High-power spiral wave plasma source device

Abstract

The invention relates to a high-power spiral wave plasma source device, and belongs to the technical field of plasma sources. According to the device, water-cooling flanges with different designs are combined with inner and outer quartz tubes to form three water-cooling passages which can be independent or connected in series, and a water-cooling spiral wave antenna is adopted. The interior of the inner quartz tube can be tightly connected with a high-vacuum device connected with the device, working medium gas conveying is completed, and the problem that the vacuum degree is reduced due to overheating of the connecting position is solved; the quartz tube is broken due to overheating; ohm heating is serious, so that the temperature of the antenna rises, and high-power long-time steady-state operation of the spiral wave source is difficult to achieve. Meanwhile, the supporting component is arranged to ensure safety and stability of the quartz tube. The device can support long-time hour steady-state discharge of different gases under the conditions of low air pressure (10 <-1 > Pa) and high power (20 kW), and provides a reliable high-density plasma generation source for research on interaction between plasma and wall materials.

Description

Technical Field

[0001] This invention relates to a high-power spiral wave plasma source device, belonging to the field of plasma source technology. Background Technology

[0002] As the most promising device for achieving controlled nuclear fusion, the tokamak has seen rapid development in recent years. However, in-depth research on plasma-wall material interaction (PWI) in tokamak devices faces significant limitations. For example, tokamak experiments are extremely expensive, and the limitations of diagnostics and the complexity of discharge conditions make it difficult to fully understand the physical processes. Existing tokamas struggle to achieve long-pulse steady-state discharges on the scale of fusion reactors. Although the EAST superconducting tokamak device has achieved a 1066-second high-confinement mode discharge, it still lags far behind the steady-state discharges of future reactors.

[0003] Compared to tokamak devices, linear plasma devices can achieve long pulses and steady-state discharges, have lower experimental costs and are easier to diagnose, and offer greater flexibility in experimental design and operation. Based on these advantages, linear plasma devices have been widely used to study the interaction between plasma and wall materials.

[0004] A spiral wave plasma source is a wave-driven plasma source that excites plasma through a specific antenna under a background magnetic field. It can generate uniform, high-density (10⁻⁶) plasma. 17 ~10 19 m -3 The helical wave source is used to achieve steady-state discharge of plasma, which is then used to study the interaction between plasma and wall materials, boundary plasma transport, high-parameter plasma sources, and ion cyclotron resonance heating, among other related physical processes. However, achieving high plasma parameters requires operation at high power (around 20kW), and experiments typically conducted on linear devices place high demands on the steady-state operating time of the helical wave source. Therefore, long-term high-power operation poses significant challenges to the cooling efficiency and vacuum sealing of the helical wave source.

[0005] Meanwhile, as the medium for transferring energy from the power source to the plasma, the antenna is the core and key component of the helical wave plasma source. A well-designed antenna system plays a crucial role in generating stable and efficient helical wave plasma. Based on the spatial relationship between the antenna and the vacuum chamber, helical wave plasma source antenna systems mainly come in two forms: external and immersion. The external type places the antenna outside the vacuum chamber, preventing it from contacting the vacuum chamber and effectively avoiding contamination of the sample inside the vacuum by the antenna electrodes. However, helical wave discharge requires an insulating tube as a discharge chamber, and since the antenna is external to the vacuum chamber, antenna shielding needs to be considered.

[0006] Existing spiral wave plasma sources suffer from overheating at the connection between the antenna, quartz tube, and vacuum chamber, which affects the sealing components and leads to a decrease in vacuum. Overheating and rupture of the quartz tube pose safety hazards, making it difficult for the spiral wave source to achieve high-power, long-term steady-state operation. Under high power operation, the current inside the antenna is large, and ohmic heating is very serious. If the antenna temperature continues to rise, it will seriously affect the discharge stability, and in severe cases, it may even burn out the electrodes.

[0007] Therefore, there is an urgent need for a high-power spiral wave plasma source with high cooling efficiency and high vacuum sealing. Summary of the Invention

[0008] To address the problems in existing technologies, such as overheating at the connection between the antenna and quartz tube and the vacuum chamber leading to a decrease in vacuum; overheating of the quartz tube causing breakage; and severe ohmic heating leading to increased antenna temperature, making it difficult for helical wave sources to achieve high-power, long-term steady-state operation, this invention provides a high-power helical wave plasma source with high cooling efficiency and high vacuum sealing. This source is suitable for high-power helical wave plasma source systems in linear plasma devices, and is particularly applicable to various plasma-related devices requiring high plasma parameters and high-power, long-term steady-state discharge.

[0009] The technical solution adopted in this invention is: a high-power spiral wave plasma source device, which includes an inner quartz tube, an outer quartz tube, and a water-cooled spiral wave antenna, all mounted coaxially. The inner quartz tube is coaxially mounted with an air-injection water-cooled flange and a water-cooled connecting support at both ends. The two ends of the inner quartz tube are respectively inserted into the annular grooves of the air-injection water-cooled flange and the water-cooled connecting support. A polytetrafluoroethylene gasket is provided in the annular groove. The inner quartz tube is fitted with a sealing ring and a water-cooled flange, and the sealing ring is pressed by the boss of the water-cooled flange. The gas-injection water-cooled flange has a hollow gas-injection flange cavity inside. The gas-injection water-cooled flange is provided with a gas injection port and a gas-injection water-cooled flange water inlet. The gas-injection water-cooled flange and the gas-injection water-cooled flange water inlet form a first water-cooling passage. The water-cooled connecting support has a water-cooled support cavity inside, and a water-cooled connecting support water inlet communicating with the water-cooled support cavity is provided on the water-cooled connecting support. The water-cooled connecting support and the water-cooled connecting support water inlet form a second water-cooling passage. The outer quartz tube is coaxially installed outside the inner quartz tube. Both ends of the outer quartz tube are respectively inserted into the annular groove of the water-cooled flange. A polytetrafluoroethylene gasket is provided in the annular groove of the flange. The inner diameter of the outer quartz tube is larger than the outer diameter of the inner quartz tube. There is a tube wall sandwich between the outer quartz tube and the inner quartz tube. The outer quartz tube is fitted with a sealing ring and a clamping flange, and the sealing ring is clamped by a coaxial clamping flange boss; The water-cooled flange has a convex structure that connects to the water inlet of the water-cooled flange. The water-cooled flanges at both ends of the quartz tube, the water inlet of the water-cooled flange, and the interlayer of the tube wall constitute a third water-cooling passage. One end of the quartz tube has a compression flange, a water-cooled flange, and an air-injection water-cooled flange connected together by bolts; the other end of the quartz tube has a compression flange, a water-cooled flange, and a water-cooled connection support connected together by bolts. The water-cooled spiral wave antenna is provided with a spiral wave antenna cavity inside, and the water-cooled spiral wave antenna and the water-cooled spiral wave antenna water inlet form a fourth water-cooling path. Each water-cooling passage contains at least two inlets, one of which is used as the inlet and the other as the outlet, and the coolant flows in each water passage.

[0010] Furthermore, each water-cooling passage is connected to the cooling water circuit in parallel and / or series.

[0011] Furthermore, in the third water-cooling passage, the water-cooling flange port at one end of the quartz tube serves as the inlet, and the water-cooling flange port at the other end serves as the outlet.

[0012] Furthermore, the water-cooled spiral wave antenna is externally nested with a separate polytetrafluoroethylene insulated antenna protective sleeve.

[0013] Furthermore, the material of the water-cooled helical wave antenna is copper.

[0014] Furthermore, the coolant is deionized water.

[0015] Furthermore, the temperature of the coolant is 20 degrees Celsius.

[0016] Furthermore, the device has an external support disc that is fixed to the gas-injection water-cooled flange by fixing bolts, and the support disc is mounted on the water-cooled connection support by a support rod.

[0017] Compared with the prior art, the present invention has the following advantages: 1. The spiral wave plasma source adopts a structure with water-cooled flange, double-layer quartz tube water cooling, and water-cooled connecting support for connecting the quartz tube to the main cavity, so that all surfaces in contact with the plasma have water cooling function. The heat generated by the discharge is carried away from all directions, ensuring that the sealing components are always in a cooled state under high power and long-term operation, thereby ensuring that the vacuum degree inside the plasma source does not change.

[0018] 2. The water-cooled structure of the helical wave antenna ensures that the working components outside the helical wave source are also kept cool, preventing the quartz tube from cracking due to the temperature difference between the inside and outside.

[0019] 3. The supporting component structure ensures the overall mechanical stability of the helical wave source and avoids breakage caused by uneven stress on the quartz tube. This allows the helical wave plasma source to operate stably for extended periods. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 Overall diagram of the device.

[0022] Figure 2 A schematic diagram of the structure of a polytetrafluoroethylene (PTFE) insulated antenna protective sleeve.

[0023] Figure 3 Cross-sectional view of the device.

[0024] Figure 4 A. Enlarged view of a specific area.

[0025] Figure 5 A' is a magnified view of a specific area.

[0026] Figure 6 A schematic diagram of the water-cooled connection base.

[0027] Figure 7 Schematic diagram of the second water-cooled flange.

[0028] Figure 8 Schematic diagram of the second clamping flange.

[0029] Figure 9 Schematic diagram of the gas injection water-cooled flange.

[0030] In the diagram: 1. Inner quartz tube; 2. Outer quartz tube; 2g. Tube wall interlayer; 3. First clamping flange; 3c. Fourth sealing ring; 3d. First clamping flange boss; 3f. Second clamping flange threaded hole; 4. First water-cooled flange; 4b. First water-cooled flange annular groove; 4c. Third sealing ring; 4d. First water-cooled flange boss; 4e. First water-cooled flange nozzle; 4f. First water-cooled flange threaded hole. 5. Gas-injected water-cooled flange, 5a. Gas injection port, 5b. Annular groove of gas-injected water-cooled flange, 5e. Water inlet of gas-injected water-cooled flange, 5f. Threaded hole of gas-injected water-cooled flange, 5g. Gas-injected flange cavity. 6. Second clamping flange; 6c. Second sealing ring; 6d. Second clamping flange boss; 6f. Second clamping flange threaded hole; 7. Second water-cooled flange; 7b. Second water-cooled flange annular groove; 7c. First sealing ring; 7d. Second water-cooled flange boss; 7e. Second water-cooled flange water inlet; 7f. Second clamping flange threaded hole. 8. Water-cooled connection support; 8a. Connection hole; 8b. Annular groove of water-cooled connection support; 8e. Water outlet of water-cooled connection support; 8f. Threaded hole of water-cooled connection support; 8g. Cavity of water-cooled support. 10. Water-cooled spiral wave antenna; 10e. Water-cooled spiral wave antenna nozzle; 11a. First PTFE insulated antenna protective sleeve; 11b. Second PTFE insulated antenna protective sleeve; 12. Support rod; 13. Support disc; 13a. Fixing bolt. Detailed Implementation

[0031] It should be noted that, unless otherwise specified, the embodiments and features described in the present invention can be combined with each other. The present invention will now be described in detail with reference to the accompanying drawings and embodiments.

[0032] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present invention or its application or use. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0033] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the scope of exemplary embodiments according to the invention. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0034] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps described in these embodiments do not limit the scope of the invention. It should also be understood that, for ease of description, the dimensions of the various parts shown in the drawings are not drawn to actual scale. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters in the following figures denote similar items; therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0035] In the description of this invention, it should be understood that the orientation or positional relationship indicated by directional terms such as "front, back, up, down, left, right", "horizontal, vertical, horizontal" and "top, bottom" is generally based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing this invention and simplifying the description. Unless otherwise stated, these directional terms do not indicate or imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the scope of protection of this invention. The directional terms "inner" and "outer" refer to the inner and outer contours relative to the outline of each component itself.

[0036] For ease of description, spatial relative terms such as "above," "over," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation besides the orientation of the device as described in the figures. For example, if the device in the figures is inverted, a device described as "above" or "above" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.

[0037] Furthermore, it should be noted that the use of terms such as "first" and "second" to define components is merely for the purpose of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore should not be construed as limiting the scope of protection of this invention.

[0038] A high-power spiral wave plasma source device, comprising: The working gas passage includes a water-cooled gas injection flange 5, a gas injection port 5a, an inner quartz tube 1, and a water-cooled connecting base 8; The first water-cooling passage for cooling the end face of the device includes an air-injection water-cooled flange 5 and an air-injection water-cooled flange inlet 5e; The second water cooling passage for water cooling of quartz tubes includes a first water cooling flange 4, a first water cooling flange inlet 4e, a pipe wall jacket 2g, a second water cooling flange 7, and a second water cooling flange inlet 7e. A third water-cooling passage for water cooling at the connection between the device and the installation equipment, including a water-cooling connection base 8 and a water-cooling connection support inlet 8e; The fourth water-cooling path for water cooling of the helical wave antenna includes the water-cooled helical wave antenna 10 and the water-cooled helical wave antenna nozzle 10e.

[0039] The water-cooled connection support 8 is provided with an outwardly extending rod, and a connection hole 8a is provided on the extension rod. The bottom surface of the water-cooled connection support 8 can be designed according to specific sealing requirements.

[0040] During assembly, all components are coaxially mounted, and there are at least two water inlets in all water passages, all of which can be used for water inlet or outlet.

[0041] Press the water-cooled connection support 8 into the equipment to be installed through the pre-drilled connection hole 8a on the outside.

[0042] The water-cooled connecting support 8 has a hollow water-cooled support cavity 8g, and is provided with at least two water-cooled connecting support inlets 8e for coolant inlet and outlet, forming a third water-cooling passage. The third water-cooling passage enables the water-cooled connecting support 8 to cool the equipment to be installed, and enables the water-cooled connecting support 8 itself to cool directly in front of the plasma during the discharge process; at the same time, it enables the cooling of the first sealing ring 7c, ensuring that the seal does not age due to overheating and reduce its sealing performance.

[0043] One end of the inner quartz tube 1 is installed into the annular groove 8b of the water-cooled connection support. A polytetrafluoroethylene pad is pre-laid in the groove to buffer the hard contact between the quartz tube and the metal and prevent the quartz tube from breaking.

[0044] The second water-cooled flange 7 has a second water-cooled flange boss 7d on its exterior.

[0045] A first sealing ring 7c is fitted onto the outside of the inner quartz tube 1, and then a second water-cooled flange 7 is fitted onto the inner quartz tube 1, making contact with the water-cooled connecting support 8 and the first sealing ring 7c. The boss 7d of the second water-cooled flange presses against the first sealing ring 7c, achieving a seal between the outside of the inner quartz tube 1 and the second water-cooled flange 7 and the water-cooled connecting base 8.

[0046] The second water-cooled flange 7 has a convex cavity inside. The upper part of the convex cavity is the inner edge of the annular groove 7b of the second water-cooled flange, and the lower part is connected to the water inlet 7e of the second water-cooled flange.

[0047] The outer quartz tube 2 is placed in the annular groove 7b of the second water-cooled flange. A polytetrafluoroethylene gasket is pre-laid in this groove to buffer the hard contact between the quartz tube and the metal, preventing the quartz tube from breaking. At the same time, it achieves a seal between the outer quartz tube 2 and the second water-cooled flange 7.

[0048] A second sealing ring 6c is fitted onto the outside of the outer quartz tube 2. A second clamping flange 6 is then fitted onto the outside of the outer quartz tube 2 and placed on the second sealing ring 6c, contacting the second water-cooled flange 7. The boss 6d of the second clamping flange presses against the second sealing ring 6c, achieving a seal between the outer quartz tube 2, the second clamping flange 6, and the second water-cooled flange 7. The outer quartz tube 2 is fitted onto the outside of the inner quartz tube 1, and the cavity formed between the outer wall of the inner quartz tube 1 and the inner wall of the outer quartz tube 2 is a tube wall interlayer 2g.

[0049] Align the threaded holes 6f and 7f of the second clamping flange with the threaded hole 8f of the water-cooled connection support, and tighten them with bolts.

[0050] The water-cooled helical wave antenna 10 is made of hollow copper. The antenna RF current feed end and the ground end have water-cooled helical wave antenna water inlet 10e, forming a fourth water-cooling path, which is used to continuously cool the antenna with water when the load is high power.

[0051] The water-cooled helical wave antenna 10 is externally nested with a separate PTFE (polytetrafluoroethylene) insulated antenna protective sleeve. During installation, first, the second PTFE insulated antenna protective sleeve 11b is placed over the outer quartz tube 2. Then, the helical wave antenna is placed over the outer quartz tube 2 and nested inside the second PTFE insulated antenna protective sleeve 11b. Finally, the first PTFE insulated antenna protective sleeve 11a is placed over the outer quartz tube 2. The first and second PTFE insulated antenna protective sleeves are then combined and their positions adjusted. The PTFE insulated antenna protective sleeve nested outside the helical wave antenna prevents arcing caused by excessive voltage at high power levels and also protects personnel safety during discharge.

[0052] The other end of the inner quartz tube 1 is equipped with a gas injection water-cooled flange 5, which serves as the end face of the device. The gas injection water-cooled flange 5 is provided with a gas injection port 5a for injecting working gas into the inner quartz tube 1. The working gas passes through the inner quartz tube 1 and enters the equipment connected by the water-cooled connecting support 8, without leaking to the outside of the device.

[0053] The structure of the first clamping flange 3 is the same as that of the second clamping flange 6, and the structure of the first water-cooled flange 4 is the same as that of the second water-cooled flange 7. The inner structure of the gas-injection water-cooled flange 5 is the same as that of the water-cooled connecting support 8. The inner quartz tube 1 is installed into the annular groove 5b of the gas-injection water-cooled flange. A polytetrafluoroethylene gasket is pre-laid in the groove to buffer the hard contact between the quartz tube and the metal and prevent the quartz tube from breaking. The first clamping flange 3, the fourth sealing ring 3c, the first water-cooled flange 4, the third sealing ring 4c, and the gas-injection water-cooled flange 5 are placed in sequence and connected to the quartz tube in the same way. Finally, they are fixed with bolts.

[0054] The water-cooled flange has at least two inlets for water inlet and outlet. A cavity is formed by the outer wall of the inner quartz tube 1, the convex interior of the water-cooled flange, and the inner wall of the outer quartz tube 2. The interlayer 2g of the tube wall is connected to the inlets of the water-cooled flange, forming a second water-cooling passage. This second water-cooling passage cools both the inner and outer quartz tubes 1 and removes the heat applied to the inner side of the inner quartz tube 1 by the plasma during the discharge process. Simultaneously, it ensures the cooling of the sealing rings, preventing overheating and aging, thus guaranteeing a good seal.

[0055] The gas-injection water-cooled flange 5 has a hollow gas-injection flange cavity 5g and at least two gas-injection water-cooled flange inlets 5e for coolant inlet and outlet, forming a first water-cooling passage. The first water-cooling passage enables the gas-injection water-cooled flange 5, which is directly exposed to the plasma during the discharge process, to achieve water cooling itself; at the same time, it enables the cooling of the third sealing ring 4c, ensuring that the sealing element does not age due to overheating and reduce its sealing performance.

[0056] The coolant can be connected in series in sequence to achieve the cooling effect while simplifying the water circuit.

[0057] The coolant used is deionized water, which improves the efficiency of the plasma absorption RF antenna power. A cooling system is used to maintain the coolant temperature at approximately 20 degrees Celsius.

[0058] When the above technical solution is used, the coolant is first introduced through the water-cooled connecting support inlet 8e, passes through the third water-cooling passage, and is discharged from another inlet of the water-cooled connecting support 8; it is divided into four paths and connected to the second water-cooled flange inlet 7e respectively, passes through the second water-cooling passage, flows through the interlayer of the inner quartz tube 1 and the outer quartz tube 2, and flows out from the first water-cooled flange inlet 4e, merging into one path; it enters the air-injection water-cooled flange inlet 5e, passes through the first water-cooling passage; flows out from another inlet of the air-injection water-cooled flange 5, enters the water-cooled spiral wave antenna inlet 10e, and finally flows out from another inlet of the water-cooled spiral wave antenna 10.

[0059] Preferably, the device is used horizontally. When the device is running, water is only introduced through the lower water inlet of the first water-cooled flange 4 and discharged through the upper water inlet of the second water-cooled flange 7. The other water inlets are closed. In this way, when the device is in use, the coolant enters from the bottom and exits from the top in the space between the two walls, which can fill the space between the two walls with coolant, making it less likely to generate air bubbles. The coolant is evenly distributed and prevents the quartz tube from breaking due to uneven heating and cooling.

[0060] The coolant can also be connected in parallel to each independent water circuit through the inlets on each component, resulting in better cooling performance.

[0061] All components are fixed on the inner quartz tube 1 and the outer quartz tube 2. The total weight of the flange is relatively large, which can easily cause the quartz tube to break under the load. A support disc 13 is set up to support the three components and then the support rod 12 connects them to the water-cooled connection support 8 to reduce the stress on the quartz tube, stabilize the mechanical structure, and ensure the stability of the device.

[0062] Four support rods 12 are bolted to the four outer rods of the water-cooled connecting support 8, and the other end is bolted to the support disc 13. The air-injection water-cooled flange 5 is fixed to the center of the support disc using fixing bolts 13a. This ensures a stable connection for the mechanical structure.

[0063] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A high-power helical wave plasma source device, comprising an inner quartz tube, an outer quartz tube, and a water-cooled helical wave antenna mounted coaxially, characterized in that: The inner quartz tube is coaxially mounted with an air-injection water-cooled flange and a water-cooled connecting support at both ends. The two ends of the inner quartz tube are respectively inserted into the annular grooves of the air-injection water-cooled flange and the water-cooled connecting support. A polytetrafluoroethylene gasket is provided in the annular groove. The inner quartz tube is fitted with a sealing ring and a water-cooled flange, and the sealing ring is pressed by the boss of the water-cooled flange. The gas-injection water-cooled flange has a hollow gas-injection flange cavity inside. The gas-injection water-cooled flange is provided with a gas injection port and a gas-injection water-cooled flange water inlet. The gas-injection water-cooled flange and the gas-injection water-cooled flange water inlet form a first water-cooling passage. The water-cooled connecting support has a water-cooled support cavity inside, and a water-cooled connecting support water inlet communicating with the water-cooled support cavity is provided on the water-cooled connecting support. The water-cooled connecting support and the water-cooled connecting support water inlet form a second water-cooling passage. The outer quartz tube is coaxially installed outside the inner quartz tube. Both ends of the outer quartz tube are respectively inserted into the annular groove of the water-cooled flange. A polytetrafluoroethylene gasket is provided in the annular groove of the flange. The inner diameter of the outer quartz tube is larger than the outer diameter of the inner quartz tube. There is a tube wall sandwich between the outer quartz tube and the inner quartz tube. The outer quartz tube is fitted with a sealing ring and a clamping flange, and the sealing ring is clamped by a coaxial clamping flange boss; The water-cooled flange has a convex structure that connects to the water inlet of the water-cooled flange. The water-cooled flanges at both ends of the quartz tube, the water inlet of the water-cooled flange, and the interlayer of the tube wall constitute a third water-cooling passage. One end of the quartz tube has a compression flange, a water-cooled flange, and an air-injection water-cooled flange connected together by bolts; the other end of the quartz tube has a compression flange, a water-cooled flange, and a water-cooled connection support connected together by bolts. The water-cooled spiral wave antenna is provided with a spiral wave antenna cavity inside, and the water-cooled spiral wave antenna and the water-cooled spiral wave antenna water inlet form a fourth water-cooling path. Each water-cooling passage contains at least two inlets, one of which is used as the inlet and the other as the outlet, and the coolant flows in each water passage.

2. The high-power spiral wave plasma source device according to claim 1, characterized in that: Each water-cooling passage is connected to the cooling water circuit in parallel and / or in series.

3. The high-power spiral wave plasma source device according to claim 1, characterized in that: In the third water-cooling passage, the water-cooling flange at one end of the quartz tube serves as the inlet, and the water-cooling flange at the other end serves as the outlet.

4. The high-power spiral wave plasma source device according to claim 1, characterized in that: The water-cooled spiral wave antenna is externally nested with a separate polytetrafluoroethylene insulated antenna protective sleeve.

5. A high-power spiral wave plasma source device according to claim 4, characterized in that: The water-cooled helical wave antenna is made of copper.

6. A high-power spiral wave plasma source device according to claim 1, characterized in that: The coolant is deionized water.

7. A high-power spiral wave plasma source device according to claim 6, characterized in that: The temperature of the coolant is 20 degrees Celsius.

8. A high-power spiral wave plasma source device according to any one of claims 1-7, characterized in that: The device has an external support disc that is fixed to the gas injection water-cooled flange by fixing bolts. The support disc is mounted on the water-cooled connection support by a support rod.

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