A chemical vapor deposition apparatus and method for semiconductor high purity silicon carbide coating

Abstract

The application relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition device and method for semiconductor high-purity silicon carbide coating, which comprises a deposition tank, the top of the deposition tank is provided with an air inlet pipe, the inside of the deposition tank is provided with a fixing cylinder, the outside of the fixing cylinder is provided with a fixing bolt, the fixing cylinder is connected with the bottom of the air inlet pipe through the fixing bolt, the inside of the fixing cylinder is provided with a starting assembly for treating impurities in gas, the starting assembly, a scraping assembly and an adjusting assembly are matched, when the chemical vapor deposition device for semiconductor high-purity silicon carbide coating is used, the cooperation of a transmission gear, a scraping sheet and a filter disc can avoid the situation that aerosol small particles generated in the gasification process of a precursor liquid or residual particles of raw materials not completely evaporated in a pipeline enter the equipment interior along with the gas to cause the coating thickness to be inconsistent, and the purity of the coating is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition device and method for semiconductor high-purity silicon carbide coating. BACKGROUND

[0002] The chemical vapor deposition device for semiconductor high-purity silicon carbide coating is a special equipment for depositing high-purity silicon carbide coating on the surface of a substrate through gas-phase chemical reaction, mainly used for the production and performance improvement of key components in semiconductor manufacturing. Through the decomposition of gaseous reactants (such as methyltrichlorosilane, hydrogen, etc.) at high temperature, silicon carbide is generated and deposited on the surface of the substrate. At present, when using the chemical vapor deposition device for semiconductor high-purity silicon carbide coating, aerosol small particles generated in the gasification process of the precursor liquid (such as methyltrichlorosilane) or residual particles of the raw material not completely evaporated in the pipeline will enter the interior of the equipment with the gas, thereby causing inconsistent coating thickness, increased crystal defects, and even unable to form a continuous thin film. SUMMARY

[0003] In order to overcome the shortcomings of the prior art, the present application provides a chemical vapor deposition device for semiconductor high-purity silicon carbide coating.

[0004] To solve the above technical problems, the present application provides the following technical scheme: a deposition tank is provided, the top of the deposition tank is provided with an air inlet pipe, the inside of the deposition tank is provided with a fixing cylinder, the outside of the fixing cylinder is provided with a fixing bolt, the fixing cylinder is connected with the bottom of the air inlet pipe through the fixing bolt, the inside of the fixing cylinder is provided with a starting assembly for treating impurities in the gas, the starting assembly is provided with a filter disc and a rotating column, the impurities in the gas can be intercepted through the cooperation of the filter disc and the rotating column, the starting assembly is provided with a bearing strip, the bearing strip is L-shaped, the bearing strip is fixedly connected to the outside of the fixing cylinder, the bottom of the fixing cylinder is fixedly connected with a placing shell, the bottom of the bearing strip is fixedly connected with a connecting block, the connecting block is fixedly connected with the placing shell, the connecting block is fixedly connected with a first machine shell, the connecting block is provided with a bearing, the inner ring of the bearing of the connecting block is fixedly connected with a transmission column, the inside of the first machine shell is provided with a servo motor, the output shaft of the servo motor is fixedly connected with the transmission column, the end of the transmission column away from the servo motor is fixedly connected with a transmission gear, the bottom of the placing shell is fixedly connected with a bearing ring, the bearing ring is provided with a groove for connecting the first gear ring, the first gear ring is inserted into the groove of the bearing ring, the inside of the first gear ring is fixedly connected with the filter disc, and the first gear ring is engaged with the transmission gear, a plurality of small round holes for filtering the gas are arranged on the filter disc, the filter disc is fixedly connected with the rotating column, a placing groove for fixing a placing column is arranged on the bearing strip, the placing column is fixedly connected in the placing groove of the bearing strip, and a plurality of brush strips are fixedly connected to the placing column.

[0005] When the impurities need to be treated, the fixed cylinder is fixed at the bottom of the air inlet pipe through the fixing bolt, the servo motor is started, the servo motor drives the transmission column to rotate, the transmission column drives the transmission gear to rotate when rotating, the transmission gear drives the first tooth ring to rotate when rotating, the first tooth ring rotates in the bearing ring, the first tooth ring drives the filter disc to rotate, the filter disc drives the rotating column to rotate when rotating.

[0006] As a preferred technical scheme of the present application, the filter disc is provided with a scraping assembly matched with the starting assembly, the scraping assembly is provided with a fixed column and a scraping piece, the inner wall of the fixed cylinder can be cleaned through the cooperation of the fixed column and the scraping piece, the scraping assembly is provided with a pressure bearing ring, the pressure bearing ring is fixedly connected to the top of the rotating column, the outer side of the pressure bearing ring is fixedly connected with a plurality of fixed columns, one end of each fixed column away from the pressure bearing ring is fixedly connected with a placement strip, a plurality of telescopic cylinders are fixedly connected to each placement strip, a telescopic column is arranged in each telescopic cylinder, each telescopic column is inserted into the corresponding telescopic cylinder, one end of each telescopic column away from the telescopic cylinder is fixedly connected with the corresponding scraping piece, a spring is arranged in each telescopic cylinder, the spring is sleeved outside the corresponding telescopic column, a blocking piece is fixedly connected to each telescopic column, and the two ends of each spring are fixedly connected with the inner wall of the corresponding telescopic cylinder and the blocking piece.

[0007] When the rotating column rotates, the rotating column drives the pressure bearing ring to rotate, the pressure bearing ring drives the fixed column to rotate, the fixed column drives the telescopic cylinder to rotate when rotating, the telescopic cylinder drives the telescopic column to rotate when rotating, the telescopic column drives the scraping piece to rotate when rotating, and the impurities adhered to the inner wall of the fixed cylinder are cleaned when the scraping piece rotates.

[0008] As a preferred technical scheme of the present application, the rotating column is provided with an adjusting assembly for matching the starting assembly, the adjusting assembly is provided with an adjusting piece and a starting strip, the cooperation of the adjusting piece and the starting strip can control the gas ejection range, the adjusting assembly is provided with a groove block, the groove block is fixedly connected to the bearing strip, the groove block is provided with a U-shaped groove for placing a positioning ring, the positioning ring is fixedly connected to the U-shaped groove of the positioning ring, the inside of the positioning ring is provided with a ring groove for connecting the second gear ring, the second gear ring is inserted into the ring groove of the positioning ring and is engaged with the transmission gear, the end of the bearing strip away from the connecting block is fixedly connected with a bearing block, the bearing block is provided with a bearing, the inner ring of the bearing of the bearing block is fixedly connected with a rotating drum, the rotating drum is sleeved on the outside of the rotating column, the outside of the rotating drum is fixedly connected with a connecting ring, the connecting ring is composed of a circular ring and a plurality of cylinders, the cylinder portions of the connecting ring are fixedly connected to the inside of the second gear ring, the cylinder portions of each connecting ring are movably connected with an adjusting piece, the outside of the rotating column is fixedly connected with a positioning column, the outside of the positioning column is fixedly connected with a starting strip, each adjusting piece is annularly correspondingly distributed, the starting strip is L-shaped, the number of the starting strips corresponds to the adjusting pieces, and the height of the starting strip corresponds to the adjusting piece, when the adjusting piece rotates to the position corresponding to the starting strip, the adjusting piece is attached to the starting strip.

[0009] When the transmission gear rotates, the transmission gear drives the engaged second gear ring to rotate reversely, when it is necessary to adjust the flow rate, the second gear ring drives the connecting ring to rotate, when the connecting ring rotates to the position corresponding to the starting strip, the adjusting piece is blocked by the starting strip, and then the adjusting piece rotates to the horizontal state along the connecting ring, when the adjusting piece rotates to the position away from the starting strip, the starting strip removes the blocking effect on the upper end of the adjusting piece, and then the adjusting piece rotates to the vertical state, when the adjusting piece rotates, the brush strip on the placing column cleans the impurities attached to the top of the adjusting piece.

[0010] As a preferred technical scheme of the present application, the outside of the placing shell is provided with a processing assembly for collecting impurities, the processing assembly is provided with a limiting cylinder, the limiting cylinder is fixedly connected to the outside of the placing shell, a scraping column is inserted into the limiting cylinder, the end of the scraping column away from the placing shell is fixedly connected with a connecting strip, the outside of the placing shell is fixedly connected with a bearing piece, the bearing piece is provided with a bearing, the inner ring of the bearing of the bearing piece is fixedly connected with a threaded column, the outside of the bearing piece is fixedly connected with a frame strip, the end of the threaded column away from the bearing piece is movably connected with the frame strip, the frame strip is fixedly connected with a second shell, the inside of the second shell is provided with a stepping motor, the output shaft of the stepping motor is fixedly connected with the threaded column, the outside of the threaded column is threadedly connected with a threaded block, the threaded block is fixedly connected with the connecting strip, the frame strip is provided with a movable groove for movably arranging a limiting block, the limiting block is inserted into the movable groove of the frame strip, the end of the threaded block away from the connecting strip is fixedly connected with the limiting block, the bottom of the connecting strip is fixedly connected with a collecting box, and the scraping column corresponds to the collecting box.

[0011] When it is necessary to clean the impurities attached to the filter disc, the stepper motor is started, the stepper motor drives the threaded column to rotate, the threaded column drives the threaded block connected by threads to move towards the position of the placing shell, the threaded block drives the limiting block to move along the frame strip while moving, the threaded block drives the connecting strip to move while moving, the connecting strip drives the scraping column to move towards the position of the filter disc and adhere while moving, the connecting strip drives the collecting box to move to the bottom of the filter disc while moving, and then the scraping column adhering to the filter disc scrapes off the impurities attached to the filter disc when the filter disc rotates, and the impurities scraped off from the filter disc fall into the collecting box through the small holes of the filter disc.

[0012] A method for using a semiconductor high-purity silicon carbide coating chemical vapor deposition device, comprising the following steps:

[0013] First step: the fixed cylinder is fixed at the bottom of the air inlet pipe through the fixing bolt, the servo motor is started, the servo motor drives the transmission column to rotate, the transmission column drives the first tooth ring to rotate through the transmission gear when rotating, the first tooth ring drives the filter disc to rotate, and the filter disc drives the rotating column to rotate when rotating;

[0014] Second step: the rotating column drives the pressure-bearing ring to rotate when rotating, the pressure-bearing ring drives the scraping piece to rotate when rotating, and the scraping piece cleans the impurities attached to the inner wall of the fixed cylinder when rotating;

[0015] Third step: the transmission gear drives the second tooth ring to rotate when rotating, the second tooth ring drives the connecting ring to rotate when rotating, and the connecting ring is adjusted to the position corresponding to the starting strip, and the flow of the gas flow is adjusted;

[0016] Fourth step: when it is necessary to clean the impurities attached to the filter disc, the stepper motor is started, the stepper motor drives the threaded column to rotate, the threaded column drives the threaded block connected by threads to move towards the position of the placing shell, the threaded block drives the scraping column and the collecting box to move towards the bottom of the filter disc, and the filter disc is cleaned by the scraping column when rotating, and the falling impurities enter the inside of the collecting box.

[0017] Compared with the prior art, the beneficial effects that can be achieved by the present application are:

[0018] By starting the assembly, the scraping assembly and the adjusting assembly, when the semiconductor high-purity silicon carbide coating chemical vapor deposition device is used, the cooperation of the transmission gear, the scraping piece and the filter disc can avoid the situation that the gas aerosol small particles or the residual particles of the raw materials not completely evaporated in the pipeline will enter the inside of the equipment along with the gas during the gasification process of the precursor liquid, resulting in inconsistent coating thickness, and the purity of the coating is improved.

[0019] The application is characterized by the setting of the starting assembly and the scraping assembly, when the chemical vapor deposition device for coating high-purity silicon carbide of semiconductor is used, the cooperation of the scraping sheet and the telescopic cylinder can automatically clean the impurities attached to the inner wall of the fixed cylinder while blocking the particulate matter, preventing clogging and pollution.

[0020] The application is characterized by the setting of the starting assembly and the adjusting assembly, when the chemical vapor deposition device for coating high-purity silicon carbide of semiconductor is used, the cooperation of the adjusting sheet and the starting strip can automatically adjust the gas distribution, optimizing the deposition uniformity.

[0021] The application is characterized by the setting of the adjusting assembly, when the chemical vapor deposition device for coating high-purity silicon carbide of semiconductor is used, the setting of the brush strip can clean the impurities on the top of the adjusting sheet, ensuring the adjusting accuracy.

[0022] The application is characterized by the setting of the starting assembly and the processing assembly, when the chemical vapor deposition device for coating high-purity silicon carbide of semiconductor is used, the cooperation of the scraping column and the collection box can drive the scraping column to adhere to the surface of the filter disc, scrape off the impurities and introduce them into the collection box, efficiently recovering the impurities and avoiding secondary pollution.

[0023] The application is characterized by the setting of the processing assembly, when the chemical vapor deposition device for coating high-purity silicon carbide of semiconductor is used, the cooperation of the limiting cylinder and the frame strip can ensure the accuracy of the moving track of the scraping column and the positioning accuracy of the collection box, realizing automatic operation, reducing manual intervention and improving the maintenance efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 It is a structural schematic view of the gas inlet pipe of the application;

[0025] Figure 2 It is a structural schematic view of the fixed cylinder of the application;

[0026] Figure 3 It is a structural schematic view of the bearing strip of the application;

[0027] Figure 4 It is a structural schematic view of the bearing block of the application;

[0028] Figure 5 It is a structural schematic view of the connecting block of the application;

[0029] Figure 6 It is a structural schematic view of the pressure-bearing ring of the application;

[0030] Figure 7 It is a structural schematic view of the scraping sheet of the application;

[0031] Figure 8 It is a structural schematic view of the second tooth ring of the application;

[0032] Figure 9It is the structural schematic view of the transmission gear of the present application.

[0033] Figure 10 It is the structural schematic view of the limiting cylinder of the present application.

[0034] Figure 11 It is the structural schematic view of the collecting box of the present application.

[0035] Figure 12 It is the structural schematic view of the limiting block of the present application.

[0036] 1, sedimentation tank; 2, air inlet pipe; 3, fixed cylinder; 4, bearing strip; 5, bearing block; 6, first casing; 7, connecting block; 8, servo motor; 9, transmission column; 10, transmission gear; 11, placing shell; 12, bearing ring; 13, first tooth ring; 14, filter disc; 15, recess block; 16, rotating column; 17, rotating cylinder; 18, positioning ring; 19, second tooth ring; 20, collecting box; 21, pressure bearing ring; 22, fixed column; 23, placing strip; 24, scraper; 25, telescopic cylinder; 26, spring; 27, telescopic column; 28, blocking piece; 29, placing column; 30, brush strip; 31, adjusting piece; 32, connecting ring; 33, positioning column; 34, starting strip; 35, limiting cylinder; 36, bearing piece; 37, second casing; 38, stepper motor; 39, threaded block; 40, connecting strip; 41, limiting block; 42, threaded column; 43, frame strip; 44, scraping column; 45, fixed bolt. DETAILED DESCRIPTION

[0037] In order to make the technical means, creative features, purposes and effects realized by the present application easy to understand, the following further describes the present application in combination with specific embodiments, but the following embodiments are only preferred embodiments of the present application, not all. Based on the embodiments in the embodiments, other embodiments obtained by those skilled in the art without creative labor are within the protection scope of the present application. In the following embodiments, the experimental methods are conventional methods, and the materials and reagents used in the following embodiments are commercially available unless otherwise specified.

[0038] Embodiment: as Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5As shown in the figure, a kind of semiconductor high-purity silicon carbide coating chemical vapor deposition device includes a deposition tank 1, the top of deposition tank 1 is equipped with inlet pipe 2, the inside of deposition tank 1 is equipped with fixed cylinder 3, the outside of fixed cylinder 3 is equipped with fixed bolt 45, fixed cylinder 3 is connected with the bottom of inlet pipe 2 by fixed bolt 45, the inside of fixed cylinder 3 is equipped with starting assembly for treating impurities in gas, filter disc 14 and rotating column 16 are equipped in starting assembly, the cooperation of filter disc 14 and rotating column 16 can intercept impurities in gas, bearing strip 4 is equipped in starting assembly, bearing strip 4 is L-shaped, bearing strip 4 is fixedly connected to the outside of fixed cylinder 3, the bottom of fixed cylinder 3 is fixedly connected with placing shell 11, the bottom of bearing strip 4 is fixedly connected with connecting block 7, connecting block 7 is fixedly connected with first machine shell 6, bearing is equipped on connecting block 7, transmission column 9 is fixedly connected to the inner ring of bearing of connecting block 7, the inside of first machine shell 6 is equipped with servo motor 8, the output shaft of servo motor 8 is fixedly connected with transmission column 9, transmission gear 10 is fixedly connected to the end of transmission column 9 away from servo motor 8, the bottom of placing shell 11 is fixedly connected with bearing ring 12, bearing ring 12 is equipped with recess for connecting first tooth ring 13, first tooth ring 13 is inserted in the recess of bearing ring 12, the inside of first tooth ring 13 is fixedly connected with filter disc 14, and first tooth ring 13 is engaged with transmission gear 10, a plurality of small round holes for filtering gas are equipped on filter disc 14, filter disc 14 is fixedly connected with rotating column 16, placing groove for fixing placing column 29 is equipped on bearing strip 4, placing column 29 is fixedly connected in the placing groove of bearing strip 4, a plurality of brush strips 30 are fixedly connected to placing column 29.

[0039] As Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, when impurities need to be treated, fixed cylinder 3 is fixed at the bottom of inlet pipe 2 by fixed bolt 45, servo motor 8 is started, servo motor 8 drives transmission column 9 to rotate, transmission column 9 drives transmission gear 10 to rotate when rotating, first tooth ring 13 rotates when transmission gear 10 rotates, first tooth ring 13 rotates in bearing ring 12, first tooth ring 13 drives filter disc 14 to rotate, filter disc 14 drives rotating column 16 to rotate when rotating.

[0040] As Figure 3 , Figure 4 , Figure 5 , Figure 6 and Figure 7As shown, the filter disc 14 is provided with a scraping assembly matched with the starting assembly, the scraping assembly is provided with a fixed column 22 and a scraping piece 24, the fixed column 22 and the scraping piece 24 can clean the inner wall of the fixed cylinder 3, the scraping assembly is provided with a pressure bearing ring 21, the pressure bearing ring 21 is fixedly connected to the top of the rotating column 16, the outer side of the pressure bearing ring 21 is fixedly connected with a plurality of fixed columns 22, one end of each fixed column 22 away from the pressure bearing ring 21 is fixedly connected with a placing strip 23, a plurality of telescopic cylinders 25 are fixedly connected on each placing strip 23, a telescopic column 27 is arranged in each telescopic cylinder 25, each telescopic column 27 is inserted into the corresponding telescopic cylinder 25, one end of each telescopic column 27 away from the telescopic cylinder 25 is fixedly connected with the corresponding scraping piece 24, a spring 26 is arranged in each telescopic cylinder 25, the spring 26 is sleeved outside the corresponding telescopic column 27, a blocking piece 28 is fixedly connected on each telescopic column 27, and both ends of each spring 26 are fixedly connected with the inner wall of the corresponding telescopic cylinder 25 and the blocking piece 28.

[0041] As Figure 3 , Figure 4 , Figure 5 , Figure 6 and Figure 7 shown, when the rotating column 16 rotates, the rotating column 16 drives the pressure bearing ring 21 to rotate, the pressure bearing ring 21 drives the fixed column 22 to rotate, the fixed column 22 drives the telescopic cylinder 25 to rotate when rotating, the telescopic cylinder 25 drives the telescopic column 27 to rotate when rotating, the telescopic column 27 drives the scraping piece 24 to rotate when rotating, and the scraping piece 24 cleans the impurities attached to the inner wall of the fixed cylinder 3 when rotating, when the scraping piece 24 is worn, the compressed spring 26 rebounds and drives the telescopic column 27 to move away from the telescopic cylinder 25, and the telescopic column 27 can make the scraping piece 24 always adhere to the inner wall of the fixed cylinder 3 when moving.

[0042] As Figure 4 , Figure 5 , Figure 6 , Figure 8 and Figure 9As shown, the rotating column 16 is provided with an adjusting assembly for matching the starting assembly, the adjusting assembly is provided with an adjusting piece 31 and a starting strip 34, the cooperation of the adjusting piece 31 and the starting strip 34 can control the gas ejection range, the adjusting assembly is provided with a groove block 15, the groove block 15 is fixedly connected to the bearing strip 4, the groove block 15 is provided with a U-shaped groove for placing the positioning ring 18, the positioning ring 18 is fixedly connected in the U-shaped groove of the positioning ring 18, the positioning ring 18 is provided with a ring groove for connecting the second tooth ring 19, the second tooth ring 19 is inserted into the ring groove of the positioning ring 18, and the second tooth ring 19 is engaged with the transmission gear 10, the bearing block 5 is fixedly connected to the end of the bearing strip 4 away from the connecting block 7, the bearing block 5 is provided with a bearing, the inner ring of the bearing of the bearing block 5 is fixedly connected with a rotating drum 17, the rotating drum 17 is sleeved on the outside of the rotating column 16, the outside of the rotating drum 17 is fixedly connected with a connecting ring 32, the connecting ring 32 is composed of a circular ring and a plurality of cylinders, the cylinder part of the connecting ring 32 is fixedly connected with the inside of the second tooth ring 19, the cylinder part of each connecting ring 32 is movably connected with an adjusting piece 31, the outside of the positioning column 33 is fixedly connected with the starting strip 34, each adjusting piece 31 is annularly distributed, the starting strip 34 is L-shaped, the number of the starting strip 34 corresponds to the adjusting piece 31, and the height of the starting strip 34 corresponds to the adjusting piece 31, when the adjusting piece 31 rotates to the position corresponding to the starting strip 34, the adjusting piece 31 is attached to the starting strip 34.

[0043] As shown in Figure 4 , Figure 5 , Figure 6 , Figure 8 and Figure 9 , when the transmission gear 10 rotates, the transmission gear 10 drives the engaged second tooth ring 19 to rotate in the opposite direction, when it is necessary to adjust the flow rate, the second tooth ring 19 drives the connecting ring 32 to rotate, when the connecting ring 32 rotates to the position corresponding to the starting strip 34, the adjusting piece 31 is blocked by the starting strip 34, and then the adjusting piece 31 rotates to the horizontal state along the connecting ring 32, when the adjusting piece 31 rotates to the position away from the starting strip 34, the starting strip 34 removes the blocking effect on the upper end of the adjusting piece 31, and then the adjusting piece 31 rotates to the vertical state, when the adjusting piece 31 rotates, the brush strip 30 on the placing column 29 cleans the impurities attached to the top of the adjusting piece 31.

[0044] As shown in Figure 10 , Figure 11 and Figure 12As shown, the outer side of the placement shell 11 is provided with a processing assembly for collecting impurities, the processing assembly is provided with a limiting cylinder 35, the limiting cylinder 35 is fixedly connected to the outer side of the placement shell 11, a scraping column 44 is inserted into the limiting cylinder 35, the end of the scraping column 44 away from the placement shell 11 is fixedly connected with a connecting strip 40, a bearing piece 36 is fixedly connected to the outer side of the placement shell 11, the bearing piece 36 is provided with a bearing, the inner ring of the bearing of the bearing piece 36 is fixedly connected with a threaded column 42, the outer side of the bearing piece 36 is fixedly connected with a frame strip 43, the end of the threaded column 42 away from the bearing piece 36 is movably connected with the frame strip 43, the frame strip 43 is fixedly connected with a second machine shell 37, the inside of the second machine shell 37 is provided with a stepping motor 38, the output shaft of the stepping motor 38 is fixedly connected with the threaded column 42, the outer side of the threaded column 42 is threadedly connected with a threaded block 39, the threaded block 39 is fixedly connected with the connecting strip 40, the frame strip 43 is provided with a movable slot for the movement of a limiting block 41, the limiting block 41 is inserted into the movable slot of the frame strip 43, the end of the threaded block 39 away from the connecting strip 40 is fixedly connected with the limiting block 41, the bottom of the connecting strip 40 is fixedly connected with a collecting box 20, and the scraping column 44 corresponds to the collecting box 20.

[0045] As shown in Figure 10 , Figure 11 and Figure 12 , when it is necessary to clean the impurities attached to the filter disc 14, the stepping motor 38 is started, the stepping motor 38 drives the threaded column 42 to rotate, the threaded column 42 drives the threadedly connected threaded block 39 to move towards the position of the placement shell 11, the threaded block 39 drives the limiting block 41 to move along the frame strip 43 while moving, the threaded block 39 drives the connecting strip 40 to move while moving, the connecting strip 40 drives the scraping column 44 to move towards and abut against the position of the filter disc 14 while moving, the connecting strip 40 drives the collecting box 20 to move to the bottom of the filter disc 14 while moving, and then the scraping column 44 abutting against the filter disc 14 during the rotation of the filter disc 14 scrapes off the impurities attached to the filter disc 14, and the impurities scraped off from the filter disc 14 fall into the inside of the collecting box 20 along the small holes of the filter disc 14.

[0046] A method for using a chemical vapor deposition device for a high-purity silicon carbide coating of a semiconductor, comprising the following steps:

[0047] First step: the fixed cylinder 3 is fixed to the bottom of the gas inlet pipe 2 through the fixing bolt 45, the servo motor 8 is started, the servo motor 8 drives the transmission column 9 to rotate, the transmission column 9 drives the first tooth ring 13 to rotate through the transmission gear 10 while rotating, the first tooth ring 13 drives the filter disc 14 to rotate, and the filter disc 14 drives the rotating column 16 to rotate while rotating;

[0048] Second step: the rotating column 16 drives the pressure bearing ring 21 to rotate while rotating, the pressure bearing ring 21 drives the scraping piece 24 to rotate while rotating, and the scraping piece 24 cleans the impurities attached to the inner wall of the fixed cylinder 3 while rotating.

[0049] Third step: the transmission gear 10 drives the second gear ring 19 to rotate, the second gear ring 19 drives the connecting ring 32 to rotate, the connecting ring 32 rotates to the position corresponding to the starting strip 34, and the flow of the airflow is adjusted;

[0050] Fourth step: when the impurities attached to the filter disc 14 need to be cleaned, the step motor 38 is started, the step motor 38 drives the threaded column 42 to rotate, the threaded column 42 drives the threaded block 39 to move towards the position of the placing shell 11, the threaded block 39 drives the scraping column 44 and the collecting box 20 to move towards the bottom of the filter disc 14, the filter disc 14 rotates, the scraping column 44 cleans the filter disc 14, and the falling impurities enter the inside of the collecting box 20.

[0051] Working principle:

[0052] First step, as shown in Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 , when the impurities need to be treated, the fixed cylinder 3 is fixed at the bottom of the air inlet pipe 2 through the fixing bolt 45, the servo motor 8 is started, the servo motor 8 drives the transmission column 9 to rotate, the transmission column 9 drives the transmission gear 10 to rotate when rotating, the transmission gear 10 drives the first gear ring 13 to rotate, the first gear ring 13 rotates in the bearing ring 12, the first gear ring 13 drives the filter disc 14 to rotate, and the filter disc 14 drives the rotating column 16 to rotate when rotating;

[0053] Second step, as shown in Figure 3 , Figure 4 , Figure 5 , Figure 6 and Figure 7 , when the rotating column 16 rotates, the rotating column 16 drives the pressure bearing ring 21 to rotate, the pressure bearing ring 21 drives the fixed column 22 to rotate, the fixed column 22 drives the telescopic cylinder 25 to rotate when rotating, the telescopic cylinder 25 drives the telescopic column 27 to rotate when rotating, the telescopic column 27 drives the scraping piece 24 to rotate when rotating, the scraping piece 24 cleans the impurities attached to the inner wall of the fixed cylinder 3 when rotating, when the scraping piece 24 is worn, the compressed spring 26 rebounds to drive the telescopic column 27 to move away from the telescopic cylinder 25, the telescopic column 27 can make the scraping piece 24 always adhere to the inner wall of the fixed cylinder 3 when moving;

[0054] Third step, as shown in Figure 4 , Figure 5 , Figure 6 , Figure 8 and Figure 9As shown, when the transmission gear 10 rotates, the transmission gear 10 drives the meshed second gear ring 19 to rotate reversely. When the flow rate needs to be adjusted, the second gear ring 19 drives the connecting ring 32 to rotate. When the connecting ring 32 rotates to the position corresponding to the starting strip 34, the adjusting piece 31 is blocked by the starting strip 34. Then the adjusting piece 31 rotates along the connecting ring 32 to the horizontal state. When the adjusting piece 31 rotates to the position away from the starting strip 34, the starting strip 34 removes the blocking effect on the upper end of the adjusting piece 31. Then the adjusting piece 31 rotates to the vertical state. When the adjusting piece 31 rotates, the brush strip 30 on the placing column 29 cleans the impurities attached to the top of the adjusting piece 31.

[0055] The fourth step is shown in Figure 10 、 Figure 11 and Figure 12 When the impurities attached to the filter disc 14 need to be cleaned, the step motor 38 is started. The step motor 38 drives the threaded column 42 to rotate. The threaded column 42 drives the threaded block 39 connected by threads to move towards the position of the placing shell 11. The threaded block 39 drives the limiting block 41 to move along the frame strip 43 while moving. The threaded block 39 drives the connecting strip 40 to move while moving. The connecting strip 40 drives the scraping column 44 to move towards and adhere to the position of the filter disc 14 while moving. The connecting strip 40 drives the collecting box 20 to move to the bottom of the filter disc 14 while moving. Then the scraping column 44 adhered to the filter disc 14 scrapes off the impurities attached to the filter disc 14 while the filter disc 14 rotates. The impurities scraped off from the filter disc 14 fall into the collecting box 20 through the small holes of the filter disc 14.

[0056] The embodiments of the present application are described in detail above with reference to the drawings, but the present application is not limited thereto. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present application.

Claims

1. A chemical vapor deposition apparatus for a semiconductor high purity silicon carbide coating, comprising a deposition tank, a gas inlet pipe being provided at the top of the deposition tank, characterized in that, The interior of the deposition tank is provided with a fixing cylinder, the outer side of the fixing cylinder is provided with a fixing bolt, the fixing cylinder is connected with the bottom of the air inlet pipe through the fixing bolt, the interior of the fixing cylinder is provided with a starting assembly for treating impurities in the gas, the starting assembly is provided with a filter disc and a rotating column, the impurities in the gas can be intercepted through the cooperation of the filter disc and the rotating column, the filter disc is provided with a scraping assembly matched with the starting assembly, the scraping assembly is provided with a fixing column and a scraping sheet, the inner wall of the fixing cylinder can be cleaned through the cooperation of the fixing column and the scraping sheet, the rotating column is provided with an adjusting assembly matched with the starting assembly, the adjusting assembly is provided with an adjusting sheet and a starting strip, the spraying range of the gas can be controlled through the cooperation of the adjusting sheet and the starting strip; The adjusting assembly is provided with a groove block, the groove block is fixedly connected to the bearing strip, the groove block is provided with a U-shaped groove for placing a positioning ring, the positioning ring is fixedly connected to the U-shaped groove of the positioning ring, the interior of the positioning ring is provided with a ring groove for connecting the second tooth ring, the second tooth ring is inserted into the ring groove of the positioning ring and is engaged with the transmission gear, one end of the bearing strip away from the connecting block is fixedly connected with a bearing block, the bearing block is provided with a bearing, the inner ring of the bearing of the bearing block is fixedly connected with a rotating cylinder, the rotating cylinder is sleeved on the outer side of the rotating column, the outer side of the rotating cylinder is fixedly connected with a connecting ring, the connecting ring is composed of a circular ring and a plurality of cylindrical columns, the cylindrical columns of the connecting ring are fixedly connected to the inner side of the second tooth ring, the cylindrical columns of each connecting ring are movably connected with an adjusting sheet, the outer side of the rotating column is fixedly connected with a positioning column, and the outer side of the positioning column is fixedly connected with the starting strip; Each adjusting sheet is annularly distributed, the starting strip is L-shaped, the number of the starting strips corresponds to the adjusting sheets, and the height of the starting strips corresponds to the adjusting sheets, the adjusting sheet is attached to the starting strip when the adjusting sheet is rotated to the position corresponding to the starting strip, the second tooth ring is reversely rotated when the transmission gear is rotated, the connecting ring is rotated when the flow rate needs to be adjusted, the adjusting sheet is blocked by the starting strip when the connecting ring is rotated to the position corresponding to the starting strip, the adjusting sheet is rotated to the horizontal state along the connecting ring, the starting strip removes the blocking effect on the upper end of the adjusting sheet when the adjusting sheet is rotated away from the starting strip, and the adjusting sheet is rotated to the vertical state.

2. The apparatus for chemical vapor deposition of a semiconducting high purity silicon carbide coating according to claim 1, characterized in that The starting assembly is provided with a bearing strip, the bearing strip is L-shaped, the bearing strip is fixedly connected to the outer side of the fixing cylinder, the bottom of the fixing cylinder is fixedly connected with a placing shell, the bottom of the bearing strip is fixedly connected with a connecting block, the connecting block is fixedly connected with the placing shell, the connecting block is fixedly connected with a first shell, the connecting block is provided with a bearing, the inner ring of the bearing of the connecting block is fixedly connected with a transmission column, the interior of the first shell is provided with a servo motor, the output shaft of the servo motor is fixedly connected with the transmission column, one end of the transmission column away from the servo motor is fixedly connected with a transmission gear, the bottom of the placing shell is fixedly connected with a bearing ring, the bearing ring is provided with a groove for connecting a first tooth ring, the first tooth ring is inserted into the groove of the bearing ring, the inner side of the first tooth ring is fixedly connected with a filter disc, and the first tooth ring is engaged with the transmission gear, the filter disc is provided with a plurality of small holes for filtering gas, and the filter disc is fixedly connected with a rotating column.

3. The apparatus for chemical vapor deposition of a semiconducting high purity silicon carbide coating according to claim 2, wherein The scraping assembly is provided with a pressure bearing ring fixedly connected to the top of the rotating column, a plurality of fixed columns fixedly connected to the outer side of the pressure bearing ring, a placing strip fixedly connected to the end of each fixed column away from the pressure bearing ring, a plurality of telescopic cylinders fixedly connected to each placing strip, a telescopic column arranged in each telescopic cylinder, each telescopic column inserted into the corresponding telescopic cylinder, each telescopic column fixedly connected to the corresponding scraping blade at the end away from the telescopic cylinder, a spring arranged in each telescopic cylinder, the spring sleeved outside the corresponding telescopic column, a blocking piece fixedly connected to each telescopic column, and the two ends of each spring fixedly connected to the inner wall of the corresponding telescopic cylinder and the blocking piece.

4. The apparatus for chemical vapor deposition of a semiconducting high purity silicon carbide coating according to claim 3, wherein The outer side of the placing shell is provided with a processing assembly for collecting impurities, the processing assembly is provided with a limiting cylinder fixedly connected to the outer side of the placing shell, a scraping column inserted into the limiting cylinder, a connecting strip fixedly connected to the end of the scraping column away from the placing shell, a bearing piece fixedly connected to the outer side of the placing shell, a bearing arranged on the bearing piece, a threaded column fixedly connected to the inner ring of the bearing of the bearing piece, a frame strip fixedly connected to the outer side of the bearing piece, the threaded column movably connected to the frame strip at the end away from the bearing piece, a second machine shell fixedly connected to the frame strip, a stepping motor arranged in the second machine shell, the output shaft of the stepping motor fixedly connected to the threaded column, a threaded block threadedly connected to the outer side of the threaded column, the threaded block fixedly connected to the connecting strip, a movable slot arranged on the frame strip for the limiting block, the limiting block inserted into the movable slot of the frame strip, the end of the threaded block away from the connecting strip fixedly connected to the limiting block, and a collecting box fixedly connected to the bottom of the connecting strip, and the scraping column corresponding to the collecting box.

5. The apparatus for chemical vapor deposition of a semiconducting high purity silicon carbide coating according to claim 4, wherein The bearing strip is provided with a placing slot for fixing the placing column, the placing column is fixedly connected in the placing slot of the bearing strip, and a plurality of brush strips are fixedly connected to the placing column.

6. The method of using a chemical vapor deposition apparatus for a semiconductor high purity silicon carbide coating according to claim 5, wherein The method comprises the following steps: First step: fixing the fixed cylinder to the bottom of the air inlet pipe through the fixing bolt, starting the servo motor, and rotating the transmission column to drive the first tooth ring to rotate through the transmission gear when the transmission column rotates, the first tooth ring drives the filter disc to rotate, and the filter disc drives the rotating column to rotate when rotating; Second step: the rotating column drives the pressure bearing ring to rotate when rotating, the pressure bearing ring drives the scraping blade to rotate when rotating, and the scraping blade cleans the impurities attached to the inner wall of the fixed cylinder when rotating; Third step: the transmission gear drives the second tooth ring to rotate when rotating, the second tooth ring drives the connecting ring to rotate when rotating, and the flow of the gas is adjusted when the connecting ring rotates to the position of the starting strip; Fourth step: when it is necessary to clean the impurities attached to the filter disc, start the stepping motor, the stepping motor drives the threaded column to rotate, the threaded column drives the threaded block to move towards the position of the placing shell, the threaded block drives the scraping column and the collecting box to move towards the bottom of the filter disc, and the filter disc is cleaned by the scraping column when rotating, and the falling impurities enter the inside of the collecting box.

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