Method for obliquely cleaning semiconductor chip
The semiconductor chip tilting cleaning method uses tilting fixtures and fluid nozzles to clean the gap between the chip and the substrate, solving the problems of uneven cleaning and high material consumption in traditional cleaning technologies. It achieves efficient and uniform cleaning results and is suitable for various chip types.
Patent Information
- Application Number
- CN202410548805.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-06
- Publication Date
- 2025-11-07
AI Technical Summary
Existing cleaning technologies are ineffective at removing minute contaminants from the surface of semiconductor chips and between the substrate. Furthermore, traditional methods are harmful to the environment or damage the chips, have uneven cleaning results, and are costly in terms of consumables.
A semiconductor chip tilting cleaning method is adopted, which uses a tilting fixture and a fluid nozzle to clean the gap between the chip and the substrate. By adjusting the tilting angle of the fixture and the movement of the nozzle, it is ensured that the cleaning fluid covers all cleaning areas. A detachable nozzle and appropriate pressure control are used.
It improves cleaning efficiency and effectiveness, reduces consumable usage, lowers costs, enhances cleaning uniformity and depth, is suitable for chips of different sizes and types, and reduces the risk of contaminant residue.