A polishing slurry, its preparation method and application
By using a polishing slurry composition with pH < 7, containing silica abrasive, citric acid, and sodium citrate, the contradiction between surface quality and removal rate, as well as the cleanliness and environmental protection issues in the polishing of quartz substrates by existing polishing slurries are resolved, achieving a high-efficiency and low-damage polishing effect that meets the needs of high-end photomask manufacturing.
CN122080784APending Publication Date: 2026-05-26CHANGSHA SHAOGUANG CHROME BLANK +1
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Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHANGSHA SHAOGUANG CHROME BLANK
- Filing Date
- 2026-01-27
- Publication Date
- 2026-05-26
Abstract
This invention discloses a polishing slurry, its preparation method, and its application, relating to the field of polishing slurry technology. The polishing slurry of this invention comprises silica abrasive, citric acid, and sodium citrate, with a pH < 7. It effectively controls metal ion contamination during the polishing process of synthetic quartz, improves the removal rate during the polishing of quartz glass substrates, and reduces the surface roughness of the quartz. It synergistically optimizes chemical corrosion and mechanical removal, achieving an atomically smooth, scratch-free, and subsurface-damage-free quartz glass substrate surface while maintaining a high material removal rate. Furthermore, it possesses characteristics such as low contamination, easy cleaning, and environmental friendliness.
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