Solid metal ion source

Abstract

The invention discloses a solid metal ion source which comprises an ion source arc chamber, a cathode cap, a reflecting electrode, a metal source sample piece sleeve and a lining are arranged in the ion source arc chamber, the cathode cap and the reflecting electrode are oppositely arranged on the two sides in the ion source arc chamber, a lamp filament is arranged in the cathode cap, the metal source sample piece sleeve is arranged between the cathode cap and the lining in a sleeved mode, and the metal source sample piece sleeve is arranged in the lining in a sleeved mode. The outer wall of the metal source sample piece sleeve is attached to the inner wall of the lining. The device has the advantages that the metal source sample piece sleeve can be prevented from being completely exposed in the arc chamber, and the service life is long.

Description

A solid metal ion source Technical Field

[0001] This invention relates to the field of ion source technology, and in particular to a solid metal ion source. Background Technology

[0002] A solid metal ion source is a device used to generate a metal ion beam. Its core feature is that it uses a solid metal material as the source of ion generation. This type of ion source converts solid metal into plasma through physical methods (such as sputtering, vacuum arc discharge, or surface ionization) and extracts a high-current metal ion beam from it.

[0003] Taking aluminum ion sources as an example, during operation, if the inner and outer sides of the aluminum source sample are sputtered, it can cause the aluminum sample to peel. Sputtering the inner side into the cathode cap can cause a short circuit, while sputtering the outer side can easily lead to perforation. Therefore, only the front side of the aluminum source sample (the end face near the reflector) needs to be sputtered for ionization. However, in existing ion source structures (such as CN115241033A), because the aluminum source sample (aluminum nitride) is completely exposed in the arc chamber, the plasma sputters over the entire area during ionization, which can damage the aluminum source sample. In severe cases, this can even lead to the failure of the aluminum source sample and reduce the service life of the equipment. Summary of the Invention

[0004] The technical problem to be solved by the present invention is to overcome the shortcomings of the prior art and provide a solid metal ion source that can prevent the metal source sample sleeve from being completely exposed in the arc chamber and has a long service life.

[0005] To solve the above-mentioned technical problems, the present invention adopts the following technical solution: a solid metal ion source, including an ion source arc chamber, wherein a cathode cap, a reflector, a metal source sample sleeve and a bushing are provided in the ion source arc chamber, the cathode cap and the reflector are arranged opposite to each other on both sides of the ion source arc chamber, a filament is provided in the cathode cap, and the metal source sample sleeve is sleeved between the cathode cap and the bushing, wherein the outer wall of the metal source sample sleeve is in contact with the inner wall of the bushing.

[0006] As a further improvement to the above technical solution: a gap is formed between the metal source sample sleeve and the cathode cap.

[0007] The metal source sample sleeve has an extension protruding from the cathode cap at the end near the reflector, and the extension extends to the cathode cap to block the gap.

[0008] Both the metal source sample sleeve and the bushing have a taper. The thickness of the metal source sample sleeve near the reflector side is greater than the thickness near the cathode cap side, and the thickness of the bushing near the reflector side is less than the thickness near the cathode cap side.

[0009] The cathode cap is fixedly provided with a cap rod extending to the outside of the ion source arc chamber. The solid metal ion source also includes a cathode cap clamping member, which is used to clamp the cap rod to fix the cathode cap.

[0010] The cathode cap and the cap rod are integrally formed, and the cap rod and the cathode cap are transitioned by machining an arc.

[0011] The cathode cap holder has filament holders on both sides, which are used to hold the ends of the filaments.

[0012] The cap rod is located in the middle of the cathode cap, and the two filament clamps are symmetrically arranged on both sides of the cathode cap clamp.

[0013] The solid metal ion source also includes a base, and the cathode cap holder and filament holder are respectively fixedly mounted on the base.

[0014] The metal source sample sleeve is an aluminum nitride sleeve.

[0015] Compared with the prior art, the advantages of the present invention are as follows: 1. The solid metal ion source of the present invention, by adding a bushing, shields the outer wall of the metal source sample sleeve, which can prevent the metal source sample sleeve from being completely exposed in the arc chamber, reduce the damage to the metal source sample sleeve caused by full-area sputtering, and extend the service life of the metal source sample sleeve and the entire equipment.

[0016] 2. The solid metal ion source of the present invention, by extending the gap to shield it (i.e., the projection on the plane perpendicular to the line connecting the reflector and the cathode cap, the extension completely covers the gap and extends to the cathode cap), can reduce the damage to the inner wall of the metal source sample sleeve caused by sputtered plasma entering from the gap, and further extend the service life of the metal source sample sleeve; in addition, by adding the extension, the contact area of ​​sputtering on the front of the metal source sample sleeve can also be increased, and the ionization effect is better.

[0017] 3. The solid metal ion source of the present invention has a tapered design for both the metal source sample sleeve and the bushing, which allows the metal source sample sleeve to self-tighten during assembly, resulting in a stable structure. During disassembly, only an axial force needs to be applied in the opposite direction to separate the metal source sample sleeve and the bushing, which facilitates the maintenance and replacement of the metal source sample sleeve and does not damage the connecting surface. In addition, the tapered sleeve connection method does not require additional connecting parts, resulting in a simple structure.

[0018] 4. The solid metal ion source of the present invention has a cap rod located in the middle of the cathode cap, and the two filament clamps are symmetrically arranged, which reduces the risk of contact short circuit caused by installation errors between the filament and the cathode cap, and has good reliability. Attached Figure Description

[0019] Figure 1 is a schematic diagram of the structure of the solid metal ion source of the present invention.

[0020] Figure 2 is a cross-sectional view of the ion source arc chamber in the solid metal ion source of the present invention.

[0021] The labels in the figure represent: 1. Ion source arc chamber; 2. Cathode cap; 21. Cap rod; 22. Cathode cap holder; 3. Reflector; 4. Metal source sample sleeve; 41. Extension; 5. Bushing; 6. Filament; 61. Filament holder; 7. Base; 8. Gap. Detailed Implementation

[0022] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0023] In the description of this invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0024] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0025] In this invention, unless otherwise explicitly specified and limited, the terms "assembly," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0026] As shown in Figures 1 and 2, the solid metal ion source of this embodiment includes an ion source arc chamber 1. The ion source arc chamber 1 is provided with a cathode cap 2, a reflector 3, a metal source sample sleeve 4, and a bushing 5. The cathode cap 2 and the reflector 3 are arranged opposite to each other on both sides of the ion source arc chamber 1. The cathode cap 2 is provided with a filament 6. The metal source sample sleeve 4 is sleeved between the cathode cap 2 and the bushing 5. The outer wall of the metal source sample sleeve 4 is attached to the inner wall of the bushing 5.

[0027] In this embodiment, the solid metal ion source, by adding a bushing 5, shields the outer wall of the metal source sample sleeve 4, which can prevent the metal source sample sleeve 4 from being completely exposed in the arc chamber, reduce the damage to the metal source sample sleeve 4 caused by full-area sputtering, and extend the service life of the metal source sample sleeve 4 and the entire equipment.

[0028] Furthermore, in this embodiment, a gap 8 is formed between the metal source sample sleeve 4 and the cathode cap 2. By leaving a gap 8 between the metal source sample sleeve 4 and the cathode cap 2 for heat insulation, it is possible to prevent metal ions on the inner wall of the metal source sample sleeve 4 from escaping due to heat, thereby further extending the service life of the metal source sample sleeve 4. The width of the gap 8 is 1.5mm to 2mm.

[0029] Furthermore, in this embodiment, the end of the metal source sample sleeve 4 near the reflector 3 is provided with an extension 41 protruding from the cathode cap 2. The extension 41 extends to the cathode cap 2 to shield the gap 8. By shielding the gap 8 with the extension 41 (i.e., in the projection on the plane perpendicular to the line connecting the reflector 3 and the cathode cap 2, the extension 41 completely covers the gap 8 and extends to the cathode cap 2), the damage caused by sputtered plasma entering from the gap 8 to the inner wall of the metal source sample sleeve 4 can be reduced, further extending the service life of the metal source sample sleeve 4; and by adding the extension 41, the contact area of ​​sputtering on the front of the metal source sample sleeve 4 can also be increased, resulting in better ionization effect. The distance between the cathode cap 2 and the extension 41 (i.e., the height of the extension 41 protruding from the cathode cap 2) is 1.2mm~1.5mm.

[0030] Furthermore, in this embodiment, both the metal source sample sleeve 4 and the bushing 5 have a taper. The thickness of the metal source sample sleeve 4 near the reflector 3 is greater than the thickness near the cathode cap 2, while the thickness of the bushing 5 near the reflector 3 is less than the thickness near the cathode cap 2. By having both the metal source sample sleeve 4 and the bushing 5 taper, the metal source sample sleeve 4 can self-tighten during assembly, resulting in a stable structure. During disassembly, only a reverse axial force needs to be applied to separate the metal source sample sleeve 4 from the bushing 5, facilitating maintenance and replacement of the metal source sample sleeve 4 without damaging the connecting surface. Moreover, the tapered sleeve connection eliminates the need for additional connecting components, simplifying the structure. Furthermore, existing metal source sample sleeves 4 typically have the metal source sample directly clamped into the end plate of the ion source arc chamber 1. This method places high demands on the roundness of the metal source sample sleeve 4 during machining. However, the tapered sleeve connection method of this application eliminates the need for direct contact between the metal source sample sleeve 4 and the ion source arc chamber 1, overcoming the aforementioned problems of existing technologies.

[0031] Furthermore, in this embodiment, a cap rod 21 extending to the outside of the ion source arc chamber 1 is fixedly disposed inside the cathode cap 2. The solid metal ion source also includes a cathode cap clamping member 22, which is used to clamp the cap rod 21 to fix the cathode cap 2. By clamping the cap rod 21 with the cathode cap clamping member 22 to fix the cathode cap 2, the position of the cathode cap 2 within the ion source arc chamber 1 is stabilized.

[0032] Furthermore, in this embodiment, the cathode cap 2 and the cap rod 21 are integrally formed, and the cap rod 21 and the cathode cap 2 are machined into an arc by turning. Compared with the existing embedded installation and sharp corner transition, the cap rod 21 is not easy to break, the structure is more stable, and the overall integrity is better.

[0033] Furthermore, in this embodiment, filament clamping members 61 are respectively provided on both sides of the cathode cap clamping member 22, and the filament clamping members 61 are used to clamp the ends of the filament 6. The two filament clamping members 61 clamp the two ends of the filament 6 respectively, so that the position of the filament 6 is stable.

[0034] Furthermore, in this embodiment, the cap rod 21 is located in the middle of the cathode cap 2, and the two filament clamps 61 are symmetrically arranged on both sides of the cathode cap clamp 22. Non-parallel installation of the filaments 6 on both sides can lead to uneven heating of the cathode cap 2, resulting in excessively rapid local wear and even perforation. By positioning the cap rod 21 in the middle of the cathode cap 2 and symmetrically arranging the two filament clamps 61, the risk of short circuits caused by installation errors between the filaments 6 and the cathode cap 2 is reduced, resulting in high reliability.

[0035] Furthermore, in this embodiment, the solid metal ion source also includes a base 7, and a cathode cap holder 22 and a filament holder 61 are respectively fixedly disposed on the base 7. By fixing the cathode cap holder 22 and the filament holder 61 with the base 7, the relative positions between the cathode cap holder 22 and the filament holder 61 are fixed, resulting in better reliability.

[0036] Furthermore, in this embodiment, the metal source sample sleeve 4 is an aluminum nitride sleeve, meaning that the solid metal ion source in this embodiment is an aluminum ion source. Of course, in other embodiments, the metal source sample can be replaced with other metal types.

[0037] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make many possible variations and modifications to the technical solutions of the present invention using the methods and techniques disclosed above, or modify them into equivalent embodiments with equivalent changes, without departing from the spirit and technical essence of the present invention. Therefore, any simple modifications, equivalent substitutions, equivalent changes, and modifications made to the above embodiments based on the technical essence of the present invention without departing from the content of the technical solutions of the present invention shall still fall within the protection scope of the technical solutions of the present invention.

Claims

1. A solid metal ion source, characterized in that: The device includes an ion source arc chamber (1), which contains a cathode cap (2), a reflector (3), a metal source sample sleeve (4), and a bushing (5). The cathode cap (2) and the reflector (3) are arranged opposite to each other on both sides of the ion source arc chamber (1). The cathode cap (2) contains a filament (6). The metal source sample sleeve (4) is fitted between the cathode cap (2) and the bushing (5). The outer wall of the metal source sample sleeve (4) is in contact with the inner wall of the bushing (5).

2. The solid metal ion source according to claim 1, characterized in that: A gap (8) is formed between the metal source sample sleeve (4) and the cathode cap (2).

3. The solid metal ion source according to claim 2, characterized in that: The metal source sample sleeve (4) has an extension (41) protruding from the cathode cap (2) at the end near the reflector (3). The extension (41) extends to the cathode cap (2) to block the gap (8).

4. The solid metal ion source according to claim 1, characterized in that: Both the metal source sample sleeve (4) and the bushing (5) have a taper. The thickness of the metal source sample sleeve (4) near the reflector (3) is greater than the thickness near the cathode cap (2). The thickness of the bushing (5) near the reflector (3) is less than the thickness near the cathode cap (2).

5. The solid metal ion source according to claim 1, characterized in that: The cathode cap (2) is fixedly provided with a cap rod (21) extending to the outside of the ion source arc chamber (1). The solid metal ion source also includes a cathode cap holder (22), which is used to hold the cap rod (21) to fix the cathode cap (2).

6. The solid metal ion source according to claim 5, characterized in that: The cathode cap (2) and the cap rod (21) are integrally formed, and the cap rod (21) and the cathode cap (2) are machined into an arc by turning to form a transition.

7. The solid metal ion source according to claim 5, characterized in that: The cathode cap holder (22) is provided with filament holders (61) on both sides, and the filament holders (61) are used to hold the end of the filament (6).

8. The solid metal ion source according to claim 7, characterized in that: The cap rod (21) is located in the middle of the cathode cap (2), and the two filament clamps (61) are symmetrically arranged on both sides of the cathode cap clamp (22).

9. The solid metal ion source according to claim 7, characterized in that: The solid metal ion source also includes a base (7), and the cathode cap holder (22) and filament holder (61) are respectively fixedly mounted on the base (7).

10. The solid metal ion source according to any one of claims 1 to 9, characterized in that: The metal source sample sleeve (4) is an aluminum nitride sleeve.

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