Angle valve structure with adjustable plasma spraying direction and plasma processing equipment

Abstract

The invention relates to the technical field of wafer processing equipment, in particular to an angle valve structure with the adjustable plasma spraying direction and plasma processing equipment, and the angle valve structure comprises a valve shell, a circumferential adjusting part, an axial sliding rail, a plasma spraying head and a pipeline assembly; a valve cavity is formed in the valve shell, and a first valve port and a second valve port which communicate with the valve cavity are formed in the valve shell. One end of the pipeline assembly is communicated with the plasma source, and the other end of the pipeline assembly is communicated with the plasma spray head; the axial sliding rail is arranged on the side wall of the valve cavity in the axial direction, the circumferential adjusting piece is arranged on the axial sliding rail in a sliding mode and can do axial movement along the axial sliding rail, and the plasma spray head is arranged on the circumferential adjusting piece and can do circumferential rotation. The defects that traditional mechanical or chemical cleaning needs to be stopped, the efficiency is low, and parts are possibly damaged or pollution is introduced are overcome, the continuous operation time of equipment is effectively prolonged, the maintenance efficiency is effectively improved, and the pollution risk is reduced.

Description

Technical Field

[0001] This invention relates to the field of wafer processing equipment technology, and in particular to an angle valve structure with adjustable plasma jet direction and a plasma processing device. Background Technology

[0002] During the operation of semiconductor equipment, byproducts generated by process gases can enter the downstream vacuum system and easily accumulate in the low-temperature angle valve area. This can lead to numerous problems such as airflow blockage, valve malfunction, particulate contamination, and frequent equipment downtime for maintenance. Currently used traditional methods such as mechanical cleaning, chemical cleaning, or high-temperature treatment all require production interruption and are offline operations, which are not only inefficient but also damage components or introduce contamination. Summary of the Invention

[0003] The purpose of this invention is to provide an angle valve structure with adjustable plasma jet direction and a plasma processing device, which solves the problems of airflow blockage, valve failure, particulate matter contamination and the need for downtime maintenance caused by the accumulation of process by-products in the angle valve area in the prior art.

[0004] To achieve the above objectives, the present invention provides an angle valve structure with adjustable plasma jet direction, including a valve housing, a circumferential adjusting component, an axial slide rail, a plasma nozzle, and a pipeline assembly; The valve housing has a valve cavity inside, and the valve housing has a first valve port and a second valve port communicating with the valve cavity; the pipeline assembly is located in the valve housing, with one end connected to the plasma source and the other end connected to the plasma nozzle; The axial slide rail is axially disposed on the side wall of the valve cavity. The circumferential adjustment component is slidably disposed on the axial slide rail and can move axially along the axial slide rail. The plasma nozzle is disposed on the circumferential adjustment component and can rotate circumferentially. The direction of the plasma nozzle is dynamically adjusted by the cooperation between the circumferential adjustment component and the axial slide rail, thereby adjusting the plasma jet direction to precisely remove deposited byproducts at a fixed point.

[0005] Optionally, a first driving member is fixedly provided on the side wall of the axial slide rail or the wall of the valve cavity. The driving end of the first driving member is connected to the circumferential adjusting member so as to drive the circumferential adjusting member to move axially on the axial slide rail.

[0006] Optionally, the circumferential adjusting member includes an outer ring portion, an inner ring portion, and a rotating shaft portion; The outer ring portion is slidably disposed on the axial slide rail, the outer ring portion is surrounding the inner ring portion, and the rotating shaft portion is disposed between the outer ring portion and the inner ring portion, and connects the outer ring portion and the inner ring portion.

[0007] Optionally, the piping assembly includes a rigid pipe, a flexible pipe, and an annular connecting portion; The rigid tube is fixedly inserted into the side wall of the valve housing, with one end of the rigid tube connected to the plasma source and the other end connected to the elastic tube. The free end of the elastic tube is connected to the annular connecting part, which is movably disposed in the annular groove. The annular groove is formed by a recess from the top to the bottom of the inner ring. A first through hole is provided on the inner ring, which is used for communication between the plasma nozzle and the annular connecting part and the elastic tube.

[0008] Optionally, a driving assembly is provided between the outer ring portion and the inner ring portion, the driving assembly including a second driving member, a first gear and a second gear; The second driving member is disposed on the inner ring wall of the outer ring portion, the first gear is disposed on the driving end of the second driving member, the second gear is fixedly sleeved on the outer ring portion, and the second gear meshes with the first gear, so as to drive the inner ring portion to rotate circumferentially relative to the outer ring portion by cooperating with the second driving member.

[0009] Optionally, the inner ring portion has a deflection groove recessed from the inner ring wall to the outer ring wall, and a deflection ball is movably disposed in the deflection groove. The plasma nozzle is disposed on the end of the deflection ball located outside the deflection groove, so that the deflection angle of the plasma nozzle can be adjusted by the deflection movement of the deflection ball in the deflection groove. The deflection ball has a communicating cavity inside that communicates with the plasma nozzle, and the deflection ball has a plurality of second through holes for communicating the communicating cavity and the first through hole.

[0010] Optionally, the axial height of the opening of the deflection groove is smaller than the diameter of the deflection ball.

[0011] Optionally, a plurality of first magnetic drive elements are provided on the sidewall of the deflection groove, and a plurality of second magnetic drive elements are provided on the deflection ball. The plurality of first magnetic drive elements and the plurality of second magnetic drive elements are controlled by independent power supplies, and the first magnetic drive elements and the second magnetic drive elements are matched. When it is necessary to adjust the plasma nozzle to a preset angle, the power supply of the first magnetic drive element at the target position and the second magnetic drive element matched with the first magnetic drive element at the target position is turned on, so that under the action of magnetic attraction force after being energized, the plasma nozzle is deflected to the preset angle by the deflection ball.

[0012] Optionally, the diameter of the second through hole is smaller than the diameter of the first through hole, and the air outlet of the first through hole simultaneously covers and connects to the air inlet of at least part of the second through hole.

[0013] Optionally, the first driving element, the plasma source, the second driving element, the first magnetic driving element, and the second magnetic driving element are all communicatively connected to the sensing element and the processing element. The sensing element is used to collect the position signal of the by-products deposited in the valve housing. The processing element drives the first driving element, the plasma source, the second driving element, the first magnetic driving element, and the second magnetic driving element to start according to the position signal of the by-products deposited in the valve housing, so that after adjustment by axial movement, circumferential movement, and deflection movement, the plasma nozzle is directed to a preset angle, so that the plasma accurately removes the deposited by-products at the preset angle.

[0014] Optionally, a valve core is provided in the valve cavity, and a valve stem is connected to the top of the valve core. The top of the valve stem is connected to a third driving member provided on the valve housing. The valve core is adapted to the first valve port so as to control the opening and closing of the first valve port when the third driving member drives the valve stem to move the valve core along the axial direction of the valve cavity.

[0015] To achieve the above objectives, the present invention also provides a plasma processing device, including a process chamber, a main process pipeline, a molecular pump and a dry pump, and a plasma jet direction adjustable angle valve structure, wherein the main process pipeline is connected to the process chamber, and the molecular pump, the plasma jet direction adjustable angle valve structure and the dry pump are sequentially arranged on the main process pipeline along the discharge direction of the process gas.

[0016] The beneficial effects of this invention are as follows: This invention achieves dynamic and precise adjustment of the plasma jet direction by incorporating a circumferentially adjustable component that can move along an axial slide rail within the valve cavity and a circumferentially rotatable plasma nozzle mounted thereon. This allows the system to precisely and directionally jet plasma to specific locations of deposited byproducts within the valve housing without interrupting equipment operation, thereby achieving targeted and efficient removal of deposits. This method overcomes the drawbacks of traditional mechanical or chemical cleaning methods, which require downtime, are inefficient, and may damage components or introduce contamination. It effectively improves the continuous operating time of the equipment, maintenance efficiency, and reduces the risk of contamination. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the adjustable plasma jet direction angle valve structure in an embodiment of the present invention; Figure 2 For the present invention Figure 1 A schematic diagram of the structure at position A in the embodiment; Figure 3 For the present invention Figure 2 A schematic diagram of the structure at position B in the embodiment.

[0018] Explanation of reference numerals in the attached figures: 1. Valve housing; 2. First valve port; 3. Second valve port; 4. Valve cavity; 5. Valve core; 6. Valve stem; 7. Circumferential adjusting component; 71. Outer ring; 72. Inner ring; 73. Rotating shaft; 8. Axial slide rail; 9. First driving component; 10. Driving assembly; 101. Second driving component; 102. First gear; 103. Second gear; 11. Plasma nozzle; 12. Piping assembly; 121. Rigid tube; 122. Elastic tube; 123. Annular connecting part; 124. Annular groove; 125. First through hole; 13. Deflecting ball; 131. Second through hole; 132. Connecting cavity; 14. Deflecting groove; 15. First magnetic driving component; 16. Second magnetic driving component. Detailed Implementation

[0019] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but do not exclude other elements or objects.

[0020] To address the problems existing in the prior art, embodiments of the present invention provide an angle valve structure with adjustable plasma jet direction, such as... Figure 1 and Figure 2 As shown, the adjustable plasma jet angle valve structure includes a valve housing 1, a circumferential adjusting component 7, an axial slide rail 8, a plasma nozzle 11, and a pipeline assembly 12.

[0021] In one embodiment, such as Figure 1 As shown, a valve cavity 4 is provided inside the valve housing 1, and a first valve port 2 and a second valve port 3 communicating with the valve cavity 4 are provided on the valve housing 1; in the actual process, the process gas flowing out of the process cavity enters the valve cavity 4 through the first valve port 2 and flows out through the second valve port 3, such as... Figure 1 As indicated by the middle arrow.

[0022] In one embodiment, such as Figure 1As shown, the piping assembly 12 is disposed on the valve housing 1, with one end connected to the plasma source and the other end connected to the plasma nozzle 11. This embodiment constructs a flexible and reliable transmission path from the external plasma source to the internal movable nozzle. Fixing the piping assembly 12 to the valve housing 1 ensures a stable connection between the plasma source and the angle valve structure, without interfering with the mechanical function of the valve body itself. By connecting one end to the plasma source and the other end to the movable plasma nozzle 11, plasma can be continuously delivered from the external source to the nozzle located inside the valve cavity 4. This ensures that the energy supply of the plasma nozzle 11 is not interrupted when adjusting the spray direction, thereby providing a continuous and necessary plasma flow for dynamically and accurately removing deposited byproducts on the inner wall of the valve cavity 4 without interfering with the equipment vacuum environment and process operation.

[0023] In one embodiment, such as Figure 1 and Figure 2 As shown, the axial slide rail 8 is axially mounted on the side wall of the valve cavity 4, and the circumferential adjusting member 7 is slidably mounted on the axial slide rail 8 and can move axially along the axial slide rail 8. This embodiment provides a basic and stable mechanical structure for the directional adjustment of the plasma nozzle 11. By fixing the axial slide rail 8 axially to the side wall of the valve cavity 4, the circumferential adjusting member 7 can slide smoothly and linearly within the valve cavity 4 along the pipe axis, precisely guided by the slide rail. This enables the position adjustment of the plasma nozzle 11 in the longitudinal direction (i.e., axial direction) of the valve body, allowing it to be aligned with byproducts deposited at different axial positions in the valve cavity 4 (such as near the first valve port 2 or the second valve port 3).

[0024] In one embodiment, the number of axial slide rails 8 can be set to several, and these axial slide rails 8 are arranged at intervals around the circumference of the valve cavity 4, preferably at equal intervals. This significantly improves the stability, load-bearing capacity, and guiding accuracy of the circumferential adjusting member 7 and its carried plasma nozzle 11 in the axial movement within the valve cavity 4. Arranging the axial slide rails 8 at intervals around the circumference of the valve cavity 4 provides multiple symmetrical linear motion fulcrums and guiding paths for the circumferential adjusting member 7. This multi-point support layout makes the force on the circumferential adjusting member 7 more uniform during axial movement, effectively preventing tilting, jamming, or increased wear caused by unilateral force or center of gravity shift. The equidistant arrangement further ensures the symmetry of load distribution and the smoothness of movement. Multiple axial slide rails 8 together form a robust and high-precision linear guide system, which not only enhances the structural rigidity of the entire adjustment mechanism, making it more reliable in vacuum or environments with impact and vibration, but also lays a better mechanical foundation for the subsequent accurate and stable positioning of the plasma nozzle 11 in the axial position.

[0025] The axial, radial, and circumferential directions described in this invention are all parallel to or coincide with the axial, radial, and circumferential directions of the valve housing 1, and will not be further explained hereafter.

[0026] In one embodiment, the axial movement of the circumferential adjusting member 7 can be the stroke length of the sliding along the axial slide rail 8. Specifically, this axial movement refers to the maximum effective distance that the circumferential adjusting member 7 can move along the axial direction of the valve cavity 4. Its range is jointly defined by the design length of the axial slide rail 8, the internal structure of the valve cavity 4 (such as the positions of the first valve port 2 and the second valve port 3), and the space required to avoid interference with other components within the valve. This movement design ensures that the plasma nozzle 11 can be positioned within the entire effective working depth of the valve cavity 4, thereby enabling the plasma to cover different deposition points along the axial path from near the first valve port 2 to the second valve port 3. This provides the necessary axial adjustment range for achieving precise positioning and cleaning in three-dimensional space (in conjunction with subsequent circumferential rotation).

[0027] In one embodiment, such as Figure 1 and Figure 2 As shown, the plasma nozzle 11 is mounted on the circumferential adjustment member 7 and can rotate circumferentially. The direction of the plasma nozzle 11 is dynamically adjusted through the cooperation of the circumferential adjustment member 7 and the axial slide rail 8, thereby adjusting the plasma jet direction to precisely remove deposited byproducts at specific points. This embodiment adds a crucial circumferential degree of freedom to the adjustment of the plasma jet direction and, in conjunction with axial movement, achieves dynamic control of the nozzle in three-dimensional space. By mounting the plasma nozzle 11 on the circumferentially rotating adjustment member 7, it can arbitrarily change the jet angle in a plane perpendicular to the axis (i.e., circumferentially). Combined with the axial movement of the circumferential adjustment member 7 on the axial slide rail 8, the plasma nozzle 11 can flexibly and precisely target byproducts deposited in any direction on the inner wall of the valve cavity 4 or on internal components. This linkage adjustment mechanism between the axial and circumferential directions allows the plasma nozzle 11 to "aim" at specific locations on complex surfaces within the cavity, thereby achieving precise, dynamic, and targeted removal of deposited byproducts, effectively solving the shortcomings of traditional offline cleaning methods that cannot reach certain angles or require overall cleaning.

[0028] In one embodiment, the circumferential rotation of the plasma nozzle 11 can be the circumferential angle of rotation around its mounting axis (which can be understood as the central axis of the valve cavity 4). Specifically, this circumferential rotation refers to the ability of the plasma nozzle 11 to rotate within a 360-degree range (or a certain angular range, such as 0-360 degrees) around its central axis. Its design aims to cover the entire circumferential direction of the annular inner wall of the valve cavity 4, allowing the plasma beam to be directed towards any circumferential position within the cavity (such as different clockwise directions) of the deposition point. This rotation is one of the key parameters for achieving comprehensive, thorough, and directional cleaning of the valve cavity's inner wall or components. Combined with axial movement, it ensures that the plasma nozzle 11 can accurately locate byproducts deposited at any position in three-dimensional space (i.e., any axial position and any circumferential angle), thereby achieving true "precise, targeted cleaning."

[0029] In one embodiment, such as Figure 2 As shown, a first driving member 9 is fixedly installed on the side wall of the axial slide rail 8 or the wall of the valve cavity 4. The driving end of the first driving member 9 is connected to the circumferential adjusting member 7, so as to drive the circumferential adjusting member 7 to move axially along the axial slide rail 8. This provides automated, precise and stable power and control for the axial movement of the circumferential adjusting member 7. By fixing the first driving member 9 to the wall of the valve cavity 4 or the axial slide rail 8 and directly connecting its driving end to the circumferential adjusting member 7, the linear power generated by the drive can be efficiently and reliably transmitted to the adjusting member. This allows the adjusting member to perform controlled and positionable linear movement on the axial slide rail 8 according to control commands, thereby driving the plasma nozzle 11 to move precisely to the target axial position without manual operation. This automates the axial position adjustment, which is the key power basis for realizing the automatic, dynamic and precise positioning of the entire plasma nozzle 11 to remove deposited by-products, and improves the control accuracy, response speed and automation level of the cleaning process of the system.

[0030] In one embodiment, the first drive element 9 can specifically be an automated actuator capable of providing linear driving force. Its implementation includes, but is not limited to, linear motors, electric actuators, servo cylinders, or ball screw modules. Taking a cylinder as an example, it uses compressed air to drive a piston rod in linear reciprocating motion, reliably connecting the drive end to the circumferential adjustment element 7. Regardless of the specific driving form used, the core function of the first drive element 9 is to convert the control signal into precise linear displacement, thereby achieving controllable and automated adjustment of the axial position of the plasma nozzle 11. It is a key power component for the three-dimensional dynamic positioning of the nozzle within the valve cavity 4 to remove deposits.

[0031] In one embodiment, such as Figure 2As shown, the circumferential adjusting member 7 includes an outer ring portion 71, an inner ring portion 72, and a rotating shaft portion 73. The outer ring portion 71 is slidably disposed on the axial slide rail 8, and surrounds the inner ring portion 72. The rotating shaft portion 73 is disposed between the outer ring portion 71 and the inner ring portion 72, and connects the outer ring portion 71 and the inner ring portion 72. This embodiment constructs a layered, nested, and functionally separated stable transmission structure, providing a clear and reliable mechanical basis for realizing the two independent degrees of freedom of axial movement and circumferential rotation of the plasma nozzle 11. The outer ring portion 71 is directly slidably disposed on the axial slide rail 8, responsible for moving along the axis of the valve cavity 4 under the action of driving force, thereby realizing the adjustment of the axial position of the nozzle. The inner ring 72 is surrounded by the outer ring 71 and is rotatably connected to the outer ring 71 via a rotating shaft 73. This ensures that the inner ring 72 and the plasma nozzle 11 mounted on it can rotate circumferentially relative to the outer ring 71 (and the entire axial position), thereby changing the circumferential spray angle of the nozzle. This structural design of "inner ring 72 rotating, outer ring 71 moving, and rotating shaft 73 connecting" cleverly decouples the two movements of axial translation and circumferential rotation, making the three-dimensional direction adjustment of the nozzle more precise, stable, and non-interfering. It is the core structural guarantee for achieving precise positioning and removal of deposited by-products.

[0032] In one embodiment, the inner ring cavity diameter of the inner ring portion 72 is larger than the diameter of the valve core 5 described later. This provides the necessary, interference-free physical space for the movement of the valve core 5 within the valve cavity 4, ensuring the independent and reliable operation of the traditional valve function and the newly added cleaning function in the integrated design of this invention. The inner ring cavity of the inner ring portion 72 is the structure that houses the plasma nozzle 11 adjustment mechanism. Designing its diameter to be larger than the diameter of the valve core 5 means that after the valve is assembled, the central channel space (i.e., the inner ring cavity) surrounded by the inner ring portion 72 is larger than the maximum outer contour of the valve core 5. This ensures that when the valve core 5 moves axially under the drive of the valve stem 6 to control the opening and closing of the first valve port 2, its position will not have physical contact or interference with the inner ring portion 72 or the plasma nozzle 11 adjustment mechanism (such as the deflection ball 13, the first magnetic drive element 15, etc., detailed later) mounted thereon. This "inclusive" relationship in the size design cleverly solves the motion conflict problem when the "movable nozzle" and "movable valve core 5" coexist in the narrow space of the valve cavity 4, so that the two can perform their respective functions without interfering with each other, ensuring that the opening and closing function of the valve base and the online plasma cleaning function can be executed independently and smoothly.

[0033] In one embodiment, to ensure stable movement of the outer ring 71 on the axial slide rail 8, a guide structure or limiting component is provided on the outer ring 71. This arrangement effectively ensures the smoothness and straightness of the outer ring 71 during movement on the axial slide rail 8, and prevents it from deflecting, jamming, or falling off during sliding. This structure may include a guide groove matching the cross-sectional shape of the axial slide rail 8 (such as a T-shaped, dovetail, or cylindrical guide rail), or be equipped with rolling elements such as linear bearings or sliders to reduce sliding friction and improve movement accuracy. By adding such a guide structure, the axial movement of the outer ring 71 becomes smoother and more reliable, which not only ensures the accuracy of the axial positioning of the plasma nozzle 11, but also improves the long-term operational stability and durability of the entire adjustment mechanism in harsh working environments such as vacuum and potential deposits.

[0034] In one embodiment, such as Figure 2 As shown, the piping assembly 12 includes a rigid pipe 121, an elastic pipe 122, and an annular connecting portion 123. The rigid pipe 121 is fixedly inserted into the side wall of the valve housing 1, with one end connected to the plasma source and the other end connected to the elastic pipe 122. The free end of the elastic pipe 122 is connected to the annular connecting portion 123. This embodiment cleverly solves the problem of reliable plasma transmission from an external stable source to an internal moving nozzle through a rigid-flexible and dynamic-static separation piping connection method. The rigid pipe is fixed to the side wall of the valve housing 1, ensuring stable and reliable connection with the plasma source and valve body. The introduction of the elastic pipe 122 is crucial. One end is connected to the rigid pipe, and the free end is connected to the annular connecting portion 123. Utilizing the flexibility and extensibility of its material, it compensates for the relative displacement generated by subsequent structures (such as the inner ring portion 72) during axial movement, avoiding damage to the piping due to kinking or pulling, or affecting the movement accuracy. This design ensures that during the dynamic process of adjusting the direction and angle of the plasma nozzle 11, the plasma gas flow or energy can be continuously and smoothly supplied to the nozzle through the annular connecting part 123, achieving a balance between flexibility of movement, reliability of sealing, and stability of the gas path.

[0035] In one embodiment, such as Figure 2As shown, the annular connecting portion 123 is movably disposed within the annular groove 124. The annular groove 124 is recessed from the top to the bottom of the inner ring portion 72. A first through hole 125 is provided on the inner ring portion 72, which is used for communication between the plasma nozzle 11 and the annular connecting portion 123 and the elastic tube 122. This provides a stable, sealed connection interface that does not interfere with rotational motion for the transmission of plasma from the moving part (annular connecting portion 123) to the mounting part of the plasma nozzle 11 (inner ring portion 72). The annular groove 124 is recessed at the top of the inner ring portion 72, providing a stable installation and movement space for the annular connecting portion 123. The annular connecting portion 123 is movably disposed within the annular groove 124, allowing it to maintain a basically constant position or make small-range adaptations relative to the inner ring portion 72 during circumferential rotation, thereby avoiding rigid interference with the inner ring portion 72. By providing the first through hole 125, a fluid (plasma) passage is established between the annular connecting portion 123 and the plasma nozzle 11. This combination structure of "annular groove 124 to movable annular connecting part 123 to first through hole 125" ensures that when the inner ring part 72 rotates with the plasma nozzle 11, the plasma delivered from the elastic tube 122 can always pass through the annular connecting part 123 and then be stably guided to the plasma nozzle 11 through the first through hole 125, thereby realizing reliable and continuous transmission of power and signal between moving parts.

[0036] In one embodiment, such as Figure 2 As shown, a drive assembly 10 is provided between the outer ring portion 71 and the inner ring portion 72. The drive assembly 10 includes a second drive member 101, a first gear 102, and a second gear 103.

[0037] In one embodiment, such as Figure 2As shown, the second driving member 101 is disposed on the inner ring wall of the outer ring portion 71, the first gear 102 is disposed on the driving end of the second driving member 101, and the second gear 103 is fixedly sleeved on the outside of the inner ring portion 72, and the second gear 103 meshes with the first gear 102, so as to drive the inner ring portion 72, with the plasma nozzle 11, to rotate circumferentially relative to the outer ring portion 71 through cooperation with the second driving member 101. This embodiment provides a precise, stable and reliable gear drive mechanism for the circumferential rotation of the inner ring portion 72. The second driving member 101 is disposed on the inner ring wall of the outer ring portion 71, and the first gear 102 is fixed on its driving end, forming a power source. The second gear 103 is fixedly sleeved on the outside of the inner ring portion 72 and meshes with the first gear 102, transmitting the rotational power of the second driving member 101 through this pair of gears, amplifying or precisely converting the small-angle rotation of the driving member into the circumferential rotation of the inner ring portion 72. This gear meshing transmission method has the advantages of constant transmission ratio, high positioning accuracy, and large torque transmission, enabling the inner ring 72 (and the plasma nozzle 11 mounted thereon) to rotate precisely and in a controllable manner relative to the outer ring 71. By controlling the start, stop, direction, and speed of the second drive component 101, the circumferential pointing angle of the plasma nozzle 11 can be precisely adjusted, which is the core rotation drive solution for achieving automated three-dimensional positioning and removal of by-products.

[0038] In one embodiment, the second driving member 101 can be a motor or driver capable of providing rotational power. The second driving member 101 is mounted on the inner ring wall of the outer ring portion 71, and its driving end is equipped with a first gear 102 for driving the inner ring portion 72 (via a second gear 103) to perform circumferential rotation. Therefore, its specific structure must be able to operate within the limited installation space inside the valve cavity 4 and reliably connect with the gear transmission mechanism. Typical implementation structures include rotary motors such as servo motors and stepper motors. This motor should have precise start / stop, direction, speed, and angle control capabilities to meet the needs of precise positioning of the plasma nozzle 11. The fixed connection between its output shaft and the first gear 102 can be a key connection, a tight fit, or a coupling connection to ensure reliable power transmission. Its overall structural design must consider factors such as the internal space of the valve cavity 4, vacuum environment compatibility, and heat dissipation.

[0039] In one embodiment, such as Figure 2As shown, the inner ring portion 72 has a deflection groove 14 recessed from the inner ring wall to the outer ring wall. A deflection ball 13 is movably disposed in the deflection groove 14. The plasma nozzle 11 is disposed on the end of the deflection ball 13 located outside the deflection groove 14, so that the deflection angle of the plasma nozzle 11 can be adjusted by the deflection movement of the deflection ball 13 in the deflection groove 14. The deflection ball 13 has a communicating cavity 132 inside, which communicates with the plasma nozzle 11. The deflection ball 13 has a plurality of second through holes 131 for connecting the communicating cavity 132 and the first through hole 125.

[0040] This embodiment introduces a second adjustable angular dimension (deflection angle) into the ejection direction of the plasma nozzle 11, greatly enhancing the flexibility of orientation and ensuring the continuity of plasma supply during adjustment. By providing a deflection groove 14 and a movable deflection ball 13 on the circumferentially rotatable inner ring 72, and fixing the plasma nozzle 11 to the deflection ball 13, the nozzle can be deflected in the pitch and other directions within the range allowed by the deflection groove 14 via a ball hinge, thereby finely adjusting its ejection tilt angle. The connecting cavity 132 inside the deflection ball 13 and the design connecting the second through hole 131 thereon with the first through hole 125 of the inner ring 72 constitute a fluid passage. No matter how the deflection ball 13 deflects, the plasma can smoothly flow from the first through hole 125 through several second through holes 131 into the connecting cavity 132, and finally reach the plasma nozzle 11, ensuring that the plasma nozzle 11 can obtain a continuous and uninterrupted plasma supply at any deflection angle. This combination of a "universal joint" spherical joint and an internally porous interconnected design allows the plasma nozzle 11 to not only move axially and rotate circumferentially, but also to pitch and deflect, achieving precise angle adjustment without blind spots in three-dimensional space, in order to target the deposited byproducts at any position on the surface of the complex valve cavity 4.

[0041] In one embodiment, such as Figure 2As shown, the axial height of the opening of the deflection groove 14 is smaller than the diameter of the deflection ball 13. This embodiment utilizes the mechanical limiting principle to achieve reliable engagement and universal constraint of the deflection ball 13, while providing a clear physical boundary for the deflection movement of the plasma nozzle 11. By designing the axial height of the opening of the deflection groove 14 to be smaller than the diameter of the deflection ball 13, the deflection ball 13 is confined within the groove after assembly and cannot be dislodged from the opening, thus ensuring its permanent connection with the inner ring 72 structure and operational reliability. This structure allows the deflection ball 13 to freely swing within a small range (i.e., deflection movement) within the deflection groove 14, providing the plasma nozzle 11 with the freedom to adjust deflection angles such as pitch. At the same time, the opening size limits the maximum swing amplitude of the deflection ball 13, providing a physical limitation on the deflection range of the nozzle, ensuring that the nozzle operates within a safe and controllable angle range, avoiding interference and collision with the inner wall of the valve cavity or other components, and improving the stability and safety of the entire adjustment mechanism.

[0042] In one embodiment, such as Figure 3As shown, a plurality of first magnetic drive elements 15 are disposed on the side wall of the deflection groove 14, and a plurality of second magnetic drive elements 16 are disposed on the deflection ball 13. The plurality of first magnetic drive elements 15 and the plurality of second magnetic drive elements 16 are controlled by independent power supplies, and the first magnetic drive elements 15 and the second magnetic drive elements 16 are matched. When it is necessary to adjust the deflection angle of the plasma nozzle 11, the power supply of the first magnetic drive element 15 at the target position and the second magnetic drive element 16 matched with the first magnetic drive element 15 at the target position is turned on, so that under the action of magnetic attraction after being energized, the plasma nozzle 11 is deflected to the preset angle by the deflection ball 13. This configuration provides a non-contact, precise and rapid-response electronically controlled drive method for adjusting the deflection angle of the plasma nozzle 11. By setting several independently controllable first magnetic drive elements 15 on the sidewall of the fixed deflection groove 14, and correspondingly setting several matching second magnetic drive elements 16 on the movable deflection ball 13, and controlling them with independent power supplies, the system constitutes a magnetic drive array. When it is necessary to adjust the nozzle to a preset deflection angle, the power supply of the first magnetic drive elements 15 and the second magnetic drive elements 16 at the target position is selectively turned on, so that they generate different or the same magnetism (generating attraction or driving force), thereby generating a controllable magnetic force between the corresponding first magnetic drive elements 15 and the second magnetic drive elements 16. This magnetic force acts on the deflection ball 13, causing it to deflect within the deflection groove 14, thereby driving the plasma nozzle 11 to accurately point to the preset angle. This magnetic drive method does not require complex mechanical transmission components, avoiding the wear, jamming, and sealing problems caused by mechanical contact. It is particularly suitable for the vacuum or special atmosphere environment of the valve cavity 4, and can achieve fast, accurate, and frictionless pointing adjustment. It is also easy to integrate with sensing and processing components to achieve fully automatic intelligent positioning and cleaning.

[0043] In one embodiment, the first magnetic drive element 15 and the second magnetic drive element 16 can be electromagnetic elements capable of generating controllable magnetic force. Therefore, their specific structures must be able to operate within the limited installation space inside the valve cavity 4 and be reliably integrated into the corresponding components. Typical implementation structures can be miniature electromagnets, energized coils, or other electromagnetic actuators. The first magnetic drive element 15 can be designed as a miniature electromagnet array fixed at a specific position on the side wall of the deflection slot 14, while the second magnetic drive element 16 can be a permanent magnet block, a soft magnetic material block, or another set of miniature electromagnets embedded or fixed at a corresponding position on the deflection ball 13. By independently controlling the power supply to each electromagnet, the magnitude, direction, and point of application of the magnetic force can be precisely controlled, thereby achieving contactless and precise electronic control adjustment of the deflection angle of the deflection ball 13 (and the plasma nozzle 11).

[0044] In one embodiment, the number of the second magnetic drive element 16 and the first magnetic drive element 15 can be matched to each other in space to form multiple independent and controllable magnetic drive pairs. The purpose is to achieve precise and controllable deflection of the deflection ball 13 in multiple directions within the deflection groove 14. A typical matching method can be designed as follows: on the circumferential sidewall of the deflection groove 14, multiple (e.g., three, four or more) independently controlled first magnetic drive elements 15 are distributed at equal intervals along the circumference, each corresponding to a different driving orientation (e.g., front, back, left, right, etc.). On the deflection ball 13, the same or more second magnetic drive elements 16 are arranged at corresponding spherical positions, and are matched one-to-one or can be combined with the first magnetic drive elements 15 on the deflection groove 14 in three-dimensional space. When the plasma nozzle 11 needs to be deflected to a specific angle, the control system can precisely connect the power supply to one or more corresponding drive pairs (first magnetic drive 15, second magnetic drive 16) at the target orientation. Utilizing the magnetic attraction (or repulsion) generated after energization, a resultant torque is formed in that direction, thereby driving the deflection ball 13 and the nozzle to precisely deflect to the preset angle. This design, which coordinates the number and space of multiple drive pairs, is the foundation for achieving multi-degree-of-freedom, high-precision stepless magnetic deflection control.

[0045] In one embodiment, such as Figure 3 As shown, the diameter of the second through-hole 131 is smaller than the diameter of the first through-hole 125, and the outlet of the first through-hole 125 simultaneously covers and connects to at least a portion of the inlet of the second through-hole 131. This embodiment ensures the continuity of plasma transmission, the reliability of sealing, and adapts to the movement of the deflection ball 13 through a clever structural design. Designing the diameter of the second through-hole 131 to be smaller than that of the first through-hole 125 can effectively prevent foreign object blockage and play a certain role in acceleration or focusing in fluid dynamics. More importantly, by geometrically covering the air inlet of at least part of the second through-hole 131 (located on the movable deflection ball 13) with the outlet of the first through-hole 125 (located in the fixed inner ring 72), the plasma flow can smoothly flow from the first through-hole 125 into at least one (usually multiple) second through-holes 131, and then into the connecting cavity 132 and the plasma nozzle 11, regardless of how the deflection ball 13 deflects. This "large hole covering small hole array" design provides a continuous, uninterrupted, and sealed connection interface that allows for a certain relative positional deviation for the fluid passage between the two components when the deflection ball 13 moves, thereby ensuring a stable plasma supply to the nozzle at any operating angle. This is a key fluid channel design for achieving stepless deflection.

[0046] In one embodiment, the first driving element 9, the plasma source, the second driving element 101, the first magnetic driving element 15, and the second magnetic driving element 16 are all communicatively connected to a sensing element and a processing element. The sensing element is used to collect the position signal of the by-products deposited in the valve housing 1. The processing element drives the first driving element 9, the plasma source, the second driving element 101, the first magnetic driving element 15, and the second magnetic driving element 16 to start according to the position signal of the by-products deposited in the valve housing 1. After adjustment by axial movement, circumferential movement, and deflection movement, the plasma nozzle 11 is directed to a preset angle, so that the plasma precisely removes the deposited by-products at the preset angle. This embodiment integrates local mechanical drive, global sensing, and intelligent control into an automated, closed-loop online cleaning system. By connecting the first driving component 9, the second driving component 101, the first magnetic driving component 15, and the second magnetic driving component 16 that drive the plasma nozzle 11 to achieve axial movement, circumferential rotation, and pitch deflection, as well as the plasma source itself, to the sensing and processing components, the system can automatically calculate the precise spatial coordinates (i.e., the preset angle) required for the nozzle to reach based on the specific position signal of the by-products inside the valve housing 1 collected in real time by the sensing component, and drive the various actuators to coordinate their actions. This enables the entire by-product removal process to achieve an automated closed loop of "perception to decision to execution": the system automatically detects the deposition location, automatically plans the nozzle path, and automatically controls the nozzle to perform a three-dimensional composite movement to accurately point to the target point, and finally automatically starts and stops the plasma for targeted removal. This not only achieves online, real-time, and non-interventional cleaning of by-products, greatly improving maintenance efficiency and avoiding equipment downtime, but also minimizes human error through fully automatic and precise control, ensuring the reliability, consistency, and efficiency of the cleaning process. This is the core control scheme of this invention for achieving intelligent, automated, and precise cleaning.

[0047] In one embodiment, the sensing element can be a visual sensor, which identifies the location and shape of deposits by acquiring and processing images of the inner wall of the valve cavity; a laser sensor, which measures distance or identifies surface contour anomalies by emitting a laser beam and receiving reflected signals; or a spectral detection device, which identifies the composition and location of deposits by analyzing the reflection or emission spectra of specific wavelengths. Regardless of the specific technology used, the sensing element must be able to operate stably in the vacuum or specific process atmosphere of the valve cavity 4 and convert the detected position information into an electrical signal so that the processing unit can calculate the precise pointing angle required by the plasma nozzle 11.

[0048] In one embodiment, the processing unit can be a programmable logic controller, an industrial computer, an embedded microprocessor, or a dedicated motion control card. This processing unit integrates signal processing, motion trajectory calculation, and logic control functions, serving as the "brain" and core control unit for achieving an automated closed loop from "sensing to decision-making to execution," ultimately enabling precise online removal of deposited byproducts from plasma.

[0049] In one embodiment, such as Figure 1 As shown, a valve core 5 is disposed within the valve cavity 4, and a valve stem 6 is connected to the top of the valve core 5. The top of the valve stem 6 is connected to a third driving component disposed on the valve housing 1. The valve core 5 is adapted to the first valve port 2 so as to control the opening and closing of the first valve port 2 when the third driving component drives the valve stem 6 to move the valve core 5 along the axial direction of the valve cavity 4. The basic flow control function of a traditional angle valve and the plasma cleaning function of this invention are integrated within the same valve body structure, realizing the multi-functional integration and high efficiency of the equipment. The arrangement of the valve core 5, valve stem 6 and third driving component allows this structure to retain and strengthen its core function as an "angle valve": that is, the valve stem 6 is driven by the third driving component (such as a cylinder or motor) to move the valve core 5 along the axial direction of the valve cavity 4, thereby precisely opening or closing the first valve port 2 to control the opening and closing and flow of process gas in the pipeline, meeting the basic requirements for switching and regulating the gas flow in the vacuum system. Meanwhile, this design is spatially and functionally independent of the newly added plasma nozzle 11 adjustment system for removing deposits, ensuring no interference between them. This allows the angle valve structure to perform its on / off function during normal operation, while simultaneously enabling online, targeted cleaning using the plasma system within the same structure when byproduct deposition is detected in the valve chamber 4, without requiring additional disassembly or installation of cleaning devices. This significantly improves the compactness, functional integrity, and ease of maintenance of the equipment, achieving seamless switching between "working" and "self-cleaning" modes within the same device.

[0050] To address the problems existing in the prior art, embodiments of the present invention also provide a plasma processing device, including a process chamber, a main process pipeline, a molecular pump, a dry pump, and a plasma jet direction-adjustable angle valve structure. The main process pipeline is connected to the process chamber, and the molecular pump, the plasma jet direction-adjustable angle valve structure, and the dry pump are sequentially arranged on the main process pipeline along the discharge direction of the process gas. Integrating the plasma jet direction-adjustable angle valve structure proposed in this invention into the vacuum piping system of the plasma processing device constructs a complete device solution with online, fixed-point self-cleaning capabilities. By setting the adjustable angle valve structure on the main process pipeline downstream of the process chamber, along the discharge direction of the process gas, between the molecular pump and the dry pump (i.e., a typical angle valve installation position), it functions as a conventional angle valve to control airflow during normal operation. When the sensor detects byproduct deposition inside the angle valve structure, its built-in plasma jet system can be immediately activated. Without interrupting the equipment's process operation (online), the nozzle direction is dynamically adjusted to precisely remove the deposits inside the valve. This fundamentally solves the problems of airflow blockage, valve failure, and particulate contamination caused by the accumulation of byproducts in the low-temperature angle valve area of ​​the vacuum system. It avoids the inefficiency, component damage, and contamination problems caused by the need for offline cleaning and disassembly of traditional methods, thereby significantly improving the continuous operation time, process stability, and maintenance efficiency of plasma processing equipment.

[0051] In one embodiment, the plasma processing equipment can be a plasma etching device for selectively removing material from the wafer surface through chemical reaction and / or physical bombardment of the material with plasma; a plasma-enhanced chemical vapor deposition device for depositing thin films on the wafer surface; and a plasma resist remover or plasma ashing device for removing photoresist or other organic residues from the wafer surface. The plasma jet direction-adjustable angle valve structure of the present invention can be applied to the vacuum piping system of any of the above-mentioned types of equipment to solve the problem caused by the deposition of byproducts generated during the process in the angle valve region, thereby improving the online maintenance capability and process stability of the equipment.

[0052] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the present invention. Furthermore, the present invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A plasma jet direction adjustable angle valve structure, characterized in that, Includes valve housing, circumferential adjusting components, axial slide rails, plasma nozzles, and piping assemblies; The valve housing has a valve cavity inside, and the valve housing has a first valve port and a second valve port communicating with the valve cavity; the pipeline assembly is located in the valve housing, with one end connected to the plasma source and the other end connected to the plasma nozzle; The axial slide rail is axially disposed on the side wall of the valve cavity. The circumferential adjustment component is slidably disposed on the axial slide rail and can move axially along the axial slide rail. The plasma nozzle is disposed on the circumferential adjustment component and can rotate circumferentially. The direction of the plasma nozzle is dynamically adjusted by the cooperation between the circumferential adjustment component and the axial slide rail, thereby adjusting the plasma jet direction to precisely remove deposited byproducts at a fixed point.

2. The plasma jet direction adjustable angle valve structure according to claim 1, characterized in that, A first driving member is fixedly provided on the side wall of the axial slide rail or the wall of the valve cavity. The driving end of the first driving member is connected to the circumferential adjusting member so as to drive the circumferential adjusting member to move axially on the axial slide rail.

3. The plasma jet direction adjustable angle valve structure according to claim 2, characterized in that, The circumferential adjusting component includes an outer ring, an inner ring, and a rotating shaft. The outer ring portion is slidably disposed on the axial slide rail, the outer ring portion is disposed around the inner ring portion, and the rotating shaft portion is disposed between the outer ring portion and the inner ring portion, and connects the outer ring portion and the inner ring portion.

4. The plasma jet direction adjustable angle valve structure according to claim 3, characterized in that, The piping assembly includes a rigid pipe, a flexible pipe, and an annular connecting portion; The rigid tube is fixedly inserted into the side wall of the valve housing, with one end of the rigid tube connected to the plasma source and the other end connected to the elastic tube. The free end of the elastic tube is connected to the annular connecting part, which is movably disposed in the annular groove. The annular groove is formed by a recess from the top to the bottom of the inner ring. A first through hole is provided on the inner ring, which is used for communication between the plasma nozzle and the annular connecting part and the elastic tube.

5. The plasma jet direction adjustable angle valve structure according to claim 4, characterized in that, A drive assembly is provided between the outer ring portion and the inner ring portion, and the drive assembly includes a second drive element, a first gear, and a second gear. The second driving member is disposed on the inner ring wall of the outer ring portion, the first gear is disposed on the driving end of the second driving member, the second gear is fixedly sleeved on the outer ring portion, and the second gear meshes with the first gear, so as to drive the inner ring portion to rotate circumferentially relative to the outer ring portion by cooperating with the second driving member.

6. The plasma jet direction adjustable angle valve structure according to claim 5, characterized in that, The inner ring portion has a deflection groove recessed from the inner ring wall to the outer ring wall. A deflection ball is movably disposed within the deflection groove. The plasma nozzle is disposed at the end of the deflection ball located outside the deflection groove, so that the deflection angle of the plasma nozzle can be adjusted by the deflection movement of the deflection ball within the deflection groove. The deflection ball has a communicating cavity inside that communicates with the plasma nozzle. The deflection ball has a plurality of second through holes for connecting the communicating cavity and the first through hole.

7. The plasma jet direction adjustable angle valve structure according to claim 6, characterized in that, The axial height of the opening of the deflection groove is less than the diameter of the deflection ball.

8. The plasma jet direction adjustable angle valve structure according to claim 6, characterized in that, The deflection groove has a plurality of first magnetic drive elements on its sidewall, and the deflection ball has a plurality of second magnetic drive elements. The plurality of first magnetic drive elements and the plurality of second magnetic drive elements are controlled by independent power supplies, and the first magnetic drive elements and the second magnetic drive elements are matched. When it is necessary to adjust the plasma nozzle to a preset angle, the power supply of the first magnetic drive element at the target position and the second magnetic drive element matched with the first magnetic drive element at the target position is turned on, so that under the action of magnetic attraction after being energized, the plasma nozzle is deflected to the preset angle by the deflection ball.

9. The plasma jet direction adjustable angle valve structure according to claim 6, characterized in that, The diameter of the second through hole is smaller than that of the first through hole, and the air outlet of the first through hole simultaneously covers and connects to the air inlet of at least part of the second through hole.

10. The plasma jet direction adjustable angle valve structure according to claim 8, characterized in that, The first driving element, the plasma source, the second driving element, the first magnetic driving element, and the second magnetic driving element are all communicatively connected to the sensing element and the processing element. The sensing element is used to collect the position signal of the by-products deposited in the valve housing. The processing element drives the first driving element, the plasma source, the second driving element, the first magnetic driving element, and the second magnetic driving element to start according to the position signal of the by-products deposited in the valve housing. After adjustment by axial movement, circumferential movement, and deflection movement, the plasma nozzle is directed to a preset angle, so that the plasma can accurately remove the deposited by-products at the preset angle.

11. The plasma jet direction adjustable angle valve structure according to claim 8, characterized in that, A valve core is provided in the valve cavity, and a valve stem is connected to the top of the valve core. The top of the valve stem is connected to a third driving member provided on the valve housing. The valve core is adapted to the first valve port so as to control the opening and closing of the first valve port when the third driving member drives the valve stem to move the valve core along the axial direction of the valve cavity.

12. A plasma processing device, characterized in that, The system includes a process chamber, a main process pipeline, a molecular pump and a dry pump, and a plasma jet direction adjustable angle valve structure as described in any one of claims 1 to 11, wherein the main process pipeline is connected to the process chamber, and the molecular pump, the plasma jet direction adjustable angle valve structure and the dry pump are sequentially arranged on the main process pipeline along the discharge direction of the process gas.

Images