Double-sided coated antireflection glass and manufacturing method thereof

Abstract

The invention relates to double-sided coated antireflection glass and a manufacturing method thereof, and belongs to the technical field of coated glass. Comprising a glass substrate and coating films on two sides of the glass substrate, the coating film on the first surface sequentially comprises a TiO2 layer, a SiO2 layer, a Nb2Ox layer, a SiO2 layer, a Nb2Ox layer and a SiO2 layer from inside to outside; the coating film on the second surface sequentially comprises a TiO2 layer, a SiO2 layer, a Nb2Ox layer, a SiO2 layer, a Nb2Ox layer and a SiO2 layer from inside to outside; a layer of organic polymer is arranged on the outer surface of the first surface coating film. According to the double-sided coated antireflection glass, the thickness of each film layer, especially the geometric thickness and the optical thickness of the dielectric layers with different refractive indexes, is reasonably designed, so that the antireflection function of the glass is realized, meanwhile, the roll-coating organic polymer is additionally arranged on the surface coated for the first time to serve as a protective layer, and the film surface safety of the coated surface is protected. And finally, the anti-reflection function of the glass is realized through double-sided coating.

Description

Technical Field

[0001] The invention relates to double-sided coated anti-reflection glass and a manufacturing method thereof, belonging to the technical field of coated glass. Background Art

[0002] In the construction sector, as energy conservation and environmental protection become increasingly popular worldwide, building energy-saving standards are becoming increasingly stringent. Anti-reflective glass can significantly improve daylighting efficiency and reduce energy consumption for indoor artificial lighting. While ordinary glass has a high reflectivity, which reflects a significant amount of light, anti-reflective glass significantly reduces this reflectivity, allowing more natural light to penetrate indoors, effectively improving the indoor lighting environment and creating a brighter and more comfortable space. According to statistics, buildings using anti-reflective glass can increase indoor lighting by approximately 20%-30% and reduce energy consumption by 15%-20%. Furthermore, in some high-end commercial buildings, office buildings, and residential projects, anti-reflective glass is increasingly being used because it enhances the overall aesthetics of the building, meeting the dual demands of modern architecture for both form and functionality. With the acceleration of urbanization, the number of new buildings continues to grow, creating broad market opportunities for anti-reflective glass in the construction market.

[0003] Anti-reflective glass has a broad and urgent market demand in a wide range of fields, including architecture, electronic displays, automobiles, optical instruments, and cultural displays. With the continuous advancement of technology and the continued improvement of people's quality of life, the market size of anti-reflective glass is expected to further expand, and its application areas will continue to expand.

[0004] Most of the existing anti-reflective glass is only coated on one side, which cannot fully meet the market demand for good light transmittance and low reflection. In addition, the durability and oxidation resistance of the glass surface cannot guarantee the long-term influence of complex environments.

[0005] The existing double-sided anti-reflection glass processing method is difficult and the yield is extremely low. Therefore, there is an urgent need for a method for manufacturing double-sided coated anti-reflection glass to solve the above problems. Summary of the Invention

[0006] The purpose of the present invention is to provide a double-sided coated anti-reflection glass and a manufacturing method to solve the above technical problems.

[0007] In order to achieve the above object, the technical solution adopted by the present invention is:

[0008] A double-sided coated anti-reflection glass, comprising a glass substrate and coatings on both sides of the glass substrate; the coating on the first side is TiO2 layer, SiO2 layer, Nb2O x layer, SiO2 layer, Nb2O x layer, SiO2 layer; the coating on the second side is TiO2 layer, SiO2 layer, Nb2O xlayer, SiO2 layer, Nb2O x layer, SiO2 layer; a layer of organic polymer is provided on the outer surface of the first coating.

[0009] A further improvement of the technical solution of the present invention is that the component of the organic polymer is an acrylate monomer, which includes a mixture of one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

[0010] The technical solution of the present invention is further improved as follows: the thickness of each layer of the first surface coating is 30nm for TiO2 layer, 45nm for SiO2 layer, and 45nm for Nb2O x layer 35nm, SiO2 layer 55nm, Nb2O x The second side coating is TiO2 layer 30nm, SiO2 layer 45nm, Nb2O x layer 35nm, SiO2 layer 55nm, Nb2O x layer 42nm, SiO2 layer 48nm.

[0011] A further improvement of the technical solution of the present invention is that the thickness of the organic polymer is 15 μm.

[0012] A method for manufacturing double-sided anti-reflection coated glass, which uses a large-area glass coating production line and a vacuum magnetron sputtering coating process to coat a glass substrate using 26 cathode targets in a negative pressure environment;

[0013] Accurately control the film thickness of the high refractive index layer and the low refractive index layer by controlling the power supply;

[0014] After the first coating is completed, a layer of protective coating is applied to the glass surface using chemical roller coating technology. The coating composition is acrylate monomer to protect the mechanical scratches on the bottom surface of the glass caused by transmission during the second coating.

[0015] Then the above coating work is performed again on the back of the completed single-sided anti-reflection glass, and the coating process is the same as the first side.

[0016] A further improvement of the technical solution of the present invention is as follows: the first dielectric layer is a TiO2 layer, and the TiO2 target is sputtered in an argon-oxygen atmosphere by an AC rotating cathode sputtering method, and the purity of the TiO2 target should be ≥99.99%;

[0017] The second dielectric layer is SiO2 layer, which is sputtered by AC rotating cathode sputtering in an argon oxygen atmosphere. The purity of the Si target should be ≥99%;

[0018] The third dielectric layer is Nb2O xlayer, Nb2O was deposited by AC rotating cathode sputtering. x The target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%;

[0019] The fourth dielectric layer is a SiO2 layer, which is sputtered by an AC rotating cathode sputtering method in an argon-oxygen atmosphere using a Si target. The purity of the Si target should be ≥99%;

[0020] The fifth dielectric layer is Nb2O x layer, Nb2O was deposited by AC rotating cathode sputtering. x The target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%;

[0021] The sixth dielectric layer is a SiO2 layer, which is sputtered by an AC rotating cathode sputtering method in an argon-oxygen atmosphere using a Si target. The purity of the Si target should be ≥99%.

[0022] A further improvement of the technical solution of the present invention is that the first dielectric layer is sputtered in an argon-oxygen atmosphere with an argon-oxygen ratio of 1000:50.

[0023] The further improvement of the technical solution of the present invention is: in the sputtering process of the third dielectric layer and the fifth dielectric layer, Nb2O x Nb2O5 needs to be used for deoxidation treatment. x The X in is 4.45±0.1. This is to increase the Nb2O x The refractive index of the film layer. The process gas should be mainly argon, with a small amount of oxygen added, and the ratio of argon to oxygen should be 1000:30.

[0024] A further improvement to the technical solution of the present invention is as follows: in the sputtering process of the second dielectric layer, the fourth dielectric layer, and the sixth electrolyte layer, magnetron sputtering is used to deposit a SiO2 film on a glass substrate. When the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1; the average particle size decreases and becomes more uniform, the surface roughness decreases with increasing oxygen-argon ratio, and the refractive index and absorptivity of the film decrease; when the oxygen content is 40%, the refractive index of the film is close to the refractive index of silicon dioxide, 1.46.

[0025] A further improvement of the technical solution of the present invention is that the negative pressure environment should meet the requirements of less than 5×10 -6E mbar.

[0026] Due to the adoption of the above technical solution, the technical effects achieved by the present invention are as follows:

[0027] The double-sided anti-reflection glass of the present invention achieves its anti-reflection and anti-reflection properties by rationally designing the thickness of each film layer, particularly the geometric and optical thickness of the dielectric layers with different refractive indices. Furthermore, a roll-coated organic polymer is added to the primary coating surface as a protective layer, protecting the already coated surface. Ultimately, the double-sided coating achieves the glass's anti-reflection and anti-reflection properties.

[0028] In this technical solution, the thickness of the high-refractive index layer and the low-refractive index layer is accurately controlled by controlling the power supply to achieve the designed film thickness. By continuously changing the refractive index, destructive interference occurs between the reflected light under a specific wavelength of light, thereby achieving the purpose of reducing reflection.

[0029] In this technical solution, two layers of single-sided anti-reflection film are repeatedly coated on both sides of the transparent voltaic glass twice. A layer of protective coating is rolled on the first side during coating to protect the bottom surface of the glass from mechanical scratches caused by transmission during the second coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 It is a schematic diagram of the film layer structure of the coated glass of the present invention. DETAILED DESCRIPTION

[0031] In order to make the technical means, creative features, objectives and effects achieved by the present invention easier to understand, the present invention is further described below in conjunction with specific implementation methods.

[0032] The invention relates to a double-sided coated anti-reflection glass, which is obtained by coating a functional film on a glass substrate, specifically coating both sides, the front side and the back side, respectively.

[0033] The glass mainly includes a glass substrate and coatings on both sides of the glass substrate. The coating is performed on one side of the glass substrate. The first coating is TiO2 layer, SiO2 layer, Nb2O x layer, SiO2 layer, Nb2O x layer, SiO2 layer; the second side coating is TiO2 layer, SiO2 layer, Nb2O x layer, SiO2 layer, Nb2O x Layer, SiO2 layer. The two film structures are the same. Figure 1 shown.

[0034] Furthermore, in a specific implementation, the thickness of each layer of the first surface coating is 30nm for TiO2 layer, 45nm for SiO2 layer, and 45nm for Nb2O x layer 35nm, SiO2 layer 55nm, Nb2O x The second side coating is TiO2 layer 30nm, SiO2 layer 45nm, Nb2O xlayer 35nm, SiO2 layer 55nm, Nb2O x layer 42nm, SiO2 layer 48nm.

[0035] The outer surface of the coating on the first side of the glass substrate is coated with an organic polymer layer to protect the coating. The organic polymer is composed of acrylate monomers, including a mixture of one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate. The organic polymer layer has a thickness of 15 μm.

[0036] Two layers of single-sided anti-reflection film are repeatedly coated on both sides of the transparent voltaic glass twice. After the first coating is completed, a layer of protective paint is rolled on the surface of the film to protect the mechanical scratches on the bottom surface of the glass caused by transmission during the second coating.

[0037] The glass adopts the vacuum magnetron sputtering coating process using a large-area glass coating production line, and uses 26 cathode targets to coat the functional film on the glass substrate under a negative pressure environment.

[0038] During coating, the negative pressure environment should be less than 5×10 -6E mbar.

[0039] By controlling the power supply, the thickness of the high refractive index layer and the low refractive index layer can be accurately controlled. The constantly changing refractive index causes destructive interference between the reflected light under a specific wavelength of light, thereby achieving the purpose of reducing reflection.

[0040] The first dielectric layer is deposited using an AC rotating cathode sputtering method using a TiO2 target in an argon-oxygen atmosphere. The purity of the TiO2 target should be ≥99.99%. High-purity TiO2 targets facilitate precise control of the film's optical parameters, achieving enhanced anti-reflection and anti-transmission effects. The ventilation ratio affects the film's refractive index, hardness, adhesion, and other properties. The ideal argon-oxygen ratio is 1000:50.

[0041] The second dielectric layer is sputtered using an AC rotating cathode sputtering method using a Si target in an argon-oxygen atmosphere. The Si target purity should be ≥99%. SiO2 films are deposited on glass substrates using magnetron sputtering. As the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the film's oxygen-silicon ratio (O / Si) continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreases and becomes more uniform, the surface roughness decreases with increasing oxygen-argon ratio, and the film's refractive index and absorptivity continuously decrease. At an oxygen content of 40%, the film's refractive index approaches that of silicon dioxide, 1.46.

[0042] The third dielectric layer is made of Nb2O by AC rotating cathode sputtering. xThe target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%, Nb2O x Nb2O5 needs to be used for deoxidation treatment. x The X in is 4.45±0.1. This is to increase the Nb2O x The refractive index of the film layer. The process gas should be mainly argon, with a small amount of oxygen added, and the ratio of argon to oxygen should be 1000:30.

[0043] The fourth dielectric layer is sputtered using an AC rotating cathode sputtering method using a Si target in an argon-oxygen atmosphere. The Si target purity should be ≥99%. SiO2 films are deposited on glass substrates using magnetron sputtering. As the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the film's oxygen-silicon ratio (O / Si) continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreases and becomes more uniform, the surface roughness decreases with increasing oxygen-argon ratio, and the film's refractive index and absorptivity continuously decrease. At an oxygen content of 40%, the film's refractive index approaches that of silicon dioxide, 1.46.

[0044] The fifth dielectric layer is made of Nb2O by AC rotating cathode sputtering. x The target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%, Nb2O x Nb2O5 needs to be used for deoxidation treatment. x The X in is 4.45±0.1. This is to increase the Nb2O x The refractive index of the film layer. The process gas should be mainly argon, with a small amount of oxygen added, and the ratio of argon to oxygen should be 1000:30.

[0045] The sixth dielectric layer is sputtered using an AC rotating cathode sputtering method using a Si target in an argon-oxygen atmosphere. The Si target purity should be ≥99%. SiO2 films are deposited on glass substrates using magnetron sputtering. As the oxygen-argon ratio (O2 / Ar) increases from 30% to 60%, the film's oxygen-silicon ratio (O / Si) continuously increases from a severely oxygen-deficient 1.68:1 to 1.93:1, approaching the stoichiometric ratio of 2:1. Simultaneously, the average particle size decreases and becomes more uniform, the surface roughness decreases with increasing oxygen-argon ratio, and the film's refractive index and absorptivity continuously decrease. At an oxygen content of 40%, the film's refractive index approaches that of silicon dioxide, 1.46.

[0046] After the first coating is completed, a layer of protective coating is coated on the glass surface using chemical roller coating technology. The coating composition is an acrylate monomer, including a mixture of one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

[0047] After LED UV curing, a protective film layer is formed on the surface of the tempered Low-e glass, which improves the mechanical processing resistance and isolates the atmosphere.

[0048] Then the above coating work is performed again on the back of the completed single-sided anti-reflection glass, and the coating process is the same as the first side.

[0049] The following are specific embodiments:

[0050] In this embodiment, a vacuum magnetron sputtering coating process is used, and the high refractive index dielectric layer uses Nb2O x The low refractive index dielectric layer uses SiO2, which includes a total of 26 double rotating AC cathodes that are sequentially coated with TiO2 / SiO2 / Nb2O on a float glass substrate. x / SiO2 / Nb2O x / SiO2.

[0051] The production process parameters are as follows:

[0052]

[0053]

[0054] Through the above process, each film layer of the coating reaches the preset thickness. After the coating is completed, a layer of protective coating is rolled on the glass coating surface using a roller coater at the coating outlet. The coating composition is an acrylate monomer, including a mixture of one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

[0055] After LED UV curing, a protective film layer is formed on the surface of the tempered Low-e glass, improving its mechanical resistance and isolating it from the atmosphere.

[0056] Then the above coating work is performed again on the back of the completed single-sided anti-reflection glass, and the coating process is the same as the first side.

[0057] In this technical solution, the thickness of the high-refractive-index layer and the low-refractive-index layer is accurately controlled by controlling the power supply, so that the designed thickness of the film layer can be achieved. By continuously changing the refractive index, destructive interference occurs between the reflected light under a specific wavelength of light, thereby achieving the purpose of reducing reflection.

[0058] The basic principles, main features, and advantages of the present invention are shown and described above. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The above embodiments and descriptions are merely illustrative of the principles of the present invention. Various changes and modifications may be made to the present invention without departing from the spirit and scope of the present invention. Such changes and modifications are intended to fall within the scope of the present invention. The scope of protection claimed in the present invention is defined by the appended claims and their equivalents.

Claims

1. A double-sided anti-reflection glass, characterized by: Including glass substrate and coating on both sides of the glass substrate; the coating on the first side is TiO2 layer, SiO2 layer, Nb2O x layer, SiO2 layer, Nb2O x layer, SiO2 layer; the coating on the second side is TiO2 layer, SiO2 layer, Nb2O x layer, SiO2 layer, Nb2O x layer, SiO2 layer; a layer of organic polymer is provided on the outer surface of the first coating.

2. The double-sided anti-reflection glass according to claim 1, characterized in that: The component of the organic polymer is an acrylate monomer, which includes a mixture of one or more of methyl methacrylate, butyl methacrylate, isooctyl methacrylate, methacrylic acid, and glycidyl methacrylate.

3. The double-sided anti-reflection glass according to claim 1, characterized in that: The thickness of each layer of the first coating is 30nm for TiO2 layer, 45nm for SiO2 layer, and 45nm for Nb2O x layer 35nm, SiO2 layer 55nm, Nb2O x The second side coating is TiO2 layer 30nm, SiO2 layer 45nm, Nb2O x layer 35nm, SiO2 layer 55nm, Nb2O x layer 42nm, SiO2 layer 48nm.

4. The double-sided anti-reflection glass according to claim 1, characterized in that: The thickness of the organic polymer was 15 μm.

5. A method for manufacturing double-sided anti-reflection coated glass according to any one of claims 1 to 4, characterized in that: The large-area glass coating production line uses a vacuum magnetron sputtering coating process and 26 cathode targets are used to coat the glass substrate in a negative pressure environment. Accurately control the film thickness of the high refractive index layer and the low refractive index layer by controlling the power supply; After the first coating is completed, a layer of protective coating is applied to the glass surface using chemical roller coating technology. The coating composition is acrylate monomer to protect the mechanical scratches on the bottom surface of the glass caused by transmission during the second coating. Then the above coating work is performed again on the back of the completed single-sided anti-reflection glass, and the coating process is the same as the first side.

6. The method for manufacturing double-sided anti-reflection coated glass according to claim 5, characterized in that: The first dielectric layer is a TiO2 layer, which is sputtered by an AC rotating cathode sputtering method in an argon-oxygen atmosphere. The purity of the TiO2 target should be ≥99.99%. The second dielectric layer is SiO2 layer, which is sputtered by AC rotating cathode sputtering in an argon oxygen atmosphere. The purity of the Si target should be ≥99%. The third dielectric layer is Nb2O x layer, Nb2O was deposited by AC rotating cathode sputtering. x The target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%; The fourth dielectric layer is a SiO2 layer, which is sputtered by an AC rotating cathode sputtering method in an argon-oxygen atmosphere using a Si target. The purity of the Si target should be ≥99%; The fifth dielectric layer is Nb2O x layer, Nb2O was deposited by AC rotating cathode sputtering. x The target is sputtered in a nitrogen and oxygen atmosphere, Nb2O x The purity of the target should be ≥99.9%; The sixth dielectric layer is a SiO2 layer, which is sputtered by an AC rotating cathode sputtering method in an argon-oxygen atmosphere using a Si target. The purity of the Si target should be ≥99%.

7. The method for manufacturing double-sided anti-reflection coated glass according to claim 6, characterized in that: The first dielectric layer was sputtered in an argon-oxygen atmosphere with an argon-oxygen ratio of 1000:

50.

8. The method for manufacturing double-sided anti-reflection coated glass according to claim 6, characterized in that: During the sputtering process of the third and fifth dielectric layers, Nb2O x Nb2O5 needs to be used for deoxidation treatment. x The X in is 4.45±0.

1. This is to increase the Nb2O x The refractive index of the film. The process gas should be mainly argon, with a small amount of oxygen added, and the ratio of argon to oxygen should be 1000:

30.

9. The method for manufacturing double-sided anti-reflection coated glass according to claim 6, characterized in that: In the sputtering process of the second dielectric layer, the fourth dielectric layer, and the sixth electrolyte layer, magnetron sputtering was used to deposit SiO2 thin films on a glass substrate. When the oxygen-argon ratio (O2 / Ar) increased from 30% to 60%, the oxygen-silicon ratio (O / Si) of the film continuously increased from 1.68:1, which was severely oxygen-deficient, to 1.93:

1. The average particle size decreased and became more uniform, the surface roughness decreased with the increase of the oxygen-argon ratio, and the refractive index and absorptivity of the film decreased. When the oxygen content was 40%, the refractive index of the film was close to that of silicon dioxide, 1.

46.

10. A method for manufacturing double-sided anti-reflection coated glass according to any one of claims 6 to 9, characterized in that: The negative pressure environment should be less than 5×10 -6E mbar.

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