Focal plane adjusting mechanism of exposure lens device

Abstract

The invention provides a focal plane adjusting mechanism of an exposure lens device, and the focal plane adjusting mechanism comprises a fixed plate fixedly connected with an optical lens assembly, and a connecting plate movably connected to one side, far away from the optical lens assembly, of the fixed plate, the connecting plate is used for installing a DMD assembly, and an installation position with a minimum gap is arranged between the fixed plate and the connecting plate. The focal plane adjusting mechanism further comprises a plurality of adjusting assemblies, each adjusting assembly comprises a matching block fixedly connected with the connecting plate and an adjusting piece in threaded connection with the matching block, each adjusting piece comprises an operation section located at one end and an abutting section located at the other end, and after the adjusting pieces are in threaded connection with the matching blocks, the abutting sections abut against the fixing plate. According to the focal plane adjusting mechanism provided by the invention, by adjusting the adjusting piece of each adjusting assembly, the focal plane position of the exposure lens device can be adjusted, and the focal plane of the exposure lens device can be leveled. Compared with an existing adjusting mode, the adjusting process is simplified, and the adjusting time is shortened.

Description

Technical Field

[0001] This invention relates to the field of direct-write lithography technology, and more particularly to a focal plane adjustment mechanism for an exposure lens device. Background Technology

[0002] Direct-write lithography is widely used in the semiconductor and PCB manufacturing industries and is an important process for manufacturing semiconductor devices, chips, and PCB boards.

[0003] In direct-write lithography machines, the exposure lens assembly typically consists of a light source, a DMD (Digital Modulator-Distributor) module, and an optical lens module. During installation, the focal plane of the exposure lens assembly needs to be adjusted to ensure the pattern quality on the exposed substrate surface. After fixing the exposure lens assembly to the machine table, shims are usually placed between the flange connecting the optical lens module and the machine table surface. By repeatedly increasing or decreasing the shim thickness and adjusting its position, the exposure position and tilt angle of the focal plane of the exposure lens assembly can be changed. However, the manually installed shim position is uncertain, requiring continuous trial and error, making it difficult to achieve the theoretical precision requirements of the exposure lens assembly. This results in a cumbersome adjustment process that consumes a significant amount of time. Furthermore, because the shims are added at the flange, they are greatly affected by the arrangement of the space above. Summary of the Invention

[0004] The technical problem to be solved by the present invention is to provide a focal plane adjustment mechanism for an exposure lens device that can adjust the focal plane of the exposure lens device without adding shims.

[0005] To achieve one of the above-mentioned objectives, the present invention provides a focal plane adjustment mechanism for an exposure lens apparatus, the exposure lens apparatus comprising a DMD assembly and an optical lens assembly, the focal plane adjustment mechanism comprising: A fixing plate is fixedly connected to the optical lens assembly; A connecting plate, movably connected to the side of the fixing plate away from the optical lens assembly, is used to mount the DMD assembly, and the mounting position has a minimum gap between the fixing plate and the connecting plate; Multiple sets of adjustment components are used to adjust the distance between the connecting plate and the fixed plate. Each set of adjustment components includes a mating block fixedly connected to the connecting plate and an adjustment member threadedly connected to the mating block. The adjustment member includes an operating section at one end and an abutting section at the other end. After the adjustment member is threadedly connected to the mating block, the abutting section abuts against the fixed plate.

[0006] As a further improvement of the present invention, the focal plane adjustment mechanism includes at least three sets of adjustment components, each set of adjustment components being disposed at the corner of the connecting plate.

[0007] As a further improvement of the present invention, the connecting plate includes a groove disposed on one side near the fixing plate, a first through hole penetrating the connecting plate along a first direction and communicating with the groove, and the mating block is installed in the groove; The mating block has a first threaded hole that extends through in a first direction. The diameter of the first through hole is larger than the diameter of the first threaded hole. The adjusting member includes a mating section located between the operating section and the abutting section. When the abutting section abuts against the fixing plate, the mating section is located inside the first through hole and the first threaded hole. The mating section is provided with a first external thread that mates with the first threaded hole.

[0008] As a further improvement of the present invention, the connecting plate has a second threaded hole extending along a second direction and communicating with the groove, and the focal plane adjustment mechanism includes a first locking member that engages with the second threaded hole. The first locking member presses against the mating block so that the side of the mating block away from the first locking member abuts against the inner wall of the groove, and the second direction is a direction perpendicular to the first direction.

[0009] As a further improvement of the present invention, the mating block has an opening groove extending along a second direction and communicating with the first threaded hole. The opening groove divides the mating block into a first segment and a second segment spaced apart along a first direction. The first segment is located on the side away from the fixed plate. The first locking member abuts against the first segment. The end face of the second segment has a gap with the side wall of the groove. The focal plane adjustment mechanism includes a first positioning hole penetrating the connecting plate along a first direction, a second positioning hole penetrating the first segment along a first direction, and a third threaded hole penetrating the second segment along a first direction. The diameters of the first positioning hole and the second positioning hole are both larger than the diameter of the third threaded hole. The focal plane adjustment mechanism also includes a first fastener located simultaneously in the first positioning hole, the second positioning hole, and the third threaded hole. The first fastener is threadedly connected to the third threaded hole.

[0010] As a further improvement of the present invention, the thickness of the first segment along the first direction is greater than the thickness of the second segment along the first direction.

[0011] As a further improvement of the present invention, the adjusting member has a third through hole coaxially disposed with the mating section, the third through hole passing through the operating section, the mating section and the abutting section in sequence along a first direction; the focal plane adjusting mechanism includes a fourth threaded hole disposed on the fixing plate and corresponding to the third through hole, and a second fastener located in the third through hole and the fourth threaded hole and threadedly connected to the fourth threaded hole.

[0012] As a further improvement of the present invention, the abutting section is a spherical surface, and the fixing plate is provided with a spherical groove that abuts against the spherical surface, and the spherical groove is connected to the fourth threaded hole.

[0013] As a further improvement of the present invention, the focal plane adjustment mechanism includes a first locking component and a second locking component. The first locking component includes a first locking screw that passes through the connecting plate and is threadedly connected to the fixing plate, and an elastic piece sleeved on the first locking screw. The connecting plate is provided with a first countersunk hole. One side of the elastic piece abuts against the cap end of the first locking screw, and the other side abuts against the bottom wall of the first countersunk hole. The second locking assembly includes a second locking screw that passes through the connecting plate and is threaded to the fixing plate, and an elastic element sleeved on the second locking screw. The connecting plate is provided with a second countersunk hole. One side of the elastic element abuts against the cap end of the second locking screw, and the other side abuts against the bottom wall of the second countersunk hole. The second locking screw has a second stepped surface that abuts against the fixing plate.

[0014] As a further improvement of the present invention, the fixing plate is provided with a through hole extending along a first direction, and the connecting plate is provided with a positioning platform protruding on the side near the fixing plate. The positioning platform is installed in the through hole, and an annular groove is provided around the positioning platform. A sealing ring is installed in the annular groove and fits against the hole wall of the through hole. The connecting plate is provided with a positioning groove for installing the DMD component and a light outlet hole connecting the positioning groove and the through hole on the side away from the fixing plate.

[0015] Compared with existing technologies, the focal plane adjustment structure of the present invention is provided with multiple sets of adjustment components. By adjusting the adjusting parts of each adjustment component, the left-right tilt angle and front-back tilt angle of the DMD component mounted on the connecting plate can be adjusted. This not only allows the focal plane of the exposure lens device to be leveled, but also adjusts the focal plane position of the exposure lens device. For lithography machines with multiple exposure lens devices, adjusting the focal plane position of each exposure lens device through the focal plane adjustment components can improve the consistency of the depth of focus of multiple exposure lens devices and improve the quality of the exposed pattern. In addition, when adjusting the focal plane of the exposure lens device, the focal plane adjustment mechanism of the present invention does not require repeatedly increasing or decreasing the thickness of the shims and adjusting the placement of the shims, thereby simplifying the adjustment process and reducing the adjustment time. Attached Figure Description

[0016] Figure 1 This is an assembly diagram of the exposure lens device and the focal plane adjustment mechanism; Figure 2 This is an exploded view of the focal plane adjustment mechanism; Figure 3 yes Figure 1 Top view of the center focal plane adjustment mechanism; Figure 4 yes Figure 3 Schematic diagram of the cross section at point AA; Figure 5 yes Figure 3 Schematic diagram of the cross section at point BB; Figure 6 yes Figure 3 Cross-sectional view at point CC; Figure 7 yes Figure 2 Enlarged diagram of point D in the middle. Detailed Implementation

[0017] To make the objectives, technical solutions, and advantages of the present invention clearer, the present invention will be described below with reference to specific embodiments shown in the accompanying drawings.

[0018] The exposure lens device of the present invention includes a DMD component 100 and an optical lens component 200. Specifically, the exposure lens device also includes an illumination part. The laser is connected to the illumination part through an optical fiber and then reflected obliquely upward through a mirror inside the exposure lens device to the DMD component 100. The DMD component 100 is located on the light-incident side of the optical lens component 200. The DMD component 100 generates light with a modulation pattern, and then the optical lens component 200 projects the light with the modulation pattern onto the surface of the substrate to be exposed.

[0019] In this invention, the focal plane adjustment mechanism 300 of the exposure lens apparatus includes a fixed plate 1 fixedly connected to the optical lens assembly 200, and a connecting plate 2 movably connected to the fixed plate 1 on the side away from the optical lens assembly 200. The connecting plate 2 is used to mount the DMD assembly 100, and the fixed plate 1 and the connecting plate 2 are installed at a minimum gap. The focal plane adjustment mechanism 300 also includes multiple sets of adjustment components, which are used to adjust the distance between the connecting plate 2 and the fixed plate 1. It is understood that the distance between the connecting plate 2 and the fixed plate 1 after adjustment by the adjustment components is not less than the minimum gap.

[0020] Specifically, each adjustment assembly includes a mating block 3 fixedly connected to the connecting plate 2, and an adjustment member 4 threadedly connected to the mating block 3. The adjustment member 4 includes an operating section 41 at one end and an abutting section 42 at the other end. After the adjustment member 4 is threadedly connected to the mating block 3, the abutting section 42 abuts against the fixed plate 1. When adjusting the focal plane of the exposure lens device, since the abutting section 42 abuts against the fixed plate 1, the movement of the adjustment member 4 towards the fixed plate 1 is restricted. Rotating the operating section 41 in the forward direction will cause the mating block 3 threadedly connected to the adjustment member 4 to move away from the fixed plate 1, thereby driving the connecting plate 2 fixedly connected to the mating block 3 to move away from the fixed plate 1, thereby increasing the distance between the connecting plate 2 and the fixed plate 1. When the distance between the connecting plate 2 and the fixed plate 1 is greater than the minimum gap, the adjustment member 4 can also be rotated in the reverse direction, causing the mating block 3 to drive the connecting plate 2 towards the fixed plate 1, thereby reducing the distance between the connecting plate 2 and the fixed plate 1. The installation position where the connecting plate 2 and the fixed plate 1 are at the minimum gap is the limit position of the reverse adjustment of the adjustment member 2.

[0021] When the focal plane adjustment mechanism 300 is equipped with multiple sets of adjustment components, by adjusting the adjustment element 4 of each set of adjustment components, the connecting plate 2 and the fixed plate 1 have different distances at different positions, thereby adjusting the focal plane position of the exposure lens device and leveling the focal plane of the exposure lens device. For lithography machines equipped with multiple exposure lens devices, adjusting the focal plane position of each exposure lens device through the focal plane adjustment mechanism 300 can improve the consistency of the depth of focus of all exposure lens devices and improve the quality of the exposure pattern of the lithography machine. In addition, when adjusting the focal plane of the exposure lens device, the focal plane adjustment mechanism 300 of the present invention does not require repeatedly increasing or decreasing the thickness of the shims and adjusting the position of the shims, thereby simplifying the adjustment process and reducing the adjustment time.

[0022] In one embodiment, the operating section 41 of the adjusting member 4 is exposed on the surface of the connecting plate 2, making adjustment easier. Additionally, the operating section 41 has evenly distributed protruding teeth 411 and scale lines corresponding to the positions of the protruding teeth 411. A pointer 5 can also be mounted on the connecting plate 2. After adjusting the focal plane of the exposure lens device, the number of teeth rotated by the adjusting member 4 can be obtained by reading the scale line corresponding to the pointer 5. Then, the displacement of the connecting plate 2 driven by the mating block 3 is calculated based on the pitch of the adjusting member 4. Based on the magnification of the imaging structure determined by the optical path design, the actual adjustment distance of the focal plane can be obtained. The focal plane adjustment mechanism 300 of the present invention makes focal plane adjustment no longer solely reliant on operational experience, but supported by theoretical data. This better meets the design requirements of high-precision lenses and greatly simplifies the cumbersome operations required for adjusting the focal plane of the exposure lens device.

[0023] The focal plane adjustment mechanism 300 includes a first locking component 6 and a second locking component 7. The first locking component 6 includes a first locking screw 61 that passes through the connecting plate 2 and is threadedly connected to the fixing plate 1, and an elastic piece 62 sleeved on the first locking screw 61. The connecting plate 2 is provided with a first countersunk hole 21. One side of the elastic piece 62 abuts against the cap end of the first locking screw 61, and the other side abuts against the bottom wall of the first countersunk hole 21.

[0024] Specifically, the connecting plate 2 has a first countersunk hole 21 on the side away from the fixing plate 1 and a first communicating hole that communicates with the first countersunk hole 21 on the side closer to the fixing plate 1. The fixing plate has a first mating hole corresponding to the first communicating hole. The first mating hole has an internal thread. The diameter of the first countersunk hole 21 is larger than the diameter of the first communicating hole, and the diameter of the first communicating hole is larger than the diameter of the first mating hole. The first locking screw 61 engages with the internal thread of the first mating hole to connect the fixing plate 1 and the connecting plate 2 together. By adjusting the screwing depth of the first locking assembly 6, a gap of about 1 mm is created between the connecting plate 2 and the lower fixing plate 1.

[0025] The second locking assembly 7 includes a second locking screw 71 that passes through the connecting plate 2 and is threaded to the fixing plate 1, and an elastic member 72 sleeved on the second locking screw 71. The connecting plate 2 is provided with a second countersunk hole 22. One side of the elastic member 72 abuts against the cap end of the second locking screw 71, and the other side abuts against the bottom wall of the second countersunk hole 22. The second locking screw 71 has a second stepped surface 711 that abuts against the fixing plate 1.

[0026] Specifically, the connecting plate 2 has a second countersunk hole 22 on the side away from the fixed plate 1 and a second communicating hole communicating with the second countersunk hole 22 on the side closer to the fixed plate 1. The fixed plate has a second mating hole corresponding to the second communicating hole, and the second mating hole has an internal thread. The diameter of the second countersunk hole 22 is larger than the diameter of the second communicating hole, and the diameter of the second communicating hole is larger than the diameter of the second mating hole. The second locking screw 71 engages with the internal thread of the second mating hole to connect the fixed plate 1 and the connecting plate 2 together. Specifically, the second locking screw 71 can be a limiting stepped screw, and the elastic element 72 can be a compression coil spring. The second countersunk hole 22 limits the compression length of the compression coil spring. The elastic element 72 in the compressed state provides elastic force to the focal plane adjustment mechanism 300, giving the focal plane adjustment mechanism 300 a suitable rebound force. When adjusting the adjusting element 4 in the reverse direction, the elastic force provided by the elastic element 72 guides the connecting plate 2 to move closer to the fixed plate 1, improving the adjustment efficiency.

[0027] Furthermore, the fixing plate 1 is provided with a through hole 101 extending along a first direction. The connecting plate 2 has a protruding positioning platform 23 on its side near the fixing plate 1. The positioning platform 23 is installed in the through hole 101. The positioning platform 23 has a circumferentially arranged annular groove, and a sealing ring 8 is installed in the annular groove. The sealing ring 8 fits against the wall of the through hole 101. Specifically, the sealing ring 8 can be a silicone sealing ring. The sealing ring 8 not only provides a seal but also ensures that the DMD assembly 100 remains in its installation position without significant displacement even when the gap between the connecting plate 2 and the fixing plate 1 is large. The lower embedment depth of the connecting plate 2 is approximately 2 to 3 times the width of the annular groove, and the size of the sealing groove depends on the silicone sealing ring 8.

[0028] The connecting plate 2 has a positioning groove 24 for mounting the DMD assembly 100 on the side away from the fixing plate 1. The DMD assembly 100 is mounted on the connecting plate 2, and the positioning groove 24 can be located at the center of the connecting plate 2. The connecting plate 2 also includes a light-emitting hole 25 connecting the positioning groove 24 and the through hole 101. The light-emitting hole 25 and the through hole 101 form a light channel, allowing the modulated light emitted by the DMD assembly 100 to smoothly enter the optical lens assembly 200.

[0029] Furthermore, the focal plane adjustment mechanism 300 includes at least three sets of adjustment components, each set of adjustment components being disposed at a corner of the connecting plate 2. In one embodiment, the focal plane adjustment mechanism 300 includes three sets of adjustment components, as shown in the reference. Figure 3 As shown, the adjustment component located at the corner where the two sides of the connecting plate 2 intersect is the first adjustment component 311, and the two adjustment components located at the two opposite corners of the connecting plate 2 are the second adjustment component 312 and the third adjustment component 313, respectively. In this embodiment, the minimum gap between the fixed plate 1 and the connecting plate 2 in the assembled focal plane adjustment mechanism 300 can be 1mm. When adjusting the focal plane of the exposure lens, by adjusting the first adjustment component 311, the second adjustment component 312, and the third adjustment component 313 respectively, the first distance between the first adjustment component 311 and the fixed plate 1, the second distance between the connecting plate 2 and the fixed plate 1 at the second adjustment component 312, and the third distance between the connecting plate 2 and the fixed plate 1 at the third adjustment component 313 are changed. This adjusts the left-right tilt angle and the front-back tilt angle of the DMD component 100 mounted on the connecting plate 2, ultimately adjusting the focal plane position of the exposure lens device and leveling the focal plane to ensure the accuracy of the exposure pattern.

[0030] In other embodiments, when the focal plane adjustment mechanism 300 includes four sets of adjustment components, and all four sets of adjustment components are located at the corners of the connecting plate 2, the focal plane adjustment of the exposure lens device can be achieved by adjusting the four sets of adjustment components respectively.

[0031] Furthermore, the connecting plate 2 includes a groove disposed near the fixed plate 1 and a first through hole 26 extending through the connecting plate 2 in a first direction and communicating with the groove. The mating block 3 is installed in the groove, and the installed mating block 3 does not protrude from the surface of the connecting plate 2. The mating block 3 is embedded in the connecting plate 2, reducing the space occupied by the adjustment component.

[0032] The mating block 3 has a first threaded hole 31 that extends through the first direction. The diameter of the first through hole 26 is larger than the diameter of the first threaded hole 31. The adjusting member 4 includes a mating section 43 located between the operating section 41 and the abutting section 42. When the abutting section 42 abuts against the fixing plate 1, the mating section 43 is located inside the first through hole 26 and the first threaded hole 31. The mating section 43 is provided with a first external thread. The first external thread is engaged with the pitch and diameter of the first threaded hole 31. Through the threaded engagement of the first external thread and the first threaded hole 31, the rotating adjusting member 4 drives the mating block 3 and the connecting plate 2 to move upward, adjusting the left and right tilt angles and front and back tilt angles of the DMD assembly 100 mounted on the connecting plate 2. Ultimately, this achieves the adjustment of the focal plane position of the exposure lens device and the leveling of the focal plane, ensuring the accuracy of the exposure pattern.

[0033] The connecting plate 2 has a second threaded hole 27 extending along a second direction and communicating with the groove. The focal plane adjustment mechanism 300 includes a first locking member 9 that mates with the second threaded hole 27. The first locking member 9 presses against the mating block 3 so that the side of the mating block 3 away from the first locking member 9 abuts against the inner wall of the groove. The second direction is a direction perpendicular to the first direction. (Refer to...) Figure 2 As shown, the second direction is horizontal. Specifically, the first locking element 9 can be a locking screw. By screwing the locking screw into the second threaded hole 27 until the locking screw presses against the mating block 3, the mating block 3 abuts against the inner wall of the groove, thereby achieving a fixed connection between the mating block 3 and the connecting plate 2.

[0034] In one specific embodiment of the present invention, the mating block 3 has an opening groove 32 extending along a second direction and communicating with the first threaded hole 31. The opening groove 32 divides the mating block 3 into a first segment 33 and a second segment 34 spaced apart along a first direction. The first segment 33 is located on the side away from the fixing plate 1, and the second segment 34 is located on the side close to the fixing plate 1. The first locking member 9 abuts against the first segment 33. The end face of the second segment 34 has a gap with the side wall of the groove. Specifically, the gap can be 0.1mm to 0.2mm to ensure that there is no interference or jamming problem when adjusting the tilt angle of the DMD assembly 100.

[0035] The focal plane adjustment mechanism 300 includes a first positioning hole 28 penetrating the connecting plate 2 along a first direction, a second positioning hole 35 penetrating the first segment 33 along a first direction, and a third threaded hole penetrating the second segment 34 along a first direction. The diameters of the first positioning hole 28 and the second positioning hole 35 are both larger than the diameter of the first threaded hole. The focal plane adjustment mechanism also includes a first fastener 10 located simultaneously in the first positioning hole 28, the second positioning hole 35, and the third threaded hole. The first fastener 10 is threadedly connected to the third threaded hole. When assembling the focal plane adjustment mechanism 300, the first locking member 9 presses the first segment 33 against it. After the focal plane of the exposure lens device is adjusted, by tightening the first fastener 10, the second segment 34 at the threaded connection with the first fastener 10 undergoes an upward tilting and bending elastic deformation driven by the first fastener 10, thereby compressing the adjusting member 4 threadedly connected to the mating block 3, keeping the adjusting member 4 in the adjusted position, thus ensuring that the adjusted focal plane position of the exposure lens device remains unchanged.

[0036] Furthermore, the thickness of the first segment 33 along the first direction is greater than the thickness of the second segment 34 along the first direction, which is more conducive to the elastic deformation of the second segment 34 under the action of the first fastener 10, while also ensuring the overall strength of the mating block 3. The material of the mating block 3 can be stainless steel, which gives it considerable elasticity and toughness when facing tensile force, and prevents it from undergoing large plastic deformation.

[0037] In one specific embodiment, the adjusting member 4 has a third through hole 44 coaxially arranged with the mating section 43. The third through hole 44 passes through the operating section 41, the mating section 43 and the abutting section 42 in sequence along a first direction. The focal plane adjustment mechanism 300 includes a fourth threaded hole 102 disposed on the fixed plate 1 and corresponding to the third through hole 44, and a second fastener 11 located in the third through hole 44 and the fourth threaded hole 102 and threadedly connected to the fourth threaded hole 102. By cooperating with the second fastener 11 and the fourth threaded hole 102, the adjusting member 4 is prevented from tilting when the second section 34 squeezes the adjusting member 4, further ensuring that the adjusting member 4 remains unchanged after adjustment, thereby ensuring that the focal plane position of the exposure lens device remains unchanged after adjustment.

[0038] Furthermore, the abutment section 42 is spherical, and the fixing plate 1 is provided with a spherical groove that abuts against the spherical surface. The cooperation between the spherical surface and the spherical groove reduces the resistance during adjustment of the adjusting member 4 and also reduces wear on the abutment section 42 of the adjusting member 4 due to long-term use. In this embodiment, the spherical groove communicates with the fourth threaded hole 102.

[0039] In one embodiment of the present invention, the first direction is the vertical direction and the second direction is the horizontal direction. The specific installation and adjustment process of the focal plane adjustment device is as follows: Install the adjustment component: First, place the mating block 3 into the groove machined in the connecting plate 2, then use the first locking piece 9 to press the first section 33 in the second threaded hole 27 on the side, and finally screw the adjustment piece 4 in from top to bottom.

[0040] The silicone sealing ring 8 is fitted into the annular groove at the bottom of the connecting plate 2, and the positioning platform 23 of the connecting plate 2 continues downward to be embedded into the through hole 101 of the lower fixing plate 1. The lower embedding depth of the connecting plate 2 is approximately 2 to 3 times the width of the sealing groove, and the size of the sealing groove depends on the silicone sealing ring 8.

[0041] Install the first locking assembly 6 and the second locking assembly 7: First, pass the first locking screw 61 with the elastic plate 62 through the first countersunk hole 21 and the first connecting hole, and screw it into the first mating hole to connect the connecting plate 2 to the lower fixing plate 1. Then, put the second locking screw 71 with the compression coil spring through the second countersunk hole 22 and the second connecting hole, screw it into the second mating hole and tighten it. Adjust the screwing depth of the first locking screw 61 with the elastic plate 62 so that the gap between the two planes of the connecting plate 2 and the lower fixing plate 1 is about 1mm. The limiting surface of the second locking screw 71 is in contact with the upper plane of the lower fixing plate 1.

[0042] Install the remaining components of the focal plane adjustment device: screw the adjustment part 4 downwards until the spherical surface of the abutment section 42 contacts the spherical groove of the lower fixing plate 1, then insert the pointer 5 next to the adjustment part 4, screw in the first fastener 10 and pre-tighten it, and the basic assembly of each component of the adjustment assembly is completed.

[0043] Adjusting the focal plane of the exposure lens: After installation, the lines connecting the three adjustment components are at right angles. Rotate the adjustment parts 4 of the three adjustment components respectively, so that the connecting plate 2 at the position of the adjustment component is lifted, changing the distance between the fixed plate 1 and the connecting plate 2, adjusting the left and right tilt angles and the front and back tilt angles of the DMD component 100 installed on the connecting plate 2, and finally adjusting the focal plane position of the exposure lens device and leveling the focal plane.

[0044] After the focal plane adjustment step is completed, first tighten the second fastener 11 to connect the lower fixing plate 1, then tighten the first fastener 10 to lock the mating block 3 in place, and the focal plane of the exposure lens device will be fixed in the adjusted state.

[0045] The focal plane adjustment mechanism 300 of the present invention, when equipped with multiple sets of adjustment components, adjusts the adjustment member 4 of each set of adjustment components, and the connecting plate 2 and the fixed plate 1 have different distances at different positions, thereby adjusting the focal plane position of the exposure lens device and simultaneously leveling the focal plane of the exposure lens device. For lithography machines equipped with multiple exposure lens devices, adjusting the focal plane position of each exposure lens device through the focal plane adjustment mechanism 300 can improve the consistency of the depth of focus of all exposure lens devices and improve the quality of the exposure pattern of the lithography machine. In addition, when adjusting the focal plane of the exposure lens device, the focal plane adjustment mechanism 300 of the present invention does not require repeatedly increasing or decreasing the thickness of the shims and adjusting the placement of the shims, thereby simplifying the adjustment process and reducing the adjustment time.

[0046] The embodiments described above are merely examples of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention.

Claims

1. A focal plane adjustment mechanism for an exposure lens apparatus, the exposure lens apparatus comprising a DMD assembly and an optical lens assembly, characterized in that, The focal plane adjustment mechanism includes: A fixing plate is fixedly connected to the optical lens assembly; A connecting plate, movably connected to the side of the fixing plate away from the optical lens assembly, is used to mount the DMD assembly, and the mounting position has a minimum gap between the fixing plate and the connecting plate; Multiple sets of adjustment components are used to adjust the distance between the connecting plate and the fixed plate. Each set of adjustment components includes a mating block fixedly connected to the connecting plate and an adjustment member threadedly connected to the mating block. The adjustment member includes an operating section at one end and an abutting section at the other end. After the adjustment member is threadedly connected to the mating block, the abutting section abuts against the fixed plate.

2. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 1, characterized in that, The focal plane adjustment mechanism includes at least three sets of adjustment components, each set of adjustment components being located at the corner of the connecting plate.

3. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 1 or 2, characterized in that, The connecting plate includes a groove disposed on one side near the fixed plate, a first through hole penetrating the connecting plate along a first direction and communicating with the groove, and the mating block is installed in the groove; The mating block has a first threaded hole that extends through in a first direction. The diameter of the first through hole is larger than the diameter of the first threaded hole. The adjusting member includes a mating section located between the operating section and the abutting section. When the abutting section abuts against the fixing plate, the mating section is located inside the first through hole and the first threaded hole. The mating section is provided with a first external thread that mates with the first threaded hole.

4. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 3, characterized in that, The connecting plate has a second threaded hole extending along a second direction and communicating with the groove. The focal plane adjustment mechanism includes a first locking member that engages with the second threaded hole. The first locking member presses against the mating block so that the side of the mating block away from the first locking member abuts against the inner wall of the groove. The second direction is a direction perpendicular to the first direction.

5. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 4, characterized in that, The mating block has an opening groove extending in a second direction and communicating with the first threaded hole. The opening groove divides the mating block into a first segment and a second segment spaced apart in a first direction. The first segment is located on the side away from the fixed plate. The first locking member abuts against the first segment. The end face of the second segment has a gap with the side wall of the groove. The focal plane adjustment mechanism includes a first positioning hole penetrating the connecting plate along a first direction, a second positioning hole penetrating the first segment along a first direction, and a third threaded hole penetrating the second segment along a first direction. The diameters of the first positioning hole and the second positioning hole are both larger than the diameter of the third threaded hole. The focal plane adjustment mechanism also includes a first fastener located simultaneously in the first positioning hole, the second positioning hole, and the third threaded hole. The first fastener is threadedly connected to the third threaded hole.

6. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 5, characterized in that, The thickness of the first segment along the first direction is greater than the thickness of the second segment along the first direction.

7. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 5, characterized in that, The adjusting member has a third through hole coaxially arranged with the mating section, and the third through hole sequentially penetrates the operating section, the mating section and the abutting section along a first direction; the focal plane adjusting mechanism includes a fourth threaded hole disposed on the fixed plate and corresponding to the third through hole, and a second fastener located in the third through hole and the fourth threaded hole and threadedly connected to the fourth threaded hole.

8. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 6, characterized in that, The abutting section is spherical, and the fixing plate is provided with a spherical groove that abuts against the spherical surface. The spherical groove is connected to the fourth threaded hole.

9. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 1, characterized in that, The focal plane adjustment mechanism includes a first locking component and a second locking component. The first locking component includes a first locking screw that passes through the connecting plate and is threadedly connected to the fixing plate, and an elastic piece sleeved on the first locking screw. The connecting plate is provided with a first countersunk hole. One side of the elastic piece abuts against the cap end of the first locking screw, and the other side abuts against the bottom wall of the first countersunk hole. The second locking assembly includes a second locking screw that passes through the connecting plate and is threaded to the fixing plate, and an elastic element sleeved on the second locking screw. The connecting plate is provided with a second countersunk hole. One side of the elastic element abuts against the cap end of the second locking screw, and the other side abuts against the bottom wall of the second countersunk hole. The second locking screw has a second stepped surface that abuts against the fixing plate.

10. The focal plane adjustment mechanism of the exposure lens apparatus according to claim 1, characterized in that, The fixing plate has a through hole extending in a first direction. The connecting plate has a positioning platform protruding on the side near the fixing plate. The positioning platform is installed in the through hole. The positioning platform has an annular groove in its circumference. A sealing ring is installed in the annular groove and fits against the hole wall of the through hole. The connecting plate has a positioning groove for installing the DMD component and a light outlet hole connecting the positioning groove and the through hole on the side away from the fixing plate.

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