Vacuum coating equipment

Abstract

The invention discloses vacuum coating equipment which comprises a feeding chamber and a process chamber, a slit channel for a loading disc to pass through is arranged between the feeding chamber and the process chamber, and an anti-adhesion plate is arranged on the side wall of the slit channel and used for adsorbing dust. According to the invention, the slit channel is arranged between the feeding chamber and the process chamber, and the anti-adhesion plate is arranged on the side wall of the slit channel, so that a transition structure with isolation and purification functions is formed, and mutual pollution of the feeding chamber and the process chamber can be effectively prevented.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of vacuum coating, in particular to a vacuum coating equipment. BACKGROUND

[0002] The vacuum coating equipment is used for surface film deposition technology in vacuum environment, which can be classified into PVD (physical vapor deposition), CVD (chemical vapor deposition), RPD (reactive plasma deposition), ALD (atomic layer deposition) and evaporation technology, etc., and specifically refers to a thin film formed by depositing a specific material on a substrate such as a silicon wafer or glass, so as to make the substrate have special optical and electrical properties.

[0003] The current vacuum coating equipment usually sets an upper and lower material loading platform, a feeding chamber and a process chamber, and buffer chambers are arranged at the front and rear ends of the process chamber. During coating, the substrate to be coated is placed in a carrier disc, and then the carrier disc is sent into the feeding chamber through the upper and lower material loading platform, and then enters the buffer chamber in front of the process chamber, and then enters the process chamber for vacuum coating. After coating is completed, it enters the buffer chamber at the rear end of the process chamber, and the buffer chamber at the rear end is provided with a discharge port, so that the finished product after coating can be discharged. Due to the large number of chambers, the space occupied is large, resulting in a generally high equipment cost. If the number of chambers is reduced, for example, the buffer chamber between the feeding chamber and the process chamber is removed, the plasma in the process chamber is likely to enter the feeding chamber, or the dust in the feeding chamber enters the process chamber, thereby causing contamination of the chambers. SUMMARY

[0004] To solve at least one of the above technical problems, the present application provides a vacuum coating equipment to prevent mutual contamination of the feeding chamber and the process chamber.

[0005] The technical solution adopted by the present application is to design a vacuum coating equipment, which comprises a feeding chamber and a process chamber, a slit passage for passing a carrier disc is arranged between the feeding chamber and the process chamber, a dust-proof plate is arranged on the side wall of the slit passage, and the dust-proof plate is used for adsorbing dust.

[0006] In some embodiments, the feeding chamber is provided with a first door valve, the first door valve is located on the side of the slit passage away from the process chamber, and the first door valve is used for opening or closing the slit passage.

[0007] In some embodiments, the dust-proof plate is provided with an adjusting groove, the adjusting groove extends towards the slit passage, and a locking member passes through the adjusting groove to lock the dust-proof plate to the feeding chamber or the process chamber.

[0008] In some embodiments, the inside of the process chamber is provided with a coating device, a process door plate is hingedly mounted on the side of the process chamber away from the coating device, the anti-sticking plate provided with the adjusting groove and the process door plate are located on the same side of the slit passage.

[0009] In some embodiments, the vacuum coating device further comprises a buffer chamber, the buffer chamber is arranged on the side of the process chamber away from the feeding chamber, the feeding chamber, the process chamber and the buffer chamber are all vertical structures, the carrier disc passes through the feeding chamber, the process chamber and the buffer chamber in an upright posture, a discharging door plate is hingedly mounted on the buffer chamber, the discharging door plate and the process door plate are located on the same side of the transport track of the carrier disc.

[0010] In some embodiments, the top of each chamber is provided with a guiding device, the guiding device comprises a plurality of N-pole magnet assemblies and a plurality of S-pole magnet assemblies, the plurality of N-pole magnet assemblies and the plurality of S-pole magnet assemblies correspond to each other one by one, all the N-pole magnet assemblies are located on the same side of the transport track of the carrier disc, all the S-pole magnet assemblies are located on the other side of the transport track of the carrier disc, the top of the carrier disc is provided with a magnet, when the top of the carrier disc passes between the N-pole magnet assemblies and the S-pole magnet assemblies, the N-pole magnet assemblies and the S-pole magnet assemblies exert equal repulsive forces on the magnet on the carrier disc to keep the carrier disc in an upright state.

[0011] In some embodiments, the guiding device further comprises a mounting frame, the mounting frame is adjustably mounted on the top of each chamber in a vertical direction, the mounting frame is mounted with the N-pole magnet assemblies and the S-pole magnet assemblies.

[0012] In some embodiments, the guiding device further comprises a mounting frame, the mounting frame is fixedly mounted on the top of each chamber, the mounting frame comprises a top plate, an N-pole mounting plate and an S-pole mounting plate, the N-pole mounting plate is adjustably mounted on one side of the top plate in the thickness direction of the carrier disc, the N-pole mounting plate is mounted with the N-pole magnet assemblies, the S-pole mounting plate is adjustably mounted on the other side of the top plate in the thickness direction of the carrier disc, the S-pole mounting plate is mounted with the S-pole magnet assemblies.

[0013] In some embodiments, the plate feeding device further comprises an upper guide assembly and a lower guide assembly; one side of the feeding chamber is provided with a feeding port, the upper guide assembly is arranged above the feeding port, and the lower guide assembly is arranged below the feeding port; the upper guide assembly comprises an upper support, a first guide member and a second guide member, the first guide member and the second guide member are both rotatably installed on the upper support, and the first guide member and the second guide member are spaced apart to form a conveying channel extending in a first horizontal direction; the lower guide assembly comprises a lower support and a support member, and the support member is rotatably installed on the lower support; when the plate feeding device is in a working state, the upper guide assembly and the lower guide assembly are arranged in a vertical direction, and the support member is located directly below the conveying channel; the first guide member is provided in plurality, the plurality of first guide members are arranged in the first horizontal direction, the number of the first guide members is greater than the number of the second guide members, and at least one first guide member is located at the front end of the entrance of the conveying channel; the lower guide assembly further comprises a third guide member, the third guide member is rotatably installed on the lower support, and the third guide member and the first guide member are located on the same side of the conveying channel; the support member is provided in plurality, and in the first horizontal direction, at least one support member is located in front of all the third guide members.

[0014] In some embodiments, one end of the upper support is provided with a first hinge assembly and a first locking assembly, the first hinge assembly is hinged to the feeding chamber, and the first locking assembly is used for selectively locking the upper support to the feeding chamber; one end of the lower support is provided with a second hinge assembly and a second locking assembly, the second hinge assembly is hinged to the feeding chamber, and the second locking assembly is used for selectively locking the lower support to the feeding chamber.

[0015] Compared with the prior art, the present application has the following beneficial effects:

[0016] The present application sets a slit channel between the feeding chamber and the process chamber, and arranges an anti-sticking plate on the side wall of the slit channel, forming a transition structure with isolation and purification functions, which can effectively prevent mutual pollution of the feeding chamber and the process chamber. BRIEF DESCRIPTION OF DRAWINGS

[0017] The present application will be described in detail below with specific embodiments and drawings, in order to show details, facilitate understanding of principles, which are not necessarily drawn to scale, and similar reference numerals can describe similar components in different views. The drawings generally show the embodiments discussed herein in an exemplary and non-limiting manner. Among them:

[0018] Figure 1 is a schematic view of a vacuum coating device.

[0019] Figure 2 is Figure 1 an enlarged view of A in Fig.

[0020] Figure 3 is a front view of a vacuum coating apparatus.

[0021] Figure 4 is Figure 3 a cross-sectional view of B-B of Fig.

[0022] Figure 5 is Figure 4 an enlarged view of H in Fig.

[0023] Figure 6 is Figure 4 a cross-sectional view of C-C of Fig.

[0024] Figure 7 is a schematic view of a carrier plate.

[0025] Figure 8 is Figure 7 a cross-sectional view of D-D of Fig.

[0026] Figure 9 is a schematic view of a chamber top guide.

[0027] Figure 10 is Figure 9 a cross-sectional view of E-E of Fig.

[0028] Figure 11 is Figure 9 a top view of Fig.

[0029] Figure 12 is a perspective view of a feed chamber.

[0030] Figure 13 is Figure 12 an enlarged view of F in Fig.

[0031] Figure 14 is Figure 12 an enlarged view of G in Fig.

[0032] In the diagram, 1. Feeding chamber; 2. Process chamber; 3. Buffer chamber; 4. Slit channel; 5. Anti-stick plate; 6. Carrier tray; 7. First valve; 8. Second valve; 9. Adjustment groove; 10. Locking bolt; 11. Coating device; 12. Process door panel; 13. Discharge door panel; 61. Magnet; 14. N-pole magnet assembly; 15. S-pole magnet assembly; 16. Telescopic rod; 17. Top plate; 18. N-pole mounting plate; 19. S-pole mounting plate; 20. Upper bracket; 21. First guide component; 22. Second guide component; 23. Third guide component; 24. Support component; 25. Lower bracket; 26. First hinge assembly; 27. First locking assembly; 28. Second hinge assembly; 29. ​​Second locking assembly; 30. Positioning groove; 31. Positioning bolt; 32. Support guide wheel; 33. Cylindrical rod. Detailed Implementation

[0033] The following are specific embodiments of the present invention, and the technical solution of the present invention will be further described in conjunction with the accompanying drawings. However, the present invention is not limited to these embodiments, and the following embodiments do not limit the invention covered by the claims. Furthermore, not all combinations of the features described in the embodiments are necessary for the inventive solution.

[0034] The principles and structure of the present invention will be described in detail below with reference to the accompanying drawings and embodiments.

[0035] Example

[0036] like Figures 1-5 As shown, a vacuum coating equipment includes a feeding chamber 1 and a process chamber 2. A slit channel 4 for a carrier plate 6 to pass through is provided between the feeding chamber 1 and the process chamber 2. A dust-proof plate 5 is provided on the side wall of the slit channel 4 for adsorbing dust.

[0037] The slit passage 4 is arranged between the feeding chamber 1 and the process chamber 2, and the anti-plate 5 is arranged on the side wall of the slit passage 4, forming a transition structure with isolation and purification functions. Specifically, the slit passage 4 defines the channel width when the carrier plate 6 enters the process chamber 2, limits the exchange of airflow, reduces the connectivity between the feeding chamber 1 and the process chamber 2, and reduces the possibility of mutual diffusion of gas and particles between the two chambers. In this embodiment, the anti-plate 5 is installed on both sides of the slit passage 4, that is, the slit passage 4 is formed between the two opposite surfaces of the anti-plate 5. When the carrier plate 6 passes through the slit passage 4, if dust flows with the carrier plate 6, the dust is easily captured by the anti-plate 5 when passing through the slit passage 4, thereby effectively preventing the dust from entering the process chamber 2 with the carrier plate 6; on the contrary, when the process chamber 2 is in the vacuum plasma deposition working condition, the plasma particles are difficult to penetrate into the feeding chamber 1 under the limited channel and the shielding effect of the anti-plate 5, thereby effectively preventing the feeding chamber 1 from being contaminated by the plasma. Through the above structural design, not only the dependence on the buffer chamber of the traditional vacuum coating equipment is simplified, the number of chambers is significantly reduced, and the overall land occupation and manufacturing cost of the equipment are reduced, but also the cleanliness isolation effect between the chambers is maintained while the structure is simplified, ensuring the stability of the coating process and the yield of the coating product.

[0038] The vacuum coating equipment of the embodiment does not need to additionally arrange a buffer chamber between the feeding chamber 1 and the process chamber 2, thereby reducing the cost.

[0039] Further, the first door valve 7 is arranged on the side of the slit passage 4 away from the process chamber 2 of the feeding chamber 1, and the first door valve 7 can selectively open or close the slit passage 4 as needed. When the carrier plate 6 needs to enter the process chamber 2 from the feeding chamber 1, the first door valve 7 is in an open state, so that the carrier plate 6 smoothly passes through the slit passage 4; during the transmission of the carrier plate 6, the first door valve 7 can be kept closed, forming a double barrier structure between the feeding chamber 1 and the process chamber 2: on the one hand, the closed first door valve 7 blocks the dust and particles in the feeding chamber 1 from entering the slit passage 4, effectively reducing the potential pollution of the dust to the anti-plate 5 and the process chamber 2; on the other hand, the first door valve 7 can also prevent the plasma or deposition particles in the process chamber 2 from diffusing to the feeding chamber 1 along the slit passage 4, thereby further improving the isolation effect between the two chambers; the first door valve 7 is arranged on the side of the slit passage 4 away from the process chamber 2, and the ion group cannot directly adhere to the first door valve 7 when the process chamber 2 performs coating on the carrier plate 6, thereby prolonging the maintenance period of the first door valve 7. Through the arrangement of the first door valve 7, the vacuum environment and cleanliness of the process chamber 2 can still be reliably maintained even in the standby or maintenance state of the equipment. Therefore, this structure not only enhances the anti-pollution ability, but also improves the flexibility and safety of the equipment operation, helps to prolong the service life of the anti-plate 5 and the slit passage 4, and improves the stability and yield of the overall coating process.

[0040] Further, the anti-boarding plate 5 is provided with an adjusting groove 9 extending towards the slit passage 4, and the locking member can pass through the adjusting groove 9 to fix the anti-boarding plate 5 to the feeding chamber 1 or the process chamber 2. Through the design of the adjusting groove 9, the anti-boarding plate 5 can be adjusted in position along the adjusting groove 9 before locking, so as to flexibly change the spacing between the two oppositely arranged anti-boarding plates 5. When the thickness of the carrier plate 6 to be conveyed changes, the operator only needs to loosen the locking member, push the anti-boarding plate 5 to move within the range of the adjusting groove 9, and then quickly adjust the effective width of the slit passage 4, and then re-lock the anti-boarding plate 5 to ensure its stability. On the one hand, this structure can adapt to the passing of different thicknesses or different types of carrier plates 6, improving the application range and versatility of the equipment; on the other hand, after the spacing between the anti-boarding plates 5 is optimized, the size of the slit passage 4 can more accurately limit the flow path of the gas and the particulate matter, further improving the effect of preventing dust from entering the process chamber 2 and blocking the diffusion of plasma. At the same time, the combined design of the adjusting groove 9 and the locking member not only ensures the firmness and reliability of the anti-boarding plate 5 during work, but also simplifies the adjustment operation process, which is conducive to maintenance and replacement. The locking member can be simply locked by a locking bolt 10 or the like.

[0041] Further, the process chamber 2 is provided with a coating device 11, a process door plate 12 is hingedly installed on the side of the process chamber 2 away from the coating device 11, and the anti-boarding plate 5 provided with the adjusting groove 9 is located on the same side of the slit passage 4 as the process door plate 12. The process door plate 12 is installed by hinging, which is convenient to open during equipment maintenance or anti-boarding plate 5 adjustment. The operator can directly adjust or disassemble the anti-boarding plate 5 from the same side of the slit passage 4, which is more convenient and efficient, and improves the operability of equipment maintenance. In addition, the design of the anti-boarding plate 5 and the process door plate 12 on the same side can adjust the anti-boarding plate 5 by disassembling the process door plate 12, avoiding the assembly complexity caused by the dispersion of the structure, making the overall layout more compact and reasonable, reducing the occupied space of the equipment, and improving the sealing reliability and working efficiency. Therefore, this structure not only ensures the stable and clean environment of the coating process in the process chamber 2, but also improves the maintenance convenience of the equipment and the stability of the overall operation.

[0042] Further, the buffer chamber 3 is arranged on the side of the process chamber 2 away from the feeding chamber 1, and the feeding chamber 1, the process chamber 2 and the buffer chamber 3 are all vertical structures, and the carrier disc 6 sequentially passes through each chamber to complete transportation in an upright posture. The vertical structure reduces the overall floor space and the equipment height. A discharging door plate 13 is hingedly arranged on the side of the buffer chamber 3, and the discharging door plate 13 and the process door plate 12 are located on the same side of the transportation track of the carrier disc 6. Through the above arrangement, the carrier disc 6 can directly enter the buffer chamber 3 after coating, and the finished product can be smoothly discharged by opening the discharging door plate 13 in the buffer chamber 3, avoiding cross contamination caused by the finished product directly passing through the feeding chamber 1. Since each chamber adopts a vertical structure, the carrier disc 6 maintains an upright posture during transportation, which not only saves the horizontal space occupied by the equipment and forms a compact chamber arrangement, but also helps to avoid the deposition of particulate matter on the substrate surface and improve the coating quality. At the same time, the discharging door plate 13 and the process door plate 12 are located on the same side of the transportation track of the carrier disc 6, so that the operation and maintenance ports of the equipment are concentrated on one side, facilitating the loading, unloading and chamber maintenance operation of the carrier disc 6, and reducing the complexity of manual operation and the floor space requirement.

[0043] The coating process can be implemented during the transition of the carrier disc 6 from the feeding chamber 1 to the process chamber 2, or during the transition from the buffer chamber 3 to the process chamber 2, or during the transition of the carrier disc 6 in the above three chambers, which is suitable for multi-layer coating.

[0044] Further, as shown in Figures 6-11 each chamber is provided with a guide device on the top, the guide device includes a plurality of N-pole magnet assemblies 14 and a plurality of S-pole magnet assemblies 15, and the plurality of N-pole magnet assemblies 14 and the plurality of S-pole magnet assemblies 15 are arranged one by one in correspondence, all the N-pole magnet assemblies 14 are located on the same side of the transportation track of the carrier disc 6, and all the S-pole magnet assemblies 15 are located on the other side of the transportation track. The carrier disc 6 is provided with a magnet 61 on the top, when the carrier disc 6 sequentially passes through each chamber along the transportation track, the top magnet 61 is located between the corresponding N-pole magnet assembly 14 and S-pole magnet assembly 15, and is subjected to equal repulsive force from the magnet assemblies on both sides. The carrier disc 6 sequentially passes through each chamber along the transportation track means that the carrier disc 6 sequentially passes through the feeding chamber 1, the process chamber 2 and the buffer chamber 3 along the transportation track. Since the N-pole and S-pole magnet assemblies 15 are symmetrically arranged and respectively act on the top magnet 61 of the carrier disc 6, the repulsive force directions are opposite and the sizes are equal, thereby forming a stable magnetic force balance during transportation, so that the carrier disc 6 can reliably maintain an upright posture without tilting or shaking. Through the magnetic suspension guide mode, the top of the carrier disc 6 can smoothly run in the transmission channel without relying on additional mechanical support, reducing mechanical friction and wear, and prolonging the service life of the transmission mechanism.

[0045] In some embodiments, the guide device further comprises a mounting frame, the mounting frame is mounted on the top of each chamber in the vertical direction, and the N-pole magnet assembly 14 and the S-pole magnet assembly 15 are fixedly installed on the mounting frame. When another weight specification of the carrier plate 6 is replaced, for example, a carrier plate 6 with lighter weight, if the repulsive force of the N-pole magnet assembly 14 and the S-pole magnet assembly 15 on the magnet 61 on the top of the carrier plate 6 cannot be reduced at this time, the carrier plate 6 may not be able to pass between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. To solve this problem, by setting the mounting frame, the position of the magnet assembly can be adjusted in the vertical direction according to the actual needs, and the mounting frame can be connected to the top of the chamber through the telescopic rod 16 with adjustable length, which can be a screw telescopic rod, etc., so as to flexibly adapt to different weights or different heights of the carrier plate 6, for example, when the carrier plate 6 with lighter weight passes between the N-pole magnet assembly 14 and the S-pole magnet assembly 15, because the mounting frame lifts the N-pole magnet assembly 14 and the S-pole magnet assembly 15, the repulsive force of the N-pole magnet assembly 14 and the S-pole magnet assembly 15 on the magnet 61 decreases, and the top of the carrier plate 6 can smoothly pass between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. When the height of the magnet 61 on the top of the carrier plate 6 changes, the operator can adjust the position of the mounting frame to make the magnet assembly always maintain the best corresponding relationship with the magnet 61 on the top of the carrier plate 6, so as to ensure that the repulsive forces of the magnet assemblies on both sides on the carrier plate 6 are consistent and symmetrical when the carrier plate 6 passes, and then the upright state of the carrier plate 6 is stably maintained. This structure not only improves the universality and adaptability of the guide device, but also facilitates quick adjustment during equipment maintenance or replacement of the carrier plate 6 specification, reducing downtime. At the same time, the mounting frame provides reliable fixed support to ensure that the magnet assembly does not deviate in position during long-term work, thereby maintaining the stability and consistency of the transmission process.

[0046] In other embodiments, the guiding device includes a mounting frame fixedly installed on the top of each chamber and a support guide wheel 32 located at the bottom of each chamber for supporting the bottom side of the guide. The mounting frame consists of a top plate 17, an N-pole mounting plate 18 and an S-pole mounting plate 19. The N-pole mounting plate 18 can be adjusted and installed on one side of the top plate 17 along the thickness direction of the carrier plate 6 and is equipped with an N-pole magnet assembly 14. The S-pole mounting plate 19 can be adjusted and installed on the other side of the top plate 17 along the thickness direction of the carrier plate 6 and is equipped with the S-pole magnet assembly 15. Through this structure, the N-pole magnet assembly 14 and the S-pole magnet assembly 15 are arranged opposite each other on both sides of the top plate 17. The spacing between the magnets on both sides can be variably controlled by adjusting their respective mounting plates. When a lighter carrier plate 6 is used, the spacing between the N-pole magnet assembly 14 and the S-pole magnet assembly 15 is increased, reducing the repulsive force on the top magnet 61 of the carrier plate 6 and preventing the top of the carrier plate 6 from being unable to pass between the N-pole magnet assembly 14 and the S-pole magnet assembly 15. When carrier plates 6 of different thicknesses or weights need to pass, the operator can adjust the positions of the N-pole mounting plate 18 and the S-pole mounting plate 19 according to the position of the top magnet 61 of the carrier plate 6, ensuring that the two sets of magnet assemblies are always symmetrically distributed and apply a balanced repulsive force to the top magnet 61 when the carrier plate 6 passes, thereby stabilizing the upright posture of the carrier plate 6. This design not only improves the adaptability of the guide device to carrier plates 6 of different specifications but also ensures the precise balance of the magnetic levitation guiding force, preventing the carrier plate 6 from tilting or wobbling due to uneven force. Meanwhile, the adjustable structure of the N and S pole mounting plates 19 facilitates later maintenance and calibration, improving the stability and reliability of equipment operation. Thus, while maintaining a compact structure, it achieves the dual advantages of flexible adjustment and stable guidance.

[0047] Specifically, a positioning groove 30 along the thickness direction of the carrier plate 6 can be provided on the top plate 17. The N pole mounting plate 18 and the S pole mounting plate 19 can be connected to the positioning groove 30 by positioning bolts 31. The distance between the N pole and the S pole mounting plate 19 can be controlled by adjusting the position of the positioning groove 30 along the thickness direction of the carrier plate 6.

[0048] Furthermore, such as Figure 12 , 13 As shown in Figure 14, the vacuum coating equipment of this embodiment also includes a plate feeding device for smoothly and accurately feeding the carrier tray 6 into the feeding chamber 1. The plate feeding device includes an upper guide assembly and a lower guide assembly. A feed inlet is provided on one side of the feeding chamber 1. The upper guide assembly is located above the feed inlet, and the lower guide assembly is located below the feed inlet. When the plate feeding device is in operation, the upper guide assembly and the lower guide assembly are arranged opposite each other in the vertical direction to form a symmetrical guiding and supporting environment. The support member 24 is located directly below the conveying channel and is used to support the carrier tray 6 and guide it to smoothly enter the feeding chamber 1 in the vertical direction.

[0049] Specifically, the upper guide assembly includes an upper bracket 20, a first guide 21 and a second guide 22, the first guide 21 and the second guide 22 are both rotatably installed on the upper bracket 20, and the two are spaced apart to form a conveying channel extending in the first horizontal direction. A plurality of first guides 21 are arranged in the horizontal direction, and the number of first guides 21 is more than that of second guides 22. At least one first guide 21 is located at the front end of the entrance of the conveying channel, and the carrier plate 6 first contacts at least one first guide 21, so that the carrier plate 6 can be quickly aligned in the horizontal direction to the conveying channel, that is, the guiding effect. It is used for pre-guiding and posture adjustment of the carrier plate 6 in the initial stage of the carrier plate 6 entering the channel, so that the carrier plate 6 can smoothly enter the conveying channel, and the carrier plate 6 is prevented from being skewed or colliding with the channel wall when it initially enters. After the plate entering device is arranged, the configuration of the rack tread is reduced, the floor area is reduced, and the cost is reduced.

[0050] The lower guide assembly includes a lower bracket 25, a support 24 and a third guide 23. The support 24 is rotatably installed on the lower bracket 25 and is located directly below the conveying channel, used to support the carrier plate 6 and form a stable vertical supporting force, so that the carrier plate 6 maintains an upright posture in the vertical direction. The third guide 23 is rotatably installed on the lower bracket 25 and is located on the same side of the conveying channel as the first guide 21. When the carrier plate 6 is placed on the support 24, the first guide 21 and the third guide 23 contact the carrier plate 6 from the same side, which is used to guide the carrier plate 6 to move along the conveying channel in cooperation with the first guide 21, so as to ensure that the carrier plate 6 also maintains a stable position in the horizontal direction, preventing deviation or shaking. The support 24 is arranged in multiple, in the horizontal direction, at least one support 24 is located in front of all third guides 23, so that the support 24 first contacts the bottom plate of the carrier plate 6 to ensure that the carrier plate 6 can immediately be supported from below when it enters the initial section of the conveying channel, thereby avoiding the carrier plate 6 from tilting or overturning due to unstable center of gravity.

[0051] Through the synergistic effect of the above-mentioned upper guide assembly and lower guide assembly, the plate entering device can realize multi-point and omnidirectional guiding and supporting of the carrier plate 6 in the horizontal and vertical directions, so that the carrier plate 6 smoothly passes through the feeding port into the feeding chamber 1 in an upright and stable posture, thereby ensuring the smooth transmission of the subsequent slit channel 4, process chamber 2 and buffer chamber 3. The first guide 21, the second guide 22 and the third guide 23 form multi-point guiding, which can effectively constrain the motion trajectory of the carrier plate 6 in the initial stage of entering the channel and the entire transmission process, avoiding deviation and collision, and improving the plate entering precision. The support 24 provides vertical supporting force to make the carrier plate 6 maintain an upright posture, and cooperates with the guide to form upward and downward and left and right multi-directional constraints, reduces shaking, ensures the cleanliness of the substrate surface, and prevents dust or particulate matter from falling off.

[0052] The first guide 21, the second guide 22, the third guide 23 and the support 24 can be one of a guide wheel, a bearing and a universal ball. In the embodiment, the first guide 21 and the third guide 23 are six guide wheels arranged side by side along the conveying direction, the second guide 22 is a guide wheel slightly larger than the first guide 21, and the support 24 is three guide wheels concave in the middle and arranged side by side along the conveying direction. The concave part in the middle is used for guiding the bottom edge of the carrier disc 6. The bottom edge of the carrier disc 6 can be arranged in a circular arc shape matching the concave position, or a cylindrical rod 33 can be arranged on the bottom edge of the carrier disc 6 to cooperate with the concave position.

[0053] Further, one end of the upper support 20 is provided with a first hinge assembly 26 and a first locking assembly 27. The first hinge assembly 26 is hinged to the feeding chamber 1, and the first locking assembly 27 is used to selectively lock the upper support 20 to the feeding chamber 1. One end of the lower support 25 is provided with a second hinge assembly 28 and a second locking assembly 29. The second hinge assembly 28 is hinged to the feeding chamber 1, and the second locking assembly 29 is used to selectively lock the lower support 25 to the feeding chamber 1. The locking assembly can be a locking bolt 10 or the like fastener, so that the support can be temporarily fixed relative to the feeding chamber 1.

[0054] When the carrier disc needs to be conveyed, the upper guide assembly and the lower guide assembly are rotated to correspond to the internal guide device in front of the feeding port. The upper support 20 and the lower support 25 can be fixed to the feeding chamber 1 through the respective locking assemblies, so as to ensure the stability of the upper guide assembly and the lower guide assembly in the vertical and horizontal directions, thereby ensuring that the carrier disc 6 maintains a straight and stable movement track during the plate entering process, preventing tilting or shaking, and improving the guiding accuracy and process reliability.

[0055] When the carrier disc does not need to be conveyed, the locking assemblies are loosened, the upper support 20 is rotated upward around the hinge shaft, the lower support 25 is rotated to one side around the hinge shaft, and the upper guide assembly and the lower guide assembly are separated from the feeding port, so as to avoid affecting the opening and closing of the second gate valve 8.

[0056] The gate valve plate of the second gate valve 8 can be locked on the rack through a manual knob. The feeding chamber 1 has a door suction effect in a vacuum state. When the gate valve is opened, the carrier disc 6 passes through the feeding chamber 1, the process chamber 2 and the buffer chamber 3 from right to left in sequence. The discharge door of the buffer chamber 3 can be opened to take out the carrier disc 6, or the carrier disc 6 can return to the original position and pass through the discharge door of the feeding chamber 1.

[0057] The specific embodiments described herein are presented for purposes of illustration only and not limitation. Various modifications or changes in addition or substitution to the specific embodiments described herein can occur to those skilled in the art from the teachings of the description and accompanying drawings, and it is intended that the following claims encompass all such modifications or changes.

Claims

1. A vacuum coating apparatus, characterized by, The vacuum coating device comprises a feeding chamber and a process chamber, a slit passage is arranged between the feeding chamber and the process chamber for passing a carrier plate, and a dustproof plate is arranged on the side wall of the slit passage for adsorbing dust.

2. The vacuum coating apparatus according to claim 1, wherein The feeding chamber is provided with a first door valve which is located on the side of the slit passage away from the process chamber and is used for opening or closing the slit passage.

3. The vacuum coating apparatus according to claim 1, wherein The dustproof plate is provided with an adjusting groove which extends towards the slit passage, and a locking member passes through the adjusting groove to lock the dustproof plate to the feeding chamber or the process chamber.

4. The vacuum coating apparatus according to claim 3, wherein The process chamber is internally provided with a coating device, a process door plate is hingedly installed on the side of the process chamber away from the coating device, and the dustproof plate provided with the adjusting groove and the process door plate are located on the same side of the slit passage.

5. The vacuum coating apparatus according to claim 4, wherein The vacuum coating device further comprises a buffer chamber which is arranged on the side of the process chamber away from the feeding chamber, and the feeding chamber, the process chamber and the buffer chamber are all vertical structures, the carrier plate passes through the feeding chamber, the process chamber and the buffer chamber in an upright posture, and the buffer chamber is hingedly installed with a discharging door plate, and the discharging door plate and the process door plate are located on the same side of the transport track of the carrier plate.

6. The vacuum coating apparatus according to claim 5, wherein The top of each chamber is provided with a guiding device which comprises a plurality of N-pole magnet assemblies and a plurality of S-pole magnet assemblies, the plurality of N-pole magnet assemblies and the plurality of S-pole magnet assemblies correspond to each other, all the N-pole magnet assemblies are located on the same side of the transport track of the carrier plate, all the S-pole magnet assemblies are located on the other side of the transport track of the carrier plate, the top of the carrier plate is provided with a magnet, and when the top of the carrier plate passes between the N-pole magnet assemblies and the S-pole magnet assemblies, the N-pole magnet assemblies and the S-pole magnet assemblies exert equal repulsive forces on the magnet on the carrier plate to keep the carrier plate in an upright state.

7. The vacuum coating apparatus according to claim 6, wherein The guiding device further comprises a mounting frame, and the mounting frame is adjustably mounted on the top of each chamber in a vertical direction and is mounted with the N-pole magnet assemblies and the S-pole magnet assemblies.

8. The vacuum coating apparatus according to claim 6, wherein The guiding device further comprises a mounting frame, and the mounting frame is fixedly mounted on the top of each chamber, the mounting frame comprises a top plate, an N-pole mounting plate and an S-pole mounting plate, the N-pole mounting plate is adjustably mounted on one side of the top plate in the thickness direction of the carrier plate, the N-pole mounting plate is mounted with the N-pole magnet assemblies, the S-pole mounting plate is adjustably mounted on the other side of the top plate in the thickness direction of the carrier plate, and the S-pole mounting plate is mounted with the S-pole magnet assemblies.

9. The vacuum coating apparatus according to claim 6, wherein The plate feeding device comprises an upper guide assembly and a lower guide assembly; one side of the feeding chamber is provided with a feeding port, the upper guide assembly is arranged above the feeding port, and the lower guide assembly is arranged below the feeding port; the upper guide assembly comprises an upper support, a first guide piece and a second guide piece, the first guide piece and the second guide piece are both rotationally installed on the upper support, and the first guide piece and the second guide piece are spaced apart to form a conveying channel extending in a first horizontal direction; the lower guide assembly comprises a lower support and a support piece, and the support piece is rotationally installed on the lower support; when the plate feeding device is in a working state, the upper guide assembly and the lower guide assembly are arranged in a vertical direction, and the support piece is located directly below the conveying channel; the first guide piece is provided in a plurality of forms, the plurality of first guide pieces are arranged in the first horizontal direction, the number of the first guide pieces is greater than the number of the second guide pieces, and at least one first guide piece is located in front of the entrance of the conveying channel; the lower guide assembly further comprises a third guide piece, the third guide piece is rotationally installed on the lower support, and the third guide piece and the first guide piece are located on the same side of the conveying channel; the support piece is provided in a plurality of forms, and in the first horizontal direction, at least one support piece is located in front of all the third guide pieces.

10. The vacuum coating apparatus according to claim 9, wherein One end of the upper support is provided with a first hinge assembly and a first locking assembly, the first hinge assembly is hinged to the feeding chamber, and the first locking assembly is used for selectively locking the upper support to the feeding chamber; one end of the lower support is provided with a second hinge assembly and a second locking assembly, the second hinge assembly is hinged to the feeding chamber, and the second locking assembly is used for selectively locking the lower support to the feeding chamber.

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