Dual-path interferometer switching method, switching device and computer storage medium

Abstract

The application provides a dual-path interferometer switching method, a switching device and a computer storage medium. The dual-path interferometer switching method is applied to a computer device in a workpiece measurement system. First, the center position of the workpiece table is obtained according to a preset time interval. Then, the switching adjustment parameter of the first interferometer and the second interferometer is determined based on the center position of the workpiece table, wherein the switching adjustment parameter includes the weight or the bias value of the first interferometer and the second interferometer. Next, the measurement values of the first interferometer and the second interferometer at the current time are obtained. Finally, the actual measurement value is output based on the measurement values of the first interferometer and the second interferometer and the switching adjustment parameter. In this way, the above method can adjust the switching adjustment parameter of the dual-path interferometer according to the center position of the workpiece table, realize the automatic switching of the dual-path interferometer, and output continuous interferometer actual measurement values.

Description

Technical Field

[0001] This application relates to the field of digital signal processing, and more specifically, to a dual-channel interferometer switching method, a switching device, and a computer storage medium. Background Technology

[0002] When using a dual-channel interferometer to perform high-precision measurements on a workpiece stage, a reflector is needed to convert the horizontal light generated by the interferometer into vertical light, thereby enabling Z-axis measurement. However, since the interferometer is fixed in position, the actual measurement values ​​may become inaccurate when the workpiece stage moves. Summary of the Invention

[0003] In view of this, the purpose of this application is to provide a dual-channel interferometer switching method, switching device and computer storage medium, which can automatically switch the dual-channel interferometer according to the center position of the workpiece stage so as to output continuous actual interferometer measurement values.

[0004] According to a first aspect of this application, a dual-channel interferometer switching method is provided, applied to a computer device in a workpiece measurement system. The workpiece measurement system further includes a workpiece stage, an interferometer, and a first reflector. A second reflector is included on one side of the workpiece stage. The first reflector is located above the workpiece stage. The interferometer includes a first interferometer and a second interferometer arranged along a first direction on the side of the workpiece stage where the second reflector is located. Light generated by the first and second interferometers is transmitted along a second direction and reflected by the second reflector before being transmitted along a third direction to the first reflector. The interferometer is connected to the computer device, and the first direction, the second direction, and the third direction are perpendicular to each other. The method includes:

[0005] The center position of the workpiece stage is obtained at preset time intervals;

[0006] The switching adjustment parameters of the first interferometer and the second interferometer are determined based on the center position of the workpiece stage, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer and the second interferometer;

[0007] Obtain the measurement values ​​of the first interferometer and the second interferometer at the current moment;

[0008] The actual measured value is output based on the measured values ​​of the first interferometer and the second interferometer and the switching adjustment parameters.

[0009] In one possible implementation of the first aspect, the interferometer further includes a third interferometer for measuring the distance of the workpiece stage in a first direction, and the step of acquiring the center position of the workpiece stage at preset time intervals includes:

[0010] The measurement values ​​of the third interferometer are acquired at preset time intervals;

[0011] The center position of the workpiece stage is determined based on the measurements taken by the third interferometer.

[0012] In one possible implementation of the first aspect, prior to the step of acquiring the center position of the workpiece stage at preset time intervals, the method includes:

[0013] Obtain the preset positional relationship between the first interferometer and the second interferometer;

[0014] Taking the centers of the first interferometer and the second interferometer as initial points, a first critical value and a second critical value symmetrical with respect to the initial point are determined on both sides of the initial point. A buffer zone located on both sides of the initial point is determined between the first critical value and the second critical value. A first alignment zone and a second alignment zone are located on both sides of the buffer zone. A first reset zone is located on the side of the first alignment zone away from the buffer zone. A second reset zone is located on the side of the second alignment zone away from the buffer zone. The interval lengths of the first alignment zone and the second alignment zone are the same. The interval lengths of the first reset zone and the second reset zone are the same.

[0015] In one possible implementation of the first aspect, the step of determining the switching adjustment parameters of the first interferometer and the second interferometer based on the center position of the workpiece stage includes:

[0016] If the center position of the workpiece stage is less than the first critical value, then the weight of the first interferometer is assigned to 1, and the weight of the second interferometer is assigned to 0.

[0017] If the center position of the workpiece stage is located within the first reset area, then the weight of the first interferometer is assigned a value of 1, the weight of the second interferometer is assigned a value of 0, and the second interferometer is reset.

[0018] If the center position of the workpiece stage is located within the first alignment area, then the weight of the first interferometer is assigned a value of 1, and the weight of the second interferometer is assigned a value of 0.

[0019] If the center position of the workpiece stage is located within the buffer zone, the weights of the first interferometer and the second interferometer are adjusted based on the center position of the workpiece stage.

[0020] If the center position of the workpiece stage is located within the second alignment area, then the weight of the second interferometer is assigned a value of 1, and the weight of the first interferometer is assigned a value of 0.

[0021] If the center position of the workpiece stage is located within the second reset area, then the weight of the second interferometer is assigned to 1, the weight of the first interferometer is assigned to 0, and the first interferometer is reset.

[0022] If the center position of the workpiece stage is greater than the second critical value, then the weight of the second interferometer is assigned a value of 1, and the weight of the first interferometer is assigned a value of 0.

[0023] In one possible implementation of the first aspect, the step of determining if the center position of the workpiece stage is located within the buffer zone includes:

[0024] If the center position of the workpiece stage is located within the buffer zone, then the weighting expression of the second interferometer is:

[0025]

[0026] The weighting expression for the first interferometer is:

[0027]

[0028] At the current moment, The weights of the second interferometer, The distance between the center position of the workpiece stage and the initial point on the coordinate axis. The distance between the boundary point of the buffer and the initial point. denoted as the weight of the first interferometer.

[0029] In one possible implementation of the first aspect, after the step of assigning a weight of 1 to the first interferometer and a weight of 0 to the second interferometer if the center position of the workpiece stage is located within the first alignment area, the method includes:

[0030] The bias value of the second interferometer is adjusted to be the difference between the measured value of the second interferometer and the measured value of the first interferometer at the current moment, so as to align the measured value of the second interferometer with that of the first interferometer.

[0031] After the step of assigning a weight of 1 to the second interferometer and a weight of 0 to the first interferometer if the center position of the workpiece stage is located within the second alignment area, the following steps are included:

[0032] The bias value of the first interferometer is adjusted to be the difference between the measured value of the first interferometer and the measured value of the second interferometer at the current moment, so as to align the measured value of the first interferometer with that of the second interferometer.

[0033] In one possible implementation of the first aspect, the width of the interval between the first reset region and the second reset region is the product of the reset effective time of the first interferometer and the second interferometer and the maximum speed of the workpiece stage movement;

[0034] The formula for the distance between the initial point and the first or second critical value on the coordinate axis is:

[0035]

[0036] in, L1 is the distance between the initial point and the first or second critical value on the coordinate axis, L2 is the length of the second reflector of the workpiece stage along the first direction, and L3 is the distance between the light generated by the first interferometer and the second interferometer.

[0037] In one possible implementation of the first aspect, in the step of outputting the actual measured value based on the measured values ​​of the first interferometer and the second interferometer and the switching adjustment parameter, the method includes:

[0038] The expression for the actual measured value is:

[0039]

[0040] At the current moment, These are actual measured values. The weights of the first interferometer are... The measured value is from the first interferometer. This is the bias value of the first interferometer. The weights of the second interferometer, The measured value is from the second interferometer. This is the bias value of the second interferometer.

[0041] According to a second aspect of this application, a dual-channel interferometer switching device is provided, applied to a computer device in a workpiece measurement system. The workpiece measurement system further includes a workpiece stage, an interferometer, and a first reflecting mirror. A second reflecting mirror is included on one side of the workpiece stage. The first reflecting mirror is located above the workpiece stage. The interferometer includes a first interferometer and a second interferometer arranged along a first direction on the side of the workpiece stage where the second reflecting mirror is located. Light generated by the first interferometer and the second interferometer is transmitted along a second direction and reflected by the second reflecting mirror before being transmitted along a third direction to the first reflecting mirror. The interferometer is connected to the computer device, and the first direction, the second direction, and the third direction are perpendicular to each other. The dual-channel interferometer switching device includes:

[0042] The first acquisition module is used to acquire the center position of the workpiece stage at preset time intervals;

[0043] The determining module is used to determine the switching adjustment parameters of the first interferometer and the second interferometer based on the center position of the workpiece stage, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer and the second interferometer;

[0044] The second acquisition module is used to acquire the measurement values ​​of the first interferometer and the second interferometer at the current moment;

[0045] The output module is used to output the actual measurement value based on the measurement values ​​of the first interferometer and the second interferometer and the switching adjustment parameters.

[0046] According to a third aspect of this application, a computer storage medium is provided, the computer storage medium storing an executable program, which, when executed by a computer device, implements the aforementioned dual-channel interferometer switching method.

[0047] Based on any of the above aspects, embodiments of this application provide a dual-channel interferometer switching method, switching device, and computer storage medium. The dual-channel interferometer switching method is applied to a computer device in a workpiece measurement system. First, the center position of the workpiece stage is acquired at preset time intervals. Then, based on the center position of the workpiece stage, switching adjustment parameters for the first and second interferometers are determined, wherein the switching adjustment parameters include the weights or bias values ​​of the first and second interferometers. Next, the measured values ​​of the first and second interferometers at the current moment are acquired. Finally, based on the measured values ​​of the first and second interferometers and the switching adjustment parameters, the actual measured values ​​are output. Thus, the above method can adjust the switching adjustment parameters of the dual-channel interferometers according to the center position of the workpiece stage, realizing automatic switching of the dual-channel interferometers and outputting continuous actual interferometer measured values. Attached Figure Description

[0048] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings required in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0049] Figure 1 This is one of the application scenarios of the workpiece measurement system provided in this embodiment;

[0050] Figure 2This is a flowchart illustrating the steps of a dual-channel interferometer switching method provided in this embodiment;

[0051] Figure 3 This is the second schematic diagram of the application scenario of the workpiece measurement system provided in this embodiment;

[0052] Figure 4 for Figure 3 A magnified view of a portion of the image;

[0053] Figure 5 for Figure 2 A flowchart illustrating the sub-steps of step S120;

[0054] Figure 6 This is a schematic diagram of the functional modules of the dual-channel interferometer switching device provided in this embodiment.

[0055] Icons: 1-Workpiece measurement system, 10-Workpiece stage, 11-Second reflector, 20-Interferometer, 21-First interferometer, 22-Second interferometer, 23-Third interferometer, 30-First reflector, 40-Machining tool, 200-First acquisition module, 210-Determination module, 220-Second acquisition module, 230-Output module. Detailed Implementation

[0056] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0057] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0058] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0059] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product is in use. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0060] It should be noted that, where there is no conflict, different features in the embodiments of this application can be combined with each other.

[0061] In order to solve the technical problems mentioned in the background section, the inventors have innovatively designed the following technical solutions, and the specific implementation scheme of this application will be described in detail below with reference to the accompanying drawings.

[0062] Please see Figure 1 , Figure 1 This is one of the interactive scenario diagrams of the workpiece measurement system 1 provided in this embodiment. The workpiece measurement system 1 of this embodiment may include a computer device (not shown in the figure), a workpiece stage 10, an interferometer 20, and a first reflecting mirror 30. A second reflecting mirror 11 is included on one side of the workpiece stage 10, and the first reflecting mirror 30 is located above the workpiece stage 10. The interferometer 20 includes a first interferometer 21 and a second interferometer 22 located on the side of the workpiece stage 10 where the second reflecting mirror 11 is located and arranged along a first direction A1. The light generated by the first interferometer 21 and the second interferometer 22 is transmitted along a second direction A2 and reflected by the second reflecting mirror 11 before being transmitted along a third direction A3 to the first reflecting mirror 30. The interferometer 20 is connected to the computer device, and the first direction A1, the second direction A2, and the third direction A3 are perpendicular to each other. In practical applications, when the workpiece stage 10 needs to perform measurements in the third direction A3, the interferometer 20 needs to be used in conjunction with the reflecting mirror. Since the surface of the workpiece stage 10 generally needs to support the workpiece, it cannot be mirrored, and a space needs to be reserved above the workpiece stage 10 for the machining tool 40. Therefore, in this embodiment, after the side of the workpiece stage 10 is cut at a 45-degree angle, a second reflector 11 is set. At the same time, a first reflector 30 is set on both sides of the processing tool 40. The first reflector 30 should be set in correspondence with the first interferometer 21 and the second interferometer 22. In this way, the light generated by the first interferometer 21 and the second interferometer 22 along the second direction A2 can be converted into light along the third direction A3, so as to realize the measurement of the third direction A3 of the workpiece stage 10.

[0063] In this embodiment, the dual-channel interferometer 20 (i.e., the first interferometer 21 and the second interferometer 22) can be connected to a computer device via wireless communication (such as Bluetooth, WIFI, etc.). When the computer device receives the center position of the workpiece stage 10 measured by the interferometer 20, it determines the switching adjustment parameters of the dual-channel interferometer 20 based on its center position, acquires the measurement value of the dual-channel interferometer 20 at the current moment, and outputs the actual measurement value of the interferometer 20 according to the previously determined switching adjustment parameters. In this way, automatic switching of the dual-channel interferometer 20 can be achieved, outputting continuous actual measurement values ​​of the interferometer 20. Furthermore, using dual-channel interferometers 20 ensures that the light generated by at least one interferometer 20 can be reflected throughout the entire movement stroke of the workpiece stage 10, guaranteeing the stability and reliability of the measurement.

[0064] Understandable. Figure 1 The workpiece measurement system 1 shown is only one feasible example. In other feasible embodiments, the workpiece measurement system 1 may also include only Figure 1 One or more of the components shown.

[0065] The following is combined with Figure 1 The application scenarios shown illustrate the dual-channel interferometer 20 switching method provided in this application embodiment. Please refer to... Figure 2 , Figure 2 This is a flowchart illustrating the steps of a dual-channel interferometer switching method provided in this embodiment. The method is applied to... Figure 1 The computer device in the workpiece measurement system 1 shown is the computer device that performs the method.

[0066] The detailed steps of the dual-channel interferometer switching method performed by computer equipment are described below:

[0067] Step S110: Obtain the center position of the workpiece stage 10 according to a preset time interval.

[0068] In this embodiment, the preset time interval can be a sampling period. The specific duration of this time interval is not specifically limited here, but needs to be set according to the actual detection accuracy requirements of the interferometer 20 in the actual application scenario.

[0069] Step S120: Determine the switching adjustment parameters of the first interferometer 21 and the second interferometer 22 based on the center position of the workpiece stage 10, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer 21 and the second interferometer 22.

[0070] In this embodiment, the computer device switches between the first interferometer 21 and the second interferometer 22 by adjusting parameters. The weight setting reflects the contribution of the dual-channel interferometer 20 to the actual measured value in this region, while the bias value is used to correct the measurement reference of the interferometer 20. For example, when the center position of the workpiece stage 10 is less than the first critical value, the measurement result output by the computer device depends on the measurement value of the first interferometer 21. When the center of the workpiece stage 10 is located in the first alignment region 2C, the bias value of the second interferometer 22 needs to be adjusted to align with the measurement value of the first interferometer 21 to ensure the continuity and accuracy of the measurement results.

[0071] It is worth noting that since the interferometer 20 adopts a relative measurement mode, its measurement results depend on the initial reference point. Therefore, a zero-point calibration operation is required before each measurement by the interferometer 20. In this embodiment, only the offset values ​​need to be adjusted in the first alignment area 2C and the second alignment area 2D; no adjustment is required in the remaining areas.

[0072] Step S130: Obtain the measurement values ​​of the first interferometer 21 and the second interferometer 22 at the current moment.

[0073] Step S140: Output the actual measured value based on the measured values ​​of the first interferometer 21 and the second interferometer 22 and the switching adjustment parameters.

[0074] In this embodiment, within the travel distance of the workpiece stage 10, the above method can adjust the switching parameters of the dual-channel interferometer 20 according to the center position of the workpiece stage 10, realize the automatic switching of the dual-channel interferometer 20, output continuous actual measurement values ​​of the interferometer 20, and ensure the stability and accuracy of the measurement results.

[0075] Furthermore, please see again Figure 1 In this embodiment, the interferometer 20 further includes a third interferometer 23 for measuring the distance of the workpiece stage 10 in the first direction A1, and the third interferometer 23 is positioned close to the first interferometer 21. Step S110 can also be implemented in the following way.

[0076] First, the measurement values ​​of the third interferometer 23 are acquired according to the preset time interval.

[0077] In this embodiment, since the position of the interferometer 20 is fixed, the light generated by the third interferometer 23 is always established within the moving stroke of the workpiece stage 10, and its measurement value will be continuously output.

[0078] Next, the center position of the workpiece stage 10 is determined based on the measurement value of the third interferometer 23.

[0079] In this embodiment, the computer device can continuously obtain the measurement values ​​of the third interferometer 23, so the center position of the workpiece stage 10 is the measurement value of the third interferometer 23 plus half the length of the workpiece stage 10.

[0080] It is worth noting that the center position of the workpiece stage 10 mentioned in this embodiment is the distance between the center of the workpiece stage 10 and the third interferometer 23. The specific length of the workpiece stage 10 is not specifically limited here and needs to be set according to the actual situation.

[0081] Furthermore, prior to step S110, the method further includes:

[0082] First, the pre-defined positional relationship between the first interferometer 21 and the second interferometer 22 is obtained.

[0083] In this embodiment, with the third interferometer 23 as a reference, the positional relationship between the light generated by the first interferometer 21 and the second interferometer 22 and the third interferometer 23 in the first direction A1 is obtained. This positional relationship includes distance.

[0084] It is worth noting that the specific positions of the first interferometer 21 and the second interferometer 22 are not specifically limited here, and need to be set according to the actual situation.

[0085] Next, please see Figure 3 and Figure 4 , Figure 3 This is the second interactive scenario diagram of the workpiece measurement system 1 provided in this embodiment. Figure 4 for Figure 3 A magnified view of a portion of the image. Taking the center of the first interferometer 21 and the second interferometer 22 as the initial point A, a first critical value and a second critical value symmetrical about the initial point A are determined on both sides of the initial point A. Between the first critical value and the second critical value, a buffer zone 1E is determined on both sides of the initial point A. A first alignment zone 2C and a second alignment zone 2D are located on both sides of the buffer zone 1E. A first reset zone 1C is located on the side of the first alignment zone 2C away from the buffer zone 1E, and a second reset zone 1D is located on the side of the second alignment zone 2D away from the buffer zone 1E. The interval lengths of the first alignment zone 2C and the second alignment zone 2D are the same, and the interval lengths of the first reset zone 1C and the second reset zone 1D are the same.

[0086] In this embodiment, the center of the light generated by the first interferometer 21 and the second interferometer 22 is usually taken as the initial point A, and the coordinate axis X is established accordingly. Then, the regions are divided and the critical values ​​are set on both sides of the initial point A, wherein the first critical value is close to the third interferometer 23.

[0087] It is worth noting that, in this embodiment, the third interferometer 23 is used as a reference. The first and second critical values ​​recorded on the computer device are the distances between the first critical point B and the second critical point B' on the coordinate axis X and the third interferometer 23 in the first direction A1. The boundary values ​​of the first reset area 1C, the first alignment area 2C, the buffer zone 1E, the second alignment area 2D, and the second reset area 1D are the distances between the boundary points of the first reset area 1C, the first alignment area 2C, the buffer zone 1E, the second alignment area 2D, and the second reset area 1D and the third interferometer 23 in the first direction A1. The value of the initial point A recorded on the computer device is the distance between the initial point A on the coordinate axis X and the third interferometer 23 in the first direction A1.

[0088] On the coordinate axis X, the boundary value of the first reset zone 1C away from the first critical point B is equal to the boundary value of the first alignment zone 2C near the first reset zone 1C. The boundary value of the first alignment zone 2C away from the first reset zone 1C is equal to the boundary value of the buffer zone 1E near the first alignment zone 2C. The boundary value of the buffer zone 1E away from the first alignment zone 2C is equal to the boundary value of the second alignment zone 2D near the buffer zone 1E. The boundary value of the second alignment zone 2D away from the buffer zone 1E is equal to the boundary value of the second reset zone 1D near the second alignment zone 2D.

[0089] Further, please see Figure 5 , Figure 5 for Figure 2 The flowchart of the sub-steps of step S120. Step S120 can also be implemented in the following ways.

[0090] In sub-step S121, if the center position of the workpiece stage 10 is less than the first critical value, then the weight of the first interferometer 21 is assigned to 1 and the weight of the second interferometer 22 is assigned to 0.

[0091] In this embodiment, when the center position of the workpiece stage 10 is less than the first critical value, the light generated by the first interferometer 21 is emitted through the second reflector 11 and the first reflector 30, which can realize the measurement of the third direction A3. The light generated by the second interferometer 22 does not illuminate the second reflector 11, so only the measurement value of the first interferometer 21 needs to be output.

[0092] In sub-step S122, if the center position of the workpiece stage 10 is located within the first reset area 1C, then the weight of the first interferometer 21 is assigned to 1, the weight of the second interferometer 22 is assigned to 0, and the second interferometer 22 is reset.

[0093] In this embodiment, when the light generated by the first interferometer 21 or the second interferometer 22 is cut off and then re-established, a reset operation is required. Therefore, when the center position of the workpiece stage 10 moves into the first reset area 1C, the workpiece stage 10 cuts off the light generated by the second interferometer 22, and a reset operation needs to be performed on the second interferometer 22. Since the second interferometer 22 is undergoing an initialization operation, the output value is still the measurement value of the first interferometer 21.

[0094] It is worth noting that the center position of the workpiece stage 10 is located within the first reset area 1C, including the point on the coordinate axis X where the center position of the workpiece stage 10 is located at the boundary point of the first reset area 1C away from the first alignment area 2C.

[0095] In sub-step S123, if the center position of the workpiece stage 10 is located within the first alignment area 2C, then the weight of the first interferometer 21 is assigned a value of 1, and the weight of the second interferometer 22 is assigned a value of 0.

[0096] In this embodiment, the measurement method of the interferometer 20 is the cumulative value. When the center position of the workpiece stage 10 moves to the first alignment area 2C, the light of the second interferometer 22 has been established and the reset operation has been completed. At this time, it is necessary to adjust the measurement value of the second interferometer 22 to align it with the measurement value of the first interferometer 2120 in order to achieve continuous measurement.

[0097] It is worth noting that the center position of the workpiece stage 10 is located within the first alignment area 2C, which means that the center position of the workpiece stage 10 on the coordinate axis X is located at the boundary point of the first reset area 1C away from the buffer 1E.

[0098] In sub-step S124, if the center position of the workpiece stage 10 is located within the buffer zone 1E, the weights of the first interferometer 21 and the second interferometer 22 are adjusted based on the center position of the workpiece stage 10.

[0099] In this embodiment, buffer zone 1E serves as a transition region. Within this region, the weights of the dual-channel interferometer 20 are adjusted by controlling the center position of the workpiece stage 10, ensuring a smooth transition of the dual-channel interferometer 20 while maintaining measurement accuracy. For example, when the workpiece stage 10 moves away from the third interferometer 23, as it passes through buffer zone 1E, the adjustment parameters are switched to gradually increase the weight of the second interferometer 22 and decrease the weight of the first interferometer 21. When the workpiece stage 10 moves towards the third interferometer 23, as it passes through buffer zone 1E, the adjustment parameters are switched to gradually increase the weight of the first interferometer 21 and decrease the weight of the second interferometer 22, ensuring the continuity and accuracy of the measurement.

[0100] It is worth noting that the center position of the workpiece stage 10 is located within the buffer zone 1E, including the boundary points on both sides of the buffer zone 1E on the coordinate axis X.

[0101] In sub-step S125, if the center position of the workpiece stage 10 is located within the second alignment area 2D, then the weight of the second interferometer 22 is assigned to 1, and the weight of the first interferometer 21 is assigned to 0.

[0102] In this embodiment, when the center position of the workpiece stage 10 moves into the second alignment area 2D, it is necessary to adjust the measurement value of the first interferometer 21 to align with the measurement value of the second interferometer 22. If the workpiece stage 10 moves toward the third interferometer 23 at this time, the first interferometer 21 can also continue to measure based on the measurement value of the second interferometer 22, so as to achieve continuous output of actual measurement values.

[0103] It is worth noting that the center position of the workpiece stage 10 is located within the second alignment zone 2D, meaning that the center position of the workpiece stage 10 on the coordinate axis X is located at the boundary point of the second alignment zone 2D away from the buffer zone 1E.

[0104] In sub-step S126, if the center position of the workpiece stage 10 is located within the second reset area 1D, then the weight of the second interferometer 22 is assigned to 1, the weight of the first interferometer 21 is assigned to 0, and the first interferometer 21 is reset.

[0105] In this embodiment, if the workpiece stage 10 moves toward the third interferometer 23, when the center position of the workpiece stage 10 moves into the second reset area 1D, the workpiece stage 10 may cut off the light generated by the first interferometer 21, and the first interferometer 21 needs to be reset. Therefore, the output value is the measurement value of the second interferometer 22.

[0106] It is worth noting that the center position of the workpiece stage 10 is located within the second reset zone 1D, meaning that the center position of the workpiece stage 10 on the coordinate axis X is located at the boundary point of the second reset zone 1D far away from the buffer zone 1E.

[0107] In sub-step S127, if the center position of the workpiece stage 10 is greater than the second critical value, then the weight of the second interferometer 22 is assigned to 1, and the weight of the first interferometer 21 is assigned to 0.

[0108] In this embodiment, if the center position of the workpiece stage 10 is greater than the first critical value, the light generated by the second interferometer 22 is emitted through the second reflector 11 and the first reflector 30, which can realize the measurement of the third direction A3. The light generated by the first interferometer 21 does not illuminate the second reflector 11, so only the measurement value of the second interferometer 22 needs to be output.

[0109] Furthermore, sub-step S124 can also be implemented in the following way.

[0110] If the center position of the workpiece stage 10 is located within the buffer zone 1E, then the weighting expression of the second interferometer 22 is:

[0111]

[0112] The weighting expression for the first interferometer 21 is:

[0113]

[0114] At the current moment, The weights of the second interferometer 22, Let A be the distance between the center of the workpiece stage 10 on the X-axis and the initial point A. Let A be the distance between the boundary point of buffer 1E and the initial point A. The weights of the first interferometer 21 are given.

[0115] Furthermore, after sub-step S123, the method provided in this embodiment also includes the following steps.

[0116] The bias value of the second interferometer 22 is adjusted to be the difference between the measured value of the second interferometer 22 and the measured value of the first interferometer 21 at the current time, so as to align the measured value of the second interferometer 22 with that of the first interferometer 21.

[0117] In this embodiment, the bias value is adjusted based on the measurement values ​​of the first interferometer 21 and the second interferometer 22 at the current moment. The workpiece stage 10 enters the first alignment area 2C from the first reset area 1C. After the second interferometer 22 has established an optical path after the reset operation, the measurement value of the second interferometer 22 may deviate from the actual measurement value. Therefore, the measurement value of the first interferometer 21 is used as a reference, and the measurement value of the second interferometer 22 is adjusted by the bias value so that the dual-path interferometer 20 can perform measurements based on the same reference, thereby ensuring the continuity of the actual measurement value.

[0118] After sub-step S125, the method provided in this embodiment further includes the following steps.

[0119] The bias value of the first interferometer 21 is adjusted to be the measured value of the first interferometer 21 at the current time minus the actual measured value of the second interferometer 22 at the current time, so as to align the measured value of the first interferometer 21 with that of the second interferometer 22.

[0120] Furthermore, please see again Figure 5In this embodiment, the width of the interval between the first reset zone 1C and the second reset zone 1D is the product of the reset effective time of the first interferometer 21 and the second interferometer 22 and the maximum speed of the workpiece stage 10. The reset effective time is the time required from the start of the reset operation of the interferometer 20 until the interferometer 20 can resume normal measurement operation. During this period, the measurement results of the interferometer 20 may be unstable. Therefore, it is necessary to set a certain range of interval width for the first reset zone 1C and the second reset zone 1D to ensure that the workpiece stage 10 does not exceed the reset zone due to excessive movement, which could lead to measurement interruption or errors.

[0121] In this embodiment, the formula for the distance between the initial point A and the first or second critical value on the coordinate axis X is:

[0122]

[0123] in, Let L1 be the distance between the initial point A and the first or second critical value on the coordinate axis X, L2 be the length of the second reflecting mirror 11 of the workpiece stage 10 along the first direction A1, and L3 be the distance between the light generated by the first interferometer 21 and the second interferometer 22. Thus, when the center position of the workpiece stage 10 is less than the first critical value, the light generated by the second interferometer 22 does not illuminate the second reflecting mirror 11 of the workpiece stage 10; similarly, when the center position of the workpiece stage 10 is greater than the second critical value, the light generated by the first interferometer 21 also cannot illuminate the second reflecting mirror 11 of the workpiece stage 10.

[0124] Furthermore, step S140 can also be implemented in the following ways.

[0125] The expression for the actual measured value is:

[0126]

[0127] At the current moment, These are actual measured values. As the weight of the first interferometer 21, The measured value is from the first interferometer 21. This is the bias value of the first interferometer 21. The weights of the second interferometer 22, The measured value is from the second interferometer 22. This is the bias value of the second interferometer 22.

[0128] Based on the same inventive concept, please refer to the figure. Figure 6This is a schematic diagram of the functional modules of a dual-channel interferometer switching device provided in this embodiment. This embodiment can divide the dual-channel interferometer switching device into functional modules according to the above method embodiment. For example, each function can be divided into its own functional modules, or two or more functions can be integrated into one processing module. The integrated module can be implemented in hardware or as a software functional module. It should be noted that the module division in this embodiment is illustrative and only represents one logical functional division; the actual implementation may have other division methods. For example, in the case of dividing each functional module according to its own function... Figure 6 The dual-channel interferometer switching device shown is only a schematic diagram. The dual-channel interferometer switching device may include a first acquisition module 200, a determination module 210, a second acquisition module 220, and an output module 230. The functions of each module of this dual-channel interferometer switching device will be described in detail below.

[0129] The first acquisition module 200 is used to acquire the center position of the workpiece stage 10 at preset time intervals.

[0130] In this embodiment, the first acquisition module 200 can be used to perform... Figure 2 For a detailed description of the first acquisition module 200, please refer to the description of step S110.

[0131] The determination module 210 is used to determine the switching adjustment parameters of the first interferometer 21 and the second interferometer 22 based on the center position of the workpiece stage 10, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer 21 and the second interferometer 22.

[0132] In this embodiment, the determining module 210 can be used to perform... Figure 2 For a detailed description of the determination module 210, please refer to the description of step S120.

[0133] The second acquisition module 220 is used to acquire the measurement values ​​of the first interferometer 21 and the second interferometer 22 at the current moment.

[0134] In this embodiment, the second acquisition module 220 can be used to perform... Figure 2 For a detailed description of the second acquisition module 220, please refer to the description of step S130 shown in step S130.

[0135] The output module 230 is used to output the actual measured value based on the measured values ​​of the first interferometer 21 and the second interferometer 22 and the switching adjustment parameters.

[0136] In this embodiment, the output module 230 can be used to execute Figure 2For a detailed description of the output module 230, see the description of step S140 shown.

[0137] Furthermore, embodiments of this application also provide a computer storage medium storing an executable program, which, when executed, can be used to implement the dual-channel interferometer switching method provided in the above-described method embodiments.

[0138] Of course, the computer storage medium containing an executable program provided in the embodiments of this application is not limited to the above-described method operations, but can also perform related operations in the dual-channel interferometer switching method provided in any embodiment of this application.

[0139] In summary, this application provides a dual-channel interferometer switching method, a switching device, and a computer storage medium. The dual-channel interferometer switching method is applied to a computer device in a workpiece measurement system. First, the center position of the workpiece stage is acquired at preset time intervals. Then, based on the center position of the workpiece stage, switching adjustment parameters for the first and second interferometers are determined, wherein the switching adjustment parameters include the weights or bias values ​​of the first and second interferometers. Next, the measured values ​​of the first and second interferometers at the current moment are acquired. Finally, based on the measured values ​​of the first and second interferometers and the switching adjustment parameters, the actual measured values ​​are output. Thus, the above method can adjust the switching adjustment parameters of the dual-channel interferometers according to the center position of the workpiece stage, realizing automatic switching of the dual-channel interferometers and outputting continuous actual interferometer measured values.

[0140] This application describes embodiments with reference to flowchart illustrations and / or block diagrams of methods, apparatus, and computer program products according to embodiments of this application. It should be understood that each block of the flowchart illustrations and / or block diagrams, and combinations of blocks in the flowchart illustrations and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, special-purpose computer, embedded processor, or other programmable data processing apparatus to produce a machine, such that the instructions, which execute via the processor of the computer or other programmable data processing apparatus, generate instructions for implementing the flowchart illustrations. Figure 1 One or more processes and / or boxes Figure 1 A device that provides the functions specified in one or more boxes.

[0141] Although this application has been described herein in conjunction with various embodiments, those skilled in the art, by reviewing the accompanying drawings, the disclosure, and the appended claims, will understand and implement other variations of the disclosed embodiments in carrying out the claimed application. In the claims, the word "comprising" does not exclude other components or steps, and "a" or "an" does not exclude multiple instances. A single processor or other unit can implement several functions listed in the claims. While different dependent claims may recite certain measures, this does not mean that these measures cannot be combined to produce good results.

[0142] It should be understood that, although Figure 2 , Figure 5 and Figure 6 The steps in the flowchart are shown sequentially as indicated by the arrows, but these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise specified in this document, there is no strict order requirement for the execution of these steps, and they can be executed in other orders.

[0143] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A method for switching between two interferometers, characterized in that, A computer device is used in a workpiece measurement system. The workpiece measurement system further includes a workpiece stage, an interferometer, and a first reflecting mirror. A second reflecting mirror is included on one side of the workpiece stage. The first reflecting mirror is located above the workpiece stage. The interferometer includes a first interferometer and a second interferometer arranged along a first direction on the side of the workpiece stage where the second reflecting mirror is located, and a third interferometer for measuring the distance of the workpiece stage in the first direction. Light generated by the first and second interferometers is transmitted along a second direction and reflected by the second and first reflecting mirrors before exiting along a third direction. The interferometer is connected to the computer device, and the first direction, the second direction, and the third direction are perpendicular to each other. The method includes: Obtain the preset positional relationship between the first interferometer and the second interferometer; Taking the centers of the first interferometer and the second interferometer as the initial point, a first critical value and a second critical value symmetrical with respect to the initial point are determined on both sides of the initial point. A buffer zone located on both sides of the initial point is determined between the first critical value and the second critical value. A first alignment zone and a second alignment zone are located on both sides of the buffer zone. A first reset zone is located on the side of the first alignment zone away from the buffer zone. A second reset zone is located on the side of the second alignment zone away from the buffer zone. The interval lengths of the first alignment zone and the second alignment zone are the same. The interval lengths of the first reset zone and the second reset zone are the same. The center position of the workpiece stage is obtained at preset time intervals, including the following steps: The measurement values ​​of the third interferometer are acquired at preset time intervals; The center position of the workpiece stage is determined based on the measurement values ​​of the third interferometer; The switching adjustment parameters of the first interferometer and the second interferometer are determined based on the center position of the workpiece stage, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer and the second interferometer; Obtain the measurement values ​​of the first interferometer and the second interferometer at the current moment; The actual measured value is output based on the measured values ​​of the first interferometer and the second interferometer and the switching adjustment parameters.

2. The dual-channel interferometer switching method as described in claim 1, characterized in that, The step of determining the switching adjustment parameters of the first interferometer and the second interferometer based on the center position of the workpiece stage includes: If the center position of the workpiece stage is less than the first critical value, then the weight of the first interferometer is assigned to 1, and the weight of the second interferometer is assigned to 0. If the center position of the workpiece stage is located within the first reset area, then the weight of the first interferometer is assigned a value of 1, the weight of the second interferometer is assigned a value of 0, and the second interferometer is reset. If the center position of the workpiece stage is located within the first alignment area, then the weight of the first interferometer is assigned a value of 1, and the weight of the second interferometer is assigned a value of 0. If the center position of the workpiece stage is located within the buffer zone, the weights of the first interferometer and the second interferometer are adjusted based on the center position of the workpiece stage. If the center position of the workpiece stage is located within the second alignment area, then the weight of the second interferometer is assigned a value of 1, and the weight of the first interferometer is assigned a value of 0. If the center position of the workpiece stage is located within the second reset area, then the weight of the second interferometer is assigned a value of 1, the weight of the first interferometer is assigned a value of 0, and the first interferometer is reset. If the center position of the workpiece stage is greater than the second critical value, then the weight of the second interferometer is assigned a value of 1, and the weight of the first interferometer is assigned a value of 0.

3. The dual-channel interferometer switching method as described in claim 2, characterized in that, The step of determining if the center position of the workpiece stage is located within the buffer zone includes: If the center position of the workpiece stage is located within the buffer zone, then the weighting expression of the second interferometer is: ； The weighting expression for the first interferometer is: ； At the current moment, The weights of the second interferometer, The distance between the center position of the workpiece stage and the initial point on the coordinate axis. The distance between the boundary point of the buffer and the initial point. denoted as the weight of the first interferometer.

4. The dual-channel interferometer switching method as described in claim 3, characterized in that, After the step of setting the weight of the first interferometer to 1 and the weight of the second interferometer to 0 if the center position of the workpiece stage is located within the first alignment area, the following steps are included: The bias value of the second interferometer is adjusted to be the difference between the measured value of the second interferometer and the measured value of the first interferometer at the current moment, so as to align the measured value of the second interferometer with that of the first interferometer. After the step of setting the weight of the second interferometer to 1 and the weight of the first interferometer to 0 if the center position of the workpiece stage is located within the second alignment area, the following steps are included: The bias value of the first interferometer is adjusted to be the difference between the measured value of the first interferometer and the measured value of the second interferometer at the current moment, so as to align the measured value of the first interferometer with that of the second interferometer.

5. The dual-channel interferometer switching method as described in claim 4, characterized in that, The width of the first reset zone and the second reset zone is the product of the reset effective time of the first interferometer and the second interferometer and the maximum speed of the workpiece stage movement; The formula for the distance between the initial point and the first or second critical value on the coordinate axis is: ； in, The distance between the initial point and either the first or second critical value on the coordinate axis. The length of the second reflector of the workpiece stage along the first direction. The distance between the light generated by the first interferometer and the second interferometer is denoted as .

6. The dual-channel interferometer switching method as described in claim 1, characterized in that, In the step of outputting the actual measured value based on the measured values ​​of the first interferometer and the second interferometer and the switching adjustment parameter, the method includes: The expression for the actual measured value is: ； At the current moment, These are actual measured values. The weights of the first interferometer, The measured value is from the first interferometer. This is the bias value of the first interferometer. The weights of the second interferometer, The measured value is from the second interferometer. This is the bias value of the second interferometer.

7. A dual-channel interferometer switching device based on the dual-channel interferometer switching method according to any one of claims 1 to 6, characterized in that, A computer device is used in a workpiece measurement system. The workpiece measurement system further includes a workpiece stage, an interferometer, and a first reflecting mirror. A second reflecting mirror is included on one side of the workpiece stage. The first reflecting mirror is located above the workpiece stage. The interferometer includes a first interferometer and a second interferometer arranged along a first direction on the side of the workpiece stage where the second reflecting mirror is located, and a third interferometer for measuring the distance of the workpiece stage in the first direction. Light generated by the first and second interferometers is transmitted along a second direction and reflected by the second and first reflecting mirrors before exiting along a third direction. The interferometer is connected to the computer device. The first direction, the second direction, and the third direction are perpendicular to each other. The dual-channel interferometer switching device includes: The first acquisition module is used to acquire the center position of the workpiece stage at preset time intervals; The determining module is used to determine the switching adjustment parameters of the first interferometer and the second interferometer based on the center position of the workpiece stage, wherein the switching adjustment parameters include the weights or bias values ​​of the first interferometer and the second interferometer; The second acquisition module is used to acquire the measurement values ​​of the first interferometer and the second interferometer at the current moment; The output module is used to output the actual measurement value based on the measurement values ​​of the first interferometer and the second interferometer and the switching adjustment parameter.

8. A computer storage medium, characterized in that, The device stores an executable program, which, when executed by a computer device, implements the dual-channel interferometer switching method according to any one of claims 1-6.

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