Throttle valve assembly and substrate processing apparatus including the same

Abstract

The throttle valve assembly of this invention includes: a flange in the shape of a pipe with a flow path formed inside; a baffle disposed on the flange and adjusted for venting by rotation; and a first support member and a second support member connected to the flange to support the baffle in a bidirectional rotatable structure. The baffle includes: a baffle body having a flat plate shape with a connecting hole formed along a rotational central axis, and receiving spaces for temperature-regulating fluid flow formed on both sides of the rotational central axis; a rod-shaped shaft connected to the first support member and the second support member along the connecting hole and connected to a drive motor to transmit driving force to rotate the baffle; and a fluid inlet / outlet flow path formed on the side of the connecting hole to provide an inlet / outlet path for the temperature-regulating fluid.

Description

Technical Field

[0001] The present invention relates to a throttle valve assembly and a substrate processing apparatus including the same. Background Technology

[0002] To manufacture semiconductor components, liquid crystal displays, and other electronic devices, various processes such as deposition, photolithography, etching, and cleaning are performed. These processes are carried out using a substrate processing apparatus that has a process chamber for processing the substrate.

[0003] The substrate processing apparatus may include an exhaust unit for maintaining a constant internal pressure within a process chamber that forms the substrate processing space during the execution of the substrate processing process, and for discharging process byproducts generated during the process. The exhaust unit includes an exhaust pipe connected to the process chamber, through which negative pressure is provided to discharge fluid from inside the process chamber. A gas flow path is formed inside the exhaust pipe, and a throttling valve disposed on the gas flow path can be used to maintain the internal pressure of the process chamber at a certain level.

[0004] The throttle valve includes a flat-shaped baffle for adjusting negative pressure, and the negative pressure is adjusted by rotating the baffle to regulate the opening ratio. Additionally, a sealing element such as an O-ring is installed on the outer circumferential surface of the baffle's edge side to airtightly separate the space of the fluid flow path.

[0005] However, when the baffle temperature rises, the sealing components described above tend to corrode easily, and when the surface temperature of the baffle changes during the process, it is prone to wear due to particulate matter deposition and other reasons, which may make it impossible to accurately control the opening and closing rate of the throttle valve. Summary of the Invention

[0006] Technical problems to be solved Embodiments of the present invention provide a throttle valve assembly and a substrate processing apparatus including the same, which prevents damage to sealing components by adjusting the temperature of a baffle, thereby enabling the substrate processing process to be performed stably for a long time.

[0007] Problem-solving methods According to an embodiment of the present invention, a throttle valve assembly includes: a flange in the shape of a pipe with a flow path formed inside; a baffle disposed on the flange and adjusted by rotation to regulate the degree of venting; and a first support member and a second support member connected to the flange to support the baffle in a bidirectional rotatable structure, wherein the baffle includes: a baffle body having a flat plate shape, with a connecting hole formed through it along a rotational central axis, and receiving spaces for the flow of temperature-regulating fluid formed on both sides of the rotating central axis; a rod-shaped shaft connected to the first support member and the second support member along the connecting hole and connected to a drive motor to transmit driving force to rotate the baffle; and a fluid inlet / outlet flow path formed on the side of the connecting hole to provide an inlet / outlet path for the temperature-regulating fluid.

[0008] According to one embodiment, the baffle body includes: at least one partition wall, which extends from the fluid inlet / outlet flow path toward the edge side of the baffle body in a direction perpendicular to the rotation center axis to form a plurality of partition spaces in the receiving space; and at least one guide wall, formed inside the partition space to guide the flow of the temperature regulating fluid, which extends from the fluid inlet / outlet flow path in a direction perpendicular to the rotation center axis.

[0009] According to one embodiment, the baffle body includes: a first connecting flow path connected to the fluid inlet / outlet flow path to supply the temperature regulating fluid to the partitioned space; and a second connecting flow path connected to the partitioned space to discharge fluid inside the partitioned space to the fluid inlet / outlet flow path.

[0010] According to one embodiment, the fluid inlet and outlet flow paths are formed around the connecting hole and have a tube-shaped structure with two sides respectively connected to the first support and the second support.

[0011] According to one embodiment, the baffle body includes a heat exchange structure formed within the accommodating space.

[0012] According to one embodiment, the first support member and the second support member each have a structure that rotates together with the baffle.

[0013] According to one embodiment, the first support member is coupled to the flange in a bidirectional rotatable structure and includes: a central connection hole providing a connection space for connecting the shaft and the drive motor to each other; a first buffer flow path formed around the side of the central connection hole and connected to the fluid inlet / outlet flow path; and a supply flow path connected to the first buffer flow path for supplying temperature-regulating fluid to the receiving space.

[0014] According to one embodiment, the second support member is coupled to the flange at a position corresponding to the first support member in a bidirectional rotatable structure, and includes: a support hole for receiving one end of the shaft; a second buffer flow path formed around the side of the support hole and connected to the fluid inlet / outlet flow path; and a discharge flow path connected to the second buffer flow path for discharging temperature-regulating fluid supplied to the receiving space or discharging fluid filled into the receiving space to the outside through the supply flow path.

[0015] According to one embodiment, the throttle valve assembly discharges fluid that has been filled into the containment space through the fluid inlet / outlet flow path to the outside, adjusting the containment space to a vacuum state, thereby controlling the temperature of the baffle. Alternatively, the throttle valve assembly allows the temperature-regulating fluid to circulate within the containment space through the fluid inlet / outlet flow path, thereby controlling the temperature of the baffle. In this case, the temperature-regulating fluid is a liquid or a gas.

[0016] According to one embodiment, at least one of the flange, the baffle, the first support member, and the second support member is manufactured using a 3D printing method. Furthermore, the throttle valve assembly includes an annular sealing member coupled along the outer peripheral surface of the baffle.

[0017] The substrate processing apparatus of this invention includes: a process chamber, forming a sealed processing space for performing substrate processing; an exhaust section, which is combined with the process chamber and connected to a vacuum pump for performing exhaust and pressure control of the processing space; and the aforementioned throttle valve assembly, disposed in the exhaust section, for controlling the fluid flow rate through the exhaust section for exhaust and pressure control of the processing space.

[0018] The effects of the invention The throttle valve assembly of this invention has the following effect: by making the internal accommodating space of the baffle a vacuum state or by allowing the temperature regulating fluid to flow in the internal accommodating space of the baffle, the surface temperature of the baffle can be effectively controlled, thereby reducing the maintenance cost of the substrate processing device.

[0019] In addition, by creating a receiving space inside the baffle, the weight of the baffle is reduced, thereby reducing the load on the drive motor and saving drive energy. Attached Figure Description

[0020] Figure 1 The structure of the substrate processing apparatus according to an embodiment of the present invention is shown.

[0021] Figure 2 This is a plan view of the throttle valve assembly according to an embodiment of the present invention.

[0022] Figure 3This is a perspective view showing a portion of a throttle valve assembly according to an embodiment of the present invention.

[0023] Figure 4 This is a perspective view showing the structure of the baffle, the first support member, and the second support member of the throttle valve assembly according to an embodiment of the present invention.

[0024] Figure 5 The internal structure of the baffle of the throttle valve assembly according to an embodiment of the present invention is shown.

[0025] Figure 6 The fluid flow path in the throttle valve assembly according to an embodiment of the present invention is shown. Detailed Implementation

[0026] Best way to carry out the invention The figure illustrating the preferred embodiment of the present invention is Figure 5 .

[0027] Methods of implementing the present invention Figure 1 The structure of the substrate processing apparatus 10 according to an embodiment of the present invention is shown.

[0028] Reference Figure 1 The substrate processing apparatus 10 includes: a process chamber 100, which forms a closed processing space S for performing substrate processing; an exhaust section 150, which is connected to the process chamber 100 and a vacuum pump (not shown in the figure) for performing exhaust and pressure control of the processing space S; and a throttle valve assembly 20, which is disposed in the exhaust section 150 to control the fluid flow rate through the exhaust section 150 for exhaust and pressure control of the processing space S.

[0029] The substrate W includes semiconductor chips, display panels, solar cell substrates, etc., which require etching, thin film deposition and other processing techniques.

[0030] The process chamber 100 is a component that forms a closed processing space S for processing the substrate W, and can adopt various structures. For example, the process chamber 100 includes a chamber body 110 with an opening on its upper side and an upper cover 120 detachably attached to the upper part of the chamber body 110. The chamber body 110, together with the upper cover 120, forms a closed processing space S for processing the substrate W, and can adopt various structures.

[0031] Furthermore, at least one door 111 is formed on the side wall of the chamber body 110 for introducing the substrate W into the processing space S or removing the substrate W from the processing space S.

[0032] The chamber body 110 can have various structures depending on the process conditions, with an opening on the upper side and a cover 120 detachably attached to the opening. The cover 120 and the gas injection section 140 are disposed on the upper part of the chamber body 110 to form a closed processing space S.

[0033] The substrate processing apparatus 10 includes a substrate placement section 130 and a gas jetting section 140.

[0034] The substrate mounting section 130 is provided on the lower side of the processing space S to support the substrate W. For example, the substrate mounting section 130 includes a member that can move up and down, so as to introduce and remove the substrate W through the door 111. The substrate mounting section 130 includes a temperature control component (not shown in the figure) such as a heater for temperature control that can heat or cool the substrate W.

[0035] The gas jetting unit 140 is positioned opposite the substrate placement unit 130 and can jet gases used to perform substrate processing into the processing space S. The gases jetted from the gas jetting unit 140 include process gases for thin film deposition, etching gases for thin film etching, cleaning gases for cleaning, etc., but are not limited to these.

[0036] An exhaust section 150 is disposed on one side of the process chamber 100 and connected to a vacuum pump (not shown in the figures) to perform exhaust and flow control of the processing space S. The exhaust section 150 includes at least one exhaust pipe 151, 153 for forming a fluid flow path F for fluid circulation. The exhaust pipes 151, 153 include connecting flanges that protrude along their edges for connection to the throttle valve assembly 20, described later. The connecting flanges of the exhaust pipes 151, 153 are fastened to the upper and lower surfaces of the valve body of the throttle valve assembly 20 by fastening members.

[0037] Throttling valve assembly 20 is provided in exhaust section 150 to control the exhaust and pressure of the processing space S in process chamber 100 and control the flow rate through exhaust section 150.

[0038] Figure 2 This is a plan view of the throttle valve assembly 20 according to an embodiment of the present invention. Figure 3 This is a perspective view showing a portion of the throttle valve assembly 20 according to an embodiment of the present invention. Furthermore, Figure 4 This is a perspective view showing the structure of the baffle 230, the first support member 250, and the second support member 270 of the throttle valve assembly 20 according to an embodiment of the present invention. Figure 5 This invention illustrates the internal structure of the baffle 230 of the throttle valve assembly 20 according to an embodiment of the present invention. Figure 6 The fluid flow path in the throttle valve assembly 20 of an embodiment of the present invention is conceptually illustrated.

[0039] In this embodiment of the invention, the throttle valve assembly 20 is disposed in the exhaust section 150 connected to the process chamber 100, and controls the pressure inside the processing space S of the process chamber 100 and the exhaust of gas by adjusting the opening ratio. The components of the throttle valve assembly 20 of this embodiment of the invention are described in detail below.

[0040] Reference Figures 2 to 6 The throttle valve assembly 20 has a structure including a flange 210, a baffle 230, a first support 250, a second support 270, and a drive unit 290.

[0041] Flange 210 has a tube-shaped structure that forms an internal flow path. Flange 210 is provided above the exhaust pipe 151 of the exhaust section 150 of the substrate forming processing apparatus (see reference). Figure 1 ) and lower exhaust pipe 153 (refer to Figure 1 The flange 210 is integrated with the connecting flanges formed on the upper exhaust pipe 151 and the lower exhaust pipe 153 respectively, by fastening components. Accordingly, the flange 210 forms a fluid flow path F for fluid circulation (refer to...). Figure 1 Part of ).

[0042] The central region of flange 210 accommodates baffle 230 and allows insertion and mounting of drive shaft 253 for transmitting the driving force for driving baffle 230. Flange 210 forms a connecting flow path through its inner side, thus the inner wall of flange 210 and the outer wall of baffle 230 are in contact with each other, forming a structure that blocks the flow of fluid through fluid flow path F.

[0043] For flange 210 to accommodate the first support member 250 and the second support member 250 respectively, two mounting holes 211 are formed in opposite positions.

[0044] The baffle 230 adjusts the amount of venting that flows along the internal passage of the flange 210 by rotation. For example, the baffle 230 is rotatably disposed in the central region of the flange 210. For example, the baffle 230 rotates in one direction to open the central region of the flange 210, allowing fluid to flow through the fluid flow path F. Furthermore, the baffle 230 rotates in the opposite direction to completely cover the open central region of the flange 210, blocking the flow of fluid in the fluid flow path F.

[0045] The baffle 230 has various structures, such as a disk or a circular plate, corresponding to the cross-sectional shape of the fluid flow path F. The attached figure shows the baffle 230 with a circular panel shape, but it is not limited to this. The outer peripheral sidewalls of the baffle 230 have a predetermined curvature to prevent interference with the inner circumferential surface of the flange 210 during rotation.

[0046] The throttle valve assembly 20 also includes an annular sealing element (not shown) that engages along the outer peripheral surface of the baffle 230. The sealing element may include, but is not limited to, an O-ring.

[0047] The baffle 230 has a structure including a baffle body 231, a shaft 232 and a fluid inlet / outlet flow path 240.

[0048] The structure of the baffle body 231 is as follows: it has a disc shape and forms a connecting hole 233 through the rotation center axis CA, with fluid flow accommodating spaces formed on both sides with the rotation center axis CA as the reference.

[0049] The shaft 232 is connected along the connecting hole 233 of the baffle body 231, and the first support member 250 and the second support member 270 are connected to both sides. Furthermore, the shaft 232 serves to connect with the drive motor to transmit the driving force that causes the baffle 230 to rotate in both directions, and may have a rod-shaped structure.

[0050] The baffle body 231 has a structure including a partition wall 235 and a guide wall 237 formed inside the accommodating space.

[0051] The partition wall 235 serves to form multiple partitioned spaces C1 to C6 within the internal accommodating space of the baffle body 231. The partition wall 235 has a structure that extends from the fluid inlet / outlet flow path 240 toward the edge of the baffle body 231 in a direction perpendicular to the rotational central axis CA of the baffle 230. At least one partition wall 235 is formed on the baffle body 231.

[0052] A guide wall 237 is formed inside the partitioned spaces C1 to C6 to guide the flow of temperature-regulating fluid, extending from the fluid inlet / outlet flow path 240 in a direction perpendicular to the rotation center axis CA. The guide wall 237 forms a connecting space for fluid to flow towards the edge side of the baffle body 231. At least one guide wall 237 is formed on the baffle body 231.

[0053] Figure 5 The diagram shows a guide wall 237 extending from the fluid inlet / outlet flow path 240 toward the baffle body 231 in a direction perpendicular to the rotation center axis CA, but it is not limited to this. For example, the guide wall 237 may also extend from the edge of the baffle body 231 toward the fluid inlet / outlet flow path 240. In this case, the guide wall 237 forms a connecting space in which fluid can flow toward the rotation center axis CA side of the baffle body 231.

[0054] The baffle 230 of this embodiment includes the partition wall 235 and the guide wall 237 mentioned above, which increases the movement path of the fluid, thereby increasing the contact time between the baffle 230 and the fluid, and can more effectively control the surface temperature of the baffle 230.

[0055] The baffle 230 has a structure including a fluid inlet / outlet flow path 240, a first connecting flow path 241 and a second connecting flow path 243 formed in the baffle body 231.

[0056] Fluid inlet / outlet flow path 240 is formed on the side of the connecting hole 233 to provide a fluid inlet / outlet path.

[0057] The fluid inlet / outlet flow path 240 receives temperature-regulating fluid from the outside to regulate the temperature of the baffle 230, and discharges the temperature-regulating fluid inside the baffle 230 to the outside of the baffle 230.

[0058] The fluid inlet / outlet flow path 240 has a circular tube-shaped structure formed around the junction hole 233 and connected to the first support 250 and the second support 270 on both sides, so as to maintain the connection with the first support 250 and the second support 250 when the baffle 230 rotates.

[0059] One end of the first connecting flow path 241 is connected to the fluid inlet / outlet flow path 240 and one side of the partitioned spaces C1~C6, respectively, to supply fluid to the partitioned spaces C1~C6. Furthermore, one end of the second connecting flow path 243 is connected to the other side of the partitioned spaces C1~C6 and the fluid inlet / outlet flow path 240, respectively, to discharge the fluid inside the partitioned spaces C1~C6 into the fluid inlet / outlet flow path 240.

[0060] like Figure 5 As shown, a first connecting flow path 241 and a second connecting flow path 243 are set according to the zone space C1~C6, but are not limited to these.

[0061] Furthermore, the baffle body 231 has a structure in which a heat exchange structure 239 is formed inside the accommodating space. The heat exchange structure 239 increases the contact area with the fluid, thereby improving the temperature regulation performance of the baffle 230.

[0062] The heat exchange structure 239 is formed by multiple panels and has a polygonal mesh structure in cross-section, such as a square or honeycomb pattern. Alternatively, not limited to this, the heat exchange structure 239 may have a structure with heat dissipation pins protruding vertically from the top or bottom of the baffle body 231. Furthermore, the heat exchange structure 239 may have various conventional structures for improving heat exchange performance.

[0063] The first support member 250 and the second support member 270 are respectively connected to the flange 210 to provide structural support for the baffle 230, which can rotate in both directions.

[0064] The first support member 250 and the second support member 270 are configured to rotate together with the baffle 230. For example, in order to engage with keyways or engagement protrusions at both ends of the engagement groove 233 of the baffle body 231, the first support member 250 and the second support member 270 form connecting protrusions or receiving grooves at corresponding positions. Accordingly, the first support member 250 and the second support member 270 are integrated with the baffle body 231 and can rotate bidirectionally together with the baffle body 231 based on the drive of the shaft 232.

[0065] The first support member 250 accommodates the shaft 232 and supplies temperature-regulating fluid to the fluid inlet / outlet flow path 240. Even when the baffle 230 rotates, the first support member 250 remains connected to the fluid inlet / outlet flow path 240, thereby enabling fluid to be supplied into the receiving space. For this purpose, the first support member 250 has a structure including a central connecting hole 251, a first buffer flow path 253, and a supply flow path 255.

[0066] The central connecting hole 251 provides space for accommodating the shaft 232 so that one end of the shaft 232 can be connected to the drive motor.

[0067] The first buffer flow path 253 has a tube-shaped structure formed around the side of the central connecting hole 251 and connected to the fluid inlet / outlet flow path 240 on one side. As described above, because the first buffer flow path 253 has a tube-shaped structure corresponding to the fluid inlet / outlet flow path 240, it is coupled to the inner circumferential surface of the flange 210 in a bidirectional rotatable structure, so that the connection with the fluid inlet / outlet flow path 240 can be maintained even when the baffle 230 is rotated.

[0068] The supply flow path 255 is connected to the other side of the first buffer flow path 253 to supply temperature regulating fluid from the outside into the receiving space of the baffle body 231. Furthermore, the supply flow path 255 can provide negative pressure into the receiving space.

[0069] The supply flow path 255 forms a structure in which one end is connected to a fluid supply pipe to supply temperature-regulating fluid from the outside.

[0070] The second support member 270 forms one end of the support shaft 232 and discharges fluid flowing along the fluid inlet / outlet flow path 240 to the outside of the receiving space of the baffle body 231. Even when the baffle 230 rotates, the second support member 270 can maintain its connection with the fluid inlet / outlet flow path 240 and discharge fluid to the outside of the receiving space. For this purpose, the second support member 270 has a structure including a support hole 271, a second buffer flow path 273, and a discharge flow path 275.

[0071] The support hole 271 provides space for the other end of the shaft 232 to be inserted and supported.

[0072] The second buffer flow path 273 has a tube-shaped structure formed around the side of the support hole 271 and connected to the fluid inlet / outlet flow path 240 on one side. As described above, because the second buffer flow path 273 has a tube-shaped structure corresponding to the fluid inlet / outlet flow path 240, it is coupled to the inner circumferential surface of the flange 210 in a bidirectional rotatable structure, so that the connection with the fluid inlet / outlet flow path 240 can be maintained even when the baffle 230 is rotated.

[0073] The discharge path 275 is connected to the other side of the second buffer path 273, providing a path for discharging fluid from inside the containment space to the outside. The discharge path 275 is connected to an external pipe, enabling the discharge of fluid from inside the containment space. The discharge path 275 is connected to an exhaust pump for discharging fluid.

[0074] In this embodiment of the invention, the throttle valve assembly 20 applies negative pressure through the fluid inlet / outlet flow path 240, thereby controlling the temperature of the baffle 230.

[0075] For example, by discharging the fluid flowing in the internal containment space of the baffle body 231 to the outside through the fluid inlet / outlet flow path 240, the internal containment space is made into a vacuum state, thereby controlling the temperature of the baffle 230.

[0076] Furthermore, according to the embodiment of the present invention, the throttle valve assembly 20 supplies temperature regulating fluid through the fluid inlet / outlet flow path 240, so that the temperature regulating fluid flows in the internal accommodating space of the baffle body 231, thereby controlling the temperature of the baffle 230.

[0077] The temperature regulating fluid can be a gas or a liquid. Furthermore, to reduce temperature differences, the temperature regulating fluid may have a temperature suitable for cooling or heating. For example, the temperature regulating fluid may include cooling water, refrigerant, cooling gas, etc., but is not limited to these.

[0078] The drive unit 290 provides driving force to rotate the baffle 230 in both directions. For this purpose, the drive unit 290 includes a drive motor (not shown in the figures). The drive motor receives an external power source to generate a driving force for rotating the baffle 230 in both directions, and transmits this driving force to the baffle 230 via shaft 232. The drive motor and shaft 232 have conventional motor and shaft configurations.

[0079] Furthermore, the drive motor is either a continuous rotary motor or a stepper motor, so that the baffle 230 can move in units of a preset angle.

[0080] At least one of the flange 210, baffle 230, first support member 250 and second support member 270 of the throttle valve assembly 20 in this embodiment of the invention is manufactured by a 3D printing method.

[0081] According to an embodiment of the present invention, the throttle valve assembly 20 can effectively control the surface temperature of the baffle 230 by making the internal accommodating space of the baffle 230 a vacuum state or by allowing the temperature regulating fluid to flow in the internal accommodating space of the baffle 230.

[0082] Furthermore, by forming a receiving space inside the baffle 230, the weight of the baffle 230 is reduced, thereby reducing the load on the drive motor and saving drive energy.

[0083] Industrial applicability In substrate processing apparatuses that perform substrate processing processes such as deposition, etching, and cleaning on substrates (or wafers), various embodiments of the present invention can be effectively utilized.

Claims

1. A throttle valve assembly, Its features are, It includes: a flange in the shape of a pipe with an internal flow path; a baffle disposed on the flange, which adjusts the degree of venting by rotation; and a first support member and a second support member, which are attached to the flange and support the baffle in a bidirectional rotatable structure. The baffle includes: The baffle body has a flat plate shape, with a connecting hole formed along the rotation center axis, and with the rotation center axis as a reference, accommodating spaces for temperature regulation fluid flow are formed on both sides. A rod-shaped shaft, connected along the connecting hole to the first and second supports, is connected to a drive motor to transmit driving force, causing the baffle to rotate; and A fluid inlet / outlet path is formed on the side of the connecting hole, providing an inlet / outlet path for the temperature-regulating fluid.

2. The throttle valve assembly according to claim 1, characterized in that, The baffle body includes: At least one partition wall, in order to form multiple partition spaces in the receiving space, extends from the fluid inlet / outlet flow path toward the edge side of the baffle body in a direction perpendicular to the rotation central axis; and At least one guide wall is formed inside the zoned space to guide the flow of the temperature-regulating fluid, extending from the fluid inlet / outlet flow path in a direction perpendicular to the rotational central axis.

3. The throttle valve assembly according to claim 2, characterized in that, The baffle body includes: A first connecting flow path is connected to the fluid inlet / outlet flow path to supply the temperature-regulating fluid to the zoned space; and The second connecting flow path is connected to the zoned space to discharge the fluid inside the zoned space into the fluid inlet / outlet flow path.

4. The throttle valve assembly according to claim 1, characterized in that, The fluid inlet and outlet flow path is formed around the connecting hole and has a tube-shaped structure with two sides respectively connected to the first support and the second support.

5. The throttle valve assembly according to claim 1, characterized in that, The baffle body includes a heat exchange structure formed inside the accommodating space.

6. The throttle valve assembly according to claim 1, characterized in that, The first support member and the second support member each have a structure that rotates together with the baffle.

7. The throttle valve assembly according to claim 1, characterized in that, The first support member is attached to the flange in a bidirectional rotatable structure. It also includes: a central connecting hole, providing a connection space so that the shaft and the drive motor can be connected to each other; A first buffer flow path is formed around the side of the central connecting hole and connects to the fluid inlet / outlet flow path; and A supply flow path is connected to the first buffer flow path to supply temperature-regulating fluid to the containment space.

8. The throttle valve assembly according to claim 7, characterized in that, The second support member is integrated into the flange at a position corresponding to the first support member, with a bidirectional rotatable structure. It also includes: a support hole for receiving one end of the shaft; A second buffer flow path is formed around the side of the support hole and connected to the fluid inlet / outlet flow path; and The discharge flow path is connected to the second buffer flow path to discharge the temperature-regulating fluid supplied to the containment space through the supply flow path, or to discharge the fluid that will be filled into the containment space to the outside.

9. The throttle valve assembly according to claim 1, characterized in that, The throttle valve assembly discharges the fluid that has been filled into the containment space through the fluid inlet and outlet flow path to the outside, adjusting the containment space to a vacuum state, thereby controlling the temperature of the baffle.

10. The throttle valve assembly according to claim 1, characterized in that, The throttle valve assembly allows the temperature-regulating fluid to circulate within the containment space through the fluid inlet and outlet flow paths, thereby controlling the temperature of the baffle.

11. The throttle valve assembly according to claim 1, characterized in that, The temperature regulating fluid is a liquid or a gas.

12. The throttle valve assembly according to claim 1, characterized in that, At least one of the flange, the baffle, the first support member, and the second support member is manufactured using a 3D printing method.

13. The throttle valve assembly according to claim 1, characterized in that, The throttle valve assembly includes an annular sealing element that engages along the outer circumferential surface of the baffle.

14. A substrate processing apparatus, characterized in that, include: A process chamber is a sealed processing space formed for performing substrate processing. An exhaust section, incorporated into the process chamber and connected to a vacuum pump for performing exhaust and pressure control of the processing space; and The throttle valve assembly according to any one of claims 1 to 13 is disposed in the exhaust section to control the fluid flow rate through the exhaust section for exhaust and pressure control of the processing space.

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