Chemical vapor deposition furnace
By setting a cone column on the carrier tray and optimizing the support structure, the problems of flat stickers and vent holes at the bottom of the workpiece are solved, and gas distribution uniformity and product quality are improved.
Patent Information
- Application Number
- CN202323269527.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-01
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2033-12-01
AI Technical Summary
In existing chemical vapor deposition furnaces, the workpieces are placed directly on the carrier plate and can easily cause flat bottoms to be placed, resulting in blind spots and bonding problems. At the same time, the blockage of the ventilation holes affects the uniform distribution of gas, resulting in poor product quality.
Several conical columns are arranged on the carrier tray to form a rectangular array arrangement, and the workpiece is placed on the conical column to avoid surface contact and bonding, ensure uniform distribution of gas, and optimize gas mixing through the support column and the intake pipe.
Effectively reduce deposition blind spots and bonds, ensure product quality, and improve yield and product thickness uniformity.
Smart Images

Figure CN222294193U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of chemical vapor deposition, in particular to a chemical vapor deposition furnace. Background Art
[0002] In order to make the reaction gas evenly distributed in the deposition area and thus obtain a better deposition effect, the chemical vapor deposition furnace in the prior art often adopts the method of evenly opening multiple vents on the carrier plate. However, this technology has the following problems in use:
[0003] First, during the vapor deposition process, the workpiece is placed directly on the loading tray, so that the bottom of the workpiece is very likely to be flat against the surface of the loading tray, making this part of the workpiece surface unable to contact the reaction gas during the chemical deposition process, resulting in a large area of deposition blind area; at the same time, the edge of the workpiece that contacts the bottom of the loading tray will also form a line contact with the loading tray, causing the coating layer on this part of the surface to adhere to the loading tray, making unloading difficult and requiring forced disassembly, which can easily cause product scrapping and low product qualification rate, thereby increasing the production cost of the product.
[0004] Second, when the bottom of the workpiece is flat on the loading plate, some vents will be blocked, affecting the distribution of the reaction gas in the deposition area, thereby making the reaction gas unevenly distributed in the deposition area, resulting in inconsistent coating thickness on the workpiece surface, affecting product quality.
[0005] Therefore, in view of the above problems and shortcomings of the above technology, the applicant believes that it is necessary to make further technical improvements to the technical solution in order to provide a chemical vapor deposition furnace. Utility Model Content
[0006] The purpose of the utility model is to solve the above-mentioned problems and shortcomings, and to provide a chemical vapor deposition furnace, on which a plurality of conical columns are arranged in a rectangular array and spaced one by one from the air holes on a loading tray, and the workpieces to be processed are mounted on the plurality of conical columns. The workpieces will not block the air holes, so that the reaction gas can be evenly distributed in the chemical vapor deposition furnace, while effectively reducing the deposition blind area on the workpieces, and can effectively prevent the workpieces to be processed from sticking to the loading tray, thereby improving the product yield and product quality.
[0007] The technical solution of the utility model is implemented as follows: a chemical vapor deposition furnace includes a furnace body and a furnace cover covering the furnace body, a loading tray is arranged in the furnace body, and a plurality of ventilation holes are provided on the loading tray. The utility model is characterized in that a plurality of conical columns are also provided on the loading tray, and the plurality of conical columns and the plurality of ventilation holes are arranged one by one in a rectangular array.
[0008] Furthermore, a plurality of loading trays are arranged in the furnace body, a plurality of supporting bosses arranged vertically side by side are arranged on the inner wall of the furnace body, and each loading tray is placed on each supporting boss respectively.
[0009] Furthermore, the supporting boss comprises a plurality of supporting protrusions arranged in a ring array; and a plurality of paving notches corresponding to each supporting protrusion are provided at the edge of the loading tray.
[0010] Furthermore, a positioning protrusion is provided at the edge of the bottom surface of the loading tray, and the positioning protrusion is provided between the two clearance notches.
[0011] Furthermore, a plurality of handles are symmetrically provided on the edge of the surface of the loading tray.
[0012] Furthermore, it also includes a plurality of support columns, which can be detachably mounted on the conical column.
[0013] Furthermore, the conical column is composed of an integrally formed cylindrical portion and a conical body portion, the cylindrical portion is arranged on the loading plate, and the conical body portion is placed at the top end of the cylindrical portion. The bottom end of the support column is provided with a groove, and the lower and upper ends of the groove are respectively a cylindrical groove and a conical groove, and the cylindrical groove and the conical groove can be detachably mounted on the cylindrical portion and the conical body portion, respectively.
[0014] Furthermore, the height H of the support column is 1.5-3 times the height h of the cone column.
[0015] Furthermore, a plurality of air inlet pipes arranged in a circular array are provided on the lower inner wall of the furnace body, and output ends of the air inlet pipes are located below the loading tray.
[0016] Beneficial effects of the utility model:
[0017] First, a number of cone columns are arranged on the loading tray, so that the workpiece is mounted on the cone columns during use, and the contact between the workpiece and the cone columns is point contact, which can avoid surface contact or line contact between the processed workpiece and the cone columns, thereby effectively avoiding the formation of deposition blind areas and ensuring product quality. At the same time, it can also greatly reduce the amount of adhesion between the coating layer of the processed workpiece and the cone columns, so that the workpiece can be easily removed without forced disassembly, which can avoid the problem of difficult unloading and effectively reduce the defective rate of products.
[0018] Secondly, a number of cones and a number of air holes are arranged in a rectangular array one by one. The workpiece is mounted on the cones without blocking the air holes, so that the reaction gas can be evenly distributed in the deposition furnace, which can make the coating layer on the surface of the workpiece more uniform and the product quality better. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] Figure 1It is a schematic diagram of the cross-sectional structure of the utility model.
[0020] Figure 2 It is a schematic diagram of the utility model in use.
[0021] Figure 3 For this utility model Figure 1 Schematic diagram of the cross-section structure along the AA direction.
[0022] Figure 4 For this utility model Figure 1 Schematic diagram of the loading tray structure in the middle BB direction.
[0023] Figure 5 For this utility model Figure 4 Enlarged schematic diagram of part D in the middle.
[0024] Figure 6 It is a schematic diagram of the cross-sectional structure of the support column of the utility model.
[0025] Figure 7 For this utility model Figure 2 Enlarged schematic diagram of part C in the middle. DETAILED DESCRIPTION
[0026] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention is clearly and completely described below in conjunction with the accompanying drawings of the present invention.
[0027] like Figure 1 , Figure 2 , Figure 4 , Figure 5 As shown, the utility model provides a chemical vapor deposition furnace, including a furnace body 1, a furnace cover 2 covering the furnace body 1, a loading tray 3 is arranged in the furnace body 1, and a plurality of vents 31 are arranged on the loading tray 3. In order to achieve the purpose proposed by the utility model, a plurality of cone columns 32 are also arranged on the loading tray 3, and the plurality of cone columns 32 and the plurality of vents 31 are arranged in a rectangular array in a one-to-one manner. In this way, when in use, the workpiece is mounted on the cone column 32, and the vents 31 will not be blocked, so that the gas can be evenly distributed in the chemical vapor deposition furnace, which is conducive to forming a coating layer with a uniform thickness on the surface of the workpiece, thereby greatly improving the quality of the product.
[0028] like Figure 1-Figure 3As shown, a plurality of loading trays 3 are arranged in the furnace body 1. In order to stably place the loading trays 3 in the furnace body 1, a plurality of supporting bosses 11 arranged vertically side by side are arranged on the inner wall of the furnace body 1, and each loading tray 3 is placed on each supporting boss 11. In this way, multiple workpieces can be processed at one time, thereby greatly improving the utilization rate of the chemical vapor deposition furnace, and the number of loading trays 3 can be adjusted according to the size of the workpiece. When a small-volume workpiece needs to be processed, several layers of loading trays 3 can be placed; when a large-volume workpiece needs to be processed, the number of loading trays 3 can be reduced. In this way, the chemical vapor deposition furnace of the utility model can process multiple small-volume workpieces at one time, and can also process large-volume workpieces, and has high operational flexibility.
[0029] like Figure 3 , Figure 4 As shown, the support boss 11 includes a plurality of support protrusions 12 arranged in a circular array, preferably the number of the support protrusions 12 is 4; a plurality of clearance notches 34 corresponding to the support protrusions 12 are arranged at the edge of the loading tray 3, and a plurality of handles 36 are symmetrically arranged at the surface edge of the loading tray 3. In this way, when the loading tray 3 is placed in the furnace body 1, the clearance notches 34 are aligned with the protrusions 12, and the loading tray 3 can be conveniently placed in the furnace body 1 by using the handles 36. When the loading tray 3 reaches above the support protrusions 12, the loading tray 3 is rotated so that the clearance notches 34 are staggered with the support protrusions 12, and the loading tray 3 can be placed on the support protrusions 12. A positioning protrusion 37 is provided at the bottom edge of the material loading tray 3, and the positioning protrusion 37 is provided between the two clearance notches 34. Preferably, two positioning protrusions 37 are provided, and the two positioning protrusions 37 are symmetrically arranged along the center line of the material loading tray 3, so that the material loading tray 3 can be prevented from rotating too much, so that the clearance notches 34 and the supporting protrusions 12 overlap again, so the positioning protrusions 37 can help the operator to quickly position the material loading tray 3, and ensure that the material loading tray 3 can be stably placed on the supporting protrusions 12. When it is necessary to take out the material loading tray 3, the material loading tray 3 is rotated so that each clearance notch 34 is aligned with each supporting protrusion 12, so that the material loading tray 3 can be conveniently taken out of the furnace body 1 by the handle 36.
[0030] like Figure 1 , Figure 2 , Figure 6 As shown, it also includes a plurality of support columns 33, which can be detachably mounted on the cone column 32, and the number of support columns 33 can be adjusted according to actual needs. In this way, when processing the special-shaped workpiece 6, the support column 33 can support the special-shaped workpiece 6, thereby preventing the irregular part of the special-shaped workpiece from extending between the adjacent cone columns 32, blocking the vent hole 31, and affecting the uniformity of gas distribution; on the other hand, it can also regularly place the various special-shaped workpieces 6 on the loading tray 3, preventing the various special-shaped workpieces 6 from stacking, causing a deposition blind area, and affecting the deposition effect.
[0031] like Figure 6 , Figure 7 As shown, the cone column 32 is composed of an integrally formed cylindrical portion 321 and a cone portion 322, the cylindrical portion 321 is arranged on the loading plate 3, and the cone portion 322 is placed at the top of the cylindrical portion 321; the bottom end of the support column 33 is provided with a groove 35, the lower and upper ends of the groove 35 are respectively a cylindrical groove 351 and a conical groove 352, the cylindrical groove 351 and the conical groove 352 are respectively detachably mounted on the cylindrical portion 321 and the cone portion 322, so that the support column 33 can be easily installed or removed, and the operation flexibility of the equipment is high. In order to ensure that the support column 33 can be stably mounted on the cone column 32, the support column 33 should not be too high, and it is preferred that the height H of the support column 33 is 1.5-3 times the height h of the cone column 32.
[0032] In order to further make the gas distribution in the furnace body 1 uniform, as Figure 1 , Figure 2 As shown, the lower inner wall of the furnace body 1 is provided with a plurality of air inlet pipes 5 arranged in a circular array, and the output end of the air inlet pipe 5 is located below the loading tray 3. In this way, after the gas enters the furnace body 1, turbulent mixing occurs at the bottom of the furnace body 1, so that the gas is mixed more evenly, and the gas can enter the furnace body 1 more evenly from each vent hole 31, which is conducive to forming a uniform coating layer on the workpiece, thereby ensuring the quality of the product. The top of the furnace cover 2 is provided with an air outlet pipe, so that the reacted gas can be discharged from the chemical vapor deposition furnace through the air outlet pipe.
Claims
1. A chemical vapor deposition furnace, comprising a furnace body (1) and a furnace cover (2) covering the furnace body (1), wherein a material loading tray (3) is arranged in the furnace body (1), and a plurality of vent holes (31) are arranged on the material loading tray (3), characterized in that: A plurality of conical columns (32) are also provided on the material loading tray (3), and the plurality of conical columns (32) and the plurality of vent holes (31) are arranged one by one in a spaced relationship to form a rectangular array.
2. The chemical vapor deposition furnace according to claim 1, characterized in that: A plurality of material loading trays (3) are arranged in the furnace body (1), and a plurality of supporting bosses (11) arranged vertically side by side are arranged on the inner wall of the furnace body (1), and each material loading tray (3) is placed on each supporting boss (11), respectively.
3. The chemical vapor deposition furnace according to claim 2, characterized in that: The supporting boss (11) comprises a plurality of supporting protrusions (12) arranged in a ring array; and a plurality of paving notches (34) corresponding one to each of the supporting protrusions (12) are provided at the edge of the material loading tray (3).
4. The chemical vapor deposition furnace according to claim 3, characterized in that: A positioning protrusion (37) is provided at the bottom edge of the material loading tray (3), and the positioning protrusion (37) is arranged between the two clearance notches (34).
5. The chemical vapor deposition furnace according to claim 1, characterized in that: A plurality of handles (36) are symmetrically provided on the edge of the surface of the material loading tray (3).
6. The chemical vapor deposition furnace according to claim 1, characterized in that: It also comprises a plurality of support columns (33), wherein the support columns (33) are detachably mounted on the conical column (32).
7. The chemical vapor deposition furnace according to claim 6, characterized in that: The conical column (32) is composed of an integrally formed cylindrical portion (321) and a conical body portion (322); the cylindrical portion (321) is arranged on the loading plate (3); the conical body portion (322) is arranged at the top end of the cylindrical portion (321); a groove (35) is provided at the bottom end of the support column (33); the lower and upper ends of the groove (35) are respectively a cylindrical groove (351) and a conical groove (352); the cylindrical groove (351) and the conical groove (352) are respectively detachably mounted on the cylindrical portion (321) and the conical body portion (322).
8. The chemical vapor deposition furnace according to claim 6 or 7, characterized in that: The height H of the support column (33) is 1.5 to 3 times the height h of the cone column (32).
9. The chemical vapor deposition furnace according to claim 1, characterized in that: A plurality of air intake pipes (5) arranged in a circular array are provided on the lower inner wall of the furnace body (1), and the output ends of the air intake pipes (5) are located below the material loading tray (3).
