Simulated gas supply system, control method and device

Abstract

The embodiment of the invention provides a simulated gas supply system, a control method and a device. The system comprises a gas supply pipeline, a simulation cavity, a gas outlet pipeline, a gas extraction pipeline and a control unit, the gas supply pipeline comprises a first regulating valve, a second regulating valve and a first bypass regulating valve, the first regulating valve is connected between the gas source and the second regulating valve, the second regulating valve is connected with the input end of the simulation cavity, and the first bypass regulating valve is connected between the first regulating valve and the second regulating valve; the air outlet pipeline comprises a third regulating valve and a second bypass regulating valve; one end of the third regulating valve is connected with the output end of the simulation cavity and the air exhaust pipeline; the exhaust pipeline comprises a fourth regulating valve, a buffer tank and a vacuum pump which are connected in series; the fourth regulating valve is connected with the output end of the simulation cavity; the control unit is connected with the air supply pipeline, the simulation cavity, the air outlet pipeline and the air exhaust pipeline and controls the pressure in the simulation cavity by adjusting one or more adjusting valves. The system has the technical advantages of being accurate in pressure adjustment, high in dynamic response speed and good in system stability.

Description

Technical Field

[0001] The present application relates to the field of special gas supply technology, and in particular to a simulated gas supply system, a control method, and a device. Background Art

[0002] During the design and production of aerospace vehicles, extensive ground simulation testing is required based on the actual operating environment of the aircraft at various altitudes. During testing, the aircraft is placed in a simulated environment, and parameters such as pressure, temperature, and flow rate are adjusted through simulation. Pressure is a key parameter affecting aircraft performance, so accurate simulation and control of pressure are of particular concern. Summary of the Invention

[0003] In view of this, the embodiments of the present application provide a simulated gas supply system, a control method, and a device, in order to meet the requirements of precise pressure regulation during the simulation test process. In the first aspect, a simulated gas supply system is provided, comprising: a gas supply pipeline, a simulation chamber, an air outlet pipeline, an air extraction pipeline and a control unit; the gas supply pipeline comprises: a first regulating valve, a second regulating valve and a first bypass regulating valve, the first regulating valve is connected between the gas source and the second regulating valve, the second regulating valve is connected to the input end of the simulation chamber, and the first bypass regulating valve is connected between the first regulating valve and the second regulating valve; the gas outlet pipeline comprises: a third regulating valve and a second bypass regulating valve, one end of the third regulating valve is connected to the output end of the simulation chamber and the air extraction pipeline; the air extraction pipeline comprises: a fourth regulating valve, a buffer tank and a vacuum pump connected in series with each other, the fourth regulating valve is connected to the output end of the simulation chamber; the control unit is connected to the gas supply pipeline, the simulation chamber, the air outlet pipeline and the air extraction pipeline, and is configured to control the pressure in the simulation chamber by adjusting one or more regulating valves.

[0004] The simulated gas supply system has strong adaptability to all operating conditions and can support a wide range of pressure ranges, from high pressure to vacuum (or vice versa), meeting the needs of various environmental simulations such as aerospace. The system utilizes multiple regulating valves and a bypass design to achieve high pressure control accuracy. It also has high dynamic response speed. The parallel supply and extraction path design allows the system to complete a wide range of pressure switching in a short time, significantly improving testing efficiency. The system also has good stability. The buffer tank structure can effectively suppress pressure fluctuations, improving the stability and consistency of the pressure environment in the simulation chamber.

[0005] Optionally, the first bypass regulating valve is configured to be controlled by a control unit to adjust a first flow ratio between the first main line and the first bypass line in the air supply pipeline; the second bypass regulating valve is configured to be controlled by a control unit to adjust a second flow ratio between the second main line and the second bypass line in the air outlet pipeline.

[0006] Optionally, the air extraction pipeline further includes: an inspection valve connected between the simulation chamber and the third regulating valve, and configured to isolate the simulation chamber and the air extraction pipeline when closed.

[0007] Optionally, the air extraction pipeline further includes: a filter connected between the simulation chamber and the third regulating valve, and configured to filter the gas entering the air extraction pipeline.

[0008] Optionally, the types of the vacuum pump include: a fixed frequency pump or a variable frequency pump; the third regulating valve is a vacuum regulating valve; and the fourth regulating valve is a vacuum solenoid valve.

[0009] Optionally, the air source includes an air compressor, an air storage tank, and a filter assembly connected in series.

[0010] 8. The simulated air supply system according to any one of claims 1 to 5, wherein the simulated chamber further comprises a transmitter connected to the control unit and configured to obtain pressure information of the simulated chamber and transmit it to the control unit.

[0011] In the second aspect, a simulated gas supply control method is provided for controlling the simulated gas supply system provided in the first aspect, including: obtaining the gas supply working condition control demand, the gas supply working condition including: positive pressure working condition and vacuum working condition; when the gas supply working condition control demand is a positive pressure working condition, closing the first bypass regulating valve, the second bypass regulating valve and the fourth regulating valve; based on the first actual pressure and the first preset pressure of the simulation chamber, adjusting the opening of the first regulating valve and the third regulating valve so that the simulation chamber reaches the first preset pressure; when the gas supply working condition control demand is a vacuum working condition, determining the opening of the first bypass regulating valve, the second bypass regulating valve and the second regulating valve based on the exhaust capacity of the vacuum pump; vacuuming the simulation chamber based on the fourth regulating valve and the vacuum pump; adjusting the opening of the first regulating valve and the third regulating valve based on the second actual pressure and the second preset pressure of the simulation chamber so that the simulation chamber reaches the second preset pressure.

[0012] According to a third aspect, a simulated gas supply device is provided for controlling the simulated gas supply system provided in the first aspect, including: an acquisition unit for acquiring the gas supply working condition control requirement, the gas supply working condition including: positive pressure working condition and vacuum working condition; a positive pressure simulation unit for closing the first bypass regulating valve, the second bypass regulating valve and the fourth regulating valve when the gas supply working condition control requirement is a positive pressure working condition; adjusting the opening of the first regulating valve and the third regulating valve based on the first actual pressure and the first preset pressure of the simulation chamber so that the simulation chamber reaches the first preset pressure; a vacuum simulation unit for determining the opening of the first bypass regulating valve, the second bypass regulating valve and the second regulating valve based on the exhaust capacity of the vacuum pump when the gas supply working condition control requirement is a vacuum working condition; vacuuming the simulation chamber based on the fourth regulating valve and the vacuum pump; adjusting the opening of the first regulating valve and the third regulating valve based on the second actual pressure and the second preset pressure of the simulation chamber so that the simulation chamber reaches the second preset pressure. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The following is a brief introduction to the drawings used in describing the embodiments of this application:

[0014] Figure 1 A schematic structural diagram of a simulated gas supply system provided in some embodiments of the present application is shown;

[0015] Figure 2 A schematic flow chart of a simulated gas supply control method provided in some embodiments of the present application is shown;

[0016] Figure 3 A schematic structural diagram of a simulated air supply device provided in some embodiments of the present application is shown. DETAILED DESCRIPTION

[0017] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the specific implementation methods of the present application will be described below with reference to the accompanying drawings. The drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings or embodiments can be obtained based on these drawings or embodiments without inventive work. Adjustments and improvements made without departing from the concept of the present application are all within the scope of protection of the present application.

[0018] To simplify the drawings, the figures schematically illustrate only the portions relevant to the embodiments and do not represent the actual structure of the products. Furthermore, to simplify the drawings and facilitate understanding, in some figures, only a portion of components with the same structure or function are schematically depicted; in practice, more or fewer components with the same structure or function may exist.

[0019] During the design and verification of aerospace vehicles, extensive ground-based environmental simulation testing is often required to ensure stable, safe, and reliable performance at various flight altitudes and operating environments. These tests are typically conducted within a dedicated dynamic simulation chamber to simulate the various typical operating conditions a spacecraft may experience during actual operation, such as high altitude, low pressure, high temperature, high pressure, and vacuum. To achieve these simulated environments, the ground-based test system must provide real-time control of multiple parameters within the dynamic simulation chamber, with pressure being one of the most critical control variables. In particular, achieving high-precision, wide-range regulation of the chamber's pressure across multiple operating conditions, including vacuum, atmospheric pressure, and high pressure, is a core challenge facing current air supply system technology. Existing air supply systems are often optimized for a single or limited pressure range, making it difficult to achieve both rapid switching and stable control between high pressure and vacuum within a single system. Furthermore, the pressure control accuracy required to dynamically adjust the chamber is insufficient. Therefore, there is an urgent need for a full-condition air supply control system that combines broad pressure adaptability with high responsiveness and high-precision regulation to meet the complex operating environment simulation requirements of aerospace ground testing.

[0020] The following is a description with reference to the accompanying drawings:

[0021] Figure 1 The following is a schematic diagram of the structure of a simulated gas supply system provided in some embodiments of the present application. The simulated gas supply system 100 includes: a gas supply pipeline 110, a simulation chamber 120, a gas outlet pipeline 130, a gas extraction pipeline 140 and a control unit 150; the gas supply pipeline 110 includes: a first regulating valve V1, a second regulating valve V2 and a first bypass regulating valve VP1, the first regulating valve V1 is connected between the gas source GS and the second regulating valve V2, the second regulating valve V2 is connected to the input end of the simulation chamber 120, and the first bypass regulating valve VP1 is connected between the first regulating valve V1 and the second regulating valve V2; the gas outlet pipeline 130, It includes: a third regulating valve V3 and a second bypass regulating valve VP2, one end of the third regulating valve V3 is connected to the output end of the simulation chamber 120 and the exhaust pipeline 140; the exhaust pipeline 140 includes: a fourth regulating valve V4, a buffer tank 141 and a vacuum pump P connected in series, the fourth regulating valve V4 is connected to the output end of the simulation chamber 120; a control unit 150, which is connected to the air supply pipeline 110, the simulation chamber 120, the air outlet pipeline 130 and the exhaust pipeline 140, and is configured to control the pressure in the simulation chamber by adjusting one or more regulating valves.

[0022] Through the above-described structural arrangement, the simulated gas supply system provided in this embodiment can achieve flexible switching between different pressure conditions on the same system platform, with advantages such as fast adjustment response, high pressure control accuracy, and strong system adaptability. It is particularly suitable for application scenarios such as aerospace that require high environmental simulation accuracy. For example, when it is necessary to establish a high-pressure environment in the simulation chamber 120, the control unit 150 can open the first regulating valve V1 and the second regulating valve V2 to introduce gas provided by the gas source GS into the simulation chamber. If the system requires rapid pressure increase or pressure control overshoot adjustment, the opening of the first bypass regulating valve VP1 can be adjusted to increase the gas input rate. The third regulating valve V3 and the second bypass regulating valve VP2 in the gas outlet line 130 can be adjusted by adjusting the opening, such as keeping them closed or slightly open, to maintain high pressure in the chamber. In addition, the exhaust line 140 can be completely closed to avoid pressure loss. For another example, when it is necessary to establish a low-pressure or vacuum environment in the simulation chamber 120, the control unit 150 can close the valves of the gas supply line 110, adjust the opening of the fourth regulating valve V4 in the gas exhaust line 140, and start the vacuum pump P, wherein the buffer tank 141 participates in the pressure stabilization to prevent the pressure fluctuation caused by the excessively fast gas exhaust rate. On the other hand, if it is necessary to fine-tune the negative pressure value, the opening of the fourth regulating valve V4 can be finely adjusted. In certain simulation tasks, the system may need to be able to quickly complete pressure conversion, such as adjusting high pressure to vacuum, or adjusting normal pressure to high pressure. At this time: the control unit 150 simultaneously controls the regulating valves on both sides of the gas supply and gas exhaust, performs predictive adjustments according to the preset adjustment curve or the historical control curve, optimizes the pressure conversion path, and uses the first bypass regulating valve VP1 and the second bypass regulating valve VP2 to achieve rapid buffering and balancing. The simulated air supply system provided in this embodiment has strong adaptability to all operating conditions and can support a wide range of pressure ranges, from high pressure to vacuum (or vice versa), meeting the needs of various environmental simulations, such as aerospace. It utilizes multiple regulating valves and feedback control algorithms, combined with a bypass design, to achieve high pressure control accuracy. It also has a high dynamic response speed. Through the design of parallel air supply and extraction paths, it can support the system to complete a wide range of pressure switching in a short time, significantly improving testing efficiency. The system also has good stability. The use of a buffer tank structure can effectively suppress pressure fluctuations, improving the stability and consistency of the pressure environment in the simulation chamber.

[0023] In some embodiments of the present application, the first bypass regulating valve is configured to be controlled by a control unit to adjust a first flow ratio between the first main line and the first bypass line in the air supply pipeline; the second bypass regulating valve is configured to be controlled by the control unit to adjust a second flow ratio between the second main line and the second bypass line in the air outlet pipeline.

[0024] In the above embodiment, the first bypass regulating valve VP1 is controlled by the control unit 150, and can adjust the first flow ratio between the first main line (i.e., the first regulating valve V1→the second regulating valve V2→the simulation chamber 120) and the first bypass line (i.e., the branch where the first bypass regulating valve VP1 is located) in the path of gas flowing into the simulation chamber 120 according to the control strategy, so as to provide an additional path to increase the flow rate or alleviate the pressure fluctuation of the main path when the system requires faster pressure increase or stable flow rate. The second bypass regulating valve VP2 is also controlled by the control unit 150, and can adjust the second flow ratio between the output gas of the simulation chamber 120 through the third regulating valve V3 (the second main line) and the second bypass regulating valve VP2 branch (the second bypass line). In scenarios where rapid pressure relief or stable pressure output is required, the second bypass regulating valve VP2 can adjust the gas flow direction, reduce the burden on the main gas outlet path, and also suppress pressure overshoot. Through the fine proportional control of the above two bypass regulating valves, the system can achieve more precise control of the gas flow state in the simulation chamber, thereby improving the sensitivity and stability of the pressure response.

[0025] In some embodiments of the present application, the exhaust pipeline 140 further includes: an inspection valve connected between the simulation chamber and the third regulating valve, and configured to isolate the simulation chamber and the exhaust pipeline when closed.

[0026] In order to improve the convenience and safety of system maintenance, the exhaust pipeline 140 further includes a maintenance valve (not numbered in the figure), which is connected between the simulation chamber 120 and the fourth regulating valve V4. The maintenance valve can be in an open or closed state. For example, under normal working conditions, the maintenance valve is open to ensure normal communication between the simulation chamber and the exhaust system. During maintenance, cleaning or component replacement, the control unit 150 or the operator can switch the maintenance valve to a closed state, thereby isolating the simulation chamber 120 from the exhaust pipeline to prevent residual gas or accidental extraction of the vacuum pump from causing damage to the environment or equipment. This structural design improves the safety and maintainability of system operation, and is particularly suitable for test scenarios with high reliability requirements, such as ground simulation testing of aerospace components.

[0027] In some embodiments of the present application, the air extraction pipeline further includes: a filter connected between the simulation chamber and the third regulating valve, and configured to filter the gas entering the air extraction pipeline.

[0028] In order to prevent impurities from entering the exhaust system and increase the service life of the vacuum pump, a filter can be installed in the exhaust line 140 (not marked in the figure, can be installed between the simulation chamber 120 and the third regulating valve V3). The filter is used to effectively filter solid particles, condensate or other impurities in the gas before it flows from the simulation chamber 120 to the exhaust line 140, thereby reducing pipeline contamination. For high-precision testing environments, it can improve the overall cleanliness level of the system. The filter can be configured as a high-precision micron-level filter element (such as PTFE, glass fiber, etc.) according to the operating conditions, and has an easy-to-replace structure for easy replacement and maintenance.

[0029] In some embodiments of the present application, the types of vacuum pumps include: fixed frequency pumps or variable frequency pumps; the third regulating valve is a vacuum regulating valve; and the fourth regulating valve is a vacuum solenoid valve.

[0030] In some embodiments, the vacuum pump P can select different types of pumps according to different demand scenarios. For example, in an environment where the gas load is relatively stable and there is no need for dynamic adjustment of the pumping speed, a fixed-frequency pump can be used as a vacuum pump. In scenarios where there is a need for real-time control of the pumping rate and vacuum degree, such as when the pressure in the simulation chamber changes rapidly or a fine response is required, a variable-frequency pump can be used to achieve flexible adjustment, thereby improving the system's response efficiency and energy consumption control capabilities. In addition, some key valves can be configured as special valves adapted to vacuum environments. For example, the third regulating valve V3 can use a vacuum-specific regulating valve (such as a vacuum proportional valve) to achieve fine flow regulation of the outlet channel; the fourth regulating valve V4 can be set as a vacuum solenoid valve, which is opened and closed by an electrical signal, has a fast response speed and high sealing, and is suitable for use with the vacuum pump P to achieve rapid pumping or isolation.

[0031] In some embodiments of the present application, the gas source includes an air compressor, an air storage tank, and a filter assembly connected in series.

[0032] In some embodiments, the gas source GS may not be a direct gas interface, but rather a gas supply system consisting of an air compressor, a gas storage tank, and a filter assembly connected in series. The air compressor compresses atmospheric air to the required pressure, the gas storage tank acts as a buffer to ensure continuous supply and pressure stability, and the filter assembly removes moisture, oil mist, and solid particles from the compressed air, ensuring input gas cleanliness. This structure significantly improves the reliability and stability of the gas supply system and is particularly suitable for simulation chamber testing tasks that require precise input pressure control, are temperature-sensitive, or require high contamination protection.

[0033] In some embodiments of the present application, the exhaust pipeline can be separately provided when connected to the simulation chamber and the exhaust pipeline.

[0034] To enhance maintainability and equipment flexibility, in an embodiment of the present application, the exhaust line 140 can be configured as a detachable connection structure at its connection to the simulation chamber 120 and the exhaust line 130. This structure can be connected using, for example, a quick-connect joint, a flange + sealing ring connection, or a threaded connector with a locking mechanism. This facilitates quick disconnection from the exhaust system during equipment maintenance, module replacement, or line cleaning, preventing residual gas from interfering with the test environment or operational safety.

[0035] In some embodiments of the present application, the simulation cavity further includes: a transmitter connected to the control unit and configured to obtain pressure information of the simulation cavity and transmit it to the control unit.

[0036] To achieve closed-loop feedback control, in some embodiments of the present application, a pressure acquisition element, namely a pressure transmitter, is provided within the simulation chamber 120. This transmitter is used to monitor the pressure state within the simulation chamber in real time and transmit the collected data to the control unit 150. Through this transmitter, the control unit can obtain the pressure state within the chamber in real time and dynamically adjust the opening of control valves such as V1 to V4, P1, and P2 based on the set target pressure, ultimately achieving closed-loop precise control of the simulation chamber pressure, ensuring that the system meets the requirements of high-precision dynamic simulation testing.

[0037] Figure 2 A flow chart of a simulated gas supply control method provided in some embodiments of the present application is shown, which is used to control the simulated gas supply system provided in the above embodiments, including:

[0038] S210: Obtaining gas supply working condition control requirements, where the gas supply working conditions include: positive pressure working condition and vacuum working condition;

[0039] S220: When the air supply working condition control requirement is a positive pressure working condition, closing the first bypass regulating valve, the second bypass regulating valve, and the fourth regulating valve; adjusting the openings of the first regulating valve and the third regulating valve based on the first actual pressure and the first preset pressure of the simulation chamber so that the simulation chamber reaches the first preset pressure;

[0040] S230: When the air supply working condition control requirement is a vacuum working condition, the openings of the first bypass regulating valve, the second bypass regulating valve and the second regulating valve are determined based on the vacuum pump's exhaust capacity; the simulation chamber is evacuated based on the fourth regulating valve and the vacuum pump; based on the second actual pressure and the second preset pressure of the simulation chamber, the openings of the first regulating valve and the third regulating valve are adjusted to make the simulation chamber reach the second preset pressure.

[0041] Based on the above simulated air supply control method, this application provides a first embodiment of control using a simulated air supply system: In the initial state, all valves in the simulated air supply system are closed, and the outlets of the air outlet pipeline are connected to the atmosphere. Under positive pressure conditions, precise adjustment may include the following steps:

[0042] S310: The transmitter monitors the first actual pressure P0 in the simulation cavity 120 in real time, and realizes dynamic tracking of the first actual pressure P0 in the simulation cavity 120. The first preset pressure P0 required by the simulation cavity 120 is set in advance in the control unit 150. S (For example, determined by a program of a programmable logic controller), the simulated gas supply system adjusts the openings of the first regulating valve V1, the second regulating valve V2 and the third regulating valve V3 to the maximum, and the control unit 150 records the first actual pressure P0 of the transmitter on the simulation cavity 120 at this time.

[0043] S320: According to the first actual pressure P0 and the set first preset pressure P S The control unit 150 performs PID control. For example, the first actual pressure P0 is less than the first preset pressure P S When the pressure reaches the first preset pressure P, the control unit 150 realizes the pressure closed-loop control by controlling the opening of the third regulating valve V3, reducing the opening of the third regulating valve V3, and increasing the actual pressure of the simulation chamber 120. S At the same time, if the first actual pressure P0 is greater than the set first preset pressure P S , the control unit 120 can realize pressure closed-loop control by controlling the opening of the first regulating valve V1, reducing the opening of the first regulating valve V1 to reduce the actual pressure of the simulation chamber 120 until the air pressure in the simulation chamber 120 reaches the first preset pressure P S range.

[0044] S330: During the process of completing the simulation test of the working condition corresponding to the set pressure, the simulation chamber 120 is adjusted to adjust the first preset pressure P according to the test requirements. S is the preset pressure P S1 .

[0045] S340: According to the first preset pressure PS and the adjusted first preset pressure P S1 The deviation values ​​of P0, P S 、P S1 If the first preset pressure P S With the adjusted first preset pressure P S1 are both less than the current first actual pressure P0, the control unit 150 implements pressure closed-loop control by controlling the opening of the first regulating valve V1, according to the previous first preset pressure P S With the adjusted first preset pressure P S1The deviation value adjusts the opening of the first regulating valve V1 until the air pressure of the simulation chamber 120 reaches the pressure setting value range. S1 are greater than the pressure value, the control unit 150 realizes pressure closed-loop control by controlling the opening of the third regulating valve V3, according to the first preset pressure P S With the adjusted first preset pressure P S1 The deviation value adjusts the opening of the third regulating valve V3 until the air pressure in the simulation chamber 120 reaches the adjusted first preset pressure P S1 If the first preset pressure P S Less than the adjusted first preset pressure P S1 , or the first preset pressure P S Greater than the adjusted first preset pressure P S1 , then repeat S310 and S320 until the air pressure in the simulation cavity 120 reaches the pressure setting value range.

[0046] It should be noted that to ensure the PID control accuracy of the control unit 150, the simulation chamber 120 can be precisely adjusted to obtain corresponding PID control parameters under gauge pressure conditions of 0.5 MPa and 2.0 MPa. The two sets of control parameters obtained are applied to pressure PID closed-loop control in the gauge pressure ranges of (0 MPa to 1.5 MPa) and (1.5 MPa to 3.0 MPa), respectively.

[0047] Based on the above simulated gas supply control method, the present application provides a second embodiment of the control using a simulated gas supply system: the above simulated gas supply control method can also be used when the vacuum pump P has a weak pumping capacity, including the steps of:

[0048] S410: The transmitter monitors the first actual pressure P0 in the simulation cavity 120 in real time to achieve dynamic tracking of the first actual pressure P0 in the simulation cavity 120. The first preset pressure P0 required by the simulation cavity 120 is set in advance in the control unit 150. S To simulate the air supply system, open the vacuum pump P, the fourth regulating valve V4, and the third regulating valve V3, and wait for the transmitter reading to stabilize. If the first actual pressure P0 within the simulation chamber 120 is less than atmospheric pressure at this point, slowly increase the opening of the second bypass regulating valve VP2 until the first actual pressure P0 within the simulation chamber 120 equals atmospheric pressure. By adjusting the opening of the second bypass regulating valve VP2, the system vacuum pressure control range is changed, achieving coarse adjustment of the system vacuum pressure control.

[0049] S420: The transmitter monitors the first actual pressure P0 in the simulation chamber 120, and the control unit 150 generates a first preset pressure P0 according to the first actual pressure P0 and the first preset pressure P0. SThe deviation value of the third regulating valve V3 is output to realize PID regulation: if the first actual pressure P0 is less than the first preset pressure P S , the control unit 150 realizes pressure closed-loop control by controlling the opening of the third regulating valve V3, increasing the opening of the third regulating valve V3 to increase the actual pressure of the simulation chamber 120 until the air pressure in the simulation chamber 120 reaches the first preset pressure P S If the first actual pressure P0 is greater than the first preset pressure P S , the control unit 150 realizes pressure closed-loop control by controlling the opening of the third regulating valve V3, reducing the opening of the third regulating valve V3 to reduce the actual pressure of the simulation chamber 120 until the air pressure of the simulation chamber 120 reaches the first preset pressure P S If the opening of the third regulating valve V3 reaches 100% during the control process, the first actual pressure P0 is still greater than the first preset pressure P S If the air pressure in the simulation chamber 120 reaches the first preset pressure P, the control unit 150 reduces the opening of the second bypass regulating valve VP2 through PID control. S range.

[0050] S430: Complete the first preset pressure P S Corresponding to the working condition simulation test, the first preset pressure P set in the simulation chamber 120 is modified according to the test requirements. S Repeat step S420 until the air pressure in the simulation chamber 120 reaches the first preset pressure P S If the opening of the third regulating valve V3 reaches 0% during the control process, the first actual pressure P0 is still lower than the first preset pressure P S If the air pressure in the simulation chamber 120 reaches the first preset pressure P, the control unit 150 increases the opening of the second bypass regulating valve VP2 through PID control. S range.

[0051] It should be noted that to ensure PID control accuracy, the simulation chamber 120 needs to be precisely adjusted under an absolute pressure of 50 kPa to obtain the corresponding PID control parameters. The two sets of control parameters obtained can be applied to pressure PID closed-loop control in the absolute pressure range (1 kPa to 100 kPa).

[0052] Based on the above simulated gas supply control method, the present application provides a third embodiment of the control using a simulated gas supply system: the above simulated gas supply control method is also applicable to the case where the vacuum pump P has a strong pumping capacity, and includes the following steps:

[0053] S510: In the initial state, all valves in the system are closed, and the outlets of the gas outlet pipes are connected to the atmosphere. The transmitter monitors the first actual pressure P0 in the simulation cavity 120 in real time, and realizes the dynamic tracking of the first actual pressure P0 in the simulation cavity 120. The first preset pressure P0 required by the simulation cavity 120 is set by the PLC program. S , open the fourth regulating valve V4 in the exhaust pipeline, start the vacuum pump P, and pump the pressure in the simulation chamber 120 to a stable state. Ensure that the gas pressure in the stable pressure state is lower than the minimum pressure value required by the system (for example, 1 kPa).

[0054] S520: After confirming that the gas inlet pressure is stable, the first control valve V1 is fully opened, the first bypass control valve VP1 is fully opened, and the opening of the second control valve V2 is gradually adjusted. The pressure increase in the simulation chamber 120 is monitored using a transmitter. If the pressure in the simulation chamber 120 is still below atmospheric pressure when the second control valve V2 is fully open, the opening of the first bypass control valve VP1 is gradually increased until the pressure in the simulation chamber 120 equals atmospheric pressure.

[0055] S530: Fix and record the openings of the first bypass control valve VP1 and the second control valve V2 to the control unit 150. If the system status and the required operating conditions of the simulation chamber 120 remain unchanged, the recorded valve openings can be used directly for the openings of the first bypass control valve VP1 and the second control valve V2. If the system status and the required operating conditions of the simulation chamber 120 change, repeat S510 and S520 to obtain and fix a new opening ratio of the first bypass control valve VP1 and the second control valve V2.

[0056] S540: The control unit 150 generates a pressure signal according to the first actual pressure P0 and the first preset pressure P S The deviation value is output to the PID controller of the control unit 150 for correction of the opening of the first regulating valve V1:

[0057] If the first actual pressure P0 is greater than the first preset pressure P S , the PID controller performs closed-loop control to reduce the opening of the first regulating valve V1 and reduce the system gas replenishment rate, thereby reducing the actual pressure in the simulation chamber 120 to the pressure setting range.

[0058] If the first actual pressure P0 is less than the first preset pressure P S , the PID controller performs closed-loop control, increases the opening of the first regulating valve V1, increases the system air supply rate, and thereby raises the actual pressure in the simulation cavity 120 to the pressure setting value range.

[0059] It should be noted that to ensure PID control accuracy, the simulation chamber 120 is precisely adjusted under an absolute pressure of 50 kPa to obtain the corresponding PID control parameters. The two sets of control parameters obtained are applied to the pressure PID closed-loop control in the absolute pressure range (1 kPa to 100 kPa).

[0060] Based on the above simulated air supply control method, the present application provides a fourth embodiment of control using a simulated air supply system: This embodiment provides a method for accurately regulating the mixed pressure of positive pressure and vacuum based on the second embodiment of the above simulated air supply control method. The following steps take the system switching from positive pressure control to vacuum control as an example:

[0061] S610: In the initial state, all valves in the system are closed, and the outlets of the gas outlet pipelines are connected to the atmosphere. The positive pressure control of the simulation cavity 120 is performed according to the steps in the first embodiment above.

[0062] S620: The desired vacuum pressure value (using gauge pressure) for the simulation chamber 120 is set via the PLC program of the control unit 150. Upon detecting a change in the positive or negative value of the first preset pressure PS, the control unit 150 closes the first and second control valves V1 and V2, opens the first bypass control valve VP1, and closes the first bypass control valve VP1 after the pressure in the gas supply pipeline has been reduced to atmospheric pressure. The control unit 150 also closes the third control valve V3 and opens the second bypass control valve VP2, and closes the second bypass control valve VP2 after the pressure in the gas outlet pipeline has been reduced to atmospheric pressure.

[0063] S630: Execute vacuum pressure control of the simulation cavity 120 according to the steps in the second embodiment.

[0064] Based on the above simulated air supply control method, the present application provides a fifth embodiment for achieving control using a simulated air supply system: This embodiment provides a method for precisely regulating the mixed pressure of positive pressure and vacuum based on the above third embodiment. The following steps take the system switching from positive pressure control to vacuum control as an example:

[0065] S710: In the initial state, all valves in the system are closed, and the outlets of the gas outlet pipelines are connected to the atmosphere. The positive pressure control of the simulation cavity 120 is performed according to the steps in the first embodiment above.

[0066] S720: Set the required vacuum pressure value (using gauge pressure) of the simulation chamber 120 through the PLC program of the control unit 150. The control unit 150 monitors the first preset pressure P S When the positive and negative values ​​change, the opening of the first regulating valve V1 is adjusted to 100%, and the first bypass regulating valve VP1 and the second regulating valve V2 are set according to the openings recorded by the control unit 150. The third regulating valve V3 is closed, and the second bypass regulating valve VP2 is opened. After the pressure in the simulation chamber 120 is reduced to normal pressure, the second bypass regulating valve VP2 is closed.

[0067] S730: Execute vacuum pressure control of the simulation cavity 120 according to the steps described in the third embodiment.

[0068] The control method of the present invention is to first adjust the pipeline flow state and roughly adjust the system pressure control range; then use the control unit 150 to select different control parameters according to the control pressure range using the PID algorithm, dynamically adjust the corresponding valve opening, and achieve precise control of the gas pressure in the simulation chamber 120, ensuring that the relative pressure of the working gas pressure is within the range of 0MPa to 3.0MPa, the pressure control accuracy reaches 0.005MPa, and the absolute pressure of the working gas pressure is within the range of 1kPa to 100kPa, and the pressure control accuracy reaches 0.1kPa. The dynamic simulation gas supply system device proposed by the present invention can be automatically controlled by the control unit 150 to meet the pressure requirements of all test conditions from vacuum 1kPa (absolute pressure) to positive pressure 3.0MPa (gauge pressure), and has the advantages of high system pressure control accuracy, fast response speed, and smooth control process.

[0069] The control circuit of the control unit 150 can be realized by those skilled in the art, so the present invention will not explain the control method and circuit connection in detail.

[0070] Figure 3 A structural schematic diagram of a simulated air supply device provided in some embodiments of the present application is shown, which is used to control the simulated air supply system provided in the first aspect, including: an acquisition unit 810, used to obtain the air supply working condition control demand, and the air supply working condition includes: positive pressure working condition and vacuum working condition; a positive pressure simulation unit 820, used to close the first bypass regulating valve, the second bypass regulating valve and the fourth regulating valve when the air supply working condition control demand is a positive pressure working condition; based on the first actual pressure and the first preset pressure of the simulation chamber, adjust the opening of the first regulating valve and the third regulating valve so that the simulation chamber reaches the first preset pressure; a vacuum simulation unit 830, used to determine the opening of the first bypass regulating valve, the second bypass regulating valve and the second regulating valve based on the exhaust capacity of the vacuum pump when the air supply working condition control demand is a vacuum working condition; vacuum the simulation chamber based on the fourth regulating valve and the vacuum pump; based on the second actual pressure and the second preset pressure of the simulation chamber, adjust the opening of the first regulating valve and the third regulating valve so that the simulation chamber reaches the second preset pressure.

[0071] The specific implementation and beneficial effects of the above simulated gas supply device can refer to the specific description of the embodiments of the simulated gas supply system and the simulated gas supply control method, and will not be repeated here. The division of the above units is only a division of logical functions. In actual implementation, they can be fully or partially integrated into one physical entity, or physically separated. In addition, the above units can be implemented in the form of a processor calling software. Alternatively, the above units can be implemented in the form of hardware circuits, and the functions of some or all units can be realized by designing the hardware circuits. The hardware circuit can be understood as one or more processors; for example, in some embodiments, the hardware circuit is an application-specific integrated circuit (ASIC), and the functions of some or all of the above units are realized by designing the logical relationships between the components in the circuit; for example, in another implementation, the hardware circuit can be implemented by a programmable logic device (PLD), which can include a large number of logic gate circuits. The logical relationships between the logic gate circuits are configured through configuration files, thereby realizing the functions of some or all of the above units. The units of the above device can be implemented entirely by the processor calling a program, or entirely by the hardware circuit, or partially by the processor calling a program, and the remaining part by the hardware circuit.

[0072] Based on the same technical concept, the present application also provides an electronic device, including the soft start circuit provided in the above embodiment.

[0073] In this application, unless otherwise specified or limited, ordinal numbers such as "first" and "second" are used solely to distinguish and describe related objects and should not be understood to indicate or imply the relative importance or order of the related objects. Furthermore, ordinal numbers do not represent the number of related objects. For example, "first capacitor" may include one capacitor or multiple capacitors.

[0074] "Multiple" includes two or more, and other quantifiers are similar.

[0075] The terms "or" and "and / or" in this application are used to describe the relationship between associated objects, which represents non-exclusive inclusion. For example, "A and / or B" and "A or B" can both include: "A alone", "B alone", or "A and B", where "A" and "B" can include a single object or multiple objects. For another example, "A, B and / or C", "A, B or C" and "A, B and C" can both include: "A alone", "B alone", "C alone", "A and B", "A and C", "B and C", or "A, B and C", where "A", "B" and "C" can include a single object or multiple objects. In addition, " / " in this application is used to represent the "or" relationship between the preceding and following associated objects. In this application, "at least one of A or B" and "one or more of A and B" have the same meaning as "A or B" above, and "one or more of A, B and C" and "at least one of A, B or C" have the same meaning as "A, B or C" above. "One or more of A, B and C" have the same meaning as "A, B or C" above.

[0076] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described or recorded in detail in a certain embodiment, reference can be made to the relevant description of other embodiments. In addition, the above embodiments can be freely combined as needed.

Claims

1. A simulated air supply system, characterized in that: include: Air supply pipeline, simulation chamber, air outlet pipeline, air extraction pipeline and control unit; The gas supply pipeline includes: a first regulating valve, a second regulating valve and a first bypass regulating valve, the first regulating valve is connected between the gas source and the second regulating valve, the second regulating valve is connected to the input end of the simulation chamber, and the first bypass regulating valve is connected between the first regulating valve and the second regulating valve; The air outlet pipeline includes: a third regulating valve and a second bypass regulating valve, one end of the third regulating valve is connected to the output end of the simulation chamber and the air extraction pipeline; The exhaust pipeline includes: a fourth regulating valve, a buffer tank and a vacuum pump connected in series, and the fourth regulating valve is connected to the output end of the simulation cavity; The control unit is connected to the air supply pipeline, the simulation chamber, the air outlet pipeline and the air extraction pipeline, and is configured to control the pressure in the simulation chamber by adjusting one or more regulating valves.

2. The simulated air supply system according to claim 1, characterized in that: The first bypass regulating valve is configured to be controlled by the control unit to adjust a first flow ratio between the first main line and the first bypass line in the gas supply pipeline; The second bypass regulating valve is configured to be controlled by the control unit to adjust a second flow ratio between the second main line and the second bypass line in the outlet pipeline.

3. The simulated air supply system according to claim 2, characterized in that: The air extraction pipeline further includes: an inspection valve connected between the simulation chamber and the third regulating valve, and configured to isolate the simulation chamber and the air extraction pipeline when closed.

4. The simulated air supply system according to claim 3, characterized in that: The air extraction pipeline further includes: a filter connected between the simulation chamber and the third regulating valve, and configured to filter the gas entering the air extraction pipeline.

5. The simulated air supply system according to claim 4, characterized in that: The types of vacuum pumps include: fixed frequency pumps or variable frequency pumps; The third regulating valve is a vacuum regulating valve; The fourth regulating valve is a vacuum solenoid valve.

6. The simulated air supply system according to any one of claims 1 to 5, characterized in that: The gas source includes an air compressor, an air storage tank and a filter assembly connected in series.

7. The simulated air supply system according to any one of claims 1 to 5, characterized in that: The air extraction pipeline can be separately arranged when connected to the simulation chamber and the air outlet pipeline.

8. The simulated air supply system according to any one of claims 1 to 5, characterized in that: The simulation cavity further includes: a transmitter connected to the control unit, configured to obtain pressure information of the simulation cavity and transmit the pressure information to the control unit.

9. A simulated gas supply control method, characterized in that: Used to control the simulated gas supply system according to any one of claims 1 to 6, comprising: Obtaining gas supply working condition control requirements, where the gas supply working conditions include: positive pressure working condition and vacuum working condition; When the air supply working condition control requirement is the positive pressure working condition, closing the first bypass regulating valve, the second bypass regulating valve and the fourth regulating valve; Based on a first actual pressure and a first preset pressure of the simulation chamber, adjusting the openings of the first regulating valve and the third regulating valve so that the simulation chamber reaches the first preset pressure; When the air supply working condition control requirement is the vacuum working condition, determining the openings of the first bypass regulating valve, the second bypass regulating valve, and the second regulating valve based on the air extraction capacity of the vacuum pump; evacuating the simulation chamber based on the fourth regulating valve and the vacuum pump; Based on the second actual pressure and the second preset pressure of the simulation chamber, the openings of the first regulating valve and the third regulating valve are adjusted to make the simulation chamber reach the second preset pressure.

10. A simulated air supply device, characterized in that: Used to control the simulated gas supply system according to any one of claims 1 to 6, comprising: An acquisition unit, configured to acquire a gas supply working condition control requirement, wherein the gas supply working condition includes: a positive pressure working condition and a vacuum working condition; a positive pressure simulation unit, configured to close the first bypass regulating valve, the second bypass regulating valve, and the fourth regulating valve when the air supply working condition control requirement is the positive pressure working condition; and adjust the openings of the first regulating valve and the third regulating valve based on the first actual pressure and the first preset pressure of the simulation chamber so that the simulation chamber reaches the first preset pressure; A vacuum simulation unit is used to determine the openings of the first bypass regulating valve, the second bypass regulating valve and the second regulating valve based on the exhaust capacity of the vacuum pump when the gas supply working condition control requirement is the vacuum working condition; to evacuate the simulation cavity based on the fourth regulating valve and the vacuum pump; and to adjust the openings of the first regulating valve and the third regulating valve based on the second actual pressure and the second preset pressure of the simulation cavity so that the simulation cavity reaches the second preset pressure.

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