Brush roll for cleaning semiconductor wafer

Abstract

The utility model relates to a brush roll for cleaning a semiconductor wafer, which aims to ensure that the brush roll mounted on an inner rod stably rotates along with the inner rod while pressing the surface of the wafer to remove various foreign matters or particles remained on the surface of the wafer, so that the rotary brush roll has a rounded cross section and keeps a constant contact state. A plurality of cylindrical protrusions are arranged on the surface of the brush roller used for cleaning the semiconductor wafer, and the surface of the semiconductor wafer can be cleaned through rotating force. The inner rod is made of polyformaldehyde (POM), the outer surface of the inner rod is in an equilateral octagon shape, a pipeline with holes is formed in the longitudinal center of the inner rod, and a longitudinal notch is formed in the center of each face and used for discharging water on a brush roller. A fixing clamp comprises eight main frames and connecting frames, wherein the eight main frames are made of soft synthetic resin and located at the longitudinal corners, and the connecting frames are longitudinally and transversely connected between the adjacent main frames at certain intervals to form a net shape. The brush roller is installed on the outer side of the clamp and is made of polyvinyl alcohol (PVA) sponge.

Description

Technical Field

[0001] The utility model relates to a brush roller for cleaning semiconductor wafers. More specifically, it relates to a brush roller for cleaning semiconductor wafers, the development purpose of which is to ensure that the brush roller mounted on an inner rod rotates stably with the inner rod while pressing the surface of the wafer to remove various foreign matter or particles remaining on the surface of the wafer, so that the rotating brush roller has a more round cross section and maintains a constant contact state. Background Art

[0002] Generally speaking, in the semiconductor field, many identical circuits are made on a wafer (i.e., substrate) processed into a thin circular plate shape to form a semiconductor integrated circuit. It integrates many devices into one chip to realize various processing and storage functions, and can be said to be the basic element for making semiconductors.

[0003] Wafers are single crystal cylindrical disks grown from silicon (Si), gallium arsenide (GaAs), etc., sliced ​​to appropriate thickness, and can be made from a variety of materials. However, considering its unit cost, stability and characteristics, most are made from silicon extracted from sand.

[0004] The process of manufacturing silicon wafers involves melting silicon raw materials extracted from sand at high temperatures to form a high-purity silicon solution, which is then allowed to grow and harden in columnar crystals to form silicon columns called silicon ingots. In order to make silicon ingots into disc-shaped silicon wafers, they need to be cut into silicon wafers of uniform thickness using a diamond saw. The surface of the cut silicon wafers will have defects and roughness, affecting the accuracy of the circuit, so the surface of the silicon wafer needs to be polished using abrasive fluid and a polishing machine to make the surface of the silicon wafer as smooth as a mirror.

[0005] The prepared wafer then undergoes different stages of physical and chemical treatment to form integrated circuits on the surface and is processed to form integrated circuit chips.

[0006] The above-mentioned wafer surface polishing process includes a cleaning process for removing various objects, such as metal impurities, organic pollutants and surface coatings such as natural oxide films, including particles remaining on the wafer surface after various semiconductor device manufacturing processes (such as chemical mechanical polishing process).

[0007] During cleaning, the wafer is cleaned by rotating the upper and lower brush rollers, which have many integrally formed cylindrical protrusions. The inner rod used in the cleaning process is usually made of synthetic resin with high mechanical strength and good wear resistance, and the brush roller is made of porous materials such as sponge. However, due to the different characteristics of the two materials, if the cross-section of the brush roller is circular, when it is in close contact with the wafer, the inner rod will idle due to the friction generated during rotation, resulting in poor cleaning and polishing effects, or the brush roller is twisted and cannot form a uniform cleaning surface.

[0008] In addition, the brush roller will be contaminated during use. When the degree of contamination exceeds a certain level, the brush roller needs to be replaced, but the structure of most traditional brush rollers requires the inner rod to be replaced at the same time, which increases costs and causes waste of resources.

[0009] Existing patent documents:

[0010] (Reference Patent 0001) Korean Patent Registration No. 10-0918894-0000 (September 17, 2009);

[0011] (Reference Patent 0002) Korean Patent Registration No. 10-1584427-0000 (January 5, 2016);

[0012] (Reference Patent 0003) Korean Patent Registration No. 10-1586428-0000 (January 12, 2016);

[0013] (Reference Patent 0004) Korean Public Patent No. 10-2023-0028012 (February 28, 2023). Utility Model Content

[0014] The utility model is developed to solve the above problems, and its purpose is to develop a brush roller for cleaning semiconductor wafers, wherein the contaminated brush roller can be easily replaced while ensuring the stable rotation of the inner rod.

[0015] Another purpose of the utility model is to prevent the brush roller from rotating and twisting due to friction during the process of cleaning the wafer.

[0016] To achieve the above-mentioned object, the utility model relates to a brush roller for cleaning semiconductor wafers, the surface of which has many cylindrical protrusions and can clean the surface of the semiconductor wafer by rotational force;

[0017] An inner rod made of polyoxymethylene (POM) with an equilateral octagonal outer surface, a perforated channel formed in the longitudinal center, and a longitudinal cutout in the center of each of the eight faces for draining water from the brush roller;

[0018] A fixing fixture, comprising eight main frames made of soft synthetic resin and located at longitudinal corners, and connecting frames longitudinally and transversely connected at certain intervals between adjacent main frames to form a mesh;

[0019] The brush roller is mounted on the outside of the fixture and is made of polyvinyl alcohol (PVA) sponge;

[0020] In addition, the cross section of the inner rod is a circle or a regular polygon;

[0021] The distance between the inner end surface of the fixing fixture and the outer end surface of the inner rod is less than 1 mm, and the fixing fixture is embedded in and fixed on the brush roller to form a whole with the brush roller.

[0022] Meanwhile, the main frame of the fixing fixture includes a plurality of fixing protrusions that protrude in a normal direction and are inserted into the brush roller.

[0023] In addition, a guide groove extending in the longitudinal direction is formed on one side of the main frame in contact with the inner rod, and a plurality of guide holes are arranged on the guide groove, one side of the guide holes is perpendicular to the main frame, and the other side is inclined in the longitudinal direction.

[0024] A guide rod is arranged inside the guide groove, and a plurality of fixed protrusions are arranged on the guide rod, and the protrusions pass through the guide hole and extend obliquely or vertically according to the position. The upper edges of the longitudinal partition and the transverse partition adopt a straight line or arc structure.

[0025] Beneficial effects:

[0026] As described above, the inner rod of the utility model is close to a circle and has an angle, so that the brush roller can be firmly fixed thereon. By installing a fixing fixture in the middle, the inner rod is prevented from idling, and the replacement of the brush roller is convenient.

[0027] In addition, a fixing protrusion formed in the jig is inserted into and fixed to the brush roller to prevent the brush roller from being twisted due to different friction forces when rotating and pressing the wafer, thereby achieving a uniform cleaning surface. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a perspective view of an embodiment of the utility model;

[0029] Figure 2 It is a cross-sectional view of an embodiment of the utility model;

[0030] Figure 3 It is a cross-sectional view of an embodiment of the utility model;

[0031] Figure 4 It is a cross-sectional view of an embodiment of the utility model;

[0032] Figure 5 It is a conceptual diagram of an embodiment of the utility model.

[0033] The markings in the figure are as follows: 1: brush roller; 11: protrusion; 12: inner rod; 121: cutout; 13: fixing clamp; 131: main frame; 132: connecting frame; 133: fixing protrusion; 134: guide groove; 135: guide hole; 136: guide rod. DETAILED DESCRIPTION

[0034] Those skilled in the art can easily understand and reproduce the present invention through the accompanying drawings.

[0035] Figure 1 It is a perspective view of an embodiment of the utility model. Figure 2 is a cross-sectional view of an embodiment of the utility model, Figure 3 is a cross-sectional view of an embodiment of the utility model, Figure 4 It is a cross-sectional view of an embodiment of the utility model.

[0036] The surface of the brush roller 1 is composed of a plurality of cylindrical protrusions 11, which can clean the surface of the semiconductor wafer through the rotation force;

[0037] The inner rod 12 is made of polyoxymethylene (POM), and its outer surface is an equilateral octagon, a perforated channel is formed in the longitudinal center, and a longitudinal cutout 121 for drainage is provided in the center of each of the eight faces;

[0038] The fixing fixture 13 includes eight main frames 131 made of soft synthetic resin and located at longitudinal corners, and connecting frames 132 connected longitudinally and transversely at certain intervals between adjacent main frames 131 to form a mesh;

[0039] The brush roller 1 is mounted on the outside of the fixture 13 and is made of polyvinyl alcohol (PVA) sponge.

[0040] Generally speaking, the brush rollers 1 are arranged up and down and have a plurality of cylindrical protrusions 11 on their surfaces, which rotate in opposite directions to each other to remove particles on the wafers passing therethrough, thereby performing a cleaning operation.

[0041] The inner rod 12 of the conventional brush roller 1 is circular and may idle, so an octagonal shape close to a circle is selected, and the inner rod 12 is made of polyoxymethylene (POM) having excellent mechanical properties.

[0042] In addition, a fixing fixture 13 is installed in the middle of the brush roller 1. The main frame 131 of the fixing fixture 13 is equipped with a plurality of fixing protrusions 133. The fixing protrusions 133 protrude along the normal direction and are inserted into the brush roller 1 to prevent idling and twisting.

[0043] This structure allows the brush roller 1 to be removed from the inner rod 12 together with the fixing fixture 13 when the brush roller 1 needs to be replaced due to contamination or wear, and only the brush roller 1 is replaced, thereby reducing waste of resources.

[0044] In this case, the water required for the cleaning process is delivered to the brush roller 1 through the cutout 121 on the side of the inner rod 12. Compared with the traditional technology of supplying water through multiple holes, it has the advantages of preventing uneven water supply caused by clogging of the holes and easy maintenance.

[0045] In addition, the brush roller 1 is made of polyvinyl alcohol (PVA), which has good hygroscopicity, and feels soft, elastic and cushiony after absorbing moisture, whereas it becomes hard after drying. It has two uses: removing particles and polishing.

[0046] In addition, the cross section of the inner rod 12 is a circle or a regular polygon.

[0047] In another embodiment, the distance between the inner end surface of the fixing fixture 13 and the outer end surface of the inner rod 12 is less than 1 mm, and the fixing fixture 13 is embedded in and fixed on the brush roller 1 to form a whole with the brush roller 1 .

[0048] In recent years, the inner rod 12 and the brush roller 1 are usually integrally formed, but the production cost and replacement cost of the integral forming are very high, and the drainage hole is easily blocked during the process of forming the brush roller 1 on the outer side of the inner rod 12.

[0049] If the fixing fixture 13 is simply installed on the inner rod 12, the cutout 121 may also be blocked when the fixing fixture drains the cleaning water.

[0050] In the above embodiment, the fixing clamp 13 is embedded in the brush roller 1, the inner rod 12 and the clamp 13 are not in direct contact, and the brush roller 1 is in contact with the inner rod 12, which facilitates the discharge of cleaning water through the incision 121, and the fixing clamp 13 can stably fix the inner rod 12.

[0051] In addition, this structure also has the effect of reducing replacement costs, that is, the inner rod 12 is retained and only the brush roller 1 embedded in the fixing fixture 13 is replaced.

[0052] Furthermore, since a stable and firm fixation with the inner rod 12 is achieved, it is not necessary to be limited to a conventional polygonal cross section, and even a circular cross section can be firmly fixed.

[0053] Figure 5 This is a conceptual diagram of another embodiment of the utility model, wherein a longitudinally extending guide groove 134 is formed on one side of the main frame 131 in contact with the inner rod 12, and a plurality of guide holes 135 are provided on the guide groove 134, one side of the guide holes being vertical and the other side being inclined in the longitudinal direction;

[0054] In the embodiment shown in the figure, the guide rod 136 has a plurality of fixing protrusions 133, which pass through the guide holes 135 and extend obliquely or vertically according to the position.

[0055] In the above embodiment, the PVA sponge of the brush roller 1 needs to be fixed using adhesive or other means, and it will be inconvenient to install and replace it simply by fixing the protrusions 133.

[0056] When the guide rod 136 is pulled to one side, the fixing protrusion 133 is in an inclined state and partially retracted inside to shorten its length. The brush roller 1 is installed by sliding in a direction in which the end of the fixing protrusion 133 is not stuck. When the guide rod 136 is pushed in the opposite direction, the fixing protrusion 133 protrudes and is vertically inserted into the brush roller 1.

[0057] This structure can facilitate the installation and replacement of the brush roller 1, while ensuring that the brush roller 1 is firmly fixed, thereby preventing idling and twisting during operation.

[0058] Finally, it should be noted that: technicians in this industry should understand that the utility model is not limited to the above-mentioned implementation cases. The above-mentioned embodiments and descriptions only illustrate the principles of the utility model. Without departing from the spirit and scope of the utility model, the utility model will have various changes and improvements, and these changes and improvements must fall within the scope of the utility model to be protected. The scope of protection of the utility model is defined by the attached claims and their equivalents.

Claims

1. A brush roller for cleaning semiconductor wafers, having a plurality of cylindrical protrusions (11) on the surface, capable of cleaning the surface of the semiconductor wafer by rotational force, characterized in that: An inner rod (12) made of polyoxymethylene (POM), the outer surface of which is in the shape of an equilateral octagon, a perforated channel is formed in the longitudinal center, and a longitudinal cutout (121) is provided in the center of each of the eight faces for draining water from the brush roller; A fixing fixture (13) comprising eight main frames (131) made of soft synthetic resin and located at longitudinal corners, and connecting frames (132) connected longitudinally and transversely at certain intervals between adjacent main frames (131) to form a mesh; The brush roller (1) is installed on the outside of the fixing fixture (13) and is made of polyvinyl alcohol (PVA) sponge.

2. The brush roller for cleaning semiconductor wafers according to claim 1, characterized in that: The cross section of the inner rod (12) is circular or regular polygonal; The distance between the inner end surface of the fixing fixture (13) and the outer end surface of the inner rod (12) is less than 1 mm, and the fixing fixture (13) forms a whole with the brush roller (1) by being embedded and fixed on the brush roller (1).

3. The brush roller for cleaning semiconductor wafers according to claim 2, characterized in that: The main frame (131) of the fixing fixture (13) comprises a plurality of fixing protrusions (133) which protrude in a normal direction and are inserted into the brush roller (1).

4. The brush roller for cleaning semiconductor wafers according to claim 3, characterized in that: A guide groove (134) extending in the longitudinal direction is formed on the side of the main frame (131) contacting the inner rod (12), and a plurality of guide holes (135) are provided on the guide groove (134), one side of the guide hole (135) is perpendicular to the main frame (131), and the other side is inclined in the longitudinal direction; A guide rod (136) is provided inside the guide groove (134), and a plurality of fixing protrusions (133) are provided on the guide rod (136). The protrusions pass through the guide hole (135) and extend out obliquely or vertically according to the position.

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