Cleaning capability test piece and cleaning capability test method

Abstract

The invention provides a cleaning capacity test piece and a cleaning capacity test method, and relates to the technical field of photomask processing. The cleaning capacity test piece comprises a test piece body, the surface of the test piece body is divided into a pattern area, a plurality of first patterns are arranged in the pattern area, the pattern types of the first patterns are the same, and any two first patterns are different in line width and / or length-width ratio. The cleaning capability test piece is applied to photomask cleaning test evaluation, the first patterns with different line widths and / or length-width ratios are designed in the pattern area of the cleaning capability test piece, and the cleaning capability of the same cleaning condition on the first patterns with different line widths and / or different length-width ratios can be obtained through one-time test. And it is determined that the cleaning condition can guarantee the integrity of the first patterns, and the evaluation process of the whole photomask cleaning test is shortened. In addition, a preferable cleaning condition combination of the cleaning capacity and the graph integrity can be quickly found, cleaning is evaluated in time, a window is made through cleaning, and time is saved and efficiency is high.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of photomask processing, in particular to a cleaning capacity test piece and a cleaning capacity test method. BACKGROUND

[0002] In the semiconductor field, with the improvement of product process capability, the line width of the photomask pattern is getting smaller and smaller, which makes the cleaning of the photomask face certain challenges, that is, both sufficient cleaning capacity for dirt and the integrity of the pattern need to be ensured, and the optimal cleaning condition needs to be found between the two.

[0003] The commonly used test method at present is to first evaluate the cleaning capacity after the cleaning condition is determined, and then verify whether the integrity of the pattern can be preserved. Such evaluation test process is tedious and may not be comprehensive. SUMMARY

[0004] The present application aims at the deficiencies in the prior art, and provides a cleaning capacity test piece and a cleaning capacity test method, which can shorten the test evaluation process of the optimal cleaning condition.

[0005] To achieve the above-mentioned purpose, the technical solutions adopted by the embodiments of the present application are as follows: In one aspect of the embodiments of the present application, a cleaning capacity test piece is provided, which comprises: a test piece body, a surface of the test piece body is divided into a pattern area, a plurality of first patterns are arranged in the pattern area, the pattern types of the plurality of first patterns are the same, and the line widths and / or the aspect ratios of any two first patterns are different.

[0006] Optionally, a plurality of second patterns are arranged in the pattern area, the second pattern comprises a main pattern and an auxiliary pattern arranged outside the main pattern, the pattern types of the main patterns of any two second patterns are different, and / or the pattern types of the auxiliary patterns of any two second patterns are different.

[0007] Optionally, the line widths and / or the aspect ratios of any two main patterns with the same pattern type are different.

[0008] Optionally, the line widths and / or the aspect ratios of any two auxiliary patterns with the same pattern type are different.

[0009] Optionally, the number of the pattern areas is a plurality, and the plurality of pattern areas cover at least 70% of the surface of the test piece body.

[0010] Optionally, the test piece body and the pattern area are both rectangular, and the plurality of pattern areas are distributed in a rectangular array on the surface of the test piece body.

[0011] Optionally, the pattern area is divided into a first pattern area and a second pattern area, the first pattern is located in the first pattern area, and the second pattern is located in the second pattern area.

[0012] Optionally, the plurality of graphic regions are identical.

[0013] In another aspect of the embodiments of the present application, a cleaning capacity testing method is provided, which uses the cleaning capacity testing sheet according to any one of the above embodiments. The cleaning capacity testing method comprises: providing the cleaning capacity testing sheet with stains, and cleaning the cleaning capacity testing sheet under a preset cleaning condition; detecting the cleaning capacity testing sheet to obtain the cleaning capacity of the preset cleaning condition and the influence on the graphic on the cleaning capacity testing sheet.

[0014] Optionally, after detecting the cleaning capacity testing sheet to obtain the cleaning capacity of the preset cleaning condition and the influence on the graphic on the cleaning capacity testing sheet, the cleaning capacity testing method further comprises: providing a new cleaning capacity testing sheet with stains, adjusting the preset cleaning condition according to the detection result, and cleaning the cleaning capacity testing sheet under the adjusted preset cleaning condition; detecting the cleaning capacity testing sheet to obtain the cleaning capacity of the adjusted preset cleaning condition and the influence on the graphic on the cleaning capacity testing sheet; repeating the above steps until the optimal preset cleaning condition is obtained.

[0015] The beneficial effects of the present application include: The present application provides a cleaning capacity testing sheet, which comprises: a testing sheet body, and a graphic region on the surface of the testing sheet body, wherein a plurality of first graphics are arranged in the graphic region, the graphic types of the plurality of first graphics are the same, and the line widths and / or the aspect ratios of any two first graphics are different. The cleaning capacity testing sheet is applied to photomask cleaning test and evaluation. The graphic region of the cleaning capacity testing sheet is designed with first graphics of different line widths and / or aspect ratios. The cleaning capacity of the first graphics of different line widths and / or aspect ratios under the same cleaning condition can be obtained by one test, and it is determined which first graphics can be guaranteed to be complete under the cleaning condition, thereby shortening the evaluation process of the entire photomask cleaning test. In addition, the optimal cleaning condition combination of cleaning capacity and graphic completeness can be quickly found, and the cleaning production window can be evaluated in time, thereby saving time and being efficient. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can also be obtained without creative labor on the basis of these drawings.

[0017] Figure 1 The structure schematic diagram of the cleaning capacity testing sheet provided by the embodiments of the present application is shown in the following figure. Figure 2A structural schematic view of a pattern area in a cleaning ability test piece provided by an embodiment of the present application; Figure 3 A flow chart of a cleaning ability test method provided by an embodiment of the present application.

[0018] Icon: 10 - cleaning ability test piece; 100 - test piece body; 110 - pattern area; 111 - first pattern area; 1111 - first sub-pattern area; 112 - second pattern area; 1121 - second sub-pattern area; 120 - first figure; 130 - second figure; 131 - main figure; 132 - auxiliary figure. DETAILED DESCRIPTION

[0019] In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. The components of the embodiments of the present application described and shown in the drawings can be arranged and designed in various different configurations.

[0020] Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the claimed present application, but only represents selected embodiments of the present application. It should be noted that, in the case of no conflict, various features in the embodiments of the present application can be combined with each other, and the combined embodiments are still within the protection scope of the present application.

[0021] It should be noted that: similar reference numerals and letters represent similar items in the following drawings, therefore, once an item is defined in one drawing, it does not need to be further defined and explained in the subsequent drawings.

[0022] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, or the orientation or positional relationship commonly placed when the product of the present application is used, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second", "third" and the like are only used to distinguish the description, and cannot be understood as indicating or implying relative importance.

[0023] In the description of the application, it also needs to be explained that, unless otherwise explicitly specified and limited, the terms "set", "install", "connect", "connect" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the application can be understood according to the specific circumstances.

[0024] An aspect of an embodiment of the present application, please refer to Figure 1 and Figure 2 , provide a cleaning ability test piece 10, applied to the test evaluation of the cleaning condition of the mask, so as to find the preferred cleaning condition between ensuring the cleaning ability and the integrity of the pattern.

[0025] The cleaning ability test piece 10 comprises: a test piece body 100, the surface of the test piece body 100 is divided into a pattern area 110, a plurality of first patterns 120 are arranged in the pattern area 110, the pattern types of the plurality of first patterns 120 are the same, and the line widths of any two first patterns 120 in the same pattern area 110 are different and / or the aspect ratios of any two first patterns 120 in the same pattern area 110 are different.

[0026] It can be understood that the material of the test piece body 100 is preferably the same as the material of the mask, so that the test result is more accurate. The surface of the test piece body 100 is divided into a pattern area 110, a plurality of first patterns 120 are formed in the pattern area 110, and the first patterns 120 are used to simulate the patterns on the mask. The pattern types of the plurality of first patterns 120 are the same, but the line widths of any two first patterns 120 in the same pattern area 110 are different, or the aspect ratios of any two first patterns 120 in the same pattern area 110 are different, or both the line widths and the aspect ratios are different. The range of the line width and the range of the aspect ratio can be designed according to actual needs.

[0027] For example, Figure 2 , in Figure 2 , the pattern types of all the first patterns 120 are rectangles, that is, the pattern types are the same; the aspect ratios of the three first patterns 120 in the first column are the same, but the line widths increase in turn; the line widths of the three first patterns 120 in the first row are the same, but the aspect ratios are different; the line width and the aspect ratio of the first first pattern 120 in the first row and the second first pattern 120 in the second row are different.

[0028] The cleaning ability test piece 10 is applied to the test evaluation of the cleaning ability of the mask, and the first pattern 120 with different line widths and / or aspect ratios is designed in the pattern area 110 of the cleaning ability test piece 10. The cleaning ability of the first pattern 120 with different line widths and / or aspect ratios under the same cleaning condition can be obtained at one time, and it is determined which first pattern 120 can ensure the integrity of the cleaning condition, thereby shortening the evaluation process of the entire mask cleaning test. In addition, the preferred cleaning condition combination of cleaning ability and pattern integrity can be quickly found, and the cleaning window can be evaluated in time, which is time-saving and efficient.

[0029] The pattern on the surface of the mask is generally divided into a main pattern and an auxiliary pattern outside the main pattern with a size smaller than the resolution limit. The auxiliary pattern is used to improve the environment near the main pattern and enhance the process stability, thereby improving the light intensity distribution and improving the imaging quality. In order to further improve the accuracy of the test, the pattern area 110 of the test piece body 100 is optionally provided with a plurality of second patterns 130. The second pattern 130 includes a main pattern 131 and an auxiliary pattern 132 disposed outside the main pattern 131. The pattern types of the main patterns 131 of any two second patterns 130 are different and / or the pattern types of the auxiliary patterns 132 of any two second patterns 130 are different.

[0030] The skilled person can select the main pattern and the auxiliary pattern that are easily damaged on the mask, and design them in the pattern area 110 as the second pattern 130. In this way, the more preferred cleaning condition combination can be detected by testing the easily damaged patterns on the mask while testing the first pattern 120.

[0031] The number of the second patterns 130 is a plurality, wherein the pattern types of the main patterns 131 of any two second patterns 130 can be the same or different, and similarly, the pattern types of the auxiliary patterns 132 of any two second patterns 130 can be the same or different. By combining different main patterns 131 and auxiliary patterns 132, the real situation of the mask can be simulated.

[0032] When designing the cleaning ability test piece 10, all known patterns that are easily damaged on the mask can be designed into the pattern area 110 as different second patterns 130, thereby further shortening the evaluation process of the mask cleaning test.

[0033] Optionally, the line widths and / or aspect ratios of any two main patterns 131 with the same pattern type are different.

[0034] In the plurality of second patterns 130, if there are two main patterns 131 of the same pattern type, the line width of the two main patterns 131 is different, or the aspect ratio of the two main patterns 131 is different, or both the line width and the aspect ratio of the two main patterns 131 are different. At this time, the pattern type, the line width, and the aspect ratio of the auxiliary pattern 132 corresponding to the main pattern 131 are not limited. In this way, the cleaning ability of the same cleaning condition on the main patterns 131 of different line widths and / or different aspect ratios can be obtained at one time, and it can be determined which main patterns 131 can be ensured to be intact under the cleaning condition.

[0035] Optionally, the line width and / or the aspect ratio of any two auxiliary patterns 132 of the same pattern type is different.

[0036] In the plurality of second patterns 130, if there are two auxiliary patterns 132 of the same pattern type, the line width of the two auxiliary patterns 132 is different, or the aspect ratio of the two auxiliary patterns 132 is different, or both the line width and the aspect ratio of the two auxiliary patterns 132 are different. At this time, the pattern type, the line width, and the aspect ratio of the main pattern 131 corresponding to the auxiliary pattern 132 are not limited. In this way, the cleaning ability of the same cleaning condition on the auxiliary patterns 132 of different line widths and / or different aspect ratios can be obtained at one time, and it can be determined which auxiliary patterns 132 can be ensured to be intact under the cleaning condition.

[0037] Optionally, there are at least two second patterns 130 of the same pattern type, and the line width and / or the aspect ratio of any two second patterns 130 of the same pattern type is different.

[0038] It should be noted that the same pattern type of the two second patterns 130 means that the pattern type of the main pattern 131 of the two second patterns 130 is the same, and the pattern type of the auxiliary pattern 132 of the two second patterns 130 is the same. The line width and the aspect ratio are compared as a whole.

[0039] In this way, the combination of the main pattern 131 and the auxiliary pattern 132 which are easily damaged on a certain mask can be tested, so that the optimal cleaning condition can be found.

[0040] Optionally, the number of the pattern areas 110 is a plurality, and the plurality of pattern areas 110 covers at least 70% of the surface of the test wafer body 100.

[0041] The plurality of pattern areas 110 are distributed on different positions of the test wafer body 100, and ensure that the coverage area is more than 70%, which means that the patterns on most areas of the mask surface are detected. Considering the position of the pattern, the measurement result can be more accurate.

[0042] Further, the plurality of graphic areas 110 are completely identical. In this way, the influence of some parameters of the graphic area 110 itself on the test result can be eliminated, so as to obtain the influence of the position of the graphic area 110 on the test result.

[0043] Optionally, the test sheet body 100 and the graphic area 110 are both rectangular, and the plurality of graphic areas 110 are arranged in a rectangular array on the surface of the test sheet body 100.

[0044] Generally, the shape of the mask is rectangular, so the test sheet body 100 is also designed to be rectangular to be more close to the actual situation of the mask. The plurality of graphic areas 110 are arranged in a rectangular array on the rectangular test sheet body 100, so that the test result can be more accurate.

[0045] Optionally, the graphic area 110 is divided into a first graphic area 111 and a second graphic area 112, the first graphic 120 is located in the first graphic area 111, and the second graphic 130 is located in the second graphic area 112.

[0046] All the first graphics 120 are located in the first graphic area 111, and all the second graphics 130 are located in the second graphic area 112, so that the surface of the test sheet body 100 can be more regular.

[0047] Further, the first graphic area 111 is divided into a plurality of first sub-graphic areas 1111 connected to each other, one first graphic 120 is arranged in each first sub-graphic area 1111, and the second graphic area 112 is divided into a plurality of second sub-graphic areas 1121 connected to each other, one second graphic 130 is arranged in each second sub-graphic area 1121.

[0048] When the number of the first graphics 120 and the second graphics 130 is both plural, each first graphic 120 is located in a small first sub-graphic area 1111, and each second graphic 130 is located in a small second sub-graphic area 1121, so that the surface of the test sheet body 100 can be more regular, and it is convenient for the staff to extract the test result.

[0049] The embodiment also provides a cleaning capacity test method, which adopts the cleaning capacity test sheet 10 of any one of the above, please refer to Figure 3 , the cleaning capacity test method comprises the following steps. S100: providing a test sheet with dirt, and cleaning the test sheet under a preset cleaning condition.

[0050] Please refer to Figure 1determining a preset cleaning condition, and cleaning the cleaning ability test piece 10 using the preset cleaning condition. The preset cleaning condition can be determined according to the experience of previous cleaning of the mask. The preset cleaning condition can include cleaning process, cleaning equipment parameters, type and concentration of cleaning liquid, etc. The cleaning ability test piece 10 needs to carry the dirt commonly carried before cleaning of the mask, so as to simulate the real situation of the mask and judge the cleaning ability of the preset cleaning condition.

[0051] S200: detecting the cleaning ability test piece to obtain the cleaning ability of the preset cleaning condition and the influence on the pattern on the cleaning ability test piece.

[0052] The cleaned cleaning ability test piece 10 is detected, on the one hand to obtain the cleaning ability of the preset cleaning condition, and on the other hand to obtain the damage of the pattern (the first pattern 120 and the second pattern 130) on the cleaning ability test piece 10. The evaluation of the cleaning ability can take the removal rate of the dirt as the evaluation parameter. The evaluation of the damage of the pattern can take the damage rate of the pattern line as the evaluation parameter. Of course, the evaluation of the above two items can also select other appropriate parameters for evaluation. According to the evaluation results of the above two items, the applicable pattern line width range and / or pattern aspect ratio range of the preset cleaning condition can be determined. According to the evaluation results, the preset cleaning condition can be optimized and adjusted combined with experience or past detection data, so as to obtain the preferred cleaning condition combination of cleaning ability and pattern integrity.

[0053] The above cleaning ability test method uses the cleaning ability test piece 10 to replace the mask for testing. The first pattern 120 with different line widths and / or aspect ratios is designed in the pattern area 110 of the cleaning ability test piece 10. The cleaning ability of the same cleaning condition on the first pattern 120 with different line widths and / or aspect ratios can be obtained by one test, and it is determined which first pattern 120 can ensure the integrity of the cleaning condition, which shortens the evaluation process of the whole mask cleaning test. In addition, the preferred cleaning condition combination of cleaning ability and pattern integrity can be quickly found, and the cleaning window can be evaluated in time, which is time-saving and efficient.

[0054] Optionally, after detecting the cleaning ability test piece to obtain the cleaning ability of the preset cleaning condition and the influence on the pattern on the cleaning ability test piece, the cleaning ability test method further comprises: S300: providing a new cleaning ability test piece with dirt, adjusting the preset cleaning condition according to the detection result, and cleaning the cleaning ability test piece using the adjusted preset cleaning condition.

[0055] According to the test result obtained in step S200, the preset cleaning condition in step S100 is adjusted in combination with experience or past detection data, etc. The adjustment content can be the type of cleaning process, cleaning equipment parameters, the type and concentration of cleaning liquid, etc., so as to obtain a new preset cleaning condition after adjustment. Then, the new cleaning ability test piece 10 with dirt is cleaned using the preset cleaning condition after adjustment.

[0056] S400: The cleaning ability test piece is detected to obtain the cleaning ability of the preset cleaning condition after adjustment and the influence on the pattern on the cleaning ability test piece.

[0057] The new cleaned cleaning ability test piece 10 is detected, and the detection content is the same as that in step S200. According to the evaluation result, the applicable pattern line width range and / or pattern aspect ratio range of the preset cleaning condition after adjustment can be determined.

[0058] S500: The above steps are repeated until the optimal preset cleaning condition is obtained.

[0059] The steps S300 and S400 are repeated, and a plurality of preferred cleaning condition combinations of cleaning ability and pattern integrity can be obtained, and the optimal preset cleaning condition is selected from them. All the detection results can also be recorded, and in the future, the optimal cleaning condition can be directly selected from the detection results when the photomask is cleaned.

[0060] The above only describes the preferred embodiments of the present application and is not used to limit the present application. For those skilled in the art, the present application can have various changes and modifications. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A cleaning ability test piece, characterized in that: include: The test piece body has a surface divided into a graphic area, wherein a plurality of first graphics are provided in the graphic area, wherein the graphic types of the plurality of first graphics are the same, and any two of the first graphics have different line widths and / or different aspect ratios.

2. The cleaning ability test piece according to claim 1, wherein: A plurality of second graphics are also provided in the graphic area, wherein the second graphics include a main graphic and an auxiliary graphic arranged outside the main graphic, and the graphic types of the main graphics of any two of the second graphics are different and / or the graphic types of the auxiliary graphics of any two of the second graphics are different.

3. The cleaning ability test piece according to claim 2, wherein: Any two main graphics of the same graphic type have different line widths and / or different aspect ratios.

4. The cleaning ability test piece according to claim 2, wherein: Any two auxiliary graphics of the same graphic type may have different line widths and / or different aspect ratios.

5. The cleaning ability test piece according to claim 1, wherein: There are multiple graphic areas, and the multiple graphic areas cover at least 70% of the surface of the test piece body.

6. The cleaning ability test piece according to claim 4, wherein: The test piece body and the graphic area are both rectangular, and a plurality of the graphic areas are distributed in a rectangular array on the surface of the test piece body.

7. The cleaning ability test piece according to claim 2, wherein: The graphic area is divided into a first graphic area and a second graphic area. The first graphic is located in the first graphic area, and the second graphic is located in the second graphic area.

8. The cleaning ability test piece according to claim 5, wherein: The plurality of graphic areas are completely identical.

9. A cleaning ability testing method, using the cleaning ability testing piece according to any one of claims 1 to 8, characterized in that: The cleaning ability testing method comprises: Providing the dirty cleaning ability test piece and cleaning the cleaning ability test piece using preset cleaning conditions; The cleaning ability test sheet is tested to obtain the cleaning ability of the preset cleaning conditions and the influence on the pattern on the cleaning ability test sheet.

10. The cleaning ability testing method according to claim 9, wherein: After testing the cleaning ability test sheet to obtain the cleaning ability of the preset cleaning conditions and the effect on the pattern on the cleaning ability test sheet, the cleaning ability test method further includes: Providing a new dirty cleaning ability test piece, adjusting the preset cleaning conditions according to the test results, and cleaning the cleaning ability test piece using the adjusted preset cleaning conditions; Testing the cleaning ability test sheet to obtain the cleaning ability of the adjusted preset cleaning conditions and the effect on the pattern on the cleaning ability test sheet; Repeat the above steps until the optimal preset cleaning conditions are obtained.

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