Arc starting cavity assembly for ion source mechanism

Abstract

The utility model provides an arcing cavity assembly for an ion source mechanism, which comprises a bearing assembly component, a support accommodating component, an electron emission component, an electron reflection component, a gas introduction component and a guide drainage component, and is characterized in that an emission carrier plate provided with an emission end cover is arranged on a support transverse plate; the lamp filament assembly can emit electrons to the inner side of the emission carrier plate through the emission end cover, a reflection carrier plate provided with a reflection end plate is arranged, the reflection end plate reflects the electrons emitted by the emission end cover, and a gas introduction component is formed through combination of the inflow vertical pipe, the transfer transverse pipe and the drainage end. The top of the support side plate, the top of the emission carrier plate and the top of the reflection carrier plate are respectively provided with a guide top cover with a drainage flow port, and the matching connection structures among the support side plate, the emission carrier plate, the reflection carrier plate and the guide top cover are respectively of a quick-release structure, so that internal sediments are convenient to clean, and the service life of the support side plate, the emission carrier plate, the reflection carrier plate and the guide top cover is prolonged. Ion implantation quality can be improved, and integrated circuit performance can be improved.

Description

Technical Field

[0001] The utility model relates to integrated circuit production equipment, in particular to an arc starting chamber component used for an ion source mechanism. Background Art

[0002] Patent document CN219575557U discloses an arc-starting chamber structure, which includes a filament assembly, a cathode assembly, a semi-cylindrical arc-starting chamber assembly, a process gas introduction assembly, and a reflector assembly. The semi-cylindrical arc-starting chamber assembly adopts a semi-cylindrical chamber design, and the reflector assembly adopts a suspended reflector design. The arc-starting chamber structure is a semi-cylindrical arc-starting chamber, which can simplify the assembly and maintenance process of the ion source, effectively extend the service life of the ion source, and improve the production capacity of the ion implanter. However, this arc-starting chamber is composed of a cathode side isolation plate, a reflector side isolation plate, a semi-cylindrical isolation plate, an arc-starting chamber, an arc-starting chamber inner cover plate, and an arc-starting chamber inner cover plate. Its matching structure is relatively complex and difficult to maintain. When high-energy ions hit the inner wall of the arc-starting chamber, deposits will be formed on the inner wall, affecting the generation and quality of plasma, thereby affecting the efficiency and effect of ion implantation, resulting in a decrease in equipment performance and the emergence of safety hazards. Therefore, it is necessary to optimize the structure of this arc-starting chamber assembly to overcome the above-mentioned defects. Utility Model Content

[0003] The utility model aims to provide an arc starting chamber component for an ion source mechanism, so as to facilitate the cleaning of deposits and improve the ion injection efficiency and the operation stability of the equipment.

[0004] The technical solution adopted by the utility model to solve its technical problems is:

[0005] An arc starting chamber assembly for an ion source mechanism, comprising:

[0006] A load-bearing assembly component, which is installed on the ion source base and has an assembly space inside;

[0007] A supporting and containing member, which is mounted on the load-bearing assembly member and has a containing space inside;

[0008] An electron emission component is installed in the support and accommodating component and cooperates with the filament assembly. The filament assembly drives the electron emission assembly to emit electrons into the support and accommodating component.

[0009] An electron reflecting member is installed in the supporting and containing member, corresponds to the electron emitting member in position, is connected to a power source, and is used to reflect the electrons emitted by the electron emitting member;

[0010] A gas introduction component is installed in the supporting and containing component, is communicated with the gas supply device, and corresponds to the electron emitting component and the electron reflecting component. The process gas is introduced into the supporting and containing component by the gas introduction component, and is impacted by electrons between the electron emitting component and the electron reflecting component to form plasma;

[0011] The guiding and draining component is installed in the supporting and containing component and corresponds to the position of the electron emitting component, the electron reflecting component and the gas introducing component, and can guide the plasma outward.

[0012] The load-bearing assembly components include:

[0013] A bearing seat plate, which is arranged in the transverse direction, and its bottom is mounted on the ion source base through a connecting piece, and the supporting and accommodating component is mounted on the top of the bearing seat plate, and an assembly notch is opened on the edge of the bearing seat plate, and the assembly notch corresponds to the position of the gas introduction component;

[0014] The assembly clamping blocks are provided in a pair, each of which is arranged on both sides of the assembly notch and fixed to the bottom of the bearing seat plate through a connecting piece, so that a clamping opening is formed between the assembly clamping blocks.

[0015] The support and receiving member comprises:

[0016] A pair of supporting plates are provided, each supporting plate is mounted on the top of the bearing seat plate through a connecting piece and extends above the bearing seat plate;

[0017] A supporting horizontal plate, which is arranged in the horizontal direction and is installed on the top of the supporting vertical plate through a connecting piece, and a positioning boss is provided on the top of the supporting horizontal plate, and the positioning boss protrudes above the supporting horizontal plate;

[0018] A pair of supporting side plates are provided, each supporting side plate is placed on the top of the supporting horizontal plate and extends upwardly to the supporting horizontal plate, and its bottom abuts against the side edge of the positioning boss to form an accommodating space enclosed by the supporting side plates and the supporting horizontal plate.

[0019] The electron emitting member comprises:

[0020] The launch carrier is located above the support horizontal plate and corresponds to the support side plate. The bottom of the launch carrier is in contact with the side edge of the positioning boss. The inner wall of the launch carrier is provided with a matching recess. The end of the support side plate is inserted into the matching recess.

[0021] The emission end cover is installed in the emission carrier, and its inner wall protrudes toward the inner side of the emission carrier. The outer wall of the emission end cover forms a filament assembly accommodating space, and the filament assembly can emit electrons toward the inner side of the emission carrier through the emission end cover.

[0022] In one embodiment of the utility model, a pair of limiting protrusions are also provided on the top of the supporting horizontal plate. The limiting protrusions are located on the outside of the positioning boss and protrude above the supporting horizontal plate. The launching carrier is located between the limiting protrusions and the positioning boss. The launching carrier is positioned by the limiting protrusions and the positioning boss. The outer wall of the launching carrier is provided with a positioning groove that is adapted to the shape of the limiting protrusion, and the limiting protrusion is inserted into the positioning groove.

[0023] The electron reflection component includes:

[0024] The reflective carrier is located above the support horizontal plate and is arranged at both ends of the support side plate together with the emission carrier. The bottom of the reflective carrier is in contact with the side edge of the positioning boss. The inner wall of the reflective carrier is provided with a snap-in notch, and the end of the support side plate is snapped into the snap-in notch.

[0025] The reflective end plate is installed on the inner wall of the reflective carrier plate, corresponds to the position of the emission end cover, and is connected to the power supply through a line. The reflective end plate reflects the electrons emitted by the emission end cover.

[0026] In one embodiment of the utility model, a pair of assembly protrusions are further provided on the top of the supporting horizontal plate. The assembly protrusions are located on the outside of the positioning bosses and protrude above the supporting horizontal plate. The reflective carrier is located between the assembly protrusions and the positioning bosses. The reflective carrier is positioned by the assembly protrusions and the positioning bosses. An assembly groove matching the shape of the assembly protrusions is opened on the outer wall of the reflective carrier, and the assembly protrusions are inserted into the assembly grooves.

[0027] The gas inlet component comprises:

[0028] The inlet riser is arranged vertically and located between the assembly clamps. The assembly clamps clamp the inlet riser and position it. The bottom of the inlet riser is connected to the gas supply device through a pipeline.

[0029] A transition horizontal pipe, which is connected to the top of the inlet vertical pipe and extends below the supporting horizontal plate;

[0030] The discharge end is installed in the support horizontal plate, with its top exposed from above the support horizontal plate and located between the emitting end cover and the reflecting end plate, and its bottom connected to the adapter horizontal pipe. The process gas can be introduced into the space between the emitting end cover and the reflecting end plate through the discharge end to form plasma between the reflecting end plate and the reflecting end cover.

[0031] The flow guiding and drainage component comprises:

[0032] The guide top cover is located above the support horizontal plate and is installed on the support side plate, the emission carrier plate and the top of the reflection carrier plate. A discharge flow opening is opened inside the guide top cover. The discharge flow opening runs through both sides of the guide top cover. The plasma can be discharged from the discharge flow opening. The inner wall of the discharge flow opening is provided with a guide slope, which extends obliquely upward from the discharge flow opening to guide the discharge process of the plasma.

[0033] In one embodiment of the present invention, the discharge opening is in the shape of an elongated strip, extending in the transverse direction and perpendicular to the axis of the discharge end. After the plasma is discharged from the discharge opening, a plasma flow with a ribbon-like distribution is formed.

[0034] In one embodiment of the utility model, two pairs of snap-fitting protrusions are provided at the bottom of the guide top cover, and each snap-fitting protrusion is respectively engaged with the matching recess and the snap-fitting recess. An engaging recess is provided at the top edge of the guide top cover, and the guide top cover can be clamped by a clamping mechanism adapted thereto.

[0035] The advantages of the utility model are:

[0036] The arc starting chamber component is enclosed by a supporting horizontal plate and a supporting side plate to form a accommodating space. An emitting carrier plate with an emitting end cover is arranged on the supporting horizontal plate. The filament assembly can emit electrons to the inner side of the emitting carrier plate through the emitting end cover. A reflecting carrier plate with a reflecting end plate is arranged. The reflecting end plate reflects the electrons emitted by the emitting end cover. A gas introduction component is formed by combining an inlet vertical pipe, a transfer horizontal pipe and a discharge end head to introduce process gas between the emitting end cover and the reflecting end plate, so that plasma is formed between the reflecting end plate and the reflecting end cover. A guide top cover with a discharge flow opening is also installed on the top of the supporting side plate, the emitting carrier plate and the reflecting carrier plate. A guiding inclined surface extending obliquely upward is arranged on the inner wall of the discharge flow opening to guide the discharge process of the plasma. The matching structures among the supporting side plate, the emitting carrier plate, the reflecting carrier plate and the guide top cover all adopt a quick-release structure, which is convenient for disassembly and assembly to clean up the sediment accumulated inside, which is beneficial to improving the quality of ion implantation and improving the operating stability of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] Figure 1 It is a structural schematic diagram of an arc starting chamber assembly for an ion source mechanism proposed by the utility model;

[0038] Figure 2 This is one of the exploded views of the arc starting chamber assembly;

[0039] Figure 3 This is the second exploded view of the arc starting chamber assembly. DETAILED DESCRIPTION

[0040] In order to make the purpose, technical scheme and advantages of the embodiment of the utility model clearer, the technical scheme in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. The components of the embodiment of the utility model generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiment of the utility model provided in the drawings is not intended to limit the scope of the utility model claimed for protection, but merely represents the selected embodiment of the utility model. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the utility model.

[0041] like Figure 1 to Figure 3 As shown, the arc starting chamber assembly for the ion source mechanism proposed by the utility model includes a bearing assembly component, a supporting and accommodating component, an electron emitting component, an electron reflecting component, a gas introducing component and a guiding and draining component. The bearing assembly component is installed on the ion source base and has an assembly space inside. The supporting and accommodating component is installed on the bearing assembly component and has an accommodating space inside. The electron emitting component is installed in the supporting and accommodating component and cooperates with the filament component. The filament component drives the electron emitting component to emit electrons into the supporting and accommodating component. The electron reflecting component is installed in the supporting and accommodating component and cooperates with the electron emitting component. The position of the components corresponds to that of the components and is connected to the power supply. The electron reflecting component reflects the electrons emitted by the electron emitting component. The gas introducing component is installed in the supporting and accommodating component, which is connected to the gas supply device and corresponds to the position of the electron emitting component and the electron reflecting component. The process gas is introduced into the supporting and accommodating component by the gas introducing component, and is impacted by the electrons between the electron emitting component and the electron reflecting component to form plasma. The guiding and draining component is installed in the supporting and accommodating component and corresponds to the position of the electron emitting component, the electron reflecting component and the gas introducing component, so as to guide the plasma outward.

[0042] In Example 1, the bearing assembly component includes a bearing seat plate 110 and an assembly clamp 120. The bearing seat plate is arranged horizontally, and its bottom is installed on the ion source base through a connecting piece. The supporting and accommodating component is installed on the top of the bearing seat plate. An assembly notch 111 is opened on the edge of the bearing seat plate, and the assembly notch corresponds to the position of the gas inlet component. A pair of assembly clamps are provided, and each assembly clamp is arranged on both sides of the assembly notch and is fixed to the bottom of the bearing seat plate through a connecting piece to form a clamping opening between the assembly clamps.

[0043] The supporting and containing components include a supporting upright plate 210, a supporting transverse plate 220 and a supporting side plate 230. A pair of supporting upright plates are provided, each of which is installed on the top of the supporting seat plate through a connecting piece and extends upward from the supporting seat plate. The supporting transverse plate is arranged in the transverse direction and is installed on the top of the supporting upright plate through a connecting piece. A positioning boss 221 is provided on the top of the supporting upright plate, and the positioning boss protrudes upward from the supporting transverse plate. A pair of supporting side plates are provided, each of which is placed on the top of the supporting transverse plate and extends upward from the supporting transverse plate, and its bottom is in contact with the side edge of the positioning boss, and a containing space is formed by the supporting side plates and the supporting transverse plate.

[0044] The electron emission component includes an emission carrier plate 310 and an emission end cover 320. The emission carrier plate is located above the support horizontal plate and corresponds to the position of the support side plate. Its bottom is in contact with the side edge of the positioning boss, and its inner wall is provided with a matching recess 311. The end of the support side plate is inserted into the matching recess. The emission end cover is installed in the emission carrier plate, and its inner wall protrudes toward the inner side of the emission carrier plate. A filament assembly accommodating space is formed on the outer wall of the emission end cover. The filament assembly can emit electrons toward the inner side of the emission carrier plate through the emission end cover.

[0045] The electron reflecting component includes a reflecting carrier plate 410 and a reflecting end plate 420. The reflecting carrier plate is located above the supporting horizontal plate, and is arranged at both ends of the supporting side plate together with the transmitting carrier plate. Its bottom is in contact with the side edge of the positioning boss, and its inner wall is provided with a snap-in recess 411. The end of the supporting side plate is snapped into the snap-in recess. The reflecting end plate is installed on the inner wall of the reflecting carrier plate, which corresponds to the position of the transmitting end cover and is connected to the power supply through a line. The reflecting end plate reflects the electrons emitted by the transmitting end cover.

[0046] The gas introduction component includes an inlet vertical pipe 510, a switching horizontal pipe 520 and a discharge terminal 530. The inlet vertical pipe is arranged vertically and is located between the assembly clamps. The inlet vertical pipe is clamped and positioned by the assembly clamps. The bottom of the inlet vertical pipe is connected to the gas supply equipment through a pipeline. The switching horizontal pipe is connected to the top of the inlet vertical pipe and extends to the bottom of the supporting horizontal plate. The discharge terminal is installed in the supporting horizontal plate, and its top is exposed from above the supporting horizontal plate and is located between the emission end cover and the reflection end plate. The bottom of the discharge terminal is connected to the switching horizontal pipe, and the process gas can be introduced between the emission end cover and the reflection end plate through the discharge terminal to form plasma between the reflection end plate and the reflection end cover.

[0047] The guiding and draining component includes a guiding top cover 600, which is located above the supporting horizontal plate and is installed on the supporting side plate, the emitting carrier plate and the top of the reflecting carrier plate. A drain opening 610 is opened inside the top cover, and the plasma can be discharged from the drain opening. The inner wall of the drain opening is provided with a guiding slope, which extends obliquely upward from the drain opening to guide the discharge process of the plasma.

[0048] In Example 2, the bearing assembly component includes a bearing seat plate 110 and an assembly clamp 120. The bearing seat plate is arranged horizontally, and its bottom is installed on the ion source base through a connecting piece. The supporting and accommodating component is installed on the top of the bearing seat plate. An assembly notch 111 is opened on the edge of the bearing seat plate, and the assembly notch corresponds to the position of the gas inlet component. A pair of assembly clamps are provided, and each assembly clamp is arranged on both sides of the assembly notch and is fixed to the bottom of the bearing seat plate through a connecting piece to form a clamping opening between the assembly clamps.

[0049] The supporting and containing components include a supporting upright plate 210, a supporting transverse plate 220 and a supporting side plate 230. A pair of supporting upright plates are provided, each of which is installed on the top of the supporting seat plate through a connecting piece and extends upward from the supporting seat plate. The supporting transverse plate is arranged in the transverse direction and is installed on the top of the supporting upright plate through a connecting piece. A positioning boss 221 is provided on the top of the supporting upright plate, and the positioning boss protrudes upward from the supporting transverse plate. A pair of supporting side plates are provided, each of which is placed on the top of the supporting transverse plate and extends upward from the supporting transverse plate, and its bottom is in contact with the side edge of the positioning boss, and a containing space is formed by the supporting side plates and the supporting transverse plate.

[0050] The electron emission component includes an emission carrier plate 310 and an emission end cover 320. The emission carrier plate is located above the support horizontal plate and corresponds to the position of the support side plate. Its bottom is in contact with the side edge of the positioning boss, and its inner wall is provided with a matching recess 311. The end of the support side plate is inserted into the matching recess. The emission end cover is installed in the emission carrier plate, and its inner wall protrudes toward the inner side of the emission carrier plate. A filament assembly accommodating space is formed on the outer wall of the emission end cover. The filament assembly can emit electrons toward the inner side of the emission carrier plate through the emission end cover.

[0051] In this embodiment, a pair of limiting protrusions 222 are also provided on the top of the supporting horizontal plate. The limiting protrusions are located on the outside of the positioning boss and protrude above the supporting horizontal plate. The launching carrier is located between the limiting protrusions and the positioning boss. The launching carrier is positioned by the limiting protrusions and the positioning boss. The outer wall of the launching carrier is provided with a positioning groove 312 that is adapted to the shape of the limiting protrusion, and the limiting protrusion is inserted into the positioning groove.

[0052] The electron reflecting component includes a reflecting carrier plate 410 and a reflecting end plate 420. The reflecting carrier plate is located above the supporting horizontal plate, and is arranged at both ends of the supporting side plate together with the transmitting carrier plate. Its bottom is in contact with the side edge of the positioning boss, and its inner wall is provided with a snap-in recess 411. The end of the supporting side plate is snapped into the snap-in recess. The reflecting end plate is installed on the inner wall of the reflecting carrier plate, which corresponds to the position of the transmitting end cover and is connected to the power supply through a line. The reflecting end plate reflects the electrons emitted by the transmitting end cover.

[0053] In this embodiment, a pair of assembly protrusions 223 are also provided on the top of the supporting horizontal plate. The assembly protrusions are located on the outside of the positioning bosses and protrude above the supporting horizontal plate. The reflective carrier is located between the assembly protrusions and the positioning bosses. The reflective carrier is positioned by the assembly protrusions and the positioning bosses. The outer wall of the reflective carrier is provided with an assembly groove 412 that is adapted to the shape of the assembly protrusions, and the assembly protrusions are snapped into the assembly grooves.

[0054] The gas introduction component includes an inlet vertical pipe 510, a switching horizontal pipe 520 and a discharge terminal 530. The inlet vertical pipe is arranged vertically and is located between the assembly clamps. The inlet vertical pipe is clamped and positioned by the assembly clamps. The bottom of the inlet vertical pipe is connected to the gas supply equipment through a pipeline. The switching horizontal pipe is connected to the top of the inlet vertical pipe and extends to the bottom of the supporting horizontal plate. The discharge terminal is installed in the supporting horizontal plate, and its top is exposed from above the supporting horizontal plate and is located between the emission end cover and the reflection end plate. The bottom of the discharge terminal is connected to the switching horizontal pipe, and the process gas can be introduced between the emission end cover and the reflection end plate through the discharge terminal to form plasma between the reflection end plate and the reflection end cover.

[0055] The guiding and draining component includes a guiding top cover 600, which is located above the supporting horizontal plate and is installed on the supporting side plate, the emitting carrier plate and the top of the reflecting carrier plate. A drain opening 610 is opened inside the top cover, and the plasma can be discharged from the drain opening. The inner wall of the drain opening is provided with a guiding slope, which extends obliquely upward from the drain opening to guide the discharge process of the plasma.

[0056] In this embodiment, the discharge opening is in the shape of an elongated strip, extending in the transverse direction and perpendicular to the axis of the discharge end. After the plasma is discharged from the discharge opening, a plasma flow with a ribbon-like distribution is formed.

[0057] In this embodiment, two pairs of snap-fitting protrusions 620 are provided at the bottom of the guide top cover, and each snap-fitting protrusion is respectively engaged with the matching recess and the snap-fitting recess. An engaging recess 630 is provided at the top edge of the guide top cover, and the guide top cover can be clamped by a clamping mechanism adapted thereto.

[0058] In the description of the present utility model, it should be noted that when terms such as "upper", "lower", "inner", "outer", "left", "right" and the like indicating orientation or positional relationship appear, it should be understood that the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the utility model product is usually placed when in use, or the orientation or positional relationship commonly understood by those skilled in the art, is only for the convenience of describing the present utility model and simplifying the description, and does not indicate or imply that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present utility model. In addition, when terms such as "first" and "second" appear, they are only used to distinguish the description, and cannot be understood as indicating or implying relative importance. In the description of the present utility model, it should also be noted that, unless otherwise clearly specified and limited, terms such as "installation", "setting", and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements. For those skilled in the art, the specific meanings of the above terms in the present utility model can be understood according to specific circumstances.

Claims

1. An arc starting chamber assembly for an ion source mechanism, characterized in that: include: A load-bearing assembly component, which is installed on the ion source base and has an assembly space inside; A supporting and containing member, which is mounted on the load-bearing assembly member and has a containing space inside; An electron emission component is installed in the support and accommodating component and cooperates with the filament assembly. The filament assembly drives the electron emission assembly to emit electrons into the support and accommodating component. An electron reflecting member is installed in the supporting and containing member, corresponds to the electron emitting member in position, is connected to a power source, and is used to reflect the electrons emitted by the electron emitting member; A gas introduction component is installed in the supporting and containing component, is communicated with the gas supply device, and corresponds to the electron emitting component and the electron reflecting component. The process gas is introduced into the supporting and containing component by the gas introduction component, and is impacted by electrons between the electron emitting component and the electron reflecting component to form plasma; The guiding and draining component is installed in the supporting and containing component and corresponds to the position of the electron emitting component, the electron reflecting component and the gas introducing component, and can guide the plasma outward.

2. An arc starting chamber assembly for an ion source mechanism according to claim 1, characterized in that: The load-bearing assembly components include: A bearing seat plate, which is arranged in the transverse direction, and its bottom is mounted on the ion source base through a connecting piece, and the supporting and accommodating component is mounted on the top of the bearing seat plate, and an assembly notch is opened on the edge of the bearing seat plate, and the assembly notch corresponds to the position of the gas introduction component; The assembly clamping blocks are provided in a pair, each of which is arranged on both sides of the assembly notch and fixed to the bottom of the bearing seat plate through a connecting piece, so that a clamping opening is formed between the assembly clamping blocks.

3. An arc starting chamber assembly for an ion source mechanism according to claim 2, characterized in that: The support and receiving member comprises: A pair of supporting plates are provided, each supporting plate is mounted on the top of the bearing seat plate through a connecting piece and extends above the bearing seat plate; A supporting horizontal plate, which is arranged in the horizontal direction and is installed on the top of the supporting vertical plate through a connecting piece, and a positioning boss is provided on the top of the supporting horizontal plate, and the positioning boss protrudes above the supporting horizontal plate; A pair of supporting side plates are provided, each supporting side plate is placed on the top of the supporting horizontal plate and extends upwardly to the supporting horizontal plate, and its bottom abuts against the side edge of the positioning boss to form an accommodating space enclosed by the supporting side plates and the supporting horizontal plate.

4. The arc starting chamber assembly for an ion source mechanism according to claim 3, characterized in that: The electron emitting member comprises: The launch carrier is located above the support horizontal plate and corresponds to the support side plate. The bottom of the launch carrier is in contact with the side edge of the positioning boss. The inner wall of the launch carrier is provided with a matching recess. The end of the support side plate is inserted into the matching recess. The emission end cover is installed in the emission carrier, and its inner wall protrudes toward the inner side of the emission carrier. The outer wall of the emission end cover forms a filament assembly accommodating space, and the filament assembly can emit electrons toward the inner side of the emission carrier through the emission end cover.

5. The arc starting chamber assembly for an ion source mechanism according to claim 4, characterized in that: The electron reflection component includes: The reflective carrier is located above the support horizontal plate and is arranged at both ends of the support side plate together with the emission carrier. The bottom of the reflective carrier is in contact with the side edge of the positioning boss. The inner wall of the reflective carrier is provided with a snap-in notch, and the end of the support side plate is snapped into the snap-in notch. The reflective end plate is installed on the inner wall of the reflective carrier plate, corresponds to the position of the emission end cover, and is connected to the power supply through a line. The reflective end plate reflects the electrons emitted by the emission end cover.

6. The arc starting chamber assembly for an ion source mechanism according to claim 5, characterized in that: The gas inlet component comprises: The inlet riser is arranged vertically and located between the assembly clamps. The assembly clamps clamp the inlet riser and position it. The bottom of the inlet riser is connected to the gas supply device through a pipeline. A transition horizontal pipe, which is connected to the top of the inlet vertical pipe and extends below the supporting horizontal plate; The discharge end is installed in the support horizontal plate, with its top exposed from above the support horizontal plate and located between the emitting end cover and the reflecting end plate, and its bottom connected to the adapter horizontal pipe. The process gas can be introduced into the space between the emitting end cover and the reflecting end plate through the discharge end to form plasma between the reflecting end plate and the reflecting end cover.

7. An arc starting chamber assembly for an ion source mechanism according to claim 6, characterized in that: The flow guiding and drainage component comprises: The guide top cover is located above the support horizontal plate and is installed on the support side plate, the emission carrier plate and the top of the reflection carrier plate. A discharge flow opening is opened inside the guide top cover. The discharge flow opening runs through both sides of the guide top cover. The plasma can be discharged from the discharge flow opening. The inner wall of the discharge flow opening is provided with a guide slope, which extends obliquely upward from the discharge flow opening to guide the discharge process of the plasma.

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