Supporting base of wafer bearing disc

Abstract

The utility model discloses a supporting base of a wafer bearing disc, which comprises a base and a rotating seat rotationally arranged on the base, a plurality of bolt groups are arranged on the rotating seat, each bolt group comprises a plurality of bolts, a supporting column is detachably mounted on each bolt, a supporting groove is formed on the inner side of the top surface of each supporting column, an arc-shaped flange is arranged on the outer side of the top surface of each supporting column, and the arc-shaped flanges are arranged in the supporting grooves. The arc centers of the arc-shaped flanges of the corresponding multiple supporting columns on the same bolt set are the same, the supporting grooves of the multiple supporting columns are matched with the arc-shaped flanges to achieve bearing, supporting and limiting of the wafer bearing disc, and a taking and placing channel is formed between every two adjacent supporting columns. A palm of a human body extends into the supporting groove to stably place the wafer bearing disc on the supporting groove or extends out of the supporting groove to stably take out the wafer bearing disc from the supporting groove, so that the silicon carbide wafer cannot be polluted due to misoperation in the operation process that the bearing disc with the silicon carbide wafer enters the Holder; and the surface yield and quality of the silicon carbide wafer are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of supporting bases, in particular to a supporting base of a wafer carrier plate. Background Art

[0002] Silicon carbide semiconductors have excellent properties such as large bandgap, excellent stability, high thermal conductivity, high critical breakdown field strength, and high saturated electron drift velocity. They are ideal semiconductor materials for making high-temperature, high-frequency, high-power and strong radiation power electronic devices. The silicon carbide material used to make silicon carbide devices is usually a silicon carbide epitaxial wafer grown on a silicon carbide substrate.

[0003] When using the LPEPE106A epitaxial furnace for the silicon carbide epitaxial growth process, when placing the wafer, you need to lift the wafer carrier from the desktop with one hand and put it into the Holder; when taking the wafer, you need to lift the carrier from the Holder with one hand and put it on the desktop. During this operation, the carrier will have a certain tilt angle when it is lifted or put down by one hand, causing the wafer and the carrier to slide and collide, resulting in an increase in dropped objects. It is easy to contaminate the silicon carbide wafer due to improper operation, reducing the surface yield of the silicon carbide wafer, thereby affecting the quality of the silicon carbide wafer. Utility Model Content

[0004] The utility model aims to provide a supporting base for a wafer carrier plate to solve the above-mentioned technical problems.

[0005] To achieve the above-mentioned purpose, the technical solution of the utility model is: a support base for a chip carrier, comprising a base and a rotating base rotatably arranged on the base, a plurality of pin groups are arranged on the rotating base, each pin group comprises a plurality of pins, a support column is detachably mounted on the pin, a support groove is formed on the inner side of the top surface of the support column, an arc-shaped rib is formed on the outer side of the top surface of the support column, the arc centers of the arc-shaped ribs of the corresponding plurality of support columns on the same pin group are the same, the support grooves of the plurality of support columns and the arc-shaped ribs cooperate with each other to realize the support and limiting of the chip carrier, a pick-up and placement channel is formed between two adjacent support columns, for allowing the palm of a human body to extend into to place the chip carrier stably on the support groove, or to extend out to take the chip carrier stably out of the support groove.

[0006] Preferably, there are four support columns, which are arranged in a ring shape and evenly disposed on the rotating seat.

[0007] Preferably, a plurality of fan-shaped protrusions are formed on the top of the rotating seat, and a mounting groove is formed between two adjacent fan-shaped protrusions. The length direction of the mounting groove is the same as the radial direction of the rotating seat. The latches are arranged on the mounting groove along the length direction of the mounting groove, and the support column is detachably mounted on the mounting groove through the latches.

[0008] Preferably, the plurality of latch pins on each latch pin group are arranged in a ring shape.

[0009] Preferably, there are two pin groups, namely an inner ring pin group and an outer ring pin group. The ring corresponding to the pins on the inner ring pin group is the inner ring, and the ring corresponding to the pins on the outer ring pin group is the outer ring. The inner ring and the outer ring are arranged concentrically, and the diameter of the inner ring is smaller than the diameter of the outer ring.

[0010] Preferably, the base is a disc base.

[0011] Preferably, it also includes a rotating shaft, and the center of the rotating seat is rotatably arranged at the center of the base through the rotating shaft.

[0012] Preferably, the support column is height-adjustable and mounted on the latch.

[0013] The utility model has the following beneficial effects:

[0014] The utility model realizes the support and limiting of the wafer carrier through the cooperation of the support grooves of the corresponding multiple support columns on the same multiple pin groups and the arc-shaped retaining edges, and a pick-up and placement channel is formed between two adjacent support columns, so that in the process of silicon carbide epitaxial growth using the LPEPE106A epitaxial furnace, when placing the wafer, the palm of the staff can extend through the pick-up and placement channel to stably place the wafer carrier on the support groove and finally put it into the Holder, or extend through the pick-up and placement channel to stably take out the wafer carrier from the support groove and put it on the table; during this operation, the carrier can remain stable when it is lifted and placed or lifted and put down by one hand, thereby preventing the wafer and the carrier from sliding and colliding, thereby avoiding the increase of dropped objects, that is, the carrier with the silicon carbide wafer placed on it will not contaminate the silicon carbide wafer due to improper operation during the operation of entering the Holder, thereby improving the surface yield and quality of the silicon carbide wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a stereogram of an embodiment of the utility model;

[0016] Figure 2 This is a top perspective view of an embodiment of the utility model;

[0017] Figure 3 It is a top view of an embodiment of the utility model;

[0018] Figure 4 It is a front view of an embodiment of the utility model;

[0019] The accompanying drawings are marked with: 1 base, 2 rotating seat, 3 support column, 31 support groove, 32 arc-shaped retaining edge, 4 latch, 5 fan-shaped protrusion, 6 installation groove, 7 pick-and-place channel, 8 rotating shaft. DETAILED DESCRIPTION

[0020] To further illustrate the various embodiments, the present invention provides drawings. These drawings are part of the disclosure of the present invention, which are mainly used to illustrate the embodiments and can be used in conjunction with the relevant descriptions in the specification to explain the operating principles of the embodiments. With reference to these contents, a person of ordinary skill in the art should be able to understand other possible implementations and advantages of the present invention. The components in the figures are not drawn to scale, and similar component symbols are generally used to represent similar components.

[0021] In the description of the present invention, unless otherwise specified, "multiple" means two or more; the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third" and the like are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0022] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0023] See also Figure 1-4As shown, as an embodiment of the utility model, a support base for a wafer carrier is provided, specifically a support base for a wafer carrier for a silicon carbide epitaxial furnace, which includes a base 1 and a rotating base 2 rotatably arranged on the base 1, a plurality of latch groups are arranged on the rotating base 2, each latch group includes a plurality of latches 4, a support column 3 is detachably mounted on the latch 4, a support groove 31 is formed on the inner side of the top surface of the support column 3, an arc-shaped rib 32 is formed on the outer side of the top surface of the support column 3, and the arc of the arc-shaped rib 32 of the corresponding plurality of support columns 3 on the same latch group The support grooves 31 and the arc-shaped retaining edges 32 of the plurality of support columns 3 cooperate with each other to realize supporting and limiting the wafer carrier, that is, the support grooves 31 are used to support the wafer carrier, and the arc-shaped retaining edges 32 are used to block and limit the wafer carrier, so as to prevent the carrier from slipping out of the support grooves 31, and a pick-and-place channel 7 is formed between two adjacent support columns 3 for a human hand to extend into to stably place the wafer carrier on the support grooves 31, or to extend to stably take the wafer carrier out of the support grooves 31.

[0024] The utility model realizes the support and limiting of the wafer carrier through the cooperation of the support grooves 31 of the corresponding multiple support columns 3 on the same multiple pin groups and the arc-shaped retaining edge 32, and a pick-up and placement channel 7 is formed between two adjacent support columns 3, so that when placing the wafer in the LPEPE106A epitaxial furnace for the silicon carbide epitaxial growth process, the palm of the staff can be inserted through the pick-up and placement channel 7 to stably place the wafer carrier on the support groove 31 and finally put it into the Holder, or extend through the pick-up and placement channel 7 to stably take the wafer carrier out of the support groove 31 and put it down on the table; during this operation, the carrier plate can remain stable when it is lifted up or put down with one hand, thereby preventing the wafer and the carrier plate from sliding and colliding, thereby avoiding an increase in dropped objects, that is, the carrier plate with the silicon carbide wafer placed on it will not contaminate the silicon carbide wafer due to improper operation during the operation of entering the Holder, thereby improving the surface yield of the silicon carbide wafer and thus improving the quality of the silicon carbide wafer; and the carrier plate base realizes the vertical lifting and lowering of the wafer carrier plate from multiple directions, and the operation is simple and quick.

[0025] In this embodiment, there are four support columns 3, and the four support columns 3 are arranged in a ring shape and evenly disposed on the rotating base 2. Of course, the number of support columns 3 can be set to more than three or multiple numbers according to usage conditions and application scenarios, and there is no limitation here.

[0026] In this embodiment, the support column 3 is mounted on the latch 4 in a height-adjustable manner, so that the height can be appropriately adjusted according to usage and application scenarios.

[0027] In this embodiment, a plurality of fan-shaped protrusions 5 are formed on the top of the rotating seat 2, and a mounting groove 6 is formed between two adjacent fan-shaped protrusions 5. The length direction of the mounting groove 6 is the same as the radial direction of the rotating seat 2. The latches 4 are arranged on the mounting groove 6 along the length direction of the mounting groove 6. The support column 3 is detachably limited and installed on the mounting groove 6 by the latches 4, that is, the inner walls on both sides of the mounting groove 6 are used to abut and limit the two sides of the support column 3 to prevent the support column 3 from rotating, thereby improving the stability of the chip carrier for supporting.

[0028] In this embodiment, multiple pins 4 on each pin group are arranged in a ring shape, and there are two pin groups, namely an inner ring pin group and an outer ring pin group. The circular ring corresponding to the pins 4 on the inner ring pin group is the inner circular ring, and the circular ring corresponding to the pins 4 on the outer ring pin group is the outer circular ring. The inner circular ring and the outer circular ring are arranged concentrically, and the diameter of the inner circular ring is smaller than the diameter of the outer circular ring. The support column 3 can be installed on the pins 4 of the pin groups of different sizes according to specific needs, so as to adapt to chip carriers of different sizes. In this embodiment, the support column 3 of the pin 4 installed on the inner ring pin group can be used to support a chip carrier with a diameter of 4 inches, and the support column 3 of the pin 4 installed on the outer ring pin group can be used to support a chip carrier with a diameter of 6 inches. Of course, the pin group can also be multiple in other numbers, such as three, so as to adapt to more chip carriers of different sizes, such as 8 inches, 12 inches and above.

[0029] In this embodiment, a rotating shaft 8 is also included, and the base 1 is a disc base. The center of the rotating seat 2 is rotatably set at the center of the base 1 through the rotating shaft 8, so that the rotating seat 2 and the disc base are coaxially set to ensure the rotation reliability of the rotating seat 2, thereby improving the stability of the bearing support for the chip carrier.

[0030] Although the present invention has been specifically demonstrated and described in conjunction with the preferred embodiments, those skilled in the art should understand that various changes made to the present invention in form and detail, without departing from the spirit and scope of the present invention as defined in the appended claims, shall fall within the scope of protection of the present invention.

Claims

1. A support base for a wafer carrier, characterized in that: The invention comprises a base and a rotating base rotatably arranged on the base, a plurality of latch groups are arranged on the rotating base, each latch group comprises a plurality of latches, a support column is detachably mounted on the latch, a support groove is formed on the inner side of the top surface of the support column, an arc-shaped rib is formed on the outer side of the top surface of the support column, the arc centers of the arc-shaped ribs of the corresponding plurality of support columns on the same latch group are the same, the support grooves of the plurality of support columns and the arc-shaped ribs cooperate with each other to realize the support and limiting of the wafer carrier, a pick-up and placement channel is formed between two adjacent support columns, for allowing a human palm to be inserted to place the wafer carrier stably on the support groove, or to be extended to take the wafer carrier stably out of the support groove.

2. The support base of the wafer carrier according to claim 1, characterized in that: There are four support columns, which are arranged in a ring and evenly arranged on the rotating seat.

3. The support base of the wafer carrier according to claim 1, characterized in that: A plurality of fan-shaped protrusions are formed on the top of the rotating seat, and a mounting groove is formed between two adjacent fan-shaped protrusions. The length direction of the mounting groove is the same as the radial direction of the rotating seat. The latches are arranged on the mounting groove along the length direction of the mounting groove, and the support column is detachably mounted on the mounting groove through the latches.

4. The support base of the wafer carrier according to claim 1, characterized in that: The multiple latch pins on each latch pin group are arranged in a ring shape.

5. The support base of the wafer carrier according to claim 4, characterized in that: There are two pin groups, namely an inner ring pin group and an outer ring pin group. The ring corresponding to the pins on the inner ring pin group is the inner ring, and the ring corresponding to the pins on the outer ring pin group is the outer ring. The inner ring and the outer ring are arranged concentrically, and the diameter of the inner ring is smaller than the diameter of the outer ring.

6. The support base of the wafer carrier according to claim 1, characterized in that: The base is a disc base.

7. The support base of the wafer carrier according to claim 1, characterized in that: It also includes a rotating shaft, and the center of the rotating seat is rotatably arranged at the center of the base through the rotating shaft.

8. The support base of the wafer carrier according to claim 1, characterized in that: The support column is height-adjustable and mounted on the latch.

Images