Polishing solution supply device

Abstract

The invention relates to a polishing solution supply device which comprises a device body, a polishing solution supply barrel is installed on the front face of the device body, the output end of the polishing solution supply barrel is in butt joint with a polishing solution output pump, and the polishing solution output pump is in butt joint with an output pipe assembly installed on the back face of the device body. An output pipe assembly is installed on the back face of the device body and used for outputting the polishing solution to a polishing machining system, a recovery pipe assembly is further installed on the back face of the device body and used for recovering and conveying the polishing solution, and the recovery pipe assembly is in butt joint with a heat exchange assembly installed on the back face of the device body. The pressure sensor is arranged through the output pipeline and the recovery pipeline, the blocking state of the filter is monitored in real time, the standby pipeline is automatically switched, shutdown for filter element replacement is avoided, the service life of the filter element is prolonged, meanwhile, residual polishing liquid can be rapidly emptied through the bottom guide pipe, and the pollution risk is reduced.

Description

Technical Field

[0001] This invention relates to the field of polishing technology, and more specifically, to a polishing slurry supply device. Background Technology

[0002] During the polishing process of semiconductor silicon wafers, a large amount of heat is generated due to friction. Therefore, it is necessary to continuously and stably supply polishing fluid at the appropriate temperature to meet the process requirements of silicon wafer polishing. While the polishing machine is continuously and stably supplied, it will discharge excess polishing fluid to the recycling tank, and then pump it back to the supply system.

[0003] The applicant's research revealed certain shortcomings in the recycling of existing polishing slurries: In wafer polishing, the polishing slurry contains deposited particles. Since silicon carbide polishing generates a lot of heat due to mechanical friction, the heat exchange coil is traditionally placed in a stirring tank. As a result, a large number of capillaries will have sediment and crystals that are difficult to clean. Moving the heat exchange device to the outside and reducing the sediment on the capillaries through liquid flow can solve the problem. At the same time, the particles generated by polishing are relatively large. Conventional use involves replacing the filter element according to the usage time, but the effect of the filter element cannot be measured. Therefore, it is necessary to shorten the replacement time, increase the replacement frequency, reduce the life of the filter element, and increase the cost of replacing the filter element.

[0004] Therefore, it is particularly necessary to design a polishing slurry supply device to solve the above-mentioned technical problems. Summary of the Invention

[0005] The purpose of this invention is to provide a polishing slurry supply device to solve the problems mentioned in the background art.

[0006] To solve the above-mentioned technical problems, the present invention provides a polishing slurry supply device, comprising: a device body, a polishing slurry supply tank installed on the front of the device body, a polishing slurry output pump connected to the output end of the polishing slurry supply tank, an output pipe assembly installed on the back of the device body, the output pipe assembly being used to output polishing slurry to a polishing processing system, and a recovery pipe assembly installed on the back of the device body, the recovery pipe assembly being used to recover and transport polishing slurry, the recovery pipe assembly being connected to a heat exchange assembly installed on the back of the device body, the heat exchange assembly being used to recover the cooling of the polishing slurry and return the cooled polishing slurry to the polishing slurry supply tank; The device is equipped with a chemical solution component, which is used for cleaning the workpiece after polishing.

[0007] Preferably, the output pipe assembly includes a first conduit connected to the polishing liquid output pump and located on the back of the device body, the top of the first conduit connected to the second conduit, the second conduit connected to the first filter installed on the back of the device body, the first filter having a pressure sensor installed on it and the output end of the first filter connected to the third conduit, the third conduit connected to the fourth conduit, the two ends of the fourth conduit connected to the first conduit and the fifth conduit, and the fifth conduit connected to the polishing liquid output port installed on the back of the device body.

[0008] Preferably, the recovery tube assembly includes a polishing liquid recovery port disposed on the back of the device body, the polishing liquid recovery port is connected to a conduit six, the conduit six is ​​connected to a filter two, the output end of the filter two is connected to a conduit seven, the conduit seven is connected to a loop tube, and the lower end of the loop tube is provided with a recovery inlet. One side of catheter six is ​​also connected to catheter eight, which connects to the loop tube and shares an inlet end with catheter seven.

[0009] Preferably, the heat exchange assembly includes a heat exchanger installed on the back of the main body of the device, the bottom liquid inlet of the heat exchanger is connected to the recovery inlet, and the one-way valve pipe of the heat exchanger is connected to the upper end of the loop pipe, and the upper end of the loop pipe is provided with a return pipe, which is connected to the polishing liquid supply tank.

[0010] Preferably, the loop pipe is provided with two valves between the return pipe and the recovery inlet, with the two valves on both sides of the inlet of conduit eight and conduit seven; The loop pipe is connected to conduit five, and valves are provided at both ends of the conduit five. A pressure relief valve is also installed on the loop pipe.

[0011] Preferably, the bottom of the second filter and the first filter are equipped with a conduit nine, and the conduit nine is connected to the discharge pipe installed on the back of the main body of the device.

[0012] Preferably, the liquid medicine assembly includes a liquid medicine container installed on the front of the device body. The liquid medicine container is connected to a cleaning tank installed on the front of the device body through a liquid medicine valve. The cleaning tank is connected to two metering pumps installed on the front of the device body through a conduit. The metering pumps are connected to a liquid medicine storage tank installed on the front of the device body through a conduit. The top of the liquid medicine storage tank is connected to a liquid medicine output pipe installed on the back of the device body through an output pump. The liquid medicine output pipe is connected to a liquid medicine output port.

[0013] Preferably, a third metering pump is installed on the front of the main body of the device. The output end of the metering pump is connected to the polishing liquid supply tank, and the input end is connected to an external liquid source.

[0014] Preferably, a multi-functional pipeline is also installed on the back of the main body of the device. The multi-functional pipeline is connected to the liquid recovery port installed on the back of the main body of the device via a valve. The multi-functional pipeline is connected to the fifth conduit via a valve. A polishing liquid inlet pipe and a liquid inlet pipe are installed sequentially on the multi-functional pipeline, and a separation structure is provided between the polishing liquid inlet pipe and the liquid inlet pipe. A diversion pipe is installed on one side of the multi-functional pipeline at the polishing liquid inlet pipe. The diversion pipe is equipped with a valve and is connected to the liquid inlet pipe. A valve is installed on the polishing liquid inlet pipe.

[0015] The beneficial effects of this invention are: 1. This invention uses a pressure sensor configured with dual output and recovery pipelines to monitor the filter clogging status in real time and automatically switch to the backup pipeline, avoiding downtime for filter replacement and extending filter life. At the same time, residual polishing liquid can be quickly drained through the bottom conduit, reducing the risk of contamination.

[0016] 2. The pressure relief valve is installed in the liquid supply pipeline system to ensure that the liquid supply system can stably output polishing liquid to the polishing machine, and to prevent sudden excessive pressure from affecting the polishing effect of the polishing machine and the polishing process.

[0017] 3. This invention achieves intelligent linkage between the chemical solution recovery and polishing liquid pipeline through a multi-functional pipeline. The cleaning agent and citric acid are automatically mixed in a preset ratio and then directly reused in the liquid supply system to avoid cross-contamination. At the same time, the bidirectional replenishment design of the chemical solution storage tank and the external liquid source ensures continuous operation of the cleaning process.

[0018] 4. The present invention can effectively cool the polishing fluid through the heat exchange component, ensuring that the polishing fluid is at a suitable temperature when it is reused in the future. Attached Figure Description

[0019] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0020] Figure 1 This is an overall rear view of a polishing fluid supply device according to the present invention; Figure 2 This is an overall front view of a polishing fluid supply device according to the present invention; Figure 3 This is a top view of a polishing slurry supply device according to the present invention. Figure 4 This is a front view of the loop pipe of a polishing fluid supply device according to the present invention; Figure 5 This invention provides an overall three-dimensional representation of a polishing slurry supply device. Figure 1 ; Figure 6 This invention provides an overall three-dimensional representation of a polishing slurry supply device. Figure 2 .

[0021] In the diagram: 1. Main body of the device; 2. Polishing fluid supply tank; 3. Polishing fluid output pump; 4. Pipeline 1; 5. Pipeline 2; 6. Filter 1; 7. Pipeline 3; 8. Pipeline 5; 9. Pipeline 4; 10. Polishing fluid recovery port; 10. Pipeline 8; 11. Pipeline 6; 12. Filter 2; 13. Pipeline 7; 14. Loop pipe; 15. Recovery inlet; 16. Heat exchanger; 17. Cooling water inlet and outlet pipes; 18. Liquid inlet. ; 19. One-way valve pipe; 20. Return pipe; 21. Pressure relief valve; 22. Conduit nine; 23. Discharge pipe; 24. Multifunctional pipeline; 25. Polishing fluid outlet; 26. Polishing fluid inlet pipe; 27. Medicine recovery port; 28. Medicine storage tank; 29. ​​Metering pump; 30. Cleaning tank; 31. Medicine filling cylinder; 32. Medicine valve; 34. Medicine output pipe; 35. Medicine output port; 36. Medicine inlet pipe; 37. Diverter pipe. Detailed Implementation

[0022] The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic diagrams, illustrating only the basic structure of the invention, and therefore only show the components relevant to the invention.

[0023] like Figures 1-6 As shown, a polishing liquid supply device of the present invention includes: a device body 1, and a polishing liquid supply tank 2 is installed on the front of the device body 1; The output end of the polishing slurry supply tank 2 is connected to the polishing slurry output pump 3. The polishing slurry output pump 3 is connected to the output pipe assembly installed on the back of the main body 1. The output pipe assembly is used to output the polishing slurry to the polishing processing system. The back of the main body 1 is also equipped with a recovery pipe assembly, which is used for the recovery and transportation of the polishing slurry. The recovery pipe assembly is connected to the heat exchange assembly installed on the back of the main body 1. The heat exchange assembly is used to recover the cooling of the polishing slurry and return the cooled polishing slurry to the polishing slurry supply tank 2. The main body 1 is equipped with a chemical solution assembly, which is used for cleaning the workpiece after polishing. A multi-functional pipe 24 is also installed on the back of the main body 1. The multi-functional pipe 24 is connected to the liquid recovery port 27 installed on the back of the main body 1 through a valve. The multi-functional pipe 24 is also connected to the conduit 5 8 through a valve. Polishing liquid inlet pipe 26 and liquid inlet pipe 36 are installed sequentially on the multi-functional pipe 24, and a separation structure is provided between the polishing liquid inlet pipe 26 and the liquid inlet pipe 36. A diversion pipe 37 is installed on the side of the multi-functional pipe 24 where the polishing liquid inlet pipe 26 is located. The diversion pipe 37 is equipped with a valve and is connected to the liquid inlet pipe 36. The polishing liquid inlet pipe 26 is also equipped with a valve. The multi-functional pipe 24 can be used to receive the liquid and return it to the cleaning tank 30 for restart. In use, the liquid recovery port 27 introduces the liquid into the multi-functional pipe 24 through the existing recovery device (polishing liquid inlet pipe 26 is closed, and the valve between the multi-functional pipe 24 and the conduit 5 8 is closed, while the valve of the diversion pipe 37 is open). Then the liquid can enter the liquid inlet pipe 36 through the diversion pipe 37 and return to the cleaning tank 30.

[0024] The output pipe assembly includes a first conduit 4 that is connected to the polishing slurry output pump 3 and located on the back of the device body 1. The top of the first conduit 4 is connected to the second conduit 5. The second conduit 5 is connected to the first filter 6 installed on the back of the device body 1. A pressure sensor is installed on the first filter 6, and the output end of the first filter 6 is connected to the third conduit 7. The third conduit 7 is connected to the fourth conduit 9. The two ends of the fourth conduit 9 are connected to the first conduit 4 and the fifth conduit 8. The fifth conduit 8 is connected to the polishing slurry output port 25 installed on the back of the device body 1.

[0025] Through the design of the output pipe assembly, during polishing, the polishing slurry output pump 3 discharges polishing slurry from the polishing slurry supply tank 2 and into conduit 4. At this time, the valve at the end of conduit 9 closest to conduit 4 is closed, while the valve of conduit 2 5 is open, allowing the polishing slurry to enter filter 6. After filtration, it enters conduit 7, whose valve is also open, and then flows into conduit 9. Conduit 9 then guides the polishing slurry into conduit 8, and finally into the polishing slurry output port 25 for polishing. When filter 6 becomes clogged, the pressure sensor detects excessive pressure, closing the valves of conduit 2 5 and conduit 3 7, and opening the valve of conduit 4 9, allowing the polishing slurry to enter conduit 8. Simultaneously, the polishing slurry output port 25 is closed, and the connecting valve between the multi-functional pipe 24 and conduit 8 is opened, allowing the polishing slurry to enter the multi-functional pipe 24. At this time, the diversion pipe 37 is closed, and the polishing slurry enters the polishing slurry supply tank 2 through the polishing slurry inlet pipe 26 (whose valve is open). Afterward, the filter element inside filter 6 can be replaced, which is very convenient. The recovery pipe assembly includes a polishing liquid recovery port 10 located on the back of the main body 1. The polishing liquid recovery port 10 is connected to a conduit 6 11. The conduit 6 11 is connected to a filter 2 12. The output end of the filter 2 12 is connected to a conduit 7 13. The conduit 7 13 is connected to a loop pipe 14. The lower end of the loop pipe 14 is provided with a recovery inlet 15. The filter 2 12 is also equipped with a pressure sensor. One side of conduit 6 11 is also connected to conduit 8 101, which is connected to loop pipe 14 and shares an inlet end with conduit 7 13.

[0026] Through the design of the recovery pipe assembly, the polishing fluid is collected centrally after use and reaches the polishing fluid recovery port 10 through the existing pipeline. It then enters the sixth conduit 11 (the eighth conduit 101 is closed and cannot conduct fluid), and then enters the second filter 12 for filtration. After filtration, it is introduced into the loop pipe 14 through the seventh conduit 13. Since valve b is closed and valve a is open, the polishing fluid enters the recovery inlet 15 (valve c is also closed) and enters the heat exchange assembly for processing. When the second filter 12 is blocked, it means that the filter element has been fully utilized. The valves of the sixth conduit 11 and the seventh conduit 13 are closed, and the valve of the eighth conduit 101 is opened, and the polishing fluid can be directly introduced into the heat exchange assembly. (The recovered second filter 12 is used to reduce the pressure of the output filter 6 and does not affect the operation of the heat exchange assembly. Afterwards, the system will issue an alarm, and the staff can quickly replace the corresponding filter element.)

[0027] The bottom of filter 212 and filter 16 is equipped with conduit 922, which is connected to the discharge pipe 23 installed on the back of the main body 1 of the device.

[0028] Furthermore, after filters 12 and 6 become clogged, there is still some residual polishing liquid inside them. At this time, after the inlet and outlet valves of filters 12 and 6 are closed, the valve of conduit 22 can be opened according to the setting, and conduit 22 can discharge the residual polishing liquid into the discharge pipe 23 for discharge, which is very convenient.

[0029] The heat exchange assembly includes a heat exchanger 16 installed on the back of the main body 1. The bottom inlet 18 of the heat exchanger 16 is connected to the recovery inlet 15, and the one-way valve pipe 19 of the heat exchanger 16 is connected to the upper end of the loop pipe 14. The upper end of the loop pipe 14 is provided with a return pipe 20, which is connected to the polishing liquid supply tank 2.

[0030] Through the heat exchange component design, the polishing fluid is introduced into the heat exchanger 16 via the recovery inlet 15. The heat exchanger 16 can introduce cooling medium through its own installed cold water inlet / outlet pipe 17, which allows the internal polishing fluid to be cooled quickly and enter the upper end of the loop pipe 14 (valves d and b are also closed). This ensures that the coolant can only return to the polishing fluid supply tank 2 through the return pipe 20, achieving recycling. Optionally, for some cases where cooling is not required, valve a can be closed and valve b can be opened, allowing the fluid to directly return to the polishing fluid supply tank 2 through the return pipe 20.

[0031] The loop pipe 14 is equipped with two valves between the return pipe 20 and the recovery inlet 15. The two valves are located on both sides of the inlet end of the conduit 8 101 and the conduit 7 13. The loop pipe 14 is connected to the conduit 5 8, and valves are provided at both ends of the connection point to the conduit 5 8. A pressure relief valve 21 is also installed on the loop pipe 14.

[0032] Optionally, in some cases, the pressure of the cooled coolant after cooling may be very high, causing excessive pressure on the return pipe 20. In this case, valve d can be opened so that part of the outflowing coolant enters the other end of the loop pipe 14 and passes through the pressure relief valve 21 installed thereon. After entering the conduit 8, it is introduced into the multi-functional pipe 24 and returned to the polishing fluid supply tank 2.

[0033] The liquid preparation assembly includes a liquid preparation cylinder 31 installed on the front of the main body 1. The liquid preparation cylinder 31 is connected to a cleaning tank 30 installed on the front of the main body 1 via a liquid preparation valve 32. The cleaning tank 30 is connected to two metering pumps 29 installed on the front of the main body 1 via conduits. The metering pumps 29 are connected to a liquid preparation storage tank 28 installed on the front of the main body 1 via conduits. The top of the liquid preparation storage tank 28 is connected to a liquid preparation output pipe 34 installed on the back of the main body 1 via an output pump. The liquid preparation output pipe 34 is connected to a liquid preparation output port 35. A third metering pump 29 is installed on the front of the main body 1. The output end of the metering pump 29 is connected to a polishing liquid supply tank 2, and the input end is connected to an external liquid source.

[0034] Finally, the polished workpiece needs to be cleaned with a cleaning solution. The cleaning solution container 31 contains cleaning agent and citric acid. During operation, the cleaning agent and citric acid mixture in the cleaning solution container 31 is first injected into the cleaning tank 30 in a preset ratio through the cleaning solution valve 32. After the metering pump 29 is started, the mixed solution is drawn from the cleaning tank 30 through a conduit and transported to the cleaning solution storage tank 28 for temporary storage. The solution in the cleaning solution storage tank 28 is pressurized by the top output pump and then transported to the cleaning solution output port 35 through the cleaning solution output pipe 34. Finally, it covers the surface of the workpiece to be cleaned in the form of atomization or spray, achieving efficient decontamination and neutralization of polishing residue.

[0035] Based on the above-described preferred embodiments of the present invention, and through the foregoing description, those skilled in the art can make various changes and modifications without departing from the inventive concept. The technical scope of this invention is not limited to the contents of the specification, but must be determined according to the scope of the claims.

Claims

1. A polishing liquid supply device characterized by comprising: The utility model relates to a kind of polishing liquid supply devices, including: Device body (1), the front of the device body (1) is equipped with polishing liquid supply tank (2); The output end of polishing liquid supply tank (2) is connected with polishing liquid output pump (3), and the polishing liquid output pump (3) is connected with output pipe assembly installed on the back of device body (1); The output pipe assembly is used to output polishing liquid to polishing processing system, and the back of the device body (1) is also provided with recovery pipe assembly, which is used for the recycling of polishing liquid, and the recovery pipe assembly is connected with heat exchange assembly installed on the back of device body (1), and the heat exchange assembly is used for cooling the recycled polishing liquid, and the cooled polishing liquid is returned to polishing liquid supply tank (2); The device body (1) is provided with liquid medicine assembly, and the liquid medicine assembly is used for cleaning the workpiece after polishing.

2. The polishing liquid supply device of claim 1, wherein The output pipe assembly includes a guide pipe I (4) connected with the polishing liquid output pump (3) and located on the back of the device body (1), the top of the guide pipe I (4) is connected with a guide pipe II (5), the guide pipe II (5) is connected with a filter I (6) installed on the back of the device body (1), a pressure sensor is installed on the filter I (6), and the output end of the filter I (6) is connected with a guide pipe III (7), the guide pipe III (7) is connected with a guide pipe IV (9), the two ends of the guide pipe IV (9) are connected with the guide pipe I (4) and a guide pipe V (8), and the guide pipe V (8) is connected with a polishing liquid outlet (25) installed on the back of the device body (1).

3. The polishing liquid supply device of claim 2, wherein The recovery pipe assembly includes a polishing liquid recovery port (10) arranged on the back of the device body (1), the polishing liquid recovery port (10) is connected with a guide pipe VI (11), the guide pipe VI (11) is connected with a filter II (12), the output end of the filter II (12) is connected with a guide pipe VII (13), the guide pipe VII (13) is connected with a loop pipe (14), and the lower end of the loop pipe (14) is provided with a recovery guide inlet (15); One side of the guide pipe VI (11) is also connected with a guide pipe VIII (101), the guide pipe VIII (101) is connected with the loop pipe (14) and shares an inlet end with the guide pipe VII (13).

4. The polishing liquid supply device of claim 3, wherein The heat exchange assembly includes a heat exchanger (16) installed on the back of the device body (1), the bottom liquid inlet (18) of the heat exchanger (16) is connected with the recovery guide inlet (15), the one-way valve pipe (19) of the heat exchanger (16) is connected with the upper end of the loop pipe (14), the upper end of the loop pipe (14) is provided with a return pipe (20), and the return pipe (20) communicates with the polishing liquid supply tank (2).

5. The polishing liquid supply device of claim 4, wherein The loop pipe (14) is provided with two valves between the return pipe (20) and the recovery guide inlet (15), and the two valves are located on both sides of the inlet end of the guide pipe VIII (101) and the guide pipe VII (13). Loop pipe (14) butt joint guide pipe five (8), and in butt joint guide pipe five (8) position both ends are provided with valve, the loop pipe (14) is installed with pressure relief valve (21) still.

6. The polishing solution supply device according to claim 5, wherein, The bottom of filter two (12) and filter one (6) is installed with guide pipe nine (22), the guide pipe nine (22) butt joint discharge pipe (23) installed on the back of device body (1).

7. The polishing solution supply device according to claim 6, wherein, The medicine liquid assembly includes medicine liquid cartridge (31) installed on the front of device body (1), the medicine liquid cartridge (31) is communicated with cleaning tank (30) installed on the front of device body (1) through medicine liquid valve (32), the cleaning tank (30) is butt jointed with two metering pumps (29) installed on the front of device body (1) through guide pipe, the metering pump (29) is butt jointed with medicine liquid storage barrel (28) installed on the front of device body (1) through guide pipe, the top of medicine liquid storage barrel (28) is butt jointed with medicine liquid output pipe (34) installed on the back of device body (1) through output pump, the medicine liquid output pipe (34) is butt jointed with medicine liquid output port (35).

8. The polishing liquid supply apparatus according to claim 7, wherein The front of device body (1) is installed with third metering pump (29), the output end of the metering pump (29) is butt jointed with polishing solution supply barrel (2), and the input end is butt jointed with external liquid guide source.

9. The polishing solution supply device according to claim 8, wherein, The back of device body (1) is further installed with multifunctional pipe (24), the multifunctional pipe (24) is butt jointed with medicine liquid recovery port (27) installed on the back of device body (1) through valve, the multifunctional pipe (24) is butt jointed with guide pipe five (8) through valve, polishing liquid inlet pipe (26) and medicine liquid inlet pipe (36) are installed on multifunctional pipe (24) in sequence, and separation structure is arranged between polishing liquid inlet pipe (26) and medicine liquid inlet pipe (36), the multifunctional pipe (24) is installed with shunt pipe (37) on the side of polishing liquid inlet pipe (26), the shunt pipe (37) is provided with valve and butt jointed with medicine liquid inlet pipe (36), and valve is installed on polishing liquid inlet pipe (26).

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