High-vacuum isolation transmission valve for semiconductor CVD (Chemical Vapor Deposition) equipment

Abstract

The utility model discloses a high vacuum isolation transmission valve for semiconductor CVD (chemical vapor deposition) equipment, which relates to the technical field of semiconductor CVD equipment and comprises a vacuum valve group and protective covers, sealing rings are embedded on the surfaces of the inner walls of openings at the left end and the right end of the vacuum valve group, and the protective covers are symmetrically sleeved at the left end and the right end of the vacuum valve group. A reinforcing frame is movably installed on the periphery of the middle of the vacuum valve set, and a control switch is installed on the top of the vacuum valve set. According to the high-vacuum isolation transmission valve for the semiconductor CVD equipment, the protective covers are arranged on the left side and the right side of the vacuum valve set, so that the structural safety of the connecting position of the whole vacuum valve set and a pipeline can be effectively guaranteed, the situation of leakage caused by the influence of external factors on the connecting position can be reduced as much as possible, and through the use of a control switch, the safety of the transmission valve is improved. And a manual and automatic combined adjusting structure can be realized, so that the opening or closing of the vacuum valve group can be randomly selected according to different use environments.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor CVD equipment, in particular to a high vacuum isolation transmission valve for semiconductor CVD equipment. Background Art

[0002] Semiconductor CVD equipment is a special equipment used for the chemical vapor deposition process of semiconductor material preparation, which includes a pumping system, which is a system for creating and maintaining a vacuum environment in the reaction chamber. The pumping system reduces the pressure in the reaction chamber by extracting gas to ensure that the reaction gas reacts within the appropriate pressure range. This system includes a vacuum isolation transfer valve, which is a commonly used valve with good airtightness in vacuum technology. It can effectively isolate the gases in different components of the vacuum system and maintain the vacuum degree. The vacuum isolation valve is usually composed of a valve body, a piston, a sealing ring, a drive mechanism and a piping system. During operation, the piston is driven up or down, causing the sealing ring to rotate and precisely dock, thereby achieving gas isolation between different pipelines;

[0003] The working principle of the vacuum isolation valve is based on the movement of the piston and the rotation of the sealing ring. When the piston moves downward, the sealing ring rotates and abuts the valve seat, preventing gas from entering or flowing out of the pipeline. When the piston moves upward, the sealing ring moves away from the valve seat, allowing gas to flow in the pipeline.

[0004] The sealing ring of the vacuum isolation valve is usually made of rubber or metal materials with good elasticity to ensure the air tightness of the valve. In addition, the drive mechanism can also control the movement of the piston manually or electrically to realize the opening and closing of the valve.

[0005] Conventional vacuum isolation valves are connected to pipelines using flange structures, and their structure is open. When affected by external factors, the structure may be affected and leaks may occur. In addition, a manual opening and closing switch structure is generally used during use, requiring operators to choose to open and close by themselves, and its operational flexibility is relatively limited.

[0006] Therefore, in view of this, the existing structure and defects are studied and improved, and a high vacuum isolation transfer valve for semiconductor CVD equipment is proposed. Utility Model Content

[0007] The utility model aims to provide a high vacuum isolation transfer valve for semiconductor CVD equipment to solve the problems raised in the above background technology.

[0008] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a high vacuum isolation transfer valve for semiconductor CVD equipment, comprising a vacuum valve group and a protective cover, the inner wall surfaces of the left and right openings of the vacuum valve group are inlaid with sealing rings, the protective cover is symmetrically sleeved on the left and right ends of the vacuum valve group, and a reinforcement frame is movably installed around the middle of the vacuum valve group, and a control switch is installed on the top of the vacuum valve group, the protective cover comprises an upper sleeve, a damping hinge, a lower ring sleeve, a docking ear and a fastening bolt, a damping hinge is installed on one side of the upper sleeve, and the lower ring sleeve is connected to the side of the damping hinge away from the upper sleeve, and the lower ring sleeve and the surface of the side of the upper sleeve away from the damping hinge are both provided with docking ears, and the middle of the docking ear is threadedly connected with a fastening bolt.

[0009] Furthermore, the vacuum valve group includes a main valve body, an assembly flange, a docking flange and a fixing groove. The top middle section of the main valve body is provided with an assembly flange, and the left and right ends of the main valve body are provided with docking flanges, and a fixing groove is provided on the inner diameter surface of the opening of the docking flange.

[0010] Furthermore, the main valve body, the assembly flange and the docking flange are all arranged in an integrated structure, and the inner surface structure of the fixing groove matches the outer surface structure of the sealing ring.

[0011] Furthermore, the upper sleeve and the lower ring sleeve have the same structure, and the inner surface structure of one end of the upper sleeve and the lower ring sleeve close to the main valve body matches the outer surface structure of one end of the main valve body.

[0012] Furthermore, the reinforcement frame includes a support rod, a first protection ring and a second protection ring. The first protection ring is installed at one end of the support rod, and the second protection ring is installed at one end of the support rod away from the first protection ring.

[0013] Furthermore, the first guard ring and the second guard ring are both arranged in a sliding structure with the support rod, and the first guard ring and the second guard ring have the same structure, and the support rod is arranged in four groups in a circular array with the first guard ring as the center.

[0014] Furthermore, the control switch includes a valve plate switch, a connecting flange, a manual switch and a solenoid valve switch, wherein a connecting flange is installed at the bottom of the valve plate switch, a manual switch is installed in the middle of the valve plate switch, and a solenoid valve switch is arranged on one side of the valve plate switch.

[0015] Furthermore, the valve plate switch is electrically connected to the solenoid valve switch, and the valve plate switch is mechanically connected to the manual switch.

[0016] The utility model provides a high vacuum isolation transfer valve for semiconductor CVD equipment, which has the following features:

[0017] Beneficial effects:

[0018] 1. The utility model has protective covers sleeved on the left and right ends of the vacuum valve group, wherein when the main valve body is connected to the external delivery pipeline by the docking flanges at the left and right ends, the upper sleeve and the lower ring sleeve are respectively clamped and wrapped by the side of one end of the main valve body by the structural activity of the damping hinge, and the docking flange is wrapped therein, and then the upper sleeve and the lower ring sleeve connected thereto are closed with each other by the structural activity of the damping hinge, and the docking ears on the same side of the two are docked with each other, and then the fastening bolts are screwed therein, that is, the protective cover can be fixed to one end of the main valve body. The use of the above structure can effectively reduce the direct influence of the external force on the docking flange, thereby providing good structural protection. At the same time, the structural flexibility of the protective cover is convenient for different use needs, and it can be arbitrarily selected to be disassembled or not, thereby improving the structural freedom and flexibility of use.

[0019] 2. The utility model, through the use of the control switch, utilizes the structural cooperation of the connecting flange and the assembly flange to make the control switch and the vacuum valve group have good structural disassembly and assembly, so that the operating personnel can perform good structural maintenance operations on it. By using the manual switch and the solenoid valve switch installed in the valve plate switch, two different vacuum valve group opening and closing operation modes of automatic control and manual control can be provided at the same time according to different usage needs. By using the combined use of the above structures, on the one hand, different control modes can be realized according to different usage scenarios, thereby ensuring the structural flexibility of use. On the other hand, the setting of the manual switch also provides a kind of insurance function for the solenoid valve switch, so that when the solenoid valve switch fails, the manual switch can provide emergency control means to prevent the vacuum valve group from being unable to open and close.

[0020] 3. The utility model can provide effective structural protection for the vacuum valve group to a certain extent through the use of a reinforcement frame. During the use of the entire vacuum valve group, it can be selected whether to install the reinforcement frame according to different usage scenarios. When the reinforcement frame is needed, it is only necessary to respectively sleeve the first protective ring and the second protective ring on the left and right ends of the main valve body, and insert the four groups of support rods in the first protective ring and the second protective ring in sequence along the horizontal direction to form a frame structure, which can reduce the collision damage to the vacuum valve group caused by foreign objects and improve the service life and structural safety. In addition, by opening a fixing groove at the opening of the docking flange and inlaying a detachable sealing ring therein, the sealing of the docking structure between the docking flange and the pipeline is guaranteed to the greatest extent, avoiding the occurrence of structural leakage. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 This is a schematic diagram of the three-dimensional structure of a high vacuum isolation transfer valve for semiconductor CVD equipment of the utility model;

[0022] Figure 2 This is a three-dimensional structural diagram of a control switch of a high vacuum isolation transfer valve for semiconductor CVD equipment of the utility model;

[0023] Figure 3 The utility model is a schematic diagram of the three-dimensional structure of a protective cover of a high vacuum isolation transfer valve for semiconductor CVD equipment.

[0024] In the figure: 1. vacuum valve group; 101. main valve body; 102. assembly flange; 103. docking flange; 104. fixing groove; 2. sealing ring; 3. protective cover; 301. upper sleeve; 302. damping hinge; 303. lower ring sleeve; 304. docking ear; 305. fastening bolt; 4. reinforcement frame; 401. support rod; 402. first protective ring; 403. second protective ring; 5. control switch; 501. valve plate switch; 502. connecting flange; 503. manual switch; 504. solenoid valve switch. DETAILED DESCRIPTION

[0025] The following is a further detailed description of the implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but cannot be used to limit the scope of the present invention.

[0026] like Figures 1 to 3As shown, a high vacuum isolation transfer valve for semiconductor CVD equipment includes a vacuum valve group 1 and a protective cover 3. The inner wall surfaces of the left and right openings of the vacuum valve group 1 are inlaid with sealing rings 2. The protective cover 3 is symmetrically sleeved on the left and right ends of the vacuum valve group 1, and a reinforcing frame 4 is movably installed around the middle of the vacuum valve group 1. A control switch 5 is installed on the top of the vacuum valve group 1. The protective cover 3 includes an upper sleeve 301, a damping hinge 302, a lower ring sleeve 303, a docking ear 304 and a fastening bolt 305. The damping hinge 302 is installed on one side of the upper sleeve 301, and the lower ring sleeve 303 is connected to the side of the damping hinge 302 away from the upper sleeve 301, and the lower ring sleeve 303 and the upper sleeve 301 The surface of the side away from the damping hinge 302 is provided with a docking ear 304, and the lower ring sleeve 303 and the upper sleeve 301 are provided with a docking ear 304, and the lower ring sleeve 303 is provided with a docking ear 304. The middle part of the connecting ear 304 is threadedly connected with a fastening bolt 305, and the upper sleeve 301 and the lower ring sleeve 303 have the same structure, and the inner surface structure of the end of the upper sleeve 301 and the lower ring sleeve 303 close to the main valve body 101 matches the outer surface structure of one end of the main valve body 101. By utilizing the structural activity of the damping hinge 302, the upper sleeve 301 and the lower ring sleeve 303 are respectively clamped and wrapped by the side of one end of the main valve body 101, and the docking flange 103 is wrapped therein. Then, by utilizing the structural activity of the damping hinge 302, the upper sleeve 301 and the lower ring sleeve 303 connected thereto are closed to each other, and the docking ears 304 on the same side of the two are docked with each other, and then the fastening bolt 305 is screwed into it, so that the protective cover 3 can be fixed to one end of the main valve body 101.

[0027] like Figures 1 to 3As shown, the vacuum valve group 1 includes a main valve body 101, an assembly flange 102, a docking flange 103 and a fixing groove 104. The top middle section of the main valve body 101 is provided with an assembly flange 102, and the left and right ends of the main valve body 101 are provided with docking flanges 103, and the inner diameter surface of the opening of the docking flange 103 is provided with a fixing groove 104. The main valve body 101, the assembly flange 102 and the docking flange 103 are all arranged in an integrated structure. The inner surface structure of the fixing groove 104 matches the outer surface structure of the sealing ring 2. The strengthening frame 4 includes a support rod 401, a first protective ring 402 and a second protective ring 403. The first protective ring 402 is installed at one end of the support rod 401, and the second protective ring 403 is installed at the end of the support rod 401 away from the first protective ring 402. The guard ring 403, the first guard ring 402 and the second guard ring 403 are all arranged in a sliding arrangement structure with the support rod 401, and the first guard ring 402 and the second guard ring 403 have the same structure, and the support rod 401 is provided with four groups of circular arrays with the first guard ring 402 as the center. The structural cooperation between the connecting flange 502 and the assembly flange 102 is utilized to ensure that the control switch 5 and the vacuum valve group 1 have good structural disassembly and assembly properties, so that the operating personnel can perform good structural maintenance operations thereon. By using the manual switch 503 and the solenoid valve switch 504 installed in the valve plate switch 501, two different operating modes of opening and closing the vacuum valve group 1, namely automatic control and manual control, can be provided at the same time according to different usage requirements.

[0028] like Figures 1 to 3 As shown, the control switch 5 includes a valve plate switch 501, a connecting flange 502, a manual switch 503 and a solenoid valve switch 504. The connecting flange 502 is installed at the bottom of the valve plate switch 501, and the manual switch 503 is installed in the middle of the valve plate switch 501, and the solenoid valve switch 504 is arranged on one side of the valve plate switch 501. The valve plate switch 501 and the solenoid valve switch 504 are electrically connected, and the valve plate switch 501 and the manual switch 503 are mechanically connected. When the entire vacuum valve group 1 is in use, it can be selected whether to install the reinforcement frame 4 according to different usage scenarios. When the reinforcement frame 4 is needed, it is only necessary to respectively sleeve the first protective ring 402 and the second protective ring 403 on the left and right ends of the main valve body 101, and insert the four groups of support rods 401 in the first protective ring 402 and the second protective ring 403 in sequence in the horizontal direction, so as to form a frame structure, which can reduce the collision damage of foreign objects to the vacuum valve group 1.

[0029] In summary, if Figures 1 to 3As shown, the high vacuum isolation transfer valve for semiconductor CVD equipment, when in use, firstly, whether to assemble the reinforcement frame 4 or not is selected according to the use requirements. When installation is required, only the first protection ring 402 and the second protection ring 403 are sleeved on the left and right ends of the main valve body 101 in the horizontal direction, and then the first protection ring 402 and the second protection ring 403 are rotated and proofread, and the support rod 401 is used to be inserted into the first protection ring 402 and the second protection ring 403 in the horizontal direction, so that the vacuum valve group 1 and the reinforcement frame 4 can be connected;

[0030] Then, the two sets of sealing rings 2 are respectively inserted into the fixing grooves 104 opened on the inner diameter surfaces of the docking flanges 103 at the left and right ends of the main valve body 101. Then, the docking flanges 103 at the left and right ends of the main valve body 101 are used to dock and fix the entire vacuum valve group 1 with the transmission pipeline. Then, the assembly flange 102 in the middle section of the main valve body 101 is used to connect the bottom connecting flanges 502 of the valve plate switch 501 to each other, so that the vacuum valve group 1 is connected and fixed with the control switch 5.

[0031] When the protective cover 3 is needed, the upper sleeve 301 and the lower ring sleeve 303 are opened by the activity of the damping hinge 302, and the upper sleeve 301 and the lower ring sleeve 303 are clamped on the outside of the connecting flange 502, and the upper sleeve 301 and the lower ring sleeve 303 are closed by the damping hinge 302, and then the fastening bolts 305 are screwed into the docking ears 304 set on the same side of the upper sleeve 301 and the lower ring sleeve 303 in sequence, so as to fix the protective cover 3 to one end of the vacuum valve group 1 to protect the docking flange 103;

[0032] During use, by using the manual switch 503 and the solenoid valve switch 504 installed in the valve plate switch 501, two different opening and closing operation modes of the vacuum valve group 1, namely automatic control and manual control, can be provided simultaneously according to different usage requirements.

[0033] The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

Claims

1. A high vacuum isolation transfer valve for semiconductor CVD equipment, comprising a vacuum valve group (1) and a protective cover (3), characterized in that: The inner wall surfaces of the openings at the left and right ends of the vacuum valve group (1) are inlaid with sealing rings (2), the protective cover (3) is symmetrically sleeved on the left and right ends of the vacuum valve group (1), and a reinforcement frame (4) is movably installed around the middle of the vacuum valve group (1), and a control switch (5) is installed on the top of the vacuum valve group (1). The protective cover (3) includes an upper sleeve (301), a damping hinge (302), a lower ring sleeve (303), a docking ear (30 4) and a fastening bolt (305), a damping hinge (302) is installed on one side of the upper sleeve (301), and a lower ring sleeve (303) is connected to the side of the damping hinge (302) away from the upper sleeve (301), and a docking ear (304) is provided on the surface of the lower ring sleeve (303) and the side of the upper sleeve (301) away from the damping hinge (302), and a fastening bolt (305) is threadedly connected to the middle part of the docking ear (304).

2. A high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 1, characterized in that: The vacuum valve assembly (1) comprises a main valve body (101), a mounting flange (102), a docking flange (103) and a fixing groove (104); the mounting flange (102) is arranged at the top middle section of the main valve body (101), and docking flanges (103) are arranged at both left and right ends of the main valve body (101); and a fixing groove (104) is arranged on the inner diameter surface of the opening of the docking flange (103).

3. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 2, characterized in that: The main valve body (101), the assembly flange (102) and the docking flange (103) are all arranged in an integrated structure, and the inner surface structure of the fixing groove (104) matches the outer surface structure of the sealing ring (2).

4. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 2, characterized in that: The upper sleeve (301) and the lower ring sleeve (303) have the same structure, and the inner surface structure of one end of the upper sleeve (301) and the lower ring sleeve (303) close to the main valve body (101) matches the outer surface structure of one end of the main valve body (101).

5. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 1, characterized in that: The reinforcing frame (4) comprises a support rod (401), a first protective ring (402) and a second protective ring (403); the first protective ring (402) is installed at one end of the support rod (401), and the second protective ring (403) is installed at one end of the support rod (401) away from the first protective ring (402).

6. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 5, characterized in that: The first guard ring (402) and the second guard ring (403) are both arranged in a sliding arrangement with the support rod (401), and the first guard ring (402) and the second guard ring (403) have the same structure, and the support rod (401) is arranged in four groups in a circular array with the first guard ring (402) as the center.

7. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 1, characterized in that: The control switch (5) comprises a valve plate switch (501), a connecting flange (502), a manual switch (503) and a solenoid valve switch (504); the connecting flange (502) is installed at the bottom of the valve plate switch (501), the manual switch (503) is installed in the middle of the valve plate switch (501), and the solenoid valve switch (504) is arranged on one side of the valve plate switch (501).

8. The high vacuum isolation transfer valve for semiconductor CVD equipment according to claim 7, characterized in that: The valve plate switch (501) is electrically connected to the solenoid valve switch (504), and the valve plate switch (501) is mechanically connected to the manual switch (503).

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