Conductive glass and display device

By adding a hydrophobic layer and an organic coating layer to the surface of the ITO layer of conductive glass, the problem of easy mold growth on the surface of conductive glass is solved, achieving good hydrophobicity, anti-fouling and easy cleaning, and extending service life.

CN222331807UActive Publication Date: 2025-01-10LILING KIBING ELECTRONIC GLASS CO LTD
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Patent Information

Application Number
CN202323583427.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2023-12-27
Publication Date
2025-01-10
Estimated Expiration
2033-12-27

AI Technical Summary

Technical Problem

Existing conductive glass surfaces are prone to mold growth, which affects their lifespan and performance.

Method used

A hydrophobic layer is added to the surface of the ITO layer of conductive glass, combined with an organic coating layer and an intermediate layer, to form a multi-layer structure to improve hydrophobicity and protective performance.

Benefits of technology

The hydrophobic layer reduces water droplet residue, prevents contaminant adhesion, maintains the transparency and conductivity of the ITO layer, extends service life, and is easy to clean.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model belongs to the technical field of glass conductive display, and provides conductive glass and a display device.The conductive glass comprises a glass substrate, an ITO layer and a hydrophobic layer, the ITO layer is arranged on the glass substrate, the hydrophobic layer is arranged on the side, back to the glass substrate, of the ITO layer, and the hydrophobic layer at least has the waterproof characteristic and the organic solvent resisting characteristic. The utility model aims to solve the technical problem that the surface of conductive glass is easy to mildew in the prior art.
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Description

Technical Field

[0001] The present application belongs to the technical field of glass conductive display, and in particular, relates to a conductive glass and a display device. Background Art

[0002] In recent years, with the popularization and rapid iteration of display and touch technology applications, the demand for ITO conductive film glass has grown steadily and rapidly. It has been widely used in the research and development and production of electrochromic devices, liquid crystal displays, LEDs, solar cells, transparent circuit boards and other fields. Among them, ITO refers to indium tin oxide, which is a substitutional solid solution.

[0003] ITO glass is a transparent ITO layer sputtered on a glass substrate. The ITO layer has strong water absorption and can easily absorb carbon dioxide and water in the air, which can easily cause mildew on the glass surface. Utility Model Content

[0004] The purpose of the present application is to provide a conductive glass and a display device, aiming to solve the technical problem in the prior art that the conductive glass surface is prone to mildew.

[0005] The first object of the present application is to provide a conductive glass, comprising a glass substrate, an ITO layer and a hydrophobic layer, wherein the ITO layer is arranged on the glass substrate, the hydrophobic layer is arranged on the side of the ITO layer facing away from the glass substrate, and the hydrophobic layer has at least waterproof properties and anti-organic solvent properties.

[0006] In one embodiment, the conductive glass further includes an organic coating layer, and the organic coating layer is disposed between the glass substrate and the ITO layer.

[0007] In one embodiment, the conductive glass further includes a first intermediate layer, which is disposed between the organic coating layer and the ITO layer; and the first intermediate layer includes silicon dioxide.

[0008] In one embodiment, the hydrophobic layer includes one of a perfluoroethylene propylene film and a polytetrafluoroethylene film.

[0009] In one embodiment, the thickness of the glass substrate is 0.5 mm-5.0 mm; and / or

[0010] The thickness of the ITO layer is 50nm-300nm; and / or

[0011] The thickness of the hydrophobic layer is 5 μm-15 μm.

[0012] In one embodiment, the organic coating layer includes at least one or more of polyester resin, polyurethane resin and epoxy resin.

[0013] In one embodiment, the thickness of the organic coating layer is 500nm-1500nm.

[0014] In one embodiment, the conductive glass further includes a second intermediate layer, wherein the second intermediate layer is disposed between the hydrophobic layer and the ITO layer; and the second intermediate layer includes silicon dioxide.

[0015] In one embodiment, the thickness of the first intermediate layer is 5nm-50nm; and / or

[0016] The thickness of the second intermediate layer is 5nm-50nm.

[0017] A second object of the present application is to provide a display device comprising the conductive glass as described in any one of the above items.

[0018] The conductive glass and display device of the present application have the following beneficial effects compared with the prior art: compared with the prior art, in the conductive glass and display device, the hydrophobic layer has good surface hydrophobicity, so that water droplets form a smaller contact angle on the surface, which helps water droplets roll or slide quickly on the surface, and reduces the possibility of water droplets remaining on the surface; the hydrophobic layer can prevent moisture and pollutants from adhering to the surface of the ITO layer, reduce the formation of dirt and water stains, and maintain the transparency and conductive properties of the ITO layer; due to the presence of the hydrophobic layer, the surface is easier to clean, and dust, dirt and other substances attached to the surface are easier to remove, thereby maintaining the cleanliness of the surface; the hydrophobic layer can also improve the durability of the coating, slow down corrosion and degradation caused by external environmental factors (such as humidity, pollutants, etc.), and extend the service life of the glass surface; in summary, the conductive glass improves the surface performance of the ITO layer by adding a hydrophobic layer, making it more resistant to pollution, easy to clean and durable. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments of the present application or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0020] Figure 1 This is a schematic diagram of the structure of a conductive glass provided in an embodiment of the present application. Figure 1 ;

[0021] Figure 2 This is a schematic diagram of the structure of a conductive glass provided in an embodiment of the present application. Figure 2 ;

[0022] Figure 3This is a schematic diagram of the structure of a conductive glass provided in an embodiment of the present application. Figure 3 ;

[0023] Figure 4 This is a schematic diagram of the structure of a conductive glass provided in an embodiment of the present application. Figure 4 .

[0024] Explanation of the reference numerals: 1. glass substrate; 2. ITO layer; 3. hydrophobic layer; 4. organic coating layer; 5. first intermediate layer; 6. second intermediate layer. DETAILED DESCRIPTION

[0025] Embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present application, and should not be construed as limiting the present application.

[0026] In the description of the present application, it should be understood that the terms "length", "width", "upper", "lower", "upward", "vertical", "horizontal", "bottom", "inside", "outside", "inner side", "outer side" and the like indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0027] In addition, the terms "first", "second", etc. are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the feature. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0028] In this application, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0029] In order to make the objectives, technical solutions and advantages of the present application more clearly understood, the present application is further described in detail below in conjunction with the accompanying drawings and embodiments.

[0030] See also Figure 1 As shown, an embodiment of the present application provides a conductive glass, which includes a glass substrate 1, an ITO layer 2 and a hydrophobic layer 3. The ITO layer 2 is arranged on the glass substrate 1, and the hydrophobic layer 3 is arranged on the side of the ITO layer 2 facing away from the glass substrate 1. The hydrophobic layer 3 has at least waterproof properties and anti-organic solvent properties.

[0031] Specifically, the glass substrate 1 is a substrate prepared by a soda-lime system and a boron-based system. The glass of the soda-lime system (Soda-Lime System) is mainly composed of silicon oxide, sodium oxide (Soda, chemical formula Na2O) and calcium oxide (Lime, chemical formula CaO). The combination of silicon oxide, sodium oxide and calcium oxide constitutes the basic components of glass. The glass of the boron-based system (Boron-Based System) mainly contains boron oxide (Boron Oxide, chemical formula B2O3). The addition of boron oxide changes the chemical properties of the glass and improves its thermal shock resistance and chemical stability.

[0032] The ITO layer 2 is made by sputtering a transparent indium tin oxide film on the surface of the glass substrate 1 by magnetron sputtering. ITO is composed of a mixture of indium oxide (In2O3) and tin oxide (SnO2). ITO material has good light transmittance and conductivity, making it an ideal choice for manufacturing transparent conductive films; in liquid crystal displays, ITO films can be used as transparent electrodes, allowing light to pass through and form images on the display screen.

[0033] The hydrophobic layer 3 is superimposed on the surface of the ITO layer 2 to protect the ITO layer 2. The ITO layer 2 is first sputtered on the glass substrate 1, and then the hydrophobic layer 3 is coated, so that the conductive glass has additional anti-pollution and hydrophobic properties on the surface while maintaining conductivity.

[0034] Specifically, the hydrophobic layer 3 can be made of fluoropolymers, silicon-based materials, hydrophobic coatings, nanostructured surfaces or special polymers, etc. For example, fluoropolymers may include polytetrafluoroethylene (PTFE) and polyperfluoropropylene (PFA), etc. The molecular structure of the above materials makes its surface present a strong hydrophobicity, and water droplets form spheres on its surface and are easy to slide off. For example, silicon-based materials may include silicone oil or silicone rubber, etc., all of which have certain hydrophobicity. Silicon-based materials can be coated on the surface of the ITO layer 2 to form a protective film to make it water-resistant. The hydrophobic coating generally includes components such as aluminum hydroxide and fluoride, which can form a thin film on the surface of the ITO layer 2 to improve the hydrophobicity of the material. For example, the nanostructured surface may include nanocolumns, nanoparticles, etc., and a hydrophobic effect can also be achieved. The above nanostructures can change the morphology of the surface, making it easier for water droplets to slide off the surface. For example, special polymers may include polyvinylidene fluoride (PVDF), etc.

[0035] In this embodiment, the hydrophobic layer 3 has good surface hydrophobicity, so that water droplets form a smaller contact angle on the surface, which helps the water droplets to roll or slide quickly on the surface, and reduces the possibility of water droplets remaining on the surface; the hydrophobic layer 3 can prevent moisture and pollutants from adhering to the surface of the ITO layer 2, reduce the formation of dirt and water stains, and maintain the transparency and conductivity of the ITO layer 2; due to the presence of the hydrophobic layer 3, the surface is easier to clean, and dust, dirt and other substances attached to the surface are easier to remove, thereby maintaining the cleanliness of the surface; the hydrophobic layer 3 can also improve the durability of the coating, slow down corrosion and degradation caused by external environmental factors (such as humidity, pollutants, etc.), and extend the service life of the glass surface; in summary, the conductive glass improves the performance of the surface of the ITO layer 2 by adding the hydrophobic layer 3, making it more resistant to pollution, easy to clean and durable.

[0036] In one embodiment, referring to Figure 2 As shown, the conductive glass also includes an organic coating layer 4, which is arranged between the glass substrate 1 and the ITO layer 2. The organic coating layer 4 can be equivalent to an organic coating layer; the thickness of the organic coating layer is 500nm-1500nm, for example, the thickness of the organic coating layer can include 500nm, 600nm, 700nm, 800nm, 900nm, 1000nm, 1100nm, 1200nm, 1300nm, 1400nm, 1500nm, etc.

[0037] Specifically, the organic coating layer 4 may include a polymer, a polymer composite material, a polymer emulsion, a fluoropolymer, a silicon-based material, polyetheretherketone, a polyether ester or an organic film, etc., wherein the polymer may include polyurethane, polyester, polypropylene, polyethylene, etc. For example, the organic coating layer 4 at least includes a combination of one or more of polyester resin, polyurethane resin and epoxy resin. The organic coating layer 4 formed by the polymer has good flexibility and chemical resistance.

[0038] Among them, the organic coating layer 4 can also be a composite material of different polymers to integrate various properties. For example, a composite coating of polyurethane and acrylate can provide good scratch resistance and chemical resistance. Aqueous polymer emulsions are commonly used for organic coatings, such as acrylate emulsions. These emulsions form a protective film by evaporating water after coating. Fluoropolymers include polytetrafluoroethylene, etc., which have excellent anti-sticking and chemical resistance. Among silicon-based materials, for example, silicone coatings are often used to provide high temperature resistance and waterproof properties. The organic coating layer 4 prepared using polyetheretherketone is used in some applications requiring high temperature, high strength and chemical resistance. The organic coating layer 4 prepared using polyether ester has good mechanical properties and high temperature resistance. Organic films may include polyimide films, polyamide films, etc., which are commonly used to provide high temperature, electrical insulation and gas barrier properties.

[0039] Na in glass substrate 1 + In the absence of a barrier layer, it is very easy to migrate into the ITO layer 2, affecting the conductive effect of the ITO layer 2. Therefore, the conductive glass in the present application adds an organic coating layer 4 between the glass substrate 1 and the ITO layer 2, so that the organic coating layer 4 forms a barrier layer. The surface energy of the organic coating layer 4 is large, which can effectively prevent the Na in the glass substrate 1 from + Diffusion into the ITO layer 2 , thereby protecting the ITO layer 2 .

[0040] In this embodiment, the conductive glass can block the Na in the glass substrate 1 by adding an organic coating layer 4 between the glass substrate 1 and the ITO layer 2. + The organic coating layer 4 diffuses and migrates into the ITO layer 2, thereby protecting the ITO layer 2; in addition, the organic coating layer 4 can smooth the ripples on the surface of the glass substrate 1, reduce the roughness of the surface of the glass substrate 1, so that the organic coating layer 4 can increase the adhesion between the ITO layer 2 and the glass substrate 1, and make the ITO layer 2 not easy to fall off; furthermore, the organic coating layer 4 can be used as a protective layer to protect the surface of the conductive glass from the influence of the external environment, and can prevent the conductive glass from being corroded by chemicals, moisture, dust, etc., and extend its service life; the organic coating layer 4 can enhance the stability and durability of the conductive glass, reduce the oxidation and corrosion of the conductive glass surface, and help maintain the stability of the conductive performance. The organic coating layer 4 can also improve the optical properties of the conductive glass, for example, increase the transparency or adjust the refractive index of the glass.

[0041] In one embodiment, referring to Figure 3 As shown, the conductive glass further includes a first intermediate layer 5, which is disposed between the organic coating layer 4 and the ITO layer 2; the first intermediate layer 5 includes silicon dioxide.

[0042] The thickness of the first intermediate layer 5 is 5 nm-50 nm. For example, the thickness of the first intermediate layer 5 includes 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm or 50 nm.

[0043] Specifically, the first intermediate layer 5 is a silicon dioxide layer. The organic coating layer 4 has a large surface energy and can adhere well to the silicon dioxide layer, thereby increasing the hardness of the film layer and making it difficult for the film layer to fall off. The silicon dioxide layer can improve the adhesion between the ITO layer 2 and the organic coating layer 4 and the glass substrate 1, ensuring that it is not easy to peel off or be damaged during use, which helps to improve the stability and durability of the coating.

[0044] In this embodiment, the first intermediate layer 5 is applied after the organic coating layer 4 is applied, so the first intermediate layer 5 can also smooth the organic coating layer 4, reduce the surface roughness, and ensure the uniformity and transparency of the subsequently applied ITO layer 2. The thickness and refractive index of the first intermediate layer 5 can adjust the optical properties, including reflection and transmission characteristics. By accurately controlling the properties of the first intermediate layer 5, the optical properties of the coating can be optimized.

[0045] In one embodiment, the hydrophobic layer 3 may include one of a perfluoroethylene propylene film and a polytetrafluoroethylene film.

[0046] Specifically, perfluoroethylene propylene (FEP) and polytetrafluoroethylene (PTFE) are both fluoropolymers with extremely strong hydrophobicity. Their surface energy is very low, so that water droplets form balls on their surfaces and slide down quickly, achieving an excellent hydrophobic effect.

[0047] In addition, perfluoroethylene propylene and polytetrafluoroethylene have excellent chemical stability. Fluoropolymers have high resistance to many chemical substances, so that the conductive glass using perfluoroethylene propylene or polytetrafluoroethylene as the hydrophobic layer 3 can maintain its performance unaffected in the face of various environments and chemical substances.

[0048] Furthermore, both perfluoroethylene propylene and polytetrafluoroethylene have good high temperature resistance, and they can maintain hydrophobic properties at higher temperatures, and are suitable for applications in high temperature environments. In addition, polytetrafluoroethylene is a material with excellent mechanical properties, with low friction coefficient and high tensile strength, so that the use of polytetrafluoroethylene film as the material of the hydrophobic layer 3 can provide good wear resistance and durability. Although perfluoroethylene propylene and polytetrafluoroethylene are solid, their film forms can have good transparency.

[0049] In one embodiment, the thickness of the glass substrate 1 is 0.5 mm-5.0 mm. For example, the thickness of the glass substrate 1 may include 0.5 mm, 0.9 mm, 1.1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc.

[0050] The ITO layer 2 is deposited on the surface of the glass substrate 1 by magnetron sputtering, and the thickness of the ITO layer 2 is 50nm-300nm. For example, the thickness of the ITO layer 2 may include 50nm, 100nm, 150nm, 200nm, 250nm, 300nm, etc.

[0051] For the hydrophobic layer 3 , the thickness of the hydrophobic layer 3 is 5 μm-15 μm. For example, the thickness of the hydrophobic layer 3 may include 5 μm, 10 μm, 12 μm, 15 μm, etc.

[0052] In one embodiment, referring to Figure 4As shown, the conductive glass further includes a second intermediate layer 6, which is disposed between the hydrophobic layer 3 and the ITO layer 2; the second intermediate layer 6 includes silicon dioxide.

[0053] The thickness of the second intermediate layer 6 is 5 nm-50 nm. For example, the thickness of the second intermediate layer 6 includes 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm or 50 nm.

[0054] Among them, it should be noted that Figure 1-4 In the figure, the thickness ratio of the glass substrate 1, the organic coating layer 4, the first intermediate layer 5, the ITO layer 2, the second intermediate layer 6 and the hydrophobic layer 3 is not drawn according to the actual ratio of the wire glass. Figure 1-4 It is only used to illustrate the layer structure of the conductive glass.

[0055] Specifically, the second intermediate layer 6 is a silicon dioxide layer, which can improve the adhesion between the hydrophobic layer 3 and the ITO layer 2, thereby helping to ensure that the hydrophobic layer 3 is firmly attached to the surface of the ITO layer 2 to prevent peeling or damage during use.

[0056] In addition, the second intermediate layer 6 can form a smooth interface between the hydrophobic layer 3 and the ITO layer 2, which helps to optimize the interaction between the two, helps to improve the performance of the optical device, and ensures the cooperative work between the ITO layer 2 and the hydrophobic layer 3. The silicon dioxide layer can provide an electrical insulation layer to prevent current from leaking between the hydrophobic layer 3 and the ITO layer 2; the silicon dioxide layer can improve the scratch resistance of the coating and protect the hydrophobic layer 3 and the ITO layer 2 from surface scratches or wear.

[0057] In this embodiment, the second intermediate layer 6 between the hydrophobic layer 3 and the ITO layer 2 plays a multi-faceted role in improving adhesion, optimizing the interface, preventing current leakage, improving optical transparency and improving scratch resistance, thereby helping to improve the overall performance and stability of the conductive glass.

[0058] The preparation process of the conductive glass in the embodiment of the present application includes:

[0059] Step A: clean and dry the glass substrate 1, and spray an organic coating layer 4 on the surface of the glass substrate 1 by spraying. The organic coating layer 4 can be one of polyester resin, polyurethane resin or epoxy resin. The film thickness of the organic coating layer 4 is between 500nm and 1500nm, and it is dried at 200℃-300℃.

[0060] Step B: transport the dried glass substrate 1 sprayed with the organic coating layer 4 (such as polyester resin) to a magnetron sputtering machine, use plasma bombardment to remove foreign matter on the glass surface, and start working when the vacuum degree in the machine is 1.0×10-3-2.0×10-3Pa, the ICP power is 1.5Kw-3Kw, the gas is Ar, the time is 30s-60s, and the Ar flow rate is 200SCCM-500SCCM.

[0061] Step C, coating the first intermediate layer 5, the first intermediate layer 5 is SiO2, the target material is SiO2, the purity is 99.99%, the vacuum degree in the coating machine is 0.05-0.8Pa, the sputtering gas is Ar, the coating rate is 0.02-0.10nm / S, the film thickness is 5-50nm, and the machine speed is 15-30rpm / min.

[0062] Step D, coating ITO layer 2, the target material is indium tin target material, the ratio of indium to tin is 8:2-9.5:0.5, the vacuum degree in the coating machine is 0.005-0.05Pa, the sputtering gas is Ar, the coating rate is 0.05-0.15nm / s, the film thickness is 50-300nm, and the machine speed is 15-30rpm / min.

[0063] Step E: annealing the glass substrate 1 as a whole at a temperature of 200-300° C. for a time of 5 min-30 min. This can effectively eliminate stress in the film layer and improve the hardness between the film layers.

[0064] Step F, coating the second intermediate layer 6, the second intermediate layer 6 is SiO2, the target material is SiO2, the purity is 99.99%, the vacuum degree in the coating machine is 0.05-0.8Pa, the sputtering gas is Ar, the coating rate is 0.02-0.10nm / S, the film thickness is 5-50nm, and the machine speed is 15-30rpm / min.

[0065] Step G: coating a hydrophobic layer 3, wherein the hydrophobic layer 3 is a perfluoroethylene propylene film or a polytetrafluoroethylene film, and has a thickness of 5-15 μm.

[0066] Through the above steps, the preparation of the conductive glass in the embodiment of the present application is completed.

[0067] An embodiment of the present application further provides a display device, which includes the conductive glass in the above embodiment.

[0068] In this embodiment, the display device may include electronic devices or electronic devices such as a display panel, a display screen, and a display. The display device includes the above-mentioned conductive glass. Therefore, the display device has all the characteristics and advantages of the above-mentioned conductive glass, which will not be repeated here.

[0069] The above are only preferred embodiments of the present application, and only specifically describe the technical principles of the present application. These descriptions are only for explaining the principles of the present application and cannot be interpreted as limiting the scope of protection of the present application in any way. Based on the explanation here, any modifications, equivalent substitutions and improvements made within the spirit and principles of the present application, and other specific implementation methods of the present application that can be associated with the technicians in this field without creative work, should be included in the scope of protection of the present application.

Claims

1. A conductive glass, characterized in that: The invention comprises a glass substrate, an ITO layer and a hydrophobic layer. The ITO layer is arranged on the glass substrate. The hydrophobic layer is arranged on the side of the ITO layer facing away from the glass substrate. The hydrophobic layer has at least waterproof and organic solvent resistance properties.

2. The conductive glass according to claim 1, characterized in that The conductive glass further includes an organic coating layer, and the organic coating layer is disposed between the glass substrate and the ITO layer.

3. The conductive glass according to claim 2, characterized in that: The conductive glass further includes a first intermediate layer, which is disposed between the organic coating layer and the ITO layer; the first intermediate layer includes silicon dioxide.

4. The conductive glass according to any one of claims 1 to 3, characterized in that: The hydrophobic layer includes one of a perfluoroethylene propylene film and a polytetrafluoroethylene film.

5. The conductive glass according to claim 4, characterized in that The thickness of the glass substrate is 0.5 mm to 5.0 mm; and / or The thickness of the ITO layer is 50nm-300nm; and / or The thickness of the hydrophobic layer is 5 μm-15 μm.

6. The conductive glass according to claim 2 or 3, characterized in that: The organic coating layer includes at least one or more of polyester resin, polyurethane resin and epoxy resin.

7. The conductive glass according to claim 6, wherein: The thickness of the organic coating layer is 500nm-1500nm.

8. The conductive glass according to claim 3, wherein: The conductive glass further includes a second intermediate layer, which is disposed between the hydrophobic layer and the ITO layer; the second intermediate layer includes silicon dioxide.

9. The conductive glass according to claim 8, characterized in that The thickness of the first intermediate layer is 5nm-50nm; and / or The thickness of the second intermediate layer is 5nm-50nm.

10. A display device, characterized in that: The conductive glass comprises the conductive glass as described in any one of claims 1 to 9.