Carrier for measuring photomask pattern and carrier assembly
By designing a stage with multiple sets of bayonets and scale lines, the inaccuracy of measurement caused by the inclination of the photomask pattern line and the difference in lens curvature is solved, and the rapid and accurate adjustment of the photomask orientation and measurement results are achieved. stability.
Patent Information
- Application Number
- CN202420918686.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-29
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2034-04-29
AI Technical Summary
When existing optical measurement microscopes measure the line width of the photomask pattern, the lines in the photomask pattern may be tilted, resulting in inconvenient operation and low measurement accuracy. Moreover, due to the difference in lens curvature, the accuracy of measurement results cannot be guaranteed. , lack of a stage for fast and precise adjustment of the photomask orientation.
Design a stage, including positioning holes and central holes, the positioning holes are circular holes, and the side wall structure has multiple sets of bayonets, and the bayonets are distributed in the circumferential direction, allowing the vehicle to adjust at different angles and constrained positions, through the scale line and The angle mark quickly finds the bayonet to avoid clamping errors, and prevents clamping through the arc bayonet and clamping needle to achieve accurate adjustment of the vehicle.
It realizes rapid and precise adjustment of the photomask orientation, improves measurement accuracy and accuracy, ensures the position stability of the photomask during the measurement process, and avoids inconsistency in the measurement results.
Smart Images
Figure CN222213194U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of photomasks, in particular to a carrier and a carrier assembly for measuring photomask patterns. Background Art
[0002] The photomask (or photomask) is the carrier of the designed graphics in the semiconductor chip lithography process. In practice, accurately measuring the line width of the graphics on the photomask is also an important part of the semiconductor manufacturing process. The line width is a key parameter in the manufacturing of semiconductor devices, which directly determines the performance and characteristics of the final product. By measuring the line width on the photomask, manufacturers can ensure the accurate replication of the graphics during the lithography process, thereby controlling the quality and performance of the product, which is conducive to the manufacture of high-performance and high-precision semiconductor devices. At the same time, lithography machines and other related equipment need to be calibrated regularly during the manufacturing process to ensure their accuracy and stability. Measuring the line width on the photomask can serve as an important reference for equipment calibration. By comparing the actual line width with the expected line width, manufacturers can adjust equipment parameters, optimize process conditions, and improve production efficiency and product quality. In addition, manufacturers can also perform quality control and monitoring, process improvement and optimization based on the measured line width.
[0003] In the prior art, an optical measuring microscope is usually used to complete the line width measurement work. The existing optical measuring microscope is usually equipped with an optical measuring system and a stage. The optical measuring system includes a lens arranged above the stage. The lens of the lens is usually a curved surface. During actual measurement, the photomask is usually placed on a carrier, and the carrier is placed on the stage so that the lens faces the photomask on the carrier. During measurement, the optical measuring system can present a measurement frame with a measurement graphic on the microscope screen. The graphic within the measurement frame is called the measurement graphic. When in use, the operator can manually circle a rectangular area as the area of interest through the optical measuring system to measure the line width. Due to the diversity of photomasks, in actual measurement, the lines in the photomask pattern may be inclined to the measurement frame. At this time, it is not only inconvenient for the operator to circle the area of interest, but also because the curvature of the lens of the optical measurement system along different directions is different, the curvature difference will lead to imaging differences, which will not only greatly reduce the measurement accuracy, but also cause the measurement results of graphics with the same line width to be different at different angles, so that the accuracy of the measurement results cannot be judged. Therefore, in order to improve the measurement accuracy and improve the measurement accuracy, the orientation of the photomask can be adjusted before measurement so as to adjust the lines in the photomask pattern to a preset orientation. However, the existing technology lacks a stage that can quickly and accurately adjust the orientation of the photomask, which needs to be solved urgently. Utility Model Content
[0004] The first aspect of the utility model aims to solve the above technical problems and provide a stage that can conveniently, quickly and accurately adjust the position of the photomask, which can accurately measure the line width and ensure the consistency of the measurement results. The main concept is:
[0005] A stage for measuring a photomask pattern, the stage is constructed with a support portion for supporting a carrier, a positioning portion for adjusting the orientation of the photomask, and a center hole for the measurement light to pass through, the positioning portion includes a positioning hole constructed on the upper surface of the stage, the positioning hole is constructed as a circular hole, the side wall of the positioning hole is constructed with at least two groups of bayonet, each group of bayonet includes four bayonet for adapting to four corners of the carrier, each bayonet is distributed along the circumferential direction of the positioning hole, the center hole is connected with the positioning hole, and the center hole passes through the lower surface of the stage. In this scheme, by constructing the positioning hole on the stage, and constructing the positioning hole as a circular hole, so that each group of bayonet is constructed along the circumferential direction, the orientation of the carrier can be adjusted with the central axis of the circular hole as the center. By constructing the center hole, the positioning hole is constructed on the upper surface of the stage, the center hole passes through the lower surface of the stage, and the center hole is connected with the positioning hole, so that the measurement light can smoothly pass through the center hole and pass through the mask plate placed in the positioning hole, so as to effectively measure the line width. At least two groups of bayonet holes are constructed on the side walls of the positioning hole, each group of bayonet holes includes four bayonet holes adapted to the four corners of the carrier, and each bayonet hole is distributed along the circumferential direction of the positioning hole, so that at least two restraining positions for restraining the carrier can be formed on the carrier, and the orientation of each restraining position is different, so that the carrier placed at each restraining position has a different orientation. When in use, it is only necessary to snap the carrier into the restraining position of the corresponding orientation, so that the orientation of the carrier can be adjusted conveniently, quickly and accurately, and the photomask is placed on the carrier, and the relative position of the photomask and the carrier remains unchanged, so that the purpose of effectively adjusting the orientation of the photomask can be achieved by changing the orientation of the carrier, so that when measuring the line width, the staff can use the carrier to accurately adjust the orientation of the photomask so as to adjust the lines in the photomask pattern to the preset orientation, and can effectively restrain the carrier to prevent the position of the carrier and the photomask from changing during the measurement process.
[0006] In order to solve the problem of improving adjustment accuracy and versatility, preferably, the side wall of the positioning hole is constructed with 90 groups of bayonet holes, and 360 bayonet holes in the 90 groups of bayonet holes are evenly distributed along the circumferential direction of the positioning hole, and the angle between two adjacent bayonet holes is 1 degree. Thus, 90 constraint positions can be formed on the carrier, and the orientations of the 90 constraint positions are different, which can meet the adjustment requirements of different angles and effectively improve versatility; when in use, the staff can adjust the orientation of the carrier along the circumferential direction with 1 degree as the minimum division, and the staff only needs to clip the carrier into the bayonet hole of the corresponding orientation, which is very accurate, convenient and efficient.
[0007] Preferably, the inner surface of the bayonet is configured as a curved surface, which is convenient for processing, positioning and restraining the carrier, and is also conducive to smoother insertion and removal of the carrier from the bayonet, making it more convenient to use.
[0008] Preferably, the center hole is constructed below the positioning hole, the center hole is coaxial with the positioning hole, the diameter of the center hole is smaller than the diameter of the positioning hole, and the step between the center hole and the positioning hole forms the support portion. This is convenient for processing and forming, and can form an annular support portion to stably and reliably support the carrier at any angle.
[0009] The second aspect of the utility model is to solve the problem of ease of use. Further, the upper surface of the carrier is also constructed with scale lines, which are arranged along the radial direction of the positioning hole. One end of each scale line corresponds to each bayonet, and at least the other end of some scale lines is also constructed with an angle mark. When in use, the user can find the required bayonet more quickly and efficiently through the scale lines and angle marks, which is not only more convenient to use, but also helps to accurately and efficiently complete the card control work of the carrier.
[0010] Furthermore, the scale line at 45 degrees in the upper right corner is used as the 0 degree angle mark, and the remaining angle marks are compiled in a counterclockwise direction. This is more convenient to use and is conducive to quick adjustment.
[0011] Furthermore, the scale lines corresponding to 0 degrees, 90 degrees, 180 degrees and 270 degrees are longer than the scale lines at other positions, making the scale lines at these four positions more eye-catching and more convenient for staff to use.
[0012] To solve the problem of card control errors, two adjacent scale lines are further configured with different color identification marks, so that users can quickly distinguish two adjacent card ports by color, thereby effectively preventing operators from making card control errors during the placement of the carrier, and effectively improving accuracy.
[0013] A carrier assembly comprises a carrier for placing a photomask and a carrier, wherein the carrier can be detachably placed on the carrier, so that the orientation of the photomask can be adjusted and the adjusted photomask can be constrained through the cooperation between the carrier and the carrier.
[0014] Preferably, the carrier is constructed with a holding platform adapted to the photomask and a hollow channel, the photomask is constrained on the holding platform and corresponds to the hollow channel, so that the photomask can be constrained by the carrier.
[0015] The fourth aspect of the utility model is to solve the problem of preventing the occurrence of jamming. Further, the four corners of the carrier are respectively configured with outwardly protruding clamping pins, the inner surface of the clamping port is configured as an arc surface, and the outer surface of the clamping pin is configured as an arc surface adapted to the clamping port. In actual use, the carrier can be constrained by the cooperation of the arc surfaces, and the carrier can be guided to be inserted or removed by the cooperation of the arc surfaces, so that the process of inserting and removing the carrier is smoother, and the occurrence of jamming can be effectively prevented.
[0016] Preferably, the carrier is a square structure, the side length of the carrier is 6 inches, the diameter of the clamping pin is 2.5 mm, and the diameter of the clamping port is 2.8 mm, so that the processed carrier and the carrier can form a match that is conducive to improving the measurement accuracy.
[0017] Compared with the prior art, the use of the carrier provided by the utility model for measuring photomask patterns only requires the carrier to be snapped into the constraint position of the corresponding orientation, so that the orientation of the carrier can be adjusted conveniently, quickly and accurately. The photomask is placed on the carrier, and the relative position of the photomask and the carrier remains unchanged, so that the orientation of the photomask can be effectively adjusted by changing the orientation of the carrier. When measuring the line width, the staff can use the carrier to accurately adjust the orientation of the photomask so as to adjust the lines in the photomask pattern to the preset orientation, and can effectively constrain the carrier to prevent the position of the carrier and the photomask from changing during the measurement process. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] In order to more clearly illustrate the technical solutions of the embodiments of the utility model, the drawings required for use in the embodiments will be briefly introduced below. It should be understood that the following drawings only show certain embodiments of the utility model and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying creative work.
[0019] Figure 1 A schematic structural diagram of a carrier provided in Example 1 of the utility model.
[0020] Figure 2 This is a schematic structural diagram of a carrier provided in Example 1 of the utility model.
[0021] Figure 3 for Figure 2 A local enlarged schematic diagram of point I in the middle.
[0022] Figure 4 for Figure 2 Top view of the .
[0023] Figure 5 for Figure 4 A local enlarged schematic diagram of point II in the middle.
[0024] Figure 6 This is a front view of the photomask provided in Example 1 of the utility model after being placed on a carrier.
[0025] Figure 7 for Figure 6 A local enlarged schematic diagram of point III in the middle.
[0026] Figure 8 This is a schematic diagram of the structure of a carrier provided in Example 1 of the utility model after being placed on a carrier, without showing angle markings.
[0027] Fig. 9 Schematic diagram of measuring the line width of a photomask using an optical measurement microscope.
[0028] Fig.10 for Fig. 9 Schematic diagram at AA in the middle, where the measuring direction is the vertical direction (Y direction), and the length direction of the lines in the photomask pattern is exactly consistent with the measuring direction.
[0029] Fig.11 for Fig.10 A local enlarged schematic diagram of point IV in the middle.
[0030] Fig.12 This is a top view of another photomask when measuring, wherein the measuring direction is the vertical direction (Y direction), but the angle between the length direction of the lines in the photomask pattern and the vertical direction (Y direction) is 63 degrees.
[0031] Fig.13 To adjust Fig.12 A top view of the oriented photomask, wherein the measurement direction is the vertical direction (Y direction), and the length direction of the lines in the photomask pattern is consistent with the measurement direction.
[0032] Fig.14 A partial cross-sectional view of a carrier provided in Example 2 of the utility model.
[0033] Markings in the figure are as follows: stage 11, lens 12, area of interest 13; carrier 2, hollow channel 21, holding platform 22, clamping pin 23, arc surface 24; photomask 3; stage 4, positioning hole 41, center hole 42, support portion 43, bayonet 44, base circle 45, scale line 46, marking line 47, distinguishing mark 48. DETAILED DESCRIPTION
[0034] The technical scheme in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is only a part of the embodiment of the utility model, rather than all the embodiments. The components of the embodiment of the utility model generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiment of the utility model provided in the drawings is not intended to limit the scope of the utility model claimed for protection, but merely represents the selected embodiment of the utility model. Based on the embodiment of the utility model, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the utility model.
[0035] Example 1
[0036] This embodiment provides a carrier assembly for measuring a photomask pattern, comprising a carrier for placing a photomask and the carrier, wherein:
[0037] The photomask 3 (or photomask) is usually placed on the carrier 2, which supports the photomask 3 and can be transferred by transferring the carrier 2. In practice, the carrier 2 can be preferably constructed as a square structure, such as Figure 1 As shown, the carrier 2 includes four corners. The carrier 2 is configured with a holding platform 22 adapted to the photomask 3 and a hollow channel 21. When in use, the photomask 3 can be constrained by the holding platform 22 and corresponds to the hollow channel 21. The hollow channel 21 runs through the upper and lower ends of the carrier 2. The holding platform 22 can constrain and support the photomask 3. For ease of explanation, in this embodiment, the photomask 3 is a six-inch photomask 3, and the carrier 2 is a carrier 2 adapted to the six-inch photomask 3. The carrier 2 can use an existing general carrier 2, such as Figure 1 As shown, the length and width of the carrier 2 are both nine inches, and the hollow channel 21 is set in the middle of the carrier 2, so that the photomask 3 can be placed in the middle of the carrier 2, and the distance between the side of the photomask 3 and the side of the carrier 2 is 1.5 inches. In practice, the shape of the hollow channel 21 can be determined according to actual needs, as long as it allows the measurement light to pass smoothly.
[0038] In this embodiment, the carrier 2 can be detachably placed on the stage 4, so that the stage 4 can be reused, which is conducive to improving versatility. In implementation, the stage 4 has multiple implementations. As an example, the stage 4 is configured with a support portion 43 for supporting the carrier 2, a positioning portion for adjusting the orientation of the photomask 3, and a center hole 42 for allowing the measurement light to pass through, wherein the positioning portion includes a positioning hole 41 configured on the upper surface of the stage 4, and the positioning hole 41 is preferably configured as a circular hole, such as Figure 2 and Figure 4As shown, the center hole 42 is connected to the positioning hole 41, and the center hole 42 passes through the lower surface of the stage 4, so that the measuring light can pass through the center hole 42 smoothly and can pass through the mask plate placed in the positioning hole 41, so as to effectively measure the line width.
[0039] In the present embodiment, the side wall of the positioning hole 41 is constructed with at least two groups of bayonet holes, each group of bayonet holes includes four bayonet holes 44 adapted to the four corners of the carrier 2, and each bayonet hole 44 is distributed along the circumferential direction of the positioning hole 41, so that at least two restraining positions for restraining the carrier 2 can be formed on the carrier 4, and the orientation of each restraining position is different, so that the carrier 2 placed at each restraining position has a different orientation. When in use, it is only necessary to snap the carrier 2 into the restraining position of the corresponding orientation, so that the orientation of the carrier 2 can be adjusted conveniently, quickly and accurately, and the photomask 3 is placed on the carrier 2, and the relative position of the photomask 3 and the carrier 2 remains unchanged, so that the orientation of the photomask 3 can be effectively adjusted by changing the orientation of the carrier 2, so that when measuring the line width, the staff can use the present carrier 4 to accurately adjust the orientation of the photomask 3, so as to adjust the lines in the photomask pattern to the preset orientation, and can effectively restrain the carrier 2 to prevent the carrier 2 and the photomask 3 from changing their positions during the measurement process.
[0040] In practice, the number of bayonet groups can be determined according to actual needs. However, in practice, the more bayonet groups there are, the more positions that can be adjusted. However, when the number of bayonet groups is more, the manufacturing difficulty and manufacturing cost will be greatly increased. In order to improve the adjustment accuracy and versatility while controlling the cost as much as possible, in a preferred embodiment, the side wall of the positioning hole 41 is constructed with 90 bayonet groups, and the 360 bayonet groups 44 in the 90 bayonet groups are evenly distributed along the circumferential direction of the positioning hole 41, such as Figure 2 and Figure 4 As shown, the angle between two adjacent bayonet holes 44 is 1 degree, so that 90 restraint positions can be formed on the carrier 2, and the orientations of the 90 restraint positions are different, which can meet the adjustment requirements of different angles and effectively improve the versatility; when in use, the staff can adjust the orientation of the carrier 2 along the circumferential direction with 1 degree as the minimum division, and the staff only needs to snap the carrier 2 into the bayonet of the corresponding orientation, which is very accurate, convenient and efficient.
[0041] Of course, in practice, the number of groups of bayonet ports 44 may also be configured to other numbers, such as 80 groups of bayonet ports, 85 groups of bayonet ports, 95 groups of bayonet ports, etc., which will not be explained one by one here.
[0042] In implementation, the positioning hole 41 can be machined into the carrier 4 along the upper surface of the carrier 4, and at the same time, the center hole 42 can be machined into the carrier 4 along the lower surface of the carrier 4. The center hole 42 can be a square hole, a round hole, etc. In the embodiment, the center hole 42 is preferably a round hole, such as Figure 4As shown. The diameter of the center hole 42 can be larger than the diameter of the positioning hole 41, or can be equal to the diameter of the positioning hole 41, or can be smaller than the diameter of the positioning hole 41. In implementation, the support portion 43 can be disposed below the positioning hole 41 to support the carrier 2. The support portion 43 has a variety of implementations. For example, the support portion 43 can be at least three protrusions disposed below the positioning hole 41, so that the protrusions can be used to support the carrier 2 together. In this embodiment, the center hole 42 is constructed below the positioning hole 41, and the center hole 42 is coaxial with the positioning hole 41. The diameter of the center hole 42 is smaller than the diameter of the positioning hole 41, as shown in FIG. Figure 2-Figure 4 As shown, the step between the center hole 42 and the positioning hole 41 forms the support portion 43, which is convenient for processing and forming, and can also form a ring-shaped support portion 43, such as Figure 2 As shown, in order to stably and reliably support the carrier 2 at any angle.
[0043] For ease of use, during implementation, the upper surface of the carrier 4 is also configured with scale lines 46, which are arranged along the radial direction of the positioning hole 41, such as Figure 2-Figure 4 As shown, one end of each scale line 46 corresponds to each bayonet 44, and the other end of at least some of the scale lines 46 is also configured with an angle mark, such as Fig.10 As shown, when in use, the user can find the desired bayonet 44 more quickly and efficiently through the scale line 46 and the angle mark, which is not only more convenient to use, but also helps to accurately and efficiently complete the card control work of the carrier 2. In implementation, the angle mark can preferably use angle numbers, and the scale line at 45 degrees in the upper right corner of the plane rectangular coordinate system can be used as the 0 degree angle mark, and the 0 degree angle mark is used as the starting point to compile the remaining angle marks in the counterclockwise direction, such as Fig.10 As shown, it is more convenient to use and is conducive to quick adjustment. Accordingly, the corner (such as the upper right corner) of the carrier 2 can be used as the zero point, and the angle can be adjusted in a reverse rotation manner; it is more convenient to use.
[0044] In a further embodiment, the scale lines 46 corresponding to 0 degrees, 90 degrees, 180 degrees and 270 degrees are longer than the scale lines 46 at other positions, such as Fig.10 As shown, the scale lines at these four positions are more eye-catching, making it easier for staff to quickly locate and use them.
[0045] In implementation, the shape of the bayonet 44 can be adapted to the shape of the corner of the carrier 2, so that the bayonet 44 has a variety of implementations. For example, the inner surface of the bayonet 44 can be configured as an arc surface, especially a circular arc surface, which is not only easy to process, but also easy to position and constrain the carrier 2, and also helps the carrier 2 to be more smoothly inserted into the bayonet 44 and removed from the bayonet 44, making it more convenient to use. Based on this, in a preferred embodiment, the four corners of the carrier 2 are respectively configured with outwardly protruding card pins 23, such as Figure 6 and Figure 7 As shown, accordingly, the inner surface of the bayonet 44 is configured as an arc surface 24, as shown in FIG. Figure 7 As shown, the outer surface of the locking pin 23 is configured as an arc surface 24 that matches the bayonet 44, so that in actual use, the carrier 2 can be constrained by the cooperation of the arc surface 24 and the arc surface 24, and the carrier 2 can be guided to be inserted or removed by the cooperation of the arc surface 24 and the arc surface 24, so that the process of inserting and removing the carrier 2 is smoother, and the jamming situation can be effectively prevented. As an example, in this embodiment, the outer surface of the locking pin 23 can be preferentially configured as a semi-circular arc surface 24, and accordingly, the inner surface of the bayonet 44 can also be preferentially configured as a semi-circular arc surface 24, such as Figure 2 and Figure 3 as shown to achieve a better fit.
[0046] During implementation, in order to make the carrier 2 and the carrier 4 form a better fit without jamming or getting stuck, it is necessary to reasonably design the size of the bayonet and the pin. This embodiment also provides a design method, including: (1) establishing a calculation model of the positioning hole 41, in which the number of bayonet 44 is n, n=360, and each bayonet 44 is evenly distributed along the circumferential direction, the angle between each adjacent bayonet 44 is 1 degree, the inner surface of the bayonet 44 is an arc surface 24, the diameter of the base circle 45 of the positioning hole 41 is R and the diameter of the bayonet 44 is D1, and the center of each bayonet 44 is located on the base circle 45. Therefore, the base circle 45 is the circle where the center of each bayonet 44 is located, such as Figure 5 As shown by the dashed line, in the calculation model, the four corners of the carrier 2 are respectively configured with outwardly protruding pins 23, the outer surface of the pin 23 is an arc surface 24, and the line c connecting two adjacent side edges of the carrier 2 is the diameter of the pin 23, and its length is D2, as shown in FIG. Figure 7 As shown by the middle dotted line, the reverse extension lines of two adjacent side edges of the carrier 2 intersect at the middle position of the arc surface 24. Figure 7 As shown by the dashed line, at this time, the diagonal length of the carrier 2 is equal to the distance between the midpoints of the two arc surfaces 24 on the carrier 2, wherein,
[0047]
[0048]
[0049] Among them, the two side lengths of the carrier 2 are a and b respectively, with the unit of mm; △L is a correction value with the unit of mm; in a preferred embodiment, △L ≤ D1. For example, during implementation, △L can preferably adopt a value ranging from 0.5 mm to 3 mm.
[0050] (2) Calculate R and D1 according to the calculation model, and calculate the diameter D2 of the card pin 23 according to the D1, where D2 < D1. During implementation, D2 = D1 - k, where k can preferably adopt a value ranging from 0.2 mm to 1 mm.
[0051] As an example, in this embodiment, the photomask 3 is 6 inches, and the carrier 2 is a 9-inch square structure. Let △L = 1 mm and k = 0.3 mm. According to the calculation model, R = 321.5 mm and D1 = 2.8 mm can be calculated to facilitate the machining of the positioning hole 41. At the same time, D2 = 2.5 mm can be calculated, so that the card pin 23 of the carrier 2 can be machined smoothly, as Fig.10 and Fig.11 shown. The processed carrier 2 and the carrier stage 4 can just form a matching that is beneficial to improving the measurement accuracy, and there is no problem of jamming.
[0052] During implementation, the shape of the carrier stage 4 can be determined according to actual needs. As an example, the carrier stage 4 can adopt a square structure, a circular structure, etc. For example, in this embodiment, the carrier stage 4 adopts a square structure, as Figure 8 shown.
[0053] When using this carrier component to measure the line width in the photomask pattern, an optical measurement microscope can be used. The configuration of the optical measurement microscope includes a stage 11 and an optical measurement system. The optical measurement system includes a lens 12 disposed above the stage 11. During use, the carrier stage 4 can be placed upright on the upper surface of the stage 11 and made to correspond to the lens 12.
[0054] Then, the vertical direction (Y direction) or the horizontal direction (X direction) can be used as the measurement direction. As an example, in this embodiment, the vertical direction is used as the measurement direction.
[0055] Then place the photomask 3 on the carrier 2, and calculate the angle between the length direction of the line in the photomask pattern and the measurement direction.
[0056] Finally, according to this angle, find the corresponding bayonet at the corresponding position on the carrier, and insert the carrier 2 carrying the photomask 3 into the corresponding bayonet 44. At this time, the length direction of the line in the photomask pattern is exactly the same as the measurement direction. For example, as Fig.10As shown in FIG. 1 , the length direction of the lines in the photomask pattern is exactly consistent with the measurement direction, so the four corners of the carrier can be respectively inserted into the corresponding slots of 0 degrees, 90 degrees, 180 degrees and 270 degrees. Fig.12 As shown in FIG. 1 , the angle between the length direction of the lines in the photomask pattern and the vertical direction is 63 degrees. Therefore, the four corners of the carrier are respectively inserted into the corresponding slots of 63 degrees, 153 degrees, 243 degrees and 333 degrees, as shown in FIG. Fig.13 As shown. After adjusting the angle in this way, on the one hand, it can ensure that the sides of the measurement frame are relatively parallel to the sides of the region of interest 13, and it can ensure that the length direction of the line width in the measurement pattern is parallel to one of the sides of the region of interest 13, which is not only more convenient for measuring the line width, but also conducive to obtaining more accurate measurement data by image recognition; on the other hand, it can ensure that each photomask 3 is measured at the same measurement orientation during each measurement process, and the position of the lens 12 does not change at all, so that the orientation of the lens 12 is the same during each measurement process, and the length direction of the line width in the measurement pattern is also the same, so that the problem of inaccurate and inaccurate measurement caused by the curvature difference of the lens in the optical measurement system in different directions can be effectively solved, which can not only effectively improve the measurement precision, but also effectively improve the accuracy of the measurement, making the measurement result more reliable.
[0057] Example 2
[0058] In order to solve the problem of card control errors, the main difference between this embodiment 2 and the above-mentioned embodiment 1 is that in the carrier 4 provided in this embodiment, two adjacent scale lines 46 are configured with distinguishing marks 48 of different colors, so that the user can quickly distinguish two adjacent card ports 44 by color, thereby effectively preventing the operator from making card control errors during the placement of the carrier 2, and effectively improving accuracy.
[0059] In practice, the scale line 46 may be a groove 55 constructed on the upper surface of the carrier 4, such as Figure 3 As shown. In implementation, the inner surface of the groove 55 can be coated with a layer of colored paint as a distinguishing mark 48, and the colors of the paint in two adjacent grooves 55 are different. For example, the color of the paint in a groove 55 can be red, and the colors of the paint in the two adjacent grooves 55 can be green. In implementation, the groove 55 can be filled with colored glue as a distinguishing mark 48, and the upper surface of the glue can be flush with the upper surface of the carrier 4, as shown. Fig.14 As shown, each groove 55 is filled with red glue and green glue respectively to form a distinguishing mark 48.
[0060] The above description is only a specific implementation of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention.
Claims
1. A stage for measuring a photomask pattern, characterized in that: The stage is structured with a supporting portion for supporting a carrier, a positioning portion for adjusting the orientation of a photomask, and a center hole for passing measurement light. The positioning portion includes a positioning hole constructed on the upper surface of the stage, and the positioning hole is constructed as a circular hole. The side walls of the positioning hole are constructed with at least two groups of bayonet holes, each group of bayonet holes includes four bayonet holes adapted to four corners of the carrier, and each bayonet hole is distributed along the circumferential direction of the positioning hole. The center hole is connected to the positioning holes, and the center hole passes through the lower surface of the stage.
2. The stage for measuring photomask patterns according to claim 1, characterized in that: The side wall of the positioning hole is constructed with 90 groups of bayonet holes, 360 bayonet holes in the 90 groups of bayonet holes are evenly distributed along the circumferential direction of the positioning hole, and the angle between two adjacent bayonet holes is 1 degree.
3. The stage for measuring photomask patterns according to claim 1, characterized in that: The inner surface of the bayonet is configured as a curved surface.
4. The stage for measuring photomask patterns according to claim 1, characterized in that: The center hole is constructed below the positioning hole, the center hole is coaxial with the positioning hole, the diameter of the center hole is smaller than the diameter of the positioning hole, and the step between the center hole and the positioning hole forms the support portion; And / or, two adjacent scale lines are provided with distinguishing marks of different colors.
5. The stage for measuring photomask patterns according to claim 1, characterized in that: The upper surface of the carrier is also constructed with scale lines, which are arranged along the radial direction of the positioning hole. One end of each scale line corresponds to each bayonet, and the other end of at least some of the scale lines is also constructed with an angle mark.
6. The stage for measuring photomask patterns according to claim 5, characterized in that: The scale line at 45 degrees in the upper right corner is used as the 0 degree angle mark, and the remaining angle marks are compiled in a counterclockwise direction.
7. The stage for measuring photomask patterns according to claim 6, characterized in that: The scale lines corresponding to 0 degrees, 90 degrees, 180 degrees, and 270 degrees are longer than the scale lines at other positions.
8. A carrier assembly, characterized in that: The invention comprises a carrier for placing a photomask and a carrier as described in any one of claims 1 to 7, wherein the carrier can be detachably placed on the carrier.
9. The carrier assembly according to claim 8, characterized in that: The four corners of the carrier are respectively configured with outwardly protruding card pins, the inner surface of the card slot is configured as an arc surface, and the outer surface of the card pin is configured as an arc surface adapted to the card slot.
10. The carrier assembly according to claim 8, characterized in that: The carrier is structured with a holding platform adapted to the photomask and a hollow channel, the photomask is constrained on the holding platform and corresponds to the hollow channel.