A semiconductor quartz component polishing device

Abstract

This invention discloses a semiconductor quartz component polishing device, relating to the field of quartz component polishing technology. The device includes a main body, inside which a polishing assembly and a rotating assembly coaxially arranged with the polishing assembly are installed. A mounting arm is mounted on the rotating end of the rotating assembly, and a ball head seat is mounted at the bottom of the mounting arm. A positioning assembly capable of vertical rotation is installed inside the ball head seat. Through the arrangement of the polishing assembly and the positioning assembly, the quartz rod is positioned, allowing the polishing assembly to first polish the end of the quartz rod. Then, combined with the cooperation of the rotating assembly and the electric push rod, the entire circumference of the quartz rod's end face can be uniformly and continuously contacted with the polishing assembly. This eliminates the need for manual polishing of the quartz rod by hand, efficiently chamfering the end of the quartz rod, eliminating quality fluctuations caused by inconsistent polishing force and path during manual polishing, effectively removing micro-cracks, scratches, and unevenness left from cutting, and reducing potential stress concentration points.

Description

Technical Field

[0001] This invention relates to the field of quartz component polishing technology, and more specifically, to a semiconductor quartz component polishing device. Background Technology

[0002] In semiconductor manufacturing, high-purity quartz components (such as quartz rods) are widely used. These components typically need to be cut to specific lengths during processing. However, the ends of the quartz rods, after cutting or accidental breakage, leave microscopic cracks, scratches, and uneven areas. These defects are not only sources of contaminants but, more importantly, become stress concentration points. Under subsequent high-temperature processing or mechanical stress, these points can easily cause the quartz component to fracture from the end, severely impacting product reliability and lifespan.

[0003] Currently, the treatment of quartz end faces mainly relies on manual polishing, which makes it difficult to efficiently and uniformly polish the quartz end face plane and the transition chamfer with the sidewall. This has drawbacks such as low efficiency, poor consistency, and polishing quality depending on the operator's experience. Summary of the Invention

[0004] To address the aforementioned technical problems, this invention provides a polishing device for semiconductor quartz components.

[0005] The technical solution is as follows:

[0006] A semiconductor quartz component polishing device includes a main body with a polishing cavity at one end. A polishing component extending into the polishing cavity is installed inside the main body. A rotating component coaxially arranged with the polishing component is installed on the inner wall of the polishing cavity. An mounting arm is installed on the rotating end of the rotating component. A ball head seat is installed at the bottom of the mounting arm. The ball head seat has a mounting cavity coaxially arranged with the polishing component. A positioning component that can rotate up and down and is used to clamp the outer wall of the quartz rod is installed in the mounting cavity.

[0007] The top wall of the mounting arm has an extension block, and an electric push rod is hinged between the extension block and the positioning component. The tilt angle of the positioning component and the quartz rod is adjusted according to the extension length of the electric push rod.

[0008] Furthermore, the positioning component includes a ball head that rotates up and down within a ball head seat, a mounting hole at the center of the ball head for a quartz rod to pass through, an extension tube at the end of the ball head away from the rotating component, and a hinge seat on the top wall of the extension tube for hinged mounting of an electric push rod.

[0009] Furthermore, the end of the extension tube away from the ball head has a plurality of clamping pieces equidistantly arranged along the circumference of the extension tube, and fasteners are threaded onto the outer wall of the plurality of clamping pieces.

[0010] Furthermore, the outer wall of the clamping piece away from the extension tube has a tapered portion, the outer wall of the clamping piece has an external thread, a rubber block that mates with the outer wall of the quartz rod is installed on the inner wall of the clamping piece corresponding to the tapered portion, the fastener has a mating port that mates with the outer wall of the clamping piece, the inner wall of the mating port has a mating portion that mates with the tapered portion, and the inner wall of the tapered portion has an internal thread that mates with the external thread.

[0011] Furthermore, the two side walls of the ball head seat have extensions, each extension having two symmetrical recesses. A circular hole is provided at the center of the extension, and a rotating shaft is rotatably installed in the circular hole of the extension. A limiting member is detachably installed on the rotating shaft located in the circular hole. The limiting member has a first protrusion and a second protrusion extending along the length direction of the ball head. The first protrusion and the second protrusion are respectively located in two symmetrical recesses, and a blocking part is formed between the two recesses on each extension.

[0012] Furthermore, the rotating shaft has a threaded hole at its center, a bolt is installed in the threaded hole, a limiting member is sleeved on the bolt's stud, and the limiting member can rotate around the bolt.

[0013] Furthermore, the polishing assembly includes a rotary cylinder disposed on the side wall of the polishing chamber, a clamping device is mounted on the rotating end of the rotary cylinder, and a polishing head for polishing is mounted on the clamping device.

[0014] Furthermore, the inner wall of the polishing cavity is provided with a mounting groove coaxially arranged with the polishing head, and the rotating assembly includes an external gear ring disposed in the mounting groove and fixedly connected to the extension block, and a motor disposed in the main body of the device, with a gear meshing with the external gear ring mounted on the output end of the motor.

[0015] Furthermore, a collection groove is provided at the bottom wall of the polishing chamber, and a liquid supply component is installed on the inner wall of the polishing chamber above the polishing component.

[0016] Furthermore, the bottom of the mounting arm has a threaded post, and the top of the ball head has a connection portion that is threadedly connected to the threaded post.

[0017] Based on the above, the beneficial effects of the semiconductor quartz component polishing equipment of the present invention are as follows:

[0018] By setting up polishing and positioning components, the quartz rod is positioned, allowing the polishing component to polish the end face of the quartz rod first. Then, in conjunction with the rotating component and electric push rod, the tilt angle of the quartz rod on the positioning component is adjusted by adjusting the extension length of the electric push rod's telescopic end, chamfering the circumferential edge of the quartz rod's end face. Next, the rotating component drives the mounting arm and the positioning component on the mounting arm to rotate, thereby causing the quartz rod held on the positioning component to rotate around the axis of the polishing component. This ensures that the entire circumferential edge of the quartz rod's end face can contact the polishing component evenly and continuously, eliminating the need for manual polishing of the quartz rod by hand. It can efficiently chamfer and polish the end of the quartz rod, eliminating quality fluctuations caused by inconsistent polishing force and path during manual polishing. It can effectively remove micro-cracks, scratches, and unevenness left when the quartz rod is cut, reducing potential stress concentration points.

[0019] The up-and-down tilt angle of the quartz rod is adjusted by an electric push rod, which can adapt to the chamfering and polishing of quartz rods with different chamfering angle requirements, thus improving the flexibility and precision of the processing.

[0020] The tapered part of the clamping plate engages with the mating part of the fastener. The threaded structure converts the tightening force of the fastener into the tightening force of the clamping plate. When tightening the fastener, the mating part squeezes the tapered part, causing the clamping plate to tighten precisely inward, thus clamping and positioning the quartz rod. The operation is simple and can quickly clamp and position the quartz rod.

[0021] By using a rotating shaft and a limiting component, the first and second protrusions on the limiting component can rotate synchronously when the ball head rotates. Combined with the blocking component, the bottom wall of the second protrusion and the top wall of the first protrusion are limited, thus constraining the angle between the limiting component and the ball head after reset. This ensures that the blocking component can block the ball head when the electric push rod resets, guaranteeing that after each angle adjustment, the axis of the mounting hole inside the ball head can always be accurately reset to the origin position coaxial with the polishing assembly. This prevents excessive deflection of the ball head angle due to misoperation or electric push rod malfunction, avoiding the risk of collision damage to the quartz rod or polishing assembly, and improving the safety and reliability of equipment operation. Attached Figure Description

[0022] Figure 1 This is a three-dimensional schematic diagram of the overall components of the present invention;

[0023] Figure 2 This is a schematic diagram of the interior of the polishing cavity of the present invention;

[0024] Figure 3 This is a schematic diagram of the structure of the polishing assembly and other components of the present invention;

[0025] Figure 4 This is a schematic diagram of the structure of the rotating assembly and other components of the present invention;

[0026] Figure 5 This is a cross-sectional schematic diagram of the positioning components and other parts of the present invention;

[0027] Figure 6 This is a three-dimensional schematic diagram of the positioning component of the present invention;

[0028] Figure 7 This is a cross-sectional perspective view of the fasteners and other components of the present invention;

[0029] Figure 8 This is a cross-sectional schematic diagram of the limiting component and other parts of the present invention.

[0030] The reference numerals in the accompanying drawings of this invention are as follows:

[0031] 100. Main body of the device; 110. Polishing chamber; 120. Collection tank; 130. Mounting tank;

[0032] 210. Rotary cylinder; 220. Clamping device; 230. Polishing head;

[0033] 310. External gear ring; 320. Motor; 330. Gear;

[0034] 400. Mounting arm; 401. Extension block; 402. Threaded post; 410. Ball head seat; 411. Extension; 412. Recess; 413. Blocking part;

[0035] 510. Ball head; 520. Mounting hole; 530. Extension tube; 531. Clamping piece; 5311. Tapered part; 5312. External thread; 532. Rubber block; 540. Fastener; 541. Mating joint; 542. Mating part; 543. Internal thread;

[0036] 600. Electric linear actuator;

[0037] 700, limiting component; 710, first protrusion; 711, second protrusion; 720, bolt;

[0038] 800. Liquid supply assembly. Detailed Implementation

[0039] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0040] The embodiments provided by the present invention will be described in detail below:

[0041] like Figures 1 to 8As shown, a semiconductor quartz component polishing device includes a device body 100, a polishing cavity 110 is provided at the end of the device body 100, a polishing component is installed inside the device body 100 extending into the polishing cavity 110, a rotating component is installed on the inner wall of the polishing cavity 110 and coaxially arranged with the polishing component, an mounting arm 400 is installed on the rotating end of the rotating component, a ball head seat 410 is fixedly installed at the bottom of the mounting arm 400, the ball head seat 410 has a mounting cavity coaxially arranged with the polishing component, a positioning component that can rotate up and down is installed in the mounting cavity, the positioning component is used to clamp the outer wall of the quartz rod so as to realize the polishing component polishing the end of the quartz rod.

[0042] The top wall of the mounting arm 400 has an extension block 401. An electric push rod 600 is hinged between the extension block 401 and the positioning component. The top end of the electric push rod 600 is hinged to the extension block 401, and the bottom end of the electric push rod 600 is hinged to the positioning component. The electric push rod 600 is used to adjust the angle of the positioning component. By extending and retracting the electric push rod 600, the positioning component is rotated up and down, thereby adjusting the angle of the positioning component. Since the quartz rod is clamped inside the positioning component, the tilt angle of the quartz rod can be ultimately adjusted by extending and retracting the electric push rod 600.

[0043] The polishing assembly includes a rotary cylinder 210 located on the side wall of the polishing chamber 110. A clamping device 220 is mounted on the rotating end of the rotary cylinder 210, and a polishing head 230 for polishing is mounted on the clamping device 220.

[0044] It should be noted that the polishing and positioning components position the quartz rod, allowing the polishing component to first polish the end face of the quartz rod. Then, in conjunction with the rotating component and the electric push rod 600, the tilt angle of the quartz rod on the positioning component is adjusted by regulating the extension length of the electric push rod 600, chamfering the circumferential edge of the quartz rod end face to prevent burrs from remaining. Next, the rotating component drives the mounting arm 400 and the positioning component on the mounting arm 400 to rotate, causing the quartz rod held on the positioning component to rotate around the axis of the polishing component. This ensures that the entire circumferential edge of the quartz rod end face makes uniform and continuous contact with the polishing component, eliminating the need for manual polishing. This allows for efficient polishing of the quartz rod end, eliminating quality fluctuations caused by inconsistent polishing force and path during manual polishing. It effectively removes micro-cracks, scratches, and unevenness left during quartz rod cutting, reducing potential stress concentration points.

[0045] Understandably, the angle adjustment function of the electric linear actuator 600 allows the positioning assembly to adapt to the chamfering and polishing of quartz rods with different chamfering angle requirements, thus improving the flexibility and precision of the processing.

[0046] like Figures 5 to 7As shown, the positioning assembly includes a ball head 510 that is rotatably disposed within a ball head seat 410, and the ball head 510 has a mounting hole 520 at its center for a quartz rod to pass through. Figure 5 The cylinder inside the mounting hole 520 is a quartz rod. The mounting hole 520 is coaxially arranged with the polishing head 230 on the polishing assembly. The end of the ball head 510 away from the rotating assembly has an extension tube 530, and the top wall of the extension tube 530 has a hinge seat for the electric push rod 600 to be hinged.

[0047] It should be noted that the ball head 510 is located within the ball head seat 410, allowing it to rotate up and down, thus providing a basis for adjusting the angle of the quartz rod. Simultaneously, the mounting hole 520 is coaxially aligned with the polishing head 230 on the polishing assembly, ensuring the coaxiality of the quartz rod within the mounting hole 520 and the polishing head 230. The extension tube 530 and the hinge seat provide a connection fulcrum for the electric push rod 600, transmitting the driving force of the electric push rod 600 to adjust the angle of the quartz rod and ensuring the stability of the quartz rod during the polishing process.

[0048] like Figures 5 to 7 As shown, the end of the extension tube 530 away from the ball head 510 has a plurality of clamping pieces 531 equidistantly arranged along the circumference of the extension tube 530. Fasteners 540 are threadedly installed on the outer wall of the plurality of clamping pieces 531. The fasteners 540 are used to drive the plurality of clamping pieces 531 to position the outer wall of the quartz rod.

[0049] It should be noted that, through the cooperation of fastener 540 and clamping plate 531, quartz rods of different diameters can be clamped and positioned, making the device applicable to quartz rods within a certain diameter range and enhancing the applicability of the device.

[0050] The outer wall of the clamping piece 531 away from the extension tube 530 has a tapered portion 5311, and the outer wall of the clamping piece 531 has an external thread 5312. A rubber block 532 that mates with the outer wall of the quartz rod is installed on the inner wall of the clamping piece 531 at the corresponding position of the tapered portion 5311. The fastener 540 has a mating port 541 that mates with the outer wall of the clamping piece 531. The inner wall of the mating port 541 has a mating portion 542 that mates with the tapered portion 5311. The mating portion 542 and the tapered portion 5311 are the same tapered shape. The inner wall of the tapered portion 5311 has an internal thread 543 that mates with the external thread 5312.

[0051] It should be noted that by setting circumferentially distributed clamping plates 531 at the end of the extension tube 530, and using the threaded engagement between the fastener 540 and the clamping plates 531, multiple clamping plates 531 can be driven to retract synchronously, which can adapt to quartz rods of different diameters and achieve clamping and positioning of quartz rods of different sizes. The circumferentially distributed design of the clamping plates 531 makes the clamping force more uniform and prevents the quartz rod from shaking or shifting during polishing and rotation.

[0052] Understandably, by engaging the tapered portion 5311 of the clamping piece 531 with the mating portion 542 of the fastener 540, the threaded structure converts the tightening force of the fastener 540 into the tightening force of the clamping piece 531. When the fastener 540 is tightened, the mating portion 542 squeezes the tapered portion 5311, causing the clamping piece 531 to tighten precisely inward, thus clamping and positioning the quartz rod. The operation is simple and allows for quick clamping and positioning of the quartz rod.

[0053] The rubber block 532 increases friction to prevent the quartz rod from slipping and also prevents the hard clamping plate 531 from scratching the outer wall of the quartz rod.

[0054] like Figure 8 As shown, the ball joint 410 has extensions 411 on both side walls. Each extension 411 is cylindrical, and each extension 411 has two symmetrical fan-shaped recesses 412. A circular hole is provided at the center of each extension 411, and a rotating shaft is rotatably installed in the circular hole of the extension 411. The rotating shaft extends into the interior of the ball joint 410 and the ball head 510. A cylindrical limiting member 700 is detachably installed on the rotating shaft located in the circular hole. A threaded hole is provided at the center of the rotating shaft, and a bolt 720 is threaded into the threaded hole. The limiting member 700 is sleeved on the stud of the bolt 720, and the limiting member 700 can rotate around the bolt 720. The bolt 720 is used to prevent the limiting member 700 from falling off axially without affecting the rotation of the limiting member 700. The limiting member 700 has a first protrusion 710 and a second protrusion 711 extending along the length direction of the ball head 510. The first protrusion 710 and the second protrusion 711 are symmetrical and are located in two symmetrical recesses 412. A blocking portion 413 is formed between the two recesses 412 on each extension 411 to limit the first protrusion 710 and the second protrusion 711. One side wall of the two blocking portions 413 is parallel to the horizontal plane. The blocking portion 413 is used to limit the bottom wall of the second protrusion 711 and the top wall of the first protrusion 710 to achieve horizontal reset of the ball head 510.

[0055] The rotating shaft has a spline groove, and the end of the limiting member 700 has a spline that is inserted into the spline groove.

[0056] It should be noted that the rotating shaft and the limiting member 700 enable the first protrusion 710 and the second protrusion 711 on the limiting member 700 to rotate synchronously when the ball head 510 rotates. In conjunction with the blocking part 413, the bottom wall of the second protrusion 711 and the top wall of the first protrusion 710 are limited, thereby constraining the angle between the limiting member 700 and the ball head 510 after reset. This ensures that when the electric push rod 600 resets, the blocking part 413 can block the ball head 510, ensuring that after each angle adjustment, the axis of the mounting hole 520 inside the ball head 510 can always be accurately reset to the origin position coaxial with the polishing assembly (i.e., the ball head 510 remains horizontal after reset). This prevents excessive deflection of the ball head 510 due to misoperation or failure of the electric push rod 600, avoids the risk of collision and damage to the quartz rod or polishing assembly, and improves the safety and reliability of equipment operation.

[0057] like Figures 1 to 4 As shown, the inner wall of the polishing chamber 110 is provided with a mounting groove 130 coaxially arranged with the polishing head 230. The rotating assembly includes an external gear ring 310 disposed in the mounting groove 130 and fixedly connected to the extension block 401, and a motor 320 disposed in the main body 100 of the device. A gear 330 that meshes with the external gear ring 310 is installed on the output end of the motor 320.

[0058] It should be noted that the transmission method driven by motor 320 makes the rotation speed of the quartz rod precisely adjustable, which, in conjunction with the rotation of polishing head 230, forms a uniform relative motion trajectory, achieving all-round uniform polishing of the end of the quartz rod. At the same time, the structural design of mounting groove 130 and polishing head 230 being coaxially set avoids the problem of uneven polishing thickness caused by eccentric rotation, further improving the consistency of polishing.

[0059] like Figures 1 to 3 As shown, a collection groove 120 is provided at the bottom wall of the polishing chamber 110, and a liquid supply assembly 800 is installed on the inner wall of the polishing chamber 110 above the polishing assembly. The liquid supply assembly 800 is used to apply coolant to the polishing head 230. This is a common structure in the prior art and will not be described in detail here.

[0060] It should be noted that the liquid supply component 800 can cool the polishing head 230, prevent the polishing head 230 from wearing due to high temperature, extend its service life, and at the same time lubricate the polishing surface, reduce the frictional resistance during the polishing process, and reduce the generation of new cracks or scratches on the end face of the quartz rod.

[0061] like Figure 5 As shown, the mounting arm 400 has a threaded post 402 at its bottom, and the ball head seat 410 has a connecting part at its top that is threadedly connected to the threaded post 402, and the connecting part has a threaded hole.

[0062] It should be noted that the threaded connection between the threaded post 402 and the connecting part enables the detachable assembly of the mounting arm 400 and the ball head seat 410, facilitating the disassembly, replacement, and maintenance of the ball head seat 410 and the positioning components.

[0063] The working principle of this embodiment is as follows:

[0064] In use, the user passes one end of the quartz rod through the ball head 510 and presses it against the polishing head 230. Then, the user rotates the fastener 540. The rotation of the fastener 540 causes the mating part 542 to press the clamping piece 531 inward, causing the clamping piece 531 to retract inward. The inward retraction of the clamping piece 531 causes the rubber block 532 to retract inward and fit against the outer wall of the quartz rod, thus completing the clamping and positioning of the quartz rod. Then, the liquid supply assembly 800 and the rotary cylinder 210 are turned on. The rotary cylinder 210 drives the polishing head 230 on the clamping device 220 to polish the end of the quartz rod. The liquid supply assembly 800 applies coolant to the end of the quartz rod and the polishing head 230. After the end face of the quartz rod is polished, the electric push rod 600 is started to adjust the angle of the quartz rod on the ball head 510. Then the motor 320 is started to drive the gear 330 to rotate. The rotation of the gear 330 drives the outer gear ring 310 and the mounting arm 400 on the outer gear ring 310 to rotate slowly. The slow rotation of the mounting arm 400 drives the ball head seat 410 on the mounting arm 400 to rotate. The rotation of the ball head seat 410 drives the quartz rod on the ball head 510 to rotate slowly, adjusting the angle of the quartz rod in the circumferential direction so that the entire circumference of the quartz rod can contact the polishing head 230, so that the circumferential edge of the entire end face of the quartz rod can be polished evenly and continuously, and the end of the quartz rod can be chamfered and polished efficiently.

[0065] It is readily understood that those skilled in the art can combine, split, or reorganize the embodiments provided in this application to obtain other embodiments, all of which do not exceed the protection scope of this application.

[0066] The present invention and its embodiments have been described above illustratively. This description is not restrictive, and the embodiments shown are only a part of the embodiments of the present invention. The actual structure is not limited thereto. Therefore, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the spirit of the present invention, they should all fall within the protection scope of the present invention.

Claims

1. A polishing device for semiconductor quartz components, characterized in that, The device includes a main body (100), a polishing cavity (110) is provided at the end of the main body (100), a polishing component is installed inside the main body (100) and extends into the polishing cavity (110), a rotating component is installed on the inner wall of the polishing cavity (110) and is coaxially arranged with the polishing component, an mounting arm (400) is installed on the rotating end of the rotating component, a ball head seat (410) is installed at the bottom of the mounting arm (400), the ball head seat (410) has a mounting cavity coaxially arranged with the polishing component, and a positioning component that can rotate up and down and is used to clamp the outer wall of the quartz rod is installed in the mounting cavity; The top wall of the mounting arm (400) has an extension block (401), and an electric push rod (600) is hinged between the extension block (401) and the positioning assembly. The tilt angle of the positioning assembly and the quartz rod is adjusted according to the extension length of the electric push rod (600). The positioning assembly includes a ball head (510) that is rotatably disposed in a ball head seat (410). The ball head (510) has a mounting hole (520) at its center for a quartz rod to pass through. The end of the ball head (510) away from the rotating assembly has an extension tube (530). The top wall of the extension tube (530) has a hinge seat for hinged mounting of an electric push rod (600). The ball head seat (410) has extensions (411) on both sides of its sidewalls. Each extension (411) has two symmetrical recesses (412). A circular hole is provided at the center of the extension (411). A rotating shaft is rotatably installed in the circular hole of the extension (411). A limiting member (700) is detachably installed on the rotating shaft located in the circular hole. The limiting member (700) has a first protrusion (710) and a second protrusion (711) extending along the length direction of the ball head (510). The first protrusion (710) and the second protrusion (711) are respectively located in the two symmetrical recesses (412). A blocking part (413) is formed between the two recesses (412) on each extension (411). The rotating shaft has a threaded hole at its center, and a bolt (720) is installed in the threaded hole. A limiting member (700) is sleeved on the stud of the bolt (720), and the limiting member (700) can rotate around the bolt (720).

2. The semiconductor quartz component polishing equipment according to claim 1, characterized in that, The extension tube (530) has a plurality of clamping pieces (531) equidistantly arranged along the circumference of the extension tube (530) at one end away from the ball head (510), and fasteners (540) are threaded on the outer wall of the plurality of clamping pieces (531).

3. The semiconductor quartz component polishing equipment according to claim 2, characterized in that, The outer wall of the clamping piece (531) away from the extension tube (530) has a tapered portion (5311), and the outer wall of the clamping piece (531) has an external thread (5312). A rubber block (532) that mates with the outer wall of the quartz rod is installed on the inner wall of the clamping piece (531) corresponding to the tapered portion (5311). The fastener (540) has a mating port (541) that mates with the outer wall of the clamping piece (531). The inner wall of the mating port (541) has a mating portion (542) that mates with the tapered portion (5311). The inner wall of the tapered portion (5311) has an internal thread (543) that mates with the external thread (5312).

4. The semiconductor quartz component polishing equipment according to claim 3, characterized in that, The polishing assembly includes a rotary cylinder (210) located on the side wall of the polishing chamber (110), a clamping device (220) is mounted on the rotating end of the rotary cylinder (210), and a polishing head (230) for polishing is mounted on the clamping device (220).

5. The semiconductor quartz component polishing equipment according to claim 4, characterized in that, The inner wall of the polishing chamber (110) is provided with a mounting groove (130) coaxially arranged with the polishing head (230). The rotating assembly includes an external gear ring (310) located in the mounting groove (130) and fixedly connected to the extension block (401) and a motor (320) located in the main body (100) of the device. A gear (330) that meshes with the external gear ring (310) is installed on the output end of the motor (320).

6. The semiconductor quartz component polishing equipment according to claim 1, characterized in that, A collection groove (120) is provided at the bottom wall of the polishing chamber (110), and a liquid supply assembly (800) is installed on the inner wall of the polishing chamber (110) above the polishing assembly.

7. The semiconductor quartz component polishing equipment according to claim 1, characterized in that, The mounting arm (400) has a threaded post (402) at the bottom and a ball head seat (410) has a connection part that is threaded to the threaded post (402) at the top.

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