Spraying mechanism and thin film deposition equipment

Abstract

The embodiment of the invention provides a spraying mechanism and thin film deposition equipment, and relates to the technical field of semiconductors. The spraying mechanism comprises a spraying assembly, the spraying assembly is provided with a plurality of first spraying areas and second spraying areas, the first spraying areas and the second spraying areas are arranged in a staggered and spaced mode, the first spraying areas are used for spraying chemical sources to the base material, and the second spraying areas are used for spraying isolation gas to the base material; the spraying assembly is provided with an exhaust channel, the exhaust channel comprises a first flow channel and a second flow channel, and the first flow channel and the second flow channel are isolated from each other; the chemical source comprises a first reaction gas and a second reaction gas, the first spraying area for spraying the first reaction gas corresponds to the first flow channel, and the first spraying area for spraying the second reaction gas corresponds to the second flow channel. In the spraying mechanism provided by the invention, residues of different reaction gases are respectively guided to the corresponding first exhaust port and the second exhaust port through the independent first flow channel and the second flow channel to be exhausted, so that different types of residual chemical sources are prevented from being subjected to a mixed reaction in the exhaust channel.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, specifically to a spraying mechanism and a thin film deposition equipment. Background Technology

[0002] Atomic layer deposition (ALD) is a thin film deposition technology based on surface chemical vapor reaction. It involves separately introducing two or more chemical gas precursors into a reaction chamber, allowing each precursor to undergo a fully saturated surface chemical reaction on the substrate surface. During this process, the gaseous reaction products and unreacted gases are purged away, thus allowing the material to be deposited on the substrate surface as a single-atom film. The thickness and uniformity of the deposited film can be precisely controlled within the atomic layer thickness range. Currently, in ALD technology, the method of drawing the chemical source and isolation gas into the exhaust space behind the spray plate easily leads to different chemical sources meeting and reacting within the spray plate's internal space, causing contamination, shortening the spray plate cleaning and maintenance cycle, and affecting the normal operation of the production line. Summary of the Invention

[0003] This application provides a spraying mechanism and a thin film deposition device to solve the problem that multiple chemical gas precursors are prone to mixing in ALD technology.

[0004] On one hand, this application provides a spraying mechanism, including a spraying assembly. The spraying assembly has multiple staggered and spaced first spraying zones and second spraying zones. The first spraying zones are used to spray a chemical source onto a substrate, and the second spraying zones are used to spray an isolation gas onto the substrate. An exhaust channel is connected to the side of the spraying assembly facing away from the substrate. The exhaust channel includes a first flow channel and a second flow channel, which are isolated from each other. The exhaust channel is provided with a first exhaust port communicating with each of the first flow channels and a second exhaust port communicating with each of the second flow channels. The chemical source includes a first reactive gas and a second reactive gas. The first spraying zone spraying the first reactive gas corresponds to the first flow channel, and the first spraying zone spraying the second reactive gas corresponds to the second flow channel.

[0005] In some embodiments, the exhaust channel is provided with a partition component, the partition component including a plurality of spaced first ribs, each of the first ribs being at least partially parallel to each other, and adjacent first ribs defining a first flow channel and a second flow channel; a single first spray zone corresponds to a single first flow channel or a single second flow channel.

[0006] In some embodiments, the partition assembly includes a plurality of second ribs connected between the ends of two first ribs to form a wave-shaped partition, such that the exhaust channel forms independent exhaust regions on both sides of the partition assembly, and the first reactive gas in the first flow channel and the second reactive gas in the second flow channel exit the exhaust channel from their respective exhaust regions.

[0007] In some embodiments, a plurality of the second ribs are parallel to each other, and the first rib and the second ribs are connected to form a rectangular wave-shaped dividing rib.

[0008] In some embodiments, multiple first exhaust ports are provided, and each first exhaust port is in communication with each of the first flow channels; and / or The second exhaust port is provided in multiple ways, and each second exhaust port is connected to each of the second flow channels.

[0009] In some embodiments, each of the first flow channels and the second flow channels is independent of each other, and the exhaust area between adjacent first ribs is provided with a first exhaust port or a second exhaust port.

[0010] In some embodiments, each of the first flow channels is provided with a first exhaust port at both ends; and / or Each of the second flow channels is provided with a second exhaust port at both ends.

[0011] In some embodiments, the separating component further includes a plurality of third ribs, the first ribs are arranged in pairs, one end of each pair of first ribs is connected to the edge of the spray assembly, and the other end is connected to the third rib, so that each pair of first ribs, the interconnected third ribs and the edge of the spray assembly define an independent first flow channel, and a plurality of first exhaust ports are provided, each first flow channel communicating with at least one first exhaust port.

[0012] In some embodiments, the separating component further includes a plurality of sub-ribs spaced apart within the first flow channel, wherein the length direction of each sub-rib within the first flow channel is consistent with the extension direction of the first flow channel; and / or The separating component includes a plurality of sub-ribs spaced apart within the second flow channel, wherein the length direction of each sub-rib within the second flow channel is consistent with the extension direction of the second flow channel.

[0013] In some embodiments, a gap is provided between the first spray zone and the second spray zone, the gap connecting the exhaust channel and the side of the spray assembly facing the substrate.

[0014] In some embodiments, a sealing gasket is provided at the point where the partition assembly abuts against the inner wall of the exhaust channel.

[0015] On the other hand, embodiments of this application provide a thin film deposition apparatus, including a reaction chamber, a pump body, and a spraying mechanism as described in any of the above embodiments, wherein the first spraying area and the second spraying area of ​​the spraying mechanism face the interior of the reaction chamber; the pump body is connected to the first exhaust port and the second exhaust port.

[0016] In some embodiments, a particulate trap is further included, the particulate trap having an inlet end and an outlet end opposite to each other, the pump body being connected to the outlet end, and one of the two sets of pipelines corresponding to the first exhaust port and the second exhaust port being connected upstream of the inlet end and downstream of the outlet end.

[0017] In some embodiments, a transmission mechanism is also included. The reaction chamber has a substrate inlet and a substrate outlet. The transmission mechanism can drive the substrate to move from the substrate inlet to the substrate outlet. The direction of substrate movement is consistent with the arrangement direction of the first spray zone and the second spray zone.

[0018] The spraying mechanism provided in this application guides the residues of different reactive gases to the corresponding first and second exhaust ports through independent first and second flow channels, thereby preventing different types of residual chemical sources from reacting inside the exhaust channel. This prevents the reaction products of the first and second reactive gases from contaminating the internal space of the exhaust channel, extends the cleaning and maintenance cycle, and improves the production efficiency of the production line. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Figure 1 This is a schematic diagram of the internal structure of a thin film deposition apparatus in some embodiments of this application; Figure 2 yes Figure 1 A schematic diagram illustrating the connection relationship between the reaction chamber and the particle trap in the embodiment; Figure 3 yes Figure 1 A schematic diagram of the spraying mechanism in the embodiment; Figure 4 This is a schematic diagram of the spray mechanism in another embodiment; Figure 5 This is a schematic diagram of the spray mechanism in another embodiment; Figure 6 This is a schematic diagram of the spray mechanism in another embodiment.

[0021] In the above attached figures: 100. Thin film deposition equipment; 10. Sprinkler system; 11. Spray assembly; 110. Exhaust channel; 111. First flow channel; 112. Second flow channel; 113. First exhaust port; 114. Second exhaust port; 115. First spray zone; 116. Second spray zone; 117. Gap; 12. Separator component; 121. First rib; 122. Second rib; 123. Third rib; 124. Sub-rib; 20. Reaction chamber; 21. Substrate inlet; 22. Substrate outlet; 30. Substrate; 40. Particle trap; 41. Air inlet; 42. Air outlet; 50. Pump body; 60. Transmission mechanism. Detailed Implementation

[0022] The present application will now be described in further detail with reference to the accompanying drawings and embodiments. It should be particularly noted that the following embodiments are for illustrative purposes only and do not limit the scope of the application. Similarly, the following embodiments are only some, not all, embodiments of the present application, and all other embodiments obtained by those skilled in the art without inventive effort are within the scope of protection of the present application.

[0023] The terms "first," "second," and "third" used in the embodiments of this application are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined as "first," "second," or "third" may explicitly or implicitly include at least one of that feature. In the description of this application, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified. All directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of this application are only used to explain the relative positional relationships and movement of components in a specific posture (as shown in the figures). If the specific posture changes, the directional indication will also change accordingly. The terms "comprising" and "having," and any variations thereof, in the embodiments of this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not limited to the listed steps or units, but may optionally include steps or units not listed, or may optionally include other steps or components inherent to these processes, methods, products, or devices.

[0024] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0025] Please see Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the internal structure of a thin film deposition apparatus in some embodiments of this application. Figure 2 yes Figure 1 A schematic diagram illustrating the connection between the reaction chamber and the particle trap in this embodiment. This application provides a thin film deposition apparatus 100, which includes a reaction chamber 20, a spray mechanism 10, and a pump body 50.

[0026] The reaction chamber 20 has a substrate inlet 21 and a substrate outlet 22. A transmission mechanism 60 is provided inside the reaction chamber 20, which can drive the substrate 30 from the substrate inlet 21 to the substrate outlet 22. The transmission mechanism 60 includes, but is not limited to, a conveyor belt, a roller assembly, or a chain drive assembly.

[0027] The spraying mechanism 10 includes a spraying assembly 11, which has multiple staggered and spaced first spraying zones 115 and second spraying zones 116. The first spraying zones 115 are used to spray chemical sources onto the substrate 30, and the second spraying zones 116 are used to spray isolation gases onto the substrate 30. The first spraying zones 115 and second spraying zones 116 face the interior of the reaction chamber 20. The chemical sources include, but are not limited to, organometallic compounds, oxidants, nitriding agents, etc., such as trimethylaluminum, ozone, water vapor, oxygen, nitrous oxide, or ammonia. The isolation gases include, but are not limited to, inert gases such as nitrogen, argon, and helium. After the isolation gases are sprayed out through the second spraying zones 116, they can form a gas isolation barrier between adjacent first spraying zones 115, effectively preventing the chemical sources sprayed from different first spraying zones 115 from undergoing CVD reactions.

[0028] The spray assembly 11 is configured as a plate structure. The side of the spray assembly 11 facing the substrate 30 is divided into multiple first spray zones 115 and multiple second spray zones 116, and each spray zone is provided with a spray nozzle. The spray mechanism 10 also includes a supply pipeline and a flow control valve. The supply pipeline is connected to the spray nozzles of the first spray zone 115 and the second spray zone 116 respectively. The flow control valve is provided on the supply pipeline, and at least one flow control valve is correspondingly provided on the supply pipeline of the first spray zone 115 and the second spray zone 116. By adjusting the flow control valve, the overall or partial flow rate of the chemical source entering the first spray zone 115 and the overall or partial flow rate of the isolation gas entering the second spray zone 116 can be precisely controlled. Thus, according to different thin film deposition process requirements, the spray volume of the chemical source and the spray volume of the isolation gas on the surface of the substrate 30 can be flexibly adjusted to ensure the stability of the thin film deposition process and the uniformity of the thin film deposition quality.

[0029] The spray assembly 11 has an exhaust channel 110 connected to the side facing away from the substrate 30. The exhaust channel 110 includes a first flow channel 111 and a second flow channel 112, which are isolated from each other. The exhaust channel 110 has a first exhaust port 113 communicating with each of the first flow channels 111 and a second exhaust port 114 communicating with each of the second flow channels 112. The chemical source includes a first reactive gas and a second reactive gas. The first spray zone 115 spraying the first reactive gas corresponds to the first flow channel 111, and the first spray zone 115 spraying the second reactive gas corresponds to the second flow channel 112.

[0030] During thin film deposition, the substrate 30 moves in the same direction as the arrangement of the first spray zone 115 and the second spray zone 116. For example... Figure 1 As shown, substrate 30 enters reaction chamber 20 through substrate inlet 21. The transmission mechanism 60 drives it to move unidirectionally and / or reciprocally along the X direction, sequentially passing through the first and second reaction gases sprayed from the first spray zone 115, completing the ALD deposition cycle. The first flow channel 111 is specifically designed to collect residual first reaction gases and their byproducts that did not fully participate in the reaction or diffused from the surface of substrate 30 during the process. Similarly, the second flow channel 112 specifically collects residual second reaction gases and related byproducts. By guiding the residues of different reaction gases through independent first and second flow channels 111 and 112 to the corresponding first and second exhaust ports 113 and 114 for discharge, it is possible to further prevent different types of residual chemical sources from meeting and reacting inside the exhaust channel 110, preventing contamination of the internal space of the exhaust channel, extending the cleaning and maintenance cycle, and improving production line efficiency.

[0031] Pump body 50 is connected to the first exhaust port 113 and the second exhaust port 114. Pump body 50 includes, but is not limited to, a vacuum pump, an air pump, or other fluid transport device with pumping function. Pump body 50 can generate negative pressure to act on the first exhaust port 113 and the second exhaust port 114 respectively, so that the residual first reaction gas and its by-products in the first flow channel 111 are smoothly discharged from the first exhaust port 113 under the attraction of the negative pressure; similarly, the residual second reaction gas and related by-products in the second flow channel 112 can also be discharged from the second exhaust port 114 under the corresponding negative pressure.

[0032] In some embodiments, such as Figure 1 As shown, a gap 117 is provided between the first spray zone 115 and the second spray zone 116, and the gap 117 connects the exhaust channel 110 and the side of the spray assembly 11 facing the substrate 30. Figure 1 As shown, on the side of the spray assembly 11 facing the substrate 30, when one of the first spray zones 115 sprays a chemical source, the residual chemical source that has not been fully adsorbed and reacted on the surface of the substrate 30 will diffuse into the gaps 117 on both sides of the first spray zone 115. Thus, the residual gas can directly enter the exhaust channel 110 through the gaps 117 on both sides of the corresponding first spray zone 115. Since a second spray zone 116 for spraying isolation gas is provided between adjacent first spray zones 115, when adjacent first spray zones 115 spray different reactive gases, the residual reactive gases generated will diffuse into the gaps 117 on their respective sides. The isolation gas sprayed by the second spray zone 116 can form a gas barrier between adjacent first spray zones 115, effectively preventing the residual reactive gases from different first spray zones 115 from diffusing laterally and reacting with each other on the surface of the substrate 30.

[0033] Please see Figure 3 , Figure 3 yes Figure 1 A schematic diagram of the spray mechanism in the embodiment. In some embodiments, the exhaust channel 110 is provided with a partition component 12, which includes a plurality of spaced first ribs 121. Each first rib 121 is at least partially parallel to each other, and adjacent first ribs 121 define a first flow channel 111 and a second flow channel 112; a single first spray area 115 corresponds to a single first flow channel 111 or a single second flow channel 112.

[0034] Specifically, the separator 12 can be integrally formed on the side surface of the spray assembly 11 facing away from the substrate 30 or fixed separately. A plurality of first ribs 121 are arranged sequentially at intervals along the X direction, so that a strip-shaped channel for fluid flow is formed between two adjacent first ribs 121, namely a first flow channel 111 or a second flow channel 112.

[0035] The distances between the first ribs 121 can be the same or different to match the diffusion characteristics of different reactive gases, as well as to match different substrate moving speeds and the spacing requirements between the first and second reactive gases. For example, in this embodiment, the distance between two adjacent first ribs 121 of the first flow channel 111 is greater than the distance between two adjacent first ribs 121 of the second flow channel 112. Through the separating effect of the first ribs 121, the first reactive gas in the first flow channel 111 and the second reactive gas in the second flow channel 112 can be effectively prevented from meeting and reacting in the exhaust channel on the side of the spray assembly 11 facing away from the substrate 30, thereby further ensuring the independence of the exhaust and delivery process of different types of reactive gases.

[0036] Each of the first flow channels 111 can be interconnected or isolated from each other, and each of the second flow channels 112 can be interconnected or isolated from each other, as long as the independence between the first flow channel 111 and the second flow channel 112 can be guaranteed.

[0037] For example, in some embodiments, the partition component 12 includes a plurality of second ribs 122 connected between the ends of two first ribs 121 to form a wave-shaped partition, so that the exhaust channel 110 forms independent exhaust regions on both sides of the partition component 12, and the junction of the two exhaust regions is toothed. The first reaction gas in the first flow channel 111 and the second reaction gas in the second flow channel 112 leave the exhaust channel 110 from their respective exhaust regions.

[0038] In this embodiment, the first rib 121 and the second rib 122 are connected to form a wave-shaped dividing rib. One side of the wave-shaped dividing rib forms a first exhaust region, and multiple first flow channels 111 are located in the first exhaust region and are interconnected. The other side of the wave-shaped dividing rib forms a second exhaust region, and multiple second flow channels 112 are located in the second exhaust region and are interconnected. With this configuration, when the pump body 50 draws suction from the first exhaust region, regardless of the location of the first exhaust port in the first exhaust region, the suction effect can be transmitted to all interconnected first flow channels 111 within the entire first exhaust region, ensuring that the reaction gas in each first flow channel 111 can be discharged. The setting of the first exhaust port 113 is more flexible and can effectively take into account the design and assembly space requirements of other components. The setting of the second exhaust port 114 is similar.

[0039] Optionally, a plurality of second ribs 122 are parallel to each other, and the first rib 121 and the second ribs 122 are connected to form a rectangular wave-shaped dividing rib. In other embodiments, the dividing rib formed by connecting the first rib 121 and the second rib 122 is not limited to a rectangular wave shape, but can also be a triangular wave shape, a sine wave shape or a similar waveform, or other irregular wave shapes.

[0040] Optionally, multiple first exhaust ports 113 are provided, and each first exhaust port 113 is connected to each first flow channel 111. Specifically, two, three, four, or more first exhaust ports 113 can be provided; no specific limitation is made here. When multiple first exhaust ports 113 are provided, each first exhaust port 113 can draw gas from the interconnected first flow channels 111 from different positions, allowing the reactant gas within the first flow channels 111 to be quickly discharged through multiple paths, effectively avoiding the potential dead zones that might exist with a single exhaust port.

[0041] Optionally, multiple second exhaust ports 114 are provided, and any one of the second exhaust ports 114 is connected to each of the second flow channels 112. Specifically, two, three, four or more second exhaust ports 114 may be provided, and no specific limitation is made here.

[0042] Please see Figure 4 , Figure 4 This is a schematic diagram of the spray mechanism in another embodiment. In some embodiments, each first flow channel 111 and second flow channel 112 is independent of each other, and the exhaust area between adjacent first ribs 121 is provided with a first exhaust port 113 or a second exhaust port 114.

[0043] Specifically, both ends of each first rib 121 are connected to the edge of the spray assembly 11, and independent exhaust areas are formed between adjacent first ribs 121. Thus, each first flow channel 111 is independent of the others, and each second flow channel 112 is independent of the others. In this embodiment, any first exhaust port 113 is specifically used to exhaust gas from the corresponding first flow channel 111, and any second exhaust port 114 is specifically used to exhaust gas from the corresponding second flow channel 112. This one-to-one correspondence between the exhaust port structure and the flow channel structure allows for more uniform suction in different flow channels. Furthermore, the orifice diameters of different first exhaust ports 113 and different second exhaust ports 114 can be different, thereby allowing for adjustment of local suction force while maintaining a uniform overall suction force distribution.

[0044] Optionally, each of the first flow channels 111 is provided with a first exhaust port 113 at both ends. This design allows the reaction gas in the first flow channel 111 to be simultaneously drawn out from both sides along its length, further improving exhaust efficiency.

[0045] Optionally, each of the second flow channels 112 is provided with a second exhaust port 114 at both ends.

[0046] Please see Figure 5 and Figure 6 , Figure 5 This is a schematic diagram of the spray mechanism in another embodiment. Figure 6This is a schematic diagram of the spray mechanism in another embodiment. In some embodiments, the partition component 12 further includes a plurality of third ribs 123, and the first ribs 121 are arranged in pairs. One end of each pair of first ribs 121 is connected to the edge of the spray component 11, and the other end is connected to the third rib 123, so that each pair of first ribs 121, the interconnected third ribs 123, and the edge of the spray component 11 define an independent first flow channel 111. A plurality of first exhaust ports 113 are provided, and each first flow channel 111 is connected to at least one first exhaust port 113.

[0047] In this embodiment, the first flow channel 111 and the second flow channel 112 are isolated from each other, and each first flow channel 111 is independent of each other, while each second flow channel 112 is interconnected. One or more second exhaust ports 114 can be provided. When there is only one second exhaust port 114, it can be connected to the overall interconnected space formed by all the second flow channels 112, achieving centralized discharge of gas from all the second flow channels 112. When there are multiple second exhaust ports 114, they can be distributed at different locations within the interconnected space of the second flow channels 112 to more efficiently exhaust gas from each area.

[0048] It is understood that in other embodiments, the first flow channels 111 can be configured to be interconnected, and the second flow channels 112 can be configured to be independent of each other. For example, for reactive gases with high fluidity such as oxygen, multiple flow channel structures can correspond to one exhaust port structure; while for reactive gases with relatively low fluidity such as water, a single flow channel structure can correspond to one exhaust port structure, thereby improving the gas extraction effect and effectively reducing residue.

[0049] Please see Figure 3 In some embodiments, the partition component 12 further includes a plurality of sub-ribs 124 spaced apart within the first flow channel 111, wherein the length direction of each sub-rib 124 within the first flow channel 111 is consistent with the extension direction of the first flow channel 111.

[0050] Similarly, the partition assembly 12 includes a plurality of sub-ribs 124 spaced apart within the second flow channel 112, wherein the length direction of each sub-rib 124 within the second flow channel 112 is consistent with the extension direction of the second flow channel 112.

[0051] Sub-ribs 124 are slender isolation structures, spaced apart within the first flow channel 111 and the second flow channel 112, with their length parallel to the flow channel extension direction. During operation, as gas flows along the flow channel extension direction, the sub-ribs 124 act as internal barriers to prevent gas molecule diffusion, further reducing the probability of different reactive gases meeting and reacting within the exhaust channel 110. Furthermore, the second ribs 122 and the third ribs 123 can be connected to the sub-ribs 124 to alter the distribution of the first and second flow channels 111 and 112, facilitating the matching of changes in parameters such as the source spacing of the spray assembly 11.

[0052] In some embodiments, the spraying mechanism 10 further includes a cover plate disposed on the side of the spraying assembly 11 facing away from the substrate 30. The cover plate seals the exhaust channel 110 and abuts against the partition assembly 12, thereby isolating the first flow channel 111 from the second flow channel 112. Specifically, the edge of the cover plate can cooperate with the outer peripheral wall of the spraying assembly 11 to form an integral closed structure, and a sealing gasket can be provided at the part abutting against the partition assembly 12 to improve the isolation effect. A sealing gasket is provided at the abutment between the partition assembly and the inner wall of the exhaust channel. Specifically, the sealing gasket can be disposed at the upper end and / or lower end of the partition assembly 12, which provides better sealing than direct abutment of rigid parts. The sealing gasket material is preferably fluororubber to cope with the corrosion of the reaction gas and the temperature environment, and to reduce the frequency of maintenance and replacement.

[0053] In other embodiments, the spray mechanism 10 may also not include a cover plate. The spray mechanism 10 is installed in the reaction chamber 20, and the inner wall of the chamber cover can act as a cover plate to abut against the partition assembly 12, thereby isolating the first flow channel 111 from the second flow channel 112.

[0054] Please see Figure 2 In some embodiments, the thin film deposition apparatus 100 further includes a particle trap 40 having an inlet end 41 and an outlet end 42 opposite to each other. The pump body 50 is connected to the outlet end 42. Of the two sets of pipelines corresponding to the first exhaust port 113 and the second exhaust port 114, one set is connected upstream of the inlet end 41 and the other set is connected downstream of the outlet end 42.

[0055] For example, if the pipe corresponding to the first exhaust port 113 is connected upstream of the inlet 41 of the particulate filter 40, the first reacting gas enters the particulate filter 40 for filtration. If the pipe corresponding to the second exhaust port 114 is connected downstream of the outlet 42 of the particulate filter 40, the second reacting gas flows directly to the pump body 50 without passing through the particulate filter 40. During operation, the first reacting gas flows from the first exhaust port 113 into the particulate filter 40 through the pipe, is filtered, flows out from the outlet 42, and enters the pump body 50; the second reacting gas flows directly from the second exhaust port 114 into the inlet of the pump body 50 through the pipe. The two gases remain physically isolated in the extraction path, preventing them from mixing and reacting inside the pipe. Compared to the method where the pipes corresponding to the first exhaust port 113 and the second exhaust port 114 are both connected upstream of the inlet end 41 of the particulate filter 40, this method can prevent the first reacting gas and the second reacting gas from reacting in the pipe upstream of the inlet end 41 of the particulate filter 40 and flowing back into the reaction chamber 20. This method further delays the meeting time of the first reacting gas and the second reacting gas in the exhaust path, and uses the particulate filter to prevent the downstream reaction products from flowing back, thereby effectively reducing the risk of particulate contamination in the reaction chamber 20.

[0056] The above description is only a part of the embodiments of this application and does not limit the scope of protection of this application. Any equivalent device or equivalent process transformation made based on the content of this application specification and drawings, or direct or indirect application in other related technical fields, are similarly included in the patent protection scope of this application.

Claims

1. A spraying mechanism, characterized in that, include: The spray assembly has multiple staggered and spaced first spray zones and second spray zones, wherein the first spray zones are used to spray a chemical source onto the substrate, and the second spray zones are used to spray a barrier gas onto the substrate. The spray assembly is provided with an exhaust channel on the side facing away from the substrate. The exhaust channel includes a first flow channel and a second flow channel. The first flow channel and the second flow channel are isolated from each other. The exhaust channel is provided with a first exhaust port communicating with each of the first flow channels and a second exhaust port communicating with each of the second flow channels. The chemical source includes a first reactive gas and a second reactive gas. The first spray zone spraying the first reactive gas corresponds to the first flow channel, and the first spray zone spraying the second reactive gas corresponds to the second flow channel.

2. The spraying mechanism according to claim 1, characterized in that, The exhaust channel is provided with a partition component, which includes a plurality of spaced first ribs, each of the first ribs being at least partially parallel to each other, and adjacent first ribs defining a first flow channel and a second flow channel; a single first spray zone corresponds to a single first flow channel or a single second flow channel.

3. The spraying mechanism according to claim 2, characterized in that, The separating component includes a plurality of second ribs, which are connected between the ends of two first ribs to form a wave-shaped partition, so that the exhaust channel forms independent exhaust regions on both sides of the separating component, and the first reactant gas in the first flow channel and the second reactant gas in the second flow channel leave the exhaust channel from their respective exhaust regions.

4. The spraying mechanism according to claim 3, characterized in that, Multiple second ribs are parallel to each other, and the first rib and the second ribs are connected to form rectangular wave-shaped dividing ribs.

5. The spraying mechanism according to claim 3, characterized in that, The first exhaust port is provided with multiple first exhaust ports, and any one of the first exhaust ports is connected to each of the first flow channels; and / or The second exhaust port is provided in multiple ways, and each second exhaust port is connected to each of the second flow channels.

6. The spraying mechanism according to claim 2, characterized in that, Each of the first flow channels and the second flow channels is independent of each other, and the exhaust area between adjacent first ribs is provided with a first exhaust port or a second exhaust port.

7. The spraying mechanism according to claim 6, characterized in that, Each of the first flow channels is provided with a first exhaust port at both ends; and / or Each of the second flow channels is provided with a second exhaust port at both ends.

8. The spraying mechanism according to claim 2, characterized in that, The separating component further includes a plurality of third ribs. The first ribs are arranged in pairs. One end of each pair of first ribs is connected to the edge of the spray component, and the other end is connected to the third rib, so that each pair of first ribs, the interconnected third ribs, and the edge of the spray component define an independent first flow channel. A plurality of first exhaust ports are provided, and each first flow channel is connected to at least one first exhaust port.

9. The spraying mechanism according to any one of claims 2-8, characterized in that, The separating component further includes a plurality of sub-ribs spaced apart within the first flow channel, wherein the length direction of each sub-rib within the first flow channel is consistent with the extension direction of the first flow channel; and / or The separating component includes a plurality of sub-ribs spaced apart within the second flow channel, wherein the length direction of each sub-rib within the second flow channel is consistent with the extension direction of the second flow channel.

10. The spraying mechanism according to any one of claims 1-8, characterized in that, A gap is provided between the first spray zone and the second spray zone, and the gap connects the exhaust channel and the side of the spray assembly facing the substrate.

11. The spraying mechanism according to claim 2, characterized in that, A sealing gasket is provided at the point where the partition component abuts against the inner wall of the exhaust channel.

12. A thin film deposition apparatus, characterized in that, include: Reaction chamber; The spraying mechanism as described in any one of claims 1-11, wherein the first spraying zone and the second spraying zone of the spraying mechanism face the interior of the reaction chamber; The pump body is connected to the first exhaust port and the second exhaust port.

13. The thin film deposition apparatus according to claim 12, characterized in that, It also includes a particulate trap having an inlet and an outlet, the pump body being connected to the outlet, and one of the two sets of pipes corresponding to the first and second exhaust ports being connected upstream of the inlet and downstream of the outlet.

14. The thin film deposition apparatus according to claim 12, characterized in that, It also includes a transmission mechanism. The reaction chamber has a substrate inlet and a substrate outlet. The transmission mechanism can drive the substrate from the substrate inlet to the substrate outlet. The direction of substrate movement is consistent with the arrangement direction of the first spray zone and the second spray zone.

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