[0070] In an embodiment, the first stage 200 can be arranged on the base 100 and can be adjacent to each corner portion of the base 100.

[0071] In an embodiment, the base 100 can have a first stroke length, and each of the first stages 200 can have a second stroke length smaller than the first stroke length. As described above, for example, the base 100 can be a large-stroke-length stage, and each of the first stages 200 can be a relatively small-stroke-length stage.

[0072] In the case of the workbench system according to the comparative example, the workbench system can include only a large-stroke-length stage or a small-stroke-length stage.

[0073] For example, in the case where the workbench system includes only a large-stroke-length stage, it may be difficult to achieve nano-scale micro-displacement or high precision. For example, for a workbench system with a stroke length of about several thousand millimeters (mm), the compensation accuracy can be only about several micrometers (1 / 1000 m). Therefore, it may be difficult to be used in the manufacturing process of display devices that require very high precision.

[0074] In the case where the stage system includes only stages with small stroke lengths, it may be difficult to fabricate over a large area. For example, a small stroke length stage may include a piezoelectric actuator (e.g., see Figure 10 ), and a flexure motion guide (e.g., a flexure hinge). For example, a flexure motion guide may refer to a displacement amplifier that easily generates parasitic motion. For example, a flexure motion guide may amplify the motion of a piezoelectric actuator in angstrom (Å) units into motion in micrometer to nanometer units. However, due to design difficulties, it may be difficult to fabricate flexure motion guides over a large area.

[0075] A stage system according to an embodiment may have a structure in which a first stage 200 is disposed on a base stage 100. The base stage 100 may have a first stroke length, and each of the first stages 200 may have a second stroke length that is smaller than the first stroke length. In an embodiment, the second stroke length may be nanoscale or less. Thus, different from a stage system according to a comparative example, a stage system with a large stroke length, a large area, and high precision can be achieved. For example, it may move by about several meters (m) through the base stage 100, it may move by about several millimeters (mm) through the first stage 200, and the first stage 200 may compensate for an error of about several nanometers (nm).

[0076] For example, translational motion errors (e.g., flatness error, straightness error, etc.) may occur along axes parallel to each of the first direction DR1, the second direction DR2, and the third direction DR3. For another example, rotational motion errors (e.g., yaw error, roll error, pitch error, etc.) may occur along axes parallel to each of the first direction DR1, the second direction DR2, and the third direction DR3.

[0077] In an embodiment, a second stage 300 may be disposed on the base stage 100 so as to be spaced apart from the first stage 200 by a gap G (e.g., Figure 2 G1 and G2).

[0078] In an embodiment, the second stage 300 may include a gasket (e.g., Figure 2310, 320, and 330). For example, the second stage 300 may include a first pad 310, a second pad 320, and a third pad 330. For example, the first pad 310 may be disposed on the base 100 and spaced apart from any one of the first stages 200 in a first direction DR1, for example, by a second gap G2. The third pad 330 may be disposed on the base 100 and spaced apart from any one of the first stages 200 in a second direction DR2, for example, by a first gap G1. The second pad 320 may be disposed on the base 100 and spaced apart from any one of the first stages 200 in a direction between the first direction DR1 and the second direction DR2.

[0079] In an embodiment, the pads may be spaced apart from each other in the first direction DR1, for example, by a second gap G2 and / or in the second direction DR2, for example, by a first gap G1, and arranged in a tile shape. For example, the first pad 310 and the second pad 320 may be arranged to be spaced apart from each other in the second direction DR2, for example, by a first gap G1. The second pad 320 and the third pad 330 may be arranged to be spaced apart from each other in the first direction DR1, for example, by a second gap G2. For example, the pads may be repeatedly arranged to be spaced apart from each other along the first direction DR1, and the pads may be repeatedly arranged to be spaced apart from each other along the second direction DR2.

[0080] In an embodiment, a positive pressure caused by air released, for example, in a third direction DR3 may be provided to the second stage 300. In an embodiment, the second stage 300 may include a porous material. In an embodiment, the porous material may be included in a main body portion (e.g., Figure 4 410) included in.

[0081] For example, the porous material may include a metal. For example, the porous material may be formed by controlling (or adjusting) the porosity of alumina. However, the embodiment is not limited thereto.

[0082] Figure 3 is a schematic diagram showing a first stage included in Figure 1 a workbench system. Figure 4 is Figure 3 a schematic front view of region B of.

[0083] Referring to Figure 3 and Figure 4 , the first stage 200 and the second stage 300 will be described in more detail.

[0084] Referring to Figure 1 , Figure 2 and Figure 3 , in an embodiment, each of the first stages 200 may include a first portion 210 and a second portion 220.

[0085] In an embodiment, the first part 210 may be disposed on the base 100 and may include a piezoelectric actuator (e.g., see Figure 10 ). As described above, the piezoelectric actuator may have various structures, shapes, arrangements, etc.

[0086] In an embodiment, the second part 220 may be disposed on the first part 210. In an embodiment, a negative pressure caused by air flowing in a direction opposite to the third direction DR3 may be provided to the second part 220. In an embodiment, the second part 220 may include a porous material.

[0087] For example, the porous material may include a metal. For example, the porous material may be formed by controlling (or adjusting) the porosity of alumina. However, the embodiment is not limited thereto.

[0088] For example, the porous materials included in the first stage 200 and the second stage 300 may have the same type. However, the embodiment is not limited thereto. For example, the porous materials included in the first stage 200 and the second stage 300 may have different types.

[0089] Reference Figure 1 、 Figure 2 and Figure 4 , in an embodiment, the second stage 300 may include pads (e.g., Figure 2 the first pad 310, the second pad 320, and the third pad 330). In an embodiment, each of the pads may include a main body part 410 and a height adjustment part 400.

[0090] In an embodiment, the main body part 410 may be disposed on the base 100, and a receiving groove AG may be defined (or formed) in the lower part.

[0091] In an embodiment, the main body part 410 may include a porous material. For example, the porous material may function such that air can freely enter and leave (or freely flow) through the pores, so that the remaining surfaces of the main body part 410 except the upper surface (e.g., the lower surface facing the upper surface in a direction opposite to the third direction DR3 and the side surfaces intersecting each of the upper surface and the lower surface) may be coated.

[0092] In an embodiment, the height adjustment part 400 may be disposed in the receiving groove AG between the base 100 and the main body part 410. For example, the receiving groove AG may define a space in which the height adjustment part 400 is disposed.

[0093] As Figure 2 and Figure 4As shown, in an embodiment, when viewed on a plane defined by a first direction DR1 and a second direction DR2 (or in a plan view), the height adjustment portion 400 may have a handle (or knob) that may include projections from the main body portion 410 (see Figure 2 310, 320, and 330). For example, the handle may project a selected length PP from an end of the main body portion 410. Thus, the handle may be rotated clockwise or counterclockwise from the outside.

[0094] In an embodiment, as the height adjustment portion 400 rotates, each of the pads may move upward in a third direction DR3 or may move downward in a direction opposite to the third direction DR3.

[0095] For example, the height adjustment portion 400 may include a leveling bolt. The second stage 300 may be lifted and lowered only by the leveling bolt. For example, the second stage 300 may not interfere with the base 100.

[0096] Figure 5 is a schematic diagram showing the first hole and the second hole defined (or formed) in the Figure 1 workbench system. Figure 6 is a schematic cross-sectional view taken along the line I-I' of Figure 5 .

[0097] Referring to Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 and Figure 6 , in an embodiment, a pipe fitting hole HO3 may be defined (or formed) in the base 100 in the third direction DR3.

[0098] In an embodiment, the second stage 300 may be connected to a pipe 600 disposed in the pipe fitting hole HO3. The pipe 600 may be connected to a pump or the like.

[0099] In an embodiment, the second unit 300 may include pads (e.g., the second pad 320, the fourth pad 340, and the sixth pad 360). Each of the pads may be individually connected to a pump or the like. For example, the second pad 320 may be connected to the first pipe 620 through an assembly portion 500 (e.g., the first assembly portion 520). The fourth pad 340 may be connected to the second pipe 640 through an assembly portion 500 (e.g., the second assembly portion 540). The sixth pad 360 may be connected to the third pipe 660 through an assembly portion 500 (e.g., the third assembly portion 560). However, the embodiment is not limited thereto. For example, when the base 100 includes metal, each of the first pipe 620, the second pipe 640, and the third pipe 660 may be connected to the metal by welding. For example, the assembly portions 500 (e.g., the first assembly portion 520, the second assembly portion 540, and the third assembly portion 560) of the connecting pipe 600 and the second unit 300 may be omitted.

[0100] The pipe 600 may be connected only to the second unit 300 and may not interfere with the base 100.

[0101] Referring again to Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 and Figure 5 , in an embodiment, a first hole HO1 and a second hole HO2 may be defined (or formed) in the base 100. Each of the first hole HO1 and the second hole HO2 may pass through the base 100 in the third direction DR3.

[0102] For example, the first hole HO1 may be a hole for defining a space for setting a lifting pin (e.g., the lifting pin 700 in Figure 7 ), and the second hole HO2 may be a hole for defining a fluid passage (e.g., a space for placing a pipe through which positive pressure is recovered). The fluid passage may overlap the second hole HO2 on a plane.

[0103] As Figure 2 shown, in an embodiment, each of the pads on a plane may include a first side S1, a second side S2, a third side S3, and a fourth side S4. For example, the fluid passage may include a first fluid passage FP1 adjacent to the first side S1, a second fluid passage FP2 adjacent to the second side S2, a third fluid passage FP3 adjacent to the third side S3, and a fourth fluid passage FP4 adjacent to the fourth side S4. However, the embodiment is not limited thereto. For example, two or more fluid passages may be arranged adjacent to each side of the pad. For example, the fluid passage may further include a fifth fluid passage adjacent to the first side S1, a sixth fluid passage adjacent to the second side S2, a seventh fluid passage adjacent to the third side S3, and an eighth fluid passage adjacent to the fourth side S4.

[0104] For example, due to the positive pressure, a bulging phenomenon may occur in the substrate. The bulging phenomenon may mean a state where the horizontal levels of the central part and the edge part of the substrate are different. The edge part may surround the central part.

[0105] To prevent the bulging phenomenon (or to improve the flatness of the substrate), the fluid channels may recover a part (or some) of the positive pressure. Thus, air at a constant flow rate may be supplied to each of the pads.

[0106] Figure 7 、 Figure 8 and Figure 9 are schematic views showing the lift pins included in the Figure 1 workbench system. For example, Figure 7 is a schematic perspective view of the lift pin. Figure 8 and Figure 9 are a schematic cross-sectional view of the lift pin being raised and a schematic cross-sectional view of the lift pin being lowered, respectively.

[0107] Referring to Figure 7 、 Figure 8 and Figure 9 , in an embodiment, the lift pin 700 may pass through the first hole HO1. In an embodiment, the lift pin 700 may move up and down in the third direction DR3. In another example, the lift pin 700 may descend in a direction opposite to the third direction DR3.

[0108] Figure 10 are schematic views showing the piezoelectric actuator included in the Figure 1 workbench system.

[0109] Referring to Figure 1 and Figure 10 , each of the first stages 200 may include a piezoelectric actuator PAC. The piezoelectric actuator PAC may have high control accuracy and a fast response time. For example, the piezoelectric actuator PAC may include a piezoelectric element PD and a shaft SH. For example, referring to Figure 10 parts (A), (B), and (C) in, when a voltage is applied to the piezoelectric element PD and the piezoelectric element PD expands, the level of the upper surface may change as the shaft SH rotates. When the piezoelectric element PD is fully expanded, the shaft may return to its initial position by quickly contracting. However, this is an example, and the piezoelectric actuator PAC may have various structures, arrangements, etc.

[0110] Referring to the above Figure 1 、 Figure 2 、 Figure 3 、 Figure 4 、 Figure 5 、 Figure 6 、 Figure 7 、 Figure 8, Figure 9 and Figure 10 The workbench system described is an example, and the workbench system according to the embodiment may further include various components.

[0111] In an embodiment, the workbench system may further include a sensor for measuring the displacement of the substrate (for example, see Figure 13 and Figure 14 800).

[0112] In an embodiment, the substrate (for example, Figure 11 substrate SUB) may be disposed on the first stage 200 and the second stage 300. In an embodiment, the substrate may extend in a first direction DR1 and a second direction DR2. Processing processes for manufacturing a display device (for example, inkjet, exposure, etc.) may be performed on the substrate.

[0113] In an embodiment, the sensor may be arranged to be spaced apart from the substrate in one of the extending directions of the substrate (for example, Figure 11 substrate SUB) (for example, the first direction DR1 or the second direction DR2).

[0114] A detailed description of the sensor will be described below with reference to Figure 14 description.

[0115] For example, translational motion errors and / or rotational motion errors may occur during the process of manufacturing a display device. For example, the linear scale included in the base 100 may detect translational motion errors and provide feedback.

[0116] In the case of a workbench system according to a comparative example including only a linear scale, the feedback may be inaccurate because the distance from the linear scale to the substrate on the workbench system is large. For example, the processing process may be performed in an unintended area of the substrate. Therefore, defects (for example, dark spots, color mixing, etc.) may occur in the display device, or the display quality may deteriorate.

[0117] However, the workbench system according to the embodiment may further include a sensor (for example, Figure 13 and Figure 14 800). The sensor may detect and feedback information such as the position of the moving frame. For example, the sensor may detect and feedback translational motion errors and / or rotational motion errors. Therefore, the process reliability can be improved and the display quality of the display device can be improved.

[0118] As described above, the workbench system according to the embodiment may include a base 100 extending in a first direction DR1 and a second direction DR2 and having a first stroke length, and a first stage 200 disposed adjacent to each corner portion of the base 100 on the base 100 and movable in the first direction DR1 and the second direction DR2 by a second stroke length smaller than the first stroke length. A workbench system with a long stroke length and a large area can be achieved by providing the base 100. For example, nanoscale high resolution can be achieved by providing the first stage 200.

[0119] For example, the workbench system may further include a second stage 300 disposed on the base 100 to be spaced apart from the first stage 200 and including a porous material. Negative pressure may be provided to the first stage 200, and positive pressure may be provided to the second stage 300. Accordingly, a substrate on the workbench system may be fixed by the first stage 200. For example, the influence of friction with the second stage 300 may be minimized.

[0120] For example, the second stage 300 may include pads (e.g., a first pad 310, a second pad 320, and a third pad 330). The pads may be spaced apart from each other in the first direction DR1 and the second direction DR2 in a tile form. Each of the pads may include a main body portion 410 and a height adjustment portion 400. The main body portion 410 is disposed on the base 100, includes a porous material, and defines a receiving groove AG in a lower portion. The height adjustment portion 400 is disposed in the receiving groove AG between the base 100 and the main body portion 410, and includes a handle portion protruding from the main body portion 410 when viewed in a plane defined by the first direction DR1 and the second direction DR2. As the height adjustment portion 400 rotates, each of the pads may move upward or downward in a third direction DR3. Accordingly, the flatness of the substrate levitated by positive pressure may be precisely controlled.

[0121] For example, a second hole HO2 may be defined (or formed) in the base 100 in the third direction DR3. The workbench system may further include a fluid passage penetrating the second hole HO2. Accordingly, a part of the positive pressure provided to the substrate may be recovered to prevent pressure accumulation and swelling of the substrate due to positive pressure levitation.

[0122] For example, in an embodiment, the workbench system may further include sensors (e.g., Figure 13 and Figure 14The sensor is disposed on the first stage 200 and the second stage 300, and is configured to be spaced apart from the substrate in one of the extending directions of the substrate, and to measure the displacement of the substrate. When the measured displacement of the substrate is outside the selected range, the manufacturing method may further include changing the position of the substrate when the measured displacement of the substrate is outside the selected range. Accordingly, errors can be additionally compensated with high precision. For example, the manufacturing method can provide a small displacement that is difficult to achieve only with the base 100.

[0123] Figure 11 , Figure 12 , Figure 13 , Figure 14 , Figure and ​ are schematic views showing a method of manufacturing a display panel according to another embodiment.

[0124] Reference ​ , ​ , ​ , ​ , ​ and ​ The method of manufacturing a display panel described above can use the workbench system described above with reference to ​ , ​ , ​ , ​ , ​ , ​ , ​ , ​ , ​ and ​ described according to an embodiment. Accordingly, in the following, overlapping descriptions of the workbench system according to an embodiment will be omitted or simplified.

[0125] The method of manufacturing a display panel according to an embodiment may include the following steps. Referring to ​ , ​ and ​ , in an embodiment, a substrate SUB may be disposed on the workbench system (S100), and the first stage 200 may be fixed to the substrate SUB (S200).

[0126] For example, the substrate SUB may be supported (or disposed) by the lift pins 700 passing through the base 100.

[0127] In an embodiment, the step of fixing the substrate SUB may further include providing a negative pressure to the first stage 200 and adsorbing the substrate SUB through the first stage 200 and flattening the substrate SUB. In an embodiment, flattening the substrate SUB may include providing a positive pressure to the second stage 300.

[0128] Therefore, the substrate SUB can be fixed by the first stage 200 and can be not shaken during the execution of the processing process. For example, the influence of the friction with the second stage 300 can be minimized.

[0129] Reference ​ and ​ , in an embodiment, the displacement of the substrate SUB can be measured (S300).

[0130] For example, the stage system can have a sensor 800. For example, the stage system can include a first sensor 810, a second sensor 820, and a third sensor 830.

[0131] For example, two sensors 800 can be arranged in a direction parallel to the moving direction of the stage system, and one sensor can be arranged in a direction intersecting the moving direction of the stage system.

[0132] For example, as ​ depicted in, the base 100 included in the stage system can move along the second direction DR2. For example, the first sensor 810 and the second sensor 820 can be arranged in a direction parallel to the moving direction, and the third sensor 830 can be arranged in a direction intersecting the moving direction.

[0133] For example, the first sensor 810 and the second sensor 820 can be provided at opposite ends of the stage system. The third sensor 830 can be arranged to enter and retreat in a direction intersecting the moving direction. Therefore, the data of the three axes such as the X-axis, Y-axis, and Z-axis of the rectangular coordinate system can be protected or ensured.

[0134] For example, the sensor 800 can be an interferometer system. The interferometer can measure the movement of the stage system by installing a mirror on the stage system, irradiating a laser beam onto the mirror, and measuring the change in the wave frequency of the light reflected by the mirror and returned (e.g., Doppler effect).

[0135] For example, the mirror can be provided on one side of the first part 210 included in the first stage 200. As described above, the first part 210 can correspond to the mover.

[0136] For example, the sensor 800 can be provided adjacent to the stage system. For example, in the case where other components are present in the path through which the laser beam is emitted and received, measurement errors may occur due to interference with the components, and collisions with the components may cause damage to the mirror and / or the sensor 800. For example, the sensor 800 can be provided adjacent to the stage system to prevent these problems.

[0137] However, this is an example, and the implementation is not limited thereto. For example, the number of sensors 800 can vary. For example, considering the travel length of the workbench system, there can be four or more sensors 800. For another example, there can be one or two sensors 800.

[0138] Reference ​ , in an embodiment, when the measured displacement of the substrate SUB is outside the selected range, the position of the substrate SUB can be changed (S400). For example, by including the base 100, a workbench system with a long travel length and a large area can be achieved (S500). For example, by including the first stage 200, nanoscale high resolution can be achieved, and the substrate SUB can be moved with a small displacement (S400).

[0139] When the measured displacement of the substrate SUB is outside the selected range, it can also include the step of changing the position of the substrate SUB. Therefore, errors can be additionally compensated with high precision. For example, it can be moved with a small displacement that is difficult to achieve with the base 100.

[0140] ​ is a workbench system using ​ and ​ , ​ , ​ , ​ , ​ and ​ A schematic cross-sectional view of a pixel manufactured by a manufacturing method of a display panel.

[0141] Reference ​ , the pixel PX can include a base substrate BS, a buffer layer BFR, a transistor TR, a gate insulating layer GI, an interlayer insulating layer ILD, a via insulating layer VIA, a light-emitting element EL, and a pixel defining layer PDL. The transistor TR can include an active layer ACT, a gate electrode GE, a source electrode SE, and a drain electrode DE. The light-emitting element EL can include a first electrode AE, a light-emitting layer EML, and a second electrode CE. The display area can include a light-emitting area PA and a non-emitting area NPA. The transistor TR and the light-emitting element EL can be disposed in the light-emitting area PA. The non-emitting area NPA can surround the light-emitting area PA in a plan view. Here, the plan view can mean when observed in the third direction DR3.

[0142] The base substrate BS can include glass, quartz, plastic, etc. In an embodiment, the base substrate BS can have the characteristics of being flexible, bendable, or rollable.

[0143] The buffer layer BFR can be disposed on the base substrate BS. The buffer layer BFR can include an inorganic insulating material. For example, the buffer layer BFR can include silicon oxide, silicon nitride, silicon oxynitride, etc. The buffer layer BFR can be used to block impurities so that the active layer ACT of the transistor TR can be not damaged by impurities diffused from the base substrate BS.

[0144] The active layer ACT can be disposed on the buffer layer BFR. In an embodiment, the active layer ACT can include a silicon semiconductor. For example, the active layer ACT can include amorphous silicon or polycrystalline silicon. In another embodiment, the active layer ACT can include an oxide semiconductor. For example, the active layer ACT can include zinc oxide, zinc-tin oxide, zinc-indium oxide, indium oxide, titanium oxide, indium-gallium-zinc oxide, indium-zinc-tin oxide, etc.

[0145] The gate insulating layer GI can be disposed on the active layer ACT. The gate insulating layer GI can include an inorganic insulating material. For example, the gate insulating layer GI can include silicon oxide, silicon nitride, silicon oxynitride, titanium oxide, tantalum oxide, etc. The gate insulating layer GI can be used to electrically insulate the active layer ACT and the gate electrode GE from each other.

[0146] The gate electrode GE can be disposed on the gate insulating layer GI. The gate electrode GE can include a conductive material. For example, the gate electrode GE can include a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. A gate signal can be applied to the gate electrode GE. The gate signal can turn on or off the transistor TR to adjust the conductivity of the active layer ACT.

[0147] The interlayer insulating layer ILD can be disposed on the gate electrode GE. The interlayer insulating layer ILD can include an organic insulating material and / or an inorganic insulating material. The interlayer insulating layer ILD can be used to electrically insulate the source electrode SE and the drain electrode DE from the gate electrode GE.

[0148] The source electrode SE and the drain electrode DE can be disposed on the interlayer insulating layer ILD. Each of the source electrode SE and the drain electrode DE can include a conductive material. For example, each of the source electrode SE and the drain electrode DE can include a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. Each of the source electrode SE and the drain electrode DE can be in electrical contact with the active layer ACT through a contact hole passing through the interlayer insulating layer ILD and the gate insulating layer GI.

[0149] The via insulating layer VIA can be disposed on the source electrode SE and the drain electrode DE. The via insulating layer VIA can include an organic insulating material. For example, the via insulating layer VIA can include polyacrylic resin, polyimide resin, acrylic resin, etc. Thus, the top surface of the via insulating layer VIA can be substantially flat.

[0150] The first electrode AE may be disposed on the via insulating layer VIA. The first electrode AE may include a conductive material. For example, the first electrode AE may include a metal, an alloy, a conductive metal oxide, a transparent conductive material, etc. The first electrode AE may be in electrical contact with the source electrode SE or the drain electrode DE through a contact hole penetrating the via insulating layer VIA. In an embodiment, the first electrode AE may be referred to as an anode electrode.

[0151] The pixel defining layer PDL may be disposed on the first electrode AE. The pixel defining layer PDL may include an organic insulating material. For example, the pixel defining layer PDL may include a polyacryloyl-based compound or a polyimide-based compound. The pixel defining layer PDL may partition (or define) the light emitting region PA of each of the pixels PX. The pixel defining layer PDL may include a pixel opening exposing the first electrode AE.

[0152] The light emitting layer EML may be disposed in the pixel opening on the first electrode AE. The light emitting layer EML may include an organic light emitting material. In an embodiment, the light emitting layer EML may have a multi-layer structure including various functional layers. In an embodiment, the light emitting layer EML may include at least one of a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer.

[0153] The second electrode CE may be disposed on the light emitting layer EML and may cover the pixel defining layer PDL. In an embodiment, the second electrode CE may be referred to as a cathode electrode.

[0154] In an embodiment, the light emitting layer EML may be formed by depositing a deposition material on the first electrode AE. A workbench system (e.g., ​ workbench system) may be used.

[0155] However, the embodiment is not limited thereto, and the workbench system may be used in various processes that require positioning and movement of a substrate (e.g., ​ base substrate BS or ​ , ​ , ​ , ​ and ​ substrate SUB).

[0156] The workbench system according to an embodiment may be applied to a process of manufacturing a display device included in a computer, a laptop, a mobile phone, a smart phone, a smart tablet, a PMP, a PDA, an MP3 player, etc.

[0157] The above description is an example of the technical features of the present disclosure, and those skilled in the art to which the present disclosure pertains will be able to make various modifications and variations. Therefore, the above embodiments may be implemented alone or in combination with each other. [[ID=�6]]

[0158] Upon concluding the detailed description, those skilled in the art will understand that many variations and modifications can be made to the embodiments without substantially departing from the principles, spirit, and scope of the present disclosure. Accordingly, the disclosed embodiments are for general and descriptive purposes only and are not for the purpose of limitation.

Claims

1. A workbench system, comprising: A base, extending in a first direction and a second direction intersecting the first direction, and having a first stroke length; And A plurality of first stages, disposed on the base adjacent to each corner portion of the base, the plurality of first stages being capable of moving in the first direction and the second direction by a second stroke length smaller than the first stroke length.

2. The workbench system according to claim 1, wherein The second stroke length is nanoscale or less.

3. The workbench system according to claim 1, wherein The base comprises at least one of granite, ceramic, and invar alloy, and Each of the plurality of first stages comprises: A first portion, disposed on the base and including a piezoelectric actuator; and A second portion, disposed on the first portion and including a porous material.

4. The workbench system according to claim 3, wherein, Negative pressure is provided to the second portion.

5. The workbench system according to claim 1, further comprising: A second stage, disposed on the base and spaced apart from the plurality of first stages, the second stage including a porous material.

6. The workbench system according to claim 5, wherein Positive pressure is provided to the second stage.

7. The workbench system according to claim 6, wherein The second stage includes a plurality of pads, and Each of the plurality of pads comprises: A main body portion, disposed on the base, including a porous material, and having a receiving groove formed in a lower portion of the main body portion; and A height adjusting portion, disposed in the receiving groove between the base and the main body portion, and including a handle protruding from the main body portion in a plan view.

8. The workbench system according to claim 7, wherein, The plurality of pads are arranged in a tile shape and are spaced apart from each other in the first direction and the second direction.

9. The workbench system according to claim 7, wherein As the height adjusting portion rotates, each of the plurality of pads moves upward or downward in a third direction intersecting the first direction and the second direction.

10. The workbench system according to claim 7, wherein An upper surface of the main body portion is flat, and The remaining surfaces of the main body portion other than the upper surface of the main body portion are coated.

11. The workbench system according to claim 7, wherein A second hole is formed in the base in a third direction intersecting the first direction and the second direction, The workbench system further includes a fluid passage passing through the second hole, and A part of the positive pressure is recovered through the fluid passage.

12. The workbench system according to claim 11, wherein Each of the plurality of pads includes a first side, a second side, a third side, and a fourth side in a plan view, and The fluid passage includes a first fluid passage adjacent to the first side, a second fluid passage adjacent to the second side, a third fluid passage adjacent to the third side, and a fourth fluid passage adjacent to the fourth side.

13. The workbench system according to claim 5, further comprising: A sensor, measuring the displacement of a substrate disposed on the plurality of first stages and the second stage, Wherein the substrate extends in the first direction and the second direction, and Wherein the sensor is spaced apart from the substrate in one of the extending directions of the substrate.

14. The workbench system according to claim 5, wherein, a pipe fitting hole is formed in the base in a third direction intersecting the first direction and the second direction, and the workbench system further includes a pipe passing through the pipe fitting hole and connected to the second table.

15. The workbench system according to claim 5, wherein, a first hole is formed in the base in a third direction intersecting the first direction and the second direction, the workbench system further includes a lifting pin passing through the first hole, and the lifting pin moves upward or downward in the third direction intersecting the first direction and the second direction.

16. A method for manufacturing a display panel, the manufacturing method comprising: placing a substrate on a workbench system including a base and a plurality of first tables, the base extending in a first direction and a second direction intersecting the first direction and having a first stroke length, the plurality of first tables being disposed adjacent to each corner portion of the base on the base and capable of moving in the first direction and the second direction by a second stroke length smaller than the first stroke length, the substrate extending in the first direction and the second direction; and fixing the substrate by the plurality of first tables.

17. The manufacturing method according to claim 16, wherein, The second stroke length is nanoscale or less.

18. The manufacturing method according to claim 16, wherein, Fixing the substrate includes: providing a negative pressure to the plurality of first tables; and adsorbing the substrate by the plurality of first tables.

19. The manufacturing method according to claim 18, wherein, the workbench system further includes a second table disposed on the base and spaced apart from the plurality of first tables, the second table including a porous material, and the manufacturing method further includes planarizing the substrate after adsorbing the substrate.

20. The manufacturing method according to claim 19, wherein, Planarizing the substrate includes providing a positive pressure to the second table.

21. The manufacturing method according to claim 18, wherein, the workbench system further includes a sensor spaced apart from the substrate in one of the extending directions of the substrate, the sensor measuring the displacement of the substrate, and after adsorbing the substrate, the manufacturing method further includes: measuring the displacement of the substrate; and changing the position of the substrate when the measured displacement of the substrate is outside a selected range.

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