Polishing solution supply device

Abstract

The polishing liquid supply device (1) is used for supplying polishing liquid to a polishing machine (2) and comprises a material barrel (11) containing the polishing liquid, the material barrel is connected with the polishing machine through a supply pipe (12), the supply pipe is provided with a water pump (13) used for pumping the polishing liquid to the polishing machine, and the supply pipe is further provided with a filter (14) and a pressure gauge (15). The filter is used for filtering particle impurities in the polishing solution, and the pressure gauge is used for detecting the hydraulic pressure in the supply pipe to monitor the blockage condition of the filter. According to the polishing solution supply device, particle impurities in polishing solution can be effectively filtered out through the filter arranged on the supply pipe, meanwhile, the hydraulic pressure in the supply pipe is detected through the pressure gauge, whether the filter and the supply pipe are blocked or not can be judged according to the hydraulic pressure, an operator can check the blocking reason in time, and the working efficiency is improved. And negative effects caused by blockage of the filter and the supply pipe are avoided.

Description

Technical Field

[0001] The present disclosure relates to the technical field of polishing machines, and in particular to a polishing liquid supply device. Background Art

[0002] In the processing and manufacturing process of optical glass such as sapphire glass, polishing is an extremely important surface precision processing process. A polishing machine is usually used to polish the surface of sapphire glass. In the polishing process, polishing liquid is one of the most important consumables. The quality of the polishing liquid will directly affect the polishing removal rate and surface quality of sapphire. The polishing liquid is provided by a polishing liquid supply device. Specifically, the polishing liquid in the barrel is pumped into the polishing machine through a supply pipe. During the supply process, the polishing liquid is prone to produce particulate impurities, which will scratch the surface of sapphire, thereby reducing the surface quality of sapphire. In addition, particulate impurities may cause blockage of the supply pipe, which in turn causes an abnormal increase in the hydraulic pressure in the supply pipe, causing damage to units such as the water pump in the supply device. Therefore, how to remove particulate impurities in the polishing liquid and avoid blockage of the supply pipe is an urgent problem to be solved. Utility Model Content

[0003] The technical problem to be solved by the present disclosure is: how to remove particulate impurities in the polishing liquid and avoid clogging of the supply pipe.

[0004] In order to solve the above technical problems, the embodiment of the present disclosure provides a polishing liquid supply device for supplying polishing liquid to a polishing machine, including a barrel containing polishing liquid, the barrel being connected to the polishing machine through a supply pipe, the supply pipe being provided with a water pump for pumping the polishing liquid to the polishing machine, the supply pipe being also provided with a filter and a pressure gauge, the filter being used to filter particulate impurities in the polishing liquid, and the pressure gauge being used to detect the hydraulic pressure in the supply pipe to monitor the blockage condition of the filter.

[0005] In some embodiments, a pressure gauge is provided on the supply pipe between the filter and the water pump.

[0006] In some embodiments, the polishing liquid supply device also includes an alarm, which is electrically connected to the pressure gauge, and the alarm is used to execute an alarm according to the hydraulic pressure detected by the pressure gauge.

[0007] In some embodiments, the alarm is an audible and visual alarm.

[0008] In some embodiments, a control valve for controlling the on-off of the supply pipe is also provided on the supply pipe.

[0009] In some embodiments, the supply tube is a rigid tube.

[0010] In some embodiments, the polishing liquid supply device further includes a flow meter disposed on the supply pipe.

[0011] In some embodiments, a stirring rod is provided in the barrel, and the stirring rod is used to stir the polishing liquid.

[0012] Through the above technical solution, the polishing liquid supply device can effectively filter out particulate impurities in the polishing liquid through the filter set on the supply pipe; at the same time, the polishing liquid supply device detects the hydraulic pressure in the supply pipe through the pressure gauge, and then can judge whether the filter is blocked according to the hydraulic pressure. Therefore, by setting the filter and the pressure gauge on the supply pipe and working together, not only can the particulate impurities in the polishing liquid be effectively removed, but also the filter can be monitored to see whether it is blocked, and the operator can be reminded in time to replace or clean the filter element of the filter, so as to avoid the adverse consequences caused by filter blockage. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present disclosure. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0014] Figure 1 is a schematic structural diagram of a polishing liquid supply device in one embodiment;

[0015] Figure 2 is a schematic structural diagram of a filter in one embodiment;

[0016] Figure 3 It is a schematic diagram of the structure of a filter disassembly and assembly wrench in one embodiment.

[0017] Description of reference numerals:

[0018] 1. Polishing liquid supply device; 11. Material barrel; 12. Supply pipe; 13. Water pump; 14. Filter; 141. Top cover; 142. Filter cotton core barrel; 143. Card slot; 144. Disassembly and assembly wrench; 1441. Card block; 15. Pressure gauge; 16. Alarm; 17. Control valve; 2. Polishing machine. DETAILED DESCRIPTION

[0019] The following is a further detailed description of the embodiments of the present disclosure in conjunction with the accompanying drawings and examples. The detailed description of the following embodiments and the accompanying drawings are used to exemplarily illustrate the principles of the present disclosure, but cannot be used to limit the scope of the present disclosure. The present disclosure can be implemented in many different forms and is not limited to the specific embodiments disclosed herein, but includes all technical solutions that fall within the scope of the claims.

[0020] The present disclosure provides these embodiments to make the present disclosure thorough and complete, and to fully express the scope of the present disclosure to those skilled in the art. It should be noted that unless otherwise specifically stated, the relative arrangement of the parts and steps, the composition of the materials, the numerical expressions and the numerical values ​​set forth in these embodiments should be interpreted as being merely exemplary, and not as limiting.

[0021] It should be noted that, in the description of the present disclosure, unless otherwise specified, the meaning of "multiple" is greater than or equal to two; the terms "upper", "lower", "left", "right", "inner", "outer", etc., indicating the orientation or positional relationship, are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present disclosure. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0022] In addition, the words "first", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different parts. "Vertical" does not mean vertical in the strict sense, but is within the tolerance range. "Parallel" does not mean parallel in the strict sense, but is within the tolerance range. "Include" or "comprising" and similar words mean that the elements before the word include the elements listed after the word, and do not exclude the possibility of including other elements.

[0023] It should also be noted that in the description of the present disclosure, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to the specific circumstances. When a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first device or the second device.

[0024] All terms used in the present disclosure have the same meanings as those understood by those of ordinary skill in the art to which the present disclosure belongs, unless otherwise specifically defined. It should also be understood that terms defined in general dictionaries, for example, should be interpreted as having meanings consistent with their meanings in the context of the relevant technology, and should not be interpreted in an idealized or extremely formal sense, unless explicitly defined as such herein.

[0025] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.

[0026] Example

[0027] Reference Figure 1 The present embodiment provides a polishing liquid supply device 1, which is used to supply polishing liquid to a polishing machine 2, including a barrel 11 containing polishing liquid, the barrel 11 is connected to the polishing machine 2 through a supply pipe 12, the supply pipe 12 is provided with a water pump 13 for pumping the polishing liquid to the polishing machine 2, the supply pipe 12 is also provided with a filter 14 and a pressure gauge 15, the filter 14 is used to filter particulate impurities in the polishing liquid, and the pressure gauge 15 is used to detect the hydraulic pressure in the supply pipe 12 to monitor the blockage condition of the filter 14.

[0028] The polishing liquid supply device 1 can effectively filter out the particulate impurities in the polishing liquid through the filter 14 arranged on the supply pipe 12; at the same time, the polishing liquid supply device 1 detects the hydraulic pressure in the supply pipe 12 through the pressure gauge 15, and can then judge whether the filter 14 is blocked according to the hydraulic pressure. Therefore, by the filter 14 and the pressure gauge 15 arranged on the supply pipe 12 and working together, not only can the particulate impurities in the polishing liquid be effectively removed, but also the filter 14 can be monitored to see whether it is blocked, and the operator can be reminded in time to replace or clean the filter element of the filter to avoid the adverse consequences caused by the blockage of the filter 14. The blockage of the filter 14 refers to the phenomenon that after the filter has been running for a certain period of time, its filter element absorbs a large amount of particulate impurities, resulting in a significant reduction in the water volume at the water outlet of the filter 14. The blockage of the filter 14 will cause the hydraulic pressure at the water inlet end to increase abnormally, and the abnormally increased hydraulic pressure will drive the particulate impurities through the filter 14, thereby reducing the filtering effect; the blockage of the filter 14 will also affect the supply efficiency of the polishing liquid. In addition, when the corner of the supply pipe 12 is clogged due to the deposition of particulate impurities, the hydraulic pressure detected by the pressure gauge 15 will also increase abnormally. Therefore, the pressure gauge 15 can also be used to monitor the blockage condition of the supply pipe 12.

[0029] The polishing machine 2 may be a sapphire polishing machine, and the polishing liquid is a special silicon oxide liquid used for polishing the sapphire lens.

[0030] In some embodiments, a pressure gauge 15 is provided on the supply pipe 12 between the filter 14 and the water pump 13 to facilitate monitoring of the blockage of the supply pipe 12 caused by the blockage of the filter 14. When the water pump 13 is working, it will provide kinetic energy to the polishing liquid in the supply pipe 12, and the hydraulic pressure of the polishing liquid will also increase, driving the polishing liquid to be transported to the polishing machine 2. In the polishing process, the filter 14 is often blocked due to the filter element of the filter 14 being filled with particulate impurities, etc. At this time, an abnormally high hydraulic pressure will be generated on the supply pipe 12 between the filter 14 and the water meter. The long-term abnormal hydraulic pressure will not only damage the water pump 13, but also affect the filtering effect of the filter 14 and even damage the filter 14. Therefore, it is necessary to promptly detect the hydraulic abnormality and then troubleshoot the cause of the abnormality. By detecting the hydraulic pressure through the pressure gauge 15, the hydraulic abnormality can be detected in time, and then it can be further checked whether the filter 14 is blocked.

[0031] In some embodiments, the polishing liquid supply device 1 also includes an alarm 16, which is electrically connected to the pressure gauge 15. The alarm 16 is used to execute an alarm according to the hydraulic pressure detected by the pressure gauge 15 to more effectively monitor the clogging condition of the filter 14. The pressure gauge 15 can be an electronic pressure gauge, such as a digital pressure gauge. The alarm 16 is configured to receive the hydraulic value transmitted by the pressure gauge 15, and determine whether the hydraulic value exceeds a preset threshold of the alarm, and then execute an alarm according to the judgment result. Specifically, the pressure gauge 15 transmits the detected hydraulic value to the alarm 16 connected thereto, and the alarm 16 receives the hydraulic value and determines whether the hydraulic value exceeds a preset threshold. If so, the alarm 16 executes an alarm to remind the operator of hydraulic abnormality. In some embodiments, the alarm 16 is an audible and visual alarm to more effectively remind the operator through sound and light signals.

[0032] In some embodiments, a control valve 17 is further provided on the supply pipe 12 to control the opening and closing of the supply pipe 12 through the control valve 17. The control valve 17 is configured to be able to control the opening degree, so as to adjust the flow rate of the polishing liquid by adjusting the opening degree of the control valve 17.

[0033] In some embodiments, the polishing liquid supply device 1 further includes a flow meter ( Figure 1 The flow meter is arranged on the supply pipe 12, and further, the flow meter can be arranged on the supply pipe 12 near the polishing machine 2. The flow meter can monitor the flow change in the supply pipe 12, and then monitor whether the filter 14 and the supply pipe 12 are blocked. The supply pipe 12 is more comprehensively monitored by the flow meter in conjunction with the pressure gauge 15, so as to more accurately and timely find abnormalities such as blockage of the filter 14 and the supply pipe 12.

[0034] In some embodiments, the supply pipe 12 is a hard pipe, so that the hard pipe can withstand higher hydraulic pressure to prevent pipe rupture or pipe leakage caused by abnormal increase in hydraulic pressure. The corners of the hard pipe are set to arcs, so that the polishing liquid can pass through the arc corners more smoothly to avoid blockage at the corners. In other embodiments, the supply pipe 12 is a hose, which has the expected pressure resistance to avoid the hose bursting due to the increase in hydraulic pressure therein, and the hose is more likely to be set with arc corners to avoid blockage at the corners.

[0035] In some embodiments, a filter element is disposed in the filter 14, and the filter element is a filter cotton core. The filter cotton core is a deep filter element, which can effectively remove suspended matter, particles and other particulate impurities in the polishing liquid and has very good filtering characteristics.

[0036] In some embodiments, a stirring rod is provided in the barrel 11, and the stirring rod is used to stir the polishing liquid in the barrel 11 to prevent liquid crystallization and particle aggregation. The stirring rod is configured to be driven by an electric drive device, such as a motor, to achieve automatic stirring.

[0037] Continue to refer to Figure 1 , the following Figure 1 The structure of the polishing liquid supply device 1 shown is further explained. The polishing liquid supply device 1 includes a barrel 11 and a supply pipe 12 connecting the barrel 11 and the polishing machine 2. The supply pipe 12 is provided with a water pump 13, a pressure gauge 15, a filter 14 and a control valve 17 in sequence from the inlet end close to the barrel 11 to the outlet end close to the polishing machine 2. The barrel 11 can be set on the ground or a table. The polishing machine 2 is usually higher than the barrel 11, so the outlet end of the supply pipe 12 is usually higher than the inlet end. The water pump 13 generates hydraulic pressure for the polishing liquid in the supply pipe 12. Under the action of the hydraulic pressure, the polishing liquid is pumped into the polishing machine 2. The control valve 17 can control the pumping process. The filter 14 is used to filter out particulate impurities in the polishing liquid. At the same time, the setting of the filter 14 is prone to the problem of filter 14 clogging, which leads to abnormal increase of the hydraulic pressure in the supply pipe 12. The abnormal hydraulic pressure will damage the water pump 13 and the filter 14. In view of this, a pressure gauge 15 is provided on the supply pipe 12, and the pressure gauge 15 can detect hydraulic abnormality in time, thereby monitoring the problem of clogging of the filter 14. The polishing liquid supply device 1 can also be provided with an alarm 16 electrically connected to the pressure gauge 15, and the alarm 16 is used to execute an alarm according to the hydraulic pressure detected by the pressure gauge 15.

[0038] Reference Figure 2-Figure 3 , Figure 2The figure shows a schematic diagram of the structure of the filter 14 in the present embodiment. The filter 14 includes a filter cotton core barrel 142 and a top cover 141 which is a detachable cover arranged above the filter cotton core barrel 142. A wire-wound filter cotton core is arranged in the filter cotton core barrel 142. The filter cotton core of the filter 14 is easy to replace. When the filter cotton core needs to be replaced, the top cover 141 can be removed from the filter cotton core barrel 142, and then the filter cotton core can be replaced. The polishing liquid at the bottom of the filter cotton core barrel 142 will not be lost, thus avoiding the waste of polishing liquid caused by replacing the filter element. A slot 143 can be arranged at the upper edge of the top cover 141, and a plurality of slots 143 can be arranged at intervals along the edge. The filter 14 can also be provided with Figure 3 The disassembly wrench 144 shown in the figure has a block 1441 that cooperates with the slot 143 on the wrench body of the disassembly wrench 144. When the wrench body is driven to rotate, the block 1441 can engage with the slot 143 and drive the top cover 141 to rotate synchronously. The disassembly wrench 144 can quickly disassemble and assemble the top cover 141, thereby improving the replacement efficiency of the filter cotton core. The pipelines connected to both sides of the filter 14 are preferably hoses to prevent the hard pipe from limiting the top cover 141 and thus affecting the disassembly of the top cover 141.

[0039] So far, various embodiments of the present disclosure have been described in detail. In order to avoid obscuring the concept of the present disclosure, some details known in the art are not described. Based on the above description, those skilled in the art can fully understand how to implement the technical solution disclosed here.

[0040] Although some specific embodiments of the present disclosure have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present disclosure. It should be understood by those skilled in the art that the above embodiments may be modified or some technical features may be replaced by equivalents without departing from the scope and spirit of the present disclosure. In particular, the various technical features mentioned in the various embodiments may be combined in any manner as long as there is no structural conflict.

Claims

1. A polishing liquid supply device (1), used for supplying polishing liquid to a polishing machine (2), comprising a barrel (11) containing polishing liquid, wherein the barrel (11) is connected to the polishing machine (2) via a supply pipe (12), and a water pump (13) is provided on the supply pipe (12) for pumping the polishing liquid to the polishing machine (2), characterized in that: The supply pipe (12) is also provided with a filter (14) and a pressure gauge (15); the filter (14) is used to filter particulate impurities in the polishing liquid; the pressure gauge (15) is used to detect the hydraulic pressure in the supply pipe (12) to monitor the clogging condition of the filter (14).

2. The polishing liquid supply device (1) according to claim 1, characterized in that: The pressure gauge (15) is arranged on the supply pipe (12) between the filter (14) and the water pump (13).

3. The polishing liquid supply device (1) according to claim 1, characterized in that: The polishing liquid supply device (1) also includes an alarm (16), the alarm (16) being electrically connected to the pressure gauge (15), and the alarm (16) being used to execute an alarm according to the hydraulic pressure detected by the pressure gauge (15).

4. The polishing liquid supply device (1) according to claim 3, characterized in that: The alarm (16) is an audible and visual alarm.

5. The polishing liquid supply device (1) according to claim 1, characterized in that: The supply pipe (12) is also provided with a control valve (17) for controlling the on and off of the supply pipe (12).

6. The polishing liquid supply device (1) according to claim 1, characterized in that: The supply pipe (12) is a hard pipe.

7. The polishing liquid supply device (1) according to claim 1, characterized in that: The polishing liquid supply device (1) also includes a flow meter arranged on the supply pipe (12).

8. The polishing liquid supply device (1) according to any one of claims 1 to 7, characterized in that: The barrel (11) is provided with a stirring rod, and the stirring rod is used to stir the polishing liquid.

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