Efficient cleaning device for wafer box

Abstract

The invention discloses an efficient cleaning device for wafer cassettes, which is used for cleaning products, and comprises a cleaning box with a cleaning cavity; the fixing piece comprises a rotating part and a fixing part, the rotating part can rotate in the first direction, and the fixing part is used for fixing a product; the cleaning piece comprises a first cleaning part and a second cleaning part; and the drying piece comprises a first drying part and a second drying part. According to the efficient cleaning device for the wafer box, the product is fixed through the fixing part, in the cleaning process, the product is driven to rotate through the rotating part, the first cleaning part and the second cleaning part clean the interior and the exterior of the product at the same time, and the interior and the exterior of the product are dried through the first drying part and the second drying part correspondingly; and the product cleaning efficiency is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of cleaning, in particular to a high-efficiency cleaning device for wafer carriers. BACKGROUND

[0002] Wafer carrier cleaning is a key step in semiconductor manufacturing, aiming to remove contaminants such as particles, organic matter, metal ions, etc., to avoid damage or contamination to wafers, wherein the cleaning methods include ultrasonic cleaning, chemical cleaning technology and single wafer carrier cleaning, etc. However, ultrasonic cleaning may cause damage to sensitive structures (such as micropores), and chemical cleaning requires control of concentration and temperature to avoid corrosion of wafer carrier materials, which is complex to operate. SUMMARY

[0003] The purpose of the present application is to provide a high-efficiency cleaning device for wafer carriers to solve the problems in the prior art, improve the cleaning effect and increase the cleaning efficiency.

[0004] The present application provides a high-efficiency cleaning device for wafer carriers for cleaning products, comprising:

[0005] A cleaning tank having a cleaning cavity;

[0006] A fixing member arranged in the cleaning cavity, comprising a rotating part and a fixing part, the fixing part being arranged on the rotating part, the rotating part being rotatable in a first direction, the fixing part being used for fixing the products, the fixing part comprising a plurality of support plates, the plurality of support plates being uniformly distributed on the rotating part in a circumferential direction, each of the support plates being provided with a stopper, each of the stoppers being in abutment with the products when the products are located on the plurality of support plates;

[0007] A cleaning member arranged in the cleaning cavity, comprising a first cleaning part and a second cleaning part, the first cleaning part comprising a liquid outlet pipe provided with a plurality of liquid outlets arranged in a second direction, the second cleaning part comprising a plurality of liquid injection pipes uniformly distributed on the inner wall surface of the cleaning cavity;

[0008] The drying piece is arranged in the cleaning cavity, and the drying piece comprises a first drying part and a second drying part.

[0009] The high-efficiency cleaning device for wafer boxes as described above, preferably, the cleaning cavity is formed with an opening on the surface of the cleaning box, and a cover is arranged at the opening, and the cover is used for opening or closing the opening.

[0010] The high-efficiency cleaning device for wafer boxes as described above, preferably, the cover is further provided with a plurality of air injection holes.

[0011] The high-efficiency cleaning device for wafer boxes as described above, preferably, the high-efficiency cleaning device for wafer boxes further comprises a pressing piece arranged on the cover, and the pressing piece is used for pressing the product.

[0012] The high-efficiency cleaning device for wafer boxes as described above, preferably, the high-efficiency cleaning device for wafer boxes further comprises a plurality of heating pieces, and the plurality of heating pieces are uniformly distributed on the side wall of the cleaning cavity.

[0013] The high-efficiency cleaning device for wafer boxes as described above, preferably, the high-efficiency cleaning device for wafer boxes further comprises a liquid discharge port arranged on the bottom wall of the cleaning cavity.

[0014] Compared with the prior art, the high-efficiency cleaning device for wafer boxes of the present application fixes the product through the fixing part, rotates the product by using the rotating part during the cleaning process, simultaneously cleans the inside and outside of the product by the first cleaning part and the second cleaning part, and finally dries the inside and outside of the product by the first drying part and the second drying part respectively, thereby improving the cleaning efficiency of the product and effectively avoiding damage to the product caused by cleaning. BRIEF DESCRIPTION OF DRAWINGS

[0015] Figure 1 is a first perspective view of the high-efficiency cleaning device for wafer boxes provided by the embodiment of the present application;

[0016] Figure 2 is a second perspective view of the high-efficiency cleaning device for wafer boxes provided by the embodiment of the present application;

[0017] Figure 3 is a third perspective view of the high-efficiency cleaning device for wafer boxes provided by an embodiment of the present application, with a cleaning box hidden;

[0018] Figure 4 is a first perspective view of the high-efficiency cleaning device for wafer boxes provided by an embodiment of the present application, with a cleaning box hidden;

[0019] Figure 5 is a second perspective view of the high-efficiency cleaning device for wafer boxes provided by an embodiment of the present application, with a cleaning box hidden;

[0020] Figure 6 is a third perspective view of the high-efficiency cleaning device for wafer boxes provided by an embodiment of the present application, with a cleaning box hidden;

[0021] Figure 7 is a first perspective view of the high-efficiency cleaning device for wafer boxes provided by an embodiment of the present application, with a cleaning box hidden; Figure 6 is an enlarged view of a partial A in the figure.

[0022] Explanation of reference signs:

[0023] 10 - cleaning box, 11 - cleaning cavity, 12 - opening, 13 - cover body, 14 - air injection hole, 15 - pressing piece;

[0024] 20 - fixing piece, 21 - rotating part, 211 - rotating disc, 22 - fixed part, 221 - support plate, 222 - stop block;

[0025] 30 - cleaning piece, 31 - first cleaning part, 311 - liquid outlet pipe, 312 - liquid outlet, 32 - second cleaning part, 321 - liquid injection pipe;

[0026] 40 - drying piece, 41 - first drying part, 411 - first air outlet pipe, 412 - first air outlet, 413 - second air outlet pipe, 414 - second air outlet, 415 - air outlet branch pipe, 416 - guide groove, 42 - second drying part, 421 - air injection pipe;

[0027] 50 - driving mechanism;

[0028] 60 - heating piece;

[0029] 70 - liquid discharge port;

[0030] D1 - first direction, D2 - second direction. DETAILED DESCRIPTION

[0031] The embodiments described below with reference to the drawings are exemplary and are only used to explain the present application, and cannot be explained as a limitation of the present application.

[0032] Reference Figures 1 to 3As shown, the present application provides a kind of high efficiency cleaning device of wafer box, for cleaning product, high efficiency cleaning device of wafer box includes cleaning box 10, fixed part 20, cleaning part 30 and drying part 40, wherein:

[0033] Cleaning box 10 has cleaning cavity 11, fixed part 20, cleaning part 30 and drying part 40 are all arranged in cleaning cavity 11, when cleaning product, need to place product in cleaning cavity 11, then clean and dry.

[0034] Referring to Figure 4 As shown, fixed part 20 includes rotating part 21 and fixed part 22, fixed part 22 is arranged on rotating part 21, rotating part 21 can rotate along first direction D1, first direction D1 is the direction of rotation with the center of rotating part 21 as the center, fixed part 22 is used to fix product, after product is fixed on fixed part 22, rotating part 21 rotates along first direction D1 can drive product to rotate along first direction D1 synchronously.

[0035] Referring to Figure 1 As shown, cleaning part 30 includes first cleaning part 31 and second cleaning part 32, first cleaning part 31 is used to clean the inside of product, and second cleaning part 32 is used to clean the outside of product. First cleaning part 31 is fixed in cleaning cavity 11, when product is fixed on rotating part 21 by fixed part 22, first cleaning part 31 is located in the inside of product, and second cleaning part 32 is located in the outside of product, when rotating part 21 rotates along first direction D1, product rotates along first direction D1 with rotating part 21, while first cleaning part 31 and second cleaning part 32 are both fixed in cleaning cavity 11 and remain stationary, and then first cleaning part 31 and second cleaning part 32 can clean the inside and the outside of product simultaneously, so as to realize the rapid cleaning of the inside and the outside of product.

[0036] After product is cleaned, drying part 40 is used to dry, continue to refer to Figure 1 As shown, drying part 40 includes first drying part 41 and second drying part 42, first drying part 41 is used to dry the inside of product, and second drying part 42 is used to dry the outside of product. When product is fixed on rotating part 21, first drying part 41 is located in the inside of product, and second drying part 42 is located in the outside of product, when drying product, rotating part 21 continues to drive product to rotate along first direction D1, while first drying part 41 and second drying part 42 remain stationary, so that first drying part 41 and second drying part 42 dry the inside and the outside of product simultaneously, so as to realize the rapid drying of the inside and the outside of product.

[0037] In the embodiments provided in the present application, the product to be cleaned is a wafer box, when the wafer box is placed on the rotating part 21, the side of the wafer box is fixed by the fixing part 22, the first cleaning part 31 and the first drying part 41 are located in the inner cavity of the wafer box, and the second cleaning part 32 and the second drying part 42 are located outside the wafer box.

[0038] During cleaning, the first cleaning part 31 and the second cleaning part 32 are started, the rotating part 21 continues to rotate, the wafer box is continuously rotated in the first direction D1, the first cleaning part 31 can continuously clean the inner wall surface of the wafer box, and the second cleaning part 32 can continuously clean the outer side surface of the wafer box.

[0039] After cleaning, the first cleaning part 31 and the second cleaning part 32 are closed, the first drying part 41 and the second drying part 42 are opened, and the rotating part 21 continues to rotate the wafer box, so that the first drying part 41 can continuously dry the inner wall surface of the wafer box, and the second drying part 42 can continuously dry the outer side surface of the wafer box.

[0040] Compared with the cleaning method of the wafer box in the prior art, the wafer box efficient cleaning device provided in the present application has simple cleaning method, simple operation, improved cleaning efficiency, and can effectively avoid damage to the wafer box caused by ultrasonic cleaning or chemical cleaning.

[0041] In a feasible implementation manner, referring to FIG. 1, Figures 4 to 6 As shown in the figure, the fixing part 22 includes a plurality of support plates 221, the plurality of support plates 221 are uniformly distributed on the rotating part 21 in the circumferential direction, each support plate 221 is provided with a stopper 222, when the product is located on the plurality of support plates 221, each stopper 222 abuts against the product, and the plurality of stoppers 222 collectively fix the product on the plurality of support plates 221, when the rotating part 21 rotates, the plurality of support plates 221 synchronously rotate, and then drive the product to rotate.

[0042] Further, the rotating part 21 includes a rotating disc 211, the wafer box efficient cleaning device further includes a driving motor (not shown), and an output end of the driving motor is connected with the rotating disc 211 to drive the rotating disc 211 to rotate. The plurality of support plates 221 are uniformly distributed along the circumferential direction of the rotating disc 211, the stopper 222 is arranged at one end of the support plate 221 away from the center of the rotating disc 211, and the orientation of the stopper 222 can be set according to the outer contour shape of the product, so that when the product is supported on the plurality of support plates 221, each stopper 222 can abut against the outer side of the product.

[0043] In the embodiments provided in the present application, referring to Figure 4 and Figure 5As shown, the first cleaning part 31 comprises a liquid outlet pipe 311, and a plurality of liquid outlets 312 are arranged on the liquid outlet pipe 311. The plurality of liquid outlets 312 are arranged along the second direction D2, and the second direction D2 is the direction of gravity. The plurality of liquid outlets 312 are arranged from top to bottom along the liquid outlet pipe 311 and are all directed towards the product. When the product is fixed on the rotating part 21, the liquid outlets 312 close to the upper part of the liquid outlet pipe 311 are arranged towards the top wall of the product, and the plurality of liquid outlets arranged on the pipe body of the liquid outlet pipe 311 are arranged towards the side wall of the product. Thus, the top wall and the side wall inside the product can be cleaned by the spray cleaning liquid through the liquid outlet pipe 311.

[0044] Referring to Figure 1 As shown, the second cleaning part 32 comprises a plurality of liquid spray pipes 321, which are uniformly distributed on the inner wall surface of the cleaning cavity 11. The liquid spray pipes 321 are distributed on the top of the cleaning cavity 11 and the side wall of the cleaning cavity 11. Thus, when the product rotates with the rotating part 21, the liquid spray pipes 321 can clean the top wall and the side wall outside the product.

[0045] Further, referring to Figures 4 to 7 As shown, the first drying part 41 comprises a first air outlet pipe 411 and a second air outlet pipe 413. A plurality of first air outlets 412 are arranged on the first air outlet pipe 411, and the plurality of first air outlets 412 are arranged along the second direction D2. The plurality of first air outlets 412 are arranged from top to bottom along the first air outlet pipe 411 and are all directed towards the product. When the product is fixed on the rotating part 21, the first air outlets 412 located at the top of the first air outlet pipe 411 are arranged towards the top wall of the product, and the plurality of first air outlets arranged on the pipe body of the first air outlet pipe 411 are all arranged towards the side wall of the product. Thus, the top wall and the side wall of the product can be dried by the airflow.

[0046] The first air outlet pipe 411 sprays the gas in a straight way to dry the product. In order to improve the drying efficiency, at least one guide groove 416 is arranged on the second air outlet pipe 413. A second air outlet 414 is arranged on the second guide groove 416, and the second air outlet 414 communicates with the second air outlet pipe 413. The guide groove 416 can guide the gas flowing out of the second air outlet 414 to the side of the product, further improving the drying effect, so as to fully dry the inside of the product.

[0047] Specifically, at least one air outlet branch pipe 415 is arranged on the second air outlet pipe 413. The guide groove 416 is formed by inwardly recessing from the outer circumferential surface of the air outlet branch pipe 415. The second air outlet 414 is arranged on the side wall of the guide groove 416 and communicates with the second air outlet pipe 413. When the gas is sprayed out of the second air outlet 414, it will be sprayed onto the side wall opposite to the side wall where the second air outlet 414 is located. Under the blockage of the side wall, the airflow flows to both sides, and then flows to the side of the product.

[0048] The second drying part 42 comprises a plurality of air injection pipes 421 arranged on the inner wall surface of the cleaning cavity 11. The inner wall surface of the cleaning cavity 11 is provided with a plurality of rows of air injection pipes 421 which are uniformly and spacedly arranged on the inner wall surface of the cleaning cavity 11. The plurality of air injection pipes 421 of each row are arranged in the direction of gravity. During rotation of the product, the air can be uniformly injected to the outside of the product to dry the outside of the product.

[0049] During the cleaning of the product, the cleaning needs to be performed in a sterile environment to ensure the cleaning effect. In the embodiments provided in the present application, as shown in FIG. 3, the cleaning cavity 11 is formed with an opening 12 on the surface of the cleaning box 10. The opening 12 is provided with a cover 13 which is used to open or close the opening 12. After the product is fixed on the rotating part 21, the opening 12 is closed by the cover 13 to isolate the cleaning cavity 11 from the external environment, so as to clean the product. After the cleaning and drying are completed, the cover 13 is opened to take out the product from the cleaning cavity 11. Figures 1 to 3

[0050] In a feasible implementation, the cleaning box 10 is externally provided with a driving mechanism 50 which is used to drive the cover 13 to rotate so as to open or close the opening 12. Specifically, the driving mechanism 50 adopts an electric cylinder which is connected with the cover 13 to drive the cover 13 to rotate. The driving mechanism 50 can also adopt other structures or components which can drive the cover 13 to rotate, which are not limited herein.

[0051] After the opening 12 is closed by the cover 13, the top of the product faces the cover 13. In order to improve the drying efficiency, a plurality of air injection holes 14 are further arranged on the cover 13. The air injection holes 14 can inject air to the top of the product to accelerate the drying.

[0052] In order to more stably fix the product on the rotating part 21, as shown in FIG. 3, the high-efficiency cleaning device for wafer box further comprises a pressing piece 15 which is arranged on the cover 13. After the opening 12 is closed by the cover 13, the pressing piece 15 abuts against the product to press the product on the rotating part 21, thereby further fixing the position of the product on the rotating part 21.

[0053] In a feasible implementation, the pressing piece 15 comprises a suction disc which is arranged on the side of the cover 13 facing the product. After the opening 12 is closed by the cover 13, the suction disc presses the product and has a certain adsorption effect on the product, which is beneficial to fix the product on the rotating part 21.

[0054] As shown in FIG. 3, the high-efficiency cleaning device for wafer box further comprises a rotating part 21 which is arranged in the cleaning cavity 11. The product is arranged on the rotating part 21. The rotating part 21 is arranged in the cleaning cavity 11 and is rotatable. The product is arranged on the rotating part 21 and is rotatable with the rotating part 21. Figure 1 ​As shown, in the embodiments provided by the present application, the high-efficiency wafer box cleaning device further comprises a heating element 60, and the heating element 60 comprises a plurality of heating elements 60 which are uniformly distributed on the side wall of the cleaning cavity 11. After cleaning, the heating element 60 can be turned on to heat the air in the cleaning cavity 11, so that the air is warmed up, and at the same time, the drying element 40 is turned on, so that the warmed air is blown to the inside and outside of the product, which is beneficial to accelerate the drying process, shorten the drying time, and thus improve the drying efficiency.

[0055] The cleaning waste liquid generated during the cleaning process needs to be discharged in time to prevent the waste liquid from polluting the product. Therefore, with reference to Figures 1 to 3 As shown, the high-efficiency wafer box cleaning device of the present application further comprises a liquid discharge port 70 which is arranged on the bottom wall of the cleaning cavity 11. After the product is fixed by the fixing part 22, there is a certain distance between the product and the rotating part 21, so as to facilitate the flow of waste liquid to the liquid discharge port 70, and to avoid secondary pollution of the product caused by the waste liquid remaining on the bottom of the product.

[0056] The above embodiments shown in the drawings explain the structure, features and effects of the present application in detail. The above description is only the preferred embodiments of the present application, but the present application is not limited by the drawings. Any changes or modifications made in accordance with the concept of the present application, or equivalent embodiments with equivalent changes, are still within the scope of the present application.

Claims

1. An efficient cleaning device for a wafer box, characterized in that: include: a cleaning box having a cleaning chamber; a fixing member disposed in the cleaning chamber, the fixing member comprising a rotating portion and a fixing portion, the rotating portion being rotatable in a first direction, the fixing portion comprising a plurality of support plates, the plurality of support plates being evenly distributed on the rotating portion along a circumferential direction, each of the support plates being provided with a stopper, and each of the stoppers being abutted against the product when the product is located on the plurality of support plates; a cleaning member disposed in the cleaning chamber, the cleaning member comprising a first cleaning portion and a second cleaning portion, the first cleaning portion comprising a liquid outlet pipe having a plurality of liquid outlets, the second cleaning portion comprising a plurality of liquid spray pipes, the plurality of liquid spray pipes being evenly distributed on the inner wall surface of the cleaning chamber; A drying element is arranged in the cleaning chamber, and the drying element includes a first drying part and a second drying part. The first drying part includes a first air outlet pipe and a second air outlet pipe. The first air outlet pipe is provided with a plurality of first air outlets, the second air outlet pipe is provided with at least one guide groove, the guide groove is provided with a second air outlet, the second air outlet is connected to the second air outlet pipe, and the second drying part includes a plurality of air injection pipes.

2. The high-efficiency cleaning device for wafer cassettes according to claim 1, characterized in that: The cleaning cavity is formed with an opening on the surface of the cleaning box. A cover is provided at the opening, and the cover is used to open or close the opening.

3. The high-efficiency cleaning device for wafer cassettes according to claim 2, characterized in that: The cover body is also provided with a plurality of air-jet holes.

4. The high-efficiency cleaning device for wafer cassettes according to claim 2, characterized in that: The high-efficiency cleaning device for the wafer box further comprises a pressing member, which is arranged on the cover and is used to press the product.

5. The high-efficiency cleaning device for wafer cassettes according to claim 1, characterized in that: The high-efficiency cleaning device for the wafer box further comprises a heating element, wherein the heating element comprises a plurality of heating elements, and the plurality of heating elements are evenly distributed on the side wall of the cleaning chamber.

6. The high-efficiency cleaning device for wafer cassettes according to claim 1, characterized in that: The high-efficiency cleaning device for the wafer box further comprises a liquid drain port, which is arranged on the bottom wall of the cleaning chamber.

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