Pressure regulation method, device and semiconductor process equipment

Abstract

The application discloses a pressure regulation method and device and a semiconductor process equipment, and relates to the technical field of semiconductor manufacturing, and comprises the following steps: acquiring actual pressure values of a target cavity according to a preset frequency; comparing each actual pressure value with a preset target pressure value; if the actual pressure value is equal to the preset target pressure value, keeping the current opening degree adjustment amount of a flow controller unchanged; if the actual pressure value is not equal to the preset target pressure value, performing the following steps: calculating a deviation value between the actual pressure value and the preset target pressure value according to the actual pressure value and the preset target pressure value; determining an opening degree adjustment amount of the flow controller according to the deviation value; and adjusting the actual pressure value to reach the preset target pressure value based on the opening degree adjustment amount. The pressure regulation method, the device and the semiconductor process equipment can automatically and accurately adjust the actual pressure value of the target cavity, do not need manual adjustment, and improve the control precision and efficiency.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, and more specifically to a pressure control method, apparatus, and semiconductor process equipment. Background Technology

[0002] In semiconductor manufacturing, many critical processes, such as thin film deposition and etching, need to be performed within highly controllable vacuum or low-pressure chambers. Precise chamber pressure control is crucial because it directly affects the mean free path of gas molecules, reaction rate, plasma stability, film uniformity, and etching profile. Even minute pressure fluctuations can cause process results (such as film thickness, composition, etching rate, and uniformity) to deviate significantly from targets, resulting in wafer defects or even scrap. Therefore, a high-precision, fast-response pressure control system is a core technological foundation for ensuring process repeatability and yield.

[0003] Traditional methods involve manually adjusting the opening of the inflation valve or using an MFC (mass flow controller) with pre- and post-diaphragm valves to control the inflation volume, thereby regulating the chamber pressure. However, manually adjusting the inflation valve opening results in poor control accuracy and a lag (typically >5s), making it unable to handle sudden changes in process gas flow (such as ±30% flow fluctuations). While using an MFC with pre- and post-diaphragm valves allows for open-loop control, its accuracy is also limited. For example, with a 10 Torr (a widely used pressure unit in vacuum technology) setpoint, the measured chamber pressure fluctuation range reaches ±15%. There is currently no mature and effective solution for precisely controlling the MFC opening to automatically and stably maintain a fixed chamber pressure. Furthermore, both methods suffer from poor system coordination; the inflation and evacuation systems lack a linkage mechanism, making pressure oscillations (typical overshoot of up to 20%) prone to occur during switching.

[0004] Furthermore, during processes such as degassing (heating and degassing) in the cavity, maintaining a constant cavity pressure is crucial for ensuring process quality. Improper pressure control, whether too high or too low, can lead to process abnormalities and affect product quality. In research experiments and industrial production where cavity pressure stability is extremely critical, such as etching and coating processes in semiconductor manufacturing, even minute fluctuations in cavity pressure can severely impact product quality.

[0005] Therefore, the existing technology lacks a pressure control method, device, and semiconductor process equipment that can automatically and accurately regulate the cavity pressure to maintain it at a preset pressure value, so as to improve control accuracy and efficiency and ensure process quality. Summary of the Invention

[0006] This invention aims to address one of the technical problems in related technologies to a certain extent. To this end, this invention provides a pressure regulation method, apparatus, and semiconductor process equipment that can automatically and accurately adjust the actual pressure value of a target cavity without manual adjustment, thus improving control accuracy and efficiency.

[0007] To achieve the above objectives, the present invention adopts the following technical solution:

[0008] A pressure regulation method, comprising:

[0009] The actual pressure value of the target cavity is obtained according to the preset frequency;

[0010] Compare each actual pressure value with the preset target pressure value; if the actual pressure value equals the preset target pressure value, keep the current opening adjustment of the flow controller unchanged; if the actual pressure value does not equal the preset target pressure value, perform the following steps:

[0011] Calculate the deviation between the actual pressure value and the preset target pressure value based on the actual pressure value and the preset target pressure value;

[0012] Based on the deviation value, determine the opening adjustment amount of the flow controller;

[0013] Based on the opening adjustment amount, adjust the actual pressure value to achieve the preset target pressure value.

[0014] Optionally, the opening adjustment amount of the flow controller is determined based on the deviation value, including:

[0015] Compare the deviation value with the preset valve switching threshold;

[0016] If the deviation value is greater than the preset valve switching threshold, the fast / slow air extraction valve group is controlled to enter the fully open state, and the current opening adjustment of the flow controller remains unchanged;

[0017] If the deviation value is less than the preset valve switching threshold, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value.

[0018] Optionally, based on the deviation value, the opening adjustment amount of the flow controller is analyzed and calculated, including:

[0019] A self-tuning algorithm is used to analyze and calculate the proportional coefficient, and the product of the proportional coefficient and the deviation value is used as the first adjustment term.

[0020] Select a preset time period as the integration time, calculate the integral of the deviation value within the preset time period, and calculate the product of the ratio of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as the second adjustment term.

[0021] The rate of change of the deviation value between adjacent time points is analyzed and calculated. A self-tuning algorithm is used to analyze and calculate the differential time. The product of the rate of change, the differential time, and the proportional coefficient is calculated as the third adjustment term.

[0022] The sum of the first adjustment item, the second adjustment item, and the third adjustment item is calculated as the adjustment coefficient, and the target flow value is analyzed and calculated based on the deviation value.

[0023] Based on the adjustment coefficient and the target flow rate, the opening adjustment amount of the flow controller is analyzed and calculated.

[0024] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, including:

[0025] A first-order inertial pure time delay mathematical model containing time constants and gain parameters is constructed using the recursive least squares method;

[0026] The target parameters are obtained by iterating the mathematical model a preset number of times using an improved particle swarm optimization algorithm.

[0027] The mathematical model is optimized using objective parameters.

[0028] Optionally, before optimizing the mathematical model using the objective parameters, the following steps are also included:

[0029] The target parameter and historical parameters are mixed and output for verification according to preset weights. When the root mean square error of the verification result decreases by more than a first preset deviation value compared to the root mean square error of the historical result, the target parameter is activated.

[0030] Optionally, the method further includes:

[0031] When using mathematical models for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model.

[0032] When the deviation between the predicted result and the actual result exceeds the second preset deviation value, the mathematical model automatically fine-tunes the target parameters.

[0033] Optionally, the method further includes:

[0034] Update the preset target pressure value to obtain the updated preset target pressure value;

[0035] Calculate the deviation between the actual pressure value and the updated preset target pressure value, or the pressure difference between the preset target pressure value before the update and the updated preset target pressure value;

[0036] Determine whether the deviation value or pressure difference value is greater than the preset critical threshold;

[0037] If the deviation value or pressure difference value is greater than the preset critical threshold, the target cavity is switched. The preset critical threshold is greater than the preset valve switching threshold.

[0038] Furthermore, the present invention also provides a pressure regulation device, comprising: a pressure acquisition module, a pressure control module, and a pressure regulation module; wherein,

[0039] The pressure acquisition module is connected to the target cavity and is used to acquire the actual pressure value of the target cavity according to a preset frequency and output it to the pressure control module.

[0040] The pressure control module is connected to the pressure acquisition module and is used to compare each actual pressure value with the preset target pressure value, generate the corresponding comparison result, and generate the corresponding control signal based on the comparison result or the comparison result and the preset valve switching threshold.

[0041] The pressure regulation module is connected to both the pressure control module and the target cavity, and is used to adjust the actual pressure value of the target cavity to achieve the target pressure value according to the control signal.

[0042] Optionally, the pressure control module includes: a programmable logic control module, a proportional-integral-derivative control module, and an industrial computer module.

[0043] The programmable logic control module is connected to the pressure acquisition module and the pressure regulation module respectively. It is used to compare each actual pressure value with the preset target pressure value. If the comparison result is that the two are equal, a steady-state control signal is generated. If the comparison result is that the two are not equal, the deviation value between the actual pressure value and the preset target pressure value is calculated, and the deviation value is compared with the preset valve switching threshold to generate the corresponding ordinary regulation control signal or flow calculation signal.

[0044] The proportional-integral-derivative control module is connected to the programmable logic control module and the pressure regulation module respectively. It is used to analyze and calculate the target flow value based on the flow calculation signal when the deviation value is less than the preset valve switching threshold, and generate the opening adjustment amount based on the target flow value and output it to the pressure regulation module.

[0045] The industrial control computer module is connected to the programmable logic controller module and is used to set preset target pressure values ​​and preset valve switching thresholds, as well as to visualize preset option information.

[0046] Optionally, the pressure regulating module includes a flow controller and a fast / slow evacuation valve assembly.

[0047] The flow controller is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to achieve the target pressure value according to the opening adjustment amount output by the pressure control module;

[0048] The fast / slow exhaust valve assembly is connected to the pressure control module and the target cavity respectively. When the deviation value is greater than the preset valve switching threshold, the fast / slow exhaust valve assembly enters the fully open state; and when the deviation value is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value, the fast / slow exhaust valve assembly enters the half-open state.

[0049] Optionally, the flow controller includes: a mass flow controller, a first diaphragm valve, and a second diaphragm valve.

[0050] The mass flow controller is connected to the pressure control module and is used to adjust the opening based on the opening adjustment amount output by the pressure control module.

[0051] The first diaphragm valve is connected to the gas source module and the mass flow controller, respectively. The second diaphragm valve is connected to the mass flow controller and the target cavity, respectively. After the mass flow controller adjusts its opening, the first diaphragm valve and the second diaphragm valve are used to inflate the target cavity with gas so that the actual pressure value reaches the preset target pressure value.

[0052] Optionally, the device may further include: an air source module and / or an air pump module.

[0053] The gas supply module is connected to the flow controller and is used to inflate the target cavity through the flow controller;

[0054] The air pump module is connected to the fast / slow evacuation valve assembly, which is used to extract gas from the target cavity through the fast / slow evacuation valve assembly.

[0055] Optionally, the device further includes: a target cavity, a slide rail, a placement module, and a sensing module; wherein,

[0056] The target cavity includes a main cavity and an auxiliary cavity, wherein a sealing door is provided between the main cavity and the auxiliary cavity; when the sealing door is open, the main cavity and the auxiliary cavity are connected; when the sealing door is closed, the main cavity and the auxiliary cavity are sealed and isolated from each other.

[0057] The slide rail is embedded in the bottom inner surface of the main cavity and the auxiliary cavity;

[0058] The storage module is slidably mounted on the slide rail and is connected to the pressure control module. After receiving the cavity switching control signal generated by the pressure control module, it slides along the slide rail through the sealing door from the main cavity to the auxiliary cavity or from the auxiliary cavity to the main cavity.

[0059] The sensor module is mounted on the slide rail and is used to open or close the sealing door when the storage module reaches or leaves the preset position.

[0060] Optionally, the pressure control module is connected to the storage module and is used to generate a cavity switching control signal and output it to the storage module when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein, the preset critical threshold is greater than a preset valve switching threshold.

[0061] Optionally, the proportional-integral-derivative control module includes: a proportional unit, a derivative unit, an integral unit, and a central control unit.

[0062] The proportional unit is connected to the central control unit and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm. Based on the proportional coefficient and the deviation value, the product of the proportional coefficient and the deviation value is calculated as the first adjustment term.

[0063] The differential unit is connected to the central control unit and is used to select a preset time period as the integration time, calculate the integral of the deviation value within the preset time period, and calculate the product of the quotient of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as the second adjustment term.

[0064] The integral unit is connected to the central control unit and is used to analyze and calculate the rate of change of the deviation value between adjacent time points based on the deviation value; to analyze and calculate the differential time using a self-tuning algorithm; and to calculate the product of the rate of change, differential time, and proportional coefficient as the third adjustment term based on the rate of change, differential time, and proportional coefficient.

[0065] The central control unit is connected to the programmable logic control module and the pressure regulation module respectively. It is used to receive the deviation value, proportional coefficient, first adjustment item, second adjustment item and third adjustment item; when the deviation value is less than the preset valve switching threshold, it analyzes and calculates the target flow value according to the flow calculation signal; it adds the first adjustment item, second adjustment item and third adjustment item to obtain the regulation coefficient; and it generates the opening regulation amount according to the target flow value and the regulation coefficient, and outputs it to the pressure regulation module.

[0066] Furthermore, the present invention also provides a semiconductor process apparatus, including any of the pressure control devices described above.

[0067] The pressure control method, apparatus, and semiconductor process equipment provided by this invention acquire the actual pressure value of a target cavity according to a preset frequency; compare each actual pressure value with a preset target pressure value; if the actual pressure value equals the preset target pressure value, keep the current opening adjustment of the flow controller unchanged; if the actual pressure value does not equal the preset target pressure value, perform the following steps: calculate the deviation between the actual pressure value and the preset target pressure value; determine the opening adjustment of the flow controller based on the deviation value; and adjust the actual pressure value to reach the preset target pressure value based on the opening adjustment. The pressure control method, apparatus, and semiconductor process equipment of this invention can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, improving control accuracy and efficiency.

[0068] These features and advantages of the present invention will be disclosed in detail in the following specific embodiments and accompanying drawings. The preferred embodiments or means of the present invention will be shown in detail in conjunction with the accompanying drawings, but are not intended to limit the technical solutions of the present invention. In addition, each of these features, elements and components appearing in the following text and drawings is a plurality of, and different symbols or numbers are used for convenience of representation, but all represent parts with the same or similar construction or function. Attached Figure Description

[0069] The present invention will be further described below with reference to the accompanying drawings:

[0070] Figure 1a A schematic diagram of the pressure control method provided by the present invention;

[0071] Figure 1b Another schematic diagram of the pressure control method provided by the present invention;

[0072] Figure 2a A schematic diagram of a circuit module structure of the pressure regulation device provided by the present invention;

[0073] Figure 2b A schematic diagram of another circuit module structure of the pressure regulation device provided by the present invention;

[0074] Figure 2c A schematic diagram of another circuit module structure of the pressure regulation device provided by the present invention;

[0075] Figure 2d A schematic diagram of the target cavity in the pressure control device provided by the present invention;

[0076] Figure 2e A schematic diagram of another circuit module structure of the pressure regulation device provided by the present invention. Detailed Implementation

[0077] Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described are intended to explain the present invention and should not be construed as limiting the invention.

[0078] The terms "an embodiment," "example," or "trademark" used in this specification refer to a particular feature, structure, or characteristic described in connection with the embodiment itself that may be included in at least one embodiment disclosed in this invention. The phrase "in an embodiment" appearing in various places throughout the specification does not necessarily refer to the same embodiment.

[0079] As a first aspect of the present invention, a pressure regulation method is provided, such as... Figure 1a As shown, the method includes:

[0080] Step S10: Obtain the actual pressure value of the target cavity according to the preset frequency;

[0081] In step S10, a preset frequency can be set using a vacuum gauge, which then acquires the actual pressure value of the target cavity according to the preset frequency. The vacuum gauge can be any existing vacuum gauge; those skilled in the art can choose according to actual needs, and no limitation is made here. Preferably, the vacuum gauge includes a pressure sensor with an accuracy of 0.1%FS (femtosecond).

[0082] Furthermore, those skilled in the art can select the preset frequency according to actual needs, and no limitation is made here. Preferably, the preset frequency is 10 Hz (Hertz).

[0083] Step S11: Compare each actual pressure value with the preset target pressure value;

[0084] In this invention, taking 10Hz as an example, the vacuum gauge acquires the actual pressure value of the target cavity every 0.1 seconds and outputs it to the pressure control module for comparison with the preset target pressure value. Therefore, precise adjustment of the actual pressure value of the target cavity can be achieved. In other words, the monitoring cycle of this invention is 0.1 seconds.

[0085] Step S12: If the actual pressure value is equal to the preset target pressure value, keep the current opening adjustment of the flow controller unchanged;

[0086] If the actual pressure value is not equal to the preset target pressure value, perform the following steps:

[0087] Step S13: Calculate the deviation between the actual pressure value and the preset target pressure value based on the actual pressure value and the preset target pressure value;

[0088] Step S14: Determine the opening adjustment amount of the flow controller based on the deviation value;

[0089] Step S15: Based on the opening adjustment amount, adjust the actual pressure value to reach the preset target pressure value.

[0090] like Figure 1b As shown, in this invention, step S14 may further include:

[0091] Step S141: Compare the deviation value with the preset valve switching threshold;

[0092] Step S142: If the deviation value is greater than the preset valve switching threshold, control the fast / slow air extraction valve group to enter the fully open state, and keep the current opening adjustment of the flow controller unchanged;

[0093] Step S143: If the deviation value is less than the preset valve switching threshold, analyze and calculate the opening adjustment amount of the flow controller based on the deviation value.

[0094] The preset valve switching threshold can be pre-set by the industrial control computer module in the pressure control module and then output to the programmable logic control module in the pressure control module. Those skilled in the art can select the value of the preset valve switching threshold according to actual needs; no limitation is made here. It should be noted that the preset valve switching threshold can be a point value or a range value.

[0095] In step S143, based on the deviation value, the opening adjustment amount of the flow controller is analyzed and calculated, specifically including:

[0096] Step S1431: Use a self-tuning algorithm to analyze and calculate the proportional coefficient, and calculate the product of the proportional coefficient and the deviation value as the first adjustment term based on the proportional coefficient and the deviation value.

[0097] Proportional adjustment mechanism: Based on the deviation between the actual pressure value of the current target cavity and the preset target pressure value, the opening of the flow controller is adjusted proportionally. The function of the proportional adjustment mechanism is to respond quickly to the deviation value. Its adjustment speed is related to the proportional coefficient. The larger the proportional coefficient, the stronger the adjustment effect. However, an excessively large proportional coefficient may lead to overshoot or even instability of the device.

[0098] During operation of the pressure control device, the pressure acquisition module collects the actual pressure value of the target cavity in real time and transmits it to the pressure control module. The pressure control module analyzes and calculates the deviation value, then obtains the proportional coefficient according to the self-tuning algorithm, and calculates the product of the proportional coefficient and the deviation value as the first adjustment term output. This output value is part of the flow controller's opening adjustment amount and directly affects the flow controller's opening adjustment. For example, if the current actual pressure value of the target cavity is less than the preset target pressure value, the proportional circuit will output a positive adjustment signal according to the magnitude of the deviation value and the proportional coefficient, increasing the flow controller's opening to increase the inflation volume; conversely, it will decrease the flow controller's opening.

[0099] Step S1432: Select a preset time period as the integration time. Calculate the integral of the deviation value within the preset time period based on the integration time. Calculate the product of the ratio of the ratio coefficient and the integration time and the integral of the deviation value within the preset time period as the second adjustment term.

[0100] Integral stage: This stage accumulates and integrates the deviation value to eliminate steady-state error and ensure that the actual pressure value of the target cavity eventually stabilizes at the preset target pressure value. Even if the proportional stage reduces the deviation value to a certain extent, if a small, persistent deviation exists, the integral stage will continuously accumulate the deviation over time, enhancing the regulating effect until the steady-state error is eliminated. The regulating strength of the integral stage is determined by the integral time; the shorter the integral time, the stronger the integral effect. However, an excessively short integral time may lead to slow system response or oscillations.

[0101] After each deviation calculation, the pressure control module accumulates the deviation value into the integral term. It calculates the output value of the integral term by multiplying the quotient of the proportional gain and the integral time by the integral of the deviation value over a preset time period. This output value is then superimposed on the output value of the proportional term, jointly affecting the flow controller's opening adjustment. For example, when the output value of the integral term is close to the preset target pressure value but still has a small deviation, the integral term continues to accumulate this deviation value, gradually adjusting the flow controller's opening until the actual pressure value of the target cavity reaches the preset target pressure value.

[0102] Step S1433: Analyze and calculate the rate of change of the deviation value between adjacent time points, and use a self-tuning algorithm to analyze and calculate the differential time. Based on the rate of change, differential time, and proportional coefficient, calculate the product of the rate of change, differential time, and proportional coefficient as the third adjustment term.

[0103] The derivative element adjusts the flow controller's opening based on the rate of change of the deviation value. Its function is to predict pressure change trends and adjust the flow controller's opening in advance to prevent pressure overshoot. When the deviation value changes rapidly, the derivative element outputs a larger adjustment signal to suppress excessive adjustment of the flow controller's opening; when the deviation value changes slowly, the effect of the derivative element weakens. The adjustment strength of the derivative element is determined by the derivative time. The longer the derivative time, the higher the sensitivity to the rate of change of the deviation value; however, an excessively long derivative time is prone to introducing noise interference.

[0104] The pressure control module approximates the rate of change of the deviation value by calculating the change in deviation value between adjacent time points. Then, combining this with the derivative time and proportional coefficient obtained from the self-tuning algorithm, it calculates the output value of the derivative element by multiplying the rate of change, derivative time, and proportional coefficient. This output value is added to the output values ​​of the proportional and integral elements to jointly determine the final opening adjustment of the flow controller. For example, when the actual pressure value of the target cavity rises rapidly and approaches the preset target pressure value, the derivative element outputs a reverse adjustment signal based on the rate of change of the deviation value between adjacent time points, reducing the opening adjustment of the flow controller in advance to avoid overshoot of the actual pressure value of the target cavity.

[0105] Step S1434: Add the first adjustment item, the second adjustment item, and the third adjustment item together as the adjustment coefficient, and analyze and calculate the target flow rate value based on the deviation value;

[0106] Step S1435: Analyze and calculate the opening adjustment amount of the flow controller based on the adjustment coefficient and the target flow value.

[0107] It should be noted that steps S1431 to S1435 are not shown in the figures, but are only used for the purpose of describing the pressure control method of the present invention.

[0108] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, including:

[0109] A first-order inertial pure time delay mathematical model containing time constants and gain parameters is constructed using the recursive least squares method;

[0110] The target parameters are obtained by iterating the mathematical model a preset number of times using an improved particle swarm optimization algorithm.

[0111] The mathematical model is optimized using objective parameters.

[0112] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, which includes: constructing a first-order inertial pure time delay mathematical model containing time constant and gain parameter using recursive least squares method; optimizing the mathematical model by iterating it a preset number of times (preferably 30 times) using an improved particle swarm optimization algorithm to obtain target parameters; and optimizing the mathematical model using the target parameters.

[0113] It should be noted that before optimizing the mathematical model using the target parameters, the target parameters of the mathematical model can be verified. Specifically, the target parameters and historical parameters are mixed and output for verification according to a preset weight (preferably 1:9). When the root mean square error of the verification result decreases by more than a first preset deviation value (preferably 15%) compared to the root mean square error of the historical results, the target parameters are activated.

[0114] When using this mathematical model for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; when the deviation between the predicted result and the actual result exceeds the second preset deviation value (preferably 5%), the mathematical model automatically fine-tunes the target parameters.

[0115] Among them, the first-order inertial pure time-delay mathematical model, the improved particle swarm optimization algorithm, and the long short-term memory network model are all existing models and algorithms. Those skilled in the art can choose according to actual needs, and no limitation is made here. In addition, those skilled in the art can also adjust the preset number of times, preset weights, first preset deviation value, and second preset deviation value according to actual needs, and no limitation is made here.

[0116] The hybrid self-tuning algorithm, the optimization and verification method of the target parameters of the mathematical model, and the fine-tuning method of the target parameters of the mathematical model adopted in the embodiments of the present invention are all aimed at making the output of the proportional-integral-derivative control module (i.e., PID control system) in the pressure control module more accurate, so as to calculate the opening adjustment amount more accurately and achieve precise regulation and control of the actual pressure value in the target cavity.

[0117] Optionally, before optimizing the mathematical model using the target parameters, the following steps are also included:

[0118] The target parameter and historical parameters are mixed and output for verification according to a preset weight. When the root mean square error of the verification result exceeds the root mean square error of the historical parameters by more than a first preset deviation value, the target parameter is activated.

[0119] In one alternative implementation, the method further includes:

[0120] When using mathematical models for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model.

[0121] When the deviation between the predicted result and the actual result exceeds the second preset deviation value, the mathematical model automatically fine-tunes the target parameters.

[0122] In one optional implementation, the method further includes: updating a preset target pressure value to obtain an updated preset target pressure value;

[0123] Calculate the deviation between the actual pressure value and the updated preset target pressure value, or the pressure difference between the preset target pressure value before the update and the updated preset target pressure value;

[0124] Determine whether the deviation value or pressure difference value is greater than the preset critical threshold;

[0125] If the deviation value or pressure difference value is greater than the preset critical threshold, the target cavity is switched. The preset critical threshold is greater than the preset valve switching threshold.

[0126] The pressure control method provided by this invention obtains the actual pressure value of the target cavity according to a preset frequency; compares each actual pressure value with a preset target pressure value; if the actual pressure value equals the preset target pressure value, the current opening adjustment of the flow controller remains unchanged; if the actual pressure value does not equal the preset target pressure value, the following steps are performed: calculating the deviation between the actual pressure value and the preset target pressure value; determining the opening adjustment of the flow controller based on the deviation value; and adjusting the actual pressure value to reach the preset target pressure value based on the opening adjustment. This pressure control method can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, improving control accuracy and efficiency.

[0127] As a second aspect of the present invention, a pressure regulating device is provided, such as... Figure 2a As shown, the device includes: a pressure acquisition module 20, a pressure control module 21, and a pressure adjustment module 22; wherein, the pressure acquisition module 21 is connected to the target cavity 23 and is used to acquire the actual pressure value of the target cavity according to a preset frequency and output it to the pressure control module 21; the pressure control module 21 is connected to the pressure acquisition module 20 and is used to compare each actual pressure value with a preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal according to the comparison result or the comparison result and a preset valve switching threshold; the pressure adjustment module 22 is connected to the pressure control module 21 and the target cavity 23 respectively, and is used to adjust the actual pressure value of the target cavity 23 to reach the target pressure value according to the control signal output by the pressure control module 21.

[0128] In this invention, the pressure acquisition module 20 can be a vacuum gauge from the prior art; those skilled in the art can choose according to actual needs, and no limitation is made here. Preferably, it is a vacuum gauge including a pressure sensor with an accuracy of 0.1%FS. Furthermore, those skilled in the art can also choose the preset frequency according to actual needs, and no limitation is made here. Preferably, the preset frequency is 10Hz.

[0129] Specifically, a preset frequency can be set using a vacuum gauge, which will then obtain the actual pressure value of the target cavity according to the preset frequency.

[0130] Optionally, such as Figure 2b As shown, the pressure control module 21 further includes: a programmable logic control module 211, a proportional-integral-derivative control module 212, and an industrial computer module 213; wherein,

[0131] The programmable logic control module 211 is connected to the pressure acquisition module 20 and the pressure regulation module 22 respectively. It is used to compare each actual pressure value with the preset target pressure value. If the comparison result is that the two are equal, a steady-state control signal is generated. If the comparison result is that the two are not equal, the deviation value between the actual pressure value and the preset target pressure value is calculated, and the deviation value is compared with the preset valve switching threshold to generate the corresponding ordinary regulation control signal or flow calculation signal.

[0132] The preset valve switching threshold can be pre-set by the industrial control computer module 213 and then output to the programmable logic control module 211. The size of the preset valve switching threshold can be selected by those skilled in the art according to actual needs, and is not limited here. It should be noted that the preset valve switching threshold can be a point value or a range value.

[0133] The proportional-integral-derivative control module 212 is connected to the programmable logic control module 211 and the pressure regulation module 22 respectively. When the deviation value is less than the preset valve switching threshold, it analyzes and calculates the target flow value based on the flow calculation signal output by the programmable logic control module 211, and generates the opening adjustment amount based on the target flow value and outputs it to the pressure regulation module 22.

[0134] Optionally, the proportional-integral-derivative (PI-DE) control module 212 adopts a PID control system from the prior art. Those skilled in the art can choose according to actual needs, and no limitation is made here. Preferably, the PI-DE control module 212 adopts a bipolar PID control system from the prior art. This invention precisely adjusts the opening of the mass flow controller (MFC) through the PID control system to precisely control the inflation volume, thereby precisely controlling the actual pressure value of the target cavity to remain at the preset target pressure value, improving the accuracy of pressure control. Furthermore, the PID control system has good dynamic response performance, capable of quickly responding (response time less than 100ms) to changes in the actual pressure value of the target cavity, and timely adjusting the opening of the MFC to ensure that the actual pressure value of the target cavity always remains at the preset target pressure value, improving the stability and reliability of pressure control.

[0135] The industrial control computer module 213 is connected to the programmable logic control module 211 and is used to set the preset target pressure value and preset valve switching threshold, as well as to visualize the preset option information.

[0136] The preset option information may include one or more of the following: preset frequency, preset target pressure value, preset valve switching threshold, target flow value, opening adjustment amount, etc. Those skilled in the art can select according to actual needs, and there is no limitation here.

[0137] Optionally, the programmable logic control module 211 and the industrial computer module 213 communicate using etherCAT (Ethernet Automation Technology) and / or ADS (Automation Device Specification), technologies already available in the art. Those skilled in the art can choose the appropriate technology based on their specific needs; no limitation is imposed here. Alternatively, the programmable logic control module 211 and the industrial computer module 213 can utilize existing circuit modules; those skilled in the art can choose the appropriate technology based on their specific needs; no limitation is imposed here.

[0138] like Figure 2b As shown, the pressure regulating module 22 may further include: a flow controller 221 and a fast / slow suction valve assembly 222; wherein,

[0139] The flow controller 221 is connected to the pressure control module 21 and the target cavity 23 respectively, and is used to adjust the actual pressure value of the target cavity 23 to reach the target pressure value according to the opening adjustment amount output by the pressure control module 21.

[0140] Specifically, the flow controller 221 is connected to the proportional-integral-derivative control module 212 in the pressure control module 21 and the target cavity 23 respectively, and is used to adjust the actual pressure value of the target cavity 23 to reach the target pressure value according to the opening adjustment amount output by the proportional-integral-derivative control module 212 in the pressure control module 21.

[0141] The fast / slow exhaust valve assembly 222 is connected to the pressure control module 21 and the target cavity 23 respectively. When the deviation value is greater than the preset valve switching threshold, the fast / slow exhaust valve assembly 222 enters the fully open state according to the normal adjustment control signal output by the pressure control module 21; and when the deviation value is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value, the fast / slow exhaust valve assembly 222 enters the half-open state.

[0142] The fast / slow extraction valve assembly 222 can be any fast / slow extraction valve assembly in the prior art. Those skilled in the art can choose according to actual needs, and no limitation is made here. Preferably, the fast / slow extraction valve assembly 222 is a high-vacuum L-type electric valve or a high-vacuum straight-through electric valve in the prior art. It should be noted that the fast / slow extraction valve assembly 222 needs to have at least two working states. The first working state is the fully open state, which allows gas to pass through at maximum flow rate. At this time, the fast / slow extraction valve assembly 222 has the least resistance and the gas flow is the smoothest. The second working state is the half-open state, which limits the gas flow rate by reducing the gas flow channel area, thereby controlling the gas pressure and speed.

[0143] Specifically, the fast / slow exhaust valve assembly 222 is connected to the programmable logic control module 211 in the pressure control module 21 and the target cavity 23, respectively. When the deviation value is greater than the preset valve switching threshold, the fast / slow exhaust valve assembly 222 is made to enter the fully open state according to the normal adjustment control signal output by the programmable logic control module 211 in the pressure control module 21; and when the deviation value is less than the preset valve switching threshold or according to the steady-state control signal, the fast / slow exhaust valve assembly 222 is made to enter the half-open state.

[0144] In one alternative implementation, combined with Figure 2b and Figure 2c The flow controller 221 further includes: a mass flow controller 2211, a first diaphragm valve 2212, and a second diaphragm valve 2213; wherein, the mass flow controller 2211 is connected to the pressure control module 21 and is used to adjust the opening of the mass flow controller 2211 according to the opening adjustment amount output by the pressure control module 21; the first diaphragm valve 2212 is connected to the air source module 24 and the mass flow controller 2211 respectively, and the second diaphragm valve 2213 is connected to the mass flow controller 2211 and the target cavity 23 respectively, and is used to inflate the target cavity 23 with air through the first diaphragm valve 2212 and the second diaphragm valve 2213 after the mass flow controller 2211 adjusts the opening, so that the actual pressure value reaches the preset target pressure value.

[0145] In another alternative implementation, the flow controller includes only a mass flow controller, i.e., a mass flow controller (MFC). Compared to the method of setting a first diaphragm valve and a second diaphragm valve, this method is simpler in structure, lower in cost, and easier to implement because it does not require additional devices such as diaphragm valves.

[0146] Specifically, the mass flow controller 2211 is connected to the proportional-integral-derivative control module 212 in the pressure control module 21, and is used to adjust the opening of the mass flow controller 2211 according to the opening adjustment amount output by the proportional-integral-derivative control module 212 in the pressure control module 21; the first diaphragm valve 2212 is connected to the air source module 24 and the mass flow controller 2211 respectively, and the second diaphragm valve 2213 is connected to the mass flow controller 2211 and the target cavity 23 respectively, and is used to fill the target cavity 23 with air through the first diaphragm valve 2212 and the second diaphragm valve 2213 after the mass flow controller 2211 adjusts the opening, so that the actual pressure value reaches the preset target pressure value.

[0147] In this invention, the mass flow controller 2211, the first diaphragm valve 2212, and the second diaphragm valve 2213 are all components in the prior art, and those skilled in the art can select them according to actual needs; no limitation is made here. It should be noted that the mass flow controller 2211 is an MFC (Mass Flow Controller), therefore, those skilled in the art can select various suitable MFCs as mass flow controllers according to actual needs. Preferably, the flow range is 0-500 sccm (standard cubic centimeters per minute), and the accuracy is ±0.8% of the MFC.

[0148] In specific embodiments of the present invention, such as Figure 2b and Figure 2c As shown, the device may further include: a gas source module 24 and / or a gas pump module 25; wherein, the gas source module 24 is connected to a flow controller 221 and is used to inflate the target cavity 23 through the flow controller 221; the gas pump module 25 is connected to a fast / slow extraction valve group 222 and is used to extract gas from the target cavity 23 through the fast / slow extraction valve group 222.

[0149] To ensure the stability of the pressure in the target cavity 23, the gas source module 24 preferably uses an inert gas process gas source that conforms to semiconductor manufacturing processes, such as nitrogen process gas source, argon process gas source, etc.; while the gas pump module 24 preferably uses a vacuum pump system. Those skilled in the art can choose according to actual needs, and no limitation is made here.

[0150] In one optional embodiment of the present invention, such as Figures 2a to 2dAs shown, the device further includes: a target cavity 23, a slide rail 26, a storage module 27, and a sensing module (not shown in the figure); wherein, the target cavity 23 further includes a main cavity 231 and an auxiliary cavity 232, wherein a sealing door 233 is provided between the main cavity 231 and the auxiliary cavity 232; when the sealing door 233 is open, the main cavity 231 and the auxiliary cavity 232 are connected; when the sealing door is closed, the main cavity 231 and the auxiliary cavity 232 are mutually sealed and isolated; the slide rail 26 is embedded in the bottom inner surface of the main cavity 231 and the auxiliary cavity 232. The placement module 27 is slidably mounted on the slide rail 26 and is connected to the pressure control module 21 (such as the programmable logic control module 211). After receiving the cavity switching control signal output by the pressure control module 21, it slides along the slide rail 26 through the sealing door 233 from the main cavity 231 to the auxiliary cavity 232 or from the auxiliary cavity 232 to the main cavity 231. The sensing module (not shown in the figure) is set at a preset position on the slide rail 26 and is used to control the sealing door 233 to open or close when the placement module 27 reaches or leaves the preset position.

[0151] In this optional embodiment, the pressure control module 21 is also connected to the placement module 27, and is used to generate a cavity switching control signal and output it to the placement module 27 when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein, the preset critical threshold is greater than the preset valve switching threshold.

[0152] The preset critical threshold and the type and preset location of the sensing module can be selected by those skilled in the art according to actual needs, and are not limited here. However, it should be noted that the preset critical threshold is greater than the preset valve switching threshold.

[0153] Optionally, the sensing module can be a pressure sensor module, a laser sensor module, etc. Those skilled in the art can choose according to actual needs, which will not be elaborated here.

[0154] In the use of the pressure control device of the present invention, when the preset target pressure value is updated, causing a significant change in the deviation value or the pressure difference between two adjacent preset target pressure values, in order to improve control accuracy, efficiency and response speed, those skilled in the art can set a preset critical threshold. When the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than the preset critical threshold, the pressure control module 21 generates a cavity switching control signal. Under the control of the cavity switching control signal, the placement module 27 slides from the main cavity 231 to the auxiliary cavity 232 or from the auxiliary cavity 232 to the main cavity 231.

[0155] It should be understood that before the main cavity 231 slides towards the auxiliary cavity 232, the actual pressure value in the auxiliary cavity 232 must be equal to the updated preset target pressure value; and before the auxiliary cavity 232 slides towards the main cavity 231, the actual pressure value in the main cavity 231 must be equal to the updated preset target pressure value. This ensures control accuracy, efficiency, and response speed. Furthermore, the method for adjusting the actual pressure value in the corresponding cavity after updating the preset target pressure value refers to the pressure control method of this invention, and will not be elaborated here.

[0156] In another optional embodiment, a preset number of buffer chambers can be provided between the main chamber and the auxiliary chambers. Corresponding sealing doors are provided between the main chamber and its adjacent buffer chambers, between adjacent buffer chambers, and between the buffer chambers and the auxiliary chambers. The actual pressure values ​​in the multiple buffer chambers should be equal to the updated preset target pressure values. This arrangement is to prevent pressure oscillations in the chambers caused by gas diffusion when the sealing doors are opened, further improving control accuracy, efficiency, and response speed. To save space, the multiple buffer chambers can also employ foldable chambers as in existing technologies, which will not be elaborated upon here.

[0157] In one alternative implementation, such as Figures 2a to 2e As shown, the proportional-integral-derivative control module 212 includes: a proportional unit 2121, an integral unit 2122, a derivative unit 2123, and a central control unit 2124; wherein,

[0158] The proportional unit 2121 is connected to the central control unit 2124 and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm, and calculate the product of the proportional coefficient and the deviation value as the first adjustment term based on the proportional coefficient and the deviation value.

[0159] Optionally, the self-tuning algorithm is a hybrid self-tuning algorithm, which includes: constructing a first-order inertial pure time delay mathematical model containing time constant and gain parameter using recursive least squares method; optimizing the mathematical model by iterating it a preset number of times (preferably 30 times) using an improved particle swarm optimization algorithm to obtain target parameters; and optimizing the mathematical model using the target parameters.

[0160] It should be noted that before optimizing the mathematical model using the target parameters, the target parameters of the mathematical model can be verified. Specifically, the target parameters and historical parameters are mixed and output for verification according to a preset weight (preferably 1:9). When the root mean square error of the verification result decreases by more than a first preset deviation value (preferably 15%) compared to the root mean square error of the historical results, the target parameters are activated.

[0161] When using this mathematical model for analysis and calculation, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model; when the deviation between the predicted result and the actual result exceeds the second preset deviation value (preferably 5%), the mathematical model automatically fine-tunes the target parameters.

[0162] Among them, the first-order inertial pure time-delay mathematical model, the improved particle swarm optimization algorithm, and the long short-term memory network model are all existing models and algorithms. Those skilled in the art can choose according to actual needs, and no limitation is made here. In addition, those skilled in the art can also adjust the preset number of times, preset weights, first preset deviation value, and second preset deviation value according to actual needs, and no limitation is made here.

[0163] The hybrid self-tuning algorithm, the optimization and verification method of the target parameters of the mathematical model, and the fine-tuning method of the target parameters of the mathematical model adopted in this embodiment of the invention are all to make the output of the proportional-integral-derivative control module 212 more accurate, so as to calculate the opening adjustment amount more accurately and achieve precise adjustment of the actual pressure value in the target cavity 23.

[0164] The integral unit 2122 is connected to the central control unit 2124 and is used to select a preset time period as the integral time, calculate the integral of the deviation value within the preset time period, and calculate the product of the ratio of the proportional coefficient output by the central control unit 2124 and the integral time and the integral of the deviation value within the preset time period as the second adjustment term.

[0165] In this invention, the preset time period can be selected by those skilled in the art according to actual needs, and is not limited here.

[0166] The differential unit 2123 is connected to the central control unit 2124 and is used to analyze and calculate the rate of change of the deviation value at adjacent time points based on the deviation value output by the central control unit 2124; to analyze and calculate the differential time using a self-tuning algorithm; and to calculate the product of the rate of change, the differential time, and the proportional coefficient output by the central control unit 2124 as the third adjustment term.

[0167] The central control unit 2124 is connected to the programmable logic control module 211 and the pressure regulation module 22 respectively. It is used to receive the deviation value, proportional coefficient, first adjustment item, second adjustment item and third adjustment item; when the deviation value is less than the preset valve switching threshold, it analyzes and calculates the target flow value according to the flow calculation signal; it adds the first adjustment item, second adjustment item and third adjustment item to obtain the regulation coefficient; and it generates the opening regulation amount according to the target flow value and the regulation coefficient, and outputs it to the pressure regulation module 22.

[0168] In this optional embodiment, the adjustment terms of the proportional-integral-derivative control module 212 are obtained by means of self-tuning algorithms, which not only improves debugging and production efficiency, but also significantly improves the control accuracy of the opening of the mass flow controller 2211 (MFC) in the flow controller 221 in the pressure regulation module 22, and also significantly improves the adaptive capability of the pressure regulation device of the present invention.

[0169] It should be noted that, Figures 2a to 2e The pressure regulating device shown is Figure 1a and Figure 1b The pressure control method shown corresponds to the one described in this invention, and its description can be found in the present invention. Figure 1a and Figure 1b The description of the pressure control method shown is omitted here.

[0170] In this invention, when the proportional-integral-derivative control module 212 adopts a bipolar PID control system and the flow controller adopts MFC, the following beneficial effects are achieved:

[0171] (1) Dual-mode control mechanism: The PID control system combines fine adjustment mode and fast evacuation mode. When the deviation value / preset target pressure value is less than or equal to 3%, PID fine adjustment is applied. When the deviation value is greater than 5% or the actual pressure value is greater than the preset valve switching threshold, the integral term separation design is disabled and the fast evacuation mode is triggered. The fast evacuation mode has a higher priority than the PID fine adjustment mode and has a hysteresis recovery mechanism (exits when the deviation value is less than 2%). The advantages are as follows: ① Improved dynamic stability: reduced pressure overshoot during mode switching; ② Safety redundancy design: independent power supply circuit for dual modes; Energy efficiency optimization: significantly improved energy saving effect compared with traditional single-mode system (through intelligent mode switching).

[0172] (2) Precise PID Control: This eliminates the cumbersome traditional method of manually adjusting valve size. A bipolar PID control system automatically adjusts the MFC opening, achieving automatic pressure control of the target cavity. This significantly reduces manual intervention, minimizes human error, improves work efficiency and production continuity, and makes operation simpler and more efficient. The PID algorithm precisely controls the MFC opening. Through the coordinated work of proportional, integral, and derivative components, the inflation volume is quickly and accurately adjusted based on the actual pressure value and the preset target pressure value. The proportional component responds quickly to pressure deviations, the integral component eliminates steady-state errors, and the derivative component predicts pressure change trends to prevent overshoot, achieving high-precision control of the target cavity pressure and effectively reducing cavity pressure fluctuations.

[0173] (3) Dynamic adaptability: It can flexibly meet various degas chamber pressure control needs by adjusting the parameters of the PID control system according to different working conditions and process requirements. Regardless of different production batches or different working environments, it can stably maintain the chamber pressure at a fixed value, which has strong adaptability and versatility.

[0174] (4) Establish a collaborative working mechanism for the inflation / extraction system.

[0175] The pressure control device provided by this invention comprises a pressure acquisition module connected to a target cavity, used to acquire the actual pressure value of the target cavity according to a preset frequency and output it to a pressure control module; a pressure control module connected to the pressure acquisition module, used to compare each actual pressure value with a preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal based on the comparison result or the comparison result and a preset valve switching threshold; and a pressure adjustment module connected to both the pressure control module and the target cavity, used to adjust the actual pressure value of the target cavity to achieve the target pressure value according to the control signal. This pressure control device can automatically and accurately adjust the actual pressure value of the target cavity without manual adjustment, thus improving control accuracy and efficiency.

[0176] As a third aspect of the present invention, a semiconductor process apparatus is provided, which includes the pressure control device of the present invention. Those skilled in the art can choose which semiconductor process apparatus to apply the pressure control device of the present invention to based on actual needs, and no limitation is made here.

[0177] Those skilled in the art will understand that all or part of the processes in the methods of the above embodiments can be implemented by a computer program instructing related hardware. Accordingly, the computer program can be stored in a non-volatile computer-readable storage medium, and when executed, it can implement the methods of any of the above embodiments. Any references to memory, storage, databases, or other media used in the embodiments provided in this application can include non-volatile and / or volatile memory. Non-volatile memory may include read-only memory (ROM), programmable ROM (PROM), electrically programmable ROM (EPROM), electrically erasable programmable ROM (EEPROM), or flash memory. Volatile memory may include random access memory (RAM) or external cache memory. By way of illustration and not limitation, RAM is available in a variety of forms, such as static RAM (SRAM), dynamic RAM (DRAM), synchronous DRAM (SDRAM), dual data rate SDRAM (DDRSDRAM), enhanced SDRAM (ESDRAM), synchronous link DRAM (SLDRAM), RAMbus direct RAM (RDRAM), direct memory bus dynamic RAM (DRDRAM), and memory bus dynamic RAM (RDRAM).

[0178] The above are merely specific embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Those skilled in the art should understand that the present invention includes, but is not limited to, the contents described in the accompanying drawings and the specific embodiments above. Any modifications that do not depart from the functional and structural principles of the present invention will be included within the scope of the claims.

Claims

1. A pressure regulation method, characterized in that, include: The actual pressure value of the target cavity is obtained according to the preset frequency; Each actual pressure value is compared with a preset target pressure value; If the actual pressure value is equal to the preset target pressure value, the current opening adjustment of the flow controller remains unchanged; If the actual pressure value is not equal to the preset target pressure value, perform the following steps: Calculate the deviation between the actual pressure value and the preset target pressure value based on the actual pressure value and the preset target pressure value; Based on the deviation value, the opening adjustment amount of the flow controller is determined; Based on the opening adjustment amount, the actual pressure value is adjusted to achieve the preset target pressure value. Determining the opening adjustment amount of the flow controller based on the deviation value includes: The deviation value is compared with a preset valve switching threshold. If the deviation value is greater than the preset valve switching threshold, the fast / slow air extraction valve group is controlled to enter the fully open state, while the current opening adjustment amount of the flow controller remains unchanged; If the deviation value is less than the preset valve switching threshold, the opening adjustment amount of the flow controller is analyzed and calculated based on the deviation value; The method further includes: Update the preset target pressure value to obtain the updated preset target pressure value; Calculate the deviation between the actual pressure value and the updated preset target pressure value, or the pressure difference between the preset target pressure value before the update and the updated preset target pressure value; Determine whether the deviation value or the pressure difference value is greater than a preset critical threshold; If the deviation value or the pressure difference value is greater than the preset critical threshold, the target cavity is switched, wherein the preset critical threshold is greater than the preset valve switching threshold.

2. The pressure regulation method according to claim 1, characterized in that, The step of analyzing and calculating the opening adjustment amount of the flow controller based on the deviation value includes: A self-tuning algorithm is used to analyze and calculate the proportional coefficient, and the product of the proportional coefficient and the deviation value is calculated as the first adjustment term; A preset time period is selected as the integration time. The integral of the deviation value within the preset time period is calculated, and the product of the ratio of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period is calculated as the second adjustment term. The rate of change of the deviation value at adjacent time points is analyzed and calculated, and the self-tuning algorithm is used to analyze and calculate the differential time. The product of the rate of change, the differential time, and the proportional coefficient is calculated as the third adjustment term. The sum of the first adjustment term, the second adjustment term, and the third adjustment term is calculated as the adjustment coefficient, and the target flow rate value is analyzed and calculated based on the deviation value. The opening adjustment amount of the flow controller is analyzed and calculated based on the adjustment coefficient and the target flow value.

3. The pressure regulation method according to claim 2, characterized in that, The self-tuning algorithm is a hybrid self-tuning algorithm, including: A first-order inertial pure time delay mathematical model containing time constants and gain parameters is constructed using the recursive least squares method; The target parameters are obtained by optimizing the mathematical model using an improved particle swarm optimization algorithm for a preset number of iterations. The mathematical model is optimized using the target parameters.

4. The pressure regulation method according to claim 3, characterized in that, Before optimizing the mathematical model using the target parameters, the method further includes: The target parameter and historical parameters are mixed and output for verification according to a preset weight. When the root mean square error of the verification result decreases by more than a first preset deviation value compared to the root mean square error of the historical result, the target parameter is activated.

5. The pressure regulation method according to claim 3 or 4, characterized in that, The method further includes: When performing analysis and calculations using the mathematical model, a pre-trained long short-term memory network model is used to predict the trend of the actual results output by the mathematical model. When the deviation between the predicted result and the actual result exceeds a second preset deviation value, the mathematical model automatically fine-tunes the target parameters.

6. A pressure regulating device, characterized in that, include: The pressure acquisition module, pressure control module, and pressure regulation module; among them, The pressure acquisition module is connected to the target cavity and is used to acquire the actual pressure value of the target cavity according to a preset frequency and output it to the pressure control module. The pressure control module is connected to the pressure acquisition module and is used to compare each actual pressure value with a preset target pressure value, generate a corresponding comparison result, and generate a corresponding control signal based on the comparison result or the comparison result and a preset valve switching threshold. The pressure regulation module is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to the preset target pressure value according to the control signal; The pressure regulation module includes: a flow controller and a fast / slow suction valve assembly; wherein... The flow controller is connected to the pressure control module and the target cavity respectively, and is used to adjust the actual pressure value of the target cavity to the preset target pressure value according to the opening adjustment amount output by the pressure control module. The fast / slow exhaust valve assembly is connected to the pressure control module and the target cavity, respectively, and is used to enter a fully open state when the deviation between the actual pressure value and the preset target pressure value is greater than the preset valve switching threshold; and to enter a half-open state when the deviation is less than the preset valve switching threshold or the actual pressure value is equal to the preset target pressure value. The device further includes: a target cavity, a slide rail, a placement module, and a sensing module; wherein... The target cavity includes a main cavity and an auxiliary cavity, wherein a sealing door is provided between the main cavity and the auxiliary cavity; when the sealing door is open, the main cavity and the auxiliary cavity are in communication; when the sealing door is closed, the main cavity and the auxiliary cavity are mutually sealed and isolated. The slide rail is embedded in the bottom inner surface of the main cavity and the auxiliary cavity; The storage module is slidably mounted on the slide rail and is connected to the pressure control module. After receiving the cavity switching control signal generated by the pressure control module, it slides along the slide rail through the sealing door from the main cavity to the auxiliary cavity or from the auxiliary cavity to the main cavity. The sensing module is mounted on the slide rail and is used to open or close the sealing door accordingly when the storage module reaches or leaves the preset position. The pressure control module is connected to the placement module and is used to generate the cavity switching control signal and output it to the placement module when the deviation value or the pressure difference between two adjacent preset target pressure values ​​is greater than a preset critical threshold; wherein, the preset critical threshold is greater than the preset valve switching threshold.

7. The pressure regulating device according to claim 6, characterized in that, The pressure control module includes: a programmable logic control module, a proportional-integral-derivative control module, and an industrial computer module; wherein... The programmable logic control module is connected to the pressure acquisition module and the pressure regulation module respectively. It is used to compare each actual pressure value with the preset target pressure value. If the comparison result is that the two are equal, a steady-state control signal is generated. If the comparison result is that the two are not equal, the deviation value between the actual pressure value and the preset target pressure value is calculated, and the deviation value is compared with the preset valve switching threshold to generate a corresponding ordinary regulation control signal or flow calculation signal. The proportional-integral-derivative control module is connected to the programmable logic control module and the pressure regulation module, respectively. It is used to analyze and calculate the target flow value based on the flow calculation signal when the deviation value is less than the preset valve switching threshold, and to generate the opening adjustment amount based on the target flow value and output it to the pressure regulation module. The industrial control computer module is connected to the programmable logic control module and is used to set the preset target pressure value and the preset valve switching threshold, as well as to visualize the preset option information.

8. The pressure regulating device according to claim 7, characterized in that, The flow controller includes: a mass flow controller, a first diaphragm valve, and a second diaphragm valve; wherein... The mass flow controller is connected to the pressure control module and is used to adjust the opening according to the opening adjustment amount output by the pressure control module; The first diaphragm valve is connected to the gas source module and the mass flow controller, and the second diaphragm valve is connected to the mass flow controller and the target cavity, respectively. After the mass flow controller adjusts its opening, the first diaphragm valve and the second diaphragm valve are used to inflate the target cavity with gas so that the actual pressure value reaches the preset target pressure value.

9. The pressure regulating device according to claim 7 or 8, characterized in that, The device further includes: a gas source module and / or a gas pump module; wherein... The gas source module is connected to the flow controller and is used to inflate the target cavity with gas through the flow controller. The air pump module is connected to the fast / slow air extraction valve group and is used to extract gas from the target cavity through the fast / slow air extraction valve group.

10. The pressure regulating device according to claim 7, characterized in that, The proportional-integral-derivative control module includes: a proportional unit, a derivative unit, an integral unit, and a central control unit; wherein, The proportional unit is connected to the central control unit and is used to analyze and calculate the proportional coefficient using a self-tuning algorithm, and calculate the product of the proportional coefficient and the deviation value as the first adjustment term based on the proportional coefficient and the deviation value. The differential unit is connected to the central control unit and is used to select a preset time period as the integration time, calculate the integral of the deviation value within the preset time period, and calculate the product of the ratio of the proportional coefficient and the integration time and the integral of the deviation value within the preset time period as the second adjustment term. The integral unit is connected to the central control unit and is used to analyze and calculate the rate of change of the deviation value at adjacent time points based on the deviation value; to analyze and calculate the differential time using a self-tuning algorithm; and to calculate the product of the rate of change, the differential time, and the proportional coefficient as a third adjustment term based on the rate of change, the differential time, and the proportional coefficient. The central control unit is connected to the programmable logic control module and the pressure regulation module, respectively, and is used to receive the deviation value, the proportional coefficient, the first adjustment item, the second adjustment item, and the third adjustment item; when the deviation value is less than the preset valve switching threshold, it analyzes and calculates the target flow value according to the flow calculation signal; it adds the first adjustment item, the second adjustment item, and the third adjustment item to obtain the regulation coefficient; and it generates the opening regulation amount according to the target flow value and the regulation coefficient, and outputs it to the pressure regulation module.

11. A semiconductor process apparatus, characterized in that, Includes the pressure regulating device according to any one of claims 6-10.

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