Dual-liquid feedstock synthesis reactor with cooling structure

Abstract

This application relates to a dual-liquid feedstock synthesis reactor with a cooling structure, comprising: a storage container, a reactor pipe, an upper spraying device, a lower spraying device, and a cooling system. The storage container has a hollow structure, and the reactor pipe is a tubular structure open at both ends. The reactor pipe is vertically arranged, with its bottom connected to the top of the storage container. The upper spraying device has a feedstock A inlet at its input end, with the spraying direction facing the bottom of the reactor pipe. The lower spraying device has a feedstock B inlet at its input end, with the spraying direction facing the top of the reactor pipe. The cooling pipe has its input end connected to the bottom of the storage container and its output end connected to the top of the reactor pipe, with the spraying direction facing the bottom of the reactor pipe. This increases the contact area for mass and heat transfer, avoiding uneven heating in localized reactions. The cooling system circulates the material in the storage container to the top of the reactor for spraying, achieving continuous removal of reaction heat and improving the mass and heat transfer effect.

Description

Technical Field

[0001] This application relates to the field of chemical equipment technology, and in particular to a dual-liquid feedstock synthesis reactor with a cooling structure. Background Technology

[0002] Due to rapid societal development, the demand for chemical intermediates is increasing, and the requirement for continuous chemical production is becoming increasingly urgent in practical regulatory processes. In the synthesis of aromatic hydrocarbons through sulfonation and acylation, gaseous products are generated alongside the reaction system, and the uniformity of raw material mixing directly affects reaction efficiency, product purity, and reaction safety. In existing aromatic hydrocarbon sulfonation and acylation reactors, due to uneven overheating in the reactor and storage containers, unreacted liquid raw material A or raw material B may escape with the gas released from the top. Summary of the Invention

[0003] In view of this, this application proposes a dual-liquid feedstock synthesis reactor with a cooling structure, comprising: a storage container, reactor piping, an upper spraying device, a lower spraying device, and a cooling system; The storage container has a hollow structure; The reactor pipe is a tubular structure with openings at both ends, and the reactor pipe is vertically arranged, with its bottom connected and communicating with the top of the storage container. The upper spraying device has a raw material A inlet at its input end and an output end that passes through the side wall of the reactor pipe to the inside of the reactor pipe, with the spraying direction facing the bottom of the reactor pipe; The input end of the lower spraying device is provided with a raw material B inlet, and the output end passes through the side wall of the reactor pipe to the inside of the reactor pipe. The spraying direction is towards the top of the reactor pipe, and the output end of the lower spraying device is located below the output end of the upper spraying device, and is arranged vertically with the output end of the upper spraying device. The cooling system includes a cooling pipe, an outlet valve, and a cooling nozzle. The inlet end of the cooling pipe is connected to the bottom of the storage container, and the outlet end is connected to the top of the reactor pipe. The cooling nozzle is located at the outlet end of the cooling pipe and sprays towards the bottom of the reactor pipe. The outlet valve is connected to the cooling pipe.

[0004] One possible implementation also includes: a first shunt plate; The first diversion plate is a plate-shaped structure with multiple first diversion holes on its surface. The first diversion plate is disposed inside the reactor pipe, with its surface perpendicular to the length direction of the reactor pipe, and is located above the output end of the upper spraying device.

[0005] One possible implementation also includes: a second shunt plate; The second flow divider plate is a plate-shaped structure with multiple second flow divider holes on its surface. The second flow divider plate is disposed inside the reactor pipe, and its surface is perpendicular to the length direction of the reactor pipe. The second diverter plate is located above the first diverter plate; The second diverter plate is spaced apart from the first diverter plate; The second diversion hole is staggered with the first diversion hole.

[0006] One possible implementation also includes: a flow divider; The flow divider is disposed between the first flow divider plate and the second flow divider plate; The diverter is a columnar structure with a preset length, the top of which is fixedly connected to the second diverter plate, and the bottom of the diverter is arc-shaped.

[0007] In one possible implementation, the reactor pipe has a double-layer structure with a first cooling channel pre-set inside; The first cooling channel is a columnar structure with an annular cross-section; The reactor pipe has a refrigerant outlet at the top and a refrigerant inlet at the bottom, and both the refrigerant inlet and the refrigerant outlet are connected to the first cooling channel.

[0008] In one possible implementation, the storage container has a double-layer structure with a pre-set second cooling channel inside; The second cooling channel is a columnar structure with an opening at the top; The storage container is provided with a refrigerant outlet at the top and a refrigerant inlet at the bottom, and both the refrigerant inlet and the refrigerant outlet are connected to the second cooling channel.

[0009] In one possible implementation, the upper spraying device includes an upper conveying pipe and an upper nozzle. The upper conveying pipe has an input end with a raw material A inlet and an output end that passes through the side wall of the reactor pipe to the interior of the reactor pipe. The upper nozzle is located at the output end of the upper conveying pipe and sprays towards the bottom of the reactor pipe.

[0010] The lower spraying device includes: a lower conveying pipe and a lower nozzle. The input end of the lower conveying pipe is provided with a raw material B inlet, and the output end passes through the side wall of the reactor pipe to the interior of the reactor pipe. The lower nozzle is located at the output end of the lower conveying pipe and sprays towards the top of the reactor pipe. The upper nozzle and the lower nozzle are arranged vertically, with the upper nozzle located above the lower nozzle.

[0011] In one possible implementation, the spray diameter of the lower nozzle is larger than the diameter of the reactor pipe; The spray diameter of the lower nozzle is larger than the diameter of the reactor pipe.

[0012] One possible implementation also includes: a hybrid board; The mixing plate is a plate-shaped structure, horizontally set at the bottom of the inside of the reactor pipe. The surface of the mixing plate has mixing holes, and multiple mixing holes are arranged in an array on the mixing plate.

[0013] In one possible implementation, there are two or more mixing plates, which are arranged vertically and horizontally, and any two adjacent mixing plates are spaced apart by a preset distance. The mixing holes on any two adjacent mixing plates are staggered.

[0014] The beneficial effects of the dual-liquid raw material synthesis reactor with cooling structure in this application embodiment are as follows: the top and bottom spray feeding method greatly increases the contact area between raw material A and raw material B, avoids uneven local reaction, and improves product purity. The cooling system circulates the material in the storage container to the top of the reactor for spraying, which not only realizes the continuous removal of reaction heat, but also disperses the material in the reactor for a second time, further improving the reaction uniformity.

[0015] Other features and aspects of this application will become clear from the following detailed description of exemplary embodiments with reference to the accompanying drawings. Attached Figure Description

[0016] The accompanying drawings, which are included in and form part of this specification, illustrate exemplary embodiments, features, and aspects of this application together with the specification and serve to explain the principles of this application.

[0017] Figure 1 This is a schematic cross-sectional view of the main structure of a dual-liquid feedstock synthesis reactor with a cooling structure according to an embodiment of this application; Figure 2 This diagram shows a partially enlarged cross-sectional view of a dual-liquid feedstock synthesis reactor with a cooling structure according to an embodiment of this application. Figure 3 This diagram shows a partially enlarged schematic of a flow divider according to an embodiment of this application; Figure 4 This is a partially enlarged schematic diagram of the hybrid plate according to an embodiment of this application. Detailed Implementation

[0018] Various exemplary embodiments, features, and aspects of this application will now be described in detail with reference to the accompanying drawings. The same reference numerals in the drawings denote elements that have the same or similar functions. Although various aspects of the embodiments are shown in the drawings, they are not necessarily drawn to scale unless specifically indicated otherwise.

[0019] It should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention or simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0020] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0021] The term “exemplary” as used herein means “serving as an example, embodiment, or illustration.” Any embodiment illustrated herein as “exemplary” is not necessarily to be construed as superior to or better than other embodiments.

[0022] Furthermore, to better illustrate this application, numerous specific details are provided in the following detailed embodiments. Those skilled in the art should understand that this application can be implemented without certain specific details. In some instances, methods, means, components, and circuits well-known to those skilled in the art have not been described in detail in order to highlight the main points of this application.

[0023] Due to rapid societal development, the demand for chemical intermediates is increasing, and the requirement for continuous chemical production is becoming increasingly urgent in practical regulatory processes. In the synthesis of aromatic hydrocarbons through sulfonation and acylation, gaseous products are generated alongside the reaction system, and the uniformity of raw material mixing directly affects reaction efficiency, product purity, and reaction safety. In existing aromatic hydrocarbon sulfonation and acylation reactors, due to uneven overheating in the reactor and storage containers, unreacted liquid raw material A or raw material B may escape with the gas released from the top.

[0024] It should be noted that raw material A can be an aromatic hydrocarbon, and raw material B can be a sulfonating agent (such as concentrated sulfuric acid, fuming sulfuric acid, etc.); in the acyl chloride reaction, raw material A can be an aromatic acid, and raw material B can be an acyl chloride agent (such as phosphorus oxychloride). The specific choice can be made according to the actual reaction requirements.

[0025] like Figure 1 As shown, the dual-liquid feedstock synthesis reactor with cooling structure in this embodiment includes: a storage container 10, a reactor pipe 20, an upper spraying device 31, a lower spraying device 32, and a cooling system. The storage container 10 has a hollow structure, and the reactor pipe 20 is a tubular structure with openings at both ends. The reactor pipe 20 is vertically arranged, with its bottom connected to and communicating with the top of the storage container 10. The upper spraying device 31 has a feedstock A inlet at its input end and its output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20. The spraying direction is towards the bottom of the reactor pipe 20. The lower spraying device 32 has a feedstock B inlet at its input end. The output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20, and the spraying direction is towards the top of the reactor pipe 20. The output end of the lower spraying device 32 is located below the output end of the upper spraying device 31 and is arranged vertically with the output end of the upper spraying device 31. The cooling system includes a cooling pipe 62, an outlet valve 63 and a cooling nozzle 65. The input end of the cooling pipe 62 is connected to the bottom of the storage container 10, and the output end is connected to the top of the reactor pipe 20. The cooling nozzle 65 is located at the output end of the cooling pipe 62 and sprays towards the bottom of the reactor pipe 20. The outlet valve 63 is connected to the cooling pipe 62.

[0026] In this specific embodiment, the top-to-bottom spray feeding method significantly increases the contact area between raw material A and raw material B, avoiding uneven local reactions and improving product purity. Meanwhile, the cooling system circulates the material in the storage container 10 to the top of the reactor for spraying, which not only achieves continuous removal of reaction heat but also performs secondary dispersion of the material in the reactor, further improving reaction uniformity.

[0027] Specifically, the storage container 10 is a hollow structure used to temporarily store materials generated during the reaction process and also serves as the starting point for material circulation in the cooling system. The reactor pipe 20, a vertically oriented tubular structure with openings at both ends and its bottom connected to the top of the storage container 10, is the core area where the sulfonation and acylchlorination reactions of the raw materials occur. The input end of the upper spraying device 31 is supplied with raw material A, such as aromatic hydrocarbons, and the output end extends into the interior of the reactor pipe 20. The spraying direction is towards the bottom of the pipe, causing raw material A to disperse downwards in a mist. The input end of the lower spraying device 32 is supplied with raw material B, such as sulfonating agents or acylchlorinating agents. The output end is located below the output end of the upper spraying device 31, and the spraying direction is towards the top of the reactor pipe 20, causing raw material B to disperse upwards in a mist. Through this top-to-bottom spraying method, raw material A and raw material B can fully contact and mix within the reactor pipe 20. The cooling system consists of a cooling pipe 62, an extraction valve 63, and a cooling nozzle 65. The extraction valve 63 extracts and stores part of the material inside the cooling pipe 62, while the cooling nozzle 65 sprays part of the material downward from the top of the reactor pipe 20, thereby achieving material circulation cooling and secondary dispersion.

[0028] In one specific embodiment, such as Figure 2 As shown, the upper spraying device 31 includes an upper conveying pipe and an upper nozzle. The input end of the upper conveying pipe is provided with a raw material A inlet, and the output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20. The upper nozzle is located at the output end of the upper conveying pipe, and the spraying direction is towards the bottom of the reactor pipe 20. The lower spraying device 32 includes a lower conveying pipe and a lower nozzle. The input end of the lower conveying pipe is used to input raw material B, and the output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20. The lower nozzle is located at the output end of the lower conveying pipe, and the spraying direction is towards the top of the reactor pipe 20. The upper nozzle and the lower nozzle are arranged vertically, with the upper nozzle located above the lower nozzle.

[0029] Furthermore, the upper spraying device 31 also includes an upper switch valve, an upper pressure transmitter, and an upper flow meter. The input end of the upper conveying pipe is used to input raw material A, and the output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20. The upper switch valve, upper pressure transmitter, and upper flow meter are respectively installed on the upper conveying pipe, and the upper nozzle is installed at the output end of the upper conveying pipe, with the spraying direction facing the bottom of the reactor pipe 20. In this way, by installing the combination structure of the upper switch valve, upper pressure transmitter, and upper flow meter on the upper conveying pipe, the operator can control the on / off of the feed through the upper switch valve according to the reaction process requirements, monitor the flow rate change of raw material A in real time through the upper pressure transmitter and upper flow meter, and adjust the feed flow rate according to the monitoring results, so as to achieve precise control of the feed flow rate of raw material A and avoid the problem of unstable reaction effect caused by fluctuations in feed flow rate.

[0030] In this specific embodiment, the lower spraying device 32 also includes a lower switching valve, a lower pressure transmitter, and a lower flow meter. The input end of the lower conveying pipe is used to input raw material B, and the output end passes through the side wall of the reactor pipe 20 to the interior of the reactor pipe 20. The lower switching valve, lower pressure transmitter, and lower flow meter are respectively installed on the lower conveying pipe. The lower nozzle is installed at the output end of the lower conveying pipe, and the spraying direction is towards the top of the reactor pipe 20. The spraying diameter of the lower nozzle is larger than the diameter of the reactor pipe 20. Thus, similar to the structural design of the upper spraying device 31, by installing the lower switching valve, lower pressure transmitter, and lower flow meter on the lower conveying pipe, precise control of the feed on / off and flow rate of raw material B can be achieved. This allows the operator to flexibly adjust the feed amount of raw material B according to the reaction requirements, ensuring that the two raw materials react in the optimal ratio.

[0031] In one specific embodiment, the spray diameter of the lower nozzle is larger than the diameter of the reactor pipe 20, ensuring that the raw material A sprayed by the upper nozzle and the raw material B sprayed by the lower nozzle can make full contact, thereby improving efficiency.

[0032] In one specific embodiment, the cooling system includes a cooling pipe 62, a first pump body 61, a switching valve, a pressure transmitter, a flow meter, a collection valve 63, and a cooling nozzle 65. The input end of the cooling pipe 62 is connected to the bottom of the storage container 10, and the output end is connected to the top of the reactor pipe 20. The cooling nozzle 65 is located at the output end of the cooling pipe 62, and the spray direction is towards the bottom of the reactor pipe 20. The collection valve 63 is connected to the cooling pipe 62. The input end of the first pump body 61 is connected to the bottom of the storage container 10, and the output end is connected to the input end of the cooling pipe. The reacted solution is discharged into the interior of the cooling pipe 62 by using the first pump body 61.

[0033] Among them, such as Figure 1 As shown, it also includes a collection pipe 64, which is connected to a cooling pipe 62 and forms a forked structure with the output end of the cooling pipe 62, allowing the reacted solution to enter the output end of the cooling pipe 62 and the collection pipe 64 respectively.

[0034] The switching valve, pressure transmitter, and flow meter are all installed on the cooling pipe 62, located between the connection point of the acquisition pipe 64 and the cooling pipe 62 and the output end of the cooling pipe 62.

[0035] The output end of the cooling pipe 62 is provided with multiple layers, including at least a first cooling pipe and a second cooling pipe. Both the first cooling pipe and the second cooling pipe are inserted into the interior of the reactor pipe 20. Multiple cooling nozzles 65 are provided, and the first cooling pipe and the second cooling pipe are arranged vertically to form multiple layers of cooling nozzles 65, which can cool the interior of the reactor pipe 20 where the reaction has just taken place.

[0036] Specifically, multiple cooling nozzles 65 are located between the upper nozzle 311 and the first splitter plate 41.

[0037] In one specific embodiment, such as Figure 2 As shown, it also includes: a first diversion plate 41, which is a plate-shaped structure with multiple first diversion holes on its surface. The first diversion plate 41 is disposed inside the reactor pipe 20, with its surface perpendicular to the length direction of the reactor pipe 20, and the first diversion plate 41 is located above the output end of the upper spraying device 31.

[0038] In this specific embodiment, the mist-like gas carrying liquid after the reaction is generated rises and collides with the first diversion plate 41. The liquid falls freely into the storage container 10 due to gravity, and the gas can be discharged through multiple first diversion holes opened on the first diversion plate 41.

[0039] Specifically, the first diverter plate 41 has a plate-like structure with multiple first diverter holes arranged in an array on its surface. In this way, the first diverter plate 41 with a large area can be used to block the mist gas, and the multiple first diverter holes arranged in an array can continue to discharge the gas and part of the mist gas upwards.

[0040] The first diversion plate 41 is a rigid plate structure with multiple through-holes evenly distributed on its surface. The first diversion plate 41 is fixedly installed inside the reactor pipe 20. During installation, it is ensured that its surface is perpendicular to the length of the reactor pipe 20. The installation position of the first diversion plate 41 is located above the upper nozzle of the upper spraying device 31, ensuring that the raw materials sprayed from the upper nozzle react first after mixing. When the gas generated by the reaction flows upward, it can directly pass through the first diversion plate 41 for blocking treatment.

[0041] The first flow divider plate 41 is located above the upper nozzle, at a predetermined distance. This predetermined distance provides ample mixing and reaction space for raw material A and raw material B, ensuring that the two raw materials are fully mixed and reacted before contacting the gas flow divider area. In one specific embodiment, such as Figure 2 As shown, it also includes: a second flow divider plate 42, which is a plate-shaped structure with multiple second flow divider holes on its surface. The second flow divider plate 42 is disposed inside the reactor pipe 20, with its surface perpendicular to the length direction of the reactor pipe 20. The second flow divider plate 42 is located above the first flow divider plate 41, and the second flow divider plate 42 and the first flow divider plate 41 are spaced apart. The second flow divider holes and the first flow divider holes are staggered.

[0042] In this specific embodiment, a second diversion plate 42 is added above the first diversion plate 41 to form a two-stage diversion structure, which can further refine and block the gas that has passed through the first diversion, improve the uniformity of gas diversion, and the second diversion hole is staggered with the first diversion hole, so that the gas needs to change its flow direction to pass through the second diversion hole, thus breaking the laminar flow state of the gas.

[0043] The second diversion plate 42 is a plate-shaped structure similar to the first diversion plate 41. Multiple through-holes are provided on its surface. The second diversion plate 42 is also fixedly installed inside the reactor pipe 20, and its surface is perpendicular to the length of the reactor pipe 20. The second diversion holes and the first diversion holes are arranged in an alternating manner, that is, the projection of the second diversion hole does not coincide with the projection of the first diversion hole, so that the gas after being diverted by the first diversion hole needs to change its flow direction before it can pass through the second diversion hole.

[0044] In one specific embodiment, such as Figure 3 As shown, it also includes: a diverter 43, which is disposed between the first diverter plate 41 and the second diverter plate 42. The diverter 43 is a columnar structure with a preset length, and its top is fixedly connected to the second diverter plate 42. The bottom of the diverter 43 is arc-shaped.

[0045] In this specific embodiment, the bottom of the diverter 43 adopts an arc-shaped design, which can accurately guide and block the gas between the two plates. While blocking the mist gas, it can guide the gas discharging liquid to flow smoothly upward. The arc-shaped bottom design can reduce gas flow resistance, avoid the formation of airflow dead zones at the bottom of the diverter 43, and reduce gas residence time. Moreover, the mist gas will collide with the bottom of the diverter 43, thereby separating the liquid in the gas. The liquid will drip downwards, and the gas will be discharged through the second diverting hole.

[0046] In one specific embodiment, such as Figure 2 As shown, the reactor pipe 20 has a double-layer structure and a first cooling channel 21 is pre-set inside. The first cooling channel 21 is a columnar structure with an annular cross-section. The top of the reactor pipe 20 is provided with a refrigerant outlet and the bottom is provided with a refrigerant inlet. Both the refrigerant inlet and the refrigerant outlet are connected to the first cooling channel 21.

[0047] In this specific embodiment, the reactor pipe 20 has a double-layer structure, so that the side wall is hollow to form a first cooling channel 21. By injecting refrigerant liquid into the first cooling channel 21, the refrigerant liquid can cool the reactor pipe 20 itself, thereby controlling the reaction temperature of the mist reaction part.

[0048] Specifically, the reactor pipe 20 is provided with a refrigerant outlet at the top and a refrigerant inlet at the bottom. The refrigerant liquid enters the interior of the first cooling channel 21 through the refrigerant inlet and is discharged from the refrigerant outlet at the top of the reactor pipe 20 from bottom to top, which can achieve cooling and temperature reduction inside the reactor pipe 20.

[0049] The first cooling channel has a preset interval to form a channel, which facilitates the injection of refrigerant liquid.

[0050] In one specific embodiment, the diverter 43 is a hollow structure with a water outlet and a water inlet at the top, both of which are connected to the interior of the first cooling channel 21. When refrigerant liquid is injected into the refrigerant inlet of the reactor pipe 20, the refrigerant liquid can also enter the interior of the diverter 43 from the first cooling channel through the water inlet, and then enter the interior of the first cooling channel 21 from the interior of the diverter 43 through the water outlet, thus completing the cooling of the diverter 43 and the top of the reactor pipe 20.

[0051] Furthermore, the diversion component 43 is made of corrosion-resistant material.

[0052] In one specific embodiment, the storage container 10 has a double-layer structure and a second cooling channel is pre-set inside. The second cooling channel 11 is a columnar structure with an open top. The top of the storage container 10 is provided with a refrigerant outlet and the bottom is provided with a refrigerant inlet. Both the refrigerant inlet and the refrigerant outlet are connected to the second cooling channel 11.

[0053] In this specific embodiment, the side wall of the storage container 10 and the reactor pipe 20 have the same cooling channel structure, that is, the side wall of the storage container 10 is hollow and has a second cooling channel 11, which further cools the solution after the reaction and prevents the gas generated by the high temperature from carrying away the solution after the reaction.

[0054] The second cooling channel 11 is a columnar structure with an open top, and its overall cross-section is a U-shaped bowl structure, matching the structure of the storage container 10. The second cooling channel 11 covers the outside of the storage container 10, thereby cooling the solution inside the storage container 10 after the reaction. The specific structure of the second cooling channel 11 is not limited, but it is required to cover the outside of the storage container 10 for cooling.

[0055] Specifically, the storage container 10 is provided with a refrigerant outlet at the top and a refrigerant inlet at the bottom. Both the refrigerant inlet and the refrigerant outlet are connected to the second cooling channel. The refrigerant liquid enters the interior of the second cooling channel 11 through the refrigerant inlet and is discharged from the refrigerant outlet at the top of the storage container 10 from bottom to top, which can achieve cooling and temperature reduction inside the storage container 10.

[0056] In one specific embodiment, such as Figure 2As shown, it also includes: a mixing plate 70, which is a plate-shaped structure and is horizontally set at the bottom of the inside of the reactor pipe 20. The mixing plate 70 has mixing holes on its surface, and multiple mixing holes are arranged in an array on the mixing plate 70. The mixing plate 70 is set below the lower nozzle 321, and is used to mix raw material A and raw material B after reaction on the mixing plate 70 before dripping into the storage container 10.

[0057] In one specific embodiment, there are two or more mixing plates 70, which are arranged vertically, and any two adjacent mixing plates 70 are spaced apart by a preset distance, and the mixing holes on any two adjacent mixing plates 70 are staggered.

[0058] In this specific embodiment, the material mixed by the upper and lower spraying devices 32 flows through multiple mixing holes on the mixing plate, where it is further mixed. Materials from different areas converge and collide after passing through these holes, achieving secondary mixing and further improving the uniformity of the mixture, ensuring a more complete reaction. The mixing plate also buffers the material flow within the reactor pipe 20, preventing unstable mixing due to excessively fast or fluctuating flow rates, thus stabilizing the material flow and providing favorable conditions for a smooth reaction.

[0059] In addition, the mixing holes on multiple mixing plates are staggered, so the material is divided and mixed once when it flows through each mixing plate. Compared with the secondary mixing of a single mixing plate, multi-stage mixing can further increase the number of collisions and the degree of mixing of the material, greatly improve the mixing uniformity of the material, and provide a solid guarantee for the full reaction.

[0060] Furthermore, the size of the mixing holes opened on any adjacent mixing plates 70 is not limited, and the cross-sectional diameters of adjacent mixing holes and mixing holes in different layers can be different.

[0061] Specifically, such as Figure 4 As shown, there are three mixing plates 70, including a first mixing plate 710, a second mixing plate 720 and a third mixing plate 730, and the mixing holes on any two adjacent mixing plates 70 are staggered.

[0062] The first mixing plate 710, the second mixing plate 720 and the third mixing plate 730 are arranged sequentially along the length of the reactor pipe 20.

[0063] In one specific embodiment, raw material A is toluene and raw material B is chlorosulfonic acid.

[0064] The various embodiments of this application have been described above. These descriptions are exemplary and not exhaustive, nor are they limited to the disclosed embodiments. Many modifications and variations will be apparent to those skilled in the art without departing from the scope and spirit of the described embodiments. The terminology used herein is chosen to best explain the principles, practical application, or improvement of the technology in the market, or to enable others skilled in the art to understand the embodiments disclosed herein.

Claims

1. A dual-liquid feed synthesis reactor with cooling structure, characterized by, The application relates to a reactor pipeline and a cooling system. The storage container is a hollow structure. The reactor pipeline is a tubular structure with open ends, and is vertically arranged, with the bottom connected to and communicated with the top of the storage container. The upper input end of the upper spraying device is provided with a raw material A inlet, and the upper output end penetrates through the side wall of the reactor pipeline to the inside of the reactor pipeline, with the spraying direction towards the bottom of the reactor pipeline. The lower input end of the lower spraying device is provided with a raw material B inlet, and the lower output end penetrates through the side wall of the reactor pipeline to the inside of the reactor pipeline, with the spraying direction towards the top of the reactor pipeline. The cooling system comprises a cooling pipeline, a production valve and a cooling nozzle. The first shunt plate is a plate structure, and a plurality of first shunt holes are formed in the plate surface.

2. The dual liquid feed synthesis reactor with cooling structure according to claim 1, characterized in that, The second shunt plate is a plate structure, and a plurality of second shunt holes are formed in the plate surface. The second shunt plate is arranged above the first shunt plate. The second shunt plate is arranged in a spaced manner relative to the first shunt plate.

3. The dual-liquid feed synthesis reactor with cooling structure according to claim 2, characterized in that, The second shunt holes are arranged in an interlaced manner relative to the first shunt holes. The shunt member is arranged between the first shunt plate and the second shunt plate. The shunt member is a columnar structure with a preset length, and the top is fixedly connected to the second shunt plate. The reactor pipeline is a double-layer structure, and a first cooling channel is pre-set in the inside. The first cooling channel is a columnar structure with a ring-shaped cross section. The top of the reactor pipeline is provided with a refrigerant outlet, and the bottom is provided with a refrigerant inlet.

4. The dual-liquid feed synthesis reactor with cooling structure according to claim 3, characterized in that, The storage container is a double-layer structure, and a second cooling channel is pre-set in the inside. The second cooling channel is a columnar structure with an open top. The top of the storage container is provided with a refrigerant water outlet, and the bottom is provided with a refrigerant water inlet. The upper spraying device comprises an upper conveying pipe body and an upper nozzle.

5. The dual liquid feed synthesis reactor with cooling structure according to claim 1, wherein, The input end of the upper conveying pipe body is adapted to input raw material A, and the output end penetrates through the side wall of the reactor pipeline to the inside of the reactor pipeline. ​ ​ 6. The dual liquid feed synthesis reactor with cooling structure according to claim 1, wherein, ​ ​ ​ 7. The dual liquid feed synthesis reactor with cooling structure according to claim 1, wherein, ​ The lower spraying device comprises a lower conveying pipe body and a lower spraying head, the input end of the lower conveying pipe body is adapted to input raw material B, the output end of the lower conveying pipe body penetrates through the side wall of the reactor pipe to the inside of the reactor pipe, and the lower spraying head is arranged at the output end of the lower conveying pipe body and sprays toward the top of the reactor pipe. The upper spraying head is arranged above and below the lower spraying head.

8. The dual-liquid feed synthesis reactor with cooling structure according to claim 7, characterized in that, The spraying diameter of the lower spraying head is greater than the diameter of the reactor pipe. The spraying diameter of the lower spraying head is greater than the diameter of the reactor pipe.

9. The dual-liquid feed synthesis reactor with cooling structure according to claim 1, characterized in that, Further comprising: a mixing plate; The mixing plate is a plate structure and is horizontally arranged at the inside bottom end of the reactor pipe, the plate surface of the mixing plate is provided with mixing holes, and a plurality of the mixing holes are arranged in an array on the mixing plate.

10. The dual-liquid feed synthesis reactor with cooling structure according to claim 9, characterized in that, There are two or more mixing plates, and any two adjacent mixing plates are spaced apart by a preset distance. The mixing holes on any two adjacent mixing plates are arranged alternately.

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