Thermosetting photo-alignment film resin composition

Abstract

Provided is a composition that enables an oriented member having excellent orientation and adhesion to be obtained through low-temperature, short-time firing without using a crosslinking agent containing an N-hydroxymethyl group, an N-alkoxymethyl group, or the like. A cured film-forming composition includes: (A) a compound represented by the following formula (a), (B) a polymer having an epoxy group, (C) a thermal acid generator, and (D) a compound having a radically polymerizable group including a C=C double bond and a nucleophilic group.

Description

Technical Field

[0001] This invention relates to a resin composition for thermosetting photoalignment films (also known as a cured film forming composition), alignment components, and phase difference components. Background Technology

[0002] In 3D displays using circularly polarized glasses, a phase difference element is typically mounted on a display element that forms an image, such as a liquid crystal panel. A phase difference element used for this purpose has a patterned configuration in which multiple phase difference regions with different phase difference characteristics are regularly arranged. It should be noted that, in this specification, this type of phase difference element patterned in the manner of arranging multiple phase difference regions with different phase difference characteristics will be referred to as a patterned phase difference element.

[0003] Patterned retardation elements can be fabricated, for example, by optically patterning a retardation material composed of polymeric liquid crystal, as disclosed in Patent Document 1. The optical patterning of the retardation material composed of polymeric liquid crystal utilizes photoalignment techniques known in the formation of alignment elements for liquid crystal panels. Specifically, a coating film composed of a photoalignment material is formed on a substrate, and two polarized lights with different polarization directions are irradiated onto it. Then, a photoalignment film is obtained as an alignment element for two liquid crystal alignment regions with different alignment control directions. A solution-like retardation material containing polymeric liquid crystal is coated onto this photoalignment film to achieve the alignment of the polymeric liquid crystal. Finally, the aligned polymeric liquid crystal is cured to form a patterned retardation element.

[0004] The anti-reflective film of an organic EL display consists of a linear polarizer and a quarter-wavelength retardation plate. The linear polarizer converts incoming light incident on the image display panel into linearly polarized light, which is then converted into circularly polarized light by the quarter-wavelength retardation plate. Here, although the circularly polarized light is reflected at the surface of the image display panel, the rotation direction of the polarization plane is reversed during this reflection. As a result, the reflected light, in the opposite direction to its incident state, is converted into linearly polarized light by the quarter-wavelength retardation plate and then blocked by the linear polarizer, thus significantly suppressing outward emission.

[0005] Regarding the quarter-wavelength retardation plate, Patent Document 2 proposes a method for constructing an optical film by combining a half-wavelength plate and a quarter-wavelength plate to form a quarter-wavelength retardation plate and utilizing negative dispersion characteristics. In this method, a liquid crystal material based on positive dispersion characteristics can be used to construct an optical film utilizing negative dispersion characteristics within a wide wavelength band for displaying color images.

[0006] Furthermore, in recent years, liquid crystal materials with negative dispersion characteristics have been proposed as liquid crystal materials that can be applied to this retardation plate (retardation layer) (Patent Documents 3 and 4). By using such liquid crystal materials with negative dispersion characteristics, instead of combining a 1 / 2 wavelength plate and a 1 / 4 wavelength plate to form a 1 / 4 wavelength retardation plate with two retardation layers as in the past, negative dispersion characteristics can be ensured by forming a retardation layer with a single layer. Thus, an optical film that can ensure the desired phase difference in a wide wavelength band can be realized with a simple structure.

[0007] Alignment layers are used to align liquid crystals. Methods for forming alignment layers include, for example, the rubbing method and the photo-alignment method. The photo-alignment method is useful in avoiding the problems of the rubbing method (i.e., the generation of static electricity and dust) and in enabling quantitative control of the alignment process.

[0008] When forming aligned parts using photoalignment methods, acrylic resins and polyimide resins with photodimerization sites such as cinnamyl and chalcone groups in their side chains are known as photoalignable materials. These resins have reportedly exhibited the ability to control liquid crystal alignment (hereinafter also referred to as liquid crystal alignment property) by being subjected to polarized UV irradiation (see Patent Documents 5 to 7).

[0009] In addition, there are examples of introducing thermal crosslinking systems into photoaligning agents using cinnamic acyl sites in order to improve orientation sensitivity and impart solvent resistance (see Patent Documents 8 and 9).

[0010] Furthermore, Patent Document 10 describes a thermosetting liquid crystal alignment member using a resin composition containing a compound having N-hydroxymethyl or N-alkoxymethyl as a highly sensitive photoalignment agent.

[0011] However, compounds containing N-hydroxymethyl groups are formed by the reaction of an amino group with formaldehyde, and therefore, in principle, most of them contain trace amounts of formaldehyde. As of April 2023, formaldehyde was designated as a highly toxic substance under the Toxic Substances Control Law, exhibiting high toxicity to living organisms. Furthermore, according to the International Agency for Research on Cancer, it is carcinogenic. Moreover, formaldehyde released into the air from compounds used in building materials and furniture can cause sick building syndrome, becoming a problem. Therefore, when using compounds containing at least one of N-hydroxymethyl and N-alkoxymethyl groups in products, it is necessary to reduce the formaldehyde concentration in the composition to ensure the safety of manufacturing personnel and consumers using the product. In addition, especially for molded articles and coatings, it is necessary to suppress the release into the gas phase and liquid layer.

[0012] Existing technical documents Patent documents Patent Document 1: Japanese Patent Application Publication No. 2005-49865 Patent Document 2: Japanese Patent Application Publication No. 10-68816 Patent Document 3: US Patent No. 8,119,026 Patent Document 4: Japanese Patent Application Publication No. 2009-179563 Patent Document 5: Japanese Patent No. 3611342 Patent Document 6: Japanese Patent Application Publication No. 2009-058584 Patent Document 7: Japanese Patent Publication No. 2001-517719 Patent Document 8: International Publication No. 2011 / 126022 Patent Document 9: International Publication No. 2014 / 010688 Patent Document 10: International Publication No. 2010 / 150748 Summary of the Invention

[0013] The problem that the invention aims to solve When a thermal crosslinking system is introduced into a cured film, formaldehyde may be generated in the cured film formation system using crosslinking agents containing N-hydroxymethyl, N-alkoxymethyl, etc. Therefore, there is a need for a composition that uses a thermal crosslinking system that does not generate formaldehyde and can produce oriented parts with excellent orientation and adhesion through low-temperature, short-time firing.

[0014] This invention is based on the above insights and research results. Specifically, the purpose of this invention is to provide a curing film forming composition that does not produce formaldehyde.

[0015] Solution for solving the problem In order to achieve the above-mentioned objectives, the inventors have repeatedly conducted in-depth research and found that by using a composition in which an epoxy-containing polymer and a thermally generated acid agent are added to the photo-orientation component, an oriented part with excellent orientation and adhesion can be obtained by low-temperature and short-time firing without worrying about the generation of formaldehyde. Thus, the present invention with the following objectives has been completed.

[0016] That is, the present invention includes the following.

[0017] [1] A curing film forming composition comprising: (A) a compound represented by formula (a) below; (B) a polymer having an epoxy group; (C) a thermally generated acid agent; and (D) a compound having a free radical polymerizable group comprising a C=C double bond and a nucleophilic group. [In the formula, A] 1 and A 2 Each can independently represent a hydrogen atom, a methyl group, or a cyano group. Q 1The following groups represent hydrogen atoms, halogen atoms, alkyl groups having 1 to 6 carbon atoms, haloalkyl groups having 1 to 6 carbon atoms, cycloalkyl groups having 3 to 8 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, haloalkoxy groups having 1 to 6 carbon atoms, alkylamino groups having 1 to 6 carbon atoms, di(alkyl)amino groups having 1 to 6 carbon atoms, OH groups, NH2 groups, carboxyl groups, trialkoxysilyl groups, cyano groups, nitro groups, or groups represented by the following formula (c-1): (In equation (c-1), the dashed line represents the intersection with Q) 2 The bond of R 101 It is an alkylene group having 1 to 30 carbon atoms, wherein one or more hydrogen atoms of the alkylene group are optionally substituted with fluorine atoms or organic groups. Furthermore, R 101 The -CH2CH2- group is optionally replaced with -CH=CH-, and, provided that any of the groups listed below are not adjacent, the alkylene group is optionally interrupted by a group selected from the group consisting of -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, and -CO-, M 1 It can be a hydrogen atom or a methyl group. ), Q 2 This indicates a single bond or an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. Q 3 Represents a single bond, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, or -CO-, where Q 2 In the case of a single key, Q 3 Also a single key, Q 4 Q represents a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent fused-ring group. 5 Represents a single bond, oxygen atom, -COO- or -OCO-, where q1 is an integer from 0 to 3, q2 is 0 or 1, and Q 6 Q represents a single bond, an oxygen atom, or a sulfur atom. 7 This refers to a single bond, an alkylene group having 1 to 20 carbon atoms, a divalent aromatic cyclic group, or a divalent aliphatic cyclic group. Here, the alkylene group having 1 to 20 carbon atoms is optionally branched or linear, as shown in Q. 6 In the case of a single key, Q 7 For a single key, Q 8This indicates OH group, NH2 group, hydroxyphenoxy, carboxyphenoxy, aminophenoxy, aminocarbonylphenoxy, phenylamino, hydroxyphenylamino, carboxyphenylamino, aminophenylamino, hydroxyalkylamino, bis(hydroxyalkyl)amino, alkoxysilyl, cyanophenylamino, alkoxy with 1 to 12 carbon atoms, haloalkoxy with 1 to 12 carbon atoms, cycloalkoxy with 3 to 12 carbon atoms, phenoxy, or biphenyloxy, wherein, in Q 2 Q 3 Q 6 And Q 7 All are single bonds, q1 is 0, Q 8 In the case of an OH group, Q 1 This refers to groups other than hydrogen atoms as defined above. [2] The curing film forming composition according to [1] above, wherein q2 is 0.

[0018] [3] The curing film forming composition according to [1] above, wherein the epoxy-containing polymer as component (B) is a homopolymer of an epoxy-containing polymeric unsaturated compound, or a copolymer of an epoxy-containing polymeric unsaturated compound and other polymeric unsaturated compounds.

[0019] [4] The curing film forming composition according to [1] above, wherein the thermal acid-generating agent as component (C) is a sulfonium salt.

[0020] [5] The curing film forming composition according to [1] above, wherein the nucleophilic group of the compound as component (D) is selected from carboxyl, epoxy, oxetyl, hydroxyl, amino, vinyl ether and isocyanate groups.

[0021] [6] An orientation member obtained by using a curing film forming composition as described in any one of [1] to [5] above.

[0022] [7] A phase difference element formed using a cured film obtained from a cured film forming composition as described in any one of [1] to [5] above.

[0023] [8] A compound represented by the following formula (a), [In the formula, A] 1 and A 2 Each can independently represent a hydrogen atom, a methyl group, or a cyano group. Q 1The following groups represent hydrogen atoms, halogen atoms, alkyl groups having 1 to 6 carbon atoms, haloalkyl groups having 1 to 6 carbon atoms, cycloalkyl groups having 3 to 8 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, haloalkoxy groups having 1 to 6 carbon atoms, alkylamino groups having 1 to 6 carbon atoms, di(alkyl)amino groups having 1 to 6 carbon atoms, OH groups, NH2 groups, carboxyl groups, trialkoxysilyl groups, cyano groups, nitro groups, or groups represented by the following formula (c-1): (In equation (c-1), the dashed line represents the intersection with Q) 2 The bond of R 101 It is an alkylene group having 1 to 30 carbon atoms, wherein one or more hydrogen atoms of the alkylene group are optionally substituted with fluorine atoms or organic groups. Furthermore, R 101 The -CH2CH2- group is optionally replaced with -CH=CH-, and, provided that any of the groups listed below are not adjacent, the alkylene group is optionally interrupted by a group selected from the group consisting of -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, and -CO-, M 1 It can be a hydrogen atom or a methyl group. ), Q 2 This indicates a single bond or an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. Q 3 Represents a single bond, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, or -CO-, where Q 2 In the case of a single key, Q 3 Also a single key, Q 4 Q represents a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent fused-ring group. 5 Represents a single bond, oxygen atom, -COO- or -OCO-, where q1 is an integer from 0 to 3, q2 is 0 or 1, and Q 6 Q represents an oxygen atom or a sulfur atom. 7 This refers to an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. 8 The alkoxy group, representing alkoxy groups with 1 to 12 carbon atoms, is represented in Q. 2 Q 3 Q 6 And Q 7 All are single bonds, q1 is 0, Q 8 In the case of an OH group, Q 1 This refers to groups other than hydrogen atoms as defined above. [9] A compound represented by the following formula. Invention Effects According to the present invention, without using crosslinking agents containing N-hydroxymethyl, N-alkoxymethyl, etc., which may generate formaldehyde, it is possible to obtain oriented parts with excellent orientation and adhesion through low-temperature and short-time firing. Detailed Implementation

[0024] The present invention will now be described in detail. It should be noted that the following description of the constituent elements is merely an example for illustrating the present invention, and the present invention is not limited to these contents.

[0025] <Curing Film Forming Composition> The curing film forming composition of the present invention comprises: (A) a compound of formula (a) above (a compound having photooriented groups), (B) a polymer having epoxy groups, (C) a thermally generated acid agent, and (D) a compound having a free radical polymerizable group containing a C=C double bond and a nucleophilic group.

[0026] The following is a detailed explanation of each ingredient.

[0027] [(A) Ingredient] The component (A) in the curing film forming composition of the present invention is a compound represented by formula (a) above, which can be described as a low-molecular-weight compound having photo-orientation groups and thermal crosslinking groups. That is, component (A) is the component that imparts photoorientation to the cured film obtained from the curing film forming composition of the present invention, and in this specification, component (A) is also referred to as the photoorientation component. In this specification, photoorientation groups can be listed as functional groups that undergo photodimerization or photoisomerization (e.g., photodimerization sites such as cinnamyl, chalcone, coumarin, anthracene, etc., and photoisomerization sites such as azobenzene structure, stilbene structure, etc.). In addition, as thermal crosslinking groups, for example, groups selected from the group consisting of hydroxyl, carboxyl, amide, amino, and alkoxysilyl groups can be listed. Furthermore, the above-mentioned thermal crosslinking groups can be protected by protecting groups. For example, it is preferable to deprotect the curing film forming composition by acid generated by the thermal acid-generating agent of component (C) described later during calcination.

[0028] Regarding the compound that is component (A), compound (a-1) is preferred, wherein in compound (a-1), Q 1 The atom is a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms or a haloalkoxy group having 1 to 6 carbon atoms, a di(alkyl)amino group having 1 to 6 carbon atoms, or OH. 2 and Q 3 For single bonds, q1 is 0, q2 is 0, Q 6 and Q 7 For a single key, Q8 It is OH.

[0029] Examples of such compounds (a-1) include ferulic acid, 4-methoxycinnamic acid, 4-propoxycinnamic acid, 4-cyclohexylcinnamic acid, and 4-(N,N-dimethylamino)cinnamic acid.

[0030] Regarding the compound that is component (A), compound (a-2) is preferred, wherein in compound (a-2), Q 1 The atom is a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, or OH. 2 and Q 3 For single bonds, q1 is 0, q2 is 0, Q 6 and Q 7 For a single key, Q 8 It is an NH2 group.

[0031] Examples of such compounds (a-2) include: 4-methylcinnamoamide, 4-ethylcinnamoamide, 4-methoxycinnamoamide, 4-ethoxycinnamoamide, etc.

[0032] Regarding the compound that is component (A), compound (a-3) is preferred, wherein in compound (a-3), Q 1 It is an OH group, Q 2 It is a single bond, an alkylene group with 1 to 20 carbon atoms, Q 3 For single bonds, -O-, -COO-, or -OCO-, q1 is 0, q2 is 0, Q 6 and Q 7 For a single key, Q 8 It is an alkoxy group with 1 to 12 carbon atoms, a haloalkoxy group with 1 to 12 carbon atoms, a phenoxy group, or a biphenyloxy group.

[0033] Specific examples of compound (a-3) include: methyl 4-(8-hydroxyoctoxy)cinnamate, methyl 4-(6-hydroxyhexyloxy)cinnamate, methyl 4-(4-hydroxybutoxy)cinnamate, methyl 4-(3-hydroxypropoxy)cinnamate, methyl 4-(2-hydroxyethoxy)cinnamate, methyl 4-hydroxymethoxycinnamate, methyl 4-hydroxycinnamate, ethyl 4-(8-hydroxyoctoxy)cinnamate, ethyl 4-(6-hydroxyhexyloxy)cinnamate, ethyl 4-(4-hydroxybutoxy)cinnamate, ethyl 4-(3-hydroxypropoxy)cinnamate, ethyl 4-(2-hydroxyethoxy)cinnamate, ethyl 4-hydroxymethoxycinnamate, ethyl 4- Ethyl hydroxycinnamate, phenyl 4-(8-hydroxyoctoxy)cinnamate, phenyl 4-(6-hydroxyhexyloxy)cinnamate, phenyl 4-(4-hydroxybutoxy)cinnamate, phenyl 4-(3-hydroxypropoxy)cinnamate, phenyl 4-(2-hydroxyethoxy)cinnamate, phenyl 4-hydroxymethoxycinnamate, phenyl 4-hydroxycinnamate, biphenyl 4-(8-hydroxyoctoxy)cinnamate, biphenyl 4-(6-hydroxyhexyloxy)cinnamate, biphenyl 4-(4-hydroxybutoxy)cinnamate, biphenyl 4-(3-hydroxypropoxy)cinnamate, biphenyl 4-(2-hydroxyethoxy)cinnamate, biphenyl 4-hydroxymethoxycinnamate, biphenyl 4-hydroxycinnamate, etc.

[0034] Regarding the compound that is component (A), compound (a-4) is preferred, wherein in compound (a-4), Q 1 It is an NH2 group, Q 2 It is a single bond, an alkylene group with 1 to 20 carbon atoms, Q 3 For single bonds, -O-, -COO-, or -OCO-, q1 is 0, q2 is 0, Q 6 and Q 7 For a single key, Q 8 It is an alkoxy group with 1 to 12 carbon atoms, a haloalkoxy group with 1 to 12 carbon atoms, a phenoxy group, or a biphenyloxy group.

[0035] Specific examples of compounds (a-4) include methyl 4-aminocinnamate and ethyl 4-aminocinnamate.

[0036] Regarding the compound that is component (A), compound (a-5) is preferred, wherein in compound (a-5), Q 1 It is a trialkoxysilyl group, Q 2 It is an alkylene group having 1 to 20 carbon atoms, Q 3 For -O-, -COO-, or -OCO-, q1 is 0, q2 is 0, Q 6 and Q 7 For a single key, Q 8It can be an alkoxy group with 1 to 12 carbon atoms, a haloalkoxy group with 1 to 12 carbon atoms, a phenoxy group, or a biphenyloxy group. It should be noted that the "alkoxy(group)" in (tri)alkoxysilyl group can be an alkoxy(group) with 1 to 12 carbon atoms.

[0037] Specific examples of compounds (a-5) include: methyl 4-(3-trimethoxysilylpropoxy)cinnamate, methyl 4-(3-triethoxysilylpropoxy)cinnamate, ethyl 4-(3-trimethoxysilylpropoxy)cinnamate, ethyl 4-(3-triethoxysilylpropoxy)cinnamate, methyl 4-(3-trimethoxysilylhexoxy)cinnamate, methyl 4-(3-triethoxysilylhexoxy)cinnamate, ethyl 4-(3-trimethoxysilylhexoxy)cinnamate, and ethyl 4-(3-triethoxysilylhexoxy)cinnamate, etc.

[0038] Regarding the compound that is component (A), compound (a-6) is preferred, wherein in compound (a-6), Q 1 The atom is hydrogen, halogen, alkyl group with 1 to 6 carbon atoms, haloalkyl group with 1 to 6 carbon atoms, cycloalkyl group with 3 to 8 carbon atoms, alkoxy group with 1 to 6 carbon atoms, or haloalkoxy group with 1 to 6 carbon atoms or OH. 2 and Q 3 For single bonds, q1 is 0, q2 is 0, Q 6 Q is a single bond or an oxygen atom. 7 It is an alkylene group having 1 to 20 carbon atoms, Q 8 It is OH.

[0039] Examples of such compounds (a-6) include: 8-hydroxyoctyl cinnamate, 6-hydroxyhexyl cinnamate, 4-hydroxybutyl cinnamate, 3-hydroxypropyl cinnamate, 2-hydroxyethyl cinnamate, and hydroxymethyl cinnamate.

[0040] Regarding the low-molecular-weight compound that is component (A), compound (a-7) is preferred, wherein in compound (a-7), Q in the above formula (a) 1 For the group represented by formula (c-1), Q 2 It is a single bond or an alkylene group having 1 to 20 carbon atoms, where q1 is 0, q2 is 0, and Q 6 For a single key, Q 7 For a single key, Q 8 It can be OH group, NH2 group, hydroxyphenoxy, carboxyphenoxy, aminophenoxy, aminocarbonylphenoxy, phenylamino, hydroxyphenylamino, carboxyphenylamino, aminophenylamino, hydroxyalkylamino, bis(hydroxyalkyl)amino, cyanophenylamino, alkoxy with 1 to 12 carbon atoms, or haloalkoxy with 1 to 12 carbon atoms.

[0041] Specific examples of compounds (a-7) that are components of (A) include: 4-(6-methacryloyloxyhexyl-1-oxy)cinnamic acid, 4-(6-acryloyloxyhexyl-1-oxy)cinnamic acid, 4-(3-methacryloyloxypropyl-1-oxy)cinnamic acid, 4-(4-(3-methacryloyloxypropyl-1-oxy)acryloyloxy)benzoic acid, 4-(4-(6-methacryloyloxyhexyl-1-oxy)benzoyloxy)cinnamic acid, 4-(6-methacryloyloxyhexyl-1-oxy)cinnamicamide, 4-(6-methacryloyloxyhexyl-1-oxy)-N-(4-cyanophenyl)cinnamicamide, 4-(6-methacryloyloxyhexyl-1-oxy)-N-bis(hydroxyethyl)cinnamicamide, etc.

[0042] Regarding the low-molecular-weight compound that is component (A), compound (a-8) is preferred, wherein in compound (a-8), Q in the above formula (a) 1 The atom is a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, or an OH group. 2 Q is a single bond or an alkylene group having 1 to 20 carbon atoms. 3 For single bonds or -O-, q1 is 0, q2 is 0, Q 6 For oxygen atoms, Q 7 It is an alkylene group having 1 to 20 carbon atoms, Q 8 It is an alkoxy group with 1 to 12 carbon atoms, a haloalkoxy group with 1 to 12 carbon atoms, a phenoxy group, or a biphenyloxy group.

[0043] For example, compounds (a-8) that are components of (A) can be listed as shown in the following formula. Regarding the low-molecular-weight compound that is component (A), compound (a-9) is preferred, wherein in compound (a-9), Q in the above formula (a) 1 For the group represented by formula (c-1), Q 2 Q is a single bond or an alkylene group having 1 to 20 carbon atoms. 3 =-O-, q1 is 0, q2 is 0, Q 6 For oxygen atoms, Q 7 It is an alkylene group having 1 to 20 carbon atoms, Q 8 It is an alkoxy group with 1 to 12 carbon atoms, a haloalkoxy group with 1 to 12 carbon atoms, a phenoxy group, or a biphenyloxy group.

[0044] For example, compounds (a-9) that are components of (A) can be listed as shown in the following formula. It should be noted that the novel compounds in the examples shown above can be manufactured based on known raw materials and according to the methods described in the embodiments.

[0045] Specific examples of low molecular weight photoorientation components that are components of (A) can be listed above, but are not limited to these. In addition, component (A) can be a mixture of more than one compound.

[0046] [(B) Component] The curing film forming composition of the present invention contains a polymer having epoxy groups as component (B). Component (B) is cured by a crosslinking reaction, thereby the oriented parts obtained from the composition of the present invention exhibit orientation and solvent resistance.

[0047] Polymers containing epoxy groups can be, for example, homopolymers of polymeric unsaturated compounds containing epoxy groups, or copolymers of polymeric unsaturated compounds containing epoxy groups with other polymeric unsaturated compounds.

[0048] Specific examples of polymerizable unsaturated compounds with epoxy groups include: glycidyl acrylate, glycidyl methacrylate, α-ethyl glycidyl acrylate, α-n-propyl glycidyl acrylate, α-n-butyl glycidyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 6,7-epoxyheptyl acrylate, 6,7-epoxyheptyl methacrylate, 3,4-epoxycyclohexyl acrylate, 3,4-epoxycyclohexyl methacrylate, α-ethyl acrylate, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, 4-hydroxybutyl methacrylate glycidyl ether, allyl glycidyl ether, 3-vinyl-7-oxabicyclo[4.1.0]heptane, 1,7-octadiene monoepoxide, etc. Among them, considering availability and the properties of the cured film, 3,4-epoxycyclohexyl methyl acrylate and 3,4-epoxycyclohexyl methyl methacrylate are particularly preferred.

[0049] Other polymerizable unsaturated compounds include: alkyl (meth)acrylates, cyclic (meth)acrylates, aryl methacrylates, aryl acrylates, unsaturated dicarboxylic acid diesters, bicyclic unsaturated compounds, maleimide compounds, unsaturated aromatic compounds, conjugated diene compounds, unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, unsaturated dicarboxylic acid anhydrides, and other polymerizable unsaturated compounds.

[0050] It should be noted that throughout this specification, (meth)acryloyl means either acryloyl or methacryloyl.

[0051] Specific examples of these include, for instance, alkyl methacrylates such as: methyl methacrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl methacrylate, diethylene glycol monomethacrylate, 2,3-dihydroxypropyl methacrylate, 2-methacryloyloxyethyl glycoside, 4-hydroxyphenyl methacrylate, methyl methacrylate, ethyl methacrylate, n-butyl methacrylate, sec-butyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-dodecyl methacrylate, tridecyl methacrylate, n-octadecyl methacrylate, etc.; alkyl acrylates such as: methyl acrylate, isopropyl acrylate, etc.; and cyclic alkyl methacrylates such as: cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, tricyclic methacrylate [5.2.1.0]. 2，6 [Decane-8-yl ester, tricyclic methacrylate [5.2.1.0]] 2，6 Decane-8-yloxyethyl ester, isobornyl methacrylate, cholealkyl methacrylate, etc.; as cyclic alkyl acrylates, examples include: cyclohexyl acrylate, 2-methylcyclohexyl acrylate, tricycloacrylate [5.2.1.0] 2，6 [Decane-8-yl ester, tricyclic acrylate [5.2.1.0]] 2，6Decane-8-yloxyethyl ester, isobornyl acrylate, cholesteryl acrylate, etc.; as aryl methacrylates, examples include: phenyl methacrylate, benzyl methacrylate, etc.; as aryl acrylates, examples include: phenyl acrylate, benzyl acrylate, etc.; as unsaturated dicarboxylic acid diesters, examples include: diethyl maleate, diethyl fumarate, diethyl itaconic acid, etc.; as bicyclic unsaturated compounds, examples include: bicyclic [2.2.1]hept-2-ene, 5-methylbicyclic [2.2.1]hept-2-ene, 5-ethylbicyclic [2.2.1]hept-2-ene, 5-methoxybicyclic [2.2.1]hept-2-ene, 5-methoxybicyclic [2.2.1]hept-2-ene. 1] Hept-2-ene, 5-ethoxybicyclo[2.2.1] hept-2-ene, 5,6-dimethoxybicyclo[2.2.1] hept-2-ene, 5,6-diethoxybicyclo[2.2.1] hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1] hept-2-ene, 5,6-dihydroxybicyclo[2.2.1] hept-2-ene, 5,6-di(hydroxymethyl)bicyclo[2.2.1] hept-2-ene, 5,6-di(2'-hydroxyethyl)bicyclo[2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo[2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1] hept-2-ene -2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]hept-2-ene, etc.; as maleimide compounds, examples include: phenylmaleimide, cyclohexylmaleimide, benzylmaleimide, N-succinimide-3-maleimide benzoate, N-succinimide-4-maleimide butyrate, N-succinimide-6-maleimide hexanoate, N-succinimide-3-maleimide propionate, N-(9-acridyl)maleimide, etc.; as unsaturated aromatic compounds, examples include: styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, etc. Vinyltoluene, p-methoxystyrene, etc.; as conjugated diene compounds, examples include: 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, etc.; as unsaturated monocarboxylic acids, examples include: acrylic acid, methacrylic acid, crotonic acid, etc.; as unsaturated dicarboxylic acids, examples include: maleic acid, fumaric acid, citraconic acid, succinic acid, itaconic acid, etc.; as unsaturated dicarboxylic acid anhydrides, examples include: the anhydrides of the above-mentioned unsaturated dicarboxylic acids; as polymerizable unsaturated compounds other than those mentioned above, examples include: acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, etc.

[0052] The copolymerization ratio of the epoxy-containing polymerizable unsaturated compound in the copolymer is preferably 30% by mass or more, more preferably 50% by mass or more.

[0053] The synthesis of (co)polymers with epoxy groups can preferably be carried out in a solvent by known free radical polymerization in the presence of a suitable polymerization initiator.

[0054] The weight-average molecular weight (converted to polystyrene) of the epoxy-containing polymer as component (B) is 1,000 to 500,000, preferably 2,000 to 200,000, more preferably 3,000 to 150,000, and even more preferably 3,000 to 80,000.

[0055] As a polymer with epoxy groups, commercially available products can be used. Products sold in the city include, for example: EHPE3150, EHPE3150CE (and above, manufactured by Daicel Chemical Co., Ltd.), UG-4010, UG-4035, UG-4040, UG-4070 (and above, manufactured by Toa Synthetic Co., Ltd., ALUFON series), ECN-1299 (manufactured by Asahi Kasei Co., Ltd.), DEN431, DEN438 (and above, manufactured by Dow Chemical Co., Ltd.), jER-152 (manufactured by MITSUBISHI CHEMICAL Co., Ltd.), EPICLON N-660, N-665, N-670, N-673, N-695, N-740, N-770, N-775 (and above, manufactured by DIC Co., Ltd.), EOCN-1020, EOCN-102S, EOCN-104S (and above, manufactured by Nippon Kayaku Co., Ltd.), etc.

[0056] These polymers can be used alone or in combination of two or more.

[0057] In the curing film forming composition of the present invention, based on 100 parts by weight of the photo-orientation component as component (A), the content of the epoxy-containing polymer as component (B) is preferably 200 parts by weight to 1500 parts by weight, more preferably 400 parts by weight to 1300 parts by weight.

[0058] [(C) component] In addition to components (A) and (B) described above, the curing film forming composition of the present invention also contains a thermal acid-generating agent as component (C).

[0059] When a curing film is formed using a curing film forming composition that forms the surface of the optical film of the present invention, component (C) is effective in promoting the thermosetting reaction.

[0060] (C) Any compound that produces acid by thermal decomposition during pre-drying or post-drying, i.e., a compound that produces acid by thermal decomposition at a temperature of 60°C to 150°C, is not particularly limited.

[0061] Examples of the above-mentioned heat-generating acid agents include: bis(toluenesulfonyloxy)ethane, bis(toluenesulfonyloxy)propane, bis(toluenesulfonyloxy)butane, p-nitrobenzyltoluene ester, o-nitrobenzyltoluene ester, 1,2,3-phenylenetris(methylsulfonate), pyridinium salt of p-toluenesulfonate, morpholineium salt of p-toluenesulfonate, ethyl p-toluenesulfonate, propyl p-toluenesulfonate, butyl p-toluenesulfonate, isobutyl p-toluenesulfonate, methyl p-toluenesulfonate, phenylethyl p-toluenesulfonate, cyanomethyl p-toluenesulfonate, 2,2,2-trifluoroethyl p-toluenesulfonate, 2-hydroxybutyl p-toluenesulfonate, N-ethyl-4-toluenesulfonamide, and compounds shown in formulas [TAG-1] to [TAG-41] below, as well as onion salts such as iodonium salts, sulfonium salts, phosphonium salts, and selenium salts. Examples of iodonium salts that are diphenyliodonium include: diphenyliodonium, 4,4'-dichlorodiphenyliodonium, 4,4'-dimethoxydiphenyliodonium, 4,4'-di-tert-butyldiphenyliodonium, 4-methylphenyl(4-(2-methylpropyl)phenyl)iodonium, 3,3'-dinitrophenyliodonium, 4-(1-ethoxycarbonylethoxy)phenyl(2,4,6-trimethylphenyl)iodonium, and 4-methoxyphenyl(phenyl)iodonium, among other diaryl iodonium salts.

[0062] Examples of iodonium salts include diaryliodonium salts, where the iodonium group is the cation and the chloride, bromide, methanesulfonate, toluenesulfonate, trifluoromethanesulfonate, tetrafluoroborate, tetra(pentafluorophenyl)borate, hexafluorophosphate, hexafluoroarsenate, and hexafluoroantimonate groups are the anions.

[0063] Examples of sulfonium salts that include sulfonium include: triphenylsulfonium, diphenyl(4-tert-butylphenyl)sulfonium, tri(4-tert-butylphenyl)sulfonium, diphenyl(4-methoxyphenyl)sulfonium, tri(4-methylphenyl)sulfonium, tri(4-methoxyphenyl)sulfonium, tri(4-ethoxyphenyl)sulfonium, diphenyl(4-(phenylthio)phenyl)sulfonium, tri(4-(phenylthio)phenyl)sulfonium, benzyl(4-acetoxyphenyl)(methyl)sulfonium, 2-methylbenzyl(4-acetoxyphenyl)(methyl)sulfonium, 4-methylbenzyl(4-hydroxyphenyl)(methyl)sulfonium, and other arylsulfonium salts.

[0064] Examples of matte salts include aryl matte salts, which have the above-mentioned matte as the cation portion and chloride ion, bromide ion, trifluoromethane sulfonate, tetrafluoroborate, hexafluorophosphate, hexafluoroarsenate, tetra(pentafluorophenyl)borate, hexafluoroantimonate, etc. as the anion portion.

[0065] Examples of phosphonium salts mentioned above include tetraphenylphosphonium, ethyltriphenylphosphonium, tetra(p-methoxyphenyl)phosphonium, ethyltri(p-methoxyphenyl)phosphonium, benzyltriphenylphosphonium, and other arylphosphoniums.

[0066] Examples of phosphonium salts include aryl phosphonium salts, which have phosphonium as the cation and chloride, bromide, tetrafluoroborate, hexafluorophosphate, hexafluoroantimonate, etc., as the anions.

[0067] Examples of the aforementioned selenium salts include triphenylselenophosphate and other triaryl selenium salts.

[0068] The (C) component can be obtained from commercially available products, such as: TA-100, TA-100FG, IK-1, IK-1FG (all of the above, manufactured by San Apro Co., Ltd.), SAN AID (registered trademark) SI-B2A, SAN AID (registered trademark) SI-B7, SAN AID (registered trademark) SI-B3A, SAN AID (registered trademark) SI-B3, SAN AID (registered trademark) SI-B5, SAN AID (registered trademark) SI-B4, SAN AID (registered trademark) SI-150, SAN AID (registered trademark) SI-110, SAN AID (registered trademark) SI-60, SAN AID (registered trademark) SI-80, SAN AID (registered trademark) SI-100 (all of the above, manufactured by Sanshin Chemical Industry Co., Ltd.), etc.

[0069] In the curing film forming composition of the present invention, the content of component (C) is 1 to 150 parts by mass relative to 100 parts by mass of the photo-alignment component (A), preferably 3 to 120 parts by mass, more preferably 5 to 100 parts by mass, and even more preferably 10 to 80 parts by mass. By setting the content of component (C) to 1 part by mass or more, sufficient thermosetting and solvent resistance can be imparted, as well as high sensitivity to exposure. Furthermore, by setting the content of component (C) to 150 parts by mass or less, good storage stability of the curing film forming composition can be achieved.

[0070] [(D) component] In addition to components (A), (B), and (C) described above, the curing film forming composition of the present invention also contains a compound having a free radical polymerizable group containing a C=C double bond and a nucleophilic group as component (D). Component (D) functions as an adhesion promoter between the alignment film and the liquid crystal layer. That is, it promotes adhesion between the alignment film and the liquid crystal layer by bonding with component (B) through the nucleophilic group and with the polymerizable liquid crystal through the free radical polymerizable group containing a C=C double bond.

[0071] Regarding the nucleophilic groups of the compounds that are components (D), examples include: carboxyl, epoxy, oxetyl, hydroxyl, amino, vinyl ether, and isocyanate groups. Among these, carboxyl and epoxy groups are preferred.

[0072] Examples of compounds having a free radical polymerizable group containing a C=C double bond and a carboxyl group include: acrylic acid, methacrylic acid, crotonic acid, mono-(2-(acryloyloxy)ethyl) phthalate, mono-(2-(methacryloyloxy)ethyl) phthalate, mono-(2-(acryloyloxy)ethyl) hexahydrophthalate, mono-(2-(methacryloyloxy)ethyl) hexahydrophthalate, mono-(2-(acryloyloxy)ethyl) succinate, mono-(2-(methacryloyloxy)ethyl) succinate, N-(carboxyphenyl)maleimide, N-(carboxyphenyl)methacrylamide, N-(carboxyphenyl)acrylamide, and ω-carboxy-polycaprolactone mono(meth)acrylate. As their monomers, for example, substances commercially available as "Light Ester HO-MS", "Light Acrylate HOA-MS(N)", "Light Acrylate HOA-HH(N)" and "Light Acrylate HOA-MPL(N)" (all manufactured by Kyoeisha Chemical Co., Ltd., trade name), ARONIX M-5300, ARONIX M-5400 (all manufactured by Toa Synthetic Co., Ltd., trade name), A-SA, SA (all manufactured by Shin-Nakamura Chemical Industry Co., Ltd., trade name) can be used.

[0073] Examples of compounds having free radical polymerizable groups containing C=C double bonds and epoxy groups include: glycidyl methacrylate, glycidyl acrylate, 4-hydroxybutyl methacrylate glycidyl ether, 4-hydroxybutyl methacrylate glycidyl ether, allyl glycidyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, 3-vinyl-7-oxabicyclo[4.1.0]heptane, 1,2-epoxy-5-hexene, and 1,7-octadiene monocyclic rings. Oxides, 3,4-epoxycyclohexyl methyl methacrylate, 3,4-epoxycyclohexyl methyl acrylate, α-ethyl glycidyl acrylate, α-n-propyl glycidyl acrylate, α-n-butyl glycidyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 6,7-epoxyheptyl acrylate, 6,7-epoxyheptyl methacrylate, 3,4-epoxycyclohexyl methyl acrylate, 3,4-epoxycyclohexyl methyl methacrylate, and α-ethyl 6,7-epoxyheptyl acrylate, etc. As monomers, for example, substances commercially available as CYCLOMERM-100 (manufactured by Daicel Co., Ltd., trade name) and 4HBAGE (manufactured by Shinmyoshi Co., Ltd., trade name) can be used.

[0074] In addition, as component (D), a substance having a spacer group between a group selected from epoxy and carboxyl groups and a free radical polymerizable group may also be selected.

[0075] Preferred examples of compounds having a free radical polymerizable group containing a C=C double bond, a spacer group, and a carboxyl group include the compounds shown below (SC-1) and (SC-2). In equations (SC-1) and (SC-2), X 4 This indicates a polymerizable group. As a representation of X... 4 Specific examples of polymerizable groups include: acryloyl, methacryl, styrene, maleimide, acrylamide, methacrylamide, etc. 1 This indicates a single bond, ether bond, ester bond, amide bond, urea bond, or carbamate bond. Q 1 and Q 3 Each can be used independently to represent an alkylene group having 2 to 10 carbon atoms. Here, Q... 2 This indicates a divalent group having a structure derived from dicarboxylic anhydrides. n represents a natural number from 1 to 10.

[0076] As compounds having a free radical polymerizable group containing a C=C double bond, a spacer group, and a carboxyl group, mono-(2-(acryloyloxy)ethyl) phthalate, mono-(2-(methacryloyloxy)ethyl) phthalate, mono-(2-(acryloyloxy)ethyl) hexahydrophthalate, mono-(2-(methacryloyloxy)ethyl) hexahydrophthalate, mono-(2-(acryloyloxy)ethyl) succinate, mono-(2-(methacryloyloxy)ethyl) succinate, and ω-carboxyl-polycaprolactone mono(meth)acrylate are preferred. Furthermore, polyfunctional acrylates having a carboxyl group are also preferred. As commercially available products, such substances can be used as "Light Ester HO-MS", "Light Acrylate HOA-MS(N)", "Light Acrylate HOA-HH(N)" and "Light Acrylate HOA-MPL(N)" (all manufactured by Kyoeisha Chemical Co., Ltd., trade names), ARONIX M-5300, and ARONIX M-5400 (all manufactured by Toa Synthesis Co., Ltd., trade names).

[0077] Compounds having free radical polymerizable groups containing C=C double bonds, spacer groups, and epoxy groups can be listed below (SE-1). In formula (SE-1), X 4 This indicates a polymerizable group. As a representation of X... 4 Specific examples of polymerizable groups include: acryloyl, methacryl, styrene, maleimide, acrylamide, methacrylamide, etc. 1 This indicates a single bond, ether bond, ester bond, amide bond, urea bond, or carbamate bond. Q 1 Indicates alkylene groups having 2 to 10 carbon atoms.

[0078] Examples of monomers having free radical polymerizable groups, spacer groups, and epoxy groups including C=C double bonds include: 4-hydroxybutyl methacrylate glycidyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, etc.

[0079] As a monomer having a free radical polymerizable group containing a C=C double bond and a carboxyl group, the polyfunctional acrylate having a carboxyl group shown below (SC-3) is also preferred. In formula (SC-3), X 4This indicates a polymerizable group. Specific examples of such polymerizable groups include: acryloyl, methacryloyl, styrene, maleimide, acrylamide, methacrylamide, etc. L 1 This indicates a single bond, ether bond, ester bond, amide bond, urea bond, or carbamate bond. Q 4 It represents an organic group with a valence of (m+1), where m represents a natural number from 2 to 10.

[0080] Such compounds can be used as substances commercially available as ARONIX M-510, M-520 (and above, manufactured by Toa Synthetic Co., Ltd., trade name).

[0081] Examples of compounds containing free radical polymerizable groups including C=C double bonds and hydroxyl groups include: 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, 6-hydroxyhexyl acrylate, 6-hydroxyhexyl methacrylate, 8-hydroxyoctyl acrylate, 8-hydroxyoctyl methacrylate, 10-hydroxydecyl acrylate, 10-hydroxydecyl methacrylate, 12-hydroxydodecyl acrylate, 1-hydroxyethyl methacrylate 2-Hydroxydodecyl ester, 2,3-dihydroxypropyl acrylate, 2,3-dihydroxypropyl methacrylate, diethylene glycol monoacrylate, diethylene glycol monomethacrylate, caprolactone 2-(acryloyloxy)ethyl ester, caprolactone 2-(methacryloyloxy)ethyl ester, poly(ethylene glycol) ethyl ether acrylate, poly(ethylene glycol) ethyl ether methacrylate, 5-acryloyloxy-6-hydroxynorbornene-2-carboxylic acid-6-lactone, 5-methacryloyloxy-6-hydroxynorbornene-2-carboxylic acid-6-lactone, etc.

[0082] As a compound having a free radical polymerizable group containing a C=C double bond and an oxetyl group, methyl methacrylate (3-ethyl-3-oxetyl) and methyl acrylate (3-ethyl-3-oxetyl) are preferred. As a commercially available product, for example, a substance commercially available as ETERNACOLL (registered trademark) OXMA (manufactured by UBE Corporation) can be used.

[0083] As compounds having a free radical polymerizable group containing a C=C double bond and an isocyanate group, 2-(acryloyloxy)ethyl isocyanate and 2-(methacryloyloxy)ethyl isocyanate are preferred. Furthermore, polyfunctional acrylates having an isocyanate group, such as 1,1-(bisacryloyloxymethyl)ethyl isocyanate, are also preferred. As commercially available products, substances commercially available as Karenz (registered trademark) AOI (manufactured by Resonac Co., Ltd.), Karenz (registered trademark) MOI (manufactured by Resonac Co., Ltd.), and Karenz (registered trademark) BEI (manufactured by Resonac Co., Ltd.) can be used, for example.

[0084] As compounds having a free radical polymerizable group containing a C=C double bond and a vinyl ether group, 2-(2-ethyleneoxyethoxy)ethyl acrylate, 2-(2-ethyleneoxyethoxy)ethyl methacrylate, etc. are preferred. As commercially available products, substances commercially available as VEEA (registered trademark) (Nippon Shokubai Co., Ltd.) and VEEM (registered trademark) (Nippon Shokubai Co., Ltd.) can be used, for example.

[0085] Examples of compounds containing free radical polymerizable groups including C=C double bonds and amino groups include: aminomethyl methacrylate, aminoethyl methacrylate, aminopropyl methacrylate, aminoisopropyl methacrylate, and aminoalkyl methacrylates.

[0086] In the curing film forming composition of the embodiments of the present invention, the content of component (D) is preferably 30 parts by mass to 300 parts by mass relative to the compound (low molecular weight compound) shown in formula (a) above as component (A), and more preferably 50 parts by mass to 250 parts by mass.

[0087] Furthermore, in the curing film forming composition of this embodiment, component (D) may also be a mixture of compounds of various components (D).

[0088] [Other additives] Other additives may be included in the curing film forming composition of the embodiments of the present invention, provided that the effects of the present invention are not compromised.

[0089] Other additives may include, for example, sensitizers. When forming a cured film on the surface of the optical film of the present invention, the sensitizer is effective in promoting its photoreaction.

[0090] Examples of sensitizers include derivatives of benzophenone, anthracene, anthraquinone, and thioxanthone, as well as nitrophenyl compounds. Among these, N,N-diethylaminobenzophenone, a derivative of benzophenone, and 2-nitrofluorene, 2-nitrofluorenone, 5-nitroacenaphthene, 4-nitrobiphenyl, 4-nitrocinnamic acid, 4-nitrostilbene, 4-nitrobenzophenone, and 5-nitroindole are particularly preferred as nitrophenyl compounds.

[0091] Sensitive agents are not specifically limited to the substances mentioned above. They can be used alone or in combination with two or more compounds.

[0092] In embodiments of the present invention, the proportion of the sensitizer used relative to 100 parts by weight of component (A) is preferably 0.1 to 20 parts by weight, more preferably 0.2 to 10 parts by weight. If the proportion is too small, the effect of the sensitizer may not be fully obtained, and if the proportion is too large, the transmittance of the cured film may decrease or the coating may become rough.

[0093] Furthermore, as long as the effects of the present invention are not compromised, the curing film forming composition of the embodiments of the present invention may contain silane coupling agents, surfactants, rheology modifiers, pigments, dyes, preservation stabilizers, defoamers, antioxidants, etc. as other additives.

[0094] [Solvent] The curing film forming composition of the present invention can be used in a solution state (varnish form) dissolved in a solvent (also called a "solvent"). The solvent used here is not particularly limited in type or structure, as long as it has such dissolving ability, it can dissolve components (A), (B), (C), (D) and other additives as desired.

[0095] Specific examples of solvents include: ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol propyl ether, propylene glycol propyl ether acetate, cyclopentyl methyl ether, toluene, xylene, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-butanone, 3-methyl-2-pentanone, 2-pentanone, 2-heptanone, γ-butyrolactone, ethyl 2-hydroxypropionate. Esters, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxylate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutyrate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl pyruvate, ethyl pyruvate, ethyl acetate, butyl acetate, ethyl lactate, butyl lactate, n-propyl acetate, isopropyl acetate, isopropanol, N,N-dimethylformamide, N,N-dimethylacetamide, and N-methyl-2-pyrrolidone, etc.

[0096] These solvents can be used alone or in combination of two or more.

[0097] Furthermore, the solvent can be obtained from commercially available products. For example, commercially available products as mixed solvents include: Neoethanol PM, Neoethanol MIP, Neoethanol IPM, Neoethanol IPE, Neoethanol PHI, Neoethanol MHI, Neoethanol PIP, Neoethanol HIMTE, Neoethanol PHM, Neoethanol IPME, Neoethanol P-7 (and above, manufactured by Daishin Chemical Co., Ltd.), etc.

[0098] Among these solvents, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, methyl ethyl ketone, cyclohexanone, 2-heptanone, propylene glycol propyl ether, propylene glycol propyl ether acetate, ethyl acetate, ethyl lactate, butyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, and Neoethanol (registered trademark) IPM have good film-forming properties and high safety, and are therefore preferred.

[0099] <Preparation of Cured Film Forming Composition> As described above, the curing film forming composition of the present invention comprises: a photo-orienting compound of formula (a) as component (A), a polymer having epoxy groups as component (B), a thermally generated acid agent as component (C), and a compound having a free radical polymerizable group containing a C=C double bond and a nucleophilic group as component (D). In one embodiment, a solvent is also included, which can be prepared in a dissolved form of the above-described components. Furthermore, the curing film forming composition of the present invention may also contain other additives, provided that the effects of the present invention are not impaired.

[0100] Preferred examples of the curing film forming composition of the present invention are described below.

[0101] [1]: A curing film forming composition comprising: (A) component; (B) component comprising 400 to 1300 parts by mass based on 100 parts by mass of (A) component; (C) component comprising 10 to 80 parts by mass relative to 100 parts by mass of (A) component; and (D) component comprising 50 to 250 parts by mass relative to 100 parts by mass of (A) component.

[0102] The following details the formulation ratios, preparation methods, etc., when the curing film forming composition of the present invention is used in solution form (in the form of a so-called varnish).

[0103] The proportion of solid components in the curing film forming composition of the present invention is not particularly limited as long as each component is uniformly dissolved in the solvent, and is 1% to 80% by mass, preferably 2% to 60% by mass, and more preferably 3% to 40% by mass. Here, solid components refer to components obtained by removing the solvent from all components of the curing film forming composition.

[0104] The method for preparing the cured film forming composition of the present invention is not particularly limited. Examples of preparation methods include: mixing components (A), (C), and (D) in a solution of component (B) dissolved in a solvent in a predetermined ratio to form a homogeneous solution; or, at an appropriate stage of the preparation method, adding other additives as needed and mixing them. In this case, to improve the storage stability of the composition, component (C) may also be added later, for example, just before the composition is to be used.

[0105] In the preparation of the cured film-forming composition of the present invention, as described above, the solution of component (B) obtained by polymerization in a solvent can be used as is. In this case, for example, components (A), (C), and (D) can be added to the solution of component (B) obtained by (co)polymerizing the above-mentioned epoxy-containing polymerizable unsaturated compound with other polymerizable unsaturated compounds as desired, to prepare a homogeneous solution and obtain the cured film-forming composition. At this time, solvent may be added further for the purpose of adjusting the concentration. At this time, the solvent used in the manufacturing process of component (B) and the solvent used to adjust the concentration of the cured film-forming composition may be the same or different.

[0106] Furthermore, the solution of the prepared curing film forming composition is preferably filtered using a filter with a pore size of about 0.2 μm before being used to form a curing film.

[0107] <Curing film, alignment components, and phase difference components> The cured film of the present invention can be formed by applying the above-mentioned cured film forming composition (solution) onto a substrate (e.g., silicon / silica coated substrate, silicon nitride substrate, substrate coated with metal such as aluminum, molybdenum, chromium, etc., glass substrate, quartz substrate, ITO substrate, etc.) or a film (e.g., cellulose triacetate (TAC) film, cyclic olefin polymer film, polyethylene terephthalate film, acrylic film, etc. resin film) by means of rod coating, spin coating, flow coating, roll coating, slot coating, slot coating followed by spin coating, inkjet coating, printing, etc., to form a coating film, and then heating and drying it using a heating plate or oven.

[0108] As described later, when using the cured film as a liquid crystal alignment film, the curing reaction should proceed to the point where the components of the liquid crystal alignment film do not dissolve into the polymeric liquid crystal solution coated thereon. For example, a heating temperature and heating time appropriately selected from the range of 50°C to 150°C and 0.4 minutes to 60 minutes may be used. Preferably, the heating temperature and heating time are 60°C to 130°C and 0.5 minutes to 10 minutes.

[0109] The thickness of the cured film of the present invention is, for example, 0.05 μm to 5 μm, and can be appropriately selected taking into account the height difference of the substrate, the optical properties, and the electrical properties of the film used as a substrate.

[0110] By subjecting the cured film of the present invention thus produced to polarized UV irradiation, the cured film formed on the substrate can function as a liquid crystal alignment film, that is, as a component for aligning liquid crystal compounds containing polymeric liquid crystals, etc., i.e., the cured film can be used as an alignment member. The present invention also targets this alignment member.

[0111] As a polarized UV irradiation method, ultraviolet to visible light with wavelengths of 150 nm to 450 nm is typically used. This is achieved by irradiating linearly polarized light from a vertical or oblique direction at room temperature or under heating conditions.

[0112] In the alignment member of the present invention, since the cured film that becomes the liquid crystal alignment film has solvent resistance and heat resistance, after coating the alignment member with a phase retardation material composed of a polymeric liquid crystal solution, heating it to the phase transition temperature of the liquid crystal causes the phase retardation material to become a liquid crystal state, allowing it to be aligned on the alignment member. Furthermore, by curing the phase retardation material in the desired alignment state while maintaining that alignment state, a phase retardation member with an optically anisotropic layer can be formed.

[0113] As a phase difference material, for example, liquid crystal monomers having polymerizable groups and compositions containing said liquid crystal monomers are used. Furthermore, when the substrate for forming the alignment member in this invention is a film, the phase difference member of this invention is useful as a phase difference film. The phase difference material forming such a phase difference member is in a liquid crystal state, and there are materials that can be horizontally oriented, cholesterically oriented, vertically oriented, or mixed oriented on the alignment member, and can be used according to their respective desired phase difference characteristics.

[0114] Furthermore, in the case of manufacturing patterned retardation elements for 3D displays, for the surface-cured film of the alignment element of the present invention, polarized UV exposure is performed relative to a predetermined reference, for example, at a +45-degree angle, through a mask with a line and space pattern. Then, after removing the mask, polarized UV exposure is performed at a -45-degree angle with less exposure. This allows the cured film on the surface of the film to become a liquid crystal alignment film with two liquid crystal alignment regions having different alignment control directions, thus enabling the optical film to become an alignment element. Then, after coating the alignment element with a retardation material composed of a polymeric liquid crystal solution, the retardation material is heated to the phase transition temperature of the liquid crystal to become a liquid crystal state. The polymeric liquid crystal in the liquid crystal state is aligned on the alignment element having two liquid crystal alignment regions, forming alignment states corresponding to each liquid crystal alignment region. Then, by curing the retardation material that has achieved such an alignment state while maintaining this alignment state, the above-mentioned alignment state is fixed, and a patterned retardation element with multiple phase difference regions having different phase difference characteristics arranged regularly can be obtained.

[0115] The cured film of the present invention can also be used as a liquid crystal alignment film for a liquid crystal display element. For example, a substrate having the cured film of this embodiment formed as described above can be used, and after the alignment members are bonded to each other with spacers in between, liquid crystal is injected between these substrates to manufacture a liquid crystal aligned liquid crystal display element.

[0116] Therefore, the cured film of the present invention can be used to manufacture various phase difference components (phase difference films), liquid crystal display elements, etc.

[0117] Example The following examples illustrate the invention in detail, but the invention is not to be construed as being limited to these examples.

[0118] [Abbreviations used in the examples] The meanings of the abbreviations used in the following embodiments are as follows.

[0119] <Polymerization Initiator> MAIB: 2,2'-Dimethyl azobis(isobutyrate) <Component A> CIN1: CIN2: <Component D> M100: CYCLOMER M-100 (manufactured by Daicel Corporation, 3,4-epoxycyclohexyl methyl methacrylate) 4HBAGE: 4-hydroxybutyl acrylate glycidyl ether (Shinryi Corporation) M5300: ARONIX M-5300 (manufactured by Toa Synthetic Co., Ltd., ω-carboxyl-polycaprolactone monoacrylate) 4HBA: 4-Hydroxybutyl acrylate (Shinryi Corporation) BEI: Karenz (registered trademark) BEI (manufactured by Resonac Co., Ltd., 1,1-(bisacryloyloxymethyl)ethyl isocyanate) OXMA: ETERNACOLL (registered trademark) OXMA (manufactured by UBE Corporation, (methyl methacrylate (3-ethyl-3-oxetanebutyl) ester)) <Component C> B2A: SAN AID (registered trademark) SI-B2A (manufactured by Sanshin Chemical Industry Co., Ltd.) (thermal acid production agent) B7: SAN AID (registered trademark) SI-B7 (manufactured by Sanshin Chemical Industry Co., Ltd.) (thermal acid production agent) <Solvent> PMA: Propylene glycol monomethyl ether acetate BA: Butyl acetate EA: Ethyl acetate AcOEt: Ethyl acetate THF: Tetrahydrofuran <Determination of weight-average molecular weight> Equipment: TOSOH Corporation GPC unit (HLC-8320) Chromatographic columns: TOSOH Corporation's TSKgel α-4000 and TSKgel α-3000 (registered trademark) Column oven: 40℃ Flow rate: 1 mL / min Eluent: N,N-dimethylformamide Standard sample: polystyrene < 1 H-NMR determination > Apparatus: Fourier transform superconducting nuclear magnetic resonance (FT-NMR) device "AVANCE III" (manufactured by BRUKER) 500MHz.

[0120] Solvent: Deuterated dimethyl sulfoxide (DMSO-d6).

[0121] Standard substance: Tetramethylsilane (TMS).

[0122] <Synthesis of Component A> <Synthesis Example 1 (Synthesis of CIN2)> CIN1 (10.0 g, 30 mmol) and THF (120 g) were added to a 500 mL four-necked flask. After nitrogen replacement, the mixture was cooled to 0 °C, and chloromethyl ethyl ether (3.3 g, 34.5 mmol) was added dropwise. Then, triethylamine (Et3N, 3.7 g, 36.0 mmol) was slowly added dropwise. After confirming that the heating had subsided, the mixture was stirred at room temperature. After the reaction was complete, AcOEt (150 g) and deionized water (150 g) were added to the reaction solution to extract the organic phase. The obtained organic phase was washed twice with deionized water (150 g) and concentrated to obtain 11.6 g of CIN2 (yellow liquid, 99% yield).

[0123] 1 H-NMR(500MHz)in DMSO-d6: δ (ppm) = 7.64-7.68 (m, 3H), 6.95-6.96 (d, 2H), 6.46-6.50 (d, 1H), 6.01 (s, 1H), 5.65 (s, 1H), 5.34 (s, 2H), 4.08-4.10 (t, 2 H), 3.99-4.01 (t, 2H), 3.64-3.69 (t, 2H), 1.87 (s, 3H), 1.70-1.73 (m, 2H), 1.62-1.65 (m, 2H), 1.35-1.44 (m, 4H), 1.13-1.16 (t, 3H).

[0124] <Synthesis of Component B> <Synthesis example 2> After dissolving M100 (37.6 g, 191.6 mmol) and MAIB (0.441 g, 1.92 mmol) as a polymerization catalyst in a 5 / 5 (mass ratio) PMA / BA mixed solvent (57.1 g), the solution was added dropwise over 60 minutes to a flask in which the 5 / 5 (mass ratio) PMA / BA mixed solvent (95.1 g) was maintained at 80 °C. After the addition was complete, the mixture was allowed to react overnight at 80 °C, thus yielding a solution of the acrylic polymer (PB-1) (20% by mass solids). The weight-average molecular weight (Mw) of the obtained acrylic polymer was 52460.

[0125] <Preparation Example 1> CIN1 (10 parts by mass) as component (A), PB-1 (70 parts by mass) obtained in Synthesis Example 2 as component (B), and M100 (20 parts by mass) as component (D) were mixed. PMA and BA with a solvent composition of PMA:BA = 20:80 (mass ratio) were added, and the mixture was stirred for 2 hours. Dissolution was visually confirmed, yielding a solution. The resulting solution was then filtered through a 0.2 μm filter, thereby preparing a composition (A-1) with a solid content concentration of 8.0% by mass.

[0126] <Preparation Examples 2-12> Using the types and amounts of each component shown in Table 1 below, except that the same procedure was followed as in Preparation Example 1, (A-2) to (A-11) and (B-1) were prepared. <Preparation of thermally generated acid solution> <Preparation Example 13> Add 1.0 g of B2A as component (C) and 19.0 g of BA as solvent, stir for 1 hour, and confirm that it has dissolved by visual inspection. Filter the solution through a 0.2 μm filter to prepare the thermal acid-producing agent solution (C-1).

[0127] <Preparation Example 14> Add 1.0 g of B7 as component (C) and 19.0 g of BA as solvent, stir for 1 hour, and confirm that it has dissolved by visual inspection. Filter the solution through a 0.2 μm filter to prepare the thermal acid-producing agent solution (C-2).

[0128] <Preparation of Cured Film Forming Composition and Liquid Crystal Alignment Agent> <Example 1-1> To the A-1 (2.00 g) obtained in Preparation Example 1, C-1 (0.08 g) obtained in Preparation Example 13 and EA (0.54 g) as a diluent were added, and the mixture was stirred for 1 minute to obtain the cured film forming composition (AL-1). (AL-1) was used as is as a liquid crystal alignment agent.

[0129] <Examples 1-2 to 1-12, Comparative Example 1-1> Using the components of the types and proportions shown in Table 2 below, except as otherwise described in Examples 1-1, curing film forming compositions (AL-2) to (AL-12) and (BL-1) were prepared. (AL-2) to (AL-12) and (BL-1) were used as liquid crystal alignment agents. <Preparation of Polymerizable Liquid Crystal Solution for Horizontal Orientation> Paliocolor LC-242 (manufactured by BASF Japan Co., Ltd.) (19.3 g) as a polymerizable liquid crystal for horizontal orientation, Omnirad 907 (manufactured by IGM Resins BV) (0.6 g) as a photoradical initiator, and BYK-361N (manufactured by BYK Chemie Japan Co., Ltd.) (0.1 g) as a leveling agent were added. CPN (80 g) was further added as a solvent. The mixture was stirred for 2 hours and visually confirmed to be dissolved to obtain a 20% by mass polymerizable liquid crystal solution (LC-1).

[0130] <Formation of Liquid Crystal Alignment Films and Fabrication of Phase Retardation Films> <Example 2-1> The liquid crystal alignment agent (AL-1) obtained in Example 1-1 was applied to the TAC film, which served as the substrate, using a bar coater to achieve a wet film thickness of 4 μm. The film was then heated and dried at 120°C for 2 minutes in a hot air circulating oven to form a cured film. Next, the film was heated at 20 mJ / cm². 2 The surface of the cured film was vertically irradiated with linearly polarized light at a wavelength of 313 nm, forming a liquid crystal alignment film. A horizontally aligned polymerizable liquid crystal solution LC-1 was then applied to the liquid crystal alignment film using a rod coater to a wet film thickness of 8 μm. Following this, the film was dried in an oven at 100°C for 2 minutes, and then further dried under a nitrogen atmosphere at 500 mJ / cm². 2 The exposure amount is perpendicularly irradiated with unpolarized light of wavelength 365nm, thereby solidifying the polymeric liquid crystal to produce a phase retardation film.

[0131] <Examples 2-2 to 2-12, Comparative Example 2-1> Phase retardation films were fabricated using (AL-2) to (AL-12) and (BL-1) as liquid crystal alignment agents through the same operation as in Example 2-1.

[0132] The phase difference films fabricated above were evaluated using the following methods. The evaluation results are shown in Table 3.

[0133] [Evaluation of Orientation] The phase retardation film on the fabricated substrate is clamped between a pair of polarizing plates, and its phase retardation characteristics are observed visually under an orthogonal Nicol prism. When the phase retardation film exhibits a phase retardation, the angle of light non-transmission is set to 0°, and the film is rotated 45° to allow uniform light transmission. If defects caused by liquid crystal alignment disorder exist, light transmission defects will occur. Phase retardation films exhibiting phase retardation without defects are designated as "Excellent," those exhibiting phase retardation but with defects are designated as "Good," and those not exhibiting phase retardation are designated as "Poor," and these are recorded in the "Orientation" column.

[0134] [Evaluation of fit] The surface of the fabricated phase retardation film (the surface on which the polymeric liquid crystal layer is formed) is slit into a grid (1mm × 1mm × 100 grids) using a cutting tool. Then, transparent tape (Cellotape, manufactured by NICHIBAN, a registered trademark, 24mm wide) is applied. Next, when peeling off the transparent tape, the number of grids remaining on the underlying cured film and the even lower film substrate after the polymeric liquid crystal layer has not been peeled off is counted. All remaining grids are marked as "Excellent," partial peeling as "Good," and complete peeling as "Poor," and recorded in the "Adhesion" column. According to the results in Table 3, the phase retardation films obtained from the curing film forming compositions containing components (A), (B), (D), and (C) of the present invention all exhibit good liquid crystal orientation and good adhesion.

[0135] In contrast, liquid crystal orientation and adhesion cannot be adequately obtained in curing film forming compositions that do not contain components (A), (B), (D), or (C) of the present invention.

[0136] Industrial availability The film on which the cured film of the present invention is formed is very useful as a liquid crystal alignment member for liquid crystal display elements and as an alignment member for forming optical anisotropic films disposed inside or outside liquid crystal display elements. It is particularly suitable as a forming material for patterned phase retardation elements in 3D displays. Furthermore, it is also suitable as a material for forming cured films such as protective films, planarization films, and insulating films in various displays such as thin-film transistor (TFT) type liquid crystal display elements and organic EL elements, especially as a material for forming interlayer insulating films of TFT type liquid crystal elements, protective films of color filters, or insulating films of organic EL elements.

Claims

1. A curing film forming composition comprising: Component A: The compound represented by formula (a) below; Component B: A polymer containing epoxy groups; Component C: Thermal acid-producing agent; and Component D: Compounds containing free radical polymerizable groups including C=C double bonds and nucleophilic groups. In equation (a), A 1 and A 2 Each can independently represent a hydrogen atom, a methyl group, or a cyano group. Q 1 This refers to a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, an alkylamino group having 1 to 6 carbon atoms, a di(alkyl)amino group having 1 to 6 carbon atoms, an OH group, an NH2 group, a carboxyl group, a trialkoxysilyl group, a cyano group, a nitro group, or a group represented by the following formula (c-1). Q 2 This indicates a single bond or an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. Q 3 This represents a single bond, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, or -CO-, where... In Q 2 In the case of a single key, Q 3 It is also a single key. Q 4 This indicates a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent fused-ring group. Q 5 This indicates a single bond, an oxygen atom, -COO-, or -OCO-. q1 is an integer between 0 and 3. q2 is either 0 or 1. Q 6 Indicates a single bond, an oxygen atom, or a sulfur atom. Q 7 This indicates a single bond, an alkylene group having 1 to 20 carbon atoms, a divalent aromatic cyclic group, or a divalent aliphatic cyclic group. Here, the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. In Q... 6 In the case of a single key, Q 7 It is a single key. Q 8 This indicates OH group, NH2 group, hydroxyphenoxy, carboxyphenoxy, aminophenoxy, aminocarbonylphenoxy, phenylamino, hydroxyphenylamino, carboxyphenylamino, aminophenylamino, hydroxyalkylamino, bis(hydroxyalkyl)amino, alkoxysilyl, cyanophenylamino, alkoxy with 1 to 12 carbon atoms, haloalkoxy with 1 to 12 carbon atoms, cycloalkoxy with 3 to 12 carbon atoms, phenoxy, or biphenyloxy. Among them, in Q 2 Q 3 Q 6 And Q 7 All are single bonds, q1 is 0, Q 8 In the case of an OH group, Q 1 This refers to groups other than hydrogen atoms as defined above. In equation (c-1), the dashed line represents the intersection with Q. 2 The bond of R 101 It is an alkylene group having 1 to 30 carbon atoms, wherein one or more hydrogen atoms of the alkylene group are optionally replaced by fluorine atoms or organic groups, and R 101 The -CH2CH2- group is optionally replaced with -CH=CH-, and, provided that any of the groups listed below are not adjacent, the alkylene group is optionally interrupted by a group selected from the group consisting of -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, and -CO-, M 1 It can be a hydrogen atom or a methyl group.

2. The curing film forming composition according to claim 1, wherein, q2 is 0.

3. The curing film forming composition according to claim 1, wherein, The epoxy-containing polymer, which is component B, is a homopolymer of an epoxy-containing polymeric unsaturated compound, or a copolymer of an epoxy-containing polymeric unsaturated compound with other polymeric unsaturated compounds.

4. The curing film forming composition according to claim 1, wherein, The thermal acid-producing agent for component C is sulfite.

5. The curing film forming composition according to claim 1, wherein, The nucleophilic group of the compound that is component D is selected from carboxyl, epoxy, oxetyl, hydroxyl, amino, vinyl ether, and isocyanate groups.

6. An orientation member obtained using a curing film forming composition as described in any one of claims 1 to 5.

7. A phase difference element formed using a cured film obtained from a cured film forming composition as described in any one of claims 1 to 5.

8. A compound represented by the following formula (a), In equation (a), A 1 and A 2 Each can independently represent a hydrogen atom, a methyl group, or a cyano group. Q 1 This refers to a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 8 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, an alkylamino group having 1 to 6 carbon atoms, a di(alkyl)amino group having 1 to 6 carbon atoms, an OH group, an NH2 group, a carboxyl group, a trialkoxysilyl group, a cyano group, a nitro group, or a group represented by the following formula (c-1). Q 2 This indicates a single bond or an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. Q 3 This represents a single bond, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, or -CO-, where... In Q 2 In the case of a single key, Q 3 It is also a single key. Q 4 This indicates a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent fused-ring group. Q 5 This indicates a single bond, an oxygen atom, -COO-, or -OCO-. q1 is an integer between 0 and 3. q2 is either 0 or 1. Q 6 Represents oxygen or sulfur atoms. Q 7 This refers to an alkylene group having 1 to 20 carbon atoms, wherein the alkylene group having 1 to 20 carbon atoms is optionally branched or linear. Q 8 The alkoxy group represents alkoxy groups with 1 to 12 carbon atoms. In Q 2 Q 3 Q 6 And Q 7 All are single bonds, q1 is 0, Q 8 In the case of an OH group, Q 1 This refers to groups other than hydrogen atoms as defined above. In equation (c-1), the dashed line represents the intersection with Q. 2 The bond of R 101 It is an alkylene group having 1 to 30 carbon atoms, wherein one or more hydrogen atoms of the alkylene group are optionally replaced by fluorine atoms or organic groups, and R 101 The -CH2CH2- group is optionally replaced with -CH=CH-, and, provided that any of the groups listed below are not adjacent, the alkylene group is optionally interrupted by a group selected from the group consisting of -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH-, and -CO-, M 1 It can be a hydrogen atom or a methyl group.

9. A compound represented by the following formula, 。

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