Filter back flushing cleaning device and method
By using a dual-filter system and a gas pressurization module for backflushing cleaning, the problems of easy clogging and inconvenient cleaning of filters during the fibrillation process of solid-state battery electrode materials have been solved. This has enabled efficient cleaning of filters and recycling of materials, ensuring production efficiency and tank stability.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HIGH ENERGY DIGITAL MANUFACTURING (GUANGZHOU) TECHNOLOGY CO LTD
- Filing Date
- 2026-01-19
- Publication Date
- 2026-04-10
AI Technical Summary
In existing technologies, filters are prone to clogging during the fibrillation process of solid-state battery electrode materials, which is inconvenient to clean and wastes materials, affecting production efficiency and cost.
It adopts a dual-filter system and uses a gas pressurization module for backflushing cleaning. By using two filters alternately, it can achieve cleaning without disassembly, avoiding material waste and tank damage.
It improves the convenience and efficiency of filter cleaning, reduces material waste, and ensures the stability and efficiency of the tank vacuuming process.
Smart Images
Figure CN121819490A_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of all-solid-state battery manufacturing technology, and in particular relates to a filter backflushing cleaning device and method. Background Technology
[0002] In the production process of fibrillation of solid-state battery electrode materials, the fibrillation process takes place in a material tank. To ensure the effectiveness of fibrillation, a vacuum pump is typically used to evacuate the tank, maintaining a certain degree of vacuum inside. Simultaneously, to prevent extremely small electrode material particles generated during fibrillation from entering the vacuum pump or leaking, a filter is added to the vacuuming pipeline.
[0003] However, due to the extremely small particle size of the electrode material, the filter device is prone to clogging after a short period of use, requiring regular cleaning. The current cleaning method involves disassembling the filter and cleaning it manually. This method is cumbersome, time-consuming, and affects production efficiency. Furthermore, the cleaned electrode material cannot be recycled, resulting in waste of electrode material and increased production costs. Summary of the Invention
[0004] This application provides a filter backflushing cleaning device and method, which can improve the problems of filter clogging, inconvenient cleaning and material waste during the fibrillation process of solid-state battery electrode materials, and ensure the stable and efficient operation of the tank vacuuming process.
[0005] In a first aspect, embodiments of this application provide a filter backflushing cleaning device, the device comprising: a material tank, a first filter, a second filter, a first vacuum pump, a second vacuum pump, and a gas pressurization module; the material tank includes a tank body and a tank cover, the tank body and the tank cover cooperating to make the interior of the tank body a sealed container, the tank cover being provided with a first connection hole and a second connection hole, the first filter being connected to the first connection hole via a first pipe, and the second filter being connected to the second connection hole via a second pipe; the gas pressurization module being connected to the first filter via a third pipe, and the gas pressurization module being connected to the second filter via a fourth pipe; the first vacuum pump being connected to the first filter via a fifth pipe, and the second vacuum pump being connected to the second filter via a sixth pipe; the first filter being provided with a first exhaust pipe communicating with the outside, and the second filter being provided with a second exhaust pipe communicating with the outside; each of the first pipe, the second pipe, the third pipe, the fourth pipe, the fifth pipe, the sixth pipe, the first exhaust pipe, and the second exhaust pipe is provided with a pipe connection / disconnection component.
[0006] In some embodiments, the device further includes: a control module; the control module is electrically connected to the first vacuum pump, the second vacuum pump, and the gas booster module respectively; the control module is also electrically connected to the pipeline on / off components disposed on the first pipeline, the second pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the sixth pipeline, the first exhaust pipeline, and the second exhaust pipeline respectively.
[0007] In some embodiments, the device further includes: a first sensor disposed in the first filter for measuring environmental data related to the degree of clogging in the first filter; a second sensor disposed in the second filter for measuring environmental data related to the degree of clogging in the second filter; the first sensor and the second sensor are respectively electrically connected to the control module.
[0008] Secondly, embodiments of this application provide a filter backflushing cleaning method, applied to the filter backflushing cleaning device provided in the first aspect. The method includes: performing a vacuuming operation on a material tank using a target vacuum pump and a target filter, wherein the target vacuum pump is a first vacuum pump or a second vacuum pump; when the target vacuum pump is a first vacuum pump, the target filter is a first filter; when the target vacuum pump is a second vacuum pump, the target filter is a second filter; when it is determined that the target filter is clogged, generating high-pressure gas using a gas pressurization module to perform a backflushing operation on the target filter, backflushing the material attached to the target filter back into the material tank, and discharging the backflushed high-pressure gas to the outside through a candidate filter, wherein when the target filter is the first filter, the candidate filter is the second filter; and when the target filter is the second filter, the candidate filter is the first filter.
[0009] In some embodiments, the target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter; when it is determined that the target filter is clogged, a high-pressure gas is generated using a gas pressurization module to backflush the target filter, including: closing the fourth pipeline, the fifth pipeline, the sixth pipeline, and the first exhaust pipeline, and opening the first pipeline, the second pipeline, the third pipeline, and the second exhaust pipeline; using the gas pressurization module, high-pressure gas is input into the first filter through the third pipeline to backflush the first filter, and the material adhering to the first filter is backflushed into the material tank through the first pipeline; the high-pressure gas backflushed into the material tank is input into the second filter through the second pipeline and discharged to the outside through the second exhaust pipeline.
[0010] In some embodiments, the target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is the first filter. When it is determined that the target filter is clogged, a high-pressure gas is generated using a gas pressurization module to backflush the target filter. This includes: closing the third, fifth, sixth, and second exhaust pipes; opening the first, second, fourth, and first exhaust pipes; using the gas pressurization module, high-pressure gas is input into the second filter through the fourth pipe to backflush the second filter, and the material adhering to the second filter is backflushed into a material tank through the second pipe; the high-pressure gas backflushed into the material tank is input into the first filter through the first pipe and discharged to the outside through the first exhaust pipe.
[0011] In some embodiments, the target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter; the vacuuming operation of the material tank through the target vacuum pump and the target filter includes: closing the second pipeline, the third pipeline, the fourth pipeline, the sixth pipeline, the first exhaust pipeline, and the second exhaust pipeline, and opening the first pipeline and the fifth pipeline; using the first vacuum pump and the first filter to evacuate the material tank so that the vacuum degree in the material tank is the same as or close to the target vacuum degree.
[0012] In some embodiments, the target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is the first filter; the vacuuming operation of the material tank through the target vacuum pump and the target filter includes: closing the first pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the first exhaust pipeline, and the second exhaust pipeline, and opening the second pipeline and the sixth pipeline; using the second vacuum pump and the second filter to evacuate the material tank so that the vacuum degree in the material tank is the same as or close to the target vacuum degree.
[0013] In some embodiments, determining that the target filter is clogged includes any of the following methods: obtaining the measurement value of a sensor in the target filter and determining that the target filter is clogged based on the measurement value; or determining that the target filter is clogged after performing a preset number of vacuuming operations through the target filter.
[0014] In some embodiments, the method further includes: exchanging the target filter and the candidate filter at preset intervals.
[0015] This application incorporates two filters and corresponding vacuum pumps. During evacuation of the tank, the target vacuum pump is connected to the tank via the corresponding target filter by adjusting the pipeline flow, thus maintaining the vacuum within the tank. When the target filter is found to be clogged, high-pressure gas is input to backflush the material adhering to the filter back into the material tank for cleaning. This eliminates the need to disassemble the filter, solving the problems of cumbersome and time-consuming traditional disassembly and cleaning operations. Furthermore, since the gas input into the material tank can be discharged through the exhaust pipe of the candidate filter, damage to the tank due to sudden pressure increases is effectively prevented. This overcomes the problems of filter clogging, inconvenient cleaning, and material waste during the fibrillation process of solid-state battery electrode materials, ensuring the stable and efficient operation of the tank vacuuming process. Attached Figure Description
[0016] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0017] Figure 1 This is a schematic diagram of the structure of a filter backflushing cleaning device provided in an embodiment of this application;
[0018] Figure 2 A flowchart of a filter backflushing cleaning method provided in an embodiment of this application;
[0019] Figure 3 A schematic diagram of the gas passage during cleaning of the first filter according to an embodiment of this application;
[0020] Figure 4 A schematic diagram of the gas passage for cleaning the second filter according to an embodiment of this application;
[0021] Figure 5 A schematic diagram of a gas passage for vacuuming using a first filter, provided as an embodiment of this application;
[0022] Figure 6 This is a schematic diagram of a gas passage for vacuuming using a second filter, provided as an embodiment of this application. Detailed Implementation
[0023] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. It should be understood that the accompanying drawings in the present invention are for illustrative and descriptive purposes only and are not intended to limit the scope of protection of the present invention. Furthermore, it should be understood that the schematic drawings are not drawn to scale. The flowcharts used in this invention illustrate operations implemented according to some embodiments of the present invention. It should be understood that the operations in the flowcharts may not be implemented in sequence, and steps without logical contextual relationships may be reversed or implemented simultaneously. In addition, those skilled in the art, guided by the content of this invention, may add one or more other operations to the flowcharts, or remove one or more operations from the flowcharts.
[0024] Furthermore, the embodiments described herein are merely some, not all, of the embodiments of the invention. The components of the embodiments of the invention described and illustrated herein can typically be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.
[0025] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0026] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this invention is in use. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this invention. In addition, the terms "first," "second," "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.
[0027] Furthermore, terms such as "horizontal" and "vertical" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal than "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.
[0028] In the description of this invention, it should also be noted that, unless otherwise explicitly specified and limited, the terms "set," "install," "connect," and "link" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.
[0029] Figure 1 This is a schematic diagram of the structure of a filter backflushing cleaning device provided in an embodiment of this application.
[0030] In some embodiments, reference Figure 1 A filter backflushing cleaning device includes: a material tank, a first filter, a second filter, a first vacuum pump, a second vacuum pump, and a gas pressurization module; the material tank includes a tank body and a tank cover, which cooperate to make the interior of the tank a sealed container; the tank cover is provided with a first connection hole and a second connection hole; the first filter is connected to the first connection hole through a first pipe, and the second filter is connected to the second connection hole through a second pipe; the gas pressurization module is connected to the first filter through a third pipe, and the gas pressurization module is connected to the second filter through a fourth pipe; the first vacuum pump is connected to the first filter through a fifth pipe, and the second vacuum pump is connected to the second filter through a sixth pipe; the first filter is provided with a first exhaust pipe communicating with the outside, and the second filter is provided with a second exhaust pipe communicating with the outside; each of the first, second, third, fourth, fifth, sixth pipes, first exhaust pipe, and second exhaust pipe is provided with a pipe connection / disconnection component.
[0031] As an example, the first filter can also be called the main filter, and the second filter can also be called the auxiliary filter. When the first filter is used for vacuuming or cleaning, the first filter is the target filter, and correspondingly, in this case, the second filter is the candidate filter.
[0032] Alternatively, when using the second filter for vacuuming or cleaning, the second filter is the target filter, and in this case, the first filter is the candidate filter.
[0033] In some embodiments, the pipeline can be made of materials with good sealing properties, such as polyvinyl chloride (PVC) pipes, metal pipes, or glass pipes. The pipeline on / off components can be valves, such as mechanical valves or solenoid valves.
[0034] In some embodiments, the filter backflushing cleaning device further includes a control module. The control module is electrically connected to the first vacuum pump, the second vacuum pump, and the gas booster module, respectively; the control module is also electrically connected to pipeline on / off components installed on the first pipeline, the second pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the sixth pipeline, the first exhaust pipeline, and the second exhaust pipeline, respectively.
[0035] As an example, the control module can be a microcontroller or a programmable logic controller (PLC). The control module can control the start / stop status of various components electrically connected to it. For example, the control module can control the start / stop, operating parameters, and running time of the first vacuum pump, the second vacuum pump, and the gas booster module. The control module can also control the on / off state of pipeline switching components to change the gas path. Specifically, when the control module controls the start / stop of the first or second filter, it can do so by controlling the on / off state of the pipeline switching components associated with the first or second filter. For example, when the control module needs to shut down the first filter, it can control the on / off state of the pipeline switching components corresponding to the first, third, fifth, and first exhaust pipelines. When the control module needs to shut down the second filter, it can control the on / off state of the pipeline switching components corresponding to the second, fourth, sixth, and second exhaust pipelines.
[0036] In some embodiments, a first sensor is provided in the first filter to measure environmental data related to the degree of clogging in the first filter; a second sensor is provided in the second filter to measure environmental data related to the degree of clogging in the second filter; the first and second sensors are electrically connected to a control module. The control module can read the environmental data collected by the first and second sensors and determine whether the first or second filter is clogged based on the environmental data.
[0037] For example, the first and second sensors can be pressure sensors, flow sensors, etc. Taking a pressure sensor as an example, it can measure the air pressure inside the first or second filter. As the degree of clogging in the first or second filter increases, its internal air pressure will also increase. Therefore, when the internal air pressure reaches a preset threshold, it can be determined that the first or second filter is clogged and needs to be cleaned.
[0038] Taking a flow sensor as an example, a flow rate sensor can measure the gas flow rate through a first filter or a second filter. As the degree of clogging of the first filter or the second filter increases, the gas flow rate through the first filter or the second filter will decrease accordingly. When the gas flow rate is lower than a preset flow rate threshold, it can be determined that the first filter or the second filter is clogged and needs to be cleaned.
[0039] Figure 2 A flowchart illustrating a filter backflushing cleaning method according to an embodiment of this application. The filter backflushing cleaning method is applied to the filter backflushing cleaning apparatus provided in the first aspect.
[0040] refer to Figure 2 The filter backflushing cleaning method includes:
[0041] S101: Vacuuming operation is performed on the material tank using the target vacuum pump and target filter.
[0042] In some embodiments, the vacuuming operation of the material tank can be achieved either by a first vacuum pump and a first filter, or by a second vacuum pump and a second filter; that is, the target vacuum pump can be either the first vacuum pump or the second vacuum pump. When the target vacuum pump is the first vacuum pump, the target filter is the first filter; when the target vacuum pump is the second vacuum pump, the target filter is the second filter. Wherein, when the target filter is the first filter, the candidate filter is the second filter; and when the target filter is the second filter, the candidate filter is the first filter.
[0043] As an example, the first filter can be used as the default filter for evacuating the tank. In this case, the first filter is the target filter, and the second filter is the candidate filter. However, using the first filter for evacuation for an extended period will significantly shorten its lifespan compared to the second filter. Therefore, the target filter and the candidate filter can be swapped at preset intervals.
[0044] For example, after vacuuming for 72 hours using the first filter as the target filter, the target filter and candidate filter can be swapped, and the second filter can be used as the target filter for vacuuming. After vacuuming for 72 hours using the second filter as the target filter, the target filter and candidate filter can be swapped again, and the first filter can be used as the target filter for vacuuming, and this cycle can be repeated. In this way, the usage time of the first and second filters can be balanced, making their lifespans more even, thereby extending the overall lifespan of the filtration system.
[0045] S102: When it is determined that the target filter is clogged, the gas booster module generates high-pressure gas to backflush the target filter, backflush the material attached to the target filter into the material tank, and discharge the backflushed high-pressure gas to the outside through the candidate filter.
[0046] In some embodiments, determining that a target filter is clogged includes any of the following methods: acquiring measurements from sensors in the target filter and determining that the target filter is clogged based on the measurements; or, determining that the target filter is clogged after a preset number of vacuuming operations through the target filter.
[0047] Referring to the above example, taking the target filter as the first filter as an example, the first filter is equipped with a first sensor. When the first sensor is a flow sensor, the measurement value of the first sensor is the gas flow rate through the first filter. When the gas flow rate is lower than the preset flow rate threshold, it can be determined that the first filter or the second filter is blocked.
[0048] Alternatively, if in actual operation there is a high probability of clogging after every 10 vacuum cycles, then it can be set to determine if the target filter is clogged after every 10 vacuum cycles.
[0049] Figure 3 This is a schematic diagram of the gas passage for cleaning the first filter according to an embodiment of this application.
[0050] In some embodiments, the target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter. When it is determined that the target filter is clogged, a high-pressure gas is generated using a gas pressurization module to backflush the target filter, including: closing the fourth, fifth, sixth, and first exhaust pipes, and opening the first, second, third, and second exhaust pipes; using the gas pressurization module, high-pressure gas is input into the first filter through the third pipe to backflush the first filter, and the material adhering to the first filter is backflushed into the material tank through the first pipe; the high-pressure gas backflushed into the material tank is input into the second filter through the second pipe and discharged to the outside through the second exhaust pipe.
[0051] refer to Figure 3 Pipes marked with an "X" are closed, while those marked with an arrow are open, with the arrow indicating the direction of gas flow.
[0052] Among them, such as Figure 3 As shown, the gas pressurization module inputs high-pressure gas into the first filter through the third pipeline. Since the output high-pressure gas is in the opposite direction to the vacuuming process, it can backflush the first filter, blowing the material adhering to the first filter back into the material tank through the first pipeline. Because the second pipeline, the second filter, and the second exhaust pipeline are connected, the gas backflushed into the material tank through the first pipeline will enter the second filter through the second pipeline and be discharged to the outside through the second exhaust pipeline of the second filter.
[0053] Figure 4 This is a schematic diagram of the gas passage for cleaning the second filter according to an embodiment of this application.
[0054] In some embodiments, the target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is a first filter. When it is determined that the target filter is clogged, a high-pressure gas is generated using a gas pressurization module to backflush the target filter, including: closing the third, fifth, sixth, and second exhaust pipes, and opening the first, second, fourth, and first exhaust pipes; using the gas pressurization module, high-pressure gas is input into the second filter through the fourth pipe to backflush the second filter, and the material adhering to the second filter is backflushed into the material tank through the second pipe; the high-pressure gas backflushed into the material tank is input into the first filter through the first pipe and discharged to the outside through the first exhaust pipe.
[0055] refer to Figure 4 Pipes marked with an "X" are closed, while those marked with an arrow are open, with the arrow indicating the direction of gas flow.
[0056] Among them, such as Figure 4 As shown, the gas pressurization module inputs high-pressure gas into the second filter through the fourth pipeline. Since the output high-pressure gas flows in the opposite direction to the vacuuming process, it enables backflushing of the second filter, causing material adhering to the filter to be backflushed into the material tank through the second pipeline. Because the first pipeline, the first filter, and the first exhaust pipeline are connected, the gas backflushed into the material tank through the second pipeline will enter the first filter through the first pipeline and be discharged to the outside through the first exhaust pipeline of the first filter.
[0057] In the above embodiments, the material adhering to the target filter is backflushed back into the material tank for reuse, effectively improving the problem of material waste. Simultaneously, the gas input into the material tank can be discharged through the exhaust pipe of the candidate filter, effectively preventing damage to the tank due to sudden pressure increases. By achieving cleaning without disassembling the filter, the problems of material waste and tank damage due to sudden pressure increases are also improved, ensuring the stable and efficient operation of the tank vacuuming process.
[0058] Figure 5 This is a schematic diagram of a gas passage for vacuuming using a first filter, provided as an embodiment of this application.
[0059] In some embodiments, the target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter; the material tank is evacuated using the target vacuum pump and the target filter, including: closing the second, third, fourth, and sixth pipelines, the first exhaust pipeline, and the second exhaust pipeline, and opening the first and fifth pipelines; using the first vacuum pump and the first filter to evacuate the material tank so that the vacuum level in the material tank is the same as or close to the target vacuum level.
[0060] refer to Figure 5 Pipes marked with an "X" are closed, while those marked with an arrow are open, with the arrow indicating the direction of gas flow.
[0061] As an example, after the first vacuum pump starts, it creates negative pressure on the first filter through the fifth pipeline, thereby evacuating the material tank through the first pipeline. During evacuation, the material inside the tank is carried away by the gas and enters the first filter through the first pipeline. After being filtered by the first filter, the material is blocked, and the gas is discharged by the vacuum pump. The first vacuum pump continues to operate until the vacuum level in the material tank is the same as or close to the target vacuum level. At this point, the first vacuum pump maintains low-power operation to keep the vacuum level in the tank stable. Here, "the vacuum level in the material tank is close to the target vacuum level" means that the difference between the vacuum level in the material tank and the target vacuum level is less than a preset threshold. For example, the difference between the vacuum level in the material tank and the target vacuum level is less than a preset difference, or the ratio of the difference between the vacuum level in the material tank and the target vacuum level is less than a preset ratio, etc.
[0062] Figure 6 This is a schematic diagram of a gas passage for vacuuming using a second filter, provided as an embodiment of this application.
[0063] In some embodiments, the target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is a first filter; the material tank is evacuated using the target vacuum pump and the target filter, including: closing the first, third, fourth, fifth, first exhaust, and second exhaust pipes, and opening the second and sixth pipes; using the second vacuum pump and the second filter to evacuate the material tank so that the vacuum level in the material tank is the same as or close to the target vacuum level.
[0064] refer to Figure 6 Pipes marked with an "X" are closed, while those marked with an arrow are open, with the arrow indicating the direction of gas flow.
[0065] As an example, after the second vacuum pump starts, it creates negative pressure on the second filter through the sixth pipeline, thereby evacuating the material tank through the second pipeline. During evacuation, the material inside the tank is carried away by the gas and enters the second filter through the second pipeline. After being filtered by the second filter, the material is blocked, and the gas is discharged by the vacuum pump. The second vacuum pump continues to operate until the vacuum level in the material tank is the same as or close to the target vacuum level. At this point, the second vacuum pump maintains low-power operation to keep the vacuum level in the tank stable. Here, "the vacuum level in the material tank is close to the target vacuum level" means that the difference between the vacuum level in the material tank and the target vacuum level is less than a preset threshold.
[0066] This application incorporates two filters and corresponding vacuum pumps. During evacuation of the tank, the target vacuum pump is connected to the tank via the corresponding target filter by adjusting the pipeline flow, thus maintaining the vacuum within the tank. When the target filter is found to be clogged, high-pressure gas is input to backflush the material adhering to the filter back into the material tank for cleaning. This eliminates the need to disassemble the filter, solving the problems of cumbersome and time-consuming traditional disassembly and cleaning operations. Furthermore, since the gas input into the material tank can be discharged through the exhaust pipe of the candidate filter, damage to the tank due to sudden pressure increases is effectively prevented. This overcomes the problems of filter clogging, inconvenient cleaning, and material waste during the fibrillation process of solid-state battery electrode materials, ensuring the stable and efficient operation of the tank vacuuming process.
[0067] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0068] The above are merely specific embodiments of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.
Claims
1. A filter backflushing cleaning device, characterized in that, The device includes: a material tank, a first filter, a second filter, a first vacuum pump, a second vacuum pump, and a gas pressurization module; The material tank includes a tank body and a tank lid. The tank body and the tank lid are fitted together to make the inside of the tank body a sealed container. The tank lid is provided with a first connection hole and a second connection hole. The first filter is connected to the first connection hole through a first pipe, and the second filter is connected to the second connection hole through a second pipe. The gas booster module is connected to the first filter via a third pipeline, and the gas booster module is connected to the second filter via a fourth pipeline; The first vacuum pump is connected to the first filter via a fifth pipeline, and the second vacuum pump is connected to the second filter via a sixth pipeline; The first filter is provided with a first exhaust pipe that communicates with the outside, and the second filter is provided with a second exhaust pipe that communicates with the outside. Pipeline switching components are provided on the first pipeline, the second pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the sixth pipeline, the first exhaust pipeline, and the second exhaust pipeline.
2. The apparatus according to claim 1, characterized in that, The device further includes: a control module; The control module is electrically connected to the first vacuum pump, the second vacuum pump, and the gas booster module, respectively. The control module is also electrically connected to the pipeline on / off components installed on the first pipeline, the second pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the sixth pipeline, the first exhaust pipeline, and the second exhaust pipeline, respectively.
3. The apparatus according to claim 2, characterized in that, The device further includes: A first sensor is provided in the first filter, and the first sensor is used to measure environmental data related to the degree of clogging in the first filter. The second filter is equipped with a second sensor, which is used to measure environmental data related to the degree of clogging in the second filter; The first sensor and the second sensor are electrically connected to the control module, respectively.
4. A filter backflushing cleaning method, applied to the filter backflushing cleaning device according to any one of claims 1-3, characterized in that, The method includes: The material tank is evacuated using a target vacuum pump and a target filter. The target vacuum pump is either a first vacuum pump or a second vacuum pump. When the target vacuum pump is the first vacuum pump, the target filter is the first filter. When the target vacuum pump is the second vacuum pump, the target filter is the second filter. When it is determined that the target filter is clogged, a high-pressure gas is generated using a gas pressurization module to backflush the target filter, blowing the material attached to the target filter back into a material tank, and then discharging the backflushed high-pressure gas to the outside through a candidate filter. Wherein, when the target filter is the first filter, the candidate filter is the second filter, and when the target filter is the second filter, the candidate filter is the first filter.
5. The method according to claim 4, characterized in that, The target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter; When it is determined that the target filter is clogged, the step of generating high-pressure gas using a gas pressurization module to backflush the target filter includes: Close the fourth pipe, the fifth pipe, the sixth pipe and the first exhaust pipe, and open the first pipe, the second pipe, the third pipe and the second exhaust pipe; Using the gas pressurization module, high-pressure gas is input into the first filter through the third pipeline to backflush the first filter, and the material adhering to the first filter is backflushed into the material tank through the first pipeline. The high-pressure gas backflushed into the material tank is fed into the second filter through the second pipeline and discharged to the outside through the second exhaust pipeline.
6. The method according to claim 4, characterized in that, The target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is the first filter; When it is determined that the target filter is clogged, the step of generating high-pressure gas using a gas pressurization module to backflush the target filter includes: Close the third pipe, the fifth pipe, the sixth pipe and the second exhaust pipe, and open the first pipe, the second pipe, the fourth pipe and the first exhaust pipe; Using the gas pressurization module, high-pressure gas is input into the second filter through the fourth pipeline to backflush the second filter, and the material adhering to the second filter is backflushed into the material tank through the second pipeline; The high-pressure gas backflushed into the material tank is fed into the first filter through the first pipeline and discharged to the outside through the first exhaust pipeline.
7. The method according to claim 4, characterized in that, The target vacuum pump is a first vacuum pump, the target filter is a first filter, and the candidate filter is a second filter; The process of evacuating the material container using a target vacuum pump and a target filter includes: Close the second pipe, the third pipe, the fourth pipe, the sixth pipe, the first exhaust pipe, and the second exhaust pipe, and open the first pipe and the fifth pipe; Using the first vacuum pump, the material container is evacuated through the first filter so that the vacuum level in the material container is the same as or close to the target vacuum level.
8. The method according to claim 4, characterized in that, The target vacuum pump is a second vacuum pump, the target filter is a second filter, and the candidate filter is the first filter; The process of evacuating the material container using a target vacuum pump and a target filter includes: Close the first pipeline, the third pipeline, the fourth pipeline, the fifth pipeline, the first exhaust pipeline, and the second exhaust pipeline, and open the second pipeline and the sixth pipeline; Using the second vacuum pump, the material container is evacuated through the second filter so that the vacuum level in the material container is the same as or close to the target vacuum level.
9. The method according to any one of claims 4-8, characterized in that, Determining that the target filter is clogged includes any of the following methods: Obtain the measurement values of the sensors in the target filter, and determine that the target filter is clogged based on the measurement values; or After a preset number of vacuuming operations are performed through the target filter, it is determined that the target filter is clogged.
10. The method according to any one of claims 4-8, characterized in that, The method further includes: The target filter and the candidate filter are swapped at preset intervals.