Ultrapure water on-line heating equipment for semiconductor cleaning

Abstract

The invention relates to the technical field of heating equipment, and discloses ultrapure water online heating equipment for semiconductor cleaning, which comprises an ultrapure water heating tank for semiconductor cleaning, a water outlet pipe is fixed at the center of the bottom of the ultrapure water heating tank, a protection assembly is arranged on the surface of the ultrapure water heating tank, and a stirring device is arranged on the surface of the protection assembly. A discharging structure is arranged on the surface of the stirring device, an online heating part is arranged on the inner wall of the ultrapure water heating tank, a material storage mechanism is arranged on the surface of the protection assembly and comprises a material storage tank and a top cover, the material storage tank is arranged on the surface of the protection assembly, and the bottom of the material storage tank penetrates through the top of the ultrapure water heating tank; according to the ultrapure water heating device, through mutual cooperation of the ultrapure water heating tank, the water outlet pipe and the protection assembly, when the ultrapure water heating device is used, the ultrapure water heating tank can be protected through the protection assembly, and therefore the ultrapure water heating device is prevented from being damaged due to collision with external objects during use and transportation.

Description

Technical Field

[0001] The present invention relates to the technical field of heating equipment, in particular to an ultrapure water online heating device for semiconductor cleaning. Background Art

[0002] Semiconductors are an extremely important material in the electrical field. During the processing and production of semiconductors, it is necessary to ensure the cleanliness of their surface. At this time, ultrapure water is needed to clean the semiconductors. Before using ultrapure water, it will be heated using a heating device.

[0003] However, during the use of existing ultrapure water online heating devices, ultrapure water lacks suspended particles due to its high purity. Therefore, when it is heated, the temperature of the ultrapure water exceeds its own boiling point and becomes a superheated liquid. If it is disturbed by external factors at this time, it will form "violent boiling", thereby reducing production safety. For this reason, an ultrapure water online heating device for semiconductor cleaning is proposed. Summary of the Invention

[0004] The purpose of the present invention is to provide an ultrapure water online heating device for semiconductor cleaning, so as to solve the problem that during the use of the existing ultrapure water online heating device proposed in the above background technology, the ultrapure water lacks suspended particles due to its high purity. Therefore, when it is heated, the temperature of the ultrapure water exceeds its own boiling point and becomes a superheated liquid. If it is disturbed by the outside world at this time, it will form "violent boiling", thereby reducing production safety.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an ultrapure water online heating device for semiconductor cleaning, comprising an ultrapure water heating tank that can be used for semiconductor cleaning, a water outlet pipe fixed at the bottom center of the ultrapure water heating tank, a protective component provided on the surface of the ultrapure water heating tank, a stirring device provided on the surface of the protective component, a feeding structure provided on the surface of the stirring device, an online heating component provided on the inner wall of the ultrapure water heating tank, a storage mechanism provided on the surface of the protective component, the storage mechanism comprising a storage tank and a top cover, the storage tank being provided on the surface of the protective component, the bottom of the storage tank passing through the top of the ultrapure water heating tank, and the top cover being threadedly connected to the top of the storage tank.

[0006] Preferably, the surface of the water outlet pipe is provided with multiple bending points, and the surface of the water outlet pipe is provided with a valve.

[0007] Preferably, the above-mentioned protective component includes an outer shell, legs, a thermostat, a water inlet pipe and a cover plate. The outer shell is nested and fixed on the outer wall surface of the ultrapure water heating tank, the two legs are symmetrically fixed on the outer wall of the outer shell, the thermostat is arranged on the side of one of the legs, the water inlet pipe passes through the side wall of the outer shell, the end of the water inlet pipe passes through the side wall of the ultrapure water heating tank, the cover plate is threadedly connected to the top of the water inlet pipe, and the storage tank passes through and is fixed on the top of the outer shell.

[0008] Preferably, the stirring device comprises a motor, a stirring rod and a feed plate, the motor is fixed to the top outer wall of the shell through a support plate, the stirring rod is fixed to the output end of the motor, and the feed plate is nested and fixed to the bottom of the stirring rod.

[0009] Preferably, the above-mentioned blanking structure includes a blanking plate and side blocks, the blanking plate is attached to the bottom of the feeding plate, the two side blocks are symmetrically fixed to the blanking plate, and the ends of the side blocks are fixedly connected to the inner wall of the ultrapure water heating tank.

[0010] Preferably, the surfaces of the blanking plate and the feeding plate are both provided with through holes, the surface of the feeding plate is provided with two through holes, and the surface of the blanking plate is provided with a plurality of through holes at equal angles.

[0011] Preferably, the online heating component comprises a side plate and an online heating rod, the side plate is fixed to the inner wall of the ultrapure water heating tank, and the online heating rod is arranged on the side of the side plate.

[0012] Preferably, two of the above-mentioned online heating rods are provided, and the online heating rods are electrically connected to the temperature controller.

[0013] Preferably, the storage tank is symmetrically distributed about the longitudinal center axis of the ultrapure water heating tank, and the bottom of the storage tank is an arc-shaped structure.

[0014] Compared with the prior art, the present invention adopts the above technical solution and has the following technical effects:

[0015] 1. The present invention cooperates with the ultrapure water heating tank, the water outlet pipe and the protective component so that when the device is in use, the protective component can be used to protect the ultrapure water heating tank, thereby preventing it from colliding with external objects and being damaged during use and transportation.

[0016] 2. The present invention cooperates with the stirring device, the feeding structure, the online heating component and the storage mechanism, so that when the device is in use, zeolite powder or quartz beads and other inert powders can be added to the ultrapure water heating tank with the help of the stirring device and the storage mechanism, thereby coordinating the stirring and reducing the probability of ultrapure water boiling, thereby solving the problem of ultrapure water boiling during the heating process of the existing device, which reduces production safety. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0018] Figure 1 This is a schematic diagram of the structure of the present invention from a first perspective;

[0019] Figure 2 This is a schematic diagram of the structure from a second viewing angle of the present invention;

[0020] Figure 3 Schematic diagram of the cross-sectional structure of the ultrapure water heating tank of the present invention;

[0021] Figure 4 For the present invention Figure 3 A in the middle is an enlarged structural diagram;

[0022] Figure 5 Schematic diagram of the three-dimensional structure of the stirring device of the present invention;

[0023] Figure 6 It is a schematic diagram of the three-dimensional structure of the material storage mechanism of the present invention;

[0024] Figure 7 Schematic diagram of the thermostat circuit structure of the present invention.

[0025] Explanation of the accompanying drawings: 1. Ultrapure water heating tank; 2. Water outlet pipe; 3. Protective component; 301. Housing; 302. Support leg; 303. Thermostat; 304. Water inlet pipe; 305. Cover plate; 4. Stirring device; 401. Motor; 402. Stirring rod; 403. Feeding plate; 5. Unloading structure; 501. Unloading plate; 502. Side block; 6. Online heating component; 601. Side plate; 602. Online heating rod; 7. Storage mechanism; 701. Storage tank; 702. Top cover. DETAILED DESCRIPTION

[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0027] It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings of this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the conditions under which this application can be implemented. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed in this application without affecting the efficacy and purpose that can be achieved by this application.

[0028] Example

[0029] In the prior art, during the use of the existing ultrapure water online heating device, the ultrapure water lacks suspended particles due to its high purity. Therefore, when it is heated, the temperature of the ultrapure water exceeds its own boiling point and becomes a superheated liquid. If it is disturbed by external factors at this time, it will form "violent boiling", thereby reducing production safety.

[0030] See also Figure 1-7The present invention provides a technical solution: an ultrapure water online heating device for semiconductor cleaning, comprising an ultrapure water heating tank 1 that can be used for semiconductor cleaning. In order to reduce the residual ultrapure water, the bottom of the ultrapure water heating tank 1 is an arc-shaped structure. In order to prevent the ultrapure water from being contaminated secondary, the ultrapure water heating tank 1 is made of low-dissolution borosilicate glass. A water outlet pipe 2 is fixed at the center of the bottom of the ultrapure water heating tank 1. A protective component 3 is provided on the surface of the ultrapure water heating tank 1. A stirring device 4 is provided on the surface of the protective component 3. A material discharge structure 5 is provided on the surface of the stirring device 4. An online heating component 6 is provided on the inner wall of the ultrapure water heating tank 1. The surface of the protective component 3 is provided with a storage mechanism 7. In order to store inert powders such as zeolite powder, thereby facilitating their delivery, reducing the probability of violent boiling, and improving production safety, a storage mechanism 7 is provided. The storage mechanism 7 includes a storage tank 701 and a top cover 702. The storage tank 701 is provided on the surface of the protective component 3. The bottom of the storage tank 701 passes through the top of the ultrapure water heating tank 1. The top cover 702 is threadedly connected to the top of the storage tank 701. In order to ensure the smoothness of the material discharge, a vibration motor is provided on the side of the storage tank 701. The model of the vibration motor is W5310, and its manufacturer is Zhongshan Lingda Dynamic Li Technology Co., Ltd., the vibration motor can be started when zeolite powder or inert powder is added. In order to reduce the damage to the pipeline caused by the impact force of water flow when ultrapure water is discharged, the surface of the water outlet pipe 2 is provided with multiple bending points, and the surface of the water outlet pipe 2 is provided with a valve. In order to protect the ultrapure water heating tank 1 from collision, a protective component 3 is provided. The protective component 3 includes a shell 301, a support leg 302, a thermostat 303, a water inlet pipe 304 and a cover plate 305. The shell 301 is nested and fixed on the outer wall surface of the ultrapure water heating tank 1. The material of the shell 301 is tungsten steel, which has the advantages of good thermal insulation effect and high hardness. The two The legs 302 are symmetrically fixed to the outer wall of the outer shell 301. In order to increase the stability of the device, the legs 302 are of a "⊥" shape. The thermostat 303 is arranged on the side of one leg 302. The surface of the leg 302 is provided with a power switch for controlling the motor 401. The water inlet pipe 304 passes through the side wall of the outer shell 301. The water inlet pipe 304 is designed to be inclined. The water inlet pipe 304 is located on the upper side of the ultrapure water heating tank 1. The end of the water inlet pipe 304 passes through the side wall of the ultrapure water heating tank 1. The cover plate 305 is threadedly connected to the top of the water inlet pipe 304. The storage tank 701 passes through and is fixed to the top of the outer shell 301.

[0031] In order to reduce the probability of violent boiling and to evenly feed the zeolite powder or inert powder, a stirring device 4 is provided. The stirring device 4 includes a motor 401, a stirring rod 402 and a feeding plate 403. The motor 401 is fixed to the top outer wall of the shell 301 through a support plate. In order to ensure smooth feeding and stirring, the motor 401 has a low speed. The low speed can make the stirring gentle, which helps to alleviate violent boiling. The stirring rod 402 is fixed to the output end of the motor 401. The stirring rod 402, the shell 301 and the ultrapure water heating tank 1 form a rotating structure through a sealed bearing. The feeding plate 403 is nested and fixed. At the bottom of the stirring rod 402, the bottom of the stirring rod 402 passes through the top of the ultrapure water heating tank 1, and the feeding plate 403 is located inside the ultrapure water heating tank 1. In order to put zeolite powder or inert powder into the interior of the ultrapure water heating tank 1 and reduce the probability of violent boiling of ultrapure water, a blanking structure 5 is provided. The blanking structure 5 includes a blanking plate 501 and a side block 502. The blanking plate 501 is attached to the bottom of the feeding plate 403, and the two side blocks 502 are symmetrically fixed to the blanking plate 501. The ends of the side blocks 502 are fixedly connected to the inner wall of the ultrapure water heating tank 1, so that the zeolite powder or inert powder can pass smoothly. The blanking plate 501 and the feeding plate 403 are provided with through holes on their surfaces. The feeding plate 403 has two through holes on its surface. The surface of the blanking plate 501 has several through holes at equal angles. When it is necessary to reduce the probability of bumping, the through holes on the feeding plate 403 and the blanking plate 501 overlap, and the blanking plate 501 is not connected to the stirring rod 402. The blanking plate 501 is in a fixed state. In order to heat the ultrapure water and control the temperature in real time, thereby completing the purpose of online heating, an online heating component 6 is provided. The online heating component 6 includes a side plate 601 and an online heating rod 602. The side plate 601 is fixed to the inner wall of the ultrapure water heating tank 1, and the online heating rod 602 is arranged on the side of the side plate 601. In order to improve the uniformity of heating and accelerate the heating efficiency so that the temperature can quickly reach the requirement, two online heating rods 602 are provided. The online heating rod 602 is electrically connected to the temperature controller 303, and the two online heating rods 602 are connected in series. In order to ensure that the feeding operation can be completed thoroughly, thereby avoiding the uneven feeding of materials in the middle, the storage tank 701 is symmetrically distributed about the longitudinal center axis of the ultrapure water heating tank 1, and the bottom of the storage tank 701 is an arc-shaped structure.

[0032] The model of motor 401 is BA71A4, and its manufacturer is Suzhou Kangnuojia Electromechanical Co., Ltd. The model of temperature controller 303 is XTMD-100, which has its own thermocouple (and the thermocouple in this application is installed inside the ultrapure water heating tank 1, and can directly contact the ultrapure water), and its manufacturer is Shanghai Wenhuang Automation Instrument Co., Ltd. The model of online heating rod 602 is 2188-6524, and its manufacturer is Shenzhen Baoxinwei Technology Co., Ltd. The working principle of online heating rod 602 is: after it is energized, the internal resistance wire will heat up, and then transfer the heat to the surface of the metal sheath. When the heated liquid flows through the position of the metal sheath, the heat on the surface of the metal sheath will be conducted into the liquid, thereby achieving the purpose of heating.

[0033] Working principle or structural principle, when it is necessary to heat the ultrapure water, the cover 305 can be rotated to open and the ultrapure water can be sent into the interior of the ultrapure water heating tank 1 from the water inlet pipe 304, and then the cover 305 can be rotated to close so that the ultrapure water is in a sealed space. Next, the temperature controller 303 is used to control the operation of the online heating rod 602, so as to heat the ultrapure water inside the ultrapure water heating tank 1, and the heating temperature can be controlled in real time, thereby completing the purpose of online heating. If it is necessary to reduce the probability of violent boiling of ultrapure water, the staff can run the electric The machine 401 drives the stirring rod 402 and the feeding plate 403 to rotate. Zeolite powder or inert powder falling from the storage tank 701 will be stored in the through holes on the feeding plate 403. As the feeding plate 403 rotates, the through holes on the surface of the feeding plate 403 will overlap with the through holes on the discharge plate 501. At this time, the zeolite powder or inert powder in the through holes on the feeding plate 403 will fall into the interior of the ultrapure water heating tank 1 along the through holes on the discharge plate 501, and cooperate with the stirring rod 402 to reduce the chance of ultrapure water boiling and increase production safety.

[0034] When the heating is completed, the staff can open the valve on the water outlet pipe 2, and the ultrapure water inside the ultrapure water heating tank 1 will leave along the water outlet pipe 2. After the staff collects the ultrapure water that leaves, they can use it to clean the semiconductor.

[0035] During the use of the equipment, the staff needs to regularly check the reserve amount of zeolite powder or inert powder inside the storage tank 701. If the reserve amount is low, it needs to be added in time. When adding, the top cover 702 can be rotated to disconnect it from the storage tank 701. After that, the zeolite powder or inert powder is put into the storage tank 701, and the top cover 702 is rotated in the opposite direction again to reconnect it to the storage tank 701, so that the interior of the storage tank 701 and the interior of the ultrapure water heating tank 1 are in a sealed state to prevent external dust from entering the interior of the equipment and causing pollution.

[0036] In summary, the device has the advantages of high safety and high energy utilization rate.

[0037] Those skilled in the art will appreciate that various combinations and / or combinations of features described in the various embodiments and / or claims of the present invention may be made, even if such combinations and / or combinations are not explicitly described in the present invention. In particular, various combinations and / or combinations of features described in the various embodiments and / or claims of the present invention may be made, without departing from the spirit and teachings of the present invention. All such combinations and / or combinations fall within the scope of the present invention.

Claims

1. An ultrapure water online heating device for semiconductor cleaning, comprising an ultrapure water heating tank (1) that can be used for semiconductor cleaning, characterized in that: A water outlet pipe (2) is fixed at the bottom center of the ultrapure water heating tank (1), a protective component (3) is provided on the surface of the ultrapure water heating tank (1), a stirring device (4) is provided on the surface of the protective component (3), a feeding structure (5) is provided on the surface of the stirring device (4), an online heating component (6) is provided on the inner wall of the ultrapure water heating tank (1), a storage mechanism (7) is provided on the surface of the protective component (3), the storage mechanism (7) comprises a storage tank (701) and a top cover (702), the storage tank (701) is provided on the surface of the protective component (3), the bottom of the storage tank (701) passes through the top of the ultrapure water heating tank (1), and the top cover (702) is threadedly connected to the top of the storage tank (701).

2. The ultrapure water online heating equipment for semiconductor cleaning according to claim 1, characterized in that: The surface of the water outlet pipe (2) is provided with a plurality of bending points, and the surface of the water outlet pipe (2) is provided with a valve.

3. The ultrapure water online heating equipment for semiconductor cleaning according to claim 1, characterized in that: The protective component (3) comprises a shell (301), legs (302), a temperature controller (303), a water inlet pipe (304) and a cover plate (305); the shell (301) is nested and fixed on the outer wall surface of the ultrapure water heating tank (1); the two legs (302) are symmetrically fixed on the outer wall of the shell (301); the temperature controller (303) is arranged on the side of one of the legs (302); the water inlet pipe (304) passes through the side wall of the shell (301); the end of the water inlet pipe (304) passes through the side wall of the ultrapure water heating tank (1); the cover plate (305) is threadedly connected to the top of the water inlet pipe (304); and the storage tank (701) passes through and is fixed to the top of the shell (301).

4. The ultrapure water online heating device for semiconductor cleaning according to claim 3, characterized in that: The stirring device (4) comprises a motor (401), a stirring rod (402) and a feeding plate (403); the motor (401) is fixed to the top outer wall of the housing (301) via a support plate; the stirring rod (402) is fixed to the output end of the motor (401); and the feeding plate (403) is nested and fixed to the bottom of the stirring rod (402).

5. The ultrapure water online heating device for semiconductor cleaning according to claim 4, characterized in that: The blanking structure (5) comprises a blanking plate (501) and side blocks (502), wherein the blanking plate (501) is attached to the bottom of the feeding plate (403), and the two side blocks (502) are symmetrically fixed to the blanking plate (501), and the ends of the side blocks (502) are fixedly connected to the inner wall of the ultrapure water heating tank (1).

6. The ultrapure water online heating device for semiconductor cleaning according to claim 5, characterized in that: The surfaces of the blanking plate (501) and the feeding plate (403) are both provided with through holes, the surface of the feeding plate (403) is provided with two through holes, and the surface of the blanking plate (501) is provided with a plurality of through holes at equal angles.

7. The ultrapure water online heating device for semiconductor cleaning according to claim 3, characterized in that: The online heating component (6) includes a side plate (601) and an online heating rod (602), wherein the side plate (601) is fixed to the inner wall of the ultrapure water heating tank (1), and the online heating rod (602) is arranged on the side of the side plate (601).

8. The ultrapure water online heating device for semiconductor cleaning according to claim 7, characterized in that: Two online heating rods (602) are provided, and the online heating rods (602) are electrically connected to the temperature controller (303).

9. The ultrapure water online heating device for semiconductor cleaning according to claim 1, characterized in that: The storage tank (701) is symmetrically distributed about the longitudinal center axis of the ultrapure water heating tank (1), and the bottom of the storage tank (701) is an arc-shaped structure.

Images