Dry ice sand blasting-chemical dissolution-ultrasonic collaborative cleaning process for nano aluminum oxide coating part
By employing a dry ice blasting-chemical dissolution-ultrasonic synergistic cleaning process, the problem of incomplete removal of contaminants from nano-alumina coatings was solved, achieving efficient cleaning while maintaining coating stability and meeting the cleanliness requirements of semiconductor manufacturing.
Patent Information
- Application Number
- CN202511471985.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-15
- Publication Date
- 2025-11-28
AI Technical Summary
Existing cleaning technologies are unable to completely remove multi-component, strongly adhering contaminants from nano-alumina coatings and are prone to damaging the coating structure. In particular, when dealing with ultra-thin coatings, it is difficult to balance thorough cleaning with coating stability.
The process employs a combined dry ice blasting, chemical dissolution, and ultrasonic cleaning technique, which includes steps such as isopropanol immersion, hot water rinsing, dry ice blasting, cleaning with a specific ratio of nitric acid and hydrofluoric acid mixture, high-pressure water washing, and ultrasonic cleaning, combined with multiple online quality control measures.
It achieves highly efficient cleaning of nano-alumina coatings, with a removal rate of over 98%, ensuring the integrity of the coating structure and the smoothness of the surface. The number of residual particles is reduced to less than 5 per square centimeter, meeting the stringent standards of the semiconductor manufacturing industry.