Single wafer ultrasonic cleaning device

Abstract

The invention discloses a single wafer ultrasonic cleaning device, and belongs to the field of ultrasonic cleaning, the single wafer ultrasonic cleaning device comprises a rack, a cleaning cylinder is fixed on the rack, a top cover is arranged above the cleaning cylinder, an electric push rod for driving the top cover to lift is mounted on the outer surface of the cleaning cylinder, and a placing cylinder is fixed at the bottom of the top cover through a connecting rod; the bottom of the placing cylinder is provided with filtering holes, the inner wall of the cleaning cylinder is provided with an ultrasonic transducer, the ultrasonic transducer is electrically connected with an external ultrasonic generator, the rack is further fixedly provided with a filtering box, and the filtering box is provided with a circulating system. Through the arrangement of the circulating system, the first infusion pump pumps cleaning liquid carrying pollutants in the cleaning cylinder to the circular shell, the cleaning liquid flows into the filtering box through the connecting pipe, impurity filtering is achieved under the action of the baffle and the filtering cylinder, then the filtered cleaning liquid is pumped back to the cleaning cylinder through the second infusion pump, cleaning liquid circulating flowing is formed, and waste of the cleaning liquid is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of ultrasonic cleaning, and in particular to a single wafer ultrasonic cleaning device. Background Art

[0002] In the field of semiconductor manufacturing, cleaning of single wafers is a core step to ensure high-quality chip production. As chip manufacturing technology continues to advance towards the nanoscale, the wafer surface's tolerance for contaminants is almost harsh. Extremely small amounts of particulate impurities, metal ion residues, or organic matter attachment may cause problems such as short circuits and abnormal signal transmission on the chip, seriously affecting the chip's performance and yield. Ultrasonic cleaning technology, with its cavitation effect generated by high-frequency vibration, can effectively remove various contaminants from the wafer surface, making it one of the commonly used methods for cleaning single wafers.

[0003] However, most existing single-wafer ultrasonic cleaning devices use a single-use cleaning liquid model. That is, after cleaning is completed, the cleaning liquid containing a large amount of pollutants is directly discharged and cannot be recycled. This method not only causes a huge waste of cleaning liquid, but also significantly increases the production costs of semiconductor manufacturing companies, including cleaning liquid procurement costs and waste liquid treatment costs. At the same time, the discharge of large amounts of cleaning liquid also puts great pressure on the environment, increases the burden of sewage treatment and environmental governance costs. In addition, frequent replacement of cleaning liquid will interrupt the cleaning process, reduce production efficiency, and extend the wafer cleaning cycle, making it difficult to meet the large-scale and high-efficiency production needs of the semiconductor industry. Summary of the Invention

[0004] The purpose of the present invention is to solve the problem in the existing technology that most of the cleaning liquids are used in a single-use mode, that is, after cleaning is completed, the cleaning liquid containing a large amount of pollutants is directly discharged and cannot be recycled. This method not only causes a huge waste of cleaning liquid, but also greatly increases the production costs of semiconductor manufacturing companies, including the cleaning liquid procurement cost and waste liquid treatment cost problems. A single-wafer ultrasonic cleaning device is proposed.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] The cleaning cylinder is fixed on the frame, a top cover is provided above the cleaning cylinder, an electric push rod for driving the top cover to rise and fall is installed on the outer surface of the cleaning cylinder, a placing cylinder is fixed on the bottom of the top cover by a connecting rod, a filter hole is opened at the bottom of the placing cylinder, an ultrasonic transducer is installed on the inner wall of the cleaning cylinder, the ultrasonic transducer is electrically connected to an external ultrasonic generator, the frame is also fixed with a filter box, a circulation system is provided on the filter box, the circulation system includes a liquid pump 1 fixed on the filter box, a circular shell is fixed on the side of the filter box, the liquid inlet and liquid outlet of the liquid pump 1 are respectively connected to the cleaning cylinder and the circular shell through a hose, a connecting pipe is connected between the circular shell and the filter box, and a liquid pump 2 is fixed on the top of the filter box, the liquid inlet and liquid outlet of the liquid pump 2 are respectively connected to the filter box and the cleaning cylinder through a hose.

[0007] Preferably, the circulation system further comprises baffles fixed on both side walls of the filter box, and a filter cartridge is fixed between the two baffles.

[0008] Preferably, the filter box is provided with a cleaning mechanism, which includes an impeller arranged in a circular shell, a rotating rod fixed at the axis of the impeller, the rotating rod is rotatably connected to the filter box through a bearing, and a turntable is fixed to the end of the rotating rod away from the impeller.

[0009] Preferably, a push rod is fixed to a side of the turntable close to the filter cartridge, a lifting shell is slidably provided on the outer surface of the push rod, a scraper is fixed to the lifting shell via a fixing rod, and a brush is fixed to the inner side of the scraper.

[0010] Preferably, a vibration mechanism for impacting the filter cartridge is also provided in the filter box, the vibration mechanism includes a cylinder body 1 fixed in the filter box, an extrusion rod is fixed to the top of the lifting shell, a piston disk 1 is fixed to the end of the extrusion rod away from the lifting shell, the extrusion rod and the piston disk 1 are both slidably connected to the cylinder body 1, and the outer surface of the cylinder body 1 is connected to a liquid inlet hose.

[0011] Preferably, a cylinder body 2 is fixed on the filter box, and the end of the liquid inlet hose away from the cylinder body 1 is connected to the cylinder body 2. A piston disk 2 slides in the cylinder body 2, and an impact rod is fixed on the piston disk 2. The impact rod is slidably connected to the filter box, and an elastic pad is fixed on the end of the impact rod close to the filter cartridge. A reset spring is sleeved on the outer surface of the impact rod, and the two ends of the reset spring are respectively fixedly connected to the cylinder body 2 and the piston disk 2.

[0012] Compared with the prior art, the present invention has the following beneficial effects:

[0013] 1. Through the setting of the circulation system, the liquid pump 1 pumps the cleaning liquid carrying pollutants in the cleaning cylinder into the circular shell, and flows into the filter box through the connecting pipe. Impurities are filtered under the action of the baffle and the filter cartridge. The filtered cleaning liquid is then pumped back to the cleaning cylinder by the liquid pump 2, forming a circulation flow of the cleaning liquid, reducing the waste of cleaning liquid, reducing production costs and sewage treatment pressure, and avoiding frequent replacement of cleaning liquid to interrupt the process, thereby improving production efficiency.

[0014] 2. Through the setting of the cleaning mechanism, the impeller in the circular shell rotates under the action of the flow of cleaning liquid, driving the rotating rod and turntable to rotate. The push rod on the turntable pushes the lifting shell to slide up and down, so that the scraper and brush fixed on the lifting shell clean the inner wall of the filter cartridge to prevent the filter cartridge from being blocked, ensure the filtering effect, and thus maintain the stable operation of the cleaning liquid circulation system.

[0015] 3. Through the setting of the vibration mechanism, the elastic pad at the end of the impact rod can hit the filter cartridge, causing the filter cartridge to vibrate, further shaking off the impurities attached to the filter cartridge. In conjunction with the cleaning mechanism, the self-cleaning ability of the filter cartridge can be effectively improved, ensuring the high efficiency of the cleaning liquid circulation filtration. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is a schematic diagram of the three-dimensional structure of a single wafer ultrasonic cleaning device proposed by the present invention;

[0017] Figure 2 This is a schematic diagram of the internal structure of a cleaning cylinder and a filter box of a single wafer ultrasonic cleaning device proposed by the present invention;

[0018] Figure 3 This is a structural front view of a single wafer ultrasonic cleaning device proposed by the present invention;

[0019] Figure 4 This is a schematic diagram of the internal structure of the cylinder 1 and cylinder 2 of the single wafer ultrasonic cleaning device proposed by the present invention;

[0020] Figure 5 The present invention proposes a single wafer ultrasonic cleaning device Figure 4 A magnified view of the structure in the middle.

[0021] In the figure: 1. Frame; 2. Cleaning cylinder; 3. Top cover; 4. Electric push rod; 5. Placement cylinder; 6. Filter box; 71. Liquid pump 1; 72. Round shell; 73. Connecting pipe; 74. Liquid pump 2; 75. Baffle; 76. Filter cylinder; 81. Impeller; 82. Rotating rod; 83. Rotating plate; 84. Push rod; 85. Lifting shell; 86. Fixed rod; 87. Scraper; 91. Cylinder body 1; 92. Extrusion rod; 93. Piston disc 1; 94. Liquid inlet hose; 95. Cylinder body 2; 96. Piston disc 2; 97. Impact rod; 98. Elastic pad; 99. Return spring. DETAILED DESCRIPTION

[0022] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention.

[0023] Example 1

[0024] Reference Figure 1-Figure 5 The top of the filter box 6 is fixed with a liquid pump 71, and the liquid pump 71 is connected with the cleaning cylinder 2 and the circular shell 72 respectively. The circular shell 72 is connected with the filter box 6 by a connecting pipe 73. A liquid pump 2 is fixed on the top of the filter box 6, and the liquid inlet and outlet ends of the liquid pump 2 are connected with the cleaning cylinder 2 and the circular shell 72 respectively through a hose. A connecting pipe 73 is connected between the circular shell 72 and the filter box 6. A liquid pump 2 is fixed on the top of the filter box 6, and the liquid inlet and outlet ends of the liquid pump 2 are connected with the cleaning cylinder 2 and the circular shell 72 respectively through a hose.

[0025] Furthermore, the circulation system further includes baffles 75 fixed to both side walls of the filter box 6 , and a filter cartridge 76 is fixed between the two baffles 75 .

[0026] Furthermore, a cleaning mechanism is provided on the filter box 6, which includes an impeller 81 arranged in the circular shell 72, a rotating rod 82 is fixed at the axis of the impeller 81, the rotating rod 82 is rotatably connected to the filter box 6 through a bearing, and a turntable 83 is fixed at the end of the rotating rod 82 away from the impeller 81.

[0027] Furthermore, a push rod 84 is fixed to one side of the turntable 83 close to the filter cartridge 76 , a lifting shell 85 is slidably mounted on the outer surface of the push rod 84 , a scraper 87 is fixed to the lifting shell 85 via a fixing rod 86 , and a brush is fixed to the inner side of the scraper 87 .

[0028] The operator starts the electric push rod 4, which drives the top cover 3 to rise and places the single wafer to be cleaned in the placement tube 5. The electric push rod 4 drives the top cover 3 to descend, so that the placement tube 5 is immersed in the cleaning liquid in the cleaning tube 2. The filter holes at the bottom of the placement tube 5 allow the cleaning liquid to flow freely, ensuring that the wafer is fully in contact with the cleaning liquid. The external ultrasonic generator supplies power to the ultrasonic transducer, and the transducer converts the high-frequency electrical signal into mechanical vibration, generating a cavitation effect in the cleaning liquid. Countless tiny bubbles are quickly formed, expanded and burst under the action of ultrasonic waves. The impact force generated directly acts on the surface of the wafer, stripping off particulate impurities, metal ions and organic residues. At the same time, ultrasonic vibration promotes the chemical reaction between the cleaning liquid and pollutants, accelerating the cleaning process.

[0029] The liquid suction pump 71 is started to pump the cleaning liquid carrying pollutants in the cleaning cylinder 2 to the circular shell 72 through the hose. After the cleaning liquid forms a vortex in the circular shell 72, it flows into the filter box 6 through the connecting pipe 73. The cleaning liquid first passes through the baffle 75 in the filter box 6 to change the flow direction and slow down the flow rate, and then passes through the filter cartridge 76 for physical filtration to remove large particles of impurities and suspended pollutants. The filtered clean cleaning liquid is then pumped back to the cleaning cylinder 2 through the hose by the liquid suction pump 2 74 to complete the cycle, reducing the waste of cleaning liquid, reducing production costs and sewage treatment pressure, and avoiding frequent replacement of cleaning liquid to interrupt the process, thereby improving production efficiency.

[0030] During the circulation of the cleaning liquid, the impeller 81 in the circular shell 72 rotates due to the impact of the liquid flow, driving the rotating rod 82 and the turntable 83 to rotate synchronously. The push rod 84 on the turntable 83 pushes the lifting shell 85 to make up and down reciprocating motion along the axial direction of the filter cartridge 76 during the rotation process. The scraper 87 and the brush fixed on the lifting shell 85 mechanically scrape the inner wall of the filter cartridge 76 to remove attached impurities, prevent the filter cartridge 76 from being blocked, ensure the filtering effect, and thus maintain the stable operation of the cleaning liquid circulation system.

[0031] After cleaning is completed, the electric push rod 4 drives the top cover 3 to rise and remove the wafer placed in the cylinder 5. At this time, the circulation system can continue to run, continuously filter the cleaning liquid, prepare for the next cleaning, or replace the cleaning liquid as needed.

[0032] Example 2 proposed based on Example 1:

[0033] Reference Figure 1-Figure 5 ,

[0034] Furthermore, a vibration mechanism for impacting the filter cartridge 76 is provided in the filter box 6. The vibration mechanism includes a cylinder 91 fixed in the filter box 6, an extrusion rod 92 fixed to the top of the lifting shell 85, and a piston disk 93 fixed to the end of the extrusion rod 92 away from the lifting shell 85. The extrusion rod 92 and the piston disk 93 are both slidably connected to the cylinder 91, and the outer surface of the cylinder 91 is connected to a liquid inlet hose 94.

[0035] Furthermore, a cylinder body 2 95 is fixed on the filter box 6, and the end of the liquid inlet hose 94 away from the cylinder body 1 91 is connected to the cylinder body 2 95, and a piston disk 2 96 slides in the cylinder body 2 95, and a striker rod 97 is fixed on the piston disk 2 96. The striker rod 97 is slidably connected to the filter box 6, and an elastic pad 98 is fixed on the end of the striker rod 97 close to the filter cartridge 76. A reset spring 99 is sleeved on the outer surface of the striker rod 97, and the two ends of the reset spring 99 are respectively fixedly connected to the cylinder body 2 95 and the piston disk 2 96.

[0036] The up and down movement of the lifting shell 85 drives the extrusion rod 92 and the piston disc 1 93 to slide in the cylinder 1 91, generating hydraulic changes. When the piston disc 1 93 moves upward, the cleaning liquid in the cylinder 1 91 is pressed into the cylinder 2 95 through the liquid inlet hose 94, pushing the piston disc 2 96 to overcome the elastic force of the return spring 99, so that the elastic pad 98 at the end of the impact rod 97 hits the filter cartridge 76, causing the filter cartridge 76 to vibrate and shake off stubbornly attached impurities. When the lifting shell 85 descends, the return spring 99 pushes the piston disc 2 96 to reset, completing a vibration cycle. This self-cleaning method combining mechanical scraping and vibration effectively prevents the filter cartridge 76 from being blocked, ensuring the filtration efficiency and the stability of the cleaning liquid circulation.

[0037] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A single wafer ultrasonic cleaning device, comprising a frame (1), characterized in that: A cleaning cylinder (2) is fixed on the frame (1), a top cover (3) is provided above the cleaning cylinder (2), an electric push rod (4) is installed on the outer surface of the cleaning cylinder (2) for driving the top cover (3) to rise and fall, a placement cylinder (5) is fixed to the bottom of the top cover (3) through a connecting rod, a filter hole is provided at the bottom of the placement cylinder (5), an ultrasonic transducer is installed on the inner wall of the cleaning cylinder (2), and the ultrasonic transducer is electrically connected to an external ultrasonic generator, a filter box (6) is also fixed on the frame (1), and a circulating The circulation system includes a first liquid pump (71) fixed on the filter box (6), a circular shell (72) is fixed on the side of the filter box (6), the liquid inlet and liquid outlet of the first liquid pump (71) are respectively connected to the cleaning cylinder (2) and the circular shell (72) through a hose, a connecting pipe (73) is connected between the circular shell (72) and the filter box (6), and a second liquid pump (74) is fixed on the top of the filter box (6), and the liquid inlet and liquid outlet of the second liquid pump (74) are respectively connected to the filter box (6) and the cleaning cylinder (2) through a hose.

2. The single wafer ultrasonic cleaning device according to claim 1, characterized in that: The circulation system further comprises baffles (75) fixed to the two side walls of the filter box (6), and a filter cartridge (76) is fixed between the two baffles (75).

3. The single wafer ultrasonic cleaning device according to claim 1, characterized in that: The filter box (6) is provided with a cleaning mechanism, which includes an impeller (81) arranged in a circular shell (72), a rotating rod (82) being fixed at the axis of the impeller (81), the rotating rod (82) being rotatably connected to the filter box (6) via a bearing, and a rotating disk (83) being fixed at one end of the rotating rod (82) away from the impeller (81).

4. The single wafer ultrasonic cleaning device according to claim 3, characterized in that: A push rod (84) is fixed to one side of the turntable (83) close to the filter cartridge (76), a lifting shell (85) is slidably mounted on the outer surface of the push rod (84), a scraper (87) is fixed to the lifting shell (85) via a fixing rod (86), and a brush is fixed to the inner side of the scraper (87).

5. The single wafer ultrasonic cleaning device according to claim 4, characterized in that: The filter box (6) is further provided with a vibration mechanism for impacting the filter cartridge (76), the vibration mechanism comprising a cylinder body (91) fixed in the filter box (6), an extrusion rod (92) fixed to the top of the lifting shell (85), a piston disc (93) fixed to the end of the extrusion rod (92) away from the lifting shell (85), the extrusion rod (92) and the piston disc (93) are both slidably connected to the cylinder body (91), and the outer surface of the cylinder body (91) is connected to a liquid inlet hose (94).

6. The single wafer ultrasonic cleaning device according to claim 5, characterized in that: A second cylinder (95) is fixed on the filter box (6), and the end of the liquid inlet hose (94) away from the first cylinder (91) is connected to the second cylinder (95). A second piston disc (96) slides in the second cylinder (95), and a striker rod (97) is fixed on the second piston disc (96). The striker rod (97) is slidably connected to the filter box (6), and an elastic pad (98) is fixed on the end of the striker rod (97) close to the filter cartridge (76). A reset spring (99) is sleeved on the outer surface of the striker rod (97), and the two ends of the reset spring (99) are respectively fixedly connected to the second cylinder (95) and the second piston disc (96).

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